Lithographic equipment with gas bath device

Abstract

The utility model discloses photoetching equipment with a gas bath device, the photoetching equipment comprises a plurality of exposure lenses and the gas bath device arranged on one side of the exposure lenses, the gas bath device comprises a shell with a gas bath cavity formed inside, one end of the shell is provided with a gas inlet communicated with the gas bath cavity, and the other end of the shell is provided with a gas outlet communicated with the gas bath cavity. The plurality of groups of air outlet channels are arranged on one side or two opposite sides of the shell at intervals, each group of air outlet channels comprises a plurality of independent air outlets, air in the air bath cavity is sprayed out obliquely downwards through the air outlets, and air bath airflow sprayed out by each group of air outlet channels effectively covers an exposure area of the corresponding exposure lens and takes away heat of the exposure area in time; a better temperature control effect is achieved, and the temperature is prevented from influencing the precision of the photoetching equipment. In addition, when the energy plate moves to the lower side of the exposure lens for exposure lens view field center detection, the air bath airflow ejected by the multiple groups of air outlet channels effectively covers the energy plate area, the temperature drift of the energy plate is controlled, and the measurement precision of the energy plate is ensured.

Description

TECHNICAL FIELD

[0001] The utility model relates to the field of semiconductor photoetch equipment, in particular to photoetch equipment with air bath device. BACKGROUND

[0002] The photoetch equipment is a kind of high-precision equipment, and the internal environment cleanliness and the temperature of component greatly influence photoetch precision.For example, when the photoetch equipment exposes, laser is hit on the carrier plate or silicon wafer at focal plane position, and the heat of laser heats the air and carrier plate or silicon wafer on laser path, causes temperature fluctuation of exposure area, and produces adverse effect on exposure performance.When the energy plate of photoetch equipment carries out field center detection to exposure lens, energy plate moves to the downside of exposure lens, and due to the heat generated by exposure lens light emission, energy plate generates greater temperature drift, which influences the measurement accuracy of energy plate.

[0003] In the existing photoetch equipment, the energy plate and exposure area are controlled by the whole air bath in the equipment, due to the block of lens mounting platform in the photoetch equipment, the flow rate of air bath airflow through exposure area and energy plate area is very small, and there is heat source on the flow path of air bath airflow reaching exposure area and energy plate area, which causes poor temperature control precision of air bath airflow reaching exposure area and energy plate area, and the control of high-precision temperature and other environmental parameters of exposure area and energy plate area cannot be realized. SUMMARY

[0004] To solve the above problems, the utility model provides a kind of photoetch equipment with air bath device, can effectively take away the heat of exposure area and energy plate area, realizes better temperature control.

[0005] To realize one of the above purposes, the utility model provides a kind of photoetch equipment with air bath device, the photoetch equipment is provided with multiple exposure lenses, further include the air bath device installed in one side of the exposure lens, the air bath device includes:

[0006] Shell, inside form air bath cavity, one end is provided with the air inlet that communicates with the air bath cavity;

[0007] Multiple sets of air outlet channels are arranged at least one side of the shell, each set of air outlet channels includes multiple independent air outlets, the air outlet is lower than the light emitting surface of the exposure lens, and the gas in the air bath cavity is sprayed to the obliquely downward through the air outlet.

[0008] Optionally, the number of groups of air outlet channels is same as the number of exposure lenses, and the air outlet is close to the focal plane of the exposure lens.

[0009] Optionally, the shell includes upper shell, lower shell connected to the upper shell, and the air outlet channel is arranged in the lower shell.

[0010] Optionally, the lower shell comprises a bottom wall arranged in a horizontal direction, and an inclined wall connected to the bottom wall, an included angle formed by the inclined wall and the bottom wall being obtuse, and the air outlet being arranged on the inclined wall.

[0011] Optionally, the plurality of exposure lenses are arranged in two rows in a staggered manner on the lens mounting platform, and the air bath device is arranged between the two rows of exposure lenses; the air bath device comprises two rows of air outlet channels arranged on opposite sides of the shell, each row of air outlet channels comprises a plurality of groups of air outlet channels arranged at intervals, and the air bath device comprises a flow dividing block arranged between the two rows of air outlet channels.

