Air inlet mechanism and reaction device
By designing a receiving seat and a sealing structure in the air intake mechanism of the reactor, the problem of waste residue accumulation in the first air pipe is solved, the smoothness of gas flow is achieved, and the efficiency of the coating process is improved.
Patent Information
- Application Number
- CN202423005145.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-05
- Publication Date
- 2025-10-17
- Estimated Expiration
- 2034-12-05
AI Technical Summary
During the production process of photovoltaic and semiconductor products, the first gas pipe in the reactor forms waste slag due to the shedding of thin films, resulting in poor gas flow and affecting the coating processing effect.
An air intake mechanism is designed, including a receiving seat and a sealing cover, which is used to accommodate waste residue at the bottom of the first air pipe and discharge the waste residue through the slag discharge port to ensure smooth gas flow.
By regularly cleaning waste residue, the gas flow smoothness of the air intake mechanism is improved, and the coating processing effect of the reaction device is improved.
Smart Images
Figure CN223450857U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The present application relates to the technical field of photovoltaic and semiconductor product production, and particularly relates to an air inlet mechanism and a reaction device. BACKGROUND
[0002] In the process of photovoltaic and semiconductor product production, sheet materials need to be subjected to film plating processing in a reaction furnace. A reaction furnace can be vertically connected to the top for the introduction of reaction gas. The reaction furnace can be connected to a first gas pipe, at least part of the structure of the first gas pipe can extend in the vertical direction. The bottom of the first gas pipe can be connected to the introduction of reaction gas, and the reaction gas can flow upwards along the first gas pipe to the top of the reaction furnace, and then enter the reaction furnace.
[0003] At present, when the sheet material is subjected to film plating processing in the reaction furnace, under the influence of the reaction furnace temperature and the reaction gas in the first gas pipe, a thin film will be formed in the first gas pipe, and the thin film will fall off into waste slag after long-term use of the reaction furnace and accumulate at the bottom of the first gas pipe, affecting the smoothness of the flow of the reaction gas in the first gas pipe. CONTENT OF THE UTILITY MODEL
[0004] In view of the above, it is necessary to provide an air inlet mechanism and a reaction device to solve the above-mentioned defects.
[0005] In a first aspect, the embodiments of the present application provide an air inlet mechanism for transmitting gas to a reaction furnace, the air inlet mechanism comprising: a first gas pipe, the first gas pipe extending in the vertical direction, the first gas pipe being used to communicate with the reaction furnace; a receiving seat, a receiving groove being formed in the receiving seat, the receiving seat being connected to the bottom of the first gas pipe in the vertical direction, the receiving groove being connected to the first gas pipe, the receiving groove being used to accommodate waste slag in the first gas pipe, a slag discharge port being formed in the receiving seat, the slag discharge port being communicated with the receiving groove; a cover, the cover being detachably connected to the receiving seat and being used to shield the slag discharge port.
[0006] Optionally, the air inlet mechanism further comprises: a second gas pipe, the second gas pipe being perpendicular to the first gas pipe, the second gas pipe being connected to the receiving seat and being communicated with the receiving groove, the second gas pipe being used to connect with the reaction furnace and being used to introduce gas.
[0007] Optionally, the second gas pipe comprises: a first sub-pipe, the first sub-pipe being connected to the receiving seat and being communicated with the receiving groove; a sealing pipe, the sealing pipe being used to pass through the reaction furnace, the sealing pipe being connected to the first sub-pipe and being communicated with the first sub-pipe.
[0008] Optionally, the second gas pipe further comprises: a second sub-pipe, the second sub-pipe being located on the side of the sealing pipe away from the first sub-pipe, the second sub-pipe being connected to the sealing pipe and being communicated with the sealing pipe, the second sub-pipe being used to introduce gas.
[0009] Optionally, the gas inlet mechanism further comprises a connecting head, the connecting head is used for connecting and communicating with the second gas pipe, the connecting head is located at one end of the second gas pipe away from the receiving seat, and the connecting head is used for connecting with a gas source device.
[0010] In a second aspect, a reaction device for processing a plurality of sheet materials is provided. The reaction device comprises a reaction furnace for accommodating the plurality of sheet materials; and a gas inlet mechanism connected with the reaction furnace and at least partially accommodated in the reaction furnace, the gas inlet mechanism being used for transmitting gas to the reaction furnace. The gas inlet mechanism comprises a first gas pipe extending in a vertical direction and connected with the reaction furnace; a receiving seat having a receiving groove formed therein, the receiving seat being connected to a bottom of the first gas pipe in the vertical direction, the receiving groove being connected with the first gas pipe and used for accommodating waste residues in the first gas pipe, the receiving seat having a residue discharge opening formed therein and communicating with the receiving groove; and a cover detachably connected to the receiving seat and used for shielding the residue discharge opening.
