Cleaning device

Abstract

The utility model discloses a cleaning device, which is applied to the technical field of semiconductors and comprises a cleaning cavity, a moisturizing cavity, a cleaning brush and a conveying device, the cleaning cavity is provided with a cleaning brush first inlet-outlet; the moisturizing cavity is provided with a moisturizing liquid inlet and a second cleaning brush inlet / outlet; the moisturizing cavity is formed in the outer side of the cleaning cavity; the first cleaning brush inlet-outlet is communicated with the second cleaning brush inlet-outlet; the conveying device is connected with the cleaning brush and drives the cleaning brush to move from the interior of the cleaning cavity to the interior of the moisturizing cavity or move from the interior of the moisturizing cavity to the interior of the cleaning cavity. The moisturizing cavity and the conveying device are additionally arranged, when the cleaning brush is idle, the cleaning brush can be moved from the interior of the cleaning cavity to the interior of the moisturizing cavity through the conveying device, moisturizing liquid is provided for the interior of the moisturizing cavity through the moisturizing liquid inlet of the moisturizing cavity, and the cleaning brush is moisturized through the moisturizing liquid; the wafer is cleaned by the moisturized cleaning brush, so that the cleaning effect can be improved, and the wafer can be prevented from being damaged.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductors, in particular to a cleaning device. Background Art

[0002] During the semiconductor manufacturing process, the cleanliness of the wafer surface directly impacts the reliability and lifespan of the chip, so wafers must be cleaned to ensure surface cleanliness. Existing cleaning processes typically use PVA (polyvinyl alcohol) brushes, which can easily dry out during cleaning intervals and equipment maintenance. When using dry brushes for cleaning, the hard surface of the dry brush creates hard contact with the wafer, resulting in inadequate cleaning and the inability to remove polishing fluid residue from the wafer surface. The resulting residue can also render the product scrapped. Utility Model Content

[0003] In view of this, an object of the present invention is to provide a cleaning device for solving the problem of poor cleaning effect and damage to the wafer caused by hard contact of a dry cleaning brush with the wafer.

[0004] In order to solve the above technical problems, the utility model provides a cleaning device, comprising: a cleaning chamber, a moisturizing chamber, a cleaning brush and a conveying device;

[0005] The cleaning chamber is provided with a first inlet and outlet for a cleaning brush; the moisturizing chamber is provided with a moisturizing liquid inlet and a second inlet and outlet for a cleaning brush; the moisturizing chamber is arranged outside the cleaning chamber; the first inlet and outlet for the cleaning brush are connected to the second inlet and outlet for the cleaning brush;

[0006] The conveying device is connected to the cleaning brush, and drives the cleaning brush to move from the inside of the cleaning chamber to the inside of the moisturizing chamber, or from the inside of the moisturizing chamber to the inside of the cleaning chamber.

[0007] Optionally, the cleaning device further comprises: an isolation device; the isolation device is arranged inside the cleaning chamber;

[0008] When the isolation device and the first inlet and outlet of the cleaning brush are not closed, the first inlet and outlet of the cleaning brush are connected to the second inlet and outlet of the cleaning brush;

[0009] When the isolation device and the first inlet and outlet of the cleaning brush are closed, the first inlet and outlet of the cleaning brush and the second inlet and outlet of the cleaning brush are both sealed.

[0010] Optionally, the isolation device includes a lifting door and a cylinder; the lifting door is connected to the cylinder, and the cylinder drives the lifting door to rise from a preset position to the first inlet and outlet of the cleaning brush, or to fall from the first inlet and outlet of the cleaning brush to the preset position.

[0011] Optionally, the cleaning device further includes: a rotating device; the rotating device is connected to the cleaning brush to drive the cleaning brush to rotate inside the moisturizing chamber.

[0012] Optionally, the moisturizing liquid inlet is provided with a spray head.

