Etching tank structure convenient to clean

Abstract

An embodiment of the utility model provides a corrosion tank structure convenient to clean, which relates to the technical field of wafer processing and comprises a tank body, a corrosion frame is arranged in the tank body and hung on the inner side of a swing unit arranged on the inner side of the tank body, and the swing unit comprises a moving frame and a sliding rod arranged on the inner side of the moving frame. A swing frame is fixedly installed in the middle of the sliding rod, an eccentric pile is movably installed in the middle of the swing frame, and the lower end of the eccentric pile is fixedly installed at the upper end of a rotating disc at the bottom of the eccentric pile. The eccentric pile installed at the upper end drives the swing frame to reciprocate, then drives the movable frames fixedly installed on the two sides to reciprocate, further drives the corrosion frame hung on the inner side to swing left and right, prevents the wafer from floating on the surface and making the wafer spread out to make contact with corrosion liquid, and facilitates corrosion operation.

Description

Technical Field

[0001] The utility model relates to the technical field of wafer processing, in particular to an etching tank structure which is easy to clean. Background Art

[0002] With the rapid development of the semiconductor industry, the requirements for wafer surface treatment are also increasing. Among them, etching technology is one of the key steps in the wafer manufacturing process, and its efficiency and quality directly affect the performance of the final product.

[0003] Traditional etching methods usually use static or manual stirring to ensure that the wafer is fully in contact with the etching liquid. During static etching, the wafers are stacked at the same time, making it difficult to ensure that the wafer surface is evenly etched. Manual operation is not only inefficient, but also easily causes harm to the operator, affecting the processing of the wafer. Utility Model Content

[0004] The purpose of the utility model is to provide an etching tank structure that is easy to clean and can avoid the problem of static etching and wafer stacking, which makes it difficult to ensure that the wafer surface is evenly etched.

[0005] The utility model provides a corrosion tank structure that is easy to clean, comprising:

[0006] A tank body, wherein an etching frame is provided inside the tank body, and the etching frame is suspended inside a swing unit provided inside the tank body, and the swing units are respectively arranged on both sides of the etching frame;

[0007] The swing unit includes a mobile frame and a sliding rod arranged on the inner side of the mobile frame, the swing frame is fixedly installed in the middle of the sliding rod, the eccentric pile is movably installed in the middle of the swing frame, the lower end of the eccentric pile is fixedly installed on the upper end of the rotating disk at the bottom of the eccentric pile, and the lower end of the rotating disk is connected to the output end of the drive motor.

[0008] Preferably, a hanging rod is provided at the upper end of the movable frame, and both sides of the hanging rod are telescopically installed inside the mounting openings provided on both sides of the inner cavity of the trough body through mounting rods for limiting.

[0009] Preferably, a fixed fence is arranged around the upper end of the corrosion frame, and hooks are fixedly provided on both sides of the fixed fence, and the hooks match the size of the hanging rod.

[0010] Preferably, a baffle cover is provided inside the trough body, the baffle cover is snap-fitted and installed on the bottom of the trough body, and the baffle cover is placed at the lower end of the corrosion frame.

[0011] Preferably, a distribution pipe is arranged at the bottom of the trough body, and a first fluid replenishment pipe, a second fluid replenishment pipe, and a third fluid replenishment pipe are arranged on one side of the trough body. The first fluid replenishment pipe, the second fluid replenishment pipe, and the third fluid replenishment pipe can respectively introduce corrosive liquid, cleaning liquid, and clean water. The first fluid replenishment pipe, the second fluid replenishment pipe, and the third fluid replenishment pipe are respectively connected to the connecting port set on one side of the upper end of the distribution pipe, and are respectively arranged through the baffle cover. The first fluid replenishment pipe, the second fluid replenishment pipe, and the third fluid replenishment pipe are respectively connected to the solenoid valve for control.

[0012] Preferably, a distribution hole is provided at the lower end of the distribution pipe.

[0013] Preferably, a drain port is provided at the bottom of the tank body, and the drain ports are all connected to the drain pipe at the lower end, and are each installed with a solenoid valve for blocking.

