Furnace belt for sintering furnace and sintering furnace

Abstract

The utility model provides a furnace belt used for a sintering furnace, the furnace belt (10) comprises a furnace belt main body (1), the furnace belt main body has a length direction (L) extending along a transmission direction of a silicon wafer (2) and a width direction (W) transverse to the length direction; the plurality of groups of brackets are used for supporting silicon wafers, the plurality of groups of brackets are fixedly connected to the furnace belt main body (1) at intervals along the length direction, and each group of brackets comprises two brackets (3) which are oppositely arranged at intervals along the width direction; wherein the support (3) comprises a first support arm (31) and a second support arm (32) extending from the first support arm, the second support arm is configured to be provided with at least two platform parts for supporting silicon wafers, and the first support arm and the second support arm are directly connected to the furnace belt main body; each bracket is arranged such that the second arm is closer to the center (P) of the furnace zone body in the width direction than the first arm. The utility model further provides a sintering furnace comprising the furnace belt.

Description

Technical Field

[0001] The utility model relates to the technical field of photovoltaics, in particular to a furnace belt for a sintering furnace and a sintering furnace comprising the furnace belt. Background Art

[0002] After screen printing, silicon solar cells need to be sintered in a sintering furnace. This sintering process affects the cell efficiency of the silicon wafer. The configuration of the conveyor belt also has a certain impact during the sintering process. The silicon wafer should be kept horizontal during conveyance to improve the uniformity of the silicon wafer's heat distribution and reduce the microscopic performance impact caused by the silicon wafer tilting.

[0003] Currently, metal supports are commonly used on the belt of a sintering furnace to support silicon wafers. However, existing belt supports often lack a platform structure or only have a small platform structure, which is not conducive to maintaining horizontal transportation of silicon wafers. This affects the uniformity of silicon wafer heating and affects the microscopic properties of the silicon wafers.

[0004] Furthermore, the inclination angle of the furnace belt support in the prior art is relatively small, and it can only play a supporting role, which is not conducive to driving the silicon wafers placed in a non-planar manner to reach a horizontal state through the action of gravity. Summary of the Invention

[0005] The purpose of the present invention is to solve one or more aspects of the above-mentioned problems and other problems, and to provide a furnace belt for a sintering furnace, wherein the metal support of the furnace belt is provided with a platform structure so that the silicon wafers can be transported smoothly and horizontally during the conveying process.

[0006] To this end, the present invention provides a furnace belt for a sintering furnace, the furnace belt comprising: a furnace belt main body, the furnace belt main body having a length direction extending along the transmission direction of silicon wafers and a width direction transverse to the length direction; and a plurality of groups of supports for supporting the silicon wafers, the plurality of groups of supports being fixedly connected to the furnace belt main body at intervals along the length direction, each group of supports comprising two supports arranged oppositely and at intervals along the width direction; wherein the supports comprise a first support arm and a second support arm extending from the first support arm, the second support arm being configured to have at least two platform portions for supporting the silicon wafers, and the first support arm and the second arm being directly connected to the furnace belt main body, and each of the supports being arranged so that the second support arm is closer to the center of the furnace belt main body in the width direction than the first arm.

[0007] In the present invention, since at least one platform portion is provided on each bracket, and each group of two brackets are arranged relative to each other, the silicon wafers to be sintered are placed horizontally on the relatively arranged platform portions, so that the silicon wafers can be transported smoothly and horizontally during the transmission process, thereby improving the heating uniformity of the silicon wafers and reducing the impact of the microscopic performance caused by the tilt of the silicon wafers.

[0008] According to a preferred embodiment of the present invention, the first arm of the bracket has a first connecting end and a second end opposite to the first connecting end, the second arm extends from the second end and has a second connecting end, the first connecting end and the second connecting end are both fixedly connected to the furnace belt body, and the bracket is arranged so that the second connecting end is closer to the center along the width direction than the first connecting end.

[0009] In a preferred embodiment of the present invention, the second arm includes a first section, a first inclined section, a first horizontal section, a second inclined section, a second horizontal section and a second section from the first connection end to the second connection end, wherein the first horizontal section and the second horizontal section respectively constitute a first platform portion and a second platform portion for supporting the silicon wafer, wherein the second platform portion is closer to the second connection end than the first platform portion.

