Cooling structure of diamond reaction cavity
By setting a water-cooled chamber in the diamond growth equipment to reduce the temperature at the annular glass, the problem of seal aging is solved, ensuring the sealing effect of the equipment and the stability of the vacuum environment.
Patent Information
- Application Number
- CN202422657513.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-10-31
- Publication Date
- 2025-08-26
- Estimated Expiration
- 2034-10-31
AI Technical Summary
The seals at the annular glass of existing diamond growth equipment are prone to aging, affecting the sealing effect.
A water-cooled chamber is provided at the annular grooves of the reaction base and the growth table. The water-cooled chamber is used to remove heat to reduce the temperature at both ends of the annular glass. A fluorine rubber ring is used as a seal to improve high temperature resistance.
It effectively avoids the aging of the seal, maintains the sealing effect of the diamond growth equipment, and ensures the stability of the vacuum environment.
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Figure CN223268765U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of accessories for MPCVD equipment, in particular to a cooling structure for a diamond reaction chamber. Background Art
[0002] Microwave plasma chemical vapor deposition (MPCVD) is a method used to grow artificial diamonds. This method places a seed crystal in a vacuum chamber and introduces a carbon-containing mixed gas containing nitrogen, methane and hydrogen. Methane is the source of carbon atoms for synthetic diamonds, while nitrogen acts as a catalyst to increase the growth rate of diamonds. Hydrogen can inhibit the formation of graphite. Under the action of microwave plasma, the carbon-containing gas is dissociated and carbon atoms are deposited into a diamond film on the diamond substrate.
[0003] For example, the patent with patent number CN221324766U includes: growth equipment, cooling input diverter, cooling output diverter, cooling inlet pipe and cooling outlet pipe; the number of the growth equipment is multiple, some of the growth equipment are one of the microwave power supply, microwave generator and reactor, and some of the growth equipment are provided with a cooling structure; the cooling input diverter is provided with multiple output ends, and the multiple output ends are respectively provided with control valves; the cooling output diverter is provided with multiple input ends, and the multiple input ends are respectively provided with flow meters and thermometers; the input end of the cooling inlet pipe is connected to the output end of the cooling input diverter, and the output end of the cooling inlet pipe is connected to the input end of the cooling structure; the input end of the cooling outlet pipe is connected to the output end of the cooling structure, and the output end of the cooling outlet pipe is connected to the input end of the cooling output diverter.
[0004] An annular glass is provided between the inner and outer support platforms of the above-mentioned device. The annular glass is used to ensure a vacuum environment during diamond growth and the normal transmission of microwaves. The annular glass is sealed with the inner and outer support platforms by a seal. However, the device cannot cool the seal at the glass. Prolonged high temperature can easily cause the seal to age, affecting the sealing effect. Utility Model Content
[0005] In view of the above-mentioned defects, the purpose of the present invention is to provide a cooling structure for a diamond reaction chamber to solve the problem that the sealing member at the annular glass of the existing diamond growing equipment is prone to aging.
[0006] To achieve this purpose, the present invention adopts the following technical solutions:
[0007] A cooling structure for a diamond reaction chamber comprises a reaction base, a growth platform and an annular glass;
[0008] A reaction tank is provided on the top of the reaction base, an annular groove is provided between the inner bottom wall of the reaction tank and the bottom end of the growth platform, the upper and lower ends of the annular glass are respectively embedded in the corresponding annular grooves, and a sealing member is provided between the annular glass and the annular grooves;
[0009] A first water-cooling chamber is provided inside the reaction base, and the first water-cooling chamber is located directly below the annular groove of the reaction tank. A first water inlet and a first water outlet are provided at the bottom end of the reaction base, which are in communication with the first water-cooling chamber.
[0010] A second water-cooling chamber is provided inside the growth platform, and the second water-cooling chamber is located directly above the annular groove of the growth platform. A circulation pipeline connected to the second water-cooling chamber is provided at the bottom end of the growth platform, and the water inlet and outlet ends of the circulation pipeline are respectively connected to the second water-cooling chamber.
