High-temperature gasified quartz sand flow control device

By designing a high-temperature gasified quartz sand flow control device and adopting a suspended push-pull gate valve and gas sealing technology, the flow control problem under high-temperature and high-activity gas conditions was solved, achieving safe and pollution-free quartz sand flow control, and improving the high-temperature gasification impurity removal effect and the production of ultrapure quartz sand.

CN223628592UActive Publication Date: 2025-12-05GONGXINSHI (SUZHOU) QUARTZ TECH CO LTD
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Patent Information

Application Number
CN202422886293.X
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-11-26
Publication Date
2025-12-05
Estimated Expiration
2034-11-26

AI Technical Summary

Technical Problem

Existing technologies lack quartz sand flow control devices, especially under conditions involving high temperature and highly active gases, making it impossible to achieve safe and pollution-free flow control, which affects the high-temperature gasification and impurity removal effect and the production of ultrapure quartz sand.

Method used

A high-temperature gasified quartz sand flow control device was designed. It adopts a suspended push-pull gate valve combined with air sealing technology. Through purified gas purging and waste gas treatment, the flow rate of the discharge pipe of the high-temperature gasification device is controlled, and pollution-free cooling is achieved by combining water cooling and air cooling.

Benefits of technology

It achieves safe and pollution-free control of quartz sand flow rate under high temperature conditions, improves the high-temperature gasification impurity removal effect and the stability of ultrapure quartz sand production, and achieves a balance between safe and efficient production.

✦ Generated by Eureka AI based on patent content.

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Patent Text Reader

Abstract

The utility model discloses a high-temperature gasified quartz sand flow control device which comprises a high-temperature gasification device, an outer sleeve, a flow control device, a waste gas treatment device, a discharge pipe and a high-temperature quartz sand cooling device, the flow control device is composed of a gate valve with a push-pull rod, a supporting plate and an air sealing device, and the gate valve with the push-pull rod is hung at the lower end of a discharging pipe of a gasification pipe of the high-temperature gasification device through the supporting plate and connected with the outer sleeve through the air sealing device. The amount of quartz sand flowing out of a discharging pipe of a gasification pipe is controlled by adjusting the opening degree of a gate valve which is hung at the lower end of the discharging pipe of the gasification pipe of the high-temperature gasification device and provided with a push-pull rod. Meanwhile, purified gas is utilized to purge the quartz sand flowing out through the gas sealing device, so that high-activity gas wrapped in the quartz sand is separated out, the purified gas and the high-activity gas are collected and treated by the waste gas treatment device together, and the quartz sand flows into the high-temperature quartz sand cooling device through the discharging pipe.
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Description

TECHNICAL FIELD

[0001] The utility model relates to the technical field of ultrapure quartz sand production, especially to a high-temperature gasification quartz sand flow control device. BACKGROUND

[0002] The high-temperature gasification impurity removal process is a process in which high-activity gas reacts with quartz sand at a high temperature above 1000 DEG C in a quartz glass container, alkali metal elements (Li, Na, K) in the quartz lattice are activated and transferred to the gas phase, and are removed together with the gas, so as to remove the alkali metal elements in the quartz lattice. The high-temperature gasification impurity removal process is a key technology for the production of ultrapure quartz sand, because the physical impurity removal process and the chemical impurity removal process in the production process of ultrapure quartz sand cannot remove the alkali metal element impurities in the quartz lattice. The alkali metal element impurities have a great influence on the quality of the ultrapure quartz sand. A high content of alkali metal elements not only reduces the temperature resistance of the quartz glass product and affects the use performance of the quartz glass product, but also diffuses into the ultrahigh-purity material (such as metallic silicon) in the quartz glass product at a high temperature, causing pollution to the ultrahigh-purity material. The high-temperature gasification impurity removal process is the most effective technology for removing the alkali metal elements in the quartz lattice. The main factors affecting the impurity removal effect of the high-temperature gasification process include the reaction temperature, the reaction time, and the characteristics of the high-activity gas (such as the ratio and flow of the high-activity gas). When the reaction temperature and the characteristics of the high-activity gas are determined, the reaction time becomes the key factor affecting the impurity removal effect of the high-temperature gasification process. The so-called reaction time is the time for which the quartz sand stays in the quartz glass container in the high-temperature gasification reaction. In a continuous production process, the reaction time is the amount of quartz sand flowing out of the quartz glass container. The greater the flow of the quartz sand, the greater the yield of the ultrapure quartz sand. However, the shorter the time for which the quartz sand stays in the quartz glass container, the poorer the high-temperature gasification effect. In the production process of ultrapure quartz sand, in order to accurately control the high-temperature gasification impurity removal effect and the yield of the ultrapure quartz sand, it is necessary to implement safe and pollution-free flow control of the high-temperature gasification quartz sand.

[0003] At present, there is no existing technology related to the flow control of quartz sand on the market, and there is no technology or device for flow control of quartz sand under the condition of high temperature and high-activity gas participation. SUMMARY

[0004] This section is intended to summarize some aspects of the embodiments of the utility model and briefly introduce some preferred embodiments. Some simplifications or omissions may be made in this section and the abstract of the specification and the utility model name to avoid obscuring the purpose of this section, the abstract of the specification and the utility model name. Such simplifications or omissions cannot be used to limit the scope of the utility model.

[0005] In view of the above existing quartz sand flow control problems, the utility model provides a high temperature gasification quartz sand flow control device and control method.

[0006] Therefore, the utility model aims at providing a high temperature gasification quartz sand flow control device and control method, solves the problem that there is no quartz sand flow control related technology in the existing market, and there is no technology or device for flow control of quartz sand under the condition of high temperature, high active gas participation.

[0007] In order to solve the above technical problems, the utility model provides the following technical scheme: a high temperature gasification quartz sand flow control device, including high temperature gasification device, outer sleeve pipe, flow control device, waste gas treatment device, discharge pipe, baffle pipe and high temperature quartz sand cooling device;Wherein, the high temperature gasification device includes gasification pipe and heating device;Wherein, the flow control device includes gate valve with push-pull rod, support plate, gas seal device, the gate valve with push-pull rod includes gate valve bottom plate, gate valve side plate, gate valve hanging plate, push-pull rod and handle;Wherein, the waste gas treatment device includes exhaust pipe, water inlet pipe, waste gas neutralization device with fan and waste gas hose, the exhaust pipe is the quartz glass pipe arranged on the outer sleeve pipe upper end, the water inlet pipe is arranged at the position close to the end of the exhaust pipe, the waste gas hose is connected with the exhaust pipe and the waste gas neutralization device with fan;The discharge pipe is arranged at the bottom of the outer sleeve pipe, the high temperature gasification quartz sand flows into the high temperature quartz sand cooling device from the discharge pipe after being blown by the purifying gas for gas sealing, the high temperature quartz sand cooling device utilizes the technology of water cooling and gas cooling to implement pollution-free cooling of high temperature quartz sand.

