Rotary silicon wafer cleaning basket

By designing a rotary silicon wafer cleaning basket, the silicon wafer is rotated in the sink by using conical gear transmission, the problem of poor contact between the silicon wafer and ultrasonic waves is solved, the cleaning efficiency is improved and the drive motor is protected.

CN223308961UActive Publication Date: 2025-09-05CHANGZHOU DAHENG PLASTIC PROD CO LTD
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Patent Information

Application Number
CN202422673048.0
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-11-04
Publication Date
2025-09-05
Estimated Expiration
2034-11-04

AI Technical Summary

Technical Problem

In the prior art, the fixation of the silicon wafer in the sink leads to poor contact with the ultrasonic waves in part of the position, which affects the cleaning efficiency.

Method used

The rotary silicon wafer cleaning basket is designed, and the driving motor is driven by the rotating connection at both ends of the basket is placed with a bevel gear transmission, so that the silicon wafer rotates in the sink, ensuring that all positions can be in effective contact with ultrasonic waves, and the driving motor is set above the water surface to prevent water splashing.

Benefits of technology

It improves the cleaning efficiency of the silicon wafer, prevents the driving motor from being affected by water splash, and achieves a more comprehensive cleaning effect.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model relates to the technical field of silicon wafer cleaning, in particular to a rotary silicon wafer cleaning flower basket which comprises a placing basket, the placing basket is a box body with two ends and the top open, a plurality of open grooves which are arranged at intervals are formed in the side face of the placing basket, a plurality of limiting plates which are in an L shape with bent end portions and are arranged at intervals are arranged in the placing basket, and the limiting plates are arranged in the placing basket. The limiting plates are vertically fixed along the inner wall of the placing basket, so that a gap for placing a silicon wafer is formed between every two adjacent limiting plates; supporting frames are installed at the two ends of the containing basket, connecting frames are arranged on the outer sides of the supporting frames, and the connecting frames are rotationally connected with the containing basket through rotating shafts. When the rotary silicon wafer cleaning flower basket is used, the placing basket can rotate in the water tank through the rotary connection of the two ends of the placing basket, so that the position of a silicon wafer in the water tank can be converted, each position of the silicon wafer can be in better contact with ultrasonic waves, and the cleaning efficiency of the silicon wafer is improved.
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Description

Technical Field

[0001] The utility model relates to the technical field of silicon wafer cleaning, in particular to a rotary silicon wafer cleaning basket. Background Art

[0002] Silicon wafers are thin slices made of high-purity crystalline silicon. They are an important component of semiconductor materials and are widely used in the electronics industry. Silicon wafers, also known as silicon wafers, are made by melting high-purity polycrystalline silicon and pulling out single-crystal silicon rods, which are then cut, ground, and polished.

[0003] After silicon wafers are cut, ground, and polished, they need to be cleaned to remove processing waste attached to their surfaces. Conventional silicon wafer cleaning involves placing the wafers in a cleaning basket, which is then placed in a sink. An ultrasonic motor generates ultrasonic waves in the water, causing the water to experience cavitation, acceleration, and straight-through flow. These effects act together on the water and dirt, dispersing, emulsifying, and peeling off the dirt layer, thereby achieving the purpose of cleaning. However, since the silicon wafers are fixed in the sink, the contact position between the silicon wafers and the ultrasonic waves during propagation in the water is fixed. Some wafers are far away from the ultrasonic motor, especially those close to the water surface. The ultrasonic waves may be consumed during propagation in the water, resulting in a reduced effect, affecting the cleaning efficiency of the silicon wafers. Utility Model Content

[0004] The purpose of the utility model is to solve the above-mentioned shortcomings in the prior art and to propose a rotary silicon wafer cleaning basket.

[0005] To achieve the above-mentioned object, the present invention adopts the following technical solution: a rotary silicon wafer cleaning basket is designed, comprising a placement basket, which is a box body with two ends and a top opening, a plurality of slots arranged at intervals on the sides of the placement basket, and a plurality of limit plates with "L"-shaped ends bent and arranged at intervals are arranged in the placement basket. The limit plates are vertically fixed along the inner wall of the placement basket, so that there is a gap between two adjacent limit plates for placing silicon wafers;

[0006] Support frames are installed at both ends of the placement basket, and connecting frames are provided on the outside of the support frames. The connecting frames are rotatably connected to the placement basket through a rotating shaft, and a box shell is also provided on the outside of one of the connecting frames, and a fixing frame is provided on the outside of the box shell and the outside of the other connecting frame;

[0007] A transmission shaft is provided in the box shell, and a fixed seat is rotatably installed on the transmission shaft, and the fixed seat is fixed to the inner wall of the box shell. A second bevel gear and a third bevel gear are coaxially installed at both ends of the transmission shaft, and a fourth bevel gear is engaged with the side of the third bevel gear. The fourth bevel gear is coaxially fixed on the rotating shaft, and the first bevel gear is engaged with the side of the second bevel gear. A driving shaft is coaxially installed on the first bevel gear, one end of the driving shaft is rotatably installed on the connecting frame, and the other end of the driving shaft passes through the casing and is connected to the driving motor.

