Base and gas phase process equipment

Abstract

The embodiment of the utility model provides a base and gas phase process equipment, the base is suitable for the gas phase process equipment, and the base comprises a first pipeline used for transmitting gas and a second pipeline used for transmitting liquid; the first pipeline and the second pipeline are at least partially located in the base and extend to the first surface of the base from the interior of the base. A first opening is exposed on the first surface of the first pipeline; a second opening is exposed on the first surface of the second pipeline; a gas distribution device communicated through the first opening and the second opening is arranged on the first surface, and a sealing piece surrounding the first opening and the second opening is arranged between the first surface and the gas distribution device; the groove is located in the first surface, located between the first opening and the second opening and used for collecting liquid leaked from the second pipeline along the first surface.

Description

Technical Field

[0001] The embodiments of the present application relate to the field of semiconductor process equipment, and in particular to a susceptor and gas phase process equipment. Background Art

[0002] Some thin film production equipment components often involve the transfer of both gas and liquid. However, when components become loose, liquid can easily leak along their surfaces. If this leaked liquid enters the pipes used to transport process gases, it can contaminate the pipes and equipment, even causing equipment failure and damage. This not only increases repair costs but also leads to production interruptions and downtime, severely impacting productivity. Utility Model Content

[0003] In view of this, embodiments of the present application provide a base and a gas phase process equipment.

[0004] To achieve the above objectives, the technical solution of the embodiment of the present application is implemented as follows:

[0005] An embodiment of the present application provides a susceptor, which is suitable for gas-phase process equipment, and includes: a first pipe for transmitting gas and a second pipe for transmitting liquid; the first pipe and the second pipe are at least partially located within the susceptor and extend from the interior of the susceptor to a first surface of the susceptor, respectively; the first pipe has a first opening exposed on the first surface; the second pipe has a second opening exposed on the first surface; a gas distribution device is provided on the first surface and communicates with the first opening and the second opening, and a sealing member surrounding the first opening and the second opening is provided between the first surface and the gas distribution device;

[0006] The groove is located on the first surface and between the first opening and the second opening, and is used to collect liquid leaked from the second pipe along the first surface.

[0007] In some embodiments, the base further comprises:

[0008] a sensor, located on the first side wall of the base, for detecting whether the leaked liquid is collected in the groove;

[0009] Wherein, the first side wall intersects with the first surface.

[0010] In some embodiments, the depth of the groove gradually increases or decreases along the extension direction of the groove;

[0011] The groove has a maximum depth at the first sidewall.

[0012] In some embodiments, an angle between an extension direction of a bottom of the groove and the first surface is greater than a first threshold.

[0013] In some embodiments, the groove has an inclined second sidewall and a third sidewall, and the second sidewall intersects the third sidewall at the bottom of the groove.

[0014] In some embodiments, the groove has a fourth sidewall and a fifth sidewall, and a bottom surface connecting the fourth sidewall and the fifth sidewall.

[0015] In some embodiments, the minimum distance between the groove and the first pipe is greater than or equal to a second threshold; and / or the minimum distance between the groove and the second pipe is greater than or equal to a third threshold.

[0016] In some embodiments, the second conduit includes a plurality of sub-channels; and a minimum distance between the groove and any of the sub-channels is smaller than a minimum distance between the groove and the first conduit.

[0017] In some embodiments, an arrangement direction of the plurality of sub-channels is the same as an extension direction of the groove.

[0018] The embodiment of the present application further provides a gas phase process device, comprising the base as described above, a gas distribution device and a plurality of sealing members;

[0019] The gas distribution device is provided with a third pipeline for transmitting gas and a fourth pipeline for transmitting liquid;

[0020] The sealing member is located between the first surface of the base and the gas distribution device, and is used to seal the connection between the first pipe and the third pipe, and the connection between the second pipe and the fourth pipe.