[0012] Optionally, the flow dividing block comprises a flow dividing section close to the air inlet, and a partition section connected to the flow dividing section, and the width of the flow dividing section gradually increases to be close to the width of the partition section in a direction close to the partition section.

[0013] Optionally, the air bath device further comprises a threaded connecting piece penetrating through the shell and the flow dividing block, and the air bath device is mounted between the two groups of exposure lenses through the threaded connecting piece.

[0014] Optionally, the plurality of exposure lenses are arranged in one row on the lens mounting platform, the air bath device is arranged on one side of the exposure lenses, and the air outlet channel is close to the exposure lens.

[0015] Optionally, a plurality of connecting tables are arranged at intervals in the air bath cavity, the air bath device comprises a threaded connecting piece penetrating through the shell and the connecting table, and the air bath device is connected to the lens mounting platform of the lithography equipment through the threaded connecting piece.

[0016] Optionally, the air inlet is connected with an air inlet pipeline, the air inlet pipeline is connected with a precision air conditioner or a U fan filter unit.

[0017] The lithography equipment provided by the utility model is provided with an air bath device, the air bath device is provided with a plurality of groups of air outlet channels, the air bath airflow sprayed by each group of air outlet channels effectively covers the exposure area of the corresponding exposure lens, and the heat of the exposure area is carried away in time, so that a better temperature control effect is achieved, and the precision of the lithography equipment is avoided from being affected by temperature. In addition, when the energy plate moves to the lower side of the exposure lens to detect the field center of the exposure lens, the air bath airflow sprayed by the plurality of groups of air outlet channels effectively covers the area of the energy plate, the temperature drift of the energy plate is controlled, and the measurement precision of the energy plate is ensured. BRIEF DESCRIPTION OF DRAWINGS

[0018] Figure 1 It is a structural schematic view of the lithography equipment with the air bath device in the first embodiment;

[0019] Figure 2 It is a bottom view of the lithography equipment with the air bath device;

[0020] Figure 3 is a structural schematic view of the gas bath device in the first embodiment;

[0021] Figure 4 is Figure 3 is a bottom view of the gas bath device in the first embodiment;

[0022] Figure 5 is a cross-sectional view of the gas bath device in the first embodiment;

[0023] Figure 6 is a structural schematic view of a lithographic apparatus having a gas bath device in the second embodiment;

[0024] Figure 7 is a structural schematic view of the gas bath device in the second embodiment;

[0025] Figure 8 is a cross-sectional view of the gas bath device in the second embodiment. DETAILED DESCRIPTION

[0026] In order to facilitate the understanding of the present application, the present application will be described more fully below with reference to the specific embodiments. In the specific embodiments, the preferred embodiments of the present application are given. However, the present application can be realized in many different forms and is not limited to the embodiments described herein. On the contrary, the purpose of providing these embodiments is to make the disclosure of the present application more thorough and comprehensive.

[0027] The words "optionally" and the like in the present application refer to the embodiments of the present application that can provide certain beneficial effects in certain circumstances. However, other embodiments can also be optional in the same or other circumstances. In addition, the description of one or more optional embodiments does not imply that other embodiments are not available, nor is it intended to exclude other embodiments from the scope of the present application.

[0028] The present application provides a lithographic apparatus, referring to Figure 1 and Figure 2 The lithographic apparatus is provided with a plurality of exposure lenses 100 and an energy plate located below the exposure lenses 100. The gas bath device 200 is installed on one side of the exposure lens 100, and the energy plate can be arranged on the exposure platform of the lithographic apparatus. When detecting the field center of the exposure lens 100, the exposure platform drives the energy plate to move to the lower side of the exposure lens 100, and the light emitted by the exposure lens 100 is collected by the energy plate to obtain the field center data of the exposure lens 100.

[0029] The gas bath device 200 comprises a shell 1, a gas bath cavity 2 is formed inside the shell 1, one end of the shell 1 is provided with a gas inlet 3 communicating with the gas bath cavity 2, the gas inlet 3 can be connected with a gas inlet pipeline 4 providing constant temperature and clean air, so that the constant temperature and clean gas enters the gas bath cavity 2 through the gas inlet 3. Specifically, the gas inlet pipeline 4 can be directly connected with a precision air conditioner, or can be connected with an FFU fan filter unit, in addition, a fan can be installed on the gas inlet pipeline 4 or the gas inlet 3 of the gas bath device 200 to provide power for the flow of gas, and the gas flow pressure and flow rate of the gas inlet 3 are improved.

