Exhaust device and semiconductor device

Abstract

The utility model provides an exhaust device and semiconductor process equipment, the exhaust device comprises a pipe body, an air extraction device, a shaft body, a spring hinge and a fixing ring structure arranged in the pipe body, the air inlet end of the pipe body is used for being connected with a target cavity, the air outlet end of the pipe body is connected with the air extraction device, and the fixing ring structure is arranged in the pipe body; the shaft body is arranged on the fixing ring structure, one end of the elastic hinge is rotationally arranged on the shaft body and extends towards the air inlet end of the pipe body to form an opening angle opening towards the air inlet end of the pipe body, and the elastic hinge shields part of the first flow channel. The opening degree of the flare angle opening is increased at the moment when the air extractor is started, so that the flow of air flowing to the air extractor through the first flow channel is reduced, and the technical problems that noise is generated and vibration is generated at the moment when the air extractor vacuumizes the target cavity are solved.

Description

TECHNICAL FIELD

[0001] The present application belongs to the technical field of semiconductor production equipment, and more particularly to an exhaust device and a semiconductor device. BACKGROUND

[0002] In many semiconductor devices, such as vapor deposition devices, the processing of semiconductor-related devices (such as substrates, pedestals, etc.) in a glove box needs to be operated in a low-pressure environment. For example, a certain degree of vacuum needs to be maintained in the reaction chamber during the low-pressure chemical vapor deposition (CVD) reaction process; in addition, the glove box and other devices also need to be pumped by a vacuum pump to ensure the negative pressure environment inside the device.

[0003] During the process of pumping and depressurizing the reaction chamber or the glove box, because the initial pressure inside the reaction chamber or the glove box is relatively large, when the valve between the vacuum pump and the reaction chamber or the glove box is opened and the vacuum pump starts pumping, the pressure difference between the two sides of the valve is large, causing the pump body of the vacuum pump to exhibit a state similar to directly extracting atmospheric air at the initial stage of starting. At this time, the vacuum pump often emits a lot of noise and generates strong vibration, which adversely affects the sealing element in the vacuum pump, shortens the service life of the sealing element, and further shortens the maintenance period of the device, increasing the operating cost of the device. CONTENT OF THE INVENTION

[0004] The purpose of the embodiments of the present application is to provide an exhaust device and a semiconductor device comprising the same, wherein the exhaust device is used to solve the technical problem that the existing exhaust device, such as a vacuum pump, is prone to emit noise and generate vibration at the initial stage of extracting vacuum from the target chamber.

[0005] To achieve the above-mentioned purpose, the first aspect of the present application provides an exhaust device, comprising:

[0006] a pipe body comprising an air outlet end and an air inlet end for communicating with a target chamber of a semiconductor device;

[0007] an exhaust device connected to the air outlet end, for extracting vacuum from the target chamber through the pipe body;

[0008] a fixed ring structure arranged in the pipe body along the circumference of the pipe body and forming a first flow channel for gas flow with the pipe body;

[0009] a shaft body arranged in the fixed ring structure along the radial direction of the fixed ring structure;

[0010] A flexible hinge is rotatably arranged at one end of the shaft body and extends towards the gas inlet end of the pipe body to form an opening with an opening angle towards the gas inlet end, so that the flexible hinge shields part of the first flow channel, and the opening degree of the opening with the opening angle increases at the moment when the air extraction device is started, so as to reduce the flow of gas through the first flow channel to the air extraction device.

[0011] A channel is formed between the flexible hinge and the shaft body for gas flow during the opening angle opening is fixed or changes.

[0012] Optionally, the flexible hinge comprises:

[0013] A flexible member is sleeved on the middle part of the shaft body.

[0014] A first rotating baffle is movably sleeved between one end of the shaft body and the middle part of the shaft body and extends towards the gas inlet end.

[0015] A second rotating baffle is movably sleeved between the other end of the shaft body and the middle part of the shaft body and extends towards the gas inlet end.

[0016] A second flow channel is formed between the first rotating baffle, the second rotating baffle, the flexible member and the shaft body for gas flow during the opening angle opening is fixed or changes.

[0017] The flexible member abuts against the side of the first rotating baffle away from the shaft body and the side of the second rotating baffle away from the shaft body at the opposite ends of the shaft body, so that the opening angle opening is formed between the first rotating baffle and the second rotating baffle.

