Circulating water tank system of photoetching machine

Abstract

The utility model relates to a circulating water tank system of a photoetching machine, and relates to the technical field of semiconductor manufacturing. In the circulation water tank system of the photoetching machine, a first water circulation pipeline is connected in series with a water supply device, a second water circulation pipeline is connected in series with the photoetching machine, and a third water circulation pipeline is connected in parallel with the first water circulation pipeline. When the first water circulation pipeline is in an abnormal state, the first valve and the second valve turn off the first water circulation pipeline, the third water circulation pipeline connected with the first water circulation pipeline in parallel is adopted to cool water in the second water circulation pipeline, and meanwhile, the second water circulation pipeline cools the photoetching machine. By adopting the circulation water tank system of the photoetching machine, the water circulation path can be timely switched off and switched when the first water circulation pipeline goes wrong, so that the temperature of the photoetching machine is kept constant, and the quality of subsequent wafer products is improved.

Description

Technical Field

[0001] The present application relates to the field of semiconductor manufacturing technology, and in particular to a circulating water tank system for a photolithography machine. Background Art

[0002] Photolithography machines are key equipment in semiconductor manufacturing. They generate significant heat during daily operation. If their temperature is not properly controlled, excessively high temperatures can affect the line width and overlay accuracy of exposed wafers, resulting in a large number of defective wafers.

[0003] The circulating water tank system of a photolithography machine can cool the machine. Traditionally, the cooling water in this system is supplied by a water supply. To ensure a constant temperature for the machine's internal components, the cooling water temperature must be controlled to prevent significant fluctuations. However, during the operation of the machine, unexpected abnormalities in the water supply temperature can occur, causing internal water temperature fluctuations within the machine and impacting wafer production. Utility Model Content

[0004] Based on this, a photolithography machine circulating water tank system is provided to address the situation where an abnormality occurs in the photolithography machine circulating water tank.

[0005] In order to achieve the above-mentioned purpose, the utility model provides a circulating water tank system for a lithography machine, comprising:

[0006] A first water circulation pipeline, a second water circulation pipeline, a third water circulation pipeline, a first valve, and a second valve;

[0007] The first water circulation pipeline is connected in series with the water supply device to provide cold water to reduce the temperature of the water in the second water circulation pipeline;

[0008] The first valve and the second valve are both located on the first water circulation pipeline, and the first end of the first valve is connected to the water inlet port of the first water circulation pipeline, the second end of the first valve is connected to the first end of the second valve, the third end of the first valve is connected to the second end of the second valve, and the second end of the second valve is connected to the water outlet port of the first water circulation pipeline. The first valve and the second valve are used to shut off the first water circulation pipeline;

[0009] The second water circulation pipeline is connected in series with the photolithography machine to reduce the temperature of the photolithography machine;

[0010] The third water circulation pipeline is connected in parallel with the first water circulation pipeline, and the first end of the third water circulation pipeline is connected to the second end of the first valve, and the second end of the third water circulation pipeline is connected to the first end of the second valve. The third water circulation pipeline is used to reduce the temperature of the water in the second water circulation pipeline when an abnormal state occurs in the first water circulation pipeline.

[0011] In one embodiment, the third water circulation pipeline includes:

[0012] a first storage tank, a third valve, and a first water pump;

[0013] The first end of the first storage tank is connected to the first end of the first water pump, and the first storage tank is used to store water;

[0014] The second end of the first water pump serves as the first end of the third water circulation pipeline, and the first water pump is used to start the third water circulation pipeline;

[0015] The first end of the third valve is connected to the second end of the first storage tank, the second end of the third valve serves as the second end of the third water circulation pipeline, and the third valve is used to open or close the third water circulation pipeline.

[0016] In one embodiment, the third water circulation pipeline further includes:

[0017] The first condenser is located in the first storage tank and is used to cool the water in the first storage tank.

[0018] In one embodiment, the third water circulation pipeline further includes:

[0019] The second condenser has a first end connected to the second end of the third valve, and the second end of the second condenser serves as the second end of the third water circulation pipeline, and is used to cool the water in the third water circulation pipeline.

[0020] In one embodiment, the third water circulation pipeline further includes:

[0021] a first branch, wherein a first end of the first branch is connected to the third end of the first storage tank, and a second end of the first branch is connected to the water inlet port of the first water circulation pipeline, for storing water in the first storage tank;

[0022] The fourth valve is located on the first branch and is used to open or close the first branch.

[0023] In one embodiment, the lithography machine circulating water tank system further includes:

[0024] The first temperature detection device is located between the water inlet port of the first water circulation pipeline and the first valve, and is used to monitor the temperature state of the first water circulation pipeline.