[0014] Preferably, stirring blades are staggeredly distributed at the bottom of the inner cavity of the tank body, and the lower ends of the stirring blades are driven to rotate by a driving motor.

[0015] Preferably, a cleaning auxiliary unit is provided on one side of the trough body, and the cleaning auxiliary unit includes a tube body connected to the inner cavity of the trough body and a filter pot arranged in the middle of the tube body. A pump body is provided on one side of the filter pot, and an elastic nozzle is installed on one side of the pump body. The end of the elastic nozzle is fixed with a brush part by screws.

[0016] Preferably, one end of the pipe body of the cleaning auxiliary unit is connected to the distribution pipe and is communicated with the distribution pipe through a connecting pipe.

[0017] The embodiment of the present invention provides an etching tank structure that is easy to clean. The wafers to be corroded are poured into the etching frame for soaking. During soaking, the rotating disk can be driven to rotate by a driving motor, and the eccentric pile installed at the upper end drives the swing frame to move back and forth, thereby driving the movable frames fixedly installed on both sides to move back and forth, and then driving the etching frame mounted on the inner side to swing left and right, preventing the wafers from floating on the surface, allowing them to be spread out and contact with the etching liquid, thereby facilitating the etching operation. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the following is a brief introduction to the drawings required for use in the embodiments. It should be understood that the following drawings only show certain embodiments of the present invention and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other relevant drawings can be obtained based on these drawings without creative work.

[0019] Figure 1 It is a schematic diagram of the overall structure of an embodiment of the present utility model.

[0020] Figure 2This is a schematic diagram of the cross-sectional structure of the tank body according to an embodiment of the present utility model.

[0021] Figure 3 This is a schematic diagram of the corrosion frame structure of an embodiment of the present utility model.

[0022] Figure 4 This is a schematic structural diagram of a swing unit according to an embodiment of the present invention.

[0023] Figure 5 This is a schematic diagram of the structure of a mobile rack according to an embodiment of the present utility model.

[0024] Figure 6 This is a schematic structural diagram of a cleaning auxiliary unit according to an embodiment of the present utility model.

[0025] Figure 7 For the embodiment of the utility model Figure 2 Enlarged structural diagram at point A in the middle.

[0026] Description of the drawings: 100, tank body; 110, first liquid infusion tube; 120, second liquid infusion tube; 130, third liquid infusion tube; 140, distribution tube; 141, connecting port; 142, connecting tube; 143, distribution hole; 150, stirring blade; 160, drain pipe; 170, drain port; 200, corrosion frame; 210, fixed fence; 220, hook; 300, cleaning auxiliary unit; 310, filter pot; 320, pump body; 330, elastic nozzle; 340, brush part; 400, baffle cover; 500, swing unit; 510, movable frame; 520, sliding rod; 530, swing frame; 540, eccentric pile; 550, rotating disk; 560, hanging rod. DETAILED DESCRIPTION

[0027] Hereinafter, only certain exemplary embodiments are briefly described. As will be appreciated by those skilled in the art, the described embodiments may be modified in various ways without departing from the spirit or scope of the embodiments of the present invention. Therefore, the drawings and description are to be regarded as illustrative in nature and not restrictive.

[0028] In the description of the embodiments of the present invention, it should be understood that the terms "length", "vertical", "horizontal", "top", "bottom", etc. indicating the orientation or position relationship are based on the orientation or position relationship shown in the accompanying drawings, and are only for the convenience of describing the embodiments of the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the embodiments of the present invention.

[0029] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be understood to indicate or imply relative importance or implicitly specify the number of the technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of the features. In the description of the embodiments of the present invention, "plurality" means two or more, unless otherwise specifically defined.

[0030] In the embodiments of the present invention, unless otherwise expressly specified or limited, the terms "installed," "connected," "connected," "fixed," etc. should be understood in a broad sense. For example, they can refer to fixed connection, detachable connection, or integration; mechanical connection, electrical connection, or communication; direct connection or indirect connection through an intermediate medium; internal communication between two components or interaction between two components. Those skilled in the art will understand the specific meanings of the above terms in the embodiments of the present invention based on specific circumstances.