[0008] As a preferred scheme of the high temperature gasification quartz sand flow control device, wherein: the gasification pipe is the cylindrical quartz glass pipe with the feed pipe arranged at the top center and the discharge pipe arranged at the bottom center, the gasification pipe is provided with the gas inlet pipe and the gas outlet pipe, and the heating device is the high temperature electric furnace arranged outside the gasification pipe.

[0009] As a preferred scheme of the high temperature gasification quartz sand flow control device, wherein: the outer sleeve pipe is the quartz glass pipe with the same diameter as the gasification pipe, which is sleeved on the lower part of the gasification pipe, and the discharge pipe of the gasification pipe is located in the outer sleeve pipe.

[0010] As a preferred scheme of the high-temperature gasification quartz sand flow control device, the gate valve bottom plate is a rectangular quartz glass plate, horizontally arranged below the discharge pipe of the gasification pipe, and the narrow side of the rectangle is larger than the diameter of the discharge pipe of the gasification pipe; the gate valve side plate is a quartz glass plate vertically arranged on both sides of the long side of the gate valve bottom plate, and the bottom end of the gate valve side plate is connected with the gate valve bottom plate, and the upper end is connected with the gate valve hanging plate; the gate valve hanging plate is a narrow strip-shaped quartz glass sheet horizontally arranged inside the gate valve side plate, and one side of the long side of the gate valve hanging plate is connected with the upper end of the gate valve side plate; the push-pull rod is a quartz glass rod, which is parallel to the long side of the gate valve bottom plate, one end of the push-pull rod is connected with the center of the narrow side of the gate valve bottom plate, and the other end extends to the outside of the outer sleeve pipe and is connected with the handle; the handle is a cross-shaped rod composed of a quartz glass rod or a circular plate made of a quartz glass plate, and the center of the cross-shaped rod or the circular plate is connected with the push-pull rod.

[0011] As a preferred scheme of the high-temperature gasification quartz sand flow control device, the support plate is a rectangular quartz glass plate as a whole, horizontally arranged on the discharge pipe of the gasification pipe, and the height of the support plate arranged on the discharge pipe is subject to the height of the gate valve side plate, so that the gate valve with the push-pull rod can be hung on the support plate through the gate valve hanging plate, and there is a certain gap between the gate valve bottom plate and the lower end of the discharge pipe of the gasification pipe, the width of the support plate is subject to the width of the gate valve bottom plate, so that the gate valve with the push-pull rod can be hung on the support plate through the gate valve hanging plate, and the discharge pipe of the gasification pipe is located between the two gate valve side plates, the length of the support plate is greater than twice the length of the gate valve bottom plate, and a certain height of the baffle is vertically arranged on both narrow sides of the support plate, the gas sealing device comprises a gas sealing pipe and an air inlet pipe, the gas sealing pipe is parallelly sleeved on the push-pull rod, one end of the gas sealing pipe is open and penetrates into the outer sleeve pipe, the gas sealing pipe is connected with the outer sleeve pipe, the other end is outside the outer sleeve pipe and is partially blocked by a quartz glass sheet, at the position of the center of the blocking quartz glass sheet, a circular hole larger than the diameter of the push-pull rod is opened, so that there is a gap between the push-pull rod and the glass sheet when the push-pull rod penetrates through the blocking glass sheet, and the air inlet pipe is connected with the gas sealing pipe outside the outer sleeve pipe, and provides purified gas for the gas sealing of the gas sealing pipe.

[0012] The utility model discloses a high temperature gasification quartz sand flow control device, compared with prior art, this high temperature gasification quartz sand flow control technology and device, through adopting the suspension type, push -pull gate valve technology, combines the gas seal technology, carries out flow control to the discharge pipe of high temperature gasification device gasification pipe, and the purified gas for gas seal can also blow out the high activity gas from quartz sand, and is collected, handled by waste gas treatment device, thereby reaches the safe, pollution -free flow control to high temperature gasification quartz sand, provides the possibility for seeking the balance point between high temperature gasification effect and ultrapure quartz sand output. BRIEF DESCRIPTION OF DRAWINGS

[0013] In order to more clearly illustrate the technical scheme of the embodiment of the utility model, the following will be briefly introduced to the drawing needed to be used in the embodiment description, obviously, the drawing in the following description only some embodiments of the utility model, for the ordinary skilled person in the art, under the premise of not paying the creative labor, still can obtain other drawings according to these drawings. Wherein:

[0014] Figure 1 The utility model provides the whole structure schematic diagram of high temperature gasification quartz sand flow control device.

[0015] Figure 2 The utility model provides the structure schematic diagram of high temperature gasification quartz sand flow control device in the push -pull rod gate valve of area.

[0016] Legend:

[0017] 1, high temperature gasification device - 11, gasification pipe, 12, high temperature electric furnace,

[0018] 2, outer sleeve pipe,

[0019] 3, flow control device - 31, the gate valve of area push -pull rod: 311, gate valve bottom plate, 312 gate valve side plate, 313, gate valve hanging plate, 314, push -pull rod, 315, handle, 32, support plate, 33, gas seal device: 331, gas seal pipe, 332, inlet pipe,

[0020] 4, waste gas treatment device - 41, exhaust pipe, 42, water inlet pipe, 43, waste gas neutralization device with fan, 44, waste gas hose,

[0021] 5, discharge pipe,

[0022] 6, baffle pipe,

[0023] 7, high temperature quartz sand cooling device. DETAILED DESCRIPTION

[0024] In order to make the above objects, features and advantages of the present application more obvious and easy to understand, the specific embodiments of the present application will be described in detail below with reference to the accompanying drawings.

[0025] In the following description, a lot of specific details are set forth in order to facilitate a full understanding of the present application, but the present application can also be implemented in other ways different from those described herein, and those skilled in the art can make similar generalizations without departing from the connotation of the present application, therefore the present application is not limited by the specific embodiments disclosed below.

[0026] Secondly, the "one embodiment" or "embodiment" referred to herein means that the specific features, structures or characteristics can be included in at least one implementation of the present application. "In one embodiment" appearing in different places in the specification does not mean the same embodiment, nor is it an embodiment that is independent of or mutually exclusive of other embodiments.

[0027] Thirdly, the present application is described in detail in conjunction with the schematic diagram, and in the detailed description of the embodiments of the present application, the cross-sectional view of the device structure is partially enlarged without the general proportion for the convenience of description, and the schematic diagram is only an example, which should not limit the scope of protection of the present application. In addition, the three-dimensional spatial dimensions of length, width and depth should be included in actual manufacture.

[0028] At present, there is no existing technology related to quartz sand flow control on the market, and there is no technology or device for flow control of quartz sand under the condition of high temperature and high active gas participation.

[0029] Therefore, with reference to Figure 1 and Figure 2 The present application provides a high-temperature gasification quartz sand flow control device, which comprises a high-temperature gasification device 1, an outer sleeve pipe 2, a flow control device 3, a waste gas treatment device 4, a discharge pipe 5, a baffle pipe 6, a high-temperature quartz sand cooling device 7.

