High-reflection film layer structure with reflectivity greater than 95% and glass substrate

Abstract

The utility model belongs to the technical field of film layer structures, and particularly provides a high-reflection film layer structure with the reflectivity larger than 95% and a glass substrate. The high-reflection film layer structure with the reflectivity larger than 95% comprises a metal aluminum layer, one face of the metal aluminum layer is plated with a silicon dioxide film layer, the other face of the silicon dioxide film layer is plated with a high-refractive-index film layer, and the other face of the metal aluminum layer is plated with a metal chromium layer. The metal chromium film is deposited below the aluminum film in a vacuum magnetron sputtering coating mode, the adhesion capacity of the aluminum film is enhanced, the reflectivity is improved and the metal film is prevented from being oxidized by depositing oxide materials with high refractive index and low refractive index above the aluminum film, meanwhile, the coating method is efficient and environmentally friendly, and the service life of the aluminum film is prolonged. The reflectivity of the prepared film layer structure is greater than 95%.

Description

Technical Field

[0001] The utility model mainly relates to the technical field of film layer structures, and in particular to a high-reflection film layer structure with a reflectivity greater than 95% and a glass substrate. Background Art

[0002] Reflective films can generally be divided into two categories, one is metal reflective film and the other is all-dielectric reflective film. In addition, there is also a metal-dielectric reflective film that combines the two. Existing high-reflective films are mostly metal film layers, but due to the refractive index and absorptivity of the material, it is difficult to achieve a reflectivity of more than 95%. Aluminum is used because of its excellent performance, but aluminum film is relatively soft and will adhere poorly when directly plated on the surface of a glass substrate, resulting in demolding. In addition, the highly reflective metal film layer is very easy to be oxidized due to its active molecular structure when exposed to the air for a long time, and the film layer is prone to oxidation. On this basis, a high-reflective film layer structure and glass substrate with a reflectivity greater than 95% are proposed. Utility Model Content

[0003] 1. Technical problems to be solved by the utility model:

[0004] The present invention provides a high-reflective film layer structure and a glass substrate with a reflectivity greater than 95%, which are used to solve the problem in the above-mentioned background technology that the aluminum film is relatively soft and has poor adhesion when directly plated on the surface of the glass substrate, resulting in demolding. In addition, the highly reflective metal film layer is very easy to be oxidized due to its active molecular structure when exposed to the air for a long time, and the film layer is prone to technical problems.

[0005] 2. Technical solution:

[0006] In order to achieve the above purpose, the technical solution of the utility model is:

[0007] A high-reflection film layer structure with a reflectivity greater than 95% comprises a metal aluminum layer, one side of the metal aluminum layer is coated with a silicon dioxide film layer, the other side of the silicon dioxide film layer is coated with a high-refractive index film layer, and the other side of the metal aluminum layer is coated with a metal chromium layer.

[0008] A further improvement is that the thickness of the metal aluminum layer is 35±5 nm.

[0009] A further improvement is that the thickness of the metal chromium layer is 10±5 nm.

[0010] A further improvement is that the thickness of the silicon dioxide film layer is 75±5 nm.

[0011] A further improvement is that the refractive index of the silicon dioxide film layer is 1.5.

[0012] Further improvement lies in that the high refractive index film layer is niobium pentoxide with a refractive index of 2.2 and a thickness of 60±5nm.

[0013] Further improvement lies in that the high refractive index film layer is titanium dioxide with a refractive index of 2.34 and a thickness of 60±5nm.

[0014] Further improvement lies in that the high refractive index film layer is silicon nitride with a refractive index of 2.05 and a thickness of 70±5nm.

[0015] The utility model also provides a glass substrate plated with a film layer, comprising glass substrate and the high reflection film layer structure with reflectivity more than 95% as described above formed on one side or two sides of glass substrate by vacuum magnetron sputtering.

[0016] 3. Advantageous effects:

[0017] Compared with the prior art, the technical scheme has the following advantageous effects:

[0018] The utility model discloses a vacuum magnetron sputtering film plating mode deposits a layer of metal chromium film under the aluminum film, enhances the adhesion of aluminum film, and then deposits high refractive index, low refractive index oxide material on the aluminum film to improve reflectivity and prevent metal film oxidation, and the film plating method is efficient and environmental protection, and the prepared film layer structure has reflectivity more than 95%. BRIEF DESCRIPTION OF DRAWINGS

[0019] Figure 1 A high reflection film layer structure with reflectivity more than 95% provided by the utility model is shown in the figure.

[0020] Figure 2 A film plating trolley running direction diagram in a high reflection film layer structure manufacturing method with reflectivity more than 95% provided by the utility model. DETAILED DESCRIPTION

[0021] In order to facilitate understanding of the utility model, the utility model will be described more fully below with reference to the relevant drawings, and the drawings show several embodiments of the utility model, but the utility model can be realized in many different forms, and is not limited to the embodiments described herein, on the contrary, the purpose of providing these embodiments is to make the disclosure of the utility model more thorough and comprehensive.

[0022] Embodiment 1

[0023] This embodiment 1 provides a high-reflection film layer structure with a reflectivity greater than 95%, including a metal aluminum layer, one side of the metal aluminum layer is coated with a silicon dioxide film layer, the other side of the silicon dioxide film layer is coated with a high-refractive index film layer, and the other side of the metal aluminum layer is coated with a metal chromium layer. The coating method of this embodiment adopts vacuum magnetron sputtering. Magnetron sputtering is a vacuum deposition technology of plasma. It realizes plasma discharge under vacuum conditions, uses electromagnetic fields to control the movement of charged particles, bombards the plated material, and thus deposits the required metal and oxide films on the substrate, which can effectively enhance the adhesion between the film layer and the substrate.

