Substrate positioning and lifting device of plasma etching equipment

Abstract

The utility model discloses a substrate positioning and lifting device of plasma etching equipment, which comprises a base, and further comprises a pushing and positioning mechanism and a connecting and pressing mechanism which are arranged on the base, the pushing and positioning mechanism comprises supporting frames and supporting plates, the supporting frames are arranged on the base, the supporting plates are arranged on the supporting frames, movable grooves are formed in the supporting plates, electric push rods are arranged on the bottom walls of the supporting plates, and the tail ends of the electric push rods are connected with stretching assemblies. The utility model belongs to the technical field of etching equipment, and particularly relates to a substrate positioning and lifting device of plasma etching equipment.

Description

TECHNICAL FIELD

[0001] The utility model belongs to etching equipment technical field, specifically point to a kind of substrate positioning lifting device of plasma etching equipment. BACKGROUND

[0002] Etching is an important process in semiconductor, microelectronics and LED manufacturing process, and it can be divided into wet etching and dry etching from the process, dry etching is plasma etching, etching gas is usually introduced into plasma processing device, and ionizes etching gas into plasma, and the wafer to be etched is etched by using the plasma.

[0003] As disclosed in the patent with publication number CN203481201U, a substrate positioning lifting device of plasma etching equipment is disclosed, which comprises a lower electrode fixed to a reaction chamber, a substrate chuck disposed on the lower electrode, a needle lifting mechanism for receiving the chuck, and a compression ring lifting mechanism for precise positioning of the substrate; the compression ring lifting mechanism comprises a base, a movable plate, a compression ring, a lifting rod connecting the movable plate and the compression ring, and a compression ring lifting drive device for driving the movable plate to lift; the lifting rod is connected with a guide mechanism for guiding the lifting of the lifting rod, and the compression ring lifting drive device is fixed to the base; the compression ring lifting drive device makes the compression ring press the substrate on the substrate chuck; the needle lifting mechanism comprises a needle for holding the substrate, a base fixedly connected with the lower end of the needle, and a needle lifting drive device, the needle lifting drive device is fixed to the lower electrode, the output shaft of the needle lifting drive device is fixedly connected with the base, and the needle penetrates through the lower electrode.

[0004] However, the above-mentioned device is inconvenient for positioning and calibrating the substrate during use, and the substrate is easily offset during placement and clamping, which affects the fixing effect of the substrate. Utility model content

[0005] The technical problem to be solved by the utility model is that the positioning effect is not good when the existing equipment is used, which easily causes the substrate to be offset and affects the etching effect.

[0006] In order to realize the above-mentioned function, the technical scheme adopted by the utility model is as follows: a substrate positioning lifting device of plasma etching equipment, comprising a base, further comprising a pushing positioning mechanism and a connecting compression mechanism arranged on the base; the pushing positioning mechanism comprises a support frame and a supporting plate, the support frame is arranged on the base, the support frame is provided with a plurality of groups, the supporting plate is arranged on the plurality of groups of support frames, the supporting plate is provided with a movable groove, the bottom wall of the supporting plate is provided with an electric push rod, and the tail end of the electric push rod is connected with an extension assembly.

[0007] As a preferred, the support frame is arranged in U shape.

[0008] Further, the stretching assembly comprises a hinged plate and a push plate, the hinged plate is arranged on the side wall of the support frame, a gear is rotatably arranged on the hinged plate, a push rod is connected to the gear, the push rod is movably arranged through the movable slot, the push plate is arranged at the end of the electric push rod, an installation plate is arranged on the push plate, a rack is arranged on the installation plate, and the rack is engaged with the gear.

[0009] Further, the connecting and pressing mechanism comprises a fixed plate and a pressing plate, the fixed plate is arranged between a plurality of support frames, a lead screw is rotatably arranged between the fixed plate and the base, a lifting plate is threadedly connected to the lead screw, the lifting plate is slidably arranged on the plurality of support frames, a connecting rod is arranged on the lifting plate and movably arranged through the supporting plate, a plurality of connecting rods are arranged, and the pressing plate is arranged at the top end of the plurality of connecting rods.