[0025] In one embodiment, the lithography machine circulating water tank system further includes:

[0026] A fifth valve is located between the first valve and the second valve, and is used to control the water flow rate in the first water circulation pipeline or the third water circulation pipeline.

[0027] In one embodiment, the lithography machine circulating water tank system further includes:

[0028] The second temperature detection device is located on the third water circulation pipeline and is used to monitor the temperature state of the third water circulation pipeline.

[0029] In one embodiment, the lithography machine circulating water tank system further includes:

[0030] The heat exchanger is located between the first water circulation pipeline and the second water circulation pipeline, and is used to exchange the temperatures of the first water circulation pipeline and the second water circulation pipeline to reduce the temperature of the water in the second water circulation pipeline.

[0031] In one embodiment, the second water circulation pipeline includes:

[0032] a second storage tank, a heater, a second water pump, a sixth valve, a seventh valve, and an eighth valve;

[0033] The first end of the second storage tank is connected to the first end of the heater, and the second storage tank is used to store water;

[0034] The second end of the heater is connected to the first end of the sixth valve, and the heater is used to heat the water in the second water circulation pipeline to reach a preset temperature of the lithography machine;

[0035] The second end of the sixth valve is connected to the first end of the seventh valve, and the sixth valve is used to control the water flow rate in the second water circulation pipeline;

[0036] The second end of the seventh valve is connected to the first end of the photolithography machine, and the seventh valve is used to open or close the second water circulation pipeline;

[0037] The first end of the second water pump is connected to the second end of the second storage tank, and the second water pump is used to start the second water circulation pipeline;

[0038] The second end of the second water pump is connected to the first end of the eighth valve, the second end of the eighth valve is connected to the second end of the photolithography machine, the third end of the eighth valve is connected to the first end of the sixth valve, and the eighth valve is used to control the second water circulation pipeline for pretreatment.

[0039] Compared with the existing technology, the above technical solution has the following advantages:

[0040] The above-mentioned photolithography machine circulating water tank system includes a first water circulation pipeline, a second water circulation pipeline, a third water circulation pipeline, a first valve, and a second valve. The first water circulation pipeline is connected in series with a water supply device, the second water circulation pipeline is connected in series with the photolithography machine, and the third water circulation pipeline is connected in parallel with the first water circulation pipeline. When the first water circulation pipeline is in normal operation, the water supply device provides cold water to the first water circulation pipeline, and the first water circulation pipeline cools the water in the second water circulation pipeline, while the second water circulation pipeline also cools the photolithography machine. When the first water circulation pipeline experiences an abnormality, the first and second valves shut off the first water circulation pipeline, and the third water circulation pipeline, connected in parallel with the first water circulation pipeline, cools the water in the second water circulation pipeline, while the second water circulation pipeline also cools the photolithography machine. This photolithography machine circulating water tank system can promptly shut down and switch the water circulation path when a problem occurs in the first water circulation pipeline, ensuring a constant temperature in the photolithography machine and improving the quality of subsequent wafer products. BRIEF DESCRIPTION OF THE DRAWINGS

[0041] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the conventional technology, the following briefly introduces the drawings required for use in the embodiments or the conventional technology descriptions. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.

[0042] Figure 1 A partial structural diagram of a circulating water tank system for a lithography machine is provided for an embodiment of the present application;

[0043] Figure 2 A schematic diagram of another part of the structure of a circulating water tank system for a lithography machine is provided for an embodiment of the present application;

[0044] Figure 3 A schematic diagram of another part of the structure of a circulating water tank system for a lithography machine is provided for an embodiment of the present application;

[0045] Figure 4 A schematic diagram of another part of the structure of a circulating water tank system for a lithography machine is provided for an embodiment of the present application;

[0046] Figure 5A schematic diagram of another part of the structure of a circulating water tank system for a lithography machine is provided for an embodiment of the present application;

[0047] Figure 6 A schematic diagram of another part of the structure of a circulating water tank system for a lithography machine is provided for an embodiment of the present application;

[0048] Figure 7 A schematic diagram of another part of the structure of a circulating water tank system for a lithography machine is provided for an embodiment of the present application;

[0049] Figure 8 A structural schematic diagram of a circulating water tank system for a lithography machine is provided for an embodiment of the present application.

[0050] Explanation of the accompanying drawings: 01-first water circulation pipeline, 02-second water circulation pipeline, 03-third water circulation pipeline, 04-first valve, 05-second valve, 06-first storage tank, 07-third valve, P1-first water pump, 08-first condenser, 081-second condenser, 031-first branch, 09-fourth valve, 10-first temperature detection device, 11-fifth valve, 12-second temperature detection device, 13-heat exchanger, 14-second storage tank, 15-heater, P2-second water pump, 16-sixth valve, 17-seventh valve, 18-eighth valve. DETAILED DESCRIPTION

[0051] To facilitate understanding of the present application, the present application will be described more fully below with reference to the accompanying drawings. The accompanying drawings provide embodiments of the present application. However, the present application may be implemented in many different forms and is not limited to the embodiments described herein. Rather, these embodiments are provided to make the disclosure of the present application more thorough and comprehensive.