[0021] The base provided in the embodiments of the present application has a groove between a first conduit for transmitting gas and a second conduit for transmitting liquid. This groove collects liquid leaking from the second conduit and blocks the leaked liquid from migrating along the first surface of the base into the first conduit. Even in the event of a poor seal or looseness between the base and the gas distribution device, leaked liquid is prevented from contaminating the first conduit and the equipment, reducing the risk of damage to the equipment. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Figure 1A A first cross-sectional view of a base provided in an embodiment of the present application;

[0023] Figure 1B A top view of the base provided in an embodiment of the present application;

[0024] Figure 2AA second top view of the base provided in an embodiment of the present application;

[0025] Figure 2B A first front view of a base provided in an embodiment of the present application;

[0026] Figure 2C A second cross-sectional view of the base provided in an embodiment of the present application;

[0027] Figure 3 A top view of the base provided in the embodiment of the present application Figure 3 ;

[0028] Figure 4 Cross-sectional view of the base provided in the embodiment of the present application Figure 3 ;

[0029] Figure 5A A second front view of the base provided in an embodiment of the present application;

[0030] Figure 5B A top view of the base provided in the embodiment of the present application Figure 4 ;

[0031] Figure 5C A partial cross-sectional view 1 of the base provided in an embodiment of the present application;

[0032] Figure 6 A fifth top view of the base provided in an embodiment of the present application;

[0033] Figure 7A A front view of the base provided in the embodiment of the present application Figure 3 ;

[0034] Figure 7B A top view of the base provided in the embodiment of the present application Figure 6 ;

[0035] Figure 7C A second partial cross-sectional view of the base provided in an embodiment of the present application;

[0036] Figure 8 Partial cross-section of the base provided in the embodiment of the present application Figure 3 ;

[0037] Figure 9 Cross-sectional view of the base provided in the embodiment of the present application Figure 4 ;

[0038] Figure 10 A top view of the base provided in an embodiment of the present application is shown in FIG7;

[0039] Figure 11 A top view of the base provided in the embodiment of the present application Figure 8 ;

[0040] Figure 12 Schematic diagram of the gas phase process equipment structure provided in the embodiment of the present application. DETAILED DESCRIPTION

[0041] The following will be combined with the embodiments of this application and the accompanying drawings to clearly and completely describe the technical solutions in the embodiments of this application. Obviously, the described embodiments are only part of the embodiments of this application, not all of the embodiments. Based on the embodiments of this application, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of this application.

[0042] In the following description, numerous specific details are provided to provide a more thorough understanding of the present application. However, it will be apparent to those skilled in the art that the present application can be practiced without one or more of these details. In other instances, certain technical features known in the art are not described to avoid confusion with the present application; that is, all features of actual embodiments are not described herein, nor are well-known functions and structures described in detail.

[0043] The purpose of the terms used herein is only to describe specific embodiments and is not intended to limit the present application. When used herein, the singular forms "a", "an", and "the" are intended to include the plural forms, unless the context clearly indicates otherwise. It should also be understood that the terms "comprising" and / or "including", when used in this specification, determine the presence of the features, integers, steps, operations, elements and / or parts, but do not exclude the presence or addition of one or more other features, integers, steps, operations, elements, parts and / or groups. When used herein, the term "and / or" includes any and all combinations of the relevant listed items.

[0044] In order to fully understand the present application, detailed steps and detailed structures will be presented in the following description to illustrate the technical solution of the present application. The preferred embodiments of the present application are described in detail below. However, in addition to these detailed descriptions, the present application may also have other implementation methods.

