Wafer cleaning liquid conveying pipeline structure
By introducing a second discharge pipeline and a normally open valve into the wafer cleaning liquid delivery pipeline, the problem of oxygen produced by ozone liquid decomposition affecting spraying operations is solved, and precise flow control and equipment reliability are achieved.
Patent Information
- Application Number
- CN202422486727.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-10-15
- Publication Date
- 2025-08-29
- Estimated Expiration
- 2034-10-15
AI Technical Summary
Ozone liquid is blocked before the spraying operation begins and is easily decomposed before the normally closed suction valve to produce oxygen, affecting the nozzle's suction effect and leading to the risk of dropping.
The second discharge pipeline and a normally open valve are introduced into the liquid supply pipeline, through which ozone liquid is discharged before the spraying operation, to prevent the ozone liquid from being blocked by the normally closed suction valve, prevent the generation of oxygen, and ensure the suction effect.
It effectively avoids the impact of oxygen production on the suction effect, ensures accurate flow control of spraying operations, prevents liquid dropping, and improves the reliability of the equipment.
Smart Images
Figure CN223282910U_ABST
Abstract
Description
Technical Field
[0001] The utility model belongs to the technical field of semiconductor cleaning, and in particular relates to a wafer cleaning liquid delivery pipeline structure. Background Art
[0002] If wafers are contaminated by dust particles or metal during the manufacturing process, it can easily damage the chip's internal circuitry, causing short circuits or open circuits, leading to integrated circuit failure. Therefore, in addition to eliminating external contamination sources, wafers must be cleaned using wafer spray equipment before processes such as high-temperature diffusion and ion implantation. During wafer cleaning, a cleaning agent is sprayed onto the wafer through a nozzle.
[0003] For the pipeline that transports ozone liquid to the nozzle, before the spraying operation begins, the ozone liquid will be blocked in front of a normally closed back-suction valve. Since ozone is easily decomposed, oxygen will be generated in the blocked ozone liquid. After the spraying operation is completed, the generated oxygen will reduce the back-suction effect of the back-suction valve, resulting in the risk of dripping from the nozzle. Utility Model Content
[0004] Based on this, in order to solve the above technical problems, a wafer cleaning solution delivery pipeline structure is provided.
[0005] In order to solve the above technical problems, the present invention adopts the following technical solutions:
[0006] A wafer cleaning liquid delivery pipeline structure includes a main circulation pipeline connected to an ozone generator, a flow controller and a normally closed back-suction valve, the main circulation pipeline is connected to a first discharge pipeline, and is connected to the front end of a liquid supply pipeline through a first three-way joint, the rear end of the liquid supply pipeline is connected to a nozzle, the flow controller and the normally closed back-suction valve are arranged on the liquid supply pipeline in sequence, and is characterized in that it also includes a second discharge pipeline, the second discharge pipeline is connected to the liquid supply pipeline through a second three-way joint, the second three-way joint is located before the normally closed back-suction valve, and a normally open valve is provided on the second discharge pipeline.
[0007] The utility model provides a wafer cleaning liquid delivery pipeline structure, which can discharge ozone liquid through a second discharge pipeline before the spraying operation begins, thereby preventing the liquid from being blocked by a normally closed back-suction valve and generating oxygen that affects the back-suction effect. BRIEF DESCRIPTION OF THE DRAWINGS
[0008] Figure 1 It is a structural diagram of the present utility model. DETAILED DESCRIPTION
[0009] The following will illustrate the implementation of the present utility model in conjunction with the drawings in the specification. It should be noted that the implementation methods involved in this specification are not exhaustive and do not represent the only implementation methods of the present utility model. The following corresponding embodiments are only for the purpose of clearly illustrating the utility model content of the utility model patent and are not intended to limit its implementation methods. For ordinary technicians in this field, different forms of changes and modifications can be made on the basis of the description of this embodiment. All obvious changes or modifications that belong to the technical concept and utility model content of the present utility model are also within the scope of protection of the present utility model.
[0010] like Figure 1 As shown, an embodiment of the present application provides a wafer cleaning liquid delivery pipeline structure, including a main circulation pipeline 11, a first discharge pipeline 12, a first three-way joint 13, a liquid supply pipeline 14, a flow controller 15, a normally closed back suction valve 16, a second three-way joint 17, a second discharge pipeline 18 and a normally open valve 19.