[0010] In a preferred embodiment, the first inclined section may have an inclination angle α relative to the first horizontal section of 45° to 90°, preferably 60° to 80°, for example 75°. The second inclined section may have an inclination angle β relative to the second horizontal section of 45° to 90°, preferably 60° to 80°, for example 75°. More preferably, the inclination angle α is equal to the inclination angle β. Because the slope angle formed by the first and second inclined sections is relatively large, after a silicon wafer is placed in the area above the platform, it can slide freely from the slope to the platform area.

[0011] In one embodiment of the present invention, the first arm is perpendicular to the furnace belt body, the first section can be a horizontal section, and the second section can be a vertical section. As mentioned, both the first section and the second section can be inclined relative to the horizontal plane, which is also within the scope of this application.

[0012] According to a preferred embodiment of the present invention, the width of the first and second horizontal sections is 8 mm to 12 mm, preferably 10 mm. This selection of the dimensions of the first and second horizontal sections provides a larger platform, thereby providing more stable support for the silicon wafer. However, it should be understood that the above dimensions are merely preferred and can be modified according to specific needs, which is also within the scope of this application.

[0013] In a preferred embodiment, the stent may be a single piece made of a metal wire having a diameter of 2 mm to 3 mm.

[0014] In one solution of the present invention, the furnace belt body is constructed in the form of a metal mesh belt, the first connecting end and the second connecting end are both provided with hook portions, and the bracket is fixedly connected to the metal mesh belt through the hook portions.

[0015] The utility model also provides a sintering furnace, which comprises the furnace belt.

[0016] The furnace belt used in the sintering furnace according to the present invention allows silicon wafers to be transported horizontally during sintering, facilitating uniform heating. During high-temperature sintering, the various components of the slurry on the silicon wafers do not flow due to the non-horizontal placement of the silicon wafers, preventing changes in component distribution and thus affecting microscopic properties. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] The accompanying drawings, which constitute part of this application, are intended to provide a further understanding of the present invention. The exemplary embodiments of the present invention and their descriptions are intended to explain the present invention and do not constitute an improper limitation of the present invention. In the accompanying drawings:

[0018] Figure 1 A schematic structural diagram of an embodiment of a furnace belt for a sintering furnace according to the present invention is shown;

[0019] Figure 2 This is a schematic diagram of a group of supports arranged on the furnace belt body as viewed along the transport direction of the silicon wafer;

[0020] Figure 3a A schematic structural diagram of an embodiment of a bracket according to the present utility model is shown;

[0021] Figure 3b shows a structural schematic diagram of another embodiment of the bracket according to the present utility model; and

[0022] Figure 4 A top view of a plurality of bracket groups arranged on a furnace belt body is shown, wherein the furnace belt body is in the form of a mesh belt.

[0023] The accompanying drawings are merely schematic and are not necessarily drawn to scale. They show only those parts necessary to illustrate the present invention, while other parts may be omitted or only briefly mentioned. In addition to the components shown in the accompanying drawings, the present invention may also include other components. DETAILED DESCRIPTION

[0024] A manual powder grinding press according to an exemplary embodiment of the present invention is described below with reference to the accompanying drawings. In the following description, many specific details are set forth to enable a person skilled in the art to have a more comprehensive understanding of the present invention. However, it is obvious to a person skilled in the art that the present invention may be implemented without some of these specific details. In addition, it should be understood that the present invention is not limited to the specific embodiments described. On the contrary, it is contemplated that the present invention may be implemented with any combination of the following features and elements, regardless of whether they relate to different embodiments. Therefore, the following features, embodiments, and advantages are for illustrative purposes only and should not be regarded as elements or limitations of the claims unless expressly set forth in the claims.