[0045] In some thin film preparation processes, gas transmission is usually involved. For example, chemical vapor deposition (CVD) equipment heats one or more gases to decompose the gases to produce reaction products, and deposits the desired thin film on the surface of the substrate. In order to prevent the gas delivery pipeline from overheating, a condenser for reducing the gas temperature is often arranged near the gas pipeline. However, when the substrate base and the transmission component above it become loose, the sealing rubber ring between the substrate base and the transmission component cannot achieve a good sealing effect through the extrusion force. The condensate in the condenser is easy to leak along the contact surface between the substrate base and the transmission component above it. The leaked liquid will diffuse under capillary action and may even diffuse into the pipeline for delivering process gases, thereby contaminating the entire machine equipment and causing equipment failure and damage. Not only will it increase maintenance costs, but it will also lead to production interruptions and increase downtime, seriously affecting production efficiency.

[0046] In view of this, an embodiment of the present application provides a base 100 , which is suitable for gas phase process equipment. Figure 1A and Figure 1B 1 and 2 show a longitudinal cross-sectional view and a top view of the base 100 respectively. Figure 1A to Figure 1B As shown, the base 100 includes: a first pipe 101 for transmitting gas and a second pipe 102 for transmitting liquid; the first pipe 101 and the second pipe 102 are at least partially located in the base 100, and extend from the interior of the base 100 to the first surface 103 of the base 100 respectively; the first pipe 101 has a first opening 101a exposed on the first surface 103; the second pipe 102 has a second opening 102a exposed on the first surface 103; a gas distribution device ( Figure 1A (not shown), a seal around the first opening 101a and the second opening 102a is provided between the first surface 103 and the gas distribution device;

[0047] The groove 104 is located on the first surface 103 and between the first opening 101 a and the second opening 102 a , and is used to collect liquid leaked from the second pipe 102 along the first surface 103 .

[0048] The base 100 can be in direct contact with an external component (e.g., a gas distribution device) through the first surface 103, and the first pipe 101 and the second pipe 102 are sealed at the connection point through a seal. When the base 100 and the external component become loose, the squeezing force of the base 100 and the external component on the seal is insufficient, and a poor seal is likely to occur. The liquid in the second pipe 102 may leak and spread along the contact interface (i.e., the first surface 103). Since a groove 104 is provided near the second opening 102a of the second pipe 102, the bottom of the groove is at a lower level than the first surface 103. When the leaked liquid spreads to the groove 104, the leaked liquid will fall to the bottom of the groove 104 under the action of gravity. The groove 104 blocks the path for the leaked liquid to spread into the first pipe 101, thereby preventing the leaked liquid from entering and contaminating the first pipe 101 and the machine equipment.

[0049] It should be noted that the first conduit 101 and the second conduit 102 in this embodiment can be integrally formed in the base 100. That is, the transmission medium (gas or liquid) in the first conduit 101 and the second conduit 102 is in direct contact with the base 100. The first conduit 101, the second conduit 102, and the base 100 in this embodiment can also be formed and manufactured separately, in which case the first conduit 101 and the second conduit 102 can be partially located inside the base 100.

[0050] In this embodiment, Figure 1B The cross-sectional shape of the groove 104 shown is rectangular. It should be noted that the shape of the groove 104 on the first surface 103 can be rectangular, trapezoidal, rhombus-shaped, or even curved or curved. The embodiment of the present application does not limit the cross-sectional shape of the groove 104 on the first surface 103. The groove 104 between the first opening 101a and the second opening 102a can be used to prevent the liquid in the first pipe 101 from entering the second pipe 102 along the first surface 103.

[0051] In addition, in some embodiments, the first surface 103 of the base 100 can be a plane parallel to the ground surface, or a flat curved surface with a certain curvature, or an inclined plane with an angle with the ground. In other embodiments, the first surface 103 can also be an uneven surface.

[0052] The base provided in the embodiments of the present application has a groove 104 disposed between a first conduit 101 for transmitting gas and a second conduit 102 for transmitting liquid. This groove 104 collects liquid leaking from the second conduit 102 and blocks the leaked liquid from migrating along the first surface 103 of the base 100 into the first conduit 101. Even in the event of a poor seal or looseness between the base 100 and the gas distribution device, leaked liquid is prevented from contaminating the first conduit 101 and the equipment, reducing the risk of damage to the equipment.