[0030] Referring to Figures 3 to 8 As shown in the figure, the gas bath device 200 further comprises a plurality of groups of gas outlet channels, which are arranged at least on one side of the shell 1. Specifically, the plurality of groups of gas outlet channels are arranged at positions corresponding to the arrangement positions of the exposure lenses 100 in the lithography equipment. It can be understood that when the lithography equipment is provided with one row of exposure lenses 100, the plurality of groups of gas outlet channels are arranged on one side of the shell 1. When the lithography equipment is provided with two rows of exposure lenses 100, the plurality of groups of gas outlet channels are arranged on opposite sides of the shell 1.

[0031] Each group of gas outlet channels comprises a plurality of independent gas outlets 5, and the shape of the gas outlet 5 is not limited, for example, the cross section of the gas outlet 5 can be circular, rectangular, racetrack-shaped, etc. The gas outlet 5 is lower than the light emitting surface of the exposure lens 100, and the gas in the gas bath cavity 2 is sprayed downward through the gas outlet 5, so that the gas bath gas flow sprayed by each group of gas outlet channels of the gas bath device 200 effectively covers the exposure area of the corresponding exposure lens 100, and timely removes the heat of the exposure area, so as to achieve a better temperature control effect and avoid the influence of temperature on the precision of the lithography equipment. In addition, when the energy plate moves to the lower side of the exposure lens 100 to detect the center of the field of view of the exposure lens 100, the gas bath gas flow sprayed by the plurality of groups of gas outlet channels effectively covers the area of the energy plate, controls the temperature drift of the energy plate, and ensures the measurement accuracy of the energy plate.

[0032] The gas bath device 200 can be made of metal materials such as aluminum alloy, stainless steel, etc., or plastic materials such as polyethylene (PE), polypropylene (PP) and polyvinyl chloride (PVC) etc.

[0033] Preferably, the number of groups of gas outlet channels is the same as the number of exposure lenses 100, and the gas outlet 5 is close to the focal plane of the exposure lens 100. The gas bath gas flow sprayed by each group of gas outlet channels of the gas bath device 200 effectively covers the focal plane area of the corresponding exposure lens 100, timely removes the heat of the focal plane area, achieves a better temperature control effect, and avoids the influence of temperature on the precision of the lithography equipment.

[0034] Optionally, the shell 1 comprises an upper shell 11, a lower shell 12 connected to the upper shell 11, and the upper shell 11 and the lower shell 12 can be connected by threads. The air outlet channel is arranged in the lower shell 12. It can be understood that in some embodiments, the upper shell 11 and the lower shell 12 can be arranged in mirror image, and in other embodiments, the upper shell 11 can be a plate, and the lower shell 12 forms the air bath cavity 2. The shell 1 is arranged in two parts, which is more convenient for processing and manufacturing the air bath device 200, reduces the processing cost while ensuring the processing precision of the air outlet channel.

[0035] Specifically, the lower shell 12 comprises a bottom wall 121 arranged in the horizontal direction, and an inclined wall 122 connected to the bottom wall 121, and the included angle formed by the inclined wall 122 and the bottom wall 121 is an obtuse angle. The air outlet 5 is arranged on the inclined wall 122, so that the gas in the air bath cavity 2 is sprayed downward through the air outlet 5, forming an air bath airflow that effectively covers the exposure area of the corresponding exposure lens 100 and the energy plate area.

[0036] It can be understood that the structure of the above-mentioned air bath device is applicable to each embodiment of the air bath device, and the structure of the air bath device 200 will be further described below through two specific embodiments.