[0018] Optionally, it is characterized in that:

[0019] The first rotating baffle comprises a first sub-blade and a first adapter, the first adapter is movably sleeved on the shaft body, and the first sub-blade extends towards the other end of the shaft body and the gas inlet end of the pipe body.

[0020] The second rotating baffle comprises a second sub-blade and a second adapter, the second adapter is movably sleeved on the shaft body, and the second sub-blade extends towards one end of the shaft body.

[0021] The opening angle opening is formed between the first sub-blade and the second sub-blade.

[0022] The first sub-blade and the second adapter have a spacing therebetween, and the second sub-blade and the first adapter have a spacing therebetween, so as to allow gas to flow through during the opening angle opening is fixed or changes.

[0023] Optionally, the elastic member comprises:

[0024] a torsion spring, sleeved on the middle part of the shaft body, one end of the torsion spring abutting against one side of the first sub-vane away from the shaft body, the other end of the torsion spring abutting against one side of the second sub-vane away from the shaft body, so that the first sub-vane and the second sub-vane form the opening with the opening angle.

[0025] Optionally, further comprising a first limiting structure, the first limiting structure being fixedly arranged on one end of the shaft body and extending towards the other end of the shaft body by a certain distance to form a first extension end, the first extension end being in contact with the first sub-vane and the second sub-vane respectively on opposite sides of the shaft body in the radial direction, so as to limit the minimum opening degree of the opening with the opening angle.

[0026] Optionally, further comprising a second limiting structure, one end of the second limiting structure being fixedly arranged on one end of the shaft body and extending towards the other end of the shaft body by a certain distance to form a second extension end, the second extension end being in contact with the first sub-vane and the second sub-vane respectively on opposite sides of the shaft body in the radial direction, so as to limit the minimum opening degree of the opening with the opening angle.

[0027] Optionally, the elastic member comprises an elastic member body sleeved on the shaft body, the outer diameter of the elastic member body being smaller than the outer diameters of the first adapter and the second adapter, so as to form a spacing for gas passing between the elastic member and the first adapter and the second adapter.

[0028] Optionally, the opening with the opening angle is less than or equal to 90 degrees.

[0029] Optionally, further comprising:

[0030] a valve, arranged above the gas inlet end of the pipe body and the fixed ring structure, for opening or closing the gas flow passage in the pipe body.

[0031] In a second aspect, the present application provides a semiconductor device, comprising:

[0032] a target cavity:

[0033] an exhaust device, the gas inlet end of the exhaust device being connected to the target cavity, the exhaust device being any one of the exhaust devices provided.

[0034] The exhaust device and the semiconductor device provided by the application have the following beneficial effects: compared with the prior art, the exhaust device provided by the application comprises a pipe body, an air extraction device, a shaft body, a spring hinge, and a fixing ring structure arranged in the pipe body, the air inlet end of the pipe body is used for being connected with a target cavity, the air outlet end is connected with a vacuum pump, the fixing ring structure is arranged in the pipe body in a circumferential direction of the pipe body and forms a first flow channel for gas flow with the pipe body, the shaft body is arranged in the fixing ring structure in a radial direction of the fixing ring structure, one end of the spring hinge is rotatably arranged in the shaft body and extends toward the air inlet end of the pipe body to form an opening with an opening angle toward the air inlet end of the pipe body, the opening with the opening angle shields part of the first flow channel, so that the opening degree of the opening with the opening angle increases at the moment when the air extraction device is started, thereby reducing the flow of gas flowing to the air extraction device through the first flow channel, and the technical problem that the vacuum pump emits noise and generates vibration at the moment when the target cavity is vacuumized is solved, and damage to a sealing element in the vacuum pump is prevented; a channel for gas flow is formed between the spring hinge and the shaft body, so that even if the opening degree of the opening with the opening angle increases to the maximum, the channel for gas flow still exists, and the opening degree of the spring hinge can be reduced to the initial state in the process of balancing the pressure on both sides of the spring hinge. BRIEF DESCRIPTION OF DRAWINGS

[0035] In order to more clearly illustrate the technical solutions in the embodiments of the application, the following will briefly introduce the drawings needed to be used in the embodiments or the prior art description. Obviously, the drawings in the following description only some embodiments of the application, and for those skilled in the art, other drawings can also be obtained without creative labor.

[0036] Figure 1 The structural schematic diagram of the exhaust device provided by the application is shown in the figure.