[0011] Preferably, the second water-cooling chamber includes an upper water-cooling chamber and a lower water-cooling chamber, the upper water-cooling chamber is located above the lower water-cooling chamber, the water inlet end of the circulation pipeline is connected to the lower water-cooling chamber, and the water outlet end of the circulation pipeline is connected to the upper water-cooling chamber;
[0012] The upper water-cooling chamber and the lower water-cooling chamber are connected through a plurality of through holes. The inner top wall of the upper water-cooling chamber has a plurality of fin plate groups in a circular array, with gaps left between adjacent fin plate groups. The plurality of through holes are arranged around the outside of the plurality of fin plate groups.
[0013] Preferably, each group of the fin plate groups includes a plurality of arc-shaped plates, and the arc-shaped plates of the plurality of groups of the fin plate groups are coaxially arranged, with gaps being left between adjacent arc-shaped plates.
[0014] Preferably, the circulation pipeline includes a first water pipe, a second water pipe is provided on the outside of the first water pipe, a third water pipe is provided on the outside of the second water pipe, the first water pipe, the second water pipe and the third water pipe are fixedly connected to the bottom end of the growth platform, an outlet channel connected to the upper water cooling chamber is formed between the first water pipe and the second water pipe, and a water inlet channel connected to the lower water cooling chamber is formed between the second water pipe and the third water pipe.
[0015] Preferably, the sealing member is a fluororubber ring.
[0016] Preferably, the annular glass sleeve is arranged on the outside of the circulation pipeline.
[0017] Preferably, a plurality of leak detection holes connected to the reaction tank are provided at the bottom end of the reaction base, and the plurality of leak detection holes are located between the annular glass and the circulation pipeline.
[0018] Preferably, the first water-cooling chamber is arranged close to the annular groove of the reaction base, and the second water-cooling chamber is arranged close to the annular groove of the growth platform.
[0019] The technical solution provided by the utility model may have the following beneficial effects:
[0020] The heat of the annular groove of the reaction base is taken away by the first water-cooling chamber, and the heat of the annular groove of the growth table is taken away by the second water-cooling chamber, thereby reducing the temperature of the annular grooves at the upper and lower ends of the annular glass, and preventing the sealing parts in the annular grooves from being overheated and easily aging. BRIEF DESCRIPTION OF THE DRAWINGS
[0021] Figure 1 It is a schematic diagram of the overall structure of the utility model;
[0022] Figure 2 This is a schematic diagram of the internal structure of the reaction base and growth platform of the utility model;
[0023] Figure 3 This utility model Figure 2 A magnified view of area A in ;
[0024] Figure 4 It is a top view of the internal structure of the upper water-cooling chamber of the present utility model.
[0025] Among them: 1. Reaction base; 11. Reaction tank; 12. Annular groove; 13. Water inlet; 14. Water outlet; 15. Leak detection hole; 16. First water-cooling chamber; 2. Growth platform; 21. Second water-cooling chamber; 211. Upper water-cooling chamber; 212. Lower water-cooling chamber; 213. Through hole; 214. Fin plate assembly; 3. Annular glass; 31. Seal; 4. Circulation pipeline; 41. First water pipe; 42. Second water pipe; 43. Third water pipe; 44. Water outlet channel; 45. Water inlet channel. DETAILED DESCRIPTION
[0026] The following describes embodiments of the present invention in detail. Examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are intended only to explain the present invention and are not to be construed as limiting the present invention.
[0027] In the description of the present invention, it should be understood that the terms "longitudinal", "transverse", "upper", "lower", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc., indicating directions or positional relationships, are based on the directions or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific direction, be constructed and operate in a specific direction, and therefore should not be understood as limiting the present invention. In addition, features defined as "first" or "second" may explicitly or implicitly include one or more such features, and are used to distinguish between the described features, without distinction of order or importance.
