Chemical vapor deposition equipment

Abstract

The utility model discloses chemical vapor deposition equipment, and relates to the technical field of silicon carbide chemical vapor deposition, the chemical vapor deposition equipment comprises precipitation equipment and a placing rack, the interior of the precipitation equipment is rotatably connected with a first rotating shaft, the bottom of the precipitation equipment is fixedly provided with a first motor, and the output end of the first motor is fixedly connected with one end of the first rotating shaft; the storage rack has the advantages that the rack moves to drive the limiting block on one side to move, so that the limiting block is clamped into the limiting groove, the limiting work of the clamping block is completed, and the storage rack is convenient to use. Therefore, the placing frame can be dismounted and mounted according to conditions, dismounting and mounting are convenient, the first motor is used for driving the clamping block to rotate, the placing frame can be driven to rotate, the placing frame is uniformly distributed, gas can be uniformly distributed in input precipitation equipment through the flow dividing pipe, and the deposition efficiency is improved.

Description

Technical Field

[0001] This utility model relates to the field of silicon carbide chemical vapor deposition technology, specifically a chemical vapor deposition device. Background Technology

[0002] Chemical vapor deposition (CVD) is one of the main methods for preparing carbon-coated composite materials. It involves introducing carbon source gases such as hydrocarbons into a deposition furnace, where the carbon source gases undergo pyrolysis at high temperatures. The resulting pyrolytic carbon is deposited on the surface of the material to be coated, ultimately forming a coating layer on the surface of the material, thus obtaining a carbon-coated composite material. It has the advantages of simple process and suitability for large-scale production.

[0003] According to application number CN202320458158.8, a silicon carbide chemical vapor deposition (CVD) apparatus is proposed, including a deposition device. The deposition device includes a mounting frame, a deposition tank, a gas supply pipe, a regulating valve, a placement stage, an electric heating device, a sealing cap, a motor, a transmission rod, a conduit, and a branch pipe. During deposition, this CVD apparatus uses a motor to drive the transmission rod to rotate, thereby rotating the substrate placed in the placement tank on the placement stage, ensuring uniform surface distribution. However, this application heats the solid material on the placement stage, and the high-temperature treatment can cause material deformation and breakage due to different material stresses. The debris generated from the material breakage remains on the placement stage. Since the placement stage cannot be disassembled and cleaned as needed, the retained debris affects subsequent experiments, leading to inaccurate experimental data. Therefore, we propose a CVD apparatus. Utility Model Content

[0004] To address the shortcomings of existing technologies, this invention provides a chemical vapor deposition apparatus that solves the problems mentioned in the background section.

[0005] To achieve the above objectives, this utility model provides the following technical solution: a chemical vapor deposition (CVD) apparatus, comprising a precipitation device and a placement rack. The precipitation device is internally connected to a first rotating shaft. A first motor is fixedly installed at the bottom of the precipitation device. The output end of the first motor is fixedly connected to one end of the first rotating shaft. A locking block is fixedly installed at the top of the first rotating shaft. The placement rack has a locking groove at its bottom, which is adapted to the locking block. A limiting groove is provided inside the placement rack. A second rotating shaft is internally connected to the locking block. A gear is fixedly sleeved on the outer side of the second rotating shaft. A sliding groove is provided inside the locking block. A slider is slidably connected inside the sliding groove. A rack is fixedly installed on one side of the slider. A limiting block is fixedly connected to one end of the rack, and the rack meshes with the gear.

[0006] Preferably, a worm gear is fixedly sleeved on the outer side of the second rotating shaft, an installation groove is provided inside the clamping block, a second motor is fixedly installed on one side of the clamping block, and a worm is fixedly connected to the output end of the second motor, the worm meshing with the worm gear.

[0007] Preferably, an electric heating device is fixedly installed inside the sedimentation equipment.

[0008] Preferably, support frames are fixedly installed on both sides of the sedimentation device, a sealing cover is provided on the top of the sedimentation device, a gas supply pipe is fixedly installed on the top of the sealing cover, and a regulating valve is provided on the top of the gas supply pipe.

[0009] Preferably, a connecting pipe is fixedly installed at the bottom of the sealing cap, one end of the connecting pipe is fixedly connected to one end of the gas supply pipe, and a diversion pipe is connected to the outside of the connecting pipe.