[0031] The disclosure below provides many different embodiments or examples for implementing different structures of the embodiments of the present invention. In order to simplify the disclosure of the embodiments of the present invention, the components and settings of specific examples are described below. Of course, these are merely examples and are not intended to limit the embodiments of the present invention. In addition, the embodiments of the present invention may repeat reference numbers and / or reference letters in different examples. Such repetition is for the purpose of simplicity and clarity and does not in itself indicate the relationship between the various embodiments and / or settings discussed.

[0032] In order to better understand the purpose, structure and function of the present invention, the following is a further detailed description of a corrosion tank structure that is easy to clean in the present invention in conjunction with the accompanying drawings.

[0033] like Figure 1-Figure 7 As shown, an embodiment of the present invention provides an etching tank structure that is easy to clean, including a tank body 100 for etching quartz wafers. An etching frame 200 for placing the wafers for etching is provided inside the tank body 100. The etching frame 200 is suspended inside a swing unit 500 provided inside the tank body 100, and the swing units 500 are respectively arranged on both sides of the etching frame 200.

[0034] The swing unit 500 includes a movable frame 510 for driving the corrosion frame 200 to swing and a sliding rod 520 arranged on the inner side of the movable frame 510 for supporting the movable frame 510. The upper end of the sliding rod 520 is limited by a sliding sleeve installed in the inner cavity at the bottom of the trough body 100, and is assisted in movement by internal ball bearings. A swing frame 530 for driving the sliding rod 520 to move is fixedly installed in the middle of the sliding rod 520, and an eccentric pile 540 for driving the swing frame 530 to move is movably installed in the middle of the swing frame 530. The lower end of the eccentric pile 540 is fixedly installed on the upper end of the rotating disk 550 at the bottom of the eccentric pile 540, and the lower end of the rotating disk 550 is connected to the output end of the driving motor.

[0035] The wafer to be corroded is poured into the corrosion frame 200 for soaking. During soaking, the rotating disk 550 can be driven to rotate by the driving motor, and the eccentric pile 540 installed at the upper end drives the swing frame 530 to move back and forth, thereby driving the movable frames 510 fixed on both sides to move back and forth, thereby driving the corrosion frame 200 mounted on the inner side to swing left and right to prevent the wafer from floating on the surface, so that it is spread out and in contact with the corrosion liquid, thereby facilitating the corrosion operation.

[0036] The upper end of the movable frame 510 is provided with a hanging rod 560 for hanging and installing the corrosion frame 200. Both sides of the hanging rod 560 are telescopically installed in the installation openings set on both sides of the inner cavity of the trough body 100 for limiting the position. The upper end of the corrosion frame 200 is surrounded by a fixed fence 210 for positioning the corrosion frame 200. Both sides of the fixed fence 210 are fixedly provided with hooks 220 for installing and positioning the corrosion frame 200. The hooks 220 match the hanging rod 560 in size. The matching use of the hooks 220 and the hanging rod 560 facilitates the installation and positioning of the corrosion frame 200. After the corrosion is completed, the corrosion frame 200 is removed for transportation, which is convenient for operation.

[0037] The interior of the trough body 100 is provided with a barrier cover 400 for isolating the upper objects and preventing them from falling and being damaged. The barrier cover 400 is snap-fitted and installed at the bottom of the trough body 100. The barrier cover 400 is placed at the lower end of the corrosion frame 200 to prevent the upper end wafers from falling to the lower end and damaging the wafers caused by the equipment at the lower end. The barrier cover protects the wafers and protects the lower end parts at the same time.