[0030] The high-temperature gasification device 1 comprises a gasification pipe 11 and a heating device 12; the gasification pipe 11 is a cylindrical quartz glass pipe with a feed pipe arranged at the top center and a discharge pipe arranged at the bottom center, and the gasification pipe is provided with an air inlet pipe and an air outlet pipe; the heating device 12 is a high-temperature electric furnace arranged outside the gasification pipe 11.

[0031] The outer sleeve pipe 2 is a quartz glass pipe with the same diameter as the gasification pipe 11 and sleeved at the lower part of the gasification pipe 11, and the discharge pipe of the gasification pipe 11 of the high-temperature gasification device 1 is located in the outer sleeve pipe 2.

[0032] The flow control device 3( Figure 1 , Figure 2) by the gate valve 31 with push-pull rod, support plate 32, gas seal device 33, with push-pull rod, the gate valve 31 includes the gate valve bottom plate 311, the gate valve side plate 312, the gate valve hanging plate 313 and the push-pull rod 314, handle 315;Gate valve bottom plate 311 is rectangular quartz glass plate, horizontally arranged in the discharge pipe below the gasification pipe 11 of high temperature gasification device 1, the long narrow side of rectangle is greater than the diameter of discharge pipe of high temperature gasification device 1 gasification pipe 11;Gate valve side plate 312 is vertically arranged in the long edge of the gate valve bottom plate 311 two sides of quartz glass plate, the bottom end of gate valve side plate 312 is connected with the gate valve bottom plate 311, the upper end is connected with the gate valve hanging plate 313;Gate valve hanging plate 313 is horizontally arranged in the inside of the gate valve side plate 312, narrow strip-shaped quartz glass sheet, one side of the long edge of the gate valve hanging plate 313 is connected with the upper end of the gate valve side plate 312, the gate valve hanging plate 313 is used to hang the whole gate valve 31 with push-pull rod on the support plate 32 Figure 2 );Push-pull rod 314 is quartz glass rod, push-pull rod 314 is parallel to the long edge of the gate valve bottom plate 311, one end of push-pull rod 314 is connected with the center of the narrow edge of the gate valve bottom plate 311, the other end extends to the outside of the outer sleeve 2 and is connected with handle 315;Handle 315 is cross-shaped rod composed of quartz glass rod or circular plate made of quartz glass plate, the center of cross-shaped rod or circular plate is connected with push-pull rod 314, so as to facilitate the push-pull gate valve 31 with push-pull rod. Support plate 32 is rectangular quartz glass plate, horizontally arranged on the discharge pipe of high temperature gasification device 1 gasification pipe 11 Figure 2), the height of the support plate 32 on the discharge pipe (or the height of the support plate 32 from the bottom end of the discharge pipe) is subject to the height of the gate valve side plate 312, the gate valve 31 with a push-pull rod can be hung on the support plate 32 through the gate valve hanging plate 313, and there is a gap between the gate valve bottom plate 311 and the lower end of the discharge pipe of the gasification pipe 11; the width of the support plate 32 is subject to the width of the gate valve bottom plate 311, the gate valve 31 with a push-pull rod can be hung on the support plate 32 through the gate valve hanging plate 313, and the discharge pipe of the gasification pipe 11 is located between the two gate valve side plates 312; the length of the support plate 32 is greater than twice the length of the gate valve bottom plate 311, and a certain height of the baffle is vertically arranged on the two narrow edges of the support plate 32 to limit the pushing and pulling range of the gate valve hanging plate 313, and also limit the pushing and pulling range of the gate valve 31 with a push-pull rod; when the push-pull rod 314 of the gate valve 31 with a push-pull rod is pushed into the outer sleeve 2 to the top end, the gate valve hanging plate 313 will touch the baffle on the narrow edge of the support plate 32 and cannot continue to push in, at this time the gate valve bottom plate 311 will completely block the discharge pipe of the gasification pipe 11 of the high-temperature gasification device 1, and the discharge pipe of the gasification pipe 11 will not flow out of the quartz sand; when the push-pull rod 314 of the gate valve 31 with a push-pull rod is pulled out to the top end of the outer sleeve 2, the gate valve hanging plate 313 will touch the baffle on the other narrow edge of the support plate 32 and cannot continue to pull out, at this time the gate valve bottom plate 311 will not block the discharge pipe of the gasification pipe 11, and the quartz sand will flow out of the discharge pipe of the gasification pipe 11 at full load; when the push-pull rod 314 of the gate valve 31 with a push-pull rod is pulled to a degree between the above two states, the gate valve bottom plate 311 will form a partial block to the discharge pipe of the gasification pipe 11, thereby achieving the purpose of controlling the flow of the discharge pipe of the gasification pipe 11. The gas seal device 33 includes a gas seal pipe 331 and an air inlet pipe 332; the gas seal pipe 331 is parallelly sleeved on the push-pull rod 314, one end of the gas seal pipe 331 is open and penetrates into the outer sleeve 2, the gas seal pipe 331 is connected with the outer sleeve 2, the other end of the gas seal pipe 331 is outside the outer sleeve 2 and is partially sealed by a quartz glass sheet, a circular hole slightly larger than the diameter of the push-pull rod 314 is opened in the center of the sealing quartz glass sheet, so that there is a small gap between the push-pull rod 314 and the glass sheet when the push-pull rod 314 passes through the sealing glass sheet, facilitating the back and forth pushing and pulling of the push-pull rod 314, and the push-pull rod 314 is not located at the center of the gas seal pipe 331 but at an upper position in the gas seal pipe 331, so that most of the purified gas for gas sealing is blown into the outer sleeve 2 from below the push-pull rod 314; the air inlet pipe 332 is connected with the gas seal pipe 331 outside the outer sleeve 2 to provide purified gas for gas sealing for the gas seal pipe 331;

[0033] The exhaust gas treatment device 4 comprises an exhaust pipe 41, a water inlet pipe 42, an exhaust gas neutralization device 43 with a fan, and an exhaust gas hose 44. The exhaust pipe 41 is a quartz glass pipe arranged at the upper end of the outer sleeve pipe 2, for discharging the high-activity gas wrapped by the purifying gas for air sealing and quartz sand together out of the outer sleeve pipe 2; the water inlet pipe 42 is arranged at a position close to the end of the exhaust pipe 41, for cooling the high-temperature high-activity gas and protecting the exhaust gas hose 44 connected with the exhaust pipe 41; the exhaust gas neutralization device 43 with a fan mainly collects and transports the exhaust gas into a neutralization tank through the fan, so as to achieve the purpose of standard treatment of the exhaust gas; and the exhaust gas hose 44 is used for connecting the exhaust pipe 41 and the exhaust gas neutralization device 43 with a fan.

[0034] The discharge pipe 5 is arranged at the bottom of the outer sleeve pipe 2, and the high-temperature gasified quartz sand flowing out of the discharge pipe of the gasification pipe 11 of the high-temperature gasification device 1 flows into the high-temperature quartz sand cooling device 7 from the discharge pipe 5 after being purged by the purifying gas for air sealing.