[0028] In the description of this utility model, it should be noted that, unless otherwise expressly specified or limited, the terms "mounted," "connected," and "connected" should be understood in a broad sense. For example, they can refer to fixed connections, detachable connections, or integral connections; mechanical connections, electrical connections; direct connections, indirect connections through an intermediate medium, and internal communication between two components. Those skilled in the art will understand the specific meanings of the above terms in this utility model based on the specific circumstances.
[0029] Below is the attached figure Figures 1 to 4 The technical solution of the utility model is further illustrated through specific implementation methods.
[0030] like Figure 1-4 As shown, a cooling structure of a diamond reaction chamber includes a reaction base 1, a growth platform 2 and an annular glass 3;
[0031] A reaction tank 11 is provided on the top of the reaction base 1. An annular groove 12 is provided between the inner bottom wall of the reaction tank 11 and the bottom end of the growth platform 2. The upper and lower ends of the annular glass 3 are respectively embedded in the corresponding annular grooves 12. A sealing member 31 is provided between the annular glass 3 and the annular grooves 12.
[0032] A first water-cooling chamber 16 is provided inside the reaction base 1. The first water-cooling chamber 16 is located directly below the annular groove 12 of the reaction tank 11. A first water inlet 13 and a first water outlet 14 are provided at the bottom end of the reaction base 1 and communicate with the first water-cooling chamber 16.
[0033] A second water-cooling chamber 21 is provided inside the growth platform 2. The second water-cooling chamber 21 is located directly above the annular groove 12 of the growth platform 2. A circulation pipeline 4 connected to the second water-cooling chamber 21 is provided at the bottom end of the growth platform 2. The water inlet and outlet ends of the circulation pipeline 4 are respectively connected to the second water-cooling chamber 21.
[0034] The coolant enters the first water-cooling chamber 16 through the first water inlet 13 and flows out through the first water outlet 14, which can take away the heat of the reaction base 1 to reduce the temperature of the annular groove 12 of the reaction base 1, thereby cooling the seal 31 at the annular groove 12 of the reaction base 1. The coolant enters the second water-cooling chamber 21 through the water inlet end of the circulation pipeline 4 and flows out through the water outlet end of the circulation pipeline 4, which can take away the heat of the growth platform 2 to reduce the temperature of the annular groove 12 of the growth platform 2, thereby cooling the seal 31 at the annular groove 12 of the growth platform 2, so as to reduce the temperature of the seals 31 at the upper and lower ends of the annular glass 3, thereby preventing the seal 31 from being aged due to excessive temperature and affecting the sealing effect of the device.
[0035] like Figure 2-3 As shown, the second water-cooling chamber 21 includes an upper water-cooling chamber 211 and a lower water-cooling chamber 212, the upper water-cooling chamber 211 is located above the lower water-cooling chamber 212, the water inlet end of the circulation pipe 4 is connected to the lower water-cooling chamber 212, and the water outlet end of the circulation pipe 4 is connected to the upper water-cooling chamber 211;
[0036] The upper water-cooling chamber 211 and the lower water-cooling chamber 212 are connected by a plurality of through holes 213 . The inner top wall of the upper water-cooling chamber 211 has a plurality of fin plate groups 214 in a circular array, with gaps left between adjacent fin plate groups 214 . The plurality of through holes 213 are arranged around the outside of the plurality of fin plate groups 214 .
[0037] Specifically, the coolant enters the lower water cooling chamber 212 through the water inlet end of the circulation pipe 4. After the coolant fills the lower water cooling chamber 212, it enters the upper water cooling chamber 211 through several through holes 213, and then flows out from the water outlet end of the circulation pipe 4 through the gaps between several fin plate groups 214 to slow down the flow rate of the coolant in the upper water cooling chamber 211. At the same time, the contact area between the coolant and the upper cooling chamber 211 can be increased through the several fin plate groups 214, so that the coolant can fully contact the upper cooling chamber 211, thereby better taking away the heat of the growth table 2 to cool the growth table 2, and can also cool the seal 31 at the annular groove 12 of the growth table 2.
