Ion source for micro-nano polishing machine

Abstract

The ion source for the micro-nano polishing machine comprises a protective shell, a gas leading-in channel is arranged in the protective shell, a penning ion gun, an accelerating electrode and an electrostatic lens are sequentially arranged at the position of the gas leading-in channel, and the penning ion gun, the accelerating electrode and the electrostatic lens are all connected with a power module. The power supply module comprises an ionization voltage Vd applied to the penning ion gun, an acceleration voltage Va applied to the acceleration electrode and a focusing voltage Ve applied to the electrostatic lens, and the ionization voltage Vd, the acceleration voltage Va and the focusing voltage Ve are all provided by a voltage-adjustable power supply. According to the utility model, the diameter and distribution of the ion beam current can be adjusted, so that the same processing scheme can generate the same processing effect.

Description

TECHNICAL FIELD

[0001] The utility model relates to a polishing machine technical field, especially point to a kind of ion source for micro-nano polishing machine. BACKGROUND

[0002] After long-term work of ion beam equipment, the ion beam ejected by ion source can cause the wear of structural components in vacuum chamber, and the tiny particles generated by sample polishing can adhere to ion source and vacuum chamber, especially the ion beam outlet of ion source, which can cause the change of conditions in vacuum chamber, and then with the increase of use time, the energy distribution and morphology of ion beam change, thereby leading to different processing effects for the same processing scheme. SUMMARY

[0003] The utility model provides a kind of ion source for micro-nano polishing machine, the diameter of ion beam current and adjustable hole distribution are ensured, and the same processing effect is generated for the same processing scheme.

[0004] The technical scheme of the utility model is realized as follows: a kind of ion source for micro-nano polishing machine, including protective shell, gas introduction passage is provided in protective shell, gas introduction passage is sequentially provided with Panning ion gun, acceleration electrode and electrostatic lens, Panning ion gun, acceleration electrode and electrostatic lens are connected with power module, power module includes ionization voltage Vd applied to Panning ion gun, acceleration voltage Va applied to acceleration electrode and focusing voltage Ve applied to electrostatic lens, ionization voltage Vd, acceleration voltage Va and focusing voltage Ve are all provided by adjustable voltage power supply.

[0005] Further, the electrostatic lens includes a first electrostatic lens electrode, one side of the first electrostatic lens electrode is close to the acceleration electrode, and the other side is provided with a second electrostatic lens electrode, and the first electrostatic lens electrode and the second electrostatic lens electrode are both circular ring-shaped plates.

[0006] Further, the Panning ion gun includes a ring-shaped cathode and a ring-shaped counter-cathode, a ring-shaped anode is provided between the ring-shaped cathode and the ring-shaped counter-cathode, and the outer side of the ring-shaped anode is wrapped with a cylindrical permanent magnet.

[0007] Further, one end of the ionization voltage Vd is connected with the ring-shaped anode through an anode resistor, and the other end is connected with the ring-shaped cathode and the ring-shaped counter-cathode through a cathode resistor, respectively.

[0008] Further, one end of the ionization voltage Vd is also provided with a second ammeter.

[0009] Further, the ion source further includes a detection assembly, and the detection assembly includes a detection electrode, the detection electrode faces the ion beam outlet end of the electrostatic lens, and the detection electrode is connected with the first ammeter.

[0010] The utility model discloses a beneficial effect:

[0011] The utility model discloses ion source has added acceleration electrode and electrostatic lens, cooperation power module makes the ion beam flow diameter and distribution controllable, adjustable that produce, and further ensures the same processing effect of the same processing scheme.

[0012] The utility model discloses ion source still contains detection subassembly, and the distribution of ion beam flow can be detected in time fast, provides the guarantee for the distribution of fast optimization ion beam. BRIEF DESCRIPTION OF DRAWINGS

[0013] In order to more clearly illustrate the technical scheme in the embodiment of the utility model or prior art, the following will be to the embodiment or prior art description needed to use the drawing briefly introduces, obviously, the following description in the drawing is only some embodiments of the utility model, for the ordinary skilled person in the art comes, under the premise of not paying creative labor, can also obtain other drawings according to these drawings.

[0014] Figure 1 It is ion source's structural schematic diagram;

[0015] Figure 2 It is power module's structural schematic diagram.

[0016] Protective shell 1, gas introduction channel 2, penning ion gun 3, acceleration electrode 4, electrostatic lens 5, annular cathode 6, annular counter cathode 7, annular anode 8, permanent magnet 9, first electrostatic lens electrode 10, second electrostatic lens electrode 11, power module 12, second ammeter 13, support member 14, detection electrode 15, first ammeter 16. DETAILED DESCRIPTION

[0017] The technical scheme in the embodiments of the utility model will be clearly and completely described in the following with reference to the drawings of the embodiments of the utility model, obviously, the described embodiments are only some embodiments of the utility model, not all the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by the ordinary skilled person in the art without paying creative labor belong to the protection scope of the utility model.

