Monitoring system of deposition equipment and deposition equipment

Abstract

The utility model relates to the technical field of photovoltaics and semiconductors, in particular to a monitoring system of deposition equipment and the deposition equipment, and solves the problem that the monitoring system of the deposition equipment is poor in operation stability. The monitoring system of the deposition equipment provided by the embodiment of the utility model is configured to monitor and control various auxiliary devices of the deposition equipment. The monitoring system of the deposition equipment comprises a programmable controller, a switch and a serial server. The switch is in communication connection with the programmable controller, and the serial port server is in communication connection with the various auxiliary devices and the switch respectively, so that the serial port server can perform data exchange with the various auxiliary devices and the programmable controller respectively, and a part of communication load of the programmable controller is transferred to the serial port server; the communication load of the programmable controller is reduced, and the operation stability of the monitoring system of the deposition equipment is improved.

Description

TECHNICAL FIELD

[0001] The present disclosure relates to the field of photovoltaic and semiconductor technology, and in particular, to a monitoring system of a deposition device and the deposition device. BACKGROUND

[0002] In the photovoltaic and semiconductor industry, a deposition device is usually used to perform a thin film deposition process on a product. Generally, the deposition device needs to have many auxiliary features when performing the thin film deposition process on the product, such as a certain amount of process gas, a vacuum process environment, and a power-on state, and therefore, a variety of auxiliary devices are needed to provide a variety of auxiliary functions for performing the thin film deposition process, and a monitoring system is needed to monitor and control the variety of auxiliary devices.

[0003] At present, the monitoring system of the related art usually uses a programmable controller to be in communication connection with the variety of auxiliary devices to achieve data exchange between the programmable controller and the variety of auxiliary devices. However, because the communication mode and the communication protocol of the variety of auxiliary devices are different from those of the programmable controller, the programmable controller needs to add multiple communication interfaces. The multiple communication interfaces of the programmable controller are in communication connection with the communication interfaces of the variety of auxiliary devices to enable the programmable controller to exchange data with the variety of auxiliary devices, which results in a large communication load of the programmable controller and further results in poor running stability of the monitoring system. SUMMARY

[0004] Therefore, the embodiments of the present disclosure provide a monitoring system of a deposition device and the deposition device, which solve the problem of poor running stability of the monitoring system of the deposition device.

[0005] In a first aspect, the embodiments of the present disclosure provide a monitoring system of a deposition device, configured to monitor and control a variety of auxiliary devices of the deposition device; wherein the monitoring system of the deposition device comprises: a programmable controller; a switch in communication connection with the programmable controller; and a serial server in communication connection with the variety of auxiliary devices and the switch respectively, so that the serial server exchanges data with the variety of auxiliary devices and the programmable controller respectively.

[0006] In some embodiments, the programmable controller has a first communication interface, the switch has at least two second communication interfaces, the serial server has a third communication interface and a plurality of fourth communication interfaces, and the auxiliary devices have a fifth communication interface; wherein the monitoring system of the deposition apparatus further comprises: a first communication connection line connecting the first communication interface and one of the second communication interfaces, so that the switch is in communication connection with the programmable controller; a second communication connection line connecting another of the second communication interfaces and the third communication interface, so that the switch is in communication connection with the serial server; and a plurality of third communication connection lines, each of which is arranged in one-to-one correspondence with one of the fourth communication interfaces and one of the auxiliary devices, and connects the fourth communication interface and the fifth communication interface of the corresponding auxiliary device, so that the serial server is in communication connection with the plurality of auxiliary devices respectively.

[0007] In some embodiments, the communication mode between the serial server and the programmable controller comprises Ethernet communication; wherein the first communication interface, the second communication interface and the third communication interface are all Ethernet interfaces, and the first communication connection line and the second communication connection line are both Ethernet network cables.

[0008] In some embodiments, the communication protocols adopted by the serial server and the switch, and by the switch and the programmable controller in communication connection comprise TCP protocol and IP protocol.

[0009] In some embodiments, the fourth communication interface and the fifth communication interface are both RS485 interfaces, and the third communication connection line is an RS485 connection line, or the fourth communication interface and the fifth communication interface are both RS232 interfaces, and the third communication connection line is an RS232 connection line.

[0010] In some embodiments, the communication protocols adopted by the serial server and the auxiliary devices in communication connection comprise free protocol and Modbus protocol.

[0011] In some embodiments, the auxiliary devices comprise electrically operated valves, radio frequency power supplies, flow meters and vacuum pumps.

