Filter and chemical vapor deposition equipment

Abstract

The utility model provides a filter and chemical vapor deposition equipment, including body and filter element, the interior of body is the hollow chamber, filter element is provided in the hollow chamber, the interior of body is divided into unfiltered area and filtered area; an air inlet and an air outlet are formed in the body, the air inlet is communicated with the unfiltered area, and the air outlet is communicated with the filtered area; the cooling device is arranged on the periphery of the body and is used for cooling the body. The filter can continuously and effectively cool the body through the cooling device carefully arranged on the periphery of the filter. By means of the design, condensation and collection of by-products in tail gas are remarkably promoted, it is ensured that the by-products are efficiently intercepted in the filter, the by-products are effectively prevented from further entering a follow-up treatment device, and therefore smooth proceeding of the chemical vapor deposition process is ensured.

Description

TECHNICAL FIELD

[0001] The utility model belongs to chemical vapor deposition technical field especially relates to a filter and chemical vapor deposition equipment. BACKGROUND

[0002] In the field of semiconductor manufacturing process, silicon carbide (SiC) has become the preferred material for manufacturing parts of some process equipment due to its excellent performance. Chemical vapor deposition (CVD) technology, as one of the key means for preparing silicon carbide, is particularly valued by the industry, among which methyltrichlorosilane (MTS) is a commonly used core raw material. In order to ensure the smoothness of the production process, a filter is usually equipped between the deposition chamber and the vacuum system. The core function of the filter is to effectively intercept dust particles in the tail gas, thereby preventing the blockage of the downstream pipeline and significantly reducing the risk of failure of the vacuum system and the tail gas treatment device caused by dust accumulation.

[0003] However, the existing filter lacks an effective cooling mechanism. During the CVD reaction process, the temperature in the reaction chamber is often as high as 1200℃ or above, and the filter is therefore exposed to an extremely high temperature environment. Under such extreme conditions, by-product silicon chloride (SiCl X ) may have penetrated the filter in a gaseous state and entered the subsequent processing device. As the temperature gradually decreases, these gaseous by-products will condense into a liquid state and remain inside the subsequent vacuum system and tail gas treatment device, thereby interfering with their normal operation. After the reaction is completed, when the entire system cools down to room temperature and the filter is opened for filter core replacement, the residual liquid by-product SiCl X will chemically react with oxygen to produce SiO2 and Cl2. These two chemicals not only may further damage the vacuum system and the tail gas treatment device, but also may pose a serious threat to the health of on-site personnel. SUMMARY

[0004] To solve all or part of the problems of the prior art, the utility model provides a filter and chemical vapor deposition equipment, which continuously cools the body by configuring a cooling device around the filter body, promotes the condensation and collection of by-products in the tail gas, and significantly reduces the risk of by-products accidentally entering the subsequent vacuum system and tail gas treatment device.

[0005] To achieve the above purpose, the utility model provides the following technical scheme:

[0006] A filter comprises a body and a filter core, the body is internally provided with a hollow chamber, the filter core is arