Coating line glass substrate foreign gas cleaning equipment
By introducing roller brushes and vacuum pump assemblies into the glass substrate cleaning equipment for coating lines, the problem of traditional equipment being unable to pre-clean impurities has been solved, improving the cleaning effect and equipment efficiency.
Patent Information
- Application Number
- CN202422647849.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-10-31
- Publication Date
- 2025-11-11
- Estimated Expiration
- 2034-10-31
AI Technical Summary
Traditional glass substrate cleaning equipment for coating lines cannot perform pre-cleaning before the glass substrate enters, causing impurities to be released again in the vacuum environment, which reduces the cleaning effect.
A device for cleaning impurity gases from glass substrates in a coating line has been designed. It includes components such as a cleaning chamber, a sealed cover, a filter, a vacuum pump, a guide roller, a vertical rod, an auxiliary plate, and a roller brush. Impurities are pre-cleaned by friction between the roller brush and the substrate surface, and the impurity gas is extracted by the vacuum pump.
This technology enables pre-cleaning of impurities before the glass substrate enters the cleaning equipment, improving the cleaning equipment's handling quality of impurity gases, reducing the re-release of impurities in the vacuum environment, and lowering the workload of the vacuum pump.
Smart Images
Figure CN223531045U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of glass substrate processing technology for coating lines, and in particular to a device for cleaning impurity gases from glass substrates in coating lines. Background Technology
[0002] Glass substrate processing in coating lines is a critical production process widely used in the semiconductor, optoelectronics, display, and photovoltaic industries. This process aims to ensure the surface quality and performance of glass substrates to meet the requirements of high-tech applications. Before coating, it is necessary to clean the impurity gases on the surface of the glass substrate. The main components of the cleaning equipment include a vacuum pump, which is used to extract the impurity gases from the substrate surface. The process mainly involves placing the glass substrate inside the equipment, starting the vacuum pump, and drawing the inside of the equipment to a low-pressure state to remove most of the impurity gases, facilitating subsequent plasma cleaning of the substrate.
[0003] The glass substrate needs to be placed inside the equipment, and impurities and gases are removed by a vacuum pump. Therefore, the vacuum pump has a heavy workload. Traditional cleaning equipment cannot pre-clean the glass substrate before it enters the equipment, and cannot effectively prevent impurities from being released again in the vacuum environment, thus reducing the processing effect of the cleaning equipment. To address this, a glass substrate impurity and gas cleaning equipment for coating lines is designed. Utility Model Content
[0004] The purpose of this invention is to provide a glass substrate impurity gas cleaning device for a coating line, so as to solve the problem mentioned in the background art that traditional cleaning devices cannot perform pre-cleaning before the glass substrate enters and cannot effectively prevent impurities from being released again in a vacuum environment.
[0005] To achieve the above objectives, this utility model provides the following technical solution: a glass substrate impurity gas cleaning device for a coating line, comprising a cleaning chamber, a sealed cover plate, a filter screen, and a vacuum pump. The sealed cover plate is disposed on one side of the cleaning chamber, the filter screen is disposed inside the cleaning chamber, and the vacuum pump is disposed on the other side of the cleaning chamber. A guide frame is disposed on one side of the cleaning chamber, and multiple guide rollers are rotatably installed inside the guide frame. Two vertical frames are disposed on the top of the guide frame, and vertical rods are disposed inside each of the two vertical frames. An auxiliary plate is sleeved on one end of each of the two vertical rods, and two arc-shaped plates are disposed at the bottom of the auxiliary plates. A roller brush is disposed between the two arc-shaped plates.
[0006] As a preferred embodiment of this utility model, the auxiliary plate is movably sleeved on one end of the two vertical rods, and multiple limiting holes are provided on one side of each of the two vertical frames.
[0007] As a preferred embodiment of this utility model, L-shaped blocks are fixedly installed on both sides of the auxiliary plate, and a limit strip is provided on one side of each of the two L-shaped blocks. One end of each of the two limit strips is respectively connected to the internal threads of multiple limit holes.
[0008] As a preferred embodiment of this utility model, the multiple limiting holes are arranged at equal intervals.
[0009] As a preferred embodiment of this utility model, the top ends of the two arc-shaped plates are fixedly connected to the bottom end of the auxiliary plate, a support shaft is provided between the inner walls of the two arc-shaped plates, and the roller brush is movably sleeved on one end of the support shaft.
[0010] As a preferred embodiment of this utility model, the bottom of the guide frame is provided with a placement plate, and the top of the placement plate is provided with a storage box.
[0011] As a preferred embodiment of this utility model, the bottom ends of the two vertical frames are fixedly connected to the top of the guide frame, and the positions of the two vertical frames are corresponding.
[0012] Compared with the prior art, the beneficial effects of this utility model are:
[0013] 1. This utility model discloses a glass substrate impurity gas cleaning device for a coating line. It comprises a vacuum pump, guide rollers, vertical rods, an auxiliary plate, a support shaft, and roller brushes. The glass substrate is placed on the side of the guide frame and pushed into the cleaning chamber. As the multiple guide rollers rotate, the substrate is moved to the surface of the filter screen by the roller brushes. The auxiliary plate can move up and down at one end of the two vertical rods. After the roller brushes contact the substrate surface, they limit the position of the auxiliary plate. As the substrate continues to move, the roller brushes repeatedly rub against the substrate surface, pre-cleaning away impurities. After the substrate enters the cleaning chamber, the vacuum pump is activated as the sealed cover closes, extracting the impurity gas from the substrate surface.
[0014] 2. This utility model discloses a glass substrate impurity gas cleaning device for a coating line. By setting up an L-shaped block, a storage box, limiting holes, and limiting strips, and by using a roller brush to pre-clean impurities on the substrate surface, the quality of impurity gas treatment by the cleaning device can be improved. The roller brush surface is provided with a large number of bristles, which can remove impurities under the friction between the bristles and the substrate. At the same time, the position and height of the auxiliary plate can be adjusted according to the thickness of the glass substrate of the coating line. After the auxiliary plate reaches the appropriate position, one end of the two limiting strips is embedded into the corresponding limiting holes, and the two are threaded together, thereby limiting and fixing the auxiliary plate and the two vertical frames. Attached Figure Description
[0015] Figure 1 This is a front view structural diagram of the present utility model;
[0016] Figure 2 This is a partial bottom view of the structure of this utility model;
[0017] Figure 3 For the present utility model Figure 2 Enlarged view of point A in the middle;
[0018] Figure 4 This is a partial side view of the structure of this utility model.
[0019] In the diagram: 1. Cleaning box; 2. Sealed cover; 3. Filter screen; 4. Vacuum pump; 5. Guide frame; 6. Guide roller; 7. Vertical frame; 8. Vertical rod; 9. Auxiliary plate; 10. L-shaped block; 11. Arc plate; 12. Support shaft; 13. Roller brush; 14. Limiting hole; 15. Limiting strip; 16. Placement plate; 17. Miscellaneous item box. Detailed Implementation
[0020] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.
[0021] Please see Figure 1-4 This utility model provides a technical solution for a glass substrate impurity gas cleaning device for a coating line:
[0022] Example 1:
[0023] like Figure 1-3As shown, a glass substrate impurity gas cleaning device for a coating line includes a cleaning chamber 1, a sealed cover plate 2, a filter screen 3, and a vacuum pump 4. The sealed cover plate 2 is located on one side of the cleaning chamber 1, the filter screen 3 is located inside the cleaning chamber 1, and the vacuum pump 4 is located on the other side of the cleaning chamber 1. A guide frame 5 is provided on one side of the cleaning chamber 1. Multiple guide rollers 6 are rotatably installed inside the guide frame 5. Two vertical frames 7 are provided on the top of the guide frame 5. Vertical rods 8 are provided inside each of the two vertical frames 7. An auxiliary plate 9 is sleeved on one end of each of the two vertical rods 8. Two arc-shaped plates 11 are provided at the bottom, and a roller brush 13 is provided between the two arc-shaped plates 11. L-shaped blocks 10 are fixedly installed on both sides of the auxiliary plate 9. Limiting strips 15 are provided on one side of each of the two L-shaped blocks 10. One end of each of the two limiting strips 15 is connected to the internal threads of multiple limiting holes 14. The roller brush 13 repeatedly rubs against the surface of the substrate, which can clean the impurities attached to the surface in advance. After the substrate enters the cleaning box 1, the vacuum pump 4 is started as the sealing cover 2 closes with the cleaning box 1, which can extract the impurity gas on the surface of the substrate.
[0024] Example 2:
[0025] Based on Example 1, such as Figure 1 and Figure 4 As shown, the top ends of the two arc-shaped plates 11 are fixedly connected to the bottom ends of the auxiliary plate 9, and a support shaft 12 is provided between the inner walls of the two arc-shaped plates 11. The roller brush 13 is movably sleeved on one end of the support shaft 12. This utility model is a glass substrate impurity gas cleaning device for coating lines. By setting up an L-shaped block 10, a storage box 17, a limiting hole 14, and a limiting strip 15, the roller brush 13 can pre-clean impurities on the substrate surface, thereby improving the quality of impurity gas treatment by the cleaning device. The roller brush 13 has a large number of bristles on its surface. Under the friction between the bristles and the substrate, the impurities can be cleaned off. At the same time, the position and height of the auxiliary plate 9 can be adjusted according to the thickness of the glass substrate of the coating line.
[0026] Working Principle: Glass substrate processing in coating lines is a critical production process widely used in the semiconductor, optoelectronics, display, and photovoltaic industries. This process aims to ensure the surface quality and performance of glass substrates to meet the requirements of high-tech applications. Before coating, impurity gases on the surface of the glass substrate need to be removed. The main components of the cleaning equipment include a vacuum pump 4, used to extract impurity gases from the substrate surface. The process involves placing the glass substrate inside the equipment, starting the vacuum pump 4, and evacuating the equipment to a low-pressure state to remove most of the impurity gases, facilitating subsequent plasma cleaning of the substrate. Since the glass substrate needs to be placed inside the equipment and the vacuum pump 4 removes impurities and gases, the vacuum pump 4 has a heavy workload. Traditional cleaning equipment cannot pre-clean the glass substrate before it enters the vacuum environment, thus failing to effectively prevent impurities from being released again, thereby reducing the processing efficiency of the cleaning equipment. Therefore, a glass substrate impurity gas cleaning device for coating lines is designed. The glass substrate is placed on the side of the guide frame 5 and pushed into the cleaning box 1. As multiple guide rollers 6 rotate, the glass substrate is... The substrate can be moved onto the surface of the filter screen 3 by the roller brush 13. The auxiliary plate 9 can move up and down at one end of the two vertical rods 8. After the roller brush 13 contacts the substrate surface, it limits the position of the auxiliary plate 9. As the substrate continues to move, the roller brush 13 repeatedly rubs against the substrate surface, which can clean the impurities attached to the surface in advance. After the substrate enters the cleaning chamber 1, the vacuum pump 4 is started as the sealing cover 2 closes with the cleaning chamber 1. The impurity gas on the substrate surface can be extracted and the impurities on the substrate surface can be removed by the roller brush 13. Pre-cleaning can improve the quality of impurity gas treatment by the cleaning equipment. The roller brush 13 has a large number of bristles on its surface. The friction between the bristles and the substrate can remove impurities. At the same time, the position and height of the auxiliary plate 9 can be adjusted according to the thickness of the glass substrate of the coating line. After the auxiliary plate 9 reaches the appropriate position, one end of the two limiting strips 15 is embedded into the corresponding limiting hole 14. The two are threaded together, which can limit and fix the auxiliary plate 9 and the two vertical frames 7. The cleaned impurities will fall into the impurity collection box 17 for collection.
[0027] In the description of this utility model, it should be understood that the indicated orientation or positional relationship is based on the orientation or positional relationship shown in the accompanying drawings, and is only for the convenience of describing this utility model and simplifying the description, and is not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model.
[0028] In this utility model, unless otherwise explicitly specified and limited, for example, it can be a fixed connection, a detachable connection, or an integral part; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium; it can be a connection within two components or an interaction between two components. Unless otherwise explicitly limited, those skilled in the art can understand the specific meaning of the above terms in this utility model according to the specific circumstances.
[0029] Although embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the present invention, the scope of which is defined by the appended claims and their equivalents.
Claims
1. A glass substrate impurity gas cleaning device for a coating line, comprising a cleaning chamber (1), a sealed cover plate (2), a filter screen (3), and a vacuum pump (4), wherein the sealed cover plate (2) is disposed on one side of the cleaning chamber (1), the filter screen (3) is disposed inside the cleaning chamber (1), and the vacuum pump (4) is disposed on the other side of the cleaning chamber (1), characterized in that: A guide frame (5) is provided on one side of the cleaning box (1). Multiple guide rollers (6) are rotatably installed inside the guide frame (5). Two vertical frames (7) are provided on the top of the guide frame (5). Vertical rods (8) are provided inside the two vertical frames (7). An auxiliary plate (9) is sleeved on one end of the two vertical rods (8). Two arc-shaped plates (11) are provided at the bottom of the auxiliary plate (9). A roller brush (13) is provided between the two arc-shaped plates (11).
2. The equipment for cleaning impurity gases from glass substrates in a coating line according to claim 1, characterized in that: The auxiliary plate (9) is movably sleeved on one end of the two vertical rods (8), and multiple limiting holes (14) are provided on one side of each of the two vertical frames (7).
3. The equipment for cleaning impurity gases from a glass substrate in a coating line according to claim 2, characterized in that: Both sides of the auxiliary plate (9) are fixedly installed with L-shaped blocks (10), and each of the two L-shaped blocks (10) is provided with a limit strip (15) on one side. One end of each of the two limit strips (15) is respectively connected to the internal threads of multiple limit holes (14).
4. The equipment for cleaning impurity gases from a glass substrate in a coating line according to claim 3, characterized in that: The multiple limiting holes (14) are arranged at equal intervals.
5. The equipment for cleaning impurity gases from glass substrates in a coating line according to claim 1, characterized in that: The top ends of the two arc-shaped plates (11) are fixedly connected to the bottom end of the auxiliary plate (9), and a support shaft (12) is provided between the inner walls of the two arc-shaped plates (11). The roller brush (13) is movably sleeved on one end of the support shaft (12).
6. The equipment for cleaning impurity gases from a glass substrate in a coating line according to claim 1, characterized in that: The bottom of the guide frame (5) is provided with a placement plate (16), and a miscellaneous storage box (17) is placed on the top of the placement plate (16).
7. The equipment for cleaning impurity gases from a glass substrate in a coating line according to claim 1, characterized in that: The bottom ends of the two vertical frames (7) are fixedly connected to the top of the guide frame (5), and the positions of the two vertical frames (7) are corresponding.