[0008] Preferably, the front projection of the limiting plate and the slots are arranged alternately.

[0009] Preferably, the support frame is connected by a plurality of cross-arranged support rods, and the ends of the support rods are fixed to the placement basket, and the ends of the rotating shafts are fixed to the support rods.

[0010] Preferably, a lifting handle is provided above the placement basket, and the end of the lifting handle is fixed to the top of the connecting frame.

[0011] Preferably, fixing plates with ends bent into an L-shape are hinged on both sides of the top of the placement basket, and the ends of the two fixing plates are connected by a lock.

[0012] Preferably, an elastic buffer pad is installed on a side of the fixing plate close to the placement basket.

[0013] Preferably, the fixing frame includes a connecting plate with an L-shaped top, the top of the connecting plate is fixed to the corresponding box shell and the connecting frame, a locking bolt is threadedly connected to the connecting plate, and a pressure plate is vertically installed at the inner end of the locking bolt close to the connecting plate, and an elastic rubber pad is installed on the end of the pressure plate away from the locking bolt.

[0014] Preferably, the driving motor is placed in a casing, and the casing is fixed to the box shell, and a ventilation hole is opened on the side of the casing.

[0015] The design scheme proposed by the utility model has the following beneficial effects during application:

[0016] 1. The rotary silicon wafer cleaning basket is connected by rotating at both ends of the basket. After the connecting frame is fixed in the water tank, the driving motor can drive the basket to rotate under the transmission of the bevel gear. In this way, the position of the silicon wafer in the water tank can be converted, so that each position of the silicon wafer can have better contact with the ultrasonic wave, thereby improving the cleaning efficiency of the silicon wafer.

[0017] 2. The rotary silicon wafer cleaning basket is equipped with a transmission shaft, which allows the drive motor to be placed above the water surface and away from the water tank. This ensures that the basket rotates while protecting the drive motor to prevent water in the water tank from splashing onto the drive motor due to the rotation of the basket, thereby affecting the drive motor. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 This is a schematic diagram of the structure of the utility model Figure 1 ;

[0019] Figure 2 This is a schematic diagram of the structure of the utility model Figure 2 ;

[0020] Figure 3 It is a top view of the utility model;

[0021] Figure 4 This is a diagram showing the internal structure of the box shell of the present utility model.

[0022] In the figure: 1. Placement basket; 2. Slot; 3. Limiting plate; 4. Support frame; 5. Connecting frame; 6. Box shell; 7. Casing; 8. Ventilation hole; 9. Drive motor; 10. Drive shaft; 11. First bevel gear; 12. Second bevel gear; 13. Transmission shaft; 14. Fixed seat; 15. Third bevel gear; 16. Fourth bevel gear; 17. Rotating shaft; 18. Lifting handle; 19. Fixing plate; 20. Buffer pad; 21. Connecting plate; 22. Pressing plate; 23. Locking bolt. DETAILED DESCRIPTION

[0023] The technical solutions in the embodiments of the present invention will be described clearly and completely below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, rather than all the embodiments.

[0024] Reference Figures 1-4 A rotary silicon wafer cleaning basket includes a placement basket 1. The placement basket 1 is a box with openings at both ends and the top. A number of slots 2 are arranged at intervals on the sides of the placement basket 1, and a plurality of limit plates 3 with L-shaped ends bent and arranged at intervals are provided in the placement basket 1. The limit plates 3 are vertically fixed along the inner wall of the placement basket 1, so that there is a gap between two adjacent limit plates 3 for placing silicon wafers. When in use, the silicon wafers to be cleaned are placed between the limit plates 3 to place the silicon wafers. The slots 2 and the openings at both ends of the placement basket 1 ensure that after the placement basket 1 is in the water tank, the water in the water tank can flow freely around the silicon wafers and clean the silicon wafers.