[0037] Figure 2 The structural schematic diagram of the opening with the opening angle of the spring hinge in the minimum position in the application is shown in the figure.

[0038] Figure 3 The structural schematic diagram of the opening with the opening angle of the spring hinge in the maximum position in the application is shown in the figure.

[0039] Figure 4 The sectional view of the spring hinge in the pipe body and the opening with the opening angle in the minimum position in the application is shown in the figure.

[0040] Figure 5 The sectional view of the spring hinge in the pipe body and the opening with the opening angle in the maximum position in the application is shown in the figure.

[0041] Figure 6 The structural schematic diagram of the first limiting structure in the application is shown in the figure.

[0042] Wherein, the reference signs in the figures:

[0043] 10, pipe body; 20, air extraction device; 30, fixed ring structure; 31, first flow channel; 32, limiting table; 33, mounting hole; 34, sealing ring; 40, shaft body; 50, elastic hinge; 51, elastic member; 52, first rotating baffle; 521, first sub-vane; 522, first adapter; 53, second rotating baffle; 531, second sub-vane; 532, second adapter; 54, opening of opening angle; 55, second flow channel; 60, target cavity; 70, first limiting structure; 71, first fixed part; 72, first extension end; 80, second limiting structure; 81, second extension end; 90, valve. DETAILED DESCRIPTION

[0044] In order to make the technical problems, technical solutions and beneficial effects of the present application clearer, the present application will be further described in detail below in conjunction with the drawings and examples. It should be understood that the specific examples described herein are only used to explain the present application and not to limit the present application.

[0045] It should be noted that when an element is referred to as being "fixed to" or "disposed on" another element, it can be directly on the other element or indirectly on the other element. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or indirectly connected to the other element.

[0046] It should be understood that the terms "length", "upper", "lower", "vertical", "top", "bottom", "inner", "outer" and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for the purpose of facilitating the description of the present application and simplifying the description, and therefore cannot be understood as indicating or implying that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as limiting the present application.

[0047] In addition, the terms "first", "second" are only for descriptive purposes and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the technical features indicated. Therefore, the features defined with "first", "second" can explicitly or implicitly include one or more of the features. In the description of the present application, the meaning of "multiple" is two or more, unless otherwise specifically limited.

[0048] Please refer to Figures 1 to 6 , now the air exhaust device and semiconductor equipment provided by the embodiments of the present application will be described.

[0049] To achieve the above-mentioned purpose, the first aspect of the present application provides an air exhaust device, comprising a pipe body 10, an air extraction device 20, a fixed ring structure 30, a shaft body 40 and an elastic hinge 50.

[0050] The pipe body 10 comprises an air outlet end and an air inlet end for communicating with a target cavity 60 of a semiconductor device.

[0051] In some embodiments, the target cavity 60 is a reaction chamber in a chemical vapor deposition device.

[0052] In some embodiments, the target cavity 60 is a glove box arranged on a chemical vapor deposition device.

[0053] The evacuation device 20 is connected to the air outlet end of the pipe body 10, and the evacuation device 20 evacuates the target cavity 60 through the pipe body 10.

[0054] In some embodiments, the evacuation device 20 is a vacuum pump.

[0055] In some embodiments, the vacuum pump can be replaced by other types of evacuation devices 20 as necessary to enable evacuation of the connected cavity.

[0056] The fixed ring structure 30 is arranged in the pipe body 10 along the circumference of the pipe body 10, and when the fixed ring structure 30 is arranged in the pipe body 10, the hollow portion in the middle of the fixed ring structure 30 forms a first flow channel 31 for gas flow, and when the evacuation device 20 is turned on to evacuate the target cavity 60, the gas enters the pipe body 10 and then enters the evacuation device 20 through the first flow channel 31.

[0057] The shaft body 40 is arranged in the fixed ring structure 30 along the radial direction of the fixed ring structure 30.

[0058] One end of the elastic hinge 50 is rotatably arranged on the shaft body 40, and the elastic hinge 50 extends towards the air inlet end of the pipe body 10 to form an opening 54 with an opening angle towards the air inlet end of the pipe body 10. The elastic hinge 50 shields part of the first flow channel 31, and after the target cavity 60 and the pipe body 10 are connected, at the moment when the evacuation device 20 is started, the pressure in the space between the fixed ring structure 30 close to the target cavity 60, i.e. the air inlet end of the pipe body 10 and the fixed ring structure 30, is greater than the pressure in the space between the fixed ring structure 30 close to the evacuation device 20, i.e. the air outlet end of the pipe body 10 and the fixed ring structure 30. At this time, the pressure of the gas acting on the elastic hinge 50 makes the opening degree of the opening 54 of the elastic hinge 50 increase, so that the elastic hinge 50 reduces the flow of gas flowing to the evacuation device 20 through the first flow channel 31, thereby preventing the technical problem of noise and vibration of the vacuum pump at the moment of starting to evacuate the target cavity 60, and further preventing damage to the sealing element in the vacuum pump.