[0013] Optionally, the moisturizing chamber is provided with at least two moisturizing liquid inlets; the moisturizing liquid inlets are arranged along the extending length direction of the cleaning brush; and each moisturizing liquid inlet is provided with the spray head.

[0014] Optionally, the moisturizing chamber is provided with at least two rows of moisturizing liquid inlets; two adjacent rows of moisturizing liquid inlets are arranged along the height direction of the cleaning brush; and each row of moisturizing liquid inlets is arranged along the extending length direction of the cleaning brush.

[0015] Optionally, the moisturizing liquid inlet is located at the top of the moisturizing cavity.

[0016] Optionally, the moisturizing cavity is provided with a moisturizing liquid outlet.

[0017] Optionally, the conveying device is a conveying arm;

[0018] Alternatively, the conveying device is a slide rail; the slide rail extends from the inside of the cleaning chamber to the inside of the moisturizing chamber.

[0019] Optionally, the cleaning device further includes: a control device; the control device is electrically connected to the conveying device.

[0020] Optionally, the cleaning device further includes: a moisturizing liquid nozzle; the moisturizing liquid nozzle is arranged inside the cleaning cavity.

[0021] The present invention includes a cleaning chamber, a moisturizing chamber, a cleaning brush, and a conveying device. The cleaning chamber is provided with a first inlet and outlet for the cleaning brush. The moisturizing chamber is provided with a moisturizing liquid inlet and a second inlet and outlet for the cleaning brush. The moisturizing chamber is provided outside the cleaning chamber. The first inlet and outlet for the cleaning brush are connected to the second inlet and outlet for the cleaning brush. The conveying device is connected to the cleaning brush to drive the cleaning brush to move from the inside of the cleaning chamber to the inside of the moisturizing chamber, or from the inside of the moisturizing chamber to the inside of the cleaning chamber. Compared with the traditional cleaning device, the present invention adds a moisturizing chamber and a conveying device. When the cleaning brush is idle, the conveying device can move the cleaning brush from the inside of the cleaning chamber to the inside of the moisturizing chamber, and moisturize the inside of the moisturizing chamber through the moisturizing liquid inlet of the moisturizing chamber, so that the cleaning brush is moisturized by the moisturizing liquid. When the cleaning brush is working, the conveying device can move the moisturized cleaning brush from the inside of the moisturizing chamber to the inside of the cleaning chamber. The moisturized cleaning brush is used to clean the wafer, which can avoid hard contact between the cleaning brush and the wafer, thereby improving the cleaning effect and avoiding damage to the wafer. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are merely embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on the provided drawings without paying any creative work.

[0023] Figure 1 A schematic structural diagram of a cleaning device provided in an embodiment of the present utility model;

[0024] Figure 2 A schematic diagram of the position of a cleaning brush provided in an embodiment of the present utility model;

[0025] Figure 3 A front view of a shower head provided by an embodiment of the utility model;

[0026] Figure 4 A side view of a shower head provided by an embodiment of the present utility model;

[0027] Figure 5 A schematic structural diagram of a slide rail provided in an embodiment of the present utility model;

[0028] Figure 6 A schematic diagram of a lifting door provided by an embodiment of the present utility model when closed;

[0029] Figure 7 A schematic diagram of a lift door provided by an embodiment of the present utility model when it is open;

[0030] Figure 8 A schematic diagram of the position of a nozzle provided in an embodiment of the present utility model.

[0031] The following are the descriptions of the reference numerals:

[0032] 1-Cleaning chamber; 11-Cleaning chamber inlet and outlet; 12-First cleaning brush inlet and outlet; 2-Moisturizing chamber; 21-Moisturizing liquid inlet; 22-Second cleaning brush inlet and outlet; 211-Spray head; 22-Moisturizing liquid outlet; 3-Cleaning brush; 4-Wafer; 5-Power wheel; 6-Slide rail; 71-Lifting door; 72-Cylinder; 8-Moisturizing liquid nozzle. DETAILED DESCRIPTION

[0033] To make the purpose, technical solutions, and advantages of the embodiments of the present invention more clear, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the embodiments described are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts shall fall within the scope of protection of the present invention.