[0038] A distribution pipe 140 for replenishing the internal corrosive liquid is arranged at the bottom of the tank body 100, and a first liquid replenishing pipe 110, a second liquid replenishing pipe 120, and a third liquid replenishing pipe 130 for replenishing the corrosive liquid are arranged on one side of the tank body 100. The first liquid replenishing pipe 110, the second liquid replenishing pipe 120, and the third liquid replenishing pipe 130 can be respectively fed with corrosive liquid, cleaning liquid and clean water to replenish the tank body 100. The first liquid replenishing pipe 110, the second liquid replenishing pipe 120, and the third liquid replenishing pipe 130 are respectively connected to the connecting port 141 provided on one side of the upper end of the distribution pipe 140, and are respectively arranged through the baffle cover 400. The first liquid replenishing pipe 110, the second liquid replenishing pipe 120, and the third liquid replenishing pipe 130 are respectively connected to the connecting port 141 provided on one side of the upper end of the distribution pipe 140, and are respectively arranged through the baffle cover 400. 0. The second liquid replenishing tube 120 and the third liquid replenishing tube 130 are respectively connected to the solenoid valve for control. When filling the interior of the tank body 100 with liquid, the corrosion liquid, the cleaning liquid and the clean water can be respectively introduced into the first liquid replenishing tube 110, the second liquid replenishing tube 120 and the third liquid replenishing tube 130 as needed. The liquid can be replaced in time according to specific use, and they are respectively connected to the distribution pipe 140, so that the liquids flushed into the first liquid replenishing tube 110, the second liquid replenishing tube 120 and the third liquid replenishing tube 130 can be evenly and smoothly filled. After corrosion, the tank body 100 can be cleaned with cleaning liquid and clean water, and the tank body 100 can be used to clean the wafers.

[0039] The lower end of the distribution pipe 140 is provided with distribution holes 143 for facilitating the leakage of liquid, thereby facilitating uniform distribution of the liquid inside.

[0040] A drain port 170 is provided at the bottom of the tank body 100 for facilitating the discharge and replacement of the liquid in the tank body 100. The drain ports 170 are all connected to the drain pipe 160 at the lower end, and are all equipped with solenoid valves for blocking. When the internal liquid needs to be discharged and replaced, the solenoid valve is opened, and the liquid inside the tank body 100 is discharged from the drain port 170, making it convenient to replace the liquid.

[0041] Stirring blades 150 for stirring the internal liquid are staggered at the bottom of the inner cavity of the trough body 100. The lower ends of the stirring blades 150 are driven to rotate by a driving motor. When draining the liquid, the driving motor drives the stirring blades 150 to rotate, so that it stirs the liquid, facilitates the stirring and discharge of the bottom sediment, and facilitates drainage.

[0042] A cleaning auxiliary unit 300 for cleaning the internal wafers and the tank body 100 is provided on one side of the tank body 100. The cleaning auxiliary unit 300 includes a tube body connected to the inner cavity of the tank body 100 and a filter pot 310 arranged in the middle of the tube body. The interior can be filled with filter material for use. A pump body 320 for pumping water for flushing is provided on one side of the filter pot 310. An elastic nozzle 330 is installed on one side of the pump body 320. The end of the elastic nozzle 330 is fixed with a brush part 340 for auxiliary cleaning and brushing by screws. When cleaning the wafers and the tank body 100, water is pumped by the pump body 320 for spraying, which is convenient for hand-held flushing of the wafers inside the corrosion frame 200 and the edge of the tank body 100. The brush part 340 assists in brushing to ensure cleaning.

[0043] One end of the cleaning auxiliary unit 300 is connected to the distribution pipe 140 and is connected through the connecting pipe 142, so that the pipe can draw liquid from the inside of the tank 100 for auxiliary cleaning, avoiding blockage of a single liquid intake port affecting the liquid drawing and flushing operation.

[0044] The working principle of an etching tank structure that is easy to clean is as follows: the wafers to be etched are poured into the etching frame 200 for soaking. During soaking, the rotating disk 550 can be driven by a driving motor to rotate, and the eccentric pile 540 installed at the upper end drives the swing frame 530 to move back and forth, thereby driving the movable frames 510 fixed on both sides to move back and forth, and then driving the etching frame 200 mounted on the inner side to swing left and right to prevent the wafers from floating on the surface, so that they are spread out and in contact with the etching liquid, thereby facilitating the etching operation.