[0037] In the first embodiment of the present application, referring to Figures 1 to 5 The lithography equipment comprises a lens mounting platform 300, a plurality of exposure lenses 100 are installed on the lens mounting platform 300 in a staggered manner, and the air bath device 200 is installed between the two rows of exposure lenses 100. Specifically, the air bath device 200 comprises two rows of air outlet channels arranged on opposite sides of the shell 1, each row of air outlet channels comprises a plurality of groups of air outlet channels arranged at intervals, and each group of air outlet channels comprises a plurality of independent air outlets 5. The air bath airflow sprayed by each group of air outlet channels of the air bath device 200 effectively covers the exposure area of the corresponding exposure lens 100, and timely carries away the heat of the two exposure areas, so as to achieve a better temperature control effect and avoid the influence of temperature on the precision of the lithography equipment. In addition, when the energy plate moves to the lower side of the exposure lens 100 to detect the field center of the exposure lens 100, the air bath airflow sprayed by the plurality of groups of air outlet channels effectively covers the energy plate area, controls the temperature drift of the energy plate, and ensures the measurement accuracy of the energy plate.

[0038] Further, the gas bath device 200 comprises a flow dividing block 6 between the two exhaust gas channels, the constant temperature and clean gas flowing into the gas inlet 3 is divided into two parts by the flow dividing block 6, and the two parts of gas are guided to flow out of the corresponding exhaust gas channel by the corresponding flow dividing plate. Specifically, the flow dividing block 6 comprises a flow dividing section 61 close to the gas inlet 3, and a separation section 62 connected with the flow dividing section 61. In the direction close to the separation section 62, the width of the flow dividing section 61 gradually increases to be close to the width of the separation section 62. The gradually increasing width of the flow dividing block 6 gradually increases the airflow resistance of the airflow entering the gas bath cavity 2, thereby avoiding the formation of vortex. It can be understood that the length of the flow dividing block 6 is close to the length of the shell 1. When the shell 1 is provided in a split manner, the flow dividing block 6 can be provided in the lower shell 11, or the flow dividing block 6 can comprise an upper flow dividing block connected to the upper shell 11 and a lower flow dividing block connected to the lower shell 12.

[0039] Preferably, a plurality of threaded connection holes are arranged on the flow dividing block 6 in an interval manner, the upper shell 11 and the lower shell 12 are respectively provided with an upper threaded hole and a lower threaded hole corresponding to each threaded connection hole, and the gas bath device 200 further comprises a threaded connecting piece penetrating through the shell 1 and the flow dividing block 6, which can be a bolt or a screw, etc. The threaded connecting piece sequentially passes through the lower threaded hole, the threaded connection hole and the upper threaded hole to install the gas bath device 200 between the two groups of exposure lenses 100. Through the cooperation of the flow dividing block 6 and the threaded connecting piece, the installation and positioning are facilitated, the installation accuracy of the gas bath device 200 is ensured, and the connection strength of the gas bath device 200 is increased. In the present application, after the installation of the gas bath device 200, each exhaust gas channel corresponds to an exposure lens 100, and the exhaust gas outlet 5 is lower than the light emitting surface of the exposure lens 100 and close to the focal surface of the exposure lens 100.

[0040] In the second embodiment of the present application, as shown in Figures 6 to 8 different from the first embodiment, the plurality of exposure lenses 100 are installed on the lens mounting platform 300 in a row, the gas bath device 200 is installed on one side of the exposure lens 100, and the exhaust gas channel is close to the exposure lens 100. The gas bath airflow sprayed by each group of exhaust gas channels of the gas bath device 200 effectively covers the exposure area of the corresponding exposure lens 100, and timely removes the heat of the exposure area, so as to achieve a better temperature control effect and avoid the influence of temperature on the precision of the photolithography equipment. In addition, when the energy plate moves to the lower side of the exposure lens 100 to detect the field center of the exposure lens 100, the gas bath airflow sprayed by the plurality of exhaust gas channels effectively covers the area of the energy plate, controls the temperature drift of the energy plate, and ensures the measurement accuracy of the energy plate.

[0041] Further, different from the first embodiment, a plurality of connecting platforms 7 are arranged in the air bath cavity 2 at intervals, each connecting platform 7 is provided with a threaded connecting hole, the upper shell 11 and the lower shell 12 are respectively provided with an upper threaded hole and a lower threaded hole corresponding to each threaded connecting hole, the air bath device 200 further comprises a threaded connecting piece arranged through the shell 1 and the connecting platform 7, and the threaded connecting piece sequentially passes through the lower threaded hole, the threaded connecting hole and the upper threaded hole to connect the air bath device 200 to the lens mounting platform 300 of the photoetching equipment. Through the cooperation of the connecting platforms 7 arranged at intervals and the threaded connecting piece, the flow direction of the gas in the air bath cavity 2 is not affected, and the installation and positioning are facilitated, the installation precision and the connecting strength of the air bath device 200 are ensured.