[0035] The high-temperature quartz sand cooling device 7 is a device for implementing pollution-free cooling of high-temperature quartz sand by combining water cooling and air cooling technologies.

[0036] It should be noted that the high-temperature gasification device is a device for removing alkali metal element impurities in a quartz lattice. The purpose of the present application is mainly to control the flow of high-temperature quartz sand treated by the device, and does not involve the quartz sand high-temperature gasification impurity removal process, that is, the high-temperature gasification device only exists as a source of high-temperature gasified quartz sand in the present application. Therefore, the present application only briefly describes the high-temperature gasification device, and the specific structural features are beyond the scope of the present application. The high-temperature gasification device comprises a gasification pipe and a heating device. The gasification pipe is a cylindrical quartz glass pipe with a feed pipe arranged at the top center and a discharge pipe arranged at the bottom center. The gasification pipe is provided with an air inlet pipe and an air outlet pipe. The heating device is a high-temperature electric furnace arranged outside the gasification pipe.

[0037] The outer sleeve pipe is a quartz glass pipe with the same diameter as the gasification pipe, which is sleeved on the lower part of the gasification pipe. The discharge pipe of the gasification pipe of the high-temperature gasification device is located in the outer sleeve pipe.

[0038] The flow control device is composed of a gate valve with a push-pull rod, a support plate and a gas sealing device. The gate valve with a push-pull rod comprises a gate valve bottom plate, a gate valve side plate, a gate valve hanging plate and a push-pull rod and a handle. The gate valve bottom plate is a rectangular quartz glass plate, which is horizontally arranged below the discharge pipe of the gasification pipe of the high-temperature gasification device, and the narrow side of the rectangle is larger than the diameter of the discharge pipe of the gasification pipe of the high-temperature gasification device. The gate valve side plate is a quartz glass plate vertically arranged on both sides of the long side of the gate valve bottom plate, and the bottom end of the gate valve side plate is connected with the gate valve bottom plate, and the upper end is connected with the gate valve hanging plate. The gate valve hanging plate is a narrow strip-shaped quartz glass plate horizontally arranged inside the gate valve side plate, and one side of the long side of the gate valve hanging plate is connected with the upper end of the gate valve side plate, and the gate valve hanging plate is used to suspend the whole gate valve with a push-pull rod on the support plate. The push-pull rod is a quartz glass rod, which is parallel to the long side of the gate valve bottom plate, and one end of the push-pull rod is connected with the center of the narrow side of the gate valve bottom plate, and the other end extends to the outside of the outer sleeve pipe and is connected with the handle. The handle is a cross-shaped rod composed of a quartz glass rod or a circular plate made of a quartz glass plate, and the center of the cross-shaped rod or the circular plate is connected with the push-pull rod to facilitate the push-pull of the gate valve with a push-pull rod. The support plate is a rectangular quartz glass plate, which is horizontally arranged on the discharge pipe of the gasification pipe of the high-temperature gasification device, and the height of the support plate arranged on the discharge pipe (or the height of the support plate from the bottom end of the discharge pipe) is subject to the height of the gate valve side plate, so that the gate valve with a push-pull rod can be suspended on the support plate through the gate valve hanging plate, and there is a certain gap between the gate valve bottom plate and the lower end of the discharge pipe of the gasification pipe. The width of the support plate is subject to the width of the gate valve bottom plate, so that the gate valve with a push-pull rod can be suspended on the support plate through the gate valve hanging plate, and the discharge pipe of the gasification pipe is located between the two gate valve side plates. The length of the support plate is greater than twice the length of the gate valve bottom plate, and a certain height of the baffle is vertically arranged on both narrow sides of the support plate to limit the push-pull range of the gate valve hanging plate, and at the same time, the push-pull range of the gate valve with a push-pull rod is also limited. When the push-pull rod of the gate valve with a push-pull rod is pushed into the outer sleeve pipe to the top end, the gate valve hanging plate touches the baffle on the narrow side of the support plate and cannot continue to be pushed in. At this time, the gate valve bottom plate completely blocks the discharge pipe of the gasification pipe of the high-temperature gasification device, and the discharge pipe of the gasification pipe has no quartz sand flowing out. When the push-pull rod of the gate valve with a push-pull rod is pulled out of the outer sleeve pipe to the top end, the gate valve hanging plate touches the baffle on the other side of the narrow side of the support plate and cannot continue to be pulled out. At this time, the gate valve bottom plate does not block the discharge pipe of the gasification pipe at all, and the quartz sand flows out from the discharge pipe of the gasification pipe at full load. When the push-pull rod of the gate valve with a push-pull rod is pulled to a degree between the above two states, the gate valve bottom plate forms a partial block to the discharge pipe of the gasification pipe, thereby achieving the purpose of controlling the flow of the discharge pipe of the gasification pipe.The air seal device comprises an air seal pipe and an air inlet pipe; the air seal pipe is sleeved on the push-pull rod in parallel, one end of the air seal pipe is open and penetrates into the outer sleeve pipe, the air seal pipe is connected with the outer sleeve pipe, the other end of the air seal pipe is outside the outer sleeve pipe and is locally blocked by a quartz glass sheet, a circular hole slightly larger than the diameter of the push-pull rod is formed in the position of the center of the blocking quartz glass sheet, so that there is a gap between the push-pull rod and the glass sheet when the push-pull rod penetrates through the blocking glass sheet, facilitating the back and forth pushing and pulling of the push-pull rod, and the push-pull rod is not located at the center of the air seal pipe but at the upper position in the air seal pipe, so that most of the purified gas for air sealing is blown into the outer sleeve pipe from below the push-pull rod, and the purified gas can blow the quartz sand from below the gate valve bottom plate; the air inlet pipe is connected with the air seal pipe outside the outer sleeve pipe to provide the purified gas for air sealing for the air seal pipe.

[0039] The exhaust gas treatment device comprises an exhaust pipe, a water inlet pipe, an exhaust gas neutralization device with a fan and an exhaust gas hose. The exhaust pipe is a quartz glass pipe arranged at the upper end of the outer sleeve pipe to discharge the purified gas for air sealing and the high-activity gas wrapped by the quartz sand together out of the outer sleeve pipe; the water inlet pipe is arranged at the position close to the end of the exhaust pipe to cool the high-temperature high-activity gas and protect the exhaust gas hose connected with the exhaust pipe; the exhaust gas neutralization device with a fan mainly collects the exhaust gas by the fan and transports the exhaust gas into a neutralization tank to achieve the purpose of standard treatment of the exhaust gas. How the exhaust gas neutralization device with a fan collects the exhaust gas and how it neutralizes and treats the exhaust gas are beyond the scope of the utility model and are not described in detail in the utility model. The utility model only uses the existing technology to standard treat the exhaust gas involved in the utility model. The exhaust gas hose is used to connect the exhaust pipe and the exhaust gas neutralization device with a fan.

[0040] The discharge pipe is arranged at the bottom of the outer sleeve pipe, and the high-temperature gasified quartz sand flowing out of the discharge pipe of the gasification pipe of the high-temperature gasification device flows into the high-temperature quartz sand cooling device from the discharge pipe after being swept by the purified gas for air sealing.