[0024] By depositing a layer of metal chromium film under the aluminum film to enhance the adhesion of the aluminum film, and then depositing high-refractive index and low-refractive index oxide materials on the aluminum film to improve the reflectivity and prevent the problem of metal film oxidation, the coating method is efficient and environmentally friendly, and the reflectivity of the film structure is greater than 95%.

[0025] In a preferred embodiment, the thickness of the metal aluminum layer is 35±5 nm.

[0026] In a preferred embodiment, the thickness of the metal chromium layer is 10±5 nm.

[0027] In a preferred embodiment, the thickness of the silicon dioxide film layer is 75±5 nm.

[0028] In a preferred embodiment, the refractive index of the silicon dioxide film layer is 1.5.

[0029] In a preferred embodiment, the high refractive index film layer is niobium pentoxide, which has a refractive index of 2.2 and a thickness of 60±5 nm.

[0030] In a preferred embodiment, the high refractive index film layer is titanium dioxide, which has a refractive index of 2.34 and a thickness of 60±5 nm.

[0031] In a preferred embodiment, the high refractive index film layer is silicon nitride, with a refractive index of 2.05 and a thickness of 70±5 nm.

[0032] Example 2

[0033] This embodiment provides a glass substrate coated with a film layer, comprising a glass substrate and a high-reflective film layer structure with a reflectivity greater than 95% as described in Example 1 formed on one or both sides of the glass substrate by vacuum magnetron sputtering.

[0034] Example 3

[0035] This embodiment provides a method for manufacturing a high-reflective film layer structure with a reflectivity greater than 95%, comprising the following steps:

[0036] The film layer selection selects pure Al with higher basic reflection as the metal film material, the purity is more than 99.99 %, Nb2O5 with a refractive index of 2.2, TiO2 with a refractive index of 2.34, Si3N4 with a refractive index of 2.05 and SiO2 low-refractive material with a refractive index of 1.5 are selected as matching and protective layers, and Cr metal film with small stress and good adhesion is selected as the bottom layer;

[0037] The film layer design structure is designed through software simulation according to the refractive index of each material, and each layer film thickness with a reflection of more than 95 % is obtained, and the specific table is as follows:

[0038]

[0039] The film coating mode is that a metal chromium layer, a metal aluminum layer, a silicon dioxide film layer and a high-refractive film layer are coated on the surface of the glass substrate by adopting a vacuum magnetron sputtering technology, and the adhesion of the film layer and the glass substrate is effectively enhanced.

[0040] An isolation chamber is added in the Inline continuous line, and rotatable V-gates are added in front and back, so as to isolate the oxygen and nitrogen flow of the oxidation film or the nitrogenization film from flowing into the metal film coating chamber, and avoid the oxidation and nitrogenization of the metal film when the metal film, the oxidation film and the nitrogenization film are coated at the same time. Figure 2 .

[0041] The above-mentioned embodiments only express certain implementation manners of the utility model, the description is more specific and detailed, but it cannot be understood as the limitation of the utility model patent scope; it should be pointed out that, for ordinary skilled persons in the art, on the premise of not departing from the utility model concept, a plurality of deformations and improvements can be made, which belong to the protection scope of the utility model; therefore, the protection scope of the utility model patent should be subject to the appended claims.

Claims

1. A high-reflection film structure with a reflectivity greater than 95%, characterized in that: The invention comprises a metal aluminum layer, one side of the metal aluminum layer is plated with a silicon dioxide film layer, the other side of the silicon dioxide film layer is plated with a high refractive index film layer, and the other side of the metal aluminum layer is plated with a metal chromium layer.

2. A high reflective film structure with a reflectivity greater than 95% according to claim 1, characterized in that :The thickness of the metal aluminum layer is 35±5nm.

3. The high-reflection film structure with a reflectivity greater than 95% according to claim 1, characterized in that :The thickness of the metal chromium layer is 10±5nm.

4. The high-reflection film structure with a reflectivity greater than 95% according to claim 1, characterized in that :The thickness of the silicon dioxide film layer is 75±5nm.

5. The high-reflection film structure with a reflectivity greater than 95% according to claim 1, characterized in that :The refractive index of the silicon dioxide film layer is 1.

5.

6. The high-reflection film structure with a reflectivity greater than 95% according to claim 1, characterized in that : The high refractive index film layer is niobium pentoxide, with a refractive index of 2.2 and a thickness of 60±5nm.

7. The high-reflection film structure with a reflectivity greater than 95% according to claim 1, characterized in that : The high refractive index film layer is titanium dioxide, with a refractive index of 2.34 and a thickness of 60±5nm.

8. The high-reflection film structure with a reflectivity greater than 95% according to claim 1, characterized in that :The high refractive index film layer is silicon nitride, with a refractive index of 2.05 and a thickness of 70±5nm.

9. A glass substrate coated with a film layer, comprising a glass substrate and a high-reflection film layer structure with a reflectivity greater than 95% as claimed in any one of claims 1 to 8 formed on one or both sides of the glass substrate by vacuum magnetron sputtering.

Images