Sputtering cavity for sputtering table
By arranging a swing and limit mechanism in the sputtering chamber of the sputtering table, uniform sputtering of the substrate is achieved, the problem of uneven target material utilization is solved, and target material consumption and cost are reduced.
Patent Information
- Application Number
- CN202422854496.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-11-22
- Publication Date
- 2025-09-19
- Estimated Expiration
- 2034-11-22
AI Technical Summary
In existing sputtering technology, different areas on the target surface are bombarded by ions unevenly, resulting in low target utilization and increased target consumption and cost.
A sputtering chamber for a sputtering table is used, and a swing mechanism and a limit mechanism are set to realize the back-and-forth swing and fixation of the substrate, ensuring that the sputtered atoms are evenly deposited around the substrate and improving the utilization rate of the target material.
By swinging the substrate back and forth, the overall utilization rate of the target material is improved, and the consumption and cost of the target material are reduced.
Smart Images
Figure CN223357728U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of sputtering platforms, in particular to a sputtering chamber for a sputtering platform. Background Art
[0002] The sputtering chamber is one of the most critical components of a sputtering station. It is an enclosed space that primarily houses the sputtering target, the substrate (the workpiece to be coated), and the plasma generation environment. It is typically a sealed chamber constructed of metal, such as stainless steel, due to its strength and corrosion resistance. Common chamber shapes include cylindrical or rectangular.
[0003] However, in the prior art, during the sputtering process, due to factors such as the electric field distribution, magnetic field distribution (for sputtering equipment with a magnetic field) and plasma distribution on the target surface, different areas on the target surface are bombarded by ions to different degrees, resulting in uneven target utilization. Usually, the sputtering rate in the center area of the target is higher, while the sputtering rate in the edge area is lower, which makes the overall utilization of the target material low and increases the consumption and cost of the target material. Utility Model Content
[0004] The utility model aims to solve the problem in the prior art that uneven sputtering occurs in some areas, resulting in low overall utilization, increased target material consumption and cost, and proposes a sputtering chamber for a sputtering table.
[0005] In order to achieve the above-mentioned object, the present invention adopts the following technical solution: a sputtering chamber for a sputtering table, comprising a sputtering chamber body, a swing mechanism is provided at the lower end of the sputtering chamber body, and a limit mechanism is provided inside the sputtering chamber body;
[0006] The swing mechanism includes a fixed plate and a concave frame plate, a transmission rod is rotatably mounted on the lower end of the concave frame plate, a toothed belt transmission assembly is provided at the lower end of the fixed plate, a servo motor is fixedly mounted on the upper end of the fixed plate, a rotating rod is rotatably mounted in the middle of the concave frame plate, two groups of elliptical plates are fixedly mounted on the outer wall of the rotating rod, a connecting block is fixedly mounted on the outer wall of the rotating rod, a disc is fixedly mounted on the upper end of the transmission rod, a long rod is fixedly mounted in the middle of the two groups of elliptical plates, and a movable block is slidably mounted on the outer wall of the long rod.
[0007] Preferably, the limiting mechanism includes a placement table, a limiting groove is provided at the upper end of the placement table, a threaded hole is penetrated through one end of the placement table, a bolt is connected to the internal thread of the threaded hole, and a push plate is provided inside the limiting groove.
[0008] Preferably, the protruding portions on both sides of the concave frame plate are respectively fixed to the inner side walls of the sputtering chamber body, and the upper end of the connecting block is fixed to the lower end of the placement table.
[0009] Preferably, the output end of the servo motor passes through the upper end of the fixed plate and is fixed to the upper end of one set of pulleys in the toothed belt transmission assembly, and the lower end of the transmission rod passes through the lower end of the sputtering chamber body and is fixed to the upper end of another set of pulleys in the toothed belt transmission assembly.
[0010] Preferably, one end of the fixed plate is fixed to the outer wall of the sputtering chamber body, and the lower end protrusion of the movable block is fixed to the upper end of the disc.
[0011] Preferably, two groups of guide holes are opened through one end of the placement table, and two groups of stabilizing rods are fixedly installed on one end of the push plate.