[0052] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as those commonly understood by those skilled in the art to which this application pertains. The terms used herein in the specification of this application are for the purpose of describing specific embodiments only and are not intended to limit this application.

[0053] It will be understood that when a layer is referred to as being "on," "adjacent," or "connected to" another layer, it can be directly on, adjacent, or connected to the other layer, or intervening layers may be present. In contrast, when an element is referred to as being "directly on," "directly adjacent," or "directly connected to" another layer, there are no intervening layers present.

[0054] When used herein, the singular forms "a", "an", and "the" may also include the plural forms, unless the context clearly indicates otherwise. It should also be understood that the terms "include / comprise" or "have" and the like specify the presence of stated features, integers, steps, operations, components, parts, or combinations thereof, but do not preclude the possibility of the presence or addition of one or more other features, integers, steps, operations, components, parts, or combinations thereof.

[0055] Based on the content in the background technology, the exposure lens of the lithography machine is particularly prone to generating high heat. If the exposure lens cannot be cooled at all times to ensure constant temperature, it will cause abnormal temperature inside the lithography machine, resulting in long-term downtime affecting production and producing a large number of non-compliant wafer products.

[0056] Based on this, the present application provides a circulating water tank system for a photolithography machine, comprising a first water circulation pipeline 01, a second water circulation pipeline 02, a third water circulation pipeline 03, a first valve 04, and a second valve 05. The first water circulation pipeline 01 is connected in series with a water supply device, the second water circulation pipeline 02 is connected in series with the photolithography machine, and the third water circulation pipeline 03 is connected in parallel with the first water circulation pipeline 01. When the first water circulation pipeline 01 is in a normal state, the water supply device provides cold water to the first water circulation pipeline 01, which cools the water in the second water circulation pipeline 02, while the second water circulation pipeline 02 cools the photolithography machine. When the first water circulation pipeline 01 experiences an abnormal state, the first valve 04 and the second valve 05 shut off the first water circulation pipeline 01, and the third water circulation pipeline 03 is used to cool the water in the second water circulation pipeline 02, while the second water circulation pipeline 02 cools the photolithography machine. By adopting this photolithography machine circulating water tank system, when a problem occurs in the first water circulation pipeline 01, the water circulation path can be shut down and changed in time, ensuring that the temperature of the photolithography machine remains constant, thereby improving the quality of subsequent wafer products.

[0057] In order to make the above-mentioned purposes, features and advantages of the present application more obvious and easy to understand, the present application is further described in detail below with reference to the accompanying drawings and specific implementation methods.

[0058] Please refer to Figure 1 , Figure 1 A partial structural schematic diagram of a circulating water tank system of a lithography machine is provided for an embodiment of the present application; the circulating water tank system of the lithography machine includes: a first water circulation pipeline 01, a second water circulation pipeline 02, a third water circulation pipeline 03, a first valve 04 and a second valve 05.

[0059] The first water circulation pipeline 01 is connected in series with the water supply device to provide cold water to reduce the temperature of the water in the second water circulation pipeline 02.

[0060] The first valve 04 and the second valve 05 are both located on the first water circulation pipeline 01, and the first end 04a of the first valve 04 is connected to the water inlet port 01a of the first water circulation pipeline 01, the second end 04b of the first valve 04 is connected to the first end 05a of the second valve 05, the third end 04c of the first valve 04 is connected to the second end 05b of the second valve 05, and the second end 05b of the second valve 05 is connected to the water outlet port 01b of the first water circulation pipeline 01. The first valve 04 and the second valve 05 are used to shut off the first water circulation pipeline 01.

[0061] The second water circulation pipeline 02 is connected in series with the photolithography machine to reduce the temperature of the photolithography machine.

[0062] The third water circulation pipeline 03 is connected in parallel with the first water circulation pipeline 01, and the first end 03a of the third water circulation pipeline 03 is connected to the second end 04b of the first valve 04, and the second end 03b of the third water circulation pipeline 03 is connected to the first end 05a of the second valve 05. The third water circulation pipeline 03 is used to lower the temperature of the water in the second water circulation pipeline 02 when an abnormal state occurs in the first water circulation pipeline 01.

[0063] Specifically, the water supply device can supply water for factory services, wherein the factory services water supply has a uniform requirement for water temperature, which generally needs to be lower than 18°, for example, generally between 16°-18°.