[0011] Optionally, the gas inlet mechanism further comprises a second gas pipe perpendicular to the first gas pipe, the second gas pipe being connected with the receiving seat and communicating with the receiving groove, the second gas pipe being used for connecting with the reaction furnace and for introducing gas.
[0012] Optionally, the second gas pipe comprises a first sub-pipe connected with the receiving seat and communicating with the receiving groove; and a sealing pipe used for penetrating the reaction furnace, the sealing pipe being sleeved on the first sub-pipe and communicating with the first sub-pipe.
[0013] Optionally, the second gas pipe further comprises a second sub-pipe located at a side of the sealing pipe away from the first sub-pipe, the sealing pipe being further sleeved on the second sub-pipe and communicating with the second sub-pipe, the second sub-pipe being used for introducing gas.
[0014] Optionally, the gas inlet mechanism further comprises a connecting head, the connecting head is used for connecting and communicating with the second gas pipe, the connecting head is located at one end of the second gas pipe away from the receiving seat, and the connecting head is used for connecting with a gas source device.
[0015] By means of the gas inlet mechanism and the reaction device provided in the present application, the waste residues can enter the receiving groove and accumulate in the receiving groove, and the workers or the automatic equipment can enter the reaction furnace and open the cover to collect the waste residues in the receiving groove. In this way, the accumulation of the waste residues in the gas inlet mechanism to block the gas inlet mechanism can be reduced, and the flow of the gas in the gas inlet mechanism can be improved, thereby improving the effect of the reaction device on the film plating processing of the sheet materials. BRIEF DESCRIPTION OF DRAWINGS
[0016] Figure 1 FIG. 4 is a sectional view of the reaction device in the embodiment of the present application.
[0017] Figure 2is a sectional view of the gas inlet mechanism in the embodiment of the present application.
[0018] Figure 3 is a structural schematic view of the gas inlet mechanism in the embodiment of the present application.
[0019] Main element symbol explanation:
[0020] 100, reaction device; 101, reaction furnace; 1011, reaction space; 1012, furnace mouth; 102, end cover; 103, gas inlet mechanism; 10, first gas pipe; 20, receiving seat; 21, receiving groove; 22, slag discharge port; 30, sealing cover; 40, second gas pipe; 41, first sub-pipe; 42, sealing pipe; 43, second sub-pipe; 50, connecting head. DETAILED DESCRIPTION
[0021] The technical solutions in the embodiments of the present application will be described clearly and completely below in combination with the drawings in the embodiments of the present application. Obviously, the described embodiments are only some of the embodiments of the present application, not all the embodiments of the present application.
[0022] The plurality of in the present application refers to two or more. In addition, it should be understood that in the description of the present application, the words "first", "second", etc. are used only for the purpose of distinguishing the description, and cannot be understood as indicating or implying relative importance, nor can it be understood as indicating or implying order.
[0023] In the description of the embodiments of the present application, the words "exemplary" or "for example" are used to mean serving as an example, instance, or illustration. Any embodiment or design solution described as "exemplary" or "for example" in the embodiments of the present application should not be interpreted as being more preferred or having more advantages than other embodiments or design solutions. Rather, the words "exemplary" or "for example" are used in the sense of presenting a related concept in a specific manner.
[0024] Please refer to Figure 1 , Figure 1 A reaction device 100 provided by the embodiments of the present application is shown. The reaction device 100 can accommodate a plurality of sheet materials and perform film plating processing on the plurality of sheet materials.
[0025] It can be understood that a reaction space 1011 can be formed in the reaction device 100. The plurality of sheet materials can be first loaded on a carrier and then enter the reaction space 1011 synchronously with the carrier. Then the reaction device 100 can heat the reaction space 1011 and introduce reaction gas into the reaction space 1011 and discharge the waste gas generated after processing, so as to complete the film plating processing on the sheet materials in the reaction space 1011.
[0026] In embodiments of the present application, the type of the sheet material is not particularly limited. For example, the sheet material can be, but is not limited to, a silicon wafer, a silicon carbide wafer, or a wafer. The carrier can be, but is not limited to, a quartz boat or a graphite boat.
[0027] In embodiments of the present application, the process of processing the sheet material by the reaction device 100 is not particularly limited. For example, the reaction device 100 can perform a film plating process on the sheet material by a chemical vapor deposition (CVD) process.