[0034] Please refer to Figures 1 to 8 , a cleaning device provided by an embodiment of the present utility model may include: a cleaning chamber 1, a moisturizing chamber 2, a cleaning brush 3 and a conveying device;

[0035] The cleaning chamber 1 is provided with a first inlet and outlet 12 for a cleaning brush; the moisturizing chamber 2 is provided with a moisturizing liquid inlet 21 and a second inlet and outlet 22 for a cleaning brush; the moisturizing chamber 2 is arranged outside the cleaning chamber 1; the first inlet and outlet 12 for a cleaning brush is connected to the second inlet and outlet 22 for a cleaning brush;

[0036] The conveying device is connected to the cleaning brush 3 , driving the cleaning brush 3 to move from the inside of the cleaning chamber 1 to the inside of the moisturizing chamber 2 , or from the inside of the moisturizing chamber 2 to the inside of the cleaning chamber 1 .

[0037] It should be noted that the moisturizing liquid inlet 21 in this embodiment is used to supply moisturizing liquid (primarily ultrapure water) into the interior of the moisturizing chamber 2. The specific location of the moisturizing liquid inlet 21 is not limited in this embodiment, as long as it can ensure that the moisturizing liquid can be supplied to the interior of the moisturizing chamber 2. For example, the moisturizing liquid inlet 21 can be located at the top of the moisturizing chamber 2. The moisturizing liquid inlet 21 supplies moisturizing liquid downward, and the injected moisturizing liquid drips onto the surface of the cleaning brush 3 to moisturize the cleaning brush 3. Alternatively, the moisturizing liquid can be stored in the moisturizing chamber 2 to moisturize the cleaning brush 3 by soaking it.

[0038] Furthermore, in this embodiment, the moisturizing liquid inlet 21 may be provided with a spray head 211. The moisturizing liquid is sprayed onto the cleaning brush 3 to moisturize the cleaning brush 3. This embodiment does not limit the specific flow rate of the moisturizing liquid in the moisturizing liquid inlet 21 or the spray head 211. For example, the flow rate of the moisturizing liquid in the moisturizing liquid inlet 21 or the spray head 211 may be no greater than 3 L / min.

[0039] This embodiment does not limit the specific number of moisturizing liquid inlets 21 or spray heads 211. In order to improve the moisturizing effect of the cleaning brush 3 inside the moisturizing chamber 2, the moisturizing chamber 2 can be provided with at least two moisturizing liquid inlets 21; each moisturizing liquid inlet 21 is provided with a spray head 211.

[0040] This embodiment does not limit the specific arrangement of the moisturizing liquid inlet 21 or the spray head 211 . In order to improve the moisturizing effect of the cleaning brush 3 inside the moisturizing chamber 2 , the moisturizing liquid inlet 21 can be arranged along the extended length direction of the cleaning brush 3 .

[0041] In order to improve the cleaning effect of the wafer 4, the cleaning device of this embodiment may include at least two cleaning brushes 3. When the cleaning brushes 3 are working, the cleaning brushes 3 are respectively located on the front and back of the wafer 4. Figure 2 As shown, the two cleaning brushes 3 are respectively located on the front and back of the wafer 4, and can clean the front and back of the wafer 4 at the same time. Furthermore, the cleaning device of this embodiment can also include a power wheel 5, which drives the wafer 4 to rotate to improve the cleaning effect of the wafer 4. This embodiment does not limit the specific number of power wheels 5, for example, Figure 2 As shown, four power wheels 5 are included, and the power wheels 5 are evenly arranged along the circumferential direction of the wafer 4.