[0064] The first water circulation pipeline 01 is connected to a water supply device, which introduces cold water from the water inlet port 01a of the first water circulation pipeline 01. The cold water lowers the temperature of the water in the second water circulation pipeline 02 and then flows out from the water outlet port 01b of the first water circulation pipeline 01.

[0065] A first valve 04 and a second valve 05 are provided on the first water circulation pipeline 01. The first valve 04 and the second valve 05 can both be solenoid valves, which can automatically switch the flow direction of the cold water flowing into the water supply device according to temperature changes.

[0066] When the first water circulation pipeline 01 operates normally, the first valve 04 connects the first end 04a and the second end 04b, closes the third end 04c, and the second valve 05 is turned on. The water supplied by the water supply device flows into the water inlet port 01a of the first water circulation pipeline 01, passes through the first valve 04 and the second valve 05, and flows out from the water outlet port 01b of the first water circulation pipeline 01, thereby lowering the temperature of the water in the second water circulation pipeline 02.

[0067] When the first water circulation pipeline 01 is in abnormal state, the first valve 04 is switched on the first end 04a and the third end 04c, and switched off the second end 04b, the second valve 05 is switched off, the first water circulation pipeline 01 is switched off, the water supplied by the water supply device flows into the water inlet port 01a of the first water circulation pipeline 01, passes through the first valve 04, and then directly flows out from the water outlet port 01b of the first water circulation pipeline 01. At this time, the third water circulation pipeline 03 connected in parallel with the first water circulation pipeline 01 is switched on, and the third water circulation pipeline 03 is used to reduce the temperature of the water in the second water circulation pipeline 02.

[0068] The second water circulation pipeline 02 is connected in series with the photoetching machine, and the water in the second water circulation pipeline 02 can be ultrapure water. When the water in the second water circulation pipeline 02 flows through the photoetching machine, the temperature of the water is low, heat exchange is performed, thereby reducing the temperature of the photoetching machine, and the water in the second water circulation pipeline 02, which is increased in temperature, performs heat exchange with the water in the first water circulation pipeline 01 or the third water circulation pipeline 03, thereby reducing the temperature of the water in the second water circulation pipeline 02 again, so as to form the photoetching machine circulating water tank system.

[0069] In the embodiment, the first water circulation pipeline 01 is connected in series with the water supply device, the second water circulation pipeline 02 is connected in series with the photoetching machine, and the third water circulation pipeline 03 is connected in parallel with the first water circulation pipeline 01. When the first water circulation pipeline 01 is in normal state, the water supply device supplies cold water to the first water circulation pipeline 01, the first water circulation pipeline 01 reduces the temperature of the water in the second water circulation pipeline 02, and at the same time, the second water circulation pipeline 02 reduces the temperature of the photoetching machine. When the first water circulation pipeline 01 is in abnormal state, the first valve 04 and the second valve 05 are switched off the first water circulation pipeline 01, and the third water circulation pipeline 03 is used to reduce the temperature of the water in the second water circulation pipeline 02, and at the same time, the second water circulation pipeline 02 reduces the temperature of the photoetching machine. By using the photoetching machine circulating water tank system, when the first water circulation pipeline 01 is in abnormal state, the water circulation path can be switched off and converted in time, the temperature of the photoetching machine is maintained constant, and the quality of subsequent wafer products is improved.

[0070] In some embodiments, the third water circulation pipeline 03 is used to replace the first water circulation pipeline 01, and the situation that the water in the first water circulation pipeline 01, which is abnormal in temperature, causes the photoetching machine to be shut down again when the temperature of the water in the first water circulation pipeline 01 is restored to normal can also be avoided.

[0071] In another embodiment of the present application, with reference to Figure 2 , Figure 2 Another part of the structure of the photoetching machine circulating water tank system is provided in the embodiment of the present application; the third water circulation pipeline 03 comprises a first storage tank 06, a third valve 07, and a first water pump P1.

[0072] The first end 06a of the first storage tank 06 is connected to the first end P1a of the first water pump P1, and the first storage tank 06 is used to store water.

[0073] The first end P1 b of the first water pump P1 serves as the first end 03 a of the third water circulation pipeline 03 , and the first water pump P1 is used to start the third water circulation pipeline 03 .

[0074] The first end 07a of the third valve 07 is connected to the second end 06b of the first storage tank 06 , and the second end 07b of the third valve 07 serves as the second end 03b of the third water circulation pipeline 03 . The third valve 07 is used to open or close the third water circulation pipeline 03 .

[0075] Specifically, the first storage tank 06 is used to store water for cooling in the third water circulation pipeline 03. The temperature of the water in the first storage tank 06 can be between 16° and 18°, which is lower than the normal operating temperature of the lithography machine, so as to reduce the temperature of the water in the second water circulation pipeline 02.