[0053] In some embodiments, the main material of the base 100 is ceramic and is used in plasma enhanced chemical vapor deposition (PECVD) equipment. Specifically, PECVD technology is a technology that enhances the activity of reactive gases through plasma activation to promote chemical reactions and then grow a continuous thin film. Among them, the first pipe 101 can be specifically used to transmit process gases such as silane (SiH4), ammonia (NH3), argon (Ar), nitrogen (N2), oxygen (O2), or a mixture of the above process gases. The second pipe 102 can be used to transmit condensate, such as water.

[0054] In some embodiments, the base 100 further includes:

[0055] The sensor 201 is located on a first side wall of the base 100 and is used to detect whether leaked liquid is collected in the groove 104; wherein the first side wall intersects with the first surface.

[0056] Figure 2A FIG shows a top view of the base 100. Figure 2A As shown, the first opening 101a of the first conduit 101 and the second opening 102a of the second conduit 102 are arranged along the x-axis, and the groove 104 extends along the y-axis to the front and rear side walls of the base 100. The sensor 201 is located on the front or rear side wall. Of course, it is understood that the sensor 201 can also be mounted on the left or right side wall of the base. Figure 2B shows a front view of the base 100, Figure 2C FIG. 1 shows a cross-sectional view of the base 100 along the AA' section. Figures 2B to 2CAs shown, the plane where the bottom of the groove 104 is located is parallel to the first surface 103 of the base 100, and the sensor 201 is in contact with the bottom of the groove 104. In this embodiment, the sensor 201 can be a gravity sensor, an optical / electrical signal sensor or an image sensor, etc. Taking the gravity sensor as an example, it is possible to determine whether leaked liquid is collected in the groove 104 by sensing the gravity change in the groove, and then determine whether the liquid in the first pipe 101 is leaking. Taking the electric signal sensor as an example, a signal transmitting end and a receiving end can be set, and if the leaked liquid flows to the sensor and affects the optical / electrical signal received by the receiving end, it can be detected that a leak has occurred. Taking the image sensor as an example, if an image with liquid characteristics is collected, it can be determined that a leak has occurred. It should be noted that the specific type of sensor and the method of detecting leakage can be selected according to actual conditions, and the embodiments of the present application are not limited to the above-mentioned sensors.

[0057] In this embodiment, continue to refer to Figure 2C , the groove 104 passes through the front and rear side walls of the base 100. In some other embodiments, such as Figure 3 As shown, the groove 104 may only extend to the front side wall of the base 100. In this case, the sensor 201 may be disposed on the front side wall.

[0058] In some embodiments, the depth of the groove 104 gradually increases or decreases along the extension direction of the groove 104;

[0059] The groove 104 has a maximum depth at the first sidewall.

[0060] The depth of the groove 104 refers to the distance between the bottom of the groove 104 (the side close to the interior of the base) and the first surface 103 . Figure 4 A side cross-sectional view of the base 100 is shown. Figure 4 As shown, along the positive direction of the y-axis (the extension direction of the groove 104), the depth of the groove 104 gradually decreases; along the negative direction of the y-axis (the extension direction of the groove 104), the depth of the groove 104 gradually increases. The gradually changing depth of the groove 104 is conducive to the flow of liquid in the groove 104 and to the timely discharge of leaked liquid. The sensor 201 is located on the side of the groove 104 with the greatest depth. When liquid leaked from the second pipe 102 is collected in the groove 104, the liquid can be accelerated by gravity to be discharged along the bottom of the groove 104 to the sensor 201, which is conducive to the sensor 201 to detect the leakage phenomenon in time and to trigger the machine equipment alarm in time.