[0041] The high-temperature quartz sand cooling device is a device for implementing pollution-free cooling of high-temperature quartz sand by combining water cooling and air cooling. The utility model only uses the existing technology to pollution-free cool the high-temperature quartz sand involved in the utility model. How the device implements pollution-free cooling of high-temperature quartz sand is beyond the scope of the utility model, and the utility model is not described in detail.

[0042] The exhaust pipe is not directly connected with the exhaust hose after extending horizontally, but is bent downward after extending horizontally for a distance, extends for a distance, is bent to extend horizontally again, and the water inlet pipe is arranged on the exhaust pipe before being connected with the exhaust hose, so that the cooling water flowing into the exhaust pipe through the water inlet pipe can cool the high-temperature and high-activity gas and protect the exhaust hose, and the cooling water cannot flow back to the outer sleeve through the exhaust pipe to pollute the quartz sand.

[0043] The utility model discloses a baffle pipe is arranged outside the discharge pipe, and the feed pipe of high-temperature quartz sand cooling device connected with the discharge pipe is covered in the baffle pipe, prevents the dust from entering the high-temperature quartz sand cooling device through the gap between the discharge pipe and the feed pipe of high-temperature quartz sand cooling device.

[0044] Embodiment one:

[0045] The embodiment will show the effect of the high-temperature gasified quartz sand flow control technology and device on the high-temperature gasified quartz sand flow control, but the utility model is not limited by this.

[0046] The high-temperature gasified quartz sand flow control device is processed and manufactured.

[0047] First, consider the manufacture of the high-temperature gasification device 1. The high-temperature gasification device 1 includes a gasification pipe 11 and a heating device 12, which is mainly a device for removing alkali metal element impurities in the quartz lattice. Since the purpose of the utility model is mainly to control the flow of high-temperature quartz sand after being treated by the device, and does not involve the technology and device of the quartz sand high-temperature gasification process, i.e., the high-temperature gasification device 1 only exists as a source of high-temperature gasified quartz sand in the utility model, therefore, the utility model only makes a simple description of the high-temperature gasification device 1, and the specific structure is beyond the content of the utility model. The gasification pipe 11 is a cylindrical quartz glass pipe, the top center of the gasification pipe 11 is provided with a feed pipe, and the top edge is provided with an exhaust pipe; in order to facilitate the clean discharge of quartz sand in the gasification pipe without residual quartz sand, the bottom of the gasification pipe 11 is conical, the center of the conical bottom is provided with a discharge pipe, and the lower part of the gasification pipe 11 is provided with an air inlet pipe; the utility model selects a quartz glass pipe with a length of 2000-4000 mm, a diameter of 250-500 mm, and a thickness of 7-12 mm to manufacture the gasification pipe 11, as an optional solution, the utility model selects a quartz glass pipe with a length of 3000 mm, a diameter of 450 mm, and a thickness of 12 mm to manufacture the gasification pipe 11, and the discharge pipe of the gasification pipe 11 is selected to be a quartz glass pipe with a length of 100 mm, a diameter of 80 mm, and a thickness of 12 mm; the heating device 12 is a high-temperature electric furnace arranged outside the gasification pipe 11, and the maximum use temperature of the electric furnace is 1300℃.

[0048] Next, the fabrication of the outer tube 2 is considered. The outer tube 2 is a quartz glass tube with the same diameter as the vaporization tube 11, which is fitted into the lower part of the vaporization tube 11. The discharge pipe of the vaporization tube 11 of the high-temperature vaporization device 1 is located inside the outer tube 2. In this invention, a quartz glass tube with a length of 1000mm-1500mm, a diameter of 250mm-500mm, and a thickness of 5mm-10mm is selected to make the outer tube 2. As a preferred option, this invention selects a quartz glass tube with a length of 1000mm, a diameter of 450mm, and a thickness of 10mm to make the outer tube 2.

