Rapid target mounting structure for magnetron sputtering

Abstract

The utility model relates to the field of magnetron sputtering target material installation, and discloses a magnetron sputtering target material fast installation structure which comprises a target material installation back plate, a target material pressing ring is arranged on the top of the target material installation back plate, and a target material body located at the bottom of the target material pressing ring is arranged on the top of the target material installation back plate. The surface of the target mounting back plate is sleeved with a gear ring, a stabilizing ring is fixedly mounted on the surface of the target mounting back plate, a screw is movably connected to the top of the stabilizing ring, and a gear is fixedly connected to the surface of the screw. According to the utility model, through the mutual cooperation of the gear ring, the gears and the screw rod structure, the gear ring rotates to drive the gears and the screw rod to rotate, so that the screw rod drives the moving ring to slide and move downwards on the surface of the target material mounting back plate, and the moving ring is driven to move the pressing plate downwards through the control rod to press the top of the target material pressing ring; the effect that the target material body is rapidly installed on the target material installation back plate under rapid pressing of the target material pressing ring is achieved.

Description

TECHNICAL FIELD

[0001] The utility model relates to magnetron sputtering target material installation technical field especially relates to a magnetron sputtering target material quick installation structure. BACKGROUND

[0002] Magnetron sputtering technology is a kind of physical vapor deposition (PVD) technology widely used in material science field, it is through in vacuum condition using magnetic field and electric field together, the material on the target surface is sputtered and deposited to substrate material, forms the required thin film, in the vacuum chamber of sputtering equipment, a certain amount of inert gas (usually argon) is passed in, and electric field is applied to make gas ionization, and plasma is generated. Argon ion accelerates under the action of electric field and flies to the target material, because the ion has certain energy, when they impact the target surface, target atoms or molecules will be sputtered, and the purity and quality of the target material have great influence on the performance of the thin film;

[0003] Back plate is the basic component of magnetron sputtering target material installation, and its main role is to provide stable support for target material, because in the sputtering process, the target material will be bombarded by ions, and it needs to have enough strength and stability to keep its position unchanged, prevent the target material from displacement or shaking due to stress, and affect the sputtering effect, and in the magnetron sputtering, the target material is fixed with the back plate, generally mechanical fixation is adopted, and the target material is pressed tightly with the back plate by using screws, nuts and other parts through target material pressure ring, so that the target material and the back plate are installed together, and in the target replacement, a plurality of screws are sequentially removed, and then the target material pressure ring is taken out, so that the target material can be replaced, and the target replacement process is also very inconvenient.

[0004] Therefore, a magnetron sputtering target material quick installation structure is provided to solve the above problems. UTILITY MODEL CONTENTS

[0005] In order to make up for the above shortcomings, the utility model provides a magnetron sputtering target material quick installation structure, which aims at improving the inconvenient installation of the target material through the target material pressure ring and screws and the back plate in the prior art, and the problem of inconvenient magnetron sputtering after the installation of the target material and the back plate.

[0006] In order to achieve the above purpose, the utility model adopts the following technical scheme:

[0007] The application discloses a quick mounting structure for a target material for magnetron sputtering.

[0008] As a further description of the above technical solution:

[0009] The control member comprises a control rod which is rotationally connected to the top of the moving ring, the top of the surface of the control rod is sleeved with the compression plate, and the top of the surface of the control rod is threadedly connected with a nut.

[0010] As a further description of the above technical solution:

[0011] The inside of the compression plate is inlaid with an extrusion ring, and the inner wall of the extrusion ring is in contact with the surface of the control rod.

[0012] As a further description of the above technical solution:

[0013] The bottom end of the control rod is fixedly connected with a limiting block, and the top of the limiting block is in contact with the bottom of the moving ring.

[0014] As a further description of the above technical solution:

[0015] The outer side of the moving ring is threadedly connected with an anode shielding cover, and the anode shielding cover is located at the outer side of the target material compression ring.