[0076] The first water pump P1 is used to activate the third water circulation pipeline 03, that is, to pump water from the first storage tank 06 and force it to flow through the third water circulation pipeline 03. The third valve 07 can be a solenoid valve. When the first water circulation pipeline 01 is closed, the third valve 07 will automatically open to ensure that the third water circulation pipeline 03 is connected.

[0077] It should be noted that the water in the third water circulation pipeline 03 can also be supplied to other water supply equipment, and the first storage tank 06 is preferred here.

[0078] In this embodiment, the installation of a first storage tank 06 in the third water circulation pipeline 03 ensures a stable water supply without requiring additional water supply equipment or increasing the system's footprint. The installation of a first water pump P1 and a third valve 07 ensures that the third water circulation pipeline 03 is closed when the first water circulation pipeline 01 is operating, minimizing the impact of external factors.

[0079] In another embodiment of the present application, reference Figure 3 , Figure 3 A structural schematic diagram of another part of a circulating water tank system of a lithography machine is provided for an embodiment of the present application; the third water circulation pipeline 03 also includes: a first condenser 08, located in the first storage tank 06, for cooling the water in the first storage tank 06.

[0080] Specifically, when the third water circulation pipeline 03 is running, the water drawn from the first storage tank 06 exchanges heat with the water in the second water circulation pipeline 02 and then returns to the first storage tank 06 to ensure that the water circulation can be carried out. At this time, due to the increased temperature of the returned water, the subsequent cooling will be affected, so the first condenser 08 is arranged in the first storage tank 06 to condense the returned water, so as to ensure that the temperature of the water in the first storage tank 06 is lower than that of the water in the second water circulation pipeline 02. The third water circulation pipeline 03 realizes the cooling of the second water circulation pipeline 02.

[0081] In the embodiment, the first condenser 08 is arranged, which can ensure that the temperature of the circulating water in the third water circulation pipeline 03 is maintained in a range lower than the temperature of the water in the second water circulation pipeline 02, thereby avoiding the indirect change of the temperature of the lithography machine caused by the change of the temperature of the water in the third water circulation pipeline 03.

[0082] In another embodiment of the present application, referring to Figure 4 , Figure 4 Another part of the structure of the lithography machine circulating water tank system is provided in the embodiment of the present application; the third water circulation pipeline 03 further comprises: a second condenser 081, a first end 081a of the second condenser 081 is connected with the second end 07b of the third valve 07, and a second end 081b of the second condenser 081 is used as a second end 03b of the third water circulation pipeline 03 for cooling the water in the third water circulation pipeline 03.

[0083] Specifically, when the first water circulation pipeline 01 is in an abnormal state, the first valve 04 timely closes the first water circulation pipeline 01 together with the second valve 05, so that the water supplied by the water supply device directly flows out without flowing through the first water circulation pipeline 01. At this time, since the first water circulation pipeline 01 and the third water circulation pipeline 03 are arranged in parallel, part of the pipelines are used in parallel, and the second condenser 081 is arranged in the third water circulation pipeline 03, which can cool the water in the parallel pipeline to ensure that the temperature of the water entering the first storage tank 06 is low.

[0084] In the embodiment, the second condenser 081 is arranged on the third water circulation pipeline 03, which can cool the water in the parallel pipeline of the first water circulation pipeline 01 and the third water circulation pipeline 03. On the other hand, the water drawn from the first storage tank 06 and exchanged with the water in the second water circulation pipeline 02 can be pre-condensed once, so that when the flow rate of the water is high, the temperature of the water drawn from the first storage tank 06 can be lower than that of the water in the second water circulation pipeline 02.

[0085] In another embodiment of the present application, referring to Figure 5 , Figure 5A schematic diagram of another part of the structure of a circulating water tank system of a lithography machine is provided for an embodiment of the present application; the third water circulation pipeline 03 also includes: a first branch 031 and a fourth valve 09.

[0086] The first end 031a of the first branch 031 is connected to the third end 06c of the first storage tank 06 , and the second end 031b of the first branch 031 is connected to the water inlet port 01a of the first water circulation pipeline 01 , for storing water in the first storage tank 06 .

[0087] The fourth valve 09 is located on the first branch 031 and is used to open or close the first branch 031 .

[0088] Specifically, the fourth valve 09 can be a solenoid valve, and the first branch 031 connects the water supply device to the first storage tank 06. During the preparation phase before the lithography machine's circulating water tank system begins operation, the first valve 04 can be closed, the fourth valve 09 opened, and the water supply device can be used to store water in the first storage tank 06. After the water in the first storage tank 06 reaches a preset level, the fourth valve 09 is closed and the first valve 04 opened, so that the water supply device only supplies water to the first water circulation pipeline 01. It should be noted that the first branch 031 can also be connected to other water supply equipment, and this is not a specific limitation.