[0059] The elastic hinge 50 and the shaft 40 have a spacing to form a channel for gas flow, and during the change of the opening degree of the opening angle 54 of the elastic hinge 50, part of the gas flows to the gas extraction device 20 through the channel, and part of the gas flows to the gas extraction device 20 through the first flow channel 31.

[0060] Under the action of the pressure of the gas, when the opening degree of the opening angle 54 of the elastic hinge 50 increases to the maximum position, the elastic hinge 50 completely closes the first flow channel 31, and at this time, the gas can still enter the gas extraction device 20 through the channel formed between the elastic hinge 50 and the shaft 40 for gas flow.

[0061] With the continuous vacuum extraction of the target cavity 60 by the gas extraction device 20, the pressure difference between the side of the fixed ring structure 30 close to the target cavity 60 and the side of the fixed ring structure 30 close to the gas extraction device 20 gradually decreases, and the pressure difference between the side of the fixed ring structure 30 close to the target cavity 60 and the side of the fixed ring structure 30 close to the gas extraction device 20 gradually balances, and the pressure of the gas acting on the elastic hinge 50 also gradually decreases. The elastic hinge 50 returns to the initial opening angle position under the action of its own elastic force, thereby increasing the flow rate of the gas flowing through the first flow channel 31, and improving the efficiency of the gas extraction device 20 in extracting vacuum from the target cavity 60.

[0062] Compared with the prior art, the exhaust device provided by the application comprises a pipe body 10, a gas extraction device 20, a shaft 40, a spring hinge, and a fixed ring structure 30 arranged in the pipe body 10. The gas inlet end of the pipe body 10 is used to connect with the target cavity 60, the gas outlet end is connected with the vacuum pump, the fixed ring structure 30 is arranged in the pipe body 10 along the circumferential direction of the pipe body 10 and forms a first flow channel 31 with the pipe body 10 for gas flow, the shaft 40 is arranged in the fixed ring structure 30 along the radial direction of the fixed ring structure 30, one end of the elastic hinge 50 is rotatably arranged in the shaft 40 and extends towards the gas inlet end of the pipe body 10 to form an opening angle opening 54 towards the gas inlet end of the pipe body 10, so that the elastic hinge 50 shields part of the first flow channel 31. When the gas extraction device 20 is started, the opening degree of the opening angle opening 54 increases, thereby reducing the flow rate of the gas flowing through the first flow channel 31 to the gas extraction device 20, thereby preventing the technical problems of noise and vibration of the gas extraction device 20 such as the vacuum pump during the instant of extracting vacuum from the target cavity 60, and further preventing damage to the sealing element in the gas extraction device 20. The elastic hinge 50 and the shaft 40 form a channel for gas flow, so that even if the opening degree of the opening angle opening 54 increases to the maximum, there is still a channel for gas flow, and during the pressure balance process of the two sides of the elastic hinge 50, the opening degree of the elastic hinge 50 can be reduced to the initial state.

[0063] In one embodiment of the present application, the gas outlet end and the gas inlet end of the pipe body 10 are each provided with a connecting flange, and the connecting flange on the gas inlet end is connected to the connecting flange provided on the target cavity 60 to achieve the connection between the pipe body 10 and the target cavity 60. The gas extraction device 20 is connected to the connecting flange on the gas outlet end of the pipe body 10 through the connecting flange to achieve the connection between the gas extraction device 20 and the pipe body 10.

[0064] In the present application, please refer to Figure 2 and Figure 3 The elastic hinge 50 includes an elastic member 51, a first rotating baffle 52, and a second rotating baffle 53.

[0065] The elastic member 51 is sleeved on the middle part of the shaft body 40.