[0012] Preferably, the two groups of stabilizing rods are respectively slidably mounted inside the two groups of guide holes, and one end of the bolt is rotatably mounted inside the push plate.
[0013] Compared with the prior art, the advantages and positive effects of the present invention are:
[0014] 1. In the present invention, a swing mechanism is provided to facilitate the connecting block to drive the placement table to swing back and forth inside the sputtering chamber body, thereby driving the substrate to swing back and forth, so that the sputtered atoms can be evenly deposited in the circumferential direction of the substrate, thereby improving the overall utilization rate of the target material and reducing the consumption and cost of the target material.
[0015] 2. In the present invention, a limiting mechanism is provided, and when the bolt is rotated, the bolt will rotate in the internal thread of the threaded hole, and at the same time, one end of the bolt will rotate inside the push plate. When the bolt moves inside the threaded hole, the bolt will drive the push plate to move inside the limiting groove, and then the substrate inside the limiting groove can be limited, so that the substrate can be fixed inside the placement table, which is convenient for subsequent sputtering coating of the substrate. BRIEF DESCRIPTION OF THE DRAWINGS
[0016] Figure 1 The utility model provides a schematic diagram of the three-dimensional structure of a sputtering chamber for a sputtering table;
[0017] Figure 2 The utility model provides a schematic diagram of the structure of a swing mechanism and a placement table in a sputtering chamber for a sputtering table;
[0018] Figure 3 The utility model provides a side view of a swing mechanism and a placement table in a sputtering chamber for a sputtering table;
[0019] Figure 4 The utility model provides a structural schematic diagram of a limit mechanism in a sputtering chamber for a sputtering table.
[0020] Legend: 1. Sputtering chamber body; 2. Swinging mechanism; 21. Fixed plate; 22. Concave frame plate; 23. Transmission rod; 24. Toothed belt transmission assembly; 25. Servo motor; 26. Rotating rod; 27. Elliptical plate; 28. Connecting block; 29. Disc; 210. Movable block; 211. Long rod; 3. Limiting mechanism; 31. Placement table; 32. Threaded hole; 33. Guide hole; 34. Limiting groove; 35. Bolt; 36. Push plate; 37. Stabilizing bar. DETAILED DESCRIPTION
[0021] In order to more clearly understand the above-mentioned purpose, features and advantages of the present invention, the present invention is further described below with reference to the accompanying drawings and embodiments. It should be noted that the embodiments of the present application and the features therein can be combined with each other without conflict.
[0022] In the following description, many specific details are set forth to facilitate a full understanding of the present invention. However, the present invention may also be implemented in other ways than those described herein. Therefore, the present invention is not limited to the specific embodiments disclosed in the following specification.
[0023] Example 1: Figure 1 - Figure 4 As shown, the utility model provides a sputtering chamber for a sputtering table, comprising a sputtering chamber body 1, a swing mechanism 2 is provided at the lower end of the sputtering chamber body 1, and a limiting mechanism 3 is provided inside the sputtering chamber body 1;
[0024] The swing mechanism 2 includes a fixed plate 21 and a concave frame plate 22. A transmission rod 23 is rotatably mounted on the lower end of the concave frame plate 22. A toothed belt transmission assembly 24 is provided at the lower end of the fixed plate 21. A servo motor 25 is fixedly mounted on the upper end of the fixed plate 21. A rotating rod 26 is rotatably mounted in the middle of the concave frame plate 22. Two groups of elliptical plates 27 are fixedly mounted on the outer wall of the rotating rod 26. A connecting block 28 is fixedly mounted on the outer wall of the rotating rod 26. A disc 29 is fixedly mounted on the upper end of the transmission rod 23. A long rod 211 is fixedly mounted in the middle of the two groups of elliptical plates 27. The outer wall of the long rod 211 is slidably mounted. The movable block 210 and the protrusions on both sides of the concave frame plate 22 are respectively fixed to the inner side walls of the sputtering chamber body 1, the upper end of the connecting block 28 is fixed to the lower end of the placement table 31, the output end of the servo motor 25 passes through the upper end of the fixed plate 21 and is fixed to the upper end of one set of pulleys in the toothed belt transmission assembly 24, the lower end of the transmission rod 23 passes through the lower end of the sputtering chamber body 1 and is fixed to the upper end of the other set of pulleys in the toothed belt transmission assembly 24, one end of the fixed plate 21 is fixed to the outer wall of the sputtering chamber body 1, and the lower end protrusion of the movable block 210 is fixed to the upper end of the disc 29.