[0049] Thirdly, the fabrication of flow control device 3 should be considered. Flow control device 3 ( Figure 1 , Figure 2 The device consists of a gate valve 31 with a push-pull rod, a support plate 32, and an air-sealing device 33. The gate valve 31 with the push-pull rod includes a gate valve base plate 311, a gate valve side plate 312, a gate valve hanging plate 313, a push-pull rod 314, and a handle 315. The gate valve base plate 311 is a rectangular quartz glass plate, horizontally positioned below the discharge pipe of the gasification pipe 11 of the high-temperature gasification device 1. The narrow side of the rectangle is larger than the diameter of the discharge pipe of the gasification pipe 11. This invention selects a quartz glass plate with a length of 90mm-150mm, a width of 80mm-140mm, and a thickness of 7mm-12mm to make the gate valve base plate 311. As a preferred option, this invention uses a quartz glass plate with a length of 120mm, a width of 110mm, and a thickness of 8mm. A gate valve base plate 311 is fabricated; the gate valve side plate 312 is a quartz glass plate vertically arranged on both sides of the long side of the gate valve base plate 311. The lower end of the gate valve side plate 312 is connected to the gate valve base plate 311, and the upper end is connected to the gate valve hanging plate 313. This utility model uses a quartz glass plate with a length of 120mm, a width (or height) of 75mm, and a thickness of 8mm to fabricate the gate valve side plate 312; the gate valve hanging plate 313 is a narrow strip of quartz glass horizontally arranged inside the gate valve side plate 312. One long side of the gate valve hanging plate 313 is connected to the upper end of the gate valve side plate 312. The gate valve 31 with push-pull rod is suspended on the support plate 32 by the gate valve hanging plate 313. Figure 2), the utility model discloses the quartz glass sheet of selecting long 120mm, wide 13mm, thick 8mm is used to make gate valve hanging board 313;Thus it is made to complete one external size for long 120mm, wide 126mm, high 75mm's gate valve, and the internal size of gate valve is long 120mm, wide 110mm, high 59mm, and the interval of two gate valve hanging boards is 84mm;The push-pull rod 314 is quartz glass stick, and the push-pull rod 314 is parallel to the long side of gate valve bottom plate 311, and one end of push-pull rod 314 is connected with the narrow edge center of gate valve bottom plate 311, and the other end extends to the pipe outside of outer sleeve tube 2 and is connected with handle 315, and the utility model discloses the quartz glass stick of selecting long 300mm, diameter 12mm is used to make push-pull rod 314;Handle 315 is the cross-shaped stick formed by quartz glass stick or the circular plate made by quartz glass plate, and the center of cross-shaped stick or circular plate is connected with push-pull rod 314, to facilitate the gate valve 31 of push-pull rod, and the utility model discloses two quartz glass sticks of selecting long 60mm, diameter 10mm are used to make the cross-shaped handle 315. The overall support plate 32 is rectangular quartz glass plate, and is horizontally arranged on the discharge pipe of gasification pipe 11 of high-temperature gasification device 1 Figure 1 , Figure 2), the height of the support plate 32 arranged on the discharge pipe (or the height of the support plate 32 from the bottom end of the discharge pipe) is subject to the height of the gate valve side plate 312, the gate valve 31 with a push-pull rod can be hung on the support plate 32 through the gate valve hanging plate 313, and there is a gap between the gate valve bottom plate 311 and the lower end of the discharge pipe of the gasification pipe 11; the width of the support plate 32 is subject to the width of the gate valve bottom plate 311, the gate valve 31 with a push-pull rod can be hung on the support plate 32 through the gate valve hanging plate 313, and the discharge pipe of the gasification pipe 11 is located in the middle of the two gate valve side plates 312; the length of the support plate 32 is greater than twice the length of the gate valve bottom plate 311, and a certain height of the baffle is arranged vertically upward on the two narrow edges of the support plate 32 to limit the pushing and pulling range of the gate valve hanging plate 313, and also limit the pushing and pulling range of the gate valve 31 with a push-pull rod; when the push-pull rod 314 of the gate valve 31 with a push-pull rod is pushed into the outer sleeve 2 to the top end, the gate valve hanging plate 313 touches the baffle of the narrow edge of the support plate 32 and cannot continue to be pushed in, at this time the gate valve bottom plate 311 completely blocks the discharge pipe of the gasification pipe 11 of the high-temperature gasification device 1, and the discharge pipe of the gasification pipe 11 has no quartz sand flowing out, and when the push-pull rod 314 of the gate valve 31 with a push-pull rod is pulled out to the top end, the gate valve hanging plate 313 touches the baffle of the other narrow edge of the support plate 32 and cannot continue to be pulled out, at this time the gate valve bottom plate 311 will not block the discharge pipe of the gasification pipe 11, and the quartz sand will flow out from the discharge pipe of the gasification pipe 11 at full load. The glass plate with a length of 245mm, a width of 106mm and a thickness of 10mm is selected to make the support plate 32, the glass plate is welded on the discharge pipe of the gasification pipe 11 of the high-temperature gasification device 1, so that the discharge pipe of the gasification pipe 11 is 13mm away from the two long edges of the glass plate, 22.5mm away from one side narrow edge, and the bottom surface of the glass support plate 32 is 45mm away from the bottom end of the discharge pipe of the gasification pipe 11, so that there is a gap of 4mm between the bottom end of the discharge pipe of the gasification pipe 11 and the gate valve bottom plate 311 of the gate valve 31 with a push-pull rod, and finally a glass sheet with a length of 106mm, a width of 20mm and a thickness of 10mm is selected to weld a baffle on each narrow edge end of the glass support plate 32 to complete the manufacture of the support plate 32, the distance between the two baffles of the support plate 32 is 245mm, and the height of the baffle is 20mm.The air seal device 33 comprises an air seal pipe 331 and an air inlet pipe 332; the air seal pipe 331 is sleeved on the push-pull rod 314 in parallel, one end of the air seal pipe 331 is open and penetrates into the outer sleeve pipe 2, the air seal pipe 331 is connected with the outer sleeve pipe 2, the other end of the air seal pipe 331 is outside the outer sleeve pipe 2 and is partially blocked by a quartz glass sheet, a circular hole slightly larger than the diameter of the push-pull rod 314 is formed in the position of the center of the blocking quartz glass sheet, so that there is a gap between the push-pull rod 314 and the glass sheet when the push-pull rod 314 penetrates through the blocking glass sheet, the push-pull rod 314 is not located at the center of the air seal pipe 331 but at the upper position in the air seal pipe 331, most of the purified air for air sealing is blown into the outer sleeve pipe 2 from the lower side of the push-pull rod 314, the quartz glass pipe with a length of 100 mm, a diameter of 35 mm and a thickness of 5 mm is selected to manufacture the air seal pipe 331, the air seal pipe 331 penetrates into the outer sleeve pipe 2 by 20 mm, the distance between the push-pull rod 314 of the gate valve 31 with a push-pull rod and the inner wall of the air seal pipe 331 is 3 mm; the air inlet pipe 332 is connected with the air seal pipe 331 outside the outer sleeve pipe 2, the quartz glass pipe with a diameter of 35 mm and a thickness of 5 mm is selected to manufacture the air inlet pipe 332, the air inlet pipe 332 is bent to extend horizontally by 70 mm after extending vertically downward by 100 mm.

[0050] The fourth consideration is the fabrication of the waste gas treatment device. The waste gas treatment device 4 comprises an exhaust pipe 41, a water inlet pipe 42, a waste gas neutralization device 43 with a fan and a waste gas hose 44. The exhaust pipe 41 is a quartz glass pipe arranged at the upper end of the outer sleeve pipe 2, which is used to discharge the purified air for air sealing and the high-activity gas wrapped by the quartz sand together from the outer sleeve pipe 2, the quartz glass pipe with a diameter of 40 mm and a thickness of 5 mm is selected to manufacture the exhaust pipe 41, the exhaust pipe 41 connected to the upper end of the outer sleeve pipe 2 is first extended horizontally by 250 mm, then bent downward and extended by 250 mm, and finally bent to extend horizontally by 150 mm; the water inlet pipe 42 is arranged at the position close to the end of the exhaust pipe 41 and is used for cooling the high-temperature high-activity gas and protecting the waste gas hose 44 connected with the exhaust pipe 41, the quartz glass pipe with a length of 80 mm, a diameter of 25 mm and a thickness of 3 mm is selected to manufacture the water inlet pipe 42, the water inlet pipe 42 is welded to the end of the exhaust pipe 41 and the horizontally extended pipe with a length of 150 mm; the waste gas neutralization device 43 with a fan is mainly used to collect the waste gas by the fan and transport the waste gas into a neutralization tank, so as to achieve the purpose of standard treatment of the waste gas, the waste gas neutralization device 43 with a fan is made of PP plastic material; the waste gas hose 44 is used to connect the exhaust pipe 41 and the waste gas neutralization device 43 with a fan, and the plastic material hose with appropriate specifications is selected as the waste gas hose 44.

[0051] The discharge pipe 5 is arranged at the bottom of the outer sleeve pipe 2, and the high-temperature gasified quartz sand flowing out of the discharge pipe of the gasification pipe 11 of the high-temperature gasification device 1 flows into the high-temperature quartz sand cooling device 7 from the discharge pipe 5 after being purged by the purging gas for gas sealing; in order to prevent the quartz sand from remaining in the outer sleeve pipe 2, the bottom of the outer sleeve pipe 2 is arranged in a conical shape, and the discharge pipe 5 is arranged at the center of the conical body; the quartz glass pipe with a length of 150 mm, a diameter of 80 mm and a thickness of 10 mm is selected to manufacture the discharge pipe 5. In addition, in order to prevent the dust from entering the high-temperature quartz sand cooling device 7 through the gap between the discharge pipe 5 and the feeding pipe of the high-temperature quartz sand cooling device 7, the baffle pipe 6 is arranged on the discharge pipe 5, so that the feeding pipe of the high-temperature quartz sand cooling device 7 connected with the discharge pipe 5 is covered in the baffle pipe 6; the quartz glass pipe with a length of 80 mm, a diameter of 150 mm and a thickness of 5 mm is selected to manufacture the baffle pipe 6, and the bottom end of the baffle pipe 6 is 30 mm higher than the bottom end of the discharge pipe 5.