[0028] In embodiments of the present application, the reaction device 100 can include a reaction furnace 101, an end cover 102, and a gas inlet mechanism 103. The reaction furnace 101 can be provided with a furnace opening 1012 at a bottom end in a vertical direction. The reaction furnace 101 is provided with a reaction space 1011 therein, and the reaction space 1011 is in communication with the furnace opening 1012. The end cover 102 is connected to the reaction furnace 101 and can block the furnace opening 1012. Part of the gas inlet mechanism 103 is accommodated in the reaction space 1011, and the remaining structure penetrates the reaction furnace 101 and extends out of the reaction furnace 101. The gas inlet mechanism 103 can introduce a reaction gas into the reaction space 1011 from a top of the reaction space 1011 in the vertical direction, and a carrier loaded with a sheet material can enter the reaction space 1011 through the furnace opening 1012. In this way, by allowing the reaction gas to contact the sheet material in the reaction space 1011, the reaction device 100 can perform a film plating process on the sheet material.
[0029] It can be understood that the reaction furnace 101 can also be provided with an exhaust mechanism, a heating mechanism, a heat preservation mechanism, etc. to achieve the functions of exhaust, heating, and heat preservation of the reaction space 1011. The principles of achieving the above functions are known in the art, and will not be described here.
[0030] It can be understood that the end cover 102 can be movably connected to the reaction furnace 101, i.e., the end cover 102 can close the furnace opening 1012 and be relatively fixed to the reaction furnace 101, or can be moved after being relatively fixed to the reaction furnace 101 to expose the furnace opening 1012. For example, one side of the end cover 102 can be hinged to one end of the reaction furnace 101 provided with the furnace opening 1012, and the end cover 102 can be fixed to the reaction furnace 101 by bolts, buckles, etc. For another example, the end cover 102 can be mounted to one end of the reaction furnace 101 provided with the furnace opening 1012 by a flange and bolts.
[0031] It can be understood that the height direction and the width direction of the reaction device 100 can be defined as the vertical direction and the horizontal direction, respectively. For example, the vertical direction is the Y direction shown in FIG. 1, and the horizontal direction is the X direction shown in FIG. 1. Figure 1 Figure 1
[0032] Please refer to Figure 2 and Figure 3 In some embodiments, the air inlet mechanism 103 can include a first air pipe 10, a receiving seat 20, and a cover 30. The first air pipe 10 can be located in the reaction space 1011, and at least part of the body of the first air pipe 10 can extend in the vertical direction. The top end of the first air pipe 10 is open, and the first air pipe 10 is in communication with the reaction space 1011. The receiving seat 20 is fixedly installed at the bottom of the first air pipe 10 in the vertical direction and is located in the reaction space 1011. The receiving seat 20 is provided with a receiving groove 21. The receiving groove 21 is in communication with the first air pipe 10. The bottom of the receiving seat 20 in the vertical direction is provided with a slag discharge port 22, and the slag discharge port 22 is in communication with the receiving groove 21. The cover 30 is detachably connected to the bottom of the receiving seat 20, and the cover 30 can block the slag discharge port 22.
[0033] It can be understood that the receiving seat 20 can access the reaction gas, and the reaction gas can flow into the first air pipe 10 through the receiving groove 21 and flow to the top of the first air pipe 10, and then enter the reaction space 1011 through the opening at the top of the first air pipe 10.
[0034] Under the action of the temperature in the reaction space 1011 and the reaction gas in the first air pipe 10, a thin film is formed on the inner wall of the first air pipe 10 at the same time as the sheet material in the reaction space 1011 is processed. In the process of long-term operation of the reaction device 100, the thin film on the inner wall of the first air pipe 10 will gradually fall off to form waste slag, which will fall and accumulate in the direction of the bottom of the first air pipe 10 under the action of gravity. At this time, the waste slag can enter the receiving groove 21 and accumulate in the receiving groove 21. After the reaction device 100 completes the preset number of film processing, the worker or the automatic equipment can open the end cover 102 to expose the furnace opening 1012, and then enter the reaction space 1011 through the furnace opening 1012. Then the worker or the automatic equipment can open the cover 30 and collect the waste slag in the receiving groove 21.
[0035] In this way, the accumulation of waste slag in the air inlet mechanism 103 can be reduced to block the air inlet mechanism 103, and the flow of gas in the air inlet mechanism 103 can be improved, thereby improving the effect of the reaction device 100 on the film processing of the sheet material.
[0036] It can be understood that after the collection of waste slag is completed, the worker or the automatic equipment can close the cover 30, and then the reaction device 100 can continue to process the sheet material.