[0012] In some embodiments, at least one of the auxiliary devices comprises a plurality of auxiliary devices of the same type, and the plurality of auxiliary devices of the same type are in communication connection with each other and with the corresponding fourth communication interface.

[0013] In some embodiments, the number of fourth communication interfaces is greater than or equal to the number of types of auxiliary devices.

[0014] In a second aspect, the embodiments of the present disclosure provide a deposition equipment, comprising: a deposition device configured to perform a thin film deposition process on a product; a plurality of auxiliary devices connected to the deposition device and respectively configured to provide a plurality of auxiliary functions for the deposition device; and the monitoring system of the deposition equipment of the first aspect, configured to monitor and control the plurality of auxiliary devices.

[0015] The monitoring system of the deposition equipment provided by the embodiments of the present disclosure is connected in communication with the plurality of auxiliary devices through the serial server, and the serial server is connected in communication with the programmable controller through the switch, thereby replacing the communication connection between the programmable controller and the plurality of auxiliary devices, achieving the transfer of part of the communication load of the programmable controller to the serial server, reducing the communication load of the programmable controller, and improving the operation stability of the monitoring system of the deposition equipment. BRIEF DESCRIPTION OF DRAWINGS

[0016] Figure 1 Fig. 1 shows an application scenario of the monitoring system of the deposition equipment provided by an embodiment of the present disclosure.

[0017] Figure 2 Fig. 2 shows a communication relationship diagram of the monitoring system of the deposition equipment provided by an embodiment of the present disclosure.

[0018] Figure 3 Fig. 3 shows a structure diagram of the deposition equipment provided by an embodiment of the present disclosure.

[0019] REFERENCE SIGNS

[0020] 1, deposition equipment; 10, monitoring system of the deposition equipment; 100, programmable controller; 101, first communication interface; 200, switch; 201, second communication interface; 300, serial server; 301, third communication interface; 302, fourth communication interface; 400, first communication connection line; 500, second communication connection line; 600, third communication connection line; 20, auxiliary device; 2001, fifth communication interface; 210, first auxiliary device; 220, second auxiliary device; 230, third auxiliary device; 240, fourth auxiliary device; 30, deposition device. DETAILED DESCRIPTION

[0021] The technical solutions in the embodiments of the present disclosure will be described clearly and completely below with reference to the drawings in the embodiments of the present disclosure. Obviously, the described embodiments are only part of the embodiments of the present disclosure, rather than all the embodiments. Based on the embodiments in the present disclosure, all other embodiments obtained by those skilled in the art without creative labor fall within the scope of protection of the present disclosure.

[0022] Figure 1An application scenario of a monitoring system of a deposition equipment provided by an embodiment of the present disclosure is shown. Figure 2 A communication relationship diagram of a monitoring system of a deposition equipment provided by an embodiment of the present disclosure is shown. As shown in the diagram, Figure 1 and Figure 2 As shown, the monitoring system 10 of the deposition equipment is configured to monitor and control a plurality of auxiliary devices 20 of the deposition equipment 1. The monitoring system 10 of the deposition equipment includes a programmable controller 100, a switch 200, and a serial server 300. The switch 200 is communicatively connected to the programmable controller 100. The serial server 300 is communicatively connected to the plurality of auxiliary devices 20 and the switch 200, respectively, so that the serial server 300 exchanges data with the plurality of auxiliary devices 20 and the programmable controller 100, respectively.

[0023] The monitoring system 10 of the deposition equipment uses the serial server 300 to communicatively connect to the plurality of auxiliary devices 20, and the serial server 300 communicatively connects to the programmable controller 100 through the switch 200, instead of the programmable controller 100 communicatively connecting to the plurality of auxiliary devices 20, which transfers part of the communication load of the programmable controller 100 to the serial server 300, reduces the communication load of the programmable controller 100, and improves the operation stability of the monitoring system 10 of the deposition equipment.

[0024] In addition, compared with the programmable controller 100 communicatively connecting to the plurality of auxiliary devices 20, the wiring mode of the monitoring system 10 of the deposition equipment is simpler, and the manufacturing and maintenance costs are lower.

[0025] Exemplarily, the data exchange content between the programmable controller 100 and the serial server 300 can include communication state acquisition, abnormal alarm processing, connection disconnection alarm processing, and the like of the auxiliary devices 20. The data content is different according to the types of the auxiliary devices 20. Exemplarily, the communication state includes communication heartbeat, single data exchange size, data exchange times, and the like. Exemplarily, the abnormal alarm processing includes interface abnormality unrecoverable failure, single interface failure, abnormal power supply failure, and the like. Exemplarily, the connection disconnection alarm includes auxiliary device 20 communication interruption alarm, data error, and the like.