[0061] In some embodiments, continue to refer to Figure 4, an angle a is formed between the bottom extension direction of the groove 104 and the first surface 103 (perpendicular to the z-axis), and the angle a between the bottom extension direction of the groove 104 and the first surface 103 is greater than the first threshold value. Among them, the angle a is an acute angle less than 90°. The smaller the angle a is, the smaller the acceleration of the liquid under the action of gravity, the longer the time it may take for the liquid to move to the sensor 201, and the longer the time required for the sensor to detect the leakage of the liquid, which is not conducive to the extraction of the leaked liquid and is not conducive to timely discovery and treatment. In addition, the first threshold value can be determined based on the viscosity, surface tension and roughness of the inner wall of the pipe of the condensate. For example, the viscosity of the condensate is relatively large and its flow rate is relatively small. The value of the first threshold value can be slightly increased, and the angle a has a larger angle, which is conducive to the extraction of the leaked liquid.

[0062] In some embodiments, the angle α between the bottom extension direction of the groove 104 and the first surface 103 is greater than 10°. It should be noted that the specific angle between the bottom extension direction of the groove 104 and the first surface 103 can be set according to actual needs, and the embodiments of the present application do not limit the specific size of the angle.

[0063] In some embodiments, the groove 104 has an inclined second sidewall and a third sidewall, and the second sidewall intersects the third sidewall at the bottom of the groove 104 .

[0064] Figures 5A to 5B 1 and 2 show a front view and a top view of the base 100, respectively. Figure 5C FIG. 1 shows a partial cross-sectional view of the base 100 along the BB′ cross section. Figure 5C As shown, the groove 104 has a second side wall 401 and a third side wall 402 that intersect at an angle. In this embodiment, the second side wall 401 and the third side wall 402 are both planes. The extension direction of the intersection line of the second side wall 401 and the third side wall 402 is the extension direction of the bottom of the groove 104. In some other embodiments, the second side wall and the third side wall can also be curved surfaces that are convex or concave toward the outside of the base. In this case, the extension direction of the intersection line of the two curved surfaces is the extension direction of the bottom of the groove 104. Continue to refer to Figure 5B In this embodiment, the cross-sectional shape of the groove 104 on the xy plane is a rectangle, and the groove 104 extends along a straight line. In some other embodiments, such as Figure 6 As shown, the groove 104 can also be configured to extend along a curved direction.

[0065] In some embodiments, the groove 104 has a fourth sidewall and a fifth sidewall, and a bottom surface connecting the fourth sidewall and the fifth sidewall.

[0066] 7A to 7B 1 and 2 show a front view and a top view of the base 100, respectively. Figure 7CFIG. 1 shows a partial cross-sectional view of the base 100 along the CC' section. Figure 7C As shown, the groove 104 has a fourth sidewall 501, a fifth sidewall 502, and a bottom surface 503. The cross-sectional shape of the groove 104 in the CC' section (parallel to the xz plane) is a trapezoid that is wide at the top and narrow at the bottom. The fourth sidewall 501 and the fifth sidewall 502 respectively form the two sides of the trapezoid.

[0067] In another embodiment, the cross-sectional shape of the groove 104 in the CC' section is a rectangle. Specifically, the fourth side wall 501 and the fifth side wall 502 are parallel to each other, and the bottom surface 503 connecting the fourth side wall 501 and the fifth side wall 502 is a horizontal surface and is perpendicular to the fourth side wall 501 and the fifth side wall 502.

[0068] In the above embodiment, the fourth side wall 501, the fifth side wall 502 and the bottom surface 503 are all planes. In some other embodiments, the fourth side wall 501, the fifth side wall 502 and the bottom surface 503 may also be curved surfaces convex outward from the groove. Figure 8 As shown, the fourth side wall 501 and the fifth side wall 502 are both planes, and the bottom surface 503 connecting the fourth side wall 501 and the fifth side wall 502 is a curved surface convex toward the inside of the base.