[0052] The high-temperature quartz sand cooling device 7 is a device for implementing non-pollution cooling of high-temperature quartz sand by combining water cooling and air cooling technologies; the quartz glass material is selected to manufacture the high-temperature quartz sand cooling device 7, and the feeding pipe of the high-temperature quartz sand cooling device 7 has a diameter of 120 mm and a thickness of 5 mm, so that it can be arranged between the discharge pipe 5 and the baffle pipe 6.

[0053] After the high-temperature gasified quartz sand flow control device is manufactured, the connection of various components is considered. First, the feeding pipe of the high-temperature quartz sand cooling device 7 is arranged between the discharge pipe 5 and the baffle pipe 6, and the exhaust pipe 41 is connected to the exhaust gas neutralization device 43 with the exhaust gas hose 44; then, the gas source of the purifying gas is connected to the air inlet pipe 332 of the air sealing device 33 and the air inlet pipe of the high-temperature quartz sand cooling device 7 respectively, and the cooling water source is connected to the water inlet pipe of the high-temperature quartz sand cooling device 7 and the water inlet pipe 42 of the exhaust gas treatment device 4 and the water inlet pipe of the exhaust gas neutralization device 43 with the fan.

[0054] After the above supporting work is completed, the specific operation of the embodiment is started.

[0055] First, the high-temperature gasified quartz sand flow control device is closed. The handle 315 of the gate valve 31 with a push-pull rod is pushed into the outer sleeve pipe 2, so that the gate valve bottom plate 311 of the gate valve 31 with a push-pull rod completely blocks the discharge pipe of the gasification pipe 11 of the high-temperature gasification device 1; the quartz sand treated by the physical impurity removal process and the chemical impurity removal process is added into the high-temperature gasification device 1, so that the high-temperature gasification impurity removal process is implemented on the quartz sand in the gasification pipe 11 of the high-temperature gasification device 1; in the embodiment, the content of alkali metal elements in the quartz sand subjected to high-temperature gasification is respectively: Li 1.64 ppm, Na 5.20 ppm and K 3.77 ppm.

[0056] Then open the cooling water source valve, water supply to the exhaust gas treatment device 4 water inlet pipe 42, to the exhaust gas with fan neutralization device 43, to the high temperature quartz sand cooling device 7 water supply.

[0057] Then open the cooling water source valve, water supply to the exhaust gas treatment device 4 water inlet pipe 42, to the exhaust gas with fan neutralization device 43, to the high temperature quartz sand cooling device 7 water supply.

[0058] Finally, open the high temperature gasification quartz sand flow control device. Slowly pull the handle 315 of the gate valve 31 with the pull rod outside the sleeve 2, open the gate valve 31 with the pull rod below the discharge pipe of the gasification pipe 11 of the high temperature gasification device 1, and after the narrow edge of the gate valve bottom plate 311 reaches the inner diameter of the outer diameter of the discharge pipe of the gasification pipe 11, the high temperature gasified quartz sand flows out of the gap between the discharge pipe of the gasification pipe 11 and the gate valve bottom plate 311 after a period of time.

[0059] In this embodiment, since the volume of the gasification pipe 11 of the high temperature gasification device 1 and the temperature of the high temperature gasification are fixed, the main factor determining the effect of high temperature gasification of quartz sand is the gasification time of quartz sand in the gasification pipe 11 of the high temperature gasification device 1, and the opening degree of the flow control device 3 determines the residence time of quartz sand in the gasification pipe 11; in this embodiment, the gate valve 31 with the pull rod of the flow control device 3 is opened by one eighth, that is, the discharge pipe of the gasification pipe 11 of the high temperature gasification device 1 is blocked by 87.5%, at this time the quartz sand flow is about 200 kg / h, and the quartz sand from entering the gasification pipe 11 of the high temperature gasification device 1 to flowing out of the gasification pipe 11 experiences about 1.5 hours, that is, the quartz sand experiences about 1.5 hours of high temperature gasification treatment in the high temperature gasification device 1; adjust the opening degree of the purified gas source valve, so that the purified gas can prevent the high activity gas wrapped in the quartz sand from flowing into the environment through the gap between the pull rod 314 and the gas sealing pipe 331, and the purified gas can also blow the quartz sand to separate the high activity gas wrapped in the quartz sand from the quartz sand quickly; adjust the flow of the exhaust gas treatment device fan, so that the purified gas and the high activity gas in the sleeve 2 can be timely extracted out of the sleeve 2, and the exhaust gas can be neutralized and discharged after treatment; the high temperature quartz sand after gas-solid separation flows into the high temperature quartz sand cooling device 7 through the discharge pipe 5 for cooling treatment.

[0060] The cooled quartz sand is sampled and detected, and the content of alkali metal elements in the product quartz sand is respectively: Li 0.82 ppm, Na 0.46 ppm, K 0.73 ppm, reaching the internationally recognized high purity (ultra-pure) quartz sand standard (in the internationally recognized ultra-pure quartz sand standard, the content of alkali metal elements is less than 1 ppm).

[0061] Example Two:

[0062] The same high-temperature gasification quartz sand flow control technology and device as in the first embodiment is adopted, and the parameters of the quartz sand requiring high-temperature gasification are also the same as in the first embodiment, and the only difference from the first embodiment is that the opening degree of the gate valve 31 with a push-pull rod in the flow control device 3 is increased from one-eighth to one-fifth, that is, the plugging degree of the discharge pipe of the high-temperature gasification device 1 is reduced from 87.5% to 80%.

[0063] The same operation process as in the first embodiment is adopted, except that the gate valve 31 with a push-pull rod is opened by one-fifth, that is, the discharge pipe of the high-temperature gasification device 1 is plugged by 80%, under this condition, the flow of the high-temperature gasification quartz sand is increased from about 200 kg / h to about 320 kg / h, and the high-temperature gasification treatment time of the quartz sand in the high-temperature gasification device 1 is reduced from 1.5 hours to about 1 hour. Sampling and testing of the cooled quartz sand show that the content of alkali metal elements in the product quartz sand is respectively: Li 1.05 ppm, Na 1.87 ppm, K 1.19 ppm, which meets the internationally recognized high-purity (ultra-pure) quartz sand standard.

[0064] The utility model discloses adopt suspension type, push-pull gate valve technology, combine gas seal technology, carry out flow control to the discharge pipe of high-temperature gasification device gasification pipe, simultaneously, the purified gas for gas seal can also separate the high activity gas from quartz sand, and is collected, processing by waste gas treatment device, reaches the safe, pollution-free flow control to high-temperature gasification quartz sand.