[0025] In order to ensure the stability of the silicon wafers in the placement basket 1, the front projection of the limiting plate 3 and the slot 2 are arranged alternately, which can avoid the setting of the slot 2 affecting the placement of the silicon wafers.

[0026] It should be noted that if Figure 1 As shown, fixed plates 19 with ends bent into an L-shape are hinged on both sides of the top of the placement basket 1, and the ends of the two fixed plates 19 are connected by a lock. In actual use, after the fixed plates 19 are relatively closed, the distance between the middle parts of the two fixed plates 19 is smaller than the diameter of the silicon wafer. Therefore, after the silicon wafer to be cleaned is placed in the placement basket 1, the fixed plates 19 on both sides can be closed and connected and fixed by the lock, thereby preventing the silicon wafer from falling out of the placement basket 1 after the placement basket 1 is turned over.

[0027] Furthermore, an elastic buffer pad 20 is installed on the side of the fixing plate 19 close to the placement basket 1. After the fixing plate 19 is closed on the placement basket 1, the buffer pad 20 can be pressed on the top of the silicon wafer placed in the placement basket 1, thereby enhancing the stability of the silicon wafer in the placement basket 1.

[0028] like Figure 1 and Figure 4 As shown, support frames 4 are installed at both ends of the placement basket 1, and a connecting frame 5 is provided on the outside of the support frame 4. The connecting frame 5 is rotatably connected to the placement basket 1 through a rotating shaft 17, so that the placement basket 1 has the ability to rotate, that is, after the placement basket 1 is placed in the water tank, the placement basket 1 can be rotated in the water, and a box shell 6 is further provided on the outside of one of the connecting frames 5. A fixing frame is provided on the outside of the box shell 6 and on the outside of the other connecting frame 5. When in use, the fixing frame can be used to fix the placement basket 1 placed in the water tank;

[0029] Among them, the fixing frame includes a connecting plate 21 with an "L"-shaped top bent. The top of the connecting plate 21 is fixed to the corresponding box shell 6 and the connecting frame 5. A locking bolt 23 is threadedly connected to the connecting plate 21, and a pressure plate 22 is vertically installed at the inner end of the locking bolt 23 close to the connecting plate 21, and an elastic rubber pad is installed on the end of the pressure plate 22 away from the locking bolt 23. After the placement basket 1 is placed in the sink, the connecting plate 21 can be placed on the upper edge of the sink, and then the locking bolt 23 can be turned to press the pressure plate 22 against the outer wall of the sink, thereby fixing the placement basket 1 and making the placement basket 1 more stable when rotating.

[0030] like Figure 4As shown, a transmission shaft 13 is provided in the box shell 6, and a fixing seat 14 is rotatably installed on the transmission shaft 13. The fixing seat 14 is fixed to the inner wall of the box shell 6. A second bevel gear 12 and a third bevel gear 15 are coaxially installed at both ends of the transmission shaft 13. The side of the third bevel gear 15 is meshed with a fourth bevel gear 16, and the fourth bevel gear 16 is coaxially fixed on the rotating shaft 17. The side of the second bevel gear 12 is meshed with a first bevel gear 11, and a driving shaft 10 is coaxially installed on the first bevel gear 11. One end of the driving shaft 10 is rotatably installed on the connecting frame 5, and the other end of the driving shaft 10 passes through the casing 7 and is connected to the driving motor 9. Under the transmission of the bevel gear, the driving motor 9 provides power for the rotation of the placement basket 1; and the setting of the transmission shaft 13 allows the driving motor 9 to be set away from the water tank, so as to prevent water splashed by the rotation of the placement basket 1 from falling on the driving motor 9 and affecting the driving motor 9.

[0031] Furthermore, the driving motor 9 is placed in the casing 7, and the casing 7 is fixed to the box shell 6, and a ventilation hole 8 is opened on the side of the casing 7 to protect the driving motor 9 and dissipate heat for the driving motor 9 through the ventilation hole 8.

[0032] It should be noted that the support frame 4 is connected by several cross-arranged support rods, and the ends of the support rods are fixed to the placement basket 1, and the ends of the rotating shaft 17 are fixed to the support rods, so that the support frame 4 is hollowed out and does not hinder the flow of water in the placement basket 1.

