Intelligent conveying system for semiconductor workshop
By designing an intelligent conveying system for semiconductor workshops, convenient cleaning and water collection of wafers are achieved using conveyor belts, nozzles and blowers, which solves the cleaning problem during wafer transportation and improves production efficiency.
Patent Information
- Application Number
- CN202422396498.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-09-30
- Publication Date
- 2025-09-26
- Estimated Expiration
- 2034-09-30
AI Technical Summary
The wafers are inconvenient to clean during transportation and the cleaning water is difficult to collect.
An intelligent conveying system for semiconductor workshops was designed, which includes a conveyor belt, a cleaning structure and a blower mechanism. The system cleans and collects water by spraying water through a nozzle, and uses a water collection frame and a blower mechanism to achieve cleaning and water collection.
It realizes convenient cleaning of wafers during transportation and effective collection of cleaning water, thereby improving production efficiency.
Smart Images

Figure CN223390515U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to semiconductor conveying technology, in particular to an intelligent conveying system for a semiconductor workshop. Background Art
[0002] In semiconductor workshops, wafers usually need to be transported and cleaned. Wafers refer to silicon chips used in the production of silicon semiconductor integrated circuits. Because of their round shape, they are called wafers. Various circuit component structures can be processed on silicon wafers.
[0003] Existing wafers need to have their outer surfaces cleaned during the production and transportation process. Currently, it is often inconvenient to clean single wafers during transportation, and it is also inconvenient to collect the cleaning water. Utility Model Content
[0004] The purpose of the utility model is to provide an intelligent conveying system for semiconductor workshops, which is used to solve the problem that existing wafers are often inconvenient to clean during the conveying process and it is inconvenient to collect cleaning water.
[0005] In order to solve the above problems, the utility model provides an intelligent conveying system for a semiconductor workshop, comprising two rotating shafts rotatably connected to the two ends of two support rods, conveyor belts are provided on the two rotating shafts, cleaning structures are provided at the tail ends of the two support rods, and a blower structure is provided below the two support rods. The cleaning structure includes a support beam, a connecting pipe and a nozzle, the support beam is fixedly installed on the tail ends of the two support rods, the connecting pipe is fixedly installed to the support beam, the nozzle is installed at the bottom of the connecting pipe, a water collecting frame is provided below the tail ends of the two support rods, the bottom of the water collecting frame is inclined, a bracket is fixedly installed at the bottom of the two support rods, and the water collecting frame is fixedly connected to the top of the bracket.
[0006] The semiconductor workshop intelligent conveying system provided by the utility model also has the following technical features:
[0007] Furthermore, support platforms are respectively fixed on opposite sides of the two support rods.
[0008] Furthermore, there are multiple pipes and nozzles, and the multiple pipes are fixedly installed on the support beam. The multiple nozzles are respectively installed on the bottom of the corresponding pipes. The tops of the multiple pipes are fixedly connected to a water inlet pipe, and one end of the water inlet pipe is in a sealed state.
[0009] Furthermore, the hair dryer mechanism includes a base frame, a motor and fan blades. The motor is fixedly mounted on the bottom of the base frame, and the output end of the motor is fixedly mounted on the fan blades.
[0010] Furthermore, a collection box is fixedly connected to a lower side of the water collection frame, and a drainage pipe is fixedly connected to one side of the collection box.
[0011] Furthermore, a detachable support net is provided on the top of the collection box, and the support net is arranged in an H shape.
[0012] The utility model has the following beneficial effects: by placing the wafers on one side of the conveyor belt in sequence, the conveyor belt drives the wafers to move; when the wafers move to the other side of the conveyor belt, the pipe is connected to the water source, and water is sprayed through the nozzle, so that the surface of the wafer can be cleaned, and the water on the surface of the conveyor belt can fall to the lower side of the water collection frame for collection, and the lower conveyor belt can be dried by the hair dryer mechanism, so that the device is easy to clean during the wafer production and transportation process, and the cleaning water is easy to collect. BRIEF DESCRIPTION OF THE DRAWINGS
[0013] Figure 1 This is an axonometric diagram of an embodiment of the present utility model;
[0014] Figure 2 A perspective view of a broken embodiment of the present invention;
[0015] Figure 3 This is a front view cutaway diagram of a fractured embodiment of the present utility model;
[0016] Figure 4 It is a right side cutaway view of an embodiment of the present invention. DETAILED DESCRIPTION
[0017] The present invention will be described in detail below with reference to the accompanying drawings and in combination with embodiments. It should be noted that, in the absence of conflict, the embodiments and features of the embodiments of the present invention can be combined with each other.
[0018] like Figures 1 to 4In the embodiment of the semiconductor workshop intelligent conveying system of the utility model shown, the semiconductor workshop intelligent conveying system includes two rotating shafts 11 rotatably connected to the two ends of the two support rods 1, and a conveyor belt 12 is provided on the two rotating shafts 11. A servo motor is fixedly installed on one of the support rods 1, and the output end of the servo motor is connected to one of the rotating shafts 11. A cleaning structure 2 is provided at the tail end of the two support rods 1, and a blower structure 3 is provided below the two support rods 1. The cleaning structure 2 includes a support beam 201, a pipe 202 and a nozzle 203. The support beam 201 is fixedly installed on the tail end of the two support rods 1, the pipe 202 is fixedly installed on the support beam 201, and the nozzle 203 is installed at the bottom of the pipe 202. A water collecting frame 4 is provided below the tail end of each support rod 1. The bottom of the water collecting frame 4 is inclined. A bracket 5 is fixedly installed at the bottom of the two support rods 1. The water collecting frame 4 is fixedly connected to the top of the bracket 5. The wafers are placed on one side of the conveyor belt 12 in turn, and the conveyor belt 12 drives the wafer to move. When the wafer moves to the other side of the conveyor belt 12, the pipe 202 is connected to the water source, and water is sprayed through the nozzle 203, so that the surface of the wafer can be cleaned, and the water on the surface of the conveyor belt 12 can fall to the lower side of the water collecting frame 4 for collection, and the lower conveyor belt 12 can be dried by the hair dryer mechanism 3, so that the device is easy to clean during the wafer production and transportation process, and it is easy to collect cleaning water.