[0065] When the alkali metal element impurities in the quartz lattice are removed by the high-temperature gasification process, in order to obtain ideal high-temperature gasification effect, the residence time of the quartz sand in the high-temperature gasification equipment must be accurately controlled, which is to control the discharge amount of the high-temperature gasification equipment, therefore, the utility model adopts a flow control device at the pipe opening of the discharge pipe of the high-temperature gasification equipment; in order to facilitate the operation of the flow control device at high temperature, the utility model adopts a push-pull gate valve control technology, the push-pull rod of the push-pull gate valve extends to the outside of the equipment, that is, the opening degree of the push-pull gate valve is controlled outside the high-temperature gasification related equipment to avoid high temperature and facilitate operation, and in order to prevent the high-activity gas wrapped in the quartz sand from escaping to the outside of the equipment through the gap between the push-pull rod and the equipment, the utility model sets a gas sealing device at the associated part of the push-pull rod and the equipment; in addition, in order to prevent the quartz sand from blocking the push-pull shaft (support shaft) of the push-pull gate valve, the utility model designs the push-pull gate valve into a suspension type structure, and the support shaft of the push-pull gate valve does not support the push-pull gate valve from the bottom, so that the quartz sand cannot enter the support shaft of the push-pull gate valve during the opening process of the push-pull gate valve, and the support shaft cannot be blocked, thereby achieving safe and pollution-free flow control of the high-temperature gasification quartz sand.

[0066] It should be noted that the above embodiments are only used to illustrate the technical solutions of the present application and are not limiting. Although the present application has been described in detail with reference to the preferred embodiments, it should be understood by those skilled in the art that the technical solutions of the present application can be modified or replaced equivalently without departing from the spirit and scope of the technical solutions of the present application, and they should be covered in the scope of the claims of the present application.

Claims

1. A high temperature gasification quartz sand flow control device, characterized by: The application relates to a high-temperature gasification device, which comprises a high-temperature gasification device (1), an outer sleeve (2), a flow control device (3), a waste gas treatment device (4), a discharge pipe (5), a baffle pipe (6) and a high-temperature quartz sand cooling device (7). The high-temperature gasification device (1) comprises a gasification pipe (11) and a heating device (12). The flow control device (3) comprises a gate valve (31) with a push-pull rod, a support plate (32) and a gas sealing device (33), wherein the gate valve (31) comprises a gate valve bottom plate (311), a gate valve side plate (312), a gate valve hanging plate (313), a push-pull rod (314) and a handle (315). The waste gas treatment device (4) comprises an exhaust pipe (41), a water inlet pipe (42), a waste gas neutralization device (43) with a fan and a waste gas hose (44), wherein the exhaust pipe (41) is a quartz glass pipe arranged at the upper end of the outer sleeve (2), the water inlet pipe (42) is arranged at the position close to the end of the exhaust pipe (41), and the waste gas hose (44) is connected with the exhaust pipe (41) and the waste gas neutralization device (43) with the fan. The discharge pipe (5) is arranged at the bottom of the outer sleeve (2), high-temperature gasified quartz sand flows out of the discharge pipe of the gasification pipe (11), and after being purged by a gas sealing purifying gas, the high-temperature gasified quartz sand flows into the high-temperature quartz sand cooling device (7) from the discharge pipe (5). The high-temperature quartz sand cooling device (7) utilizes the technology of water cooling and air cooling to realize pollution-free cooling of high-temperature quartz sand.

2. The high temperature gasification quartz sand flow control device of claim 1, wherein: The gasification pipe (11) is a cylindrical quartz glass pipe with a feeding pipe arranged at the top center and a discharging pipe arranged at the bottom center, the gasification pipe (11) is provided with an air inlet pipe and an air outlet pipe, and the heating device (12) is a high-temperature electric furnace arranged outside the gasification pipe (11).

3. The high temperature gasification quartz sand flow control device of claim 2, wherein: The outer sleeve (2) is a quartz glass pipe with the same diameter as the gasification pipe (11) and sleeved on the lower part of the gasification pipe (11), and the discharging pipe of the gasification pipe (11) is located in the outer sleeve (2).

4. The high temperature gasification quartz sand flow control device of claim 3, wherein: The gate valve bottom plate (311) is a rectangular quartz glass plate, horizontally arranged below the discharge pipe of the gasification pipe (11), and the narrow side of the rectangle is larger than the diameter of the discharge pipe of the gasification pipe (11); the gate valve side plate (312) is a quartz glass plate vertically arranged on both sides of the long side of the gate valve bottom plate (311), the bottom end of the gate valve side plate (312) is connected with the gate valve bottom plate (311), and the upper end is connected with the gate valve hanging plate (313); the gate valve hanging plate (313) is a narrow strip-shaped quartz glass sheet horizontally arranged inside the gate valve side plate (312), and one side of the long side of the gate valve hanging plate (313) is connected with the upper end of the gate valve side plate (312); the push-pull rod (314) is a quartz glass rod, which is parallel to the long side of the gate valve bottom plate (311), one end of the push-pull rod (314) is connected with the center of the narrow side of the gate valve bottom plate (311), and the other end extends to the outside of the outer sleeve pipe (2) and is connected with the handle (315); the handle (315) is a cross-shaped rod made of a quartz glass rod or a circular plate made of a quartz glass plate, and the center of the cross-shaped rod or the circular plate is connected with the push-pull rod (314).

5. The high temperature gasification quartz sand flow control device of claim 4, wherein: The support plate (32) is a rectangular quartz glass plate as a whole, horizontally arranged on the discharge pipe of the gasification pipe (11), the height of the support plate (32) arranged on the discharge pipe is subject to the height of the gate valve side plate (312), so that the gate valve with a push-pull rod (31) can be hung on the support plate (32) through the gate valve hanging plate (313), and there is a certain gap between the gate valve bottom plate (311) and the lower end of the discharge pipe of the gasification pipe (11), the width of the support plate (32) is subject to the width of the gate valve bottom plate (311), so that the gate valve with a push-pull rod (31) can be hung on the support plate (32) through the gate valve hanging plate (313), and the discharge pipe of the gasification pipe (11) is located between the two gate valve side plates (312), the length of the support plate (32) is greater than twice the length of the gate valve bottom plate (311), and a certain height of the baffle is vertically arranged on both narrow sides of the support plate (32), the gas sealing device (33) comprises a gas sealing pipe (331) and an air inlet pipe (332), the gas sealing pipe (331) is parallelly sleeved on the push-pull rod (314), one end of the gas sealing pipe (331) is open and penetrates into the outer sleeve pipe (2), the gas sealing pipe (331) is connected with the outer sleeve pipe (2), the other end is outside the outer sleeve pipe (2) and is partially blocked by a quartz glass sheet, a circular hole larger than the diameter of the push-pull rod (314) is opened at a position deviated upward from the center of the blocking quartz glass sheet, so that there is a gap between the push-pull rod (314) and the glass sheet when the push-pull rod (314) penetrates through the blocking glass sheet, the air inlet pipe (332) is connected with the gas sealing pipe (331) outside the outer sleeve pipe (2) to provide purified gas for the gas sealing of the gas sealing pipe (331).