[0033] The lifting handle 18 is fixed to the top of the connecting frame 5, and the lifting handle 18 is used to place the placing basket 1 in the water tank or take it out from the water tank, which is convenient for taking the placing basket 1 in and out of the water tank. That is, when in use, the silicon wafers to be cleaned are first placed between the limit plates 3 and the fixing plates 19 are closed to fix them. Then, the lifting handle 18 is used to place the placing basket 1 in the water tank for cleaning. At this time, the "L"-shaped connecting plate 21 will be placed on the upper edge of the water tank. Then, the locking bolt 23 is tightened to press the pressure plate 22 on the outer wall of the water tank to stabilize the placing basket 1. Finally, the driving motor 9 is turned on to allow the placing basket 1 to rotate in the water tank, so that the ultrasonic wave in the water tank can be used to clean the silicon wafers. The continuous flipping of the silicon wafers allows the part of the silicon wafer close to the water surface to have better contact with the ultrasonic wave, so that the ultrasonic wave can have more comprehensive and better contact with the silicon wafer, thereby improving the cleaning effect of the silicon wafers.

[0034] The above is only a preferred specific implementation method of the present invention, but the protection scope of the present invention is not limited to this. Any technician familiar with the technical field within the technical scope disclosed by the present invention can make equivalent replacements or changes based on the technical solution and utility model concept of the present invention, which should be covered by the protection scope of the present invention.

Claims

1. A rotary silicon wafer cleaning basket, characterized by: The placing basket (1) comprises a box body with two ends and a top open, a plurality of slots (2) arranged at intervals are provided on the side surfaces of the placing basket (1), and a plurality of limiting plates (3) with bent ends in an "L" shape and arranged at intervals are provided in the placing basket (1), the limiting plates (3) are vertically fixed along the inner wall of the placing basket (1), so that there is a gap between two adjacent limiting plates (3) for placing silicon wafers; Support frames (4) are installed at both ends of the placement basket (1), and connecting frames (5) are provided on the outside of the support frames (4). The connecting frames (5) are rotatably connected to the placement basket (1) via a rotating shaft (17). A box shell (6) is also provided on the outside of one of the connecting frames (5), and a fixing frame is provided on the outside of the box shell (6) and on the outside of the other connecting frame (5). A transmission shaft (13) is provided in the housing (6), a fixed seat (14) is rotatably mounted on the transmission shaft (13), the fixed seat (14) is fixed to the inner wall of the housing (6), a second bevel gear (12) and a third bevel gear (15) are coaxially mounted on both ends of the transmission shaft (13), a fourth bevel gear (16) is meshed with the side of the third bevel gear (15), the fourth bevel gear (16) is coaxially fixed to the rotating shaft (17), and a first bevel gear (11) is meshed with the side of the second bevel gear (12), a drive shaft (10) is coaxially mounted on the first bevel gear (11), one end of the drive shaft (10) is rotatably mounted on the connecting frame (5), and the other end of the drive shaft (10) passes through the housing (7) and is connected to the drive motor (9).

2. The rotary silicon wafer cleaning basket according to claim 1, characterized in that: The front projection of the limiting plate (3) and the slot (2) are arranged in an interlaced manner.

3. The rotary silicon wafer cleaning basket according to claim 1, characterized in that: The support frame (4) is connected by a plurality of cross-arranged support rods, and the ends of the support rods are fixed to the placement basket (1), while the ends of the rotating shafts (17) are fixed to the support rods.

4. The rotary silicon wafer cleaning basket according to claim 1, characterized in that: A lifting handle (18) is provided above the placement basket (1), and the end of the lifting handle (18) is fixed to the top of the connecting frame (5).

5. The rotary silicon wafer cleaning basket according to claim 1, characterized in that: Fixed plates (19) with ends bent into an L-shape are hinged on both sides of the top of the placement basket (1), and the ends of the two fixed plates (19) are connected by a lock.

6. The rotary silicon wafer cleaning basket according to claim 1, characterized in that: An elastic buffer pad (20) is installed on one side of the fixing plate (19) close to the placement basket (1).

7. The rotary silicon wafer cleaning basket according to claim 1, characterized in that: The fixing frame includes a connecting plate (21) with an L-shaped top, the top of the connecting plate (21) is fixed to the corresponding box shell (6) and the connecting frame (5), a locking bolt (23) is threadedly connected to the connecting plate (21), and a pressure plate (22) is vertically installed at one end of the locking bolt (23) close to the inner side of the connecting plate (21), and an elastic rubber pad is installed at one end of the pressure plate (22) away from the locking bolt (23).

8. The rotary silicon wafer cleaning basket according to claim 1, characterized in that: The driving motor (9) is placed in the casing (7), and the casing (7) is fixed to the box shell (6), and a ventilation hole (8) is opened on the side of the casing (7).