[0016] As a further description of the above technical solution:

[0017] The outer side of the target material mounting back plate is sleeved with a reinforcing ring, and the screw rod is movably connected to the inside of the reinforcing ring.

[0018] As a further description of the above technical solution:

[0019] The top of the stabilizing ring is fixedly connected with a sealing ring, and the top of the sealing ring is in contact with the bottom of the reinforcing ring.

[0020] As a further description of the above technical solution:

[0021] The top of the stabilizing ring is movably inlaid with a ball, and the tooth ring is rotationally connected to the top of the ball.

[0022] The utility model discloses a quick mounting structure for a target material for magnetron sputtering.

[0023] The utility model discloses a kind of target material quick installation structures for magnetron sputtering, including target material installation backboard, target material compression ring, target material body, gear ring, stabilizing ring, screw rod, gear, moving ring and compression plate, the target material installation backboard is installed on the target material compression ring, the target material body is installed on the target material compression ring, the gear ring is installed on the target material compression ring, the stabilizing ring is installed on the target material compression ring, the screw rod is installed on the target material compression ring, the gear is installed on the target material compression ring, the moving ring is installed on the target material compression ring, and the compression plate is installed on the target material compression ring.

[0024] The utility model discloses a kind of target material quick installation structures for magnetron sputtering, including target material installation backboard, target material compression ring, target material body, gear ring, stabilizing ring, screw rod, gear, moving ring and compression plate, the target material installation backboard is installed on the target material compression ring, the target material body is installed on the target material compression ring, the gear ring is installed on the target material compression ring, the stabilizing ring is installed on the target material compression ring, the screw rod is installed on the target material compression ring, the gear is installed on the target material compression ring, the moving ring is installed on the target material compression ring, and the compression plate is installed on the target material compression ring. BRIEF DESCRIPTION OF DRAWINGS

[0025] Figure 1 It is a three-dimensional schematic view of the utility model to propose a kind of target material quick installation structure for magnetron sputtering;

[0026] Figure 2 It is the meshing three-dimensional structure schematic view of the utility model to propose a kind of target material quick installation structure for magnetron sputtering gear ring and gear;

[0027] Figure 3 It is the structure schematic view of the utility model to propose a kind of target material quick installation structure for magnetron sputtering main view section;

[0028] Figure 4 It is the three-dimensional structure schematic view of the utility model to propose a kind of target material quick installation structure for magnetron sputtering compression plate to target material compression ring compression;

[0029] Figure 5 It is the three-dimensional structure schematic view of the utility model to propose a kind of target material quick installation structure for magnetron sputtering compression plate and target material compression ring disengaging compression so that target material compression ring is convenient to take out.

[0030] LEGEND:

[0031] 1, target material installation backboard;2, target material compression ring;3, target material body;4, gear ring;5, stabilizing ring;6, screw rod;7, gear;8, moving ring;9, compression plate;101, control rod;102, nut;11, extrusion ring;12, limit block;13, anode shield;14, reinforcing ring;15, sealing ring;16, ball. DETAILED DESCRIPTION

[0032] With reference to the drawings of the embodiments of the present application, the technical solutions in the embodiments of the present application will be described clearly and completely. Obviously, the described embodiments are only some of the embodiments of the present application, but not all the embodiments. Based on the embodiments of the present application, all other embodiments obtained by those skilled in the art without creative work are within the scope of protection of the present application.