[0026] Exemplarily, as shown, Figure 1 The deposition equipment 1 includes four auxiliary devices 20, and the serial server 300 communicatively connects to the four auxiliary devices 20 to receive data information transmitted by the four auxiliary devices 20, and transmits the data information to the programmable controller 100 through the switch 200. Similarly, the programmable controller 100 transmits control instruction data to the serial server 300 through the switch 200, and the serial server 300 transmits the control instruction data to the corresponding auxiliary devices 20.

[0027] In some embodiments, such as Figure 1 As shown, the programmable controller has a first communication interface 101, the switch 200 has at least two second communication interfaces 201, the serial server 300 has a third communication interface 301 and multiple fourth communication interfaces 302, and the auxiliary device 20 has a fifth communication interface 2001. The monitoring system 10 of the deposition equipment also includes a first communication connection line 400, a second communication connection line 500, and multiple third communication connection lines 600. The first communication connection line 400 connects the first communication interface 101 to one of the second communication interfaces 201, enabling the switch 200 to communicate with the programmable controller 100. The second communication connection line 500 connects another second communication interface 201 to the third communication interface 301, enabling the switch 200 to communicate with the serial server 300. The multiple third communication connection lines 600 are configured one-to-one with the multiple fourth communication interfaces 302 and the various auxiliary devices 20. The third communication connection line 600 connects the fourth communication interface 302 to the fifth communication interface 2001 of a corresponding auxiliary device 20, so that the serial port server 300 can communicate with various auxiliary devices 20 respectively.

[0028] For example, such as Figure 1 As shown, the switch 200 has multiple second communication interfaces 201, two of which are used for communication connections between the switch 200 and the programmable controller 100 and between the switch 200 and the serial server 300, respectively. The remaining second communication interfaces 201 serve as backup communication interfaces and can be used for communication connections with other servers and controllers.

[0029] For example, such as Figure 1 As shown, the four auxiliary devices 20 are the first auxiliary device 210, the second auxiliary device 220, the third auxiliary device 230, and the fourth auxiliary device 240. The number of third communication connection lines 600 is four.

[0030] Exemplarily, the number of the fourth communication interfaces 302 is four. The first third communication connection line 600 connects the first fourth communication interface 302 of the serial port server 300 and the fifth communication interface 2001 of the first auxiliary device 210, so as to realize the communication connection between the serial port server 300 and the first auxiliary device 210, and enable the serial port server 300 to receive the data information transmitted by the first auxiliary device 210 and transmit the control instruction data to the first auxiliary device 210. The second third communication connection line 600 connects the second fourth communication interface 302 of the serial port server 300 and the fifth communication interface 2001 of the second auxiliary device 220, so as to realize the communication connection between the serial port server 300 and the second auxiliary device 220, and enable the serial port server 300 to receive the data information transmitted by the second auxiliary device 220 and transmit the control instruction data to the second auxiliary device 220. The third third communication connection line 600 connects the third fourth communication interface 302 of the serial port server 300 and the fifth communication interface 2001 of the third auxiliary device 230, so as to realize the communication connection between the serial port server 300 and the third auxiliary device 230, and enable the serial port server 300 to receive the data information transmitted by the third auxiliary device 230 and transmit the control instruction data to the third auxiliary device 230. The fourth third communication connection line 600 connects the fourth fourth communication interface 302 of the serial port server 300 and the fifth communication interface 2001 of the fourth auxiliary device 240, so as to realize the communication connection between the serial port server 300 and the fourth auxiliary device 240, and enable the serial port server 300 to receive the data information transmitted by the fourth auxiliary device 240 and transmit the control instruction data to the fourth auxiliary device 240.

[0031] In some embodiments, the communication mode between the serial port server 300 and the programmable controller 100 includes Ethernet communication. The first communication interface 101, the second communication interface 201 and the third communication interface 301 are all Ethernet interfaces, and the first communication connection line 400 and the second communication connection line 500 are both Ethernet network lines.

[0032] Exemplarily, the first communication interface 101 can be an RJ45 interface, a Small Form-factor Pluggable (SFP) interface, etc. Exemplarily, the second communication interface 201 can be an RJ45 interface, a Small Form-factor Pluggable (SFP) interface, etc. Exemplarily, the third communication interface 301 can be an RJ45 interface, a Small Form-factor Pluggable (SFP) interface, etc.