[0042] Furthermore, in order to ensure that multiple cleaning brushes 3 can be moisturized simultaneously in the moisturizing chamber 2, the moisturizing chamber 2 in this embodiment can be provided with at least two rows of moisturizing liquid inlets 21; two adjacent rows of moisturizing liquid inlets 21 are arranged along the height direction of the cleaning brushes 3; each row of moisturizing liquid inlets 21 is arranged along the extension length direction of the cleaning brushes 3; each moisturizing liquid inlet 21 is provided with a spray head 211. Figure 3 and Figure 4 As shown, the spray heads 211 are divided into two rows, upper and lower, and can moisturize two cleaning brushes 3 at the same time.

[0043] Furthermore, to enhance the moisturizing effect of the cleaning brush 3 within the moisturizing chamber 2, this embodiment may further include a rotating device connected to the cleaning brush 3 to drive the cleaning brush 3 to rotate within the moisturizing chamber 2. Furthermore, this embodiment may further include a control device electrically connected to the rotating device. The control device is provided with a program control system that controls the rotating device to rotate the cleaning brush 3 within the moisturizing chamber 2, and controls the rotation speed of the cleaning brush 3 to be between 30 rpm and 50 rpm (inclusive) to ensure uniform moisturizing of the cleaning brush 3. Too high a rotation speed can cause the moisturizing liquid to be ejected from the cleaning brush 3 due to centrifugal force before it has fully soaked the cleaning brush 3, drying out the cleaning brush and preventing it from performing its moisturizing function.

[0044] Furthermore, in this embodiment, the moisturizing chamber 2 may be provided with a moisturizing liquid outlet 22. When moisturizing is complete, the moisturizing liquid outlet 22 opens to discharge the moisturizing liquid, completing the moisturizing process. This embodiment does not limit the specific moisturizing time that the cleaning brush 3 remains within the moisturizing chamber 2. For example, the moisturizing time that the cleaning brush 3 remains within the moisturizing chamber 2 may range from 30 seconds to 60 seconds (inclusive). This embodiment does not limit the specific location of the moisturizing liquid outlet 22, as long as it ensures that the moisturizing liquid within the moisturizing chamber 2 can be discharged. For example, the moisturizing liquid outlet 22 may be located at the bottom of the moisturizing chamber 2.

[0045] It should be noted that the conveying device in this embodiment is used to drive the cleaning brush 3 to move between the cleaning chamber 1 and the moisturizing chamber 2: when the cleaning brush 3 is idle, the cleaning brush 3 can be moved from the inside of the cleaning chamber 1 to the inside of the moisturizing chamber 2 through the conveying device; when the cleaning brush 3 is working, the moisturized cleaning brush 3 can be moved from the inside of the moisturizing chamber 2 to the inside of the cleaning chamber 1 through the conveying device.

[0046] The present embodiment does not limit the specific type of the conveying device, as long as it can drive the cleaning brush 3 to move between the cleaning chamber 1 and the moisturizing chamber 2. For example, the conveying device can be a conveying arm; or Figure 5 As shown, the conveying device can be a slide rail 6 ; the slide rail 6 extends from the inside of the cleaning chamber 1 to the inside of the moisturizing chamber 2 .

[0047] Furthermore, this embodiment may further include: a control device; the control device and the conveying device are electrically connected. A program control system is provided in the control device, and the program control system controls the conveying device to drive the cleaning brush 3 from the interior of the cleaning chamber 1 to the interior of the moisturizing chamber 2 for moisturizing when the cleaning brush 3 has been idle for more than five minutes; and to drive the cleaning brush 3 from the interior of the moisturizing chamber 2 to the interior of the cleaning chamber 1 for moisturizing when the moisturizing time of the cleaning brush 3 reaches 30 seconds to 60 seconds (inclusive).

[0048] Please refer to Figure 7It should be noted that the first inlet and outlet 12 of the cleaning brush in this embodiment is a hollow area on the side wall of the cleaning chamber 1, which is used to move the cleaning brush 3 from the cleaning chamber 1 to the moisturizing chamber 2 or from the moisturizing chamber 2 to the cleaning chamber 1; the second inlet and outlet 22 of the cleaning brush is a hollow area on the side wall of the moisturizing chamber 2, which is used to move the cleaning brush 3 from the cleaning chamber 1 into the moisturizing chamber 2 or from the moisturizing chamber 2 to the cleaning chamber 1.