[0011] The main circulation pipeline 11 is connected to the ozone generator 2 and the first discharge pipeline 12 , and is connected to the front end of the liquid supply pipeline 14 through a first three-way joint 13 .
[0012] The rear end of the liquid supply pipe 14 is connected to the nozzle 3 .
[0013] The flow controller 15 and the normally closed back-suction valve 16 are sequentially arranged one after the other on the liquid supply pipeline 14 .
[0014] The second discharge pipeline 18 is connected to the liquid supply pipeline 14 through a second three-way joint 17 . The second three-way joint 17 is located before the normally closed back-suction valve 16 . A normally open valve 19 is provided on the second discharge pipeline 18 .
[0015] In this embodiment, in order to enable the flow controller 15 to accurately control the flow, the second three-way joint 17 is located between the flow controller 15 and the normally closed back-suction valve 16 .
[0016] The flow controller 15, the normally closed back-suction valve 16 and the normally open valve 19 are all pneumatic.
[0017] The working principle of the embodiment of this application is as follows:
[0018] The ozone liquid generated by the ozone generator 2 enters the main circulation pipeline 11. When the pressure in the main circulation pipeline 11 meets the requirements (the rear-end pressure is stabilized by the constant pressure valve between the ozone generator 2 and the main circulation pipeline 11), the ozone liquid will enter the liquid supply pipeline 14. Since ozone is easily decomposed to produce oxygen, in order to prevent oxygen from entering the liquid supply pipeline 14, it is necessary to continuously discharge the old ozone liquid through the first discharge pipeline 12 so that new ozone liquid can continuously enter the main circulation pipeline 11 from the ozone generator 2.
[0019] Similarly, after the ozone liquid enters the liquid supply line 14 and before the spraying operation begins, the ozone liquid is first discharged from the second discharge line 18. This prevents the ozone liquid from being blocked by the normally closed back-suction valve 16 and generating oxygen that could affect the back-suction effect. This also prevents bubbles from affecting the ultrasonic flowmeter, allowing it to accurately control the flow rate. When the spraying operation begins, the normally closed back-suction valve 16 opens, and the normally open valve 19 on the second discharge line 18 closes, allowing the ozone liquid to flow through the normally closed back-suction valve 16 to the nozzle 3.
[0020] The flow rate of the liquid medicine discharged or supplied to the nozzle 3 is controlled by the flow controller 15 .
[0021] After a spraying operation is started and finished, the normally closed back-suction valve 16 back-sucks the liquid and then closes, and at the same time, the normally open valve 19 opens.
[0022] From the above, it can be seen that the wafer cleaning liquid delivery pipeline structure provided in the embodiment of the present application can discharge the ozone liquid through the second discharge pipeline before the spraying operation begins, so as to avoid the liquid being blocked by the normally closed back-suction valve and generating oxygen that affects the back-suction effect. At the same time, it can prevent bubbles from affecting the ultrasonic flowmeter, so that it can accurately control the flow rate.
[0023] Obviously, those skilled in the art should realize that the above embodiments are only used to illustrate the present invention and are not used to limit the present invention. As long as they are within the spirit of the present invention, any changes or modifications to the above embodiments will fall within the scope of the claims of the present invention.
Claims
1. A wafer cleaning liquid delivery pipeline structure, comprising a main circulation pipeline connected to an ozone generator, a flow controller, and a normally closed back-sucking valve, wherein the main circulation pipeline is connected to a first discharge pipeline and is connected to the front end of a liquid supply pipeline via a first three-way joint, the rear end of the liquid supply pipeline is connected to a nozzle, and the flow controller and the normally closed back-sucking valve are sequentially arranged on the liquid supply pipeline, characterized in that: It also includes a second discharge pipeline, which is connected to the liquid supply pipeline through a second three-way joint. The second three-way joint is located before the normally closed back-suction valve, and a normally open valve is provided on the second discharge pipeline.
2. A wafer cleaning liquid delivery pipeline structure according to claim 1, characterized in that: The flow controller is a pneumatic flow controller.
3. The wafer cleaning liquid delivery pipeline structure according to claim 1, characterized in that: The normally closed back-suction valve is a pneumatic normally closed back-suction valve.
4. The wafer cleaning liquid delivery pipeline structure according to claim 1, characterized in that: The normally open valve is a pneumatic normally open valve.
5. The wafer cleaning liquid delivery pipeline structure according to claim 1, characterized in that: The second three-way joint is located between the flow controller and the normally closed back-suction valve.