[0010] This invention provides a chemical vapor deposition apparatus, which has the following advantages:

[0011] This chemical vapor deposition (CVD) equipment connects the card block and the placement frame by fitting the card block into the card slot. A second motor drives a worm gear to rotate, which in turn drives a worm wheel. The worm wheel's rotation drives a second rotating shaft, which in turn drives a gear. The gear's rotation meshes with a rack, causing the rack to move and simultaneously moving a slider within a groove. The rack's movement moves a limiting block on one side, causing it to engage with a limiting groove, thus limiting the card block's position. This allows for easy disassembly and installation of the placement frame. The first motor drives the card block to rotate, which in turn rotates the placement frame, distributing the gas evenly. A distribution pipe ensures even gas distribution within the deposition equipment, improving deposition efficiency. Attached Figure Description

[0012] Figure 1 This is a schematic diagram of the structure of this utility model;

[0013] Figure 2 This utility model Figure 1 Enlarged view of point A in the image;

[0014] Figure 3 This is a first top view of the card block of this utility model;

[0015] Figure 4 This is a second top view of the card block of this utility model.

[0016] In the diagram: 1. Sedimentation equipment; 2. Support frame; 3. First motor; 4. First rotating shaft; 5. Placement rack; 6. Electric heating device; 7. Sealing cover; 8. Connecting pipe; 9. Diverter pipe; 10. Gas supply pipe; 11. Regulating valve; 12. Gear; 14. Rack; 15. Slot; 16. Limiting slot; 17. Limiting block; 18. Locking block; 19. Mounting slot; 20. Worm gear; 21. Worm wheel; 22. Slider; 23. Slide groove; 24. Second rotating shaft; 25. Second motor. Detailed Implementation

[0017] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present utility model. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments.

[0018] Example 1:

[0019] Please see Figures 1 to 4This utility model provides a technical solution: a chemical vapor deposition (CVD) apparatus, including a precipitation device 1 and a placement rack 5. A first rotating shaft 4 is rotatably connected inside the precipitation device 1. A first motor 3 is fixedly installed at the bottom of the precipitation device 1. The output end of the first motor 3 is fixedly connected to one end of the first rotating shaft 4. A locking block 18 is fixedly installed at the top of the first rotating shaft 4. The first motor 3 drives the locking block 18 to rotate, which in turn drives the placement rack 5 to rotate, distributing the gas evenly. A distribution pipe 9 allows for uniform gas distribution within the precipitation device 1, improving deposition efficiency. A slot 15 is provided at the bottom of the placement rack 5. The slot 15 is adapted to the block 18. By adapting the block 18 to the slot 15, the connection between the block 18 and the placement rack 5 is completed. The placement rack 5 has a limiting groove 16 inside. The block 18 is rotatably connected to a second rotating shaft 24. The rack 14 moves to drive the limiting block 17 on one side to move, so that it is engaged in the limiting groove 16, thus completing the limiting work of the block 18. This allows the placement rack 5 to be disassembled and installed as needed, making disassembly and installation convenient. A gear 12 is fixedly sleeved on the outside of the second rotating shaft 24. The block 18 has a sliding groove 23 inside, and the sliding groove 23 is slidably connected inside. A slider 22 is provided, which drives a worm gear 20 to rotate via a second motor 25. The rotation of the worm gear 20 and the worm wheel 21 are related to the rotation of the worm wheel 21. A rack 14 is fixedly installed on one side of the slider 22, and a limit block 17 is fixedly connected to one end of the rack 14. The rack 14 meshes with a gear 12. A worm wheel 21 is fixedly sleeved on the outer side of a second rotating shaft 24. A mounting groove 19 is provided inside a locking block 18. A second motor 25 is fixedly installed on one side of the locking block 18, and a worm gear 20 is fixedly connected to the output end of the second motor 25. The worm gear 20 meshes with the worm wheel 21, and the rotation of the worm wheel 21 drives the second rotating shaft 24 to rotate. The rotation drives the gear 12 to rotate, and the rotation of the gear 12 meshes with the rack 14, causing the rack 14 to move. At the same time, it drives the slider 22 to slide inside the slide groove 23. An electric heating device 6 is fixedly installed inside the sedimentation equipment 1. Support frames 2 are fixedly installed on both sides of the sedimentation equipment 1. A sealing cover 7 is provided on the top of the sedimentation equipment 1. A gas supply pipe 10 is fixedly installed on the top of the sealing cover 7. A regulating valve 11 is provided on the top of the gas supply pipe 10. A connecting pipe 8 is fixedly installed at the bottom of the sealing cover 7. One end of the connecting pipe 8 is fixedly connected to one end of the gas supply pipe 10. A diversion pipe 9 is connected to the outside of the connecting pipe 8.