[0025] Figure 1 The structure of a furnace belt 10 for a sintering furnace is shown. The sintering furnace is used to sinter solar cell silicon wafers 2. The furnace belt 10 includes a furnace belt body 1 extending along the conveying direction of the silicon wafers 2. The furnace belt body defines a length direction L along the conveying direction and a width direction W transverse to the length direction (see FIG. Figure 2 The furnace belt 10 further includes a plurality of brackets 3 for supporting the silicon wafers 2 . The plurality of brackets are fixedly connected to the furnace belt body 1 at intervals along the length direction L, especially at equal intervals.

[0026] See especially Figure 2 Each group of brackets includes two brackets 3, which are arranged on the belt body 1 in a spaced-apart arrangement relative to each other along the width direction. As can be seen from the figure, each group of two brackets is symmetrically arranged about the center of the belt body's width. Each bracket 3 includes a first arm 31 and a second arm 32 connected to or integral with the first arm. The second arm 32 is configured to have two platform portions suitable for supporting the silicon wafer 2. The brackets 3 are arranged on the belt body 1 so that the second arm 32 is closer to the center P of the belt body along the width direction than the first arm 31. In this context, "close to the center of the belt body 1 along the width direction" can also be understood as "close to the center line of the belt body along its length." In the above embodiment, both the first arm 31 and the second arm 32 of the bracket 3 are directly connected to the belt body 1.

[0027] In this embodiment, it is advantageous to have two platforms on the brackets 3. Currently, two main types of silicon wafers are used: 182mm*183mm and 210mm*210mm. By providing two platforms on each bracket, the furnace belt can support wafers of two different sizes. Furthermore, the spacing between each pair of brackets can be adjusted based on the specific wafer size.

[0028] See also Figure 3aAccording to one embodiment of the present invention, the first arm 31 of the bracket 3 is configured perpendicular to the plane of the belt main body 1 and has a first connecting end 311 and an opposite second end 312. The first connecting end 311 is a free end. The second end 312 is connected to the second arm 32, extending from the second end to the second connecting end 322. The bracket 3 is fixedly connected to the belt main body 1 via the first and second connecting ends. The bracket 3 is arranged such that the second connecting end 322 is closer to the width center P than the first connecting end 311. It should be understood that the first arm 31 may also be inclined, which is also within the scope of this application.

[0029] In a preferred embodiment, see again Figure 3a The second arm 32 is constructed to include, from the first connecting end 311 to the second connecting end 322, a first section 32a, a first inclined section 32b, a first horizontal section 32c, a second inclined section 32d, a second horizontal section 32e, and a second section 32f. The first horizontal section 32c and the second horizontal section 32e respectively constitute a first platform portion and a second platform portion for supporting the silicon wafer, with the second platform portion being closer to the second connecting end 322 than the first platform portion. In one embodiment, the first and second horizontal sections have a width W dimension of 8 mm to 12 mm, preferably 10 mm, forming a larger platform portion to more stably support the silicon wafer and ensure horizontal transport of the silicon wafer on the furnace belt 10. In the illustrated embodiment, the first section 32a is a horizontal section, extending perpendicular to the first arm 31, and the second section 32f is a vertical section, extending perpendicular to the plane of the furnace belt body 1. However, it should be understood that the first section 32a may also be an inclined section, and the second section 32f may also be an inclined section, which are also encompassed within the scope of the present application.

[0030] In a preferred embodiment, to efficiently ensure the placement of silicon wafers on the corresponding metal support platform, the first and second inclined sections are configured to have a large inclination angle relative to the horizontal plane. Specifically, the inclination angle α of the first inclined section 32d relative to the first horizontal section 32c can be 45° to 90°, preferably 60° to 80°, and more preferably 75°; the inclination angle β of the second inclined section 32d relative to the second horizontal section 32e can be 45° to 90°, preferably 60° to 80°, and more preferably 75°. In a preferred embodiment, the inclination angle α is equal to the inclination angle β. This configuration allows the silicon wafer to slide freely along the slope formed by the first and second inclined sections onto the platform, ensuring the wafer remains horizontal during sintering.