[0069] It should be noted that the embodiment of the present application does not limit the cross-sectional shape of the groove, which may be the above-mentioned trapezoidal, rectangular, or triangular cross-section, or a semicircular cross-section, or a cross-section of a combination of different shapes.

[0070] In some embodiments, the minimum distance between the groove 104 and the first pipe 101 is greater than or equal to a second threshold; and / or the minimum distance between the groove 104 and the second pipe 102 is greater than or equal to a third threshold.

[0071] like Figure 9 As shown, on the first surface 103, there is a first distance L1 between the left edge of the groove 104 and the right edge of the first pipe 101 (i.e., the right edge of the first opening 101a), and a second distance L2 between the right edge of the groove 104 and the left edge of the second pipe 102 (i.e., the second opening 102a).

[0072] It should be noted that there needs to be a certain gap between the groove 104 and the first opening 101 a and the second opening 102 a to prevent leakage of gas and liquid.

[0073] In some embodiments, the minimum distance between the groove 104 and the first pipe 101 (first distance L1) is greater than or equal to 1 mm. In some embodiments, the minimum distance between the groove 104 and the second pipe 102 (second distance L2) is greater than or equal to 1 mm. Of course, it is understood that in some embodiments, both the first distance L1 and the second distance L2 can be set to be greater than or equal to 1 mm.

[0074] In some embodiments, as Figure 10 As shown, the second pipe 102 includes a plurality of sub-channels 901 ; the minimum distance (second distance L2 ) between the groove 104 and any sub-channel 901 is smaller than the minimum distance (first distance L1 ) between the groove 104 and the first pipe 101 .

[0075] In this embodiment, the arrangement direction of the two sub-channels 901 is the same as the extension direction of the groove 104. In some other embodiments, such as Figure 11 As shown, the arrangement direction of the plurality of sub-channels 901 may be different from the extension direction of the groove 104. In other embodiments, the plurality of sub-channels may be arranged in an array. It should be noted that the embodiments of the present application do not limit the specific number and arrangement of the sub-channels, as long as the sub-channels for transmitting liquid and the first pipeline for transmitting gas are respectively located on both sides of the groove.

[0076] The distance between the groove 104 and any sub-channel of the second pipe 102 can be smaller than the distance between the groove 104 and the first pipe 101. Thus, if liquid leaks from the second pipe 102, it can quickly flow to the groove 104. The distance between the first pipe 101 and the groove 104 is greater, further effectively preventing the leaked liquid from contaminating the first pipe 101.

[0077] Based on the same inventive concept, the embodiment of the present application further provides a gas phase process equipment 110, such as Figure 12 As shown, it includes the base 100, the gas distribution device 200 and a plurality of sealing members 300 as described above;

[0078] The gas distribution device 200 is provided with a third pipe 210 for transmitting gas and a fourth pipe 220 for transmitting liquid;

[0079] The sealing member 300 is located between the first surface of the base 100 and the gas distribution device 200 , and is used to seal the connection between the first pipe 101 and the third pipe 210 , and the connection between the second pipe 102 and the fourth pipe 220 .

[0080] The gas-phase processing equipment 110 in the embodiment of the present application has a groove 104 on the upper surface of the base 100. This groove 104 is located between the first conduit 101 for gas transmission and the second conduit 102 for liquid transmission. This groove 104 collects liquid leaking from the second conduit 102 and blocks the leaked liquid from migrating along the first surface of the base into the first conduit 101. Even in the event of a poor seal or looseness between the base and the gas distribution device, leaked liquid is prevented from contaminating the first conduit 101 and the equipment, reducing the risk of damage to the equipment.

[0081] In some embodiments, the sealing member 300 may include a single rubber seal or multiple rubber seals stacked vertically. When looseness occurs between the base 100 and the gas distribution device 200, small gaps may appear between the rubber seal and the first surface, or between the rubber seals themselves, potentially leading to poor sealing between the second and fourth conduits and liquid leakage.