[0066] In the axial direction of the shaft body 40, the first rotating baffle 52 is movably sleeved on the position between one end of the shaft body 40 and the middle part of the shaft body 40, and the first rotating baffle 52 extends towards the gas inlet end of the pipe body 10. The second rotating baffle 53 is sleeved on the position between the other end of the shaft body 40 and the middle part of the shaft body 40, and the second rotating baffle 53 extends towards the gas inlet end of the pipe body 10 to form an opening 54 with a variable opening angle towards the gas inlet end of the pipe body 10.

[0067] The first rotating baffle 52, the second rotating baffle 53, the elastic member 51, and the shaft body 40 form a second flow channel 55, and the flow rate of the gas through the second flow channel 55 is less than the flow rate in the first flow channel 31. The second flow channel 55 is used for the gas to pass through in the process of changing or fixing the opening angle of the opening 54 between the first rotating baffle 52 and the second rotating baffle 53.

[0068] Specifically, the cross-sectional shape of the first flow channel 31 is circular, and the end of the first rotating baffle 52 and the second rotating baffle 53 away from the shaft body 40 is a curved surface structure matched with the shape of the inner wall of the first flow channel 31.

[0069] Under the action of the pressure of the gas, in the process of gradually increasing the opening angle of the opening 54 between the first rotating baffle 52 and the second rotating baffle 53, part of the gas flows to the gas extraction device 20 through the second flow channel 55, and part of the gas flows to the gas extraction device 20 through the first flow channel 31.

[0070] In some embodiments, under the action of the pressure of the gas, the opening degree of the opening 54 between the first rotating baffle 52 and the second rotating baffle 53 increases, and even if it increases to the maximum degree, there is a gap between the curved surface structure of the first rotating baffle 52 and the second rotating baffle 53 away from the shaft body 40 and the inner wall of the first flow channel 31, so that the gas can enter the gas extraction device 20.

[0071] The elastic member 51 abuts against one side of the first rotating baffle 52 away from the shaft body 40 and the other side of the second rotating baffle 53 away from the shaft body 40 at two ends of the shaft body 40 in the axial direction, so as to provide elastic force to the first rotating baffle 52 and the second rotating baffle 53, thereby forming the opening 54 between the first rotating baffle 52 and the second rotating baffle 53, and the direction of the elastic force provided by the elastic member 51 to the first rotating baffle 52 and the second rotating baffle 53 is opposite to the direction of the pressure of the gas acting on the first rotating baffle 52 and the second rotating baffle 53.

[0072] At the moment when the gas extraction device 20 is turned on, the pressure of the gas acting on the first rotating baffle 52 and the second rotating baffle 53 is greater than the elastic force of the elastic member 51 acting on the first rotating baffle 52 and the second rotating baffle 53, and at this time, the opening of the opening 54 between the first rotating baffle 52 and the second rotating baffle 53 gradually increases under the action of the pressure of the gas.

[0073] With the continuous vacuum extraction of the target cavity 60 by the gas extraction device 20, the pressure difference between the side of the fixed ring structure 30 close to the target cavity 60 and the side of the fixed ring structure 30 close to the gas extraction device 20 gradually balances, the pressure of the gas acting on the first rotating baffle 52 and the second rotating baffle 53 gradually decreases, and when the pressure of the gas acting on the first rotating baffle 52 and the second rotating baffle 53 is less than the elastic force of the elastic member 51 acting on the first rotating baffle 52 and the second rotating baffle 53, the opening 54 between the first rotating baffle 52 and the second rotating baffle 53 returns to the initial position under the action of the elastic force of the elastic member 51, thereby improving the flow rate of the gas flowing through the first flow channel 31, so as to improve the vacuum extraction efficiency of the target cavity 60 by the gas extraction device 20.

[0074] In this application, please refer to Figures 3 to 5 The first rotating baffle 52 comprises a first sub-vane 521 and a first adapter 522 connected with each other, the first adapter 522 movably sleeved on the shaft body 40, the first sub-vane 521 extending towards the other end of the shaft body 40 and the gas inlet end of the pipe body 10. The second rotating baffle 53 comprises a second sub-vane 531 and a second adapter 532 connected with each other, the second adapter 532 movably sleeved on the shaft body 40, and the second sub-vane 531 extending towards one end of the shaft body 40.

[0075] The first sub-vane 521 and the second sub-vane 531 form the opening 54 therebetween.

[0076] The first sub-vane 521 and the second adapter 532 have a spacing therebetween, and the second sub-vane 531 and the first adapter 522 have a spacing therebetween, so as to allow the gas to pass through during the opening 54 is fixed or changes.