[0038] It is worth noting that since diamonds are grown on the growth table 2 , the temperature of the growth table 2 is relatively high, and therefore the coolant needs to be in full contact with the growth table 2 .
[0039] like Figure 3-4 As shown, each group of the fin plate groups 214 includes a plurality of arc-shaped plates. The arc-shaped plates of the plurality of groups of the fin plate groups 214 are coaxially arranged, and gaps are left between adjacent arc-shaped plates.
[0040] Specifically, the coolant flows in the gaps between adjacent curved plates, which allows the coolant to fully contact the curved plates, thereby increasing the contact area between the coolant and the upper water-cooling cavity 211 to achieve a better cooling effect.
[0041] like Figure 3 As shown, the circulation pipeline 4 includes a first water pipe 41, the outer part of the first water pipe 41 is provided with a second water pipe 42, the outer part of the second water pipe 42 is provided with a third water pipe 43, the first water pipe 41, the second water pipe 42 and the third water pipe 43 are fixedly connected to the bottom end of the growth platform 2, and an outlet channel 44 connected to the upper water cooling chamber 211 is formed between the first water pipe 41 and the second water pipe 42, and an inlet channel 45 connected to the lower water cooling chamber 212 is formed between the second water pipe 42 and the third water pipe 43.
[0042] Specifically, the coolant enters the lower water-cooling chamber 212 through the water inlet channel between the second water pipe 42 and the third water pipe 43. The coolant in the lower water-cooling chamber 212 enters the upper water-cooling chamber 211 through the plurality of through holes 213. The coolant in the upper water-cooling chamber 211 passes through the gaps between the plurality of fin plate groups 214 and then flows out through the water outlet channel 44 between the first water pipe 41 and the second water pipe 42, so that the coolant flows in the second water-cooling chamber 21.
[0043] like Figure 3 As shown, the sealing member 31 is a fluororubber ring.
[0044] Specifically, fluororubber rings have excellent high-temperature resistance, which can ensure their stability and reliability at high temperatures. They also have excellent aging resistance and resistance to active oxygen, and can maintain stable performance during long-term use. Therefore, they are more suitable for the high-temperature environment of diamond growth.
[0045] like Figure 3 As shown, the annular glass 3 is sleeved on the outside of the circulation pipeline 4.
[0046] Specifically, the annular glass 3 is sleeved on the outer side of the circulation pipeline 4 to prevent the vacuum environment in the reaction tank 11 from being affected when the seal between the circulation pipeline 4 and the growth platform 2 fails.
[0047] like Figure 3 As shown, a plurality of leak detection holes 15 communicating with the reaction tank 11 are provided at the bottom end of the reaction base 1 , and the plurality of leak detection holes 15 are located between the annular glass 3 and the circulation pipeline 4 .
[0048] Specifically, during use, it is necessary to detect the sealing status between the annular glass 3 and the reaction base 1 and the growth table 2. During the detection, the gas is injected into the reaction tank 11 through the leak detection hole 15. At this time, the gas is located in the inner circle of the annular glass 3 and fills the inner circle of the annular glass 3 with gas. If the gas can continue to be introduced, it proves that the seal 31 is damaged. If the gas cannot continue to be introduced, it proves that the seal is good.
[0049] like Figure 3 As shown, the first water-cooling chamber 16 is disposed close to the annular groove 12 of the reaction base 1 , and the second water-cooling chamber 21 is disposed close to the annular groove 12 of the growth platform 2 .
[0050] Specifically, the first water-cooling chamber 16 is disposed close to the annular groove 12 of the reaction base 1 , and the second water-cooling chamber 21 is disposed close to the annular groove 12 of the growth platform 2 , which can better reduce the temperature of the annular groove 12 .
[0051] The technical principles of the present invention have been described above with reference to specific embodiments. These descriptions are intended solely to illustrate the principles of the present invention and should not be construed in any way as limiting the scope of protection of the present invention. Based on the explanations herein, those skilled in the art will be able to devise other specific implementations of the present invention without inventive effort, and such implementations will fall within the scope of protection of the present invention.