[0010] Further, the base is provided with a motor, and the output end of the motor is connected with the lead screw.

[0011] As preferred, the pressing plate is arranged in a ring shape, and a gasket is arranged on the bottom wall of the pressing plate.

[0012] The utility model discloses take above -mentioned structure and obtain beneficial effect as follows:

[0013] 1. By setting up electric push rod and push plate, cooperate installation plate and rack, can drive rotation to gear, and then change push rod angle, utilize a plurality of push rods to be able to position substrate, avoid substrate to place deviation;

[0014] 2. By setting up lead screw and lifting plate, can drive connecting rod and pressing plate to go up and down adjustment, be convenient for to substrate and press and hold fixed, in order to subsequent etching processing. BRIEF DESCRIPTION OF DRAWINGS

[0015] Fig. 1 It is the overall structural drawing of the substrate positioning and lifting device of the plasma etching equipment proposed in the utility model;

[0016] Fig. 2 It is the sectional view of the substrate positioning and lifting device of the plasma etching equipment proposed in the utility model;

[0017] Among them, 1, base, 2, push positioning mechanism, 3, connecting and pressing mechanism, 4, support frame, 5, supporting plate, 6, movable slot, 7, electric push rod, 8, stretching assembly, 9, hinged plate, 10, push plate, 11, gear, 12, push rod, 13, installation plate, 14, rack, 15, fixed plate, 16, pressing plate, 17, lead screw, 18, lifting plate, 19, connecting rod, 20, motor, 21, gasket. DETAILED DESCRIPTION

[0018] The following is a clear and complete description of the technical solution of the present invention in conjunction with the accompanying drawings. Obviously, the embodiments described are only some of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making any creative efforts are within the scope of protection of the present invention.

[0019] In the description of the present invention, it should be noted that the terms "center," "up," "down," "left," "right," "vertical," "horizontal," "inside," and "outside" and the like, indicating orientations or positional relationships, are based on the orientations or positional relationships shown in the accompanying drawings and are intended solely for the purpose of facilitating the description of the present invention and simplifying the description. They do not indicate or imply that the devices or components referred to must have a specific orientation, be constructed, or operate in a specific orientation. Therefore, they should not be construed as limitations on the present invention. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance. The present invention will be further described below in conjunction with the accompanying drawings.

[0020] like Figs. 1-2 As shown, the utility model proposes a substrate positioning and lifting device for plasma etching equipment, including a base 1, and also includes a pushing positioning mechanism 2 and a connecting and pressing mechanism 3 arranged on the base 1; the pushing positioning mechanism 2 includes a support frame 4 and a pallet 5, the support frame 4 is arranged on the base 1, the support frame 4 is U-shaped, the support frame 4 is provided with multiple groups, the pallet 5 is provided on the multiple groups of support frames 4, a movable groove 6 is provided on the pallet 5, an electric push rod 7 is provided on the bottom wall of the pallet 5, the end of the electric push rod 7 is connected to an extension component 8, the machine chip is placed on the pallet 5, the electric push rod 7 is started, the extension component 8 is driven to move, the substrate is adjusted to the middle position by using the extension component 8, the connecting and pressing mechanism 3 is started, the substrate is fixed, thereby avoiding the substrate offset affecting the etching operation.