[0077] Specifically, the first sub-vane 521 is an arc-shaped curved surface structure on the side away from the first adapter 522, which is adapted to the inner wall of the first flow channel 31. The second sub-vane 531 is also an arc-shaped curved surface structure on the side away from the second adapter 532, which is adapted to the inner wall of the first flow channel 31.

[0078] The first adapter 522 is provided with a first adapter hole (not shown in the figure), which penetrates the first adapter 522 along the axial direction of the shaft body 40, and one end of the shaft body 40 is rotationally connected in the first adapter hole. The second adapter 532 is provided with a second adapter hole (not shown in the figure), which penetrates the second adapter 532 along the axial direction of the shaft body 40, and the other end of the shaft body 40 is rotationally connected in the second adapter hole.

[0079] When the opening angle opening 54 formed between the first sub-vane 521 and the second sub-vane 531 is in a changing process or a fixed state, the gas enters the first flow channel 31 from the second flow channel 55, the space between the first sub-vane 521 and the second adapter 532, and the space between the second sub-vane 531 and the first adapter 522, and then enters the gas extraction device 20.

[0080] In this application, please refer to Figure 6 , the elastic member 51 is a torsion spring.

[0081] The torsion spring is sleeved on the middle part of the shaft body 40, and one end of the torsion spring abuts against the side of the first sub-vane 521 away from the first adapter 522 along the axial direction of the shaft body 40, and the other end of the torsion spring abuts against the side of the second sub-vane 531 away from the second adapter 532, thereby providing elastic force to the first sub-vane 521 and the second sub-vane 531 to form the opening angle opening 54.

[0082] In some embodiments, please refer to Figure 2 and Figure 6 , the first flow channel 31 is provided with a limiting table 32, specifically, the limiting table 32 is protruded on the inner wall of the first flow channel 31 and has a ring structure, and the inner diameter of the limiting table 32 is smaller than the diameter of the first flow channel 31. When the opening degree of the opening angle opening between the first sub-vane 521 and the second sub-vane 531 reaches the maximum position, the edge parts of the first sub-vane 521 and the second sub-vane 531 abut against the side of the limiting table 32 facing the target cavity 60, so as to prevent the two sub-vanes from continuing to bend towards the side where the gas extraction device 20 is located, which is easy to cause the elastic member 51 to fail.

[0083] In this application, please refer to Figure 2 , Figure 3 and Figure 6 , the exhaust device further comprises a first limiting structure 70.

[0084] One end of the first limiting structure 70 is fixedly arranged at one end of the shaft body 40 and extends a certain distance towards the other end of the shaft body 40, thereby forming a first extension end 72, which is in contact with the first sub-vane 521 and the second sub-vane 531 respectively on opposite sides of the shaft body 40, so as to limit the minimum opening degree of the opening 54.

[0085] Specifically, in this embodiment, the first limiting structure 70 comprises a first fixed part 71 and the first extension end 72. The first fixed part 71 is arranged between the fixed ring structure 30 and one end of the shaft body 40 to fix the shaft body 40. The first extension end 72 is connected with the first fixed part 71 and extends along the axial direction of the shaft body 40 from one end of the shaft body 40 to the other end where the second limiting structure 80 is arranged. When the opening 54 between the first sub-vane 521 and the second sub-vane 531 is at the minimum opening degree, the opposite side walls of the first sub-vane 521 and the second sub-vane 531 are respectively in abutment with the two sides of the first extension end 72 along the radial direction of the shaft body 40.

[0086] In one embodiment of the present application, the first fixed part 71 is arranged on the limiting platform 32.

[0087] In the present application, please refer to Figures 2 to 6 The exhaust device further comprises a second limiting structure 80.

[0088] One end of the second limiting structure 80 is fixedly arranged at the other end of the shaft body 40 and extends a certain distance towards one end of the shaft body 40 where the first limiting structure 70 is arranged, thereby forming a second extension end 81, which is in contact with the first sub-vane 521 and the second sub-vane 531 respectively on opposite sides of the shaft body 40, so as to limit the minimum opening degree of the opening 54.