[0082] In some embodiments, the gas phase process equipment is a PECVD equipment. The gas distribution device 200 is a gas distribution aluminum block, which can be used to ensure that the process gas can be evenly distributed, thereby achieving uniform deposition of the film. Figure 12 The gas separation aluminum block includes a third pipe 210 and a fifth pipe 211 that interconnect and are used to transport gas. The third pipe 210 has a larger aperture, while the fifth pipe 211 has a smaller aperture. It is understood that the gas separation aluminum block may include multiple fifth pipes 211 connected to the third pipe 210. Gas in the third pipe 210 can enter the reaction chamber through multiple fifth pipes 211 with smaller apertures to ensure uniform gas distribution.

[0083] It should be noted that the first and second conduits 101, 102 in this embodiment can be integrally formed within the base 100. The third, fourth, and fifth conduits 210, 220, and 211 can also be integrally formed within the gas separation aluminum block. This means that the transmission medium (gas or liquid) within the first and second conduits 101, 102 is in direct contact with the gas separation aluminum block.

[0084] The various embodiments / implementations provided in this application can be combined with each other without causing any contradiction.

[0085] The above are merely preferred embodiments of the present application and are not intended to limit the present application. Persons skilled in the art will readily appreciate that various modifications and variations are possible. Any modifications, equivalent substitutions, or improvements made within the spirit and principles of the present application shall be included within the scope of protection of the present application.

Claims

1. A base, characterized in that: The base is suitable for gas-phase process equipment, and is provided with a first pipe for transmitting gas and a second pipe for transmitting liquid; the first pipe and the second pipe are at least partially located within the base and extend from the interior of the base to the first surface of the base respectively; the first pipe has a first opening exposed on the first surface; the second pipe has a second opening exposed on the first surface; a gas distribution device is provided on the first surface and communicates through the first opening and the second opening, and a sealing member surrounding the first opening and the second opening is provided between the first surface and the gas distribution device; The groove is located on the first surface and between the first opening and the second opening, and is used to collect liquid leaked from the second pipe along the first surface.

2. The base according to claim 1, wherein: Also includes: a sensor, located on the first side wall of the base, for detecting whether the leaked liquid is collected in the groove; Wherein, the first side wall intersects with the first surface.

3. The base according to claim 2, characterized in that Along the extending direction of the groove, the depth of the groove gradually increases or gradually decreases; The groove has a maximum depth at the first sidewall.

4. The base according to claim 3, characterized in that An angle between an extension direction of a bottom of the groove and the first surface is greater than a first threshold.

5. The base according to any one of claims 1 to 4, characterized in that: The groove has an inclined second side wall and a third side wall, and the second side wall intersects the third side wall at the bottom of the groove.

6. The base according to any one of claims 1 to 4, characterized in that: The groove has a fourth side wall, a fifth side wall, and a bottom surface connecting the fourth side wall and the fifth side wall.

7. The base according to any one of claims 1 to 4, characterized in that: The minimum distance between the groove and the first pipe is greater than or equal to a second threshold; and / or the minimum distance between the groove and the second pipe is greater than or equal to a third threshold.

8. The base according to any one of claims 1 to 4, characterized in that: The second pipe includes a plurality of sub-channels; the minimum distance between the groove and any of the sub-channels is smaller than the minimum distance between the groove and the first pipe.

9. The base according to claim 8, characterized in that The arrangement direction of the plurality of sub-channels is the same as the extension direction of the groove.

10. A gas phase process equipment, characterized in that: comprising the base according to any one of claims 1 to 9, the gas distribution device and a plurality of the sealing members; The gas distribution device is provided with a third pipeline for transmitting gas and a fourth pipeline for transmitting liquid; The sealing member is located between the first surface of the base and the gas distribution device, and is used to seal the connection between the first pipe and the third pipe, and the connection between the second pipe and the fourth pipe.

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