[0089] In this embodiment, the first branch 031 is connected to the water supply device, which reduces the need for redundant water supply equipment and does not increase the occupied area of ​​the system. In addition, the fourth valve 09 is provided to avoid affecting the first water circulation pipeline 01.

[0090] In another embodiment of the present application, reference Figure 5 The lithography machine circulating water tank system also includes: a first temperature detection device 10, located between the water inlet port 01a of the first water circulation pipeline 01 and the first valve 04, for monitoring the temperature state of the first water circulation pipeline 01.

[0091] Specifically, the first temperature detection device 10 is used to detect the temperature of the first water circulation pipeline 01. When the temperature detected by the first temperature detection device 10 is a preset temperature, the preset temperature range may be 16°-18°, including endpoints such as 16°, 16.5°, or 17°. When the first water circulation pipeline 01 is operating normally, the temperature of the water in the first water circulation pipeline 01 is lower than the temperature of the water in the second water circulation pipeline 02, thereby lowering the temperature of the second water circulation pipeline 02 through heat exchange.

[0092] When the temperature detected by the first temperature detecting device 10 is higher than the temperature of the water in the second water circulation pipeline 02, indicating that the first water circulation pipeline 01 is in an abnormal state, the first valve 04 is turned on between the first end 04a and the third end 04c, and the second end 04b is turned off, the second valve 05 is turned off, the first water circulation pipeline 01 is turned off, and the water supplied by the water supply device flows into the water inlet port 01a of the first water circulation pipeline 01, passes through the first valve 04, and then directly flows out from the water outlet port 01b of the first water circulation pipeline 01. At this time, the third water circulation pipeline 03 connected in parallel with the first water circulation pipeline 01 is turned on, and the third water circulation pipeline 03 is used to reduce the temperature of the water in the second water circulation pipeline 02.

[0093] In the embodiment, the first temperature detecting device 10 can detect the temperature change of the water in the first water circulation pipeline 01, so as to determine whether the first water circulation pipeline 01 is in an abnormal state, thereby improving the detection sensitivity and ensuring that the lithography machine circulating water tank system can timely switch the water circulation path.

[0094] In another embodiment of the present application, referring to Figure 6 , Figure 6 Another part of the structure of the lithography machine circulating water tank system is provided in the embodiment of the present application; the lithography machine circulating water tank system further comprises a fifth valve 11 located between the first valve 04 and the second valve 05, used to control the water flow rate in the first water circulation pipeline 01 or the third water circulation pipeline 03.

[0095] Specifically, the fifth valve 11 is located on the common pipeline of the first water circulation pipeline 01 and the third water circulation pipeline 03. The fifth valve 11 can be a manual flow valve.

[0096] In the embodiment, the water flow rate in the first water circulation pipeline 01 or the third water circulation pipeline 03 can be adjusted by adjusting the opening and closing size of the fifth valve 11, thereby increasing the heat exchange rate.

[0097] In another embodiment of the present application, referring to Figure 6 , the lithography machine circulating water tank system further comprises a second temperature detecting device 12 located on the third water circulation pipeline 03, used to monitor the temperature state of the third water circulation pipeline 03.

[0098] Specifically, the second temperature detecting device 12 can be located at any position of the third water circulation pipeline 03.

[0099] In the embodiment, the second temperature detecting device 12 can better control the temperature of the water in the third water circulation pipeline 03. In addition, when the first condenser 08 is arranged in the first storage tank, the second temperature detecting device 12 can provide a temperature reference for the first condenser 08, so as to ensure that the temperature of the water in the third water circulation pipeline 03 is constant.

[0100] In another embodiment of the present application, referring to Figure 7 , Figure 7 A schematic structural diagram of another part of the lithography machine circulating water tank system is provided in the embodiment of the present application. The lithography machine circulating water tank system further comprises a heat exchanger 13 located between the first water circulating pipeline 01 and the second water circulating pipeline 02, which is used to exchange the temperature of the first water circulating pipeline 01 and the second water circulating pipeline 02, so as to reduce the temperature of the water in the second water circulating pipeline 02.

[0101] Specifically, the heat exchanger 13 is used for the temperature exchange between the first water circulating pipeline 01 and the second water circulating pipeline 02, and other heat exchange forms can also be used, which are not limited in particular.

[0102] In the embodiment, the heat exchanger 13 is arranged to improve the heat exchange efficiency of the first water circulating pipeline 01 and the second water circulating pipeline 02.