[0049] Furthermore, the cleaning device of this embodiment may further include an isolation device disposed within the cleaning chamber 1. When the isolation device and the first cleaning brush inlet 12 are not closed, the first cleaning brush inlet 12 and the second cleaning brush inlet 22 are connected. When the isolation device and the first cleaning brush inlet 12 are closed, both the first cleaning brush inlet 12 and the second cleaning brush inlet 22 are closed. The isolation device can control the isolation and connection between the cleaning chamber 1 and the moisturizing chamber 2.

[0050] This embodiment does not limit the specific structure of the isolation device, as long as it can control the isolation and communication between the cleaning chamber 1 and the moisturizing chamber 2, for example Figure 6 and Figure 7 As shown, the isolation device may include a lift gate 71 and a cylinder 72. The lift gate 71 and the cylinder 72 are connected, and the cylinder 72 drives the lift gate 71 from a predetermined position to the first cleaning brush inlet 12, or from the first cleaning brush inlet 12 to a predetermined position. The lift gate 71 is raised and lowered by the cylinder 72. During moisturizing, the lift gate 71 is closed. When closed, the moisturizing liquid is stored and prevented from entering the cleaning chamber 1.

[0051] Furthermore, this embodiment may further include a moisturizing liquid nozzle 8 disposed within the cleaning chamber 1. The moisturizing liquid nozzle 8 may be an additional nozzle in addition to the existing cleaning nozzle within the cleaning chamber 1, or may be the existing cleaning nozzle within the cleaning chamber 1. In other words, the moisturizing liquid nozzle 8 has the added function of spraying moisturizing liquid in addition to the function of spraying cleaning liquid, thereby moisturizing the cleaning brush 3. After the moisturizing process is completed, the moisturizing liquid nozzle 8 is moved to the moisturizing chamber 2 to extend the moisturizing time, thereby preventing moisture loss caused by exhaust from the cleaning chamber 1.

[0052] This embodiment does not limit the specific flow rate of the moisturizing liquid in the moisturizing liquid nozzle 8. For example, the flow rate of the moisturizing liquid in the moisturizing liquid nozzle 8 may be no greater than 3 L / min. This embodiment does not limit the specific moisturizing time of the cleaning brush 3 within the cleaning chamber 1. For example, the moisturizing time of the cleaning brush 3 within the cleaning chamber 1 may be 30 seconds to 60 seconds (including both values).

[0053] Furthermore, this embodiment may further include a control device electrically connected to the moisturizing liquid nozzle 8. A program control system is provided in the control device, which controls the moisturizing liquid nozzle 8 to spray moisturizing liquid onto the cleaning brush 3 for moisturizing when the cleaning brush 3 has been idle for more than five minutes. Furthermore, when the moisturizing time for the cleaning brush 3 reaches 30 seconds to 60 seconds (inclusive), the program control system drives the cleaning brush 3 to move from the interior of the cleaning chamber 1 to the interior of the moisturizing chamber 2 for a second moisturizing.

[0054] Furthermore, to enhance the moisturizing effect of the cleaning brush 3 within the cleaning chamber 1, this embodiment may further include a rotating device connected to the cleaning brush 3 to drive the cleaning brush 3 to rotate within the cleaning chamber 1. Furthermore, this embodiment may further include a control device electrically connected to the rotating device. The control device is provided with a program control system that controls the rotating device to drive the cleaning brush 3 to rotate within the cleaning chamber 1, and controls the rotation speed of the cleaning brush 3 to be between 30 rpm and 50 rpm (inclusive) to ensure uniform moisturizing of the cleaning brush 3.