[0019] In one embodiment of the present application, preferably, support platforms 6 are respectively fixed to opposite sides of the two support rods 1. The provision of the support platforms 6 can facilitate use by operators.
[0020] In one embodiment of the present application, preferably, there are multiple connecting pipes 202 and nozzles 203, and the multiple connecting pipes 202 are fixedly installed on the support beam 201. The multiple nozzles 203 are respectively installed on the bottom of the corresponding connecting pipes 202. The tops of the multiple connecting pipes 202 are fixedly connected to a water inlet pipe 7, one end of the water inlet pipe 7 is in a sealed state, and one end of the water inlet pipe 7 is connected to a water source. By setting multiple nozzles 203 and multiple connecting pipes 202, it is convenient to expand the cleaning range.
[0021] In one embodiment of the present application, preferably, the hair drying mechanism 3 includes a base frame 301, a motor 302 and fan blades 303. The motor 302 is fixedly installed at the bottom of the base frame 301, and the output end of the motor 302 is fixedly installed with the fan blades 303. By starting the motor 302, the fan blades 303 can be driven to rotate and blow air, thereby facilitating the drying of the conveyor belt 12 transmitted to the lower side.
[0022] In one embodiment of the present application, preferably, a collection box 8 is fixedly connected to the lower side of the water collection frame 4, and a drain pipe 9 is fixedly connected to one side of the collection box 8. The water in the water collection frame 4 can be collected by the collection box 8 and discharged through the drain pipe 9.
[0023] In one embodiment of the present application, preferably, a detachable support net 10 is provided on the top of the collection box 8, and the support net 10 is arranged in an H shape. Through the arrangement of the support net 10, it can collect wafers that accidentally fall, and is convenient for collecting cleaning water to prevent water from falling to the ground. The H-shaped support net 10 is convenient for placement and connection, and plays a role in water blocking.
[0024] When the present invention is in use, the wafers are placed on one side of the conveyor belt 12 in sequence, and the conveyor belt 12 drives the wafers to move. When the wafers move to the other side of the conveyor belt 12, the water inlet pipe 7 is connected to the water source, and water is sprayed through the connecting pipe 202 and the nozzle 203, so that the surface of the wafer can be cleaned, and the water on the surface of the conveyor belt 12 can fall to the lower side of the water collection frame 4 for collection, and the collection box 8 can collect the water in the water collection frame 4 and discharge it through the drain pipe 9. Starting the motor 302 can drive the fan blades 303 to rotate and blow air, so as to facilitate the drying of the conveyor belt 12 driven to the lower side, so that the device is easy to clean during the wafer production and transportation process, and it is easy to collect cleaning water.
[0025] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit it. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or make equivalent replacements for some of the technical features therein. However, these modifications or replacements do not deviate the essence of the corresponding technical solutions from the spirit and scope of the technical solutions of the various embodiments of the present invention.
Claims
1. An intelligent conveying system for a semiconductor workshop, comprising two rotating shafts (11) rotatably connected to the two ends of two supporting rods (1), and a conveyor belt (12) is provided on the two rotating shafts (11), characterized in that: A cleaning structure (2) is provided at the tail ends of the two support rods (1), and a blower structure (3) is provided below the two support rods (1). The cleaning structure (2) comprises a support beam (201), a connecting pipe (202) and a nozzle (203). The support beam (201) is fixedly mounted on the tail ends of the two support rods (1), the connecting pipe (202) is fixedly mounted on the support beam (201), and the nozzle (203) is mounted on the bottom of the connecting pipe (202). A water collecting frame (4) is provided below the tail ends of the two support rods (1), and the bottom of the water collecting frame (4) is inclined. A bracket (5) is fixedly mounted on the bottom of the two support rods (1), and the water collecting frame (4) is fixedly connected to the top of the bracket (5).
2. The semiconductor workshop intelligent conveying system according to claim 1, characterized in that: Support platforms (6) are respectively fixed on opposite sides of the two support rods (1).
3. The semiconductor workshop intelligent conveying system according to claim 1, characterized in that: There are a plurality of pipes (202) and nozzles (203), each of the pipes (202) is fixedly mounted on the support beam (201), and each of the nozzles (203) is mounted on the bottom of a corresponding pipe (202). The tops of the pipes (202) are fixedly connected to a water inlet pipe (7), and one end of the water inlet pipe (7) is in a sealed state.
4. The semiconductor workshop intelligent conveying system according to claim 1, characterized in that: The hair dryer structure (3) comprises a base frame (301), a motor (302) and fan blades (303); the motor (302) is fixedly mounted on the bottom of the base frame (301); and the output end of the motor (302) is fixedly mounted on the fan blades (303).
5. The semiconductor workshop intelligent conveying system according to claim 1, characterized in that: A collection box (8) is fixedly connected to a lower side of the water collection frame (4), and a drainage pipe (9) is fixedly connected to one side of the collection box (8).
6. The semiconductor workshop intelligent conveying system according to claim 5, characterized in that: A detachable support net (10) is provided on the top of the collection box (8), and the support net (10) is arranged in an H shape.