[0089] Specifically, in this embodiment, the second limiting structure 80 comprises a second fixed part (not marked in the figure) and the second extension end 81. The second fixed part is arranged between the fixed ring structure 30 and the other end of the shaft body 40 to fix the shaft body 40. The second extension end 81 is connected with the second fixed part and extends along the axial direction of the shaft body 40 from the other end of the shaft body 40 towards one end of the shaft body 40 where the first limiting structure 70 is arranged. When the opening 54 between the first sub-vane 521 and the second sub-vane 531 is at the minimum opening degree, the opposite side walls of the first sub-vane 521 and the second sub-vane 531 are respectively in abutment with the two sides of the second extension end 81 along the radial direction of the shaft body 40.

[0090] In one embodiment of the present application, the second fixed part is arranged on the limiting platform 32.

[0091] In the present application, please refer to Figure 2 and Figure 4The opening angle 54 between the first sub-vane 521 and the second sub-vane 531 is less than or equal to 90 degrees.

[0092] When the pressure difference between the side of the fixed ring structure 30 close to the target cavity 60 and the side of the fixed ring structure 30 close to the exhaust device 20 gradually balances, by setting the opening angle 54 between the first sub-vane 521 and the second sub-vane 531 to be less than or equal to 90 degrees, the part of the first flow channel 31 that is shielded is ensured to be as small as possible, thereby ensuring the exhaust rate of the exhaust device 20 on the target cavity 60.

[0093] In the present application, please refer to Figure 2 , Figure 5 and Figure 6 , the fixed ring structure 30 is provided with a mounting hole 33, the mounting hole 33 sequentially penetrates one end of the radial direction of the fixed ring structure 30, the first fixed part 71, the second fixed part, and the other end of the radial direction of the fixed ring structure 30 along the radial direction of the fixed ring structure 30, and the shaft body 40 is installed in the mounting hole 33.

[0094] In the present application, please refer to Figure 4 and Figure 5 , the outer wall of the fixed ring structure 30 is provided with a curved surface structure with an arc shape, and the curved surface structure on the fixed ring structure 30 and the inner wall of the pipe body 10 are provided with a sealing ring 34.

[0095] In the present application, please refer to Figure 1 , the exhaust device further comprises a valve 90.

[0096] The valve 90 is arranged between the gas inlet end of the pipe body 10 and the fixed ring structure 30, and is used to open or close the gas flow channel in the pipe body 10.

[0097] When it is necessary to vacuumize the target cavity 60, the valve 90 is opened, so that the vacuum pump is communicated with the target cavity 60 through the pipe body 10 and extracts vacuum on the target cavity 60. After the vacuumization of the target cavity 60 is completed, the valve 90 is closed, so that the target cavity 60 is kept in a preset vacuum degree range.

[0098] In the second aspect, the present application provides a semiconductor process equipment, which comprises a target cavity 60 and an exhaust device.

[0099] In some embodiments, the target cavity 60 is a reaction chamber in a chemical vapor deposition device.

[0100] In some embodiments, the target cavity 60 is a glove box arranged on a chemical vapor deposition device.

[0101] The gas inlet end of the exhaust device is connected with the target cavity 60, and the exhaust device is the exhaust device provided in any one of the above embodiments.

[0102] Compared with the prior art, the semiconductor process equipment provided by the application includes the exhaust device provided by any one of the above embodiments, the exhaust device includes a pipe body 10, a suction device 20, a shaft body 40, a spring hinge, and a fixed ring structure 30 arranged in the pipe body 10, the gas inlet end of the pipe body 10 is used to be connected with a target cavity 60, the gas outlet end is connected with a vacuum pump, the fixed ring structure 30 is arranged in the pipe body 10 along the circumference of the pipe body 10 and forms a first flow channel 31 for gas flow with the pipe body 10, the shaft body 40 is arranged in the fixed ring structure 30 along the radial direction of the fixed ring structure 30, one end of the spring hinge 50 is rotatably arranged in the shaft body 40 and extends towards the gas inlet end of the pipe body 10 to form an opening 54 with an opening angle towards the gas inlet end of the pipe body 10, the opening 54 shields part of the first flow channel 31, so that the opening degree of the opening 54 increases at the moment when the suction device 20 starts to work, thereby reducing the flow of gas flowing to the suction device 20 through the first flow channel 31, thereby preventing the technical problems that the vacuum pump emits noise and generates vibration at the moment of vacuumizing the target cavity 60, and further preventing damage to the sealing element in the vacuum pump; a channel for gas flow is formed between the spring hinge 50 and the shaft body 40, so that even if the opening degree of the opening 54 increases to the maximum, there is still a channel for gas flow, so that in the process of balancing the pressure on both sides of the spring hinge 50, the opening degree of the opening 54 can be reduced to the initial state.