[0033] In some embodiments, the communication protocol used by the serial server 300 to communicate with the switch 200, and the switch 200 to communicate with the programmable controller 100, includes: TCP protocol, IP protocol.

[0034] In some embodiments, the fourth communication interface 302 and the fifth communication interface 2001 are both RS485 interfaces, and the third communication connection line 600 is an RS485 connection line.

[0035] In some embodiments, the fourth communication interface 302 and the fifth communication interface 2001 are both RS232 interfaces, and the third communication connection line 600 is an RS232 connection line.

[0036] The RS485 connection line and the RS232 connection line have strong anti-interference performance, which can further improve the operation stability of the deposition equipment monitoring system 10.

[0037] Exemplarily, the fourth communication interface 302 can be a DB9 interface, a DB25 interface, etc. Exemplarily, the fifth communication interface 2001 can be a DB9 interface, a DB25 interface, etc.

[0038] In some embodiments, the communication protocol used by the serial server 300 to communicate with the auxiliary device 20 includes: free protocol, Modbus protocol.

[0039] In some embodiments, the auxiliary device 20 includes: an electric valve, a radio frequency power supply, a flow meter, a vacuum pump.

[0040] Exemplarily, as shown in Figure 1 , the first auxiliary device 210 includes an electric valve, the second auxiliary device 220 includes a radio frequency power supply, the third auxiliary device 230 includes a flow meter, and the fourth auxiliary device 240 includes a vacuum pump. Exemplarily, the electric valve can be a butterfly valve or a pneumatic diaphragm valve, and the electric valve is used to control the on-off of the gas circuit. The radio frequency power supply is used to provide high-frequency electric energy. The flow meter is used to detect and control the gas flow of the gas circuit. The vacuum pump is used to perform vacuumization on the deposition device 30 of the deposition equipment 1.

[0041] In some embodiments, at least one auxiliary device 20 includes a plurality of auxiliary devices 20, the plurality of auxiliary devices 20 of the same type of auxiliary device 20 are in communication connection with each other, and are in communication connection with the corresponding fourth communication interface 302, so as to simplify the line structure of the deposition equipment monitoring system 10.

[0042] Exemplarily, as shown in Figure 1 , the third auxiliary device 230 includes four auxiliary devices 20, which are in communication connection with each other and in communication connection with the third fourth communication interface 302.

[0043] In some embodiments, the number of fourth communication interfaces 302 is greater than or equal to the number of categories of auxiliary devices 20, so as to reserve fourth communication interfaces 302 to enable the serial port server 300 to be communicatively connected with more other categories of auxiliary devices 20.

[0044] Exemplarily, as shown in Figure 1 the number of fourth communication interfaces 302 is eight, and the number of categories of auxiliary devices 20 is four, wherein four fourth communication interfaces 302 are respectively used for the serial port server 300 to be communicatively connected with four categories of auxiliary devices 20, and the remaining four fourth communication interfaces 302 are used as backup communication interfaces and can be used for the serial port server 300 to be communicatively connected with more other categories of auxiliary devices 20. Exemplarily, the number of fourth communication interfaces 302 can also be sixteen or even more. Since the serial port server 300 is a dedicated serial port communication device, the number of fourth communication interfaces 302 can be set to be relatively large to facilitate meeting the communication requirements.

[0045] Figure 3 Fig. 1 shows a structural schematic diagram of a deposition device provided by an embodiment of the present disclosure. As shown in Figure 3 the deposition device 1 comprises the deposition device monitoring system 10, the plurality of auxiliary devices 20 and the deposition device 30 mentioned in the above embodiments. The deposition device 30 is configured to perform a thin film deposition process on a product. The plurality of auxiliary devices 20 are connected with the deposition device 10 and are respectively configured to provide a plurality of auxiliary functions for the deposition device 30. The deposition device monitoring system 10 is configured to monitor and control the plurality of auxiliary devices 20.

[0046] Since the deposition device 1 comprises the deposition device monitoring system 10, the deposition device 1 comprises all the technical features and technical effects of the deposition device monitoring system 10, which will not be described here again.

[0047] In the description, “an embodiment”, “one embodiment”, or the like means that the described embodiment can include a particular feature, structure, or characteristic, but every embodiment can not necessarily include the particular feature, structure, or characteristic. Moreover, such phrases are not necessarily referring to the same embodiment. Furthermore, when a particular feature, structure, or characteristic is described in connection with an embodiment, it is submitted that implementation of such feature, structure, or characteristic in connection with an explicitly or implicitly described other embodiment is within the scope of those skilled in the art.