[0103] In another embodiment of the present application, referring to Figure 8 , Figure 8 A schematic structural diagram of the lithography machine circulating water tank system is provided in the embodiment of the present application. The second water circulating pipeline 02 comprises a second storage tank 14, a heater 15, a second water pump P2, a sixth valve 16, a seventh valve 17 and an eighth valve 18.

[0104] The first end 14a of the second storage tank 14 is connected to the first end 15a of the heater 15, and the second storage tank 14 is used to store water.

[0105] The second end 15b of the heater 15 is connected to the first end 16a of the sixth valve 16, and the heater 15 is used to heat the water in the second water circulating pipeline 02 to reach the preset temperature of the lithography machine.

[0106] The second end 16b of the sixth valve 16 is connected to the first end 17a of the seventh valve 17, and the sixth valve 16 is used to control the flow speed of the water in the second water circulating pipeline 02.

[0107] The second end 17b of the seventh valve 17 is connected to the first end of the lithography machine, and the seventh valve 17 is used to turn on or turn off the second water circulating pipeline 02.

[0108] The first end P2a of the second water pump P2 is connected to the second end 14b of the second storage tank 14, and the second water pump P2 is used to start the second water circulating pipeline 02.

[0109] The second end P2b of the second water pump P2 is connected to the first end 18a of the eighth valve 18, the second end 18b of the eighth valve 18 is connected to the second end of the photolithography machine, and the third end 18c of the eighth valve 18 is connected to the first end 16a of the sixth valve 16. The eighth valve 18 is used to control the second water circulation pipeline 02 for pretreatment.

[0110] Specifically, the second storage tank 14 is used to store water in the second water circulation pipeline 02 used to cool the lithography machine. The temperature of the water in the second storage tank 14 can be between 16° and 18°. It should be noted that the second storage tank 14 may also include a water inlet port 14c for adding ultrapure water to the second storage tank 14 during the preparation phase before the lithography machine's circulating water tank system is put into operation.

[0111] Since the preset working temperature of the lithography machine is 22°, it is necessary to ensure that the water temperature passing through the lithography machine is maintained at 22°. Therefore, a heater 15 is set on the second water circulation pipeline 02 and connected to the second storage tank 14 to heat the water in the second water circulation pipeline 02.

[0112] A sixth valve 16 is also provided on the second water circulation pipeline 02 and connected to the heater 15. The sixth valve 16 can be a manual flow valve. By adjusting the opening and closing of the sixth valve 16, the water flow rate in the second water circulation pipeline 02 is controlled, thereby adjusting the cooling rate of the lithography machine.

[0113] A seventh valve 17 is also provided on the second water circulation pipeline 02 and is connected to the sixth valve 16. The seventh valve 17 may be a solenoid valve that controls the conduction or shutoff of the second water circulation pipeline 02. When a problem occurs in the second water circulation pipeline 02, the valve 17 can be shut off for maintenance to extend the service life of the lithography machine's circulating water tank system.

[0114] A second water pump P2 is also provided on the second water circulation pipeline 02 , and the second water pump P2 is used to pump out water in the second storage tank 14 , thereby opening the second water circulation pipeline 02 .

[0115] An eighth valve 18, which can be a solenoid valve, is also provided on the second water circulation pipeline 02. The eighth valve 18 has three ports. During the preparation phase before the photolithography machine's circulating water tank system is operational, the first end 18a and the third end 18c of the eighth valve 18 are connected, while the second end 18b is closed. This also closes the seventh valve 17. At this point, the second water circulation pipeline 02 can be pre-conditioned, specifically by raising the temperature within the second storage tank 14 to the preset temperature of the photolithography machine, for example, 22°C.

[0116] Then, the first end 18a and the second end 18b of the eighth valve 18 are connected, the third end 18c is closed, and the seventh valve 17 and the eighth valve 18 are connected to cool the lithography machine.

[0117] In this embodiment, the provision of the second water circulation pipeline 02 can ensure the normal operation of the lithography machine, and can cool the lithography machine to ensure that the temperature of the lithography machine remains constant, thereby improving the yield of the wafers.

[0118] In the description of this specification, reference to the terms "some embodiments" or "another embodiment" means that the specific features, structures, materials, or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present invention. In this specification, the schematic descriptions of the above terms do not necessarily refer to the same embodiment or example.

[0119] The technical features of the above-mentioned embodiments can be combined arbitrarily. In order to make the description concise, not all possible combinations of the technical features of the above-mentioned embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0120] The above-described embodiments merely represent several implementation methods of the present application. While the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the patent application. It should be noted that a person of ordinary skill in the art may make various modifications and improvements without departing from the spirit of the present application, and these modifications and improvements fall within the scope of protection of the present application. Therefore, the scope of protection of the present patent application shall be determined by the appended claims.