Claims

1. An exhaust apparatus for a semiconductor device, characterized by comprising: The exhaust device comprises: a pipe body comprising an air outlet end and an air inlet end for communicating with a target cavity of a semiconductor device; an exhaust device connected to the air outlet end for vacuumizing the target cavity through the pipe body; a fixed ring structure arranged in the pipe body in a circumferential direction of the pipe body and forming a first flow channel for gas flow with the pipe body; a shaft body arranged in the fixed ring structure in a radial direction of the fixed ring structure; a resilient hinge having one end rotatably arranged in the shaft body and extending towards the air inlet end of the pipe body to form an opening with an opening angle towards the air inlet end, so that the resilient hinge shields part of the first flow channel, and the opening degree of the opening with the opening angle increases at the moment when the exhaust device is started to reduce the flow of gas through the first flow channel to the exhaust device; a channel formed between the resilient hinge and the shaft body for gas flow during the fixation or change of the opening with the opening angle.

2. The exhaust apparatus according to claim 1, characterized by The resilient hinge comprises: a resilient member sleeved on a middle part of the shaft body; a first rotating baffle movably sleeved between one end of the shaft body and the middle part of the shaft body and extending towards the air inlet end; a second rotating baffle movably sleeved between the other end of the shaft body and the middle part of the shaft body and extending towards the air inlet end; a second flow channel formed between the first rotating baffle, the second rotating baffle, the resilient member and the shaft body for gas flow during the fixation or change of the opening with the opening angle; the resilient member abuts against a side of the first rotating baffle away from the shaft body and a side of the second rotating baffle away from the shaft body at two opposite ends of the shaft body, respectively, so that the opening with the opening angle is formed between the first rotating baffle and the second rotating baffle.

3. The exhaust device according to claim 2, wherein: the first rotating baffle comprises a first sub-blade connected with a first adapter, the first adapter is movably sleeved on the shaft body, the first sub-blade extends towards the other end of the shaft body and extends towards the air inlet end of the pipe body; the second rotating baffle comprises a second sub-blade connected with a second adapter, the second adapter is movably sleeved on the shaft body, the second sub-blade extends towards one end of the shaft body; the opening with the opening angle is formed between the first sub-blade and the second sub-blade; a space is formed between the first sub-blade and the second adapter, and a space is formed between the second sub-blade and the first adapter, so that gas can flow through during the fixation or change of the opening with the opening angle.

4. The exhaust apparatus of claim 3 wherein, the resilient member comprises: a torsional spring sleeved on the middle part of the shaft body, one end of the torsional spring abuts against the side of the first sub-blade away from the shaft body, and the other end of the torsional spring abuts against the side of the second sub-blade away from the shaft body, so that the opening with the opening angle is formed between the first sub-blade and the second sub-blade.

5. The exhaust apparatus according to claim 3, characterized by Further comprising: A first limiting structure is fixedly arranged at one end of the shaft body and extends a certain distance towards the other end of the shaft body to form a first extended end portion, the first extended end portion is in contact with the first sub-vane and the second sub-vane respectively on opposite sides along the radial direction of the shaft body to define the minimum opening degree of the opening of the opening angle.

6. The exhaust apparatus according to claim 3, characterized by Further comprising: A second limiting structure is fixedly arranged at one end of the shaft body and extends a certain distance towards the other end of the shaft body to form a second extended end portion, the second extended end portion is in contact with the first sub-vane and the second sub-vane respectively on opposite sides along the radial direction of the shaft body to define the minimum opening degree of the opening of the opening angle.

7. The exhaust device according to claim 3, wherein The elastic member comprises an elastic member body sleeved on the shaft body, the outer diameter of the elastic member body is smaller than the outer diameter of the first adapter and the second adapter to form a spacing for gas passing between the elastic member and the first adapter and the second adapter.

8. The exhaust device according to claim 1, wherein The opening angle is less than or equal to 90 degrees.

9. The exhaust apparatus of claim 1 wherein, Further comprising: A valve is arranged above the gas inlet end of the pipe body and the fixed ring structure to open or close the gas flow passage in the pipe body.

10. A semiconductor device, characterized by comprising: Including: A target cavity: An exhaust device is connected to the target cavity at the gas inlet end, and the exhaust device is any one of the exhaust devices according to claims 1-9.

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