[0018] For example, Figure 1 And 2As shown, an ion source for a micro-nano polishing machine, the ion source is in a cylindrical structure, which comprises a protective shell 1, a gas introduction channel 2 is arranged in the protective shell 1, a Penning ion gun 3, an acceleration electrode 4 and an electrostatic lens 5 are sequentially arranged at the gas introduction channel 2, positive ions generated by the Penning ion gun 3 are accelerated by the acceleration electrode 4 and then enter the electrostatic lens 5, and the electrostatic lens 5 further adjusts the focusing and distribution of the ion beam.

[0019] The Penning ion gun 3 comprises a ring-shaped cathode 6 and a ring-shaped counter-cathode 7, a ring-shaped anode 8 is arranged between the ring-shaped cathode 6 and the ring-shaped counter-cathode 7, and a cylindrical permanent magnet 9 is wrapped outside the ring-shaped anode 8 for generating a static magnetic field B0 along the axis of the ion source 2. The acceleration electrode 4 is located at the ion emission hole end of the Penning ion gun 3, and the electrostatic lens 5 is located at the ion beam emission hole end of the acceleration electrode 4. The electrostatic lens 5 comprises a first electrostatic lens electrode 10, one side of the first electrostatic lens electrode 10 is close to the acceleration electrode 4, and the other side is provided with a second electrostatic lens electrode 11, and the acceleration electrode 4, the first electrostatic lens electrode 10 and the second electrostatic lens electrode 11 are all circular ring-shaped plates.

[0020] The Penning ion gun 3, the acceleration electrode 4 and the electrostatic lens 5 are connected with a power supply module 12, the power supply module 12 comprises an ionization voltage Vd, an acceleration voltage Va and a focusing voltage Ve, one end of the ionization voltage Vd is connected with the ring-shaped anode 8 through an anode resistor, the other end is connected with the ring-shaped cathode 6 and the ring-shaped counter-cathode 7 through cathode resistors respectively, and the one end of the ionization voltage Vd is further provided with a second ammeter 13 for measuring the current of the discharge circuit of the ion source 2. The acceleration voltage Va is applied to the acceleration electrode 4, and the focusing voltage Ve is applied to the electrostatic lens 5, and the ionization voltage Vd, the acceleration voltage Va and the focusing voltage Ve are all provided by an adjustable voltage power supply, so that the voltage can be adjusted as needed, and the ionization voltage Vd, the acceleration voltage Va and the focusing voltage Ve are all grounded. By adjusting the ionization voltage Vd of the Penning ion gun 3, the acceleration voltage Va of the acceleration electrode 4 and the focusing voltage Ve of the electrostatic lens 5 through the power supply module 12, the focusing, distribution and energy of the ion beam are adjusted.

[0021] The ion source further comprises a detection assembly connected with a support member 14, and the position of the detection assembly is adjusted through the support member 14, for example, the support member 14 can be displaced in three dimensions XYZ within the ion beam distribution area, and the ion beam current is measured point by point in each dimension, so that the spatial distribution of the ion beam current is monitored in real time. The support member 14 belongs to an existing structure, for example, it can be an XYZ three-axis linear module or the like, and can also be other structures.

[0022] The detection assembly comprises a detection electrode 15 which is cup-shaped on the side facing the ion beam outlet end of the electrostatic lens, facilitating the receiving of the positive ion beam emitted by the ion source 2. The detection assembly further comprises a first ammeter 16 corresponding to the detection electrode 15, one end of the first ammeter 16 being connected to the detection electrode 15 and the other end being connected to the ground wire, for measuring the ion beam current.

[0023] The above merely describes the preferred embodiments of the present application and is not intended to limit the present application. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims

1. An ion source for a micro- and nano-polishing machine, characterized by: The protective shell is internally provided with a gas introduction channel, and the gas introduction channel is sequentially provided with a Penning ion gun, an acceleration electrode and an electrostatic lens.

2. The ion source for a micro-nano polishing machine according to claim 1, wherein: The electrostatic lens comprises a first electrostatic lens electrode, one side of the first electrostatic lens electrode is close to the acceleration electrode, and the other side is provided with a second electrostatic lens electrode, and the first electrostatic lens electrode and the second electrostatic lens electrode are both circular ring-shaped pole plates.

3. The ion source for a micro-nano polishing machine according to claim 1, wherein: The Penning ion gun comprises a ring-shaped cathode and a ring-shaped counter-cathode, and a ring-shaped anode is arranged between the ring-shaped cathode and the ring-shaped counter-cathode, and the outer side of the ring-shaped anode is wrapped with a cylindrical permanent magnet.

4. The ion source for a micro-nano polishing machine according to claim 1, wherein: One end of the ionization voltage Vd is connected with the ring-shaped anode through an anode resistor, and the other end is connected with the ring-shaped cathode and the ring-shaped counter-cathode through a cathode resistor respectively.

5. The ion source of claim 4, wherein: One end of the ionization voltage Vd is also provided with a second ammeter.

6. The ion source for a micro-nano polishing machine according to claim 1, wherein: The ion source further comprises a detection assembly, and the detection assembly comprises a detection electrode, the detection electrode faces the ion beam outlet end of the electrostatic lens, and the detection electrode is connected with the first ammeter.

Images