[0025] The following is a detailed description of the specific settings and functions of this embodiment. By starting the servo motor 25, the output end of the servo motor 25 drives the transmission rod 23 to rotate through the toothed belt transmission assembly 24, and the transmission rod 23 rotates inside the concave frame plate 22. At the same time, the transmission rod 23 drives the movable block 210 to move. During the movement of the movable block 210, the movable block 210 drives the two groups of elliptical plates 27 to move together through the long rod 211. At the same time, the movable block 210 slides on the outer wall of the long rod 211. By continuously driving the movable block 210 to move, the movable block 210 drives the two groups of elliptical plates 27 to swing left and right through the long rod 211, and the two groups of elliptical plates 27 drive the rotating rod 26 to rotate inside the concave frame plate 22. At the same time, the rotating rod 26 drives the connecting block 28 to swing together, thereby facilitating the connecting block 28 to drive the placement table 31 to swing back and forth inside the sputtering chamber body 1, thereby driving the substrate to swing back and forth, so that the sputtered atoms can be evenly deposited in the circumferential direction of the substrate, thereby improving the overall utilization rate of the target material and reducing the consumption and cost of the target material.
[0026] The provision of the fixing plate 21 can support the servo motor 25 and improve the stability of the servo motor 25 during operation.
[0027] Example 2: Figure 1 、 Figure 2 、 Figure 3 and Figure 4 As shown, the limiting mechanism 3 includes a placing table 31, and a limiting groove 34 is provided at the upper end of the placing table 31. A threaded hole 32 is penetrated at one end of the placing table 31, and a bolt 35 is connected to the internal thread of the threaded hole 32. A push plate 36 is provided inside the limiting groove 34, and two groups of guide holes 33 are penetrated at one end of the placing table 31. Two groups of stabilizing rods 37 are fixedly installed at one end of the push plate 36. The two groups of stabilizing rods 37 are respectively slidably installed inside the two groups of guide holes 33, and one end of the bolt 35 is rotatably installed inside the push plate 36.
[0028] The effect achieved by the entire embodiment is that by rotating the bolt 35, the bolt 35 will rotate in the internal thread of the threaded hole 32, and at the same time, one end of the bolt 35 will rotate inside the push plate 36. With the cooperation of the two sets of stabilizing rods 37 and the two guide holes 33, the push plate 36 can be limited. When the bolt 35 moves inside the threaded hole 32, the bolt 35 will drive the push plate 36 to move inside the limiting groove 34, and then the substrate inside the limiting groove 34 can be limited, so that the substrate can be fixed inside the placement table 31, which is convenient for subsequent sputtering coating of the substrate.
[0029] The usage and working principle of this device are as follows: First, place the substrate on the placement table 31 inside the sputtering chamber body 1, and the bottom of the substrate contacts the limiting groove 34, then rotate the bolt 35, the bolt 35 will rotate in the internal thread of the threaded hole 32, and at the same time, one end of the bolt 35 will rotate inside the push plate 36, with the cooperation of the two sets of stabilizing rods 37 and the two guide holes 33, the push plate 36 can be limited, when the bolt 35 moves inside the threaded hole 32, the bolt 35 will drive the push plate 36 to move inside the limiting groove 34, and the substrate inside the limiting groove 34 can be limited, finally, by starting the servo motor 25, the output end of the servo motor 25 drives the transmission rod 23 to rotate through the toothed belt transmission assembly 24, and the transmission rod 23 is in the concave frame The plate 22 rotates internally, and the transmission rod 23 drives the movable block 210 to move. During the movement of the movable block 210, the movable block 210 drives the two groups of elliptical plates 27 to move together through the long rod 211. At the same time, the movable block 210 slides on the outer wall of the long rod 211. By continuously driving the movable block 210 to move, the movable block 210 drives the two groups of elliptical plates 27 to swing left and right through the long rod 211, and the two groups of elliptical plates 27 drive the rotating rod 26 to rotate inside the concave frame plate 22. At the same time, the rotating rod 26 drives the connecting block 28 to swing together, which makes it convenient for the connecting block 28 to drive the placement table 31 to swing back and forth inside the sputtering chamber body 1, and can drive the substrate to swing back and forth, so that the sputtered atoms can be evenly deposited in the circumferential direction of the substrate.