[0020] In summary, when using this chemical vapor deposition equipment, firstly, the locking block 18 is inserted into the locking slot 15. After insertion, the second motor 25 is started to drive the worm gear 20 to rotate. The rotation of the worm gear 20 meshes with and drives the worm wheel 21 to rotate. The rotation of the worm wheel 21 drives the second rotating shaft 24 to rotate. The rotation of the second rotating shaft 24 drives the gear 12 to rotate. The rotation of the gear 12 meshes with the rack 14, causing the rack 14 to move. At the same time, it causes the slider 22 to slide inside the sliding groove 23. The movement of the rack 14 causes the limiting block 17 on one side to move and engage with the limiting groove. Inside 16, the limiting work of the card block 18 is completed. After the limiting is completed, the substrate is placed in the inner cavity of the placement rack 5, and then the sealing cover 7 is covered. The reaction gas is delivered to the distribution pipe 9 through the gas supply pipe 10 and the connecting pipe 8 to complete the distribution work. When the distribution work is in progress, the first motor 3 is started to drive the first rotating shaft 4 to rotate. The rotation of the first rotating shaft 4 drives the placement rack 5 to rotate, completing the rotation distribution work. The reaction gas reacts with the substrate surface to form a solid deposit. At the same time, the gaseous byproducts generated are removed from the substrate surface, completing the gas phase deposition work.

[0021] The above description is only a preferred embodiment of the present utility model, but the protection scope of the present utility model is not limited thereto. Any equivalent substitutions or changes made by those skilled in the art within the technical scope disclosed in the present utility model, based on the technical solution and the inventive concept of the present utility model, should be included within the protection scope of the present utility model.

Claims

1. A chemical vapor deposition apparatus, comprising a precipitation device (1) and a placement rack (5), characterized in that: The sedimentation device (1) is internally connected to a first rotating shaft (4). A first motor (3) is fixedly installed at the bottom of the sedimentation device (1). The output end of the first motor (3) is fixedly connected to one end of the first rotating shaft (4). A locking block (18) is fixedly installed at the top of the first rotating shaft (4). A slot (15) is provided at the bottom of the placement rack (5). The slot (15) is adapted to the locking block (18). A limiting groove (16) is provided inside the placement rack (5). A second rotating shaft (24) is internally connected to the locking block (18). A gear (12) is fixedly sleeved on the outside of the second rotating shaft (24). A sliding groove (23) is provided inside the locking block (18). A slider (22) is slidably connected inside the sliding groove (23). A rack (14) is fixedly installed on one side of the slider (22). A limiting block (17) is fixedly connected to one end of the rack (14). The rack (14) meshes with the gear (12).

2. The chemical vapor deposition apparatus according to claim 1, characterized in that: A worm gear (21) is fixedly sleeved on the outer side of the second rotating shaft (24). An installation groove (19) is opened inside the clamping block (18). A second motor (25) is fixedly installed on one side of the clamping block (18). A worm (20) is fixedly connected to the output end of the second motor (25). The worm (20) meshes with the worm gear (21).

3. The chemical vapor deposition apparatus according to claim 1, characterized in that: An electric heating device (6) is fixedly installed inside the sedimentation equipment (1).

4. The chemical vapor deposition apparatus according to claim 1, characterized in that: The sedimentation device (1) is fixedly installed with support frames (2) on both sides. The sedimentation device (1) is provided with a sealing cover (7) on the top. A gas supply pipe (10) is fixedly installed on the top of the sealing cover (7). A regulating valve (11) is provided on the top of the gas supply pipe (10).

5. A chemical vapor deposition apparatus according to claim 4, characterized in that: A connecting pipe (8) is fixedly installed at the bottom of the sealing cap (7). One end of the connecting pipe (8) is fixedly connected to one end of the gas transmission pipe (10). A diversion pipe (9) is connected to the outside of the connecting pipe (8).

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