Claims

1. A circulating water tank system for a photolithography machine, characterized in that: include: A first water circulation pipeline, a second water circulation pipeline, a third water circulation pipeline, a first valve, and a second valve; The first water circulation pipeline is connected in series with the water supply device to provide cold water to reduce the temperature of the water in the second water circulation pipeline; The first valve and the second valve are both located on the first water circulation pipeline, and the first end of the first valve is connected to the water inlet port of the first water circulation pipeline, the second end of the first valve is connected to the first end of the second valve, the third end of the first valve is connected to the second end of the second valve, and the second end of the second valve is connected to the water outlet port of the first water circulation pipeline. The first valve and the second valve are used to shut off the first water circulation pipeline; The second water circulation pipeline is connected in series with the photolithography machine to reduce the temperature of the photolithography machine; The third water circulation pipeline is connected in parallel with the first water circulation pipeline, and the first end of the third water circulation pipeline is connected to the second end of the first valve, and the second end of the third water circulation pipeline is connected to the first end of the second valve. The third water circulation pipeline is used to reduce the temperature of the water in the second water circulation pipeline when an abnormal state occurs in the first water circulation pipeline.

2. The circulating water tank system for a photolithography machine according to claim 1, characterized in that: The third water circulation pipeline includes: a first storage tank, a third valve, and a first water pump; The first end of the first storage tank is connected to the first end of the first water pump, and the first storage tank is used to store water; The second end of the first water pump serves as the first end of the third water circulation pipeline, and the first water pump is used to start the third water circulation pipeline; The first end of the third valve is connected to the second end of the first storage tank, the second end of the third valve serves as the second end of the third water circulation pipeline, and the third valve is used to open or close the third water circulation pipeline.

3. The circulating water tank system for a photolithography machine according to claim 2, characterized in that: The third water circulation pipeline also includes: The first condenser is located in the first storage tank and is used to cool the water in the first storage tank.

4. The circulating water tank system for a photolithography machine according to claim 2, characterized in that: The third water circulation pipeline also includes: The second condenser has a first end connected to the second end of the third valve, and the second end of the second condenser serves as the second end of the third water circulation pipeline, and is used to cool the water in the third water circulation pipeline.

5. The circulating water tank system for a photolithography machine according to claim 2, characterized in that: The third water circulation pipeline also includes: a first branch, wherein a first end of the first branch is connected to the third end of the first storage tank, and a second end of the first branch is connected to the water inlet port of the first water circulation pipeline, for storing water in the first storage tank; The fourth valve is located on the first branch and is used to open or close the first branch.

6. The circulating water tank system for a photolithography machine according to claim 1, characterized in that: The photolithography machine circulating water tank system also includes: The first temperature detection device is located between the water inlet port of the first water circulation pipeline and the first valve, and is used to monitor the temperature state of the first water circulation pipeline.

7. The circulating water tank system for a photolithography machine according to claim 1, characterized in that: The photolithography machine circulating water tank system also includes: A fifth valve is located between the first valve and the second valve, and is used to control the water flow rate in the first water circulation pipeline or the third water circulation pipeline.

8. The circulating water tank system for a photolithography machine according to claim 1, characterized in that: The photolithography machine circulating water tank system also includes: The second temperature detection device is located on the third water circulation pipeline and is used to monitor the temperature state of the third water circulation pipeline.

9. The circulating water tank system for a photolithography machine according to claim 1, characterized in that: The photolithography machine circulating water tank system also includes: The heat exchanger is located between the first water circulation pipeline and the second water circulation pipeline, and is used to exchange the temperatures of the first water circulation pipeline and the second water circulation pipeline to reduce the temperature of the water in the second water circulation pipeline.

10. The circulating water tank system for a photolithography machine according to claim 1, characterized in that: The second water circulation pipeline includes: a second storage tank, a heater, a second water pump, a sixth valve, a seventh valve, and an eighth valve; The first end of the second storage tank is connected to the first end of the heater, and the second storage tank is used to store water; The second end of the heater is connected to the first end of the sixth valve, and the heater is used to heat the water in the second water circulation pipeline to reach a preset temperature of the lithography machine; The second end of the sixth valve is connected to the first end of the seventh valve, and the sixth valve is used to control the water flow rate in the second water circulation pipeline; The second end of the seventh valve is connected to the first end of the photolithography machine, and the seventh valve is used to open or close the second water circulation pipeline; The first end of the second water pump is connected to the second end of the second storage tank, and the second water pump is used to start the second water circulation pipeline; The second end of the second water pump is connected to the first end of the eighth valve, the second end of the eighth valve is connected to the second end of the photolithography machine, the third end of the eighth valve is connected to the first end of the sixth valve, and the eighth valve is used to control the second water circulation pipeline for pretreatment.

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