[0033] With reference to the drawings of the embodiments of the present application, the technical solutions in the embodiments of the present application will be described clearly and completely. Obviously, the described embodiments are only some of the embodiments of the present application, but not all the embodiments. Based on the embodiments of the present application, all other embodiments obtained by those skilled in the art without creative work are within the scope of protection of the present application. Figures 1-3 The utility model provides an embodiment: a target material quick installation structure for magnetron sputtering, including target material installation backplate 1, target material installation backplate 1's top is provided with target material compression ring 2, target material installation backplate 1's top is provided with the target material body 3 at target material compression ring 2 bottom, the surface of target material installation backplate 1 is equipped with gear ring 4, the surface of target material installation backplate 1 is fixedly installed with stabilizing ring 5, the top of stabilizing ring 5 is movably connected with screw rod 6, the surface of screw rod 6 is fixedly connected with gear 7, the surface of gear 7 and the surface of gear ring 4 are mutually engaged, the surface of target material installation backplate 1 is equipped with moving ring 8, the surface of screw rod 6 is internally threaded with moving ring 8, the outside of moving ring 8 is connected with anode shield 13 through external thread, anode shield 13 is located at the outside of target material compression ring 2, in the process of magnetron sputtering, there will be sputtered target material atom, ion and reaction gas substance, and anode shield 13 is just to prevent these substances from depositing on the anode surface, to ensure that the anode can normally play its role in the process of plasma discharge, the top of moving ring 8 is rotatably connected with compression plate 9 through control piece, after gear ring 4 drives gear 7 to rotate, screw rod 6 is rotated, moving ring 8 is slid down on the surface of target material installation backplate 1 by screw rod 6 thread, after moving ring 8 is driven, compression plate 9 is moved down through control rod 101, compression plate 9 is pressed on the top of target material compression ring 2, target material compression ring 2 is pressed on target material installation backplate 1 to achieve the purpose of target material body 3 and installation, so as to carry out magnetron sputtering in the later period.

[0034] With reference to the drawings of the embodiments of the present application, the technical solutions in the embodiments of the present application will be described clearly and completely. Obviously, the described embodiments are only some of the embodiments of the present application, but not all the embodiments. Based on the embodiments of the present application, all other embodiments obtained by those skilled in the art without creative work are within the scope of protection of the present application. Figures 3-5, the control piece includes a control rod 101, the control rod 101 is rotatably connected at the top of the moving ring 8, the pressing plate 9 is sleeved on the top of the surface of the control rod 101, the top of the surface of the control rod 101 is threadedly connected with a nut 102, the nut 102 is used for limiting and fixing the pressing plate 9, so that the pressing plate 9 is stably sleeved and is not easy to be separated, when the pressing plate 9 needs to be moved out of the target material pressing ring 2, so that the target material body 3 is taken out for replacement, the pressing plate 9 is rotated and moved out of the top of the target material pressing ring 2 with the control rod 101 as the center, so that the pressing effect of the target material pressing ring 2 is released, then the target material pressing ring 2 is taken out, and the target material body 3 is quickly moved out of the target material mounting back plate 1 after being moved upward, so that the target material body 3 is replaced, so that the problem of inconvenient replacement of the target material body 3 is solved, the inside of the pressing plate 9 is inlaid with an extrusion ring 11, the inner wall of the extrusion ring 11 is in contact with the surface of the control rod 101, the extrusion ring 11 is inlaid in the pressing plate 9, and the pressing plate 9 is not easy to rotate after being rotated and moved out of the top of the target material pressing ring 2, so that the operator can take the target material pressing ring 2 and replace the target material body 3, the bottom end of the control rod 101 is fixedly connected with a limiting block 12, the top of the limiting block 12 is in contact with the bottom of the moving ring 8, and the limiting block 12 can be clamped at the bottom end of the control rod 101 to limit the bottom end of the control rod 101, so that the phenomenon of displacement of the bottom end of the control rod 101 is prevented.

[0035] Referring to Figures 3-5 , the outside of the target material mounting back plate 1 is sleeved with a reinforcing ring 14, the screw rod 6 is movably connected in the inside of the reinforcing ring 14, the top of the stabilizing ring 5 is fixedly connected with a sealing ring 15, the top of the sealing ring 15 is in contact with the bottom of the reinforcing ring 14, the reinforcing ring 14 can strengthen the use stability of the screw rod 6, and can cooperate with the sealing ring 15 to seal the meshing place of the tooth ring 4 and the gear 7, so that the problem that the tooth ring 4 and the gear 7 are easily blocked by foreign matters and affect use is prevented, the top of the stabilizing ring 5 movably inlays a ball 16, the tooth ring 4 is rotatably connected at the top of the ball 16, and the ball 16 can stably rotate the tooth ring 4 at the top of the stabilizing ring 5, so that the tooth ring 4 is smoothly driven by the user.