[0037] In the embodiments of the present application, the fixed connection and the fixed installation are not limited in specific manner. For example, the fixed manner can include, but is not limited to, bolt fixing, screw fixing, welding fixing, integral forming fixing, etc.
[0038] In the embodiments of the present application, the detachable connection manner is not particularly limited. For example, the detachable connection manner can include, but is not limited to, threaded connection, plug-in connection, bolt connection, etc. For example, the cover 30 can be threaded on the bottom of the receiving seat 20.
[0039] In some embodiments, the gas inlet mechanism 103 can further include a second gas pipe 40. The second gas pipe 40 can extend in the horizontal direction. One end of the second gas pipe 40 is fixedly connected with the receiving seat 20 and communicates with the receiving groove 21. The second gas pipe 40 can pass through the reaction furnace 101 and extend out of the reaction furnace 101. The end of the second gas pipe 40 extending out of the reaction furnace 101 can be detachably connected with a gas source device (not shown). The gas source device can output reaction gas, and the reaction gas can enter the receiving groove 21 through the second gas pipe 40 and flow into the first gas pipe 10.
[0040] In some embodiments, the second gas pipe 40 can include a first sub-pipe 41, a sealing pipe 42 and a second sub-pipe 43. The first sub-pipe 41, the sealing pipe 42 and the second sub-pipe 43 are arranged in the horizontal direction, and the first sub-pipe 41 and the second sub-pipe 43 are respectively located at two ends of the sealing pipe 42 in the horizontal direction. One end of the first sub-pipe 41 in the horizontal direction is fixedly connected with the receiving seat 20, and the other end is fixedly connected with the sealing pipe 42. The end of the second sub-pipe 43 in the horizontal direction facing the first sub-pipe 41 is fixedly connected with the sealing pipe 42. The first sub-pipe 41 communicates with the receiving groove 21, and the first sub-pipe 41, the second sub-pipe 43 and the sealing pipe 42 communicate with each other. The sealing pipe 42 can pass through the reaction furnace 101 and be sealingly connected with the reaction furnace 101. The first sub-pipe 41 is located in the reaction space 1011, and the second sub-pipe 43 is located outside the reaction furnace 101.
[0041] It can be understood that the outer diameter of the sealing pipe 42 can be greater than the outer diameter of the first sub-pipe 41 and greater than the outer diameter of the second sub-pipe 43. The sealing pipe 42 and the reaction furnace 101 can be sealingly connected by a sealing ring or other sealing mechanism.
[0042] In the embodiments of the present application, the connection manner of the first sub-pipe 41, the sealing pipe 42 and the second sub-pipe 43 is not particularly limited. For example, the first sub-pipe 41, the sealing pipe 42 and the second sub-pipe 43 can be fixedly welded or fixedly formed. For example, the sealing pipe 42 can be sleeved on the first sub-pipe 41 and the second sub-pipe 43, or the first sub-pipe 41 and the second sub-pipe 43 can be sleeved on the sealing pipe 42; and the sealing pipe 42 is sealingly connected with the first sub-pipe 41 and the second sub-pipe 43.
[0043] In some embodiments, the gas inlet mechanism 103 can further comprise a connecting head 50. The connecting head 50 can be fixedly connected to the second sub-pipe 43 at an end away from the sealing pipe 42. The connecting head 50 can be adapted to a gas outlet of a gas source device for outputting gas, and can be connected to the gas source device. The gas source device can be detachably connected to the second gas pipe 40 by detachable connection between the connecting head 50.
[0044] In embodiments of the present application, the type of the connecting head 50 is not specifically limited. For example, the connecting head 50 can be, but is not limited to, a Luer head.
[0045] In embodiments of the present application, the manner of detachable connection is not specifically limited. For example, the manner of detachable connection can include, but is not limited to, threaded connection, bolt connection, buckle connection, etc.
[0046] In other embodiments, the first gas pipe 10, the receiving seat 20, the cover 30 and the second gas pipe 40 can all be located outside the reaction furnace 101, and a turning branch pipe (not shown in the figure) can be provided at the top of the first gas pipe 10. The turning branch pipe can pass through the reaction furnace 101 and enter the reaction space 1011, so as to deliver the reaction gas to the reaction space 1011 at the top of the reaction furnace 101. At this time, the second gas pipe 40 can not comprise a sealing head, and the first sub-pipe 41 and the second sub-pipe 43 can be directly connected and communicated.