Claims
1. A cooling structure for a diamond reaction chamber, characterized in that: It comprises a reaction base (1), a growth platform (2) and an annular glass (3); A reaction groove (11) is provided on the top of the reaction base (1), an annular groove (12) is provided between the inner bottom wall of the reaction groove (11) and the bottom end of the growth platform (2), the upper and lower ends of the annular glass (3) are respectively embedded in the corresponding annular groove (12), and a sealing member (31) is provided between the annular glass (3) and the annular groove (12); A first water-cooling chamber (16) is provided inside the reaction base (1), and the first water-cooling chamber (16) is located directly below the annular groove (12) of the reaction tank (11); a first water inlet (13) and a first water outlet (14) are provided at the bottom end of the reaction base (1), which are connected to the first water-cooling chamber (16); A second water-cooling chamber (21) is provided inside the growth platform (2), and the second water-cooling chamber (21) is located directly above the annular groove (12) of the growth platform (2). A circulation pipeline (4) connected to the second water-cooling chamber (21) is provided at the bottom end of the growth platform (2), and the water inlet and outlet ends of the circulation pipeline (4) are respectively connected to the second water-cooling chamber (21).
2. The cooling structure of a diamond reaction chamber according to claim 1, characterized in that: The second water-cooling chamber (21) comprises an upper water-cooling chamber (211) and a lower water-cooling chamber (212), wherein the upper water-cooling chamber (211) is located above the lower water-cooling chamber (212), the water inlet end of the circulation pipeline (4) is in communication with the lower water-cooling chamber (212), and the water outlet end of the circulation pipeline (4) is in communication with the upper water-cooling chamber (211); The upper water-cooling chamber (211) and the lower water-cooling chamber (212) are connected via a plurality of through holes (213); a plurality of fin plate groups (214) are provided in a circular array on the inner top wall of the upper water-cooling chamber (211); gaps are left between adjacent fin plate groups (214); and a plurality of through holes (213) are arranged around the outside of the plurality of fin plate groups (214).
3. The cooling structure of a diamond reaction chamber according to claim 2, characterized in that: Each group of the fin plate groups (214) includes a plurality of arc-shaped plates. The arc-shaped plates of the plurality of groups of the fin plate groups (214) are coaxially arranged, and gaps are left between adjacent arc-shaped plates.
4. The cooling structure of a diamond reaction chamber according to claim 2, characterized in that: The circulation pipeline (4) comprises a first water pipe (41), a second water pipe (42) is provided on the outside of the first water pipe (41), a third water pipe (43) is provided on the outside of the second water pipe (42), the first water pipe (41), the second water pipe (42) and the third water pipe (43) are fixedly connected to the bottom end of the growth platform (2), a water outlet channel (44) communicating with the upper water cooling chamber (211) is formed between the first water pipe (41) and the second water pipe (42), and a water inlet channel (45) communicating with the lower water cooling chamber (212) is formed between the second water pipe (42) and the third water pipe (43).
5. The cooling structure of a diamond reaction chamber according to claim 1, characterized in that: The sealing member (31) is a fluorine rubber ring.
6. The cooling structure of a diamond reaction chamber according to claim 1, characterized in that: The annular glass (3) is sleeved on the outside of the circulation pipeline (4).
7. The cooling structure of a diamond reaction chamber according to claim 1, characterized in that: The bottom end of the reaction base (1) is provided with a plurality of leak detection holes (15) connected to the reaction tank (11), and the plurality of leak detection holes (15) are located between the annular glass (3) and the circulation pipeline (4).
8. The cooling structure of a diamond reaction chamber according to claim 1, characterized in that: The first water-cooling chamber (16) is arranged close to the annular groove (12) of the reaction base (1), and the second water-cooling chamber (21) is arranged close to the annular groove (12) of the growth platform (2).
Citation Information
Patent Citations
Cooling system for diamond growth equipment
CN221324766U