[0036] Working principle: in use, the user through the recess on the target material pressure ring 2 limit after placing the target material body 3 in the target material installation back plate 1 top, then through the rotation tooth ring 4, make the tooth ring 4 through the meshing drive multiple gear 7 and screw rod 6 rotation, in order to screw rod 6 screw drive moving ring 8 in the surface of target material installation back plate 1 sliding down, moving ring 8 in the process of down through the control rod 101 linkage drive compression plate 9 down, make compression plate 9 down and press in the top of target material pressure ring 2, make target material pressure ring 2 will target material body 3 stable compression in the target material installation back plate 1, in order to sputter system in the quick will target material body 3 compression in the target material installation back plate 1, replace the prior art through multiple screws will target material pressure ring 2 and target material body 3 installation mode, so as to reach in the magnetron sputtering in favor of the effect of target material installation.

[0037] Finally, it should be noted that: the above only for the preferred embodiments of the present application and does not limit the present application, although the foregoing detailed description of the present application, for those skilled in the art, it still can be modified, or part of the technical features of the equivalent replacement, within the spirit and principles of the present application, any modification, equivalent replacement, improvement, etc., should be included in the scope of the present application.

Claims

1. A quick installation structure of target material for magnetron sputtering, comprising a target material installation back plate (1), the top of the target material installation back plate (1) is provided with a target material compression ring (2), the top of the target material installation back plate (1) is provided with a target material body (3) located at the bottom of the target material compression ring (2), characterized in that: The surface of the target mounting back plate (1) is sleeved with a gear ring (4), the surface of the target mounting back plate (1) is fixedly provided with a stabilizing ring (5), the top of the stabilizing ring (5) is movably connected with a screw rod (6), the surface of the screw rod (6) is fixedly connected with a gear (7), the surface of the gear (7) is in mesh with the surface of the gear ring (4), the surface of the target mounting back plate (1) is sleeved with a moving ring (8), the surface of the screw rod (6) is in threaded connection with the inside of the moving ring (8), and the top of the moving ring (8) is rotatably connected with a pressing plate (9) through a control member. ​ 2. The quick installation structure of a target material for magnetron sputtering according to claim 1, characterized in that: The control member comprises a control rod (101), the control rod (101) is rotatably connected to the top of the moving ring (8), the pressing plate (9) is sleeved on the top of the surface of the control rod (101), and the top of the surface of the control rod (101) is in threaded connection with a nut (102).

3. The quick installation structure of a target material for magnetron sputtering according to claim 2, characterized in that: The inside of the pressing plate (9) is inlaid with an extrusion ring (11), and the inner wall of the extrusion ring (11) is in contact with the surface of the control rod (101).

4. The quick installation structure of a target material for magnetron sputtering according to claim 3, characterized in that: The bottom end of the control rod (101) is fixedly connected with a limiting block (12), and the top of the limiting block (12) is in contact with the bottom of the moving ring (8).

5. The quick installation structure of a target for magnetron sputtering according to claim 1, characterized in that: The outer side of the moving ring (8) is in external threaded connection with an anode shield (13), and the anode shield (13) is located on the outer side of the target pressing ring (2).

6. The quick installation structure of a target for magnetron sputtering according to claim 1, characterized in that: The outer side of the target mounting back plate (1) is sleeved with a reinforcing ring (14), and the screw rod (6) is movably connected in the inside of the reinforcing ring (14).

7. The quick installation structure of a target material for magnetron sputtering according to claim 6, characterized in that: The top of the stabilizing ring (5) is fixedly connected with a sealing ring (15), and the top of the sealing ring (15) is in contact with the bottom of the reinforcing ring (14).

8. The quick installation structure of a target for magnetron sputtering according to claim 1, characterized in that: The top of the stabilizing ring (5) is movably inlaid with a ball (16), and the gear ring (4) is rotatably connected to the top of the ball (16).

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