[0048] It should be understood that "on," "above," and "on top of" in the disclosure should be interpreted in the broadest context possible so that "on" means not only "directly on" but also includes the meaning of "on" with intervening features or layers therebetween, and "above" or "on top of" includes not only the meaning of "above" or "on top of" but also the meaning of "above" or "on top of" with no intervening features or layers therebetween (i.e., directly on).

[0049] In addition, spatially relative terms, such as "beneath", "below", "lower", "above", "upper" and the like, can be used herein for ease of description to describe one element or feature's relationship to another element(s) or feature(s) as illustrated in the figures. The spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientations depicted in the figures. The devices can be otherwise oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein interpreted accordingly.

[0050] It should be noted that, in the present document, the terms "comprising", "comprises" or any other variation thereof are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but can also include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without more limitations, an element defined by the statement "comprising a" does not exclude the existence of additional identical elements in the process, method, article, or apparatus that includes the element.

[0051] The above description is merely that of the preferred embodiments of the present disclosure and is not intended to limit the present disclosure. Any modification, equivalent replacement and the like within the spirit and principle of the present disclosure should be included in the protection scope of the present disclosure.

Claims

1. A monitoring system of a deposition apparatus, characterized by, The monitoring system of the deposition equipment is configured to monitor and control a plurality of auxiliary devices of the deposition equipment, wherein the monitoring system of the deposition equipment comprises: a programmable controller; a switch connected in communication with the programmable controller; a serial server connected in communication with the plurality of auxiliary devices and the switch respectively, so that the serial server exchanges data with the plurality of auxiliary devices and the programmable controller respectively.

2. The monitoring system of a deposition apparatus according to claim 1, wherein The programmable controller has a first communication interface, the switch has at least two second communication interfaces, the serial server has a third communication interface and a plurality of fourth communication interfaces, and the auxiliary devices have fifth communication interfaces; The monitoring system of the deposition equipment further comprises: a first communication connection line connecting the first communication interface and one of the second communication interfaces, so that the switch is connected in communication with the programmable controller; a second communication connection line connecting another one of the second communication interfaces and the third communication interface, so that the switch is connected in communication with the serial server; a plurality of third communication connection lines corresponding to the plurality of fourth communication interfaces and the plurality of auxiliary devices respectively, the third communication connection lines connecting the fourth communication interfaces and the fifth communication interfaces of the corresponding auxiliary devices, so that the serial server is connected in communication with the plurality of auxiliary devices respectively.

3. The monitoring system of a deposition apparatus according to claim 2, wherein The communication mode between the serial server and the programmable controller comprises Ethernet communication; The first communication interface, the second communication interface, and the third communication interface are all Ethernet interfaces, and the first communication connection line and the second communication connection line are both Ethernet network cables.

4. The monitoring system of a deposition apparatus according to claim 3, wherein The communication protocols used by the serial server and the switch, and the switch and the programmable controller in communication connection comprise TCP protocol and IP protocol.

5. The monitoring system of a deposition apparatus according to claim 2, wherein The fourth communication interfaces and the fifth communication interfaces are both RS485 interfaces, and the third communication connection lines are RS485 connection lines, or the fourth communication interfaces and the fifth communication interfaces are both RS232 interfaces, and the third communication connection lines are RS232 connection lines.

6. The monitoring system of a deposition apparatus according to claim 5, wherein The communication protocols used by the serial server and the auxiliary devices in communication connection comprise free protocol and Modbus protocol.

7. The monitoring system of a deposition apparatus according to claim 6, wherein The auxiliary devices comprise electric valves, radio frequency power supplies, flow meters, and vacuum pumps.

8. A monitoring system of a deposition apparatus according to any one of claims 2 to 7, characterized in that, At least one of the auxiliary devices comprises a plurality of auxiliary devices, the plurality of auxiliary devices of the same type of auxiliary device are connected in communication with each other and with the corresponding fourth communication interfaces.

9. A monitoring system of a deposition apparatus according to any one of claims 2 to 6, characterized in that, The number of the fourth communication interfaces is greater than or equal to the number of types of the auxiliary devices.

10. A deposition apparatus, characterized by, The deposition device comprises: a deposition device configured to perform a thin film deposition process on a product; a plurality of auxiliary devices connected with the deposition device and configured to provide a plurality of auxiliary functions for the deposition device; the monitoring system of the deposition equipment according to any one of claims 1 to 9, configured to monitor and control the plurality of auxiliary devices.

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