[0042] The air bath device 200 of the utility model, each group of air outlet channels sprays air bath airflow to effectively cover the exposure area of the corresponding exposure lens 100, timely takes away the heat of the exposure area, achieves better temperature control effect, avoids the influence of temperature on the precision of the photoetching equipment. In addition, when the energy plate moves to the lower side of the exposure lens 100 to detect the field center of the exposure lens 100, the air bath airflow sprayed by the plurality of air outlet channels effectively covers the area of the energy plate, controls the temperature drift of the energy plate, and ensures the measurement precision of the energy plate.

[0043] The above is only a preferred specific embodiment of the utility model, but the protection scope of the utility model is not limited to this, any skilled person in the art can make equivalent replacement or change according to the technical scheme and the utility model concept of the utility model within the technical range disclosed by the utility model, which should be covered in the protection scope of the utility model.

Claims

1. A lithographic apparatus having a gas bath device, the lithographic apparatus being provided with a plurality of exposure lenses, characterized in that, Also include a gas bath device installed on one side of the exposure lens, the gas bath device comprises: A housing, an air bath cavity is formed inside, one end is provided with an air inlet communicating with the air bath cavity; A plurality of groups of air outlet channels are arranged at least one side of the housing, each group of air outlet channels comprises a plurality of independent air outlets, the air outlet is lower than the light emitting surface of the exposure lens, the gas in the air bath cavity is sprayed to the obliquely downward through the air outlet.

2. The lithographic apparatus having a gas bath device according to claim 1, characterized in that, The number of groups of air outlet channels is the same as the number of exposure lenses, and the air outlet is close to the focal plane of the exposure lens.

3. The lithographic apparatus having a gas bath device according to claim 1, wherein, The housing comprises an upper housing, a lower housing connected to the upper housing, and the air outlet channel is arranged in the lower housing.

4. The lithographic apparatus having a gas bath device according to claim 3, wherein, The lower housing comprises a bottom wall arranged in the horizontal direction, and an inclined wall connected to the bottom wall, the included angle formed by the inclined wall and the bottom wall is obtuse, and the air outlet is arranged on the inclined wall.

5. The photolithography apparatus having a gas bath device according to claim 1, wherein, A plurality of exposure lenses are installed on the lens mounting platform in a staggered manner, and the gas bath device is installed between the two rows of exposure lenses. The gas bath device comprises two rows of air outlet channels arranged on opposite sides of the housing, each row of air outlet channels comprises a plurality of groups of air outlet channels arranged at intervals, and the gas bath device comprises a flow dividing block between the two rows of air outlet channels.

6. The lithographic apparatus having a gas bath device according to claim 5, wherein, The flow dividing block comprises a flow dividing section close to the air inlet, and a separation section connected to the flow dividing section, and the width of the flow dividing section gradually increases close to the separation section.

7. The lithographic apparatus having a gas bath device according to claim 6, wherein, The gas bath device further comprises a threaded connecting piece penetrating through the housing and the flow dividing block, and the gas bath device is installed between the two groups of exposure lenses through the threaded connecting piece.

8. The photolithography apparatus having a gas bath device according to claim 1, wherein, A plurality of exposure lenses are installed on the lens mounting platform in a row, the gas bath device is installed on one side of the exposure lens, and the air outlet channel is close to the exposure lens.

9. The lithographic apparatus having a gas bath device according to claim 7, wherein, The air bath cavity is provided with a plurality of connecting tables arranged at intervals, the gas bath device comprises a threaded connecting piece penetrating through the housing and the connecting table, and the gas bath device is connected to the lens mounting platform of the lithography equipment through the threaded connecting piece.

10. The photolithography apparatus having a gas bath device according to claim 1, wherein, The air inlet is connected with the air inlet pipeline, the air inlet pipeline is connected with the precision air conditioner or the U fan filter unit.

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