[0055] This embodiment does not limit the specific number of moisturizing liquid nozzles 8. To improve the moisturizing effect of the cleaning brush 3, at least two moisturizing liquid nozzles 8 can be included. This embodiment does not limit the specific arrangement of the moisturizing liquid nozzles 8. To improve the moisturizing effect of the cleaning brush 3, the moisturizing liquid nozzles 8 can be arranged along the extended length of the cleaning brush 3.

[0056] Furthermore, in order to ensure that multiple cleaning brushes 3 can be moisturized at the same time, this embodiment may include at least two rows of moisturizing liquid nozzles 8; two adjacent rows of moisturizing liquid nozzles 8 are arranged along the height direction of the cleaning brush 3; and each row of moisturizing liquid nozzles 8 is arranged along the extension length direction of the cleaning brush 3. Figure 8 As shown, the moisturizing liquid nozzles 8 are divided into two rows, one above the other, and are located obliquely above and one below the wafer 4 respectively; they can moisturize the two cleaning brushes 3 at the same time.

[0057] Based on the above embodiments, compared with the traditional cleaning device, the present invention adds a moisturizing chamber 2 and a conveying device. When the cleaning brush 3 is idle, the cleaning brush 3 can be moved from the inside of the cleaning chamber 1 to the inside of the moisturizing chamber 2 through the conveying device, and moisturizing liquid is provided to the inside of the moisturizing chamber 2 through the moisturizing liquid inlet 21 of the moisturizing chamber 2, and the cleaning brush 3 is moisturized by the moisturizing liquid; when the cleaning brush 3 is working, the moisturized cleaning brush 3 can be moved from the inside of the moisturizing chamber 2 to the inside of the cleaning chamber 1 through the conveying device, and the wafer 4 is cleaned by the moisturized cleaning brush 3, which can avoid hard contact between the cleaning brush 3 and the wafer 4, which can not only improve the cleaning effect but also avoid damage to the wafer 4.

[0058] In order to make the present invention easier to understand, the working principle of the cleaning device provided in the embodiment of the present invention will be described in detail below with reference to specific examples.

[0059] This embodiment adopts Figure 1 The cleaning device shown in the figure has a small space on the left side as a moisturizing chamber 2, and a large space on the right side as a cleaning chamber 1 for wafers 4. The moisturizing chamber 2 is arranged outside the cleaning chamber 1, and the isolation and connection of the two chambers can be controlled by a lifting door 71.

[0060] Wafers 4 are transferred from the cleaning chamber entrance 11 into the cleaning chamber 1 for cleaning. When the idle time exceeds five minutes, the transfer device is controlled by the program control system to drive the cleaning brush 3 inside the cleaning chamber 1 to be transferred into the moisturizing chamber 2 for moisturizing.

[0061] During moisturizing, the lifting door 71 is closed. The lifting door 71 is controlled by the cylinder 72 to rise and fall. When the lifting door 71 is closed, it is beneficial to store the moisturizing liquid and prevent the moisturizing liquid from entering the cleaning chamber 1. The moisturizing liquid inlet 21 is located at the top of the moisturizing chamber 2, and a spray head 211 is provided at the position of the moisturizing liquid inlet 21. The moisturizing liquid is supplied downward through the moisturizing liquid inlet 21 to moisturize the cleaning brush 3 by spraying or soaking.

[0062] When moisturizing is finished, the moisturizing liquid outlet 22 is opened to discharge the moisturizing liquid, thus completing the moisturizing process. Each moisturizing time is approximately 30s-60s (including both ends).

[0063] The conveying device is controlled by the program control system to drive the cleaning brush 3 inside the moisturizing chamber 2 to be conveyed back to the cleaning chamber 1 for work. At this time, the cleaning brush is in working time.