[0047] By means of the gas inlet mechanism 103 and the reaction device 100 provided by embodiments of the present application, the waste slag can enter the receiving groove 21 and accumulate in the receiving groove 21; the worker or the automatic equipment can open the end cover 102 to expose the furnace opening 1012, and enter the reaction space 1011 through the furnace opening 1012, open the cover 30 and collect the waste slag in the receiving groove 21. In this way, the accumulation of waste slag in the gas inlet mechanism 103 to block the gas inlet mechanism 103 can be reduced, the flow of gas in the gas inlet mechanism 103 can be improved, and thus the effect of the reaction device 100 on the film coating process of the sheet material can be improved.
[0048] It is obvious for those skilled in the art that the present application is not limited to the details of the above exemplary embodiments, and can be implemented in other specific forms without departing from the spirit or essential characteristics of the present application. Therefore, the above-described embodiments of the present application should be regarded as exemplary and non-limiting, and the scope of the present application is defined by the appended claims rather than the above description, and all changes falling within the meaning and scope of the equivalent elements of the claims are intended to be included in the present application.
Claims
1. An air intake mechanism for transmitting gas to a reaction furnace, characterized in that: The air intake mechanism comprises: a first gas pipe extending in a vertical direction and configured to communicate with the reaction furnace; A receiving seat, wherein a receiving groove is formed in the receiving seat, the receiving seat is connected to the bottom of the first air pipe in the vertical direction, the receiving groove is connected to the first air pipe, the receiving groove is used to accommodate waste residue in the first air pipe, and a slag discharge port is formed on the receiving seat, and the slag discharge port is connected to the receiving groove; The sealing cover is detachably connected to the receiving seat and is used to cover the slag discharge port.
2. The air intake mechanism according to claim 1, wherein: The air intake mechanism further comprises: The second gas pipe is perpendicular to the first gas pipe, connected to the receiving seat and communicated with the receiving groove, and is used to connect to the reaction furnace and to introduce the gas.
3. The air intake mechanism according to claim 2, wherein: The second trachea comprises: a first sub-tube, the first sub-tube being connected to the receiving seat and communicating with the receiving groove; A sealing tube is used to pass through the reaction furnace, and the sealing tube is connected to the first sub-tube and communicates with the first sub-tube.
4. The air intake mechanism according to claim 3, characterized in that: The second trachea further comprises: The second sub-tube is located on a side of the sealed tube away from the first sub-tube, is connected to the sealed tube and communicates with the sealed tube, and is used to introduce the gas.
5. The air intake mechanism according to claim 2, wherein: The air intake mechanism further comprises: A connector, which is used to connect and communicate with the second air pipe, is located at an end of the second air pipe away from the receiving seat, and is used to connect to an air source device.
6. A reaction device for processing a plurality of sheet materials, characterized in that: The reaction device comprises: a reaction furnace, the reaction furnace being used to accommodate a plurality of the sheet materials; an air intake mechanism connected to the reaction furnace and at least partially accommodated in the reaction furnace, the air intake mechanism being used to transmit gas to the reaction furnace; Wherein, the air intake mechanism includes: a first gas pipe extending in a vertical direction and communicating with the reaction furnace; A receiving seat, wherein a receiving groove is formed in the receiving seat, the receiving seat is connected to the bottom of the first air pipe in the vertical direction, the receiving groove is connected to the first air pipe, the receiving groove is used to accommodate waste residue in the first air pipe, and a slag discharge port is formed on the receiving seat, and the slag discharge port is connected to the receiving groove; The sealing cover is detachably connected to the receiving seat and is used to cover the slag discharge port.
7. The reaction device according to claim 6, characterized in that The air intake mechanism further comprises: The second gas pipe is perpendicular to the first gas pipe, connected to the receiving seat and communicated with the receiving groove, and is used to connect to the reaction furnace and to introduce the gas.
8. The reaction device according to claim 7, characterized in that The second trachea comprises: a first sub-tube, the first sub-tube being connected to the receiving seat and communicating with the receiving groove; A sealing tube is used to pass through the reaction furnace, and the sealing tube is sleeved on the first sub-tube and communicated with the first sub-tube.
9. The reaction device according to claim 8, characterized in that The second trachea further comprises: The second sub-tube is located on a side of the sealing tube away from the first sub-tube. The sealing tube is also sleeved on the second sub-tube and communicated with the second sub-tube. The second sub-tube is used to introduce the gas.
10. The reaction device according to claim 7, characterized in that The air intake mechanism further comprises: A connector, which is used to connect and communicate with the second air pipe, is located at an end of the second air pipe away from the receiving seat, and is used to connect to an air source device.