[0031] In one embodiment, the support 3 can be a single piece made of a metal wire with a diameter of 2 mm to 3 mm. Figure 4 The furnace belt body 1 is constructed in the form of a metal mesh belt. In order to more conveniently connect the metal bracket to the furnace belt body 1, the first connecting end 311 and the second connecting end 322 of the bracket 3 are both hook-shaped (see Figure 3b ), the bracket 3 is fixedly connected to the metal mesh belt by the hook portion. It should be understood that the bracket can also be made of metal sheets or other suitable materials, which are also included in the scope of this application.

[0032] According to one embodiment of the present invention, a sintering furnace is provided, comprising the aforementioned furnace belt 10. This sintering furnace, equipped with the aforementioned furnace belt, allows silicon wafers to be transported horizontally during sintering, facilitating uniform heating. Furthermore, during high-temperature sintering, the various components of the slurry on the silicon wafers do not flow due to the non-horizontal placement of the silicon wafers, preventing changes in component distribution and thus affecting microscopic properties.

[0033] Although the present invention has been disclosed above with reference to preferred embodiments, the present invention is not limited thereto. Any changes and modifications made by those skilled in the art without departing from the spirit and scope of the present invention should be included within the scope of protection of the present invention. Therefore, the scope of protection of the present invention should be based on the scope defined by the claims.

Claims

1. A furnace belt for a sintering furnace, characterized in that: The furnace belt (10) comprises: a furnace belt body (1) having a length direction (L) extending along a conveying direction of the silicon wafer (2) and a width direction (W) transverse to the length direction; and a plurality of bracket groups for supporting the silicon wafers, the plurality of bracket groups being fixedly connected to the furnace belt body (1) at intervals along the length direction, each bracket group comprising two brackets (3) arranged opposite to each other at intervals along the width direction; The support (3) comprises a first support arm (31) and a second support arm (32) extending from the first support arm, the second support arm being configured to have at least two platform portions for supporting the silicon wafer, and the first support arm and the second support arm being directly connected to the furnace belt body, and each of the supports being arranged such that the second support arm is closer to the center (P) of the furnace belt body in the width direction than the first arm.

2. The furnace belt according to claim 1, characterized in that The first arm (31) of the bracket (3) has a first connecting end (311) and an opposite second end (312), the second arm (32) extends from the second end and has a second connecting end (322), the first connecting end and the second connecting end are fixedly connected to the furnace belt body, and the bracket is arranged so that the second connecting end (322) is closer to the center (P) in the width direction than the first connecting end (311).

3. The furnace belt according to claim 2, characterized in that The second arm (32) includes, from the first connecting end (311) to the second connecting end (322), a first section (32a), a first inclined section (32b), a first horizontal section (32c), a second inclined section (32d), a second horizontal section (32e) and a second section (32f), wherein the first horizontal section (32c) and the second horizontal section (32e) respectively constitute a first platform portion and a second platform portion for supporting the silicon wafer, wherein the second platform portion is closer to the second connecting end (322) than the first platform portion.

4. The furnace belt according to claim 3, characterized in that An inclination angle α of the first inclined section relative to the first horizontal section is 45° to 90°, and an inclination angle β of the second inclined section relative to the second horizontal section is 45° to 90°.

5. The furnace belt according to claim 4, characterized in that The inclination angle α is equal to the inclination angle β and both are 60° to 80°.

6. The furnace belt according to any one of claims 3 to 5, characterized in that The first support arm (31) is perpendicular to the furnace belt body, the first section (32a) of the second support arm is a horizontal section perpendicular to the first support arm, and the second section (32f) is a vertical section.

7. The furnace belt according to any one of claims 3 to 5, characterized in that The dimensions of the first horizontal section and the second horizontal section along the width direction are 8 mm to 12 mm.

8. The furnace belt according to any one of claims 1 to 5, characterized in that The bracket (3) is an integral piece made of metal wire with a diameter of 2 mm to 3 mm.

9. The furnace belt according to any one of claims 2 to 5, characterized in that The furnace belt body (1) is constructed in the form of a metal mesh belt, the first connecting end (311) and the second connecting end (322) are both provided with hook-shaped parts, and the bracket (3) is fixedly connected to the metal mesh belt via the hook-shaped parts.

10. A sintering furnace, characterized in that: The sintering furnace comprises a furnace belt (10) according to any one of claims 1 to 9.

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