[0064] By applying the cleaning device provided by the embodiment of the present invention, by adding a moisturizing chamber 2 and a conveying device, when the cleaning brush 3 is idle, the cleaning brush 3 can be moved from the inside of the cleaning chamber 1 to the inside of the moisturizing chamber 2 through the conveying device, and moisturizing liquid is provided to the inside of the moisturizing chamber 2 through the moisturizing liquid inlet 21 of the moisturizing chamber 2, and the cleaning brush 3 is moisturized by the moisturizing liquid; when the cleaning brush 3 is working, the moisturized cleaning brush 3 can be moved from the inside of the moisturizing chamber 2 to the inside of the cleaning chamber 1 through the conveying device, and the wafer 4 is cleaned by the moisturized cleaning brush 3, which can avoid hard contact between the cleaning brush 3 and the wafer 4, which can not only improve the cleaning effect but also avoid damage to the wafer 4.

[0065] The above is a detailed introduction to a cleaning device provided by the present invention. For those skilled in the art, according to the ideas of the embodiments of the present invention, there may be changes in the specific implementation methods and application scope. In summary, the content of this specification should not be understood as limiting the present invention.

Claims

1. A cleaning device, characterized in that: include: Cleaning chamber, moisturizing chamber, cleaning brush and conveying device; The cleaning chamber is provided with a first inlet and outlet for a cleaning brush; The moisturizing chamber is provided with a moisturizing liquid inlet and a second inlet and outlet for a cleaning brush; the moisturizing chamber is provided outside the cleaning chamber; the first inlet and outlet of the cleaning brush are communicated with the second inlet and outlet of the cleaning brush; The conveying device is connected to the cleaning brush, and drives the cleaning brush to move from the inside of the cleaning chamber to the inside of the moisturizing chamber, or from the inside of the moisturizing chamber to the inside of the cleaning chamber.

2. The cleaning device according to claim 1, characterized in that Also includes: Isolation device; the isolation device is arranged inside the cleaning chamber; When the isolation device and the first inlet and outlet of the cleaning brush are not closed, the first inlet and outlet of the cleaning brush are connected to the second inlet and outlet of the cleaning brush; When the isolation device and the first inlet and outlet of the cleaning brush are closed, the first inlet and outlet of the cleaning brush and the second inlet and outlet of the cleaning brush are both sealed.

3. The cleaning device according to claim 2, characterized in that The isolation device includes a lifting door and a cylinder; the lifting door is connected to the cylinder, and the cylinder drives the lifting door to rise from a preset position to the first inlet and outlet of the cleaning brush, or to fall from the first inlet and outlet of the cleaning brush to the preset position.

4. The cleaning device according to claim 1, characterized in that Also includes: The rotating device is connected to the cleaning brush to drive the cleaning brush to rotate inside the moisturizing chamber.

5. The cleaning device according to claim 1, characterized in that The moisturizing liquid inlet is provided with a spray head.

6. The cleaning device according to claim 5, characterized in that: The moisturizing chamber is provided with at least two moisturizing liquid inlets; the moisturizing liquid inlets are arranged along the extending length direction of the cleaning brush; and each moisturizing liquid inlet is provided with the spray head.

7. The cleaning device according to claim 6, characterized in that The moisturizing chamber is provided with at least two rows of moisturizing liquid inlets; two adjacent rows of moisturizing liquid inlets are arranged along the height direction of the cleaning brush; and each row of moisturizing liquid inlets is arranged along the extending length direction of the cleaning brush.

8. The cleaning device according to claim 1, characterized in that The moisturizing liquid inlet is located at the top of the moisturizing cavity.

9. The cleaning device according to claim 1, characterized in that: The moisturizing cavity is provided with a moisturizing liquid outlet.

10. The cleaning device according to claim 1, characterized in that The conveying device is a conveying arm; Alternatively, the conveying device is a slide rail; the slide rail extends from the inside of the cleaning chamber to the inside of the moisturizing chamber.

11. The cleaning device according to claim 1, characterized in that Also includes: Control device; the control device is electrically connected to the transmission device.

12. The cleaning device according to claim 1, characterized in that Also includes: Moisturizing liquid nozzle; the moisturizing liquid nozzle is arranged inside the cleaning cavity.

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