[0021] like Fig. 2 As shown, the extension assembly 8 includes a hinged plate 9 and a push plate 10. The hinged plate 9 is arranged on the side wall of the support frame 4. A gear 11 is rotatably provided on the hinged plate 9. A lever 12 is connected to the gear 11. The lever 12 is movable through the movable slot 6. The push plate 10 is provided at the end of the electric push rod 7. A mounting plate 13 is provided on the push plate 10. A rack 14 is provided on the mounting plate 13. The rack 14 is engaged with the gear 11. When the electric push rod 7 is extended, it drives the push plate 10 to move, and the push plate 10 drives the mounting plate 13 to move. The mounting plate 13 drives the rack 14 to move, and the rack 14 drives the gear 11 to rotate. The gear 11 drives the lever 12 to approach the middle, so that the substrate can be pushed to the middle for positioning. After the positioning of the substrate is completed, the electric push rod 7 is driven in the reverse direction to retract and reset the lever 12 to avoid affecting the pressure and fixation of the substrate.

[0022] likeFig. 2 As shown, the connecting and pressing mechanism 3 comprises a fixed plate 15 and a pressing plate 16, the fixed plate 15 is arranged between the plurality of support frames 4, a screw rod 17 is rotatably arranged between the fixed plate 15 and the base 1, the base 1 is provided with a motor 20, the output end of the motor 20 is connected with the screw rod 17, a lifting plate 18 is threadedly connected on the screw rod 17, the lifting plate 18 is slidingly arranged on the plurality of support frames 4, the lifting plate 18 is provided with a connecting rod 19, the connecting rod 19 is movably arranged through the supporting plate 5, the connecting rod 19 is provided with a plurality of groups, the pressing plate 16 is arranged at the top end of the plurality of connecting rods 19, the pressing plate 16 is annularly arranged, the bottom wall of the pressing plate 16 is provided with a gasket 21, the motor 20 is started, the screw rod 17 is driven to rotate, the lifting plate 18 is driven to move, the connecting rod 19 is driven to move, the pressing plate 16 is driven to move downwards, the gasket 21 is matched to fix the substrate, and the subsequent etching operation is facilitated.

[0023] The above describes the present application and its embodiments, which is not restrictive, and the embodiments shown in the drawings are only one of the embodiments of the present application, and the actual structure is not limited thereto. In summary, if a person skilled in the art is inspired, without departing from the creative purpose of the present application, without creative design, similar structure and embodiments of the technical scheme, which should belong to the protection scope of the present application.

Claims

1. A substrate positioning and lifting device for a plasma etching apparatus, comprising a base, characterised in that: Also include the push positioning mechanism and connecting pressure holding mechanism set on the base; the push positioning mechanism includes support frame and the supporting plate, the support frame is equipped on the base, the support frame is equipped with multiple groups, the supporting plate is equipped on multiple groups the support frame, the supporting plate is equipped with movable slot, the bottom wall of the supporting plate is equipped with electric push rod, the tail end of the electric push rod is connected with the stretching assembly; the stretching assembly includes the hinged plate and the push plate, the hinged plate is equipped on the side wall of support frame, the hinged plate is equipped with gear on rotation, the gear is connected with the push rod, the push rod is movable and passes through the movable slot and is arranged, the push plate is equipped at the tail end of electric push rod, the push plate is equipped with mounting plate, the mounting plate is equipped with rack, the rack is engaged with the gear; the connecting pressure holding mechanism includes fixed plate and pressure plate, the fixed plate is equipped between multiple groups of support frame, the fixed plate is rotatably equipped with screw rod between the base, the screw rod is threadedly connected with the lifting plate, the lifting plate is slidably arranged on multiple groups the support frame, the lifting plate is equipped with connecting rod, the connecting rod is movable and passes through the supporting plate and is arranged, the connecting rod is equipped with multiple groups, the pressure plate is equipped at the top end of multiple groups The connecting rod.

2. A substrate positioning and lifting device for a plasma etching apparatus as defined in claim 1, characterized in that: The support frame is arranged in a U shape.

3. The substrate positioning and lift device for a plasma etching apparatus of claim 1 wherein: The base is provided with a motor, and the output end of the motor is connected with the screw rod.

4. The substrate positioning and lift device for a plasma etching apparatus of claim 3 wherein: The pressure plate is arranged in a ring shape, and the bottom wall of the pressure plate is provided with a gasket.

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