[0030] The above are only preferred embodiments of the present invention and are not intended to limit the present invention in any other form. Any technician familiar with the profession may use the technical content disclosed above to change or modify it into an equivalent embodiment with equivalent changes and apply it to other fields. However, any simple modification, equivalent change and modification of the above embodiment made according to the technical essence of the present invention without departing from the content of the technical solution of the present invention shall still fall within the scope of protection of the technical solution of the present invention.
Claims
1. A sputtering chamber for a sputtering table, comprising a sputtering chamber body (1), characterized in that: A swing mechanism (2) is provided at the lower end of the sputtering chamber body (1), and a limiting mechanism (3) is provided inside the sputtering chamber body (1); The swing mechanism (2) comprises a fixed plate (21) and a concave frame plate (22); a transmission rod (23) is rotatably mounted on the lower end of the concave frame plate (22); a toothed belt transmission assembly (24) is provided on the lower end of the fixed plate (21); a servo motor (25) is fixedly mounted on the upper end of the fixed plate (21); a rotating rod (26) is rotatably mounted in the middle of the concave frame plate (22); two groups of elliptical plates (27) are fixedly mounted on the outer wall of the rotating rod (26); a connecting block (28) is fixedly mounted on the outer wall of the rotating rod (26); a circular disc (29) is fixedly mounted on the upper end of the transmission rod (23); a long rod (211) is fixedly mounted in the middle of the two groups of elliptical plates (27); and a movable block (210) is slidably mounted on the outer wall of the long rod (211).
2. The sputtering chamber for a sputtering table according to claim 1, characterized in that: The limiting mechanism (3) includes a placement platform (31), a limiting groove (34) is provided at the upper end of the placement platform (31), a threaded hole (32) is provided through one end of the placement platform (31), a bolt (35) is connected to the internal thread of the threaded hole (32), and a push plate (36) is provided inside the limiting groove (34).
3. The sputtering chamber for a sputtering table according to claim 2, characterized in that: The protruding portions on both sides of the concave frame plate (22) are respectively fixed to the inner side walls of the sputtering chamber body (1), and the upper end of the connecting block (28) is fixed to the lower end of the placement table (31).
4. The sputtering chamber for a sputtering table according to claim 3, characterized in that: The output end of the servo motor (25) passes through the upper end of the fixed plate (21) and is fixed to the upper end of one set of pulleys in the toothed belt transmission assembly (24); the lower end of the transmission rod (23) passes through the lower end of the sputtering chamber body (1) and is fixed to the upper end of the other set of pulleys in the toothed belt transmission assembly (24).
5. The sputtering chamber for a sputtering table according to claim 4, characterized in that: One end of the fixed plate (21) is fixed to the outer wall of the sputtering chamber body (1), and the lower end protrusion of the movable block (210) is fixed to the upper end of the disc (29).
6. The sputtering chamber for a sputtering table according to claim 2, characterized in that: One end of the placement platform (31) is penetrated by two groups of guide holes (33), and one end of the push plate (36) is fixedly mounted with two groups of stabilizing rods (37).
7. The sputtering chamber for a sputtering table according to claim 6, characterized in that: The two groups of stabilizing rods (37) are respectively slidably mounted inside the two groups of guide holes (33), and one end of the bolt (35) is rotatably mounted inside the push plate (36).