[0045] It is understood that the present invention is described by way of certain embodiments, and those skilled in the art will appreciate that various changes or equivalent substitutions may be made to these features and embodiments without departing from the spirit and scope of the present invention. Furthermore, under the guidance of the present invention, these features and embodiments may be modified to suit specific circumstances and materials without departing from the spirit and scope of the present invention. Therefore, the present invention is not limited to the specific embodiments disclosed herein, and all embodiments falling within the scope of the claims of this application are intended to be protected by the present invention.

Claims

1. A corrosion tank structure that is easy to clean, characterized in that: include: A trough body, wherein an etching frame is provided inside the trough body, and the etching frame is suspended inside a swing unit provided inside the trough body, and the swing units are respectively arranged on both sides of the etching frame; The swing unit includes a mobile frame and a sliding rod arranged on the inner side of the mobile frame, the swing frame is fixedly installed in the middle of the sliding rod, the eccentric pile is movably installed in the middle of the swing frame, the lower end of the eccentric pile is fixedly installed on the upper end of the rotating disk at the bottom of the eccentric pile, and the lower end of the rotating disk is connected to the output end of the drive motor.

2. The corrosion tank structure that is easy to clean according to claim 1, characterized in that: A hanging rod is provided at the upper end of the movable frame, and both sides of the hanging rod are telescopically installed inside the mounting openings provided on both sides of the inner cavity of the trough body through mounting rods for limiting.

3. The corrosion tank structure that is easy to clean according to claim 2, characterized in that: A fixed fence is arranged around the upper end of the corrosion frame, and hooks are fixedly provided on both sides of the fixed fence, and the hooks match the size of the hanging rod.

4. The corrosion tank structure that is easy to clean according to claim 3, characterized in that: A baffle cover is provided inside the trough body, the baffle cover is clamped and installed on the bottom of the trough body, and the baffle cover is placed at the lower end of the corrosion frame.

5. The corrosion tank structure that is easy to clean according to claim 4, characterized in that: A distribution pipe is arranged at the bottom of the trough body, and a first liquid replenishing pipe, a second liquid replenishing pipe, and a third liquid replenishing pipe are arranged on one side of the trough body. The first liquid replenishing pipe, the second liquid replenishing pipe, and the third liquid replenishing pipe can respectively introduce corrosive liquid, cleaning liquid and clean water. The first liquid replenishing pipe, the second liquid replenishing pipe, and the third liquid replenishing pipe are respectively connected to the connecting port set on one side of the upper end of the distribution pipe, and are respectively arranged through the baffle cover. The first liquid replenishing pipe, the second liquid replenishing pipe, and the third liquid replenishing pipe are respectively connected to the solenoid valve for control.

6. The corrosion tank structure that is easy to clean according to claim 5, characterized in that: The lower end of the distribution pipe is provided with a distribution hole.

7. The corrosion tank structure that is easy to clean according to claim 6, characterized in that: The bottom of the tank body is provided with a drain port, which is communicated with the drain pipe at the lower end and is equipped with a solenoid valve for isolation.

8. The corrosion tank structure that is easy to clean according to claim 7, characterized in that: Stirring blades are staggeredly distributed on the bottom of the inner cavity of the tank body, and the lower ends of the stirring blades are driven to rotate by a driving motor.

9. The corrosion tank structure that is easy to clean according to claim 8, characterized in that: A cleaning auxiliary unit is provided on one side of the trough body, and the cleaning auxiliary unit includes a tube body connected to the inner cavity of the trough body and a filter pot arranged in the middle of the tube body. A pump body is provided on one side of the filter pot, and an elastic nozzle is installed on one side of the pump body. The end of the elastic nozzle is fixed with a brush part by screws.

10. The corrosion tank structure that is easy to clean according to claim 9, characterized in that: One end of the pipe body of the cleaning auxiliary unit is connected to the distribution pipe and is communicated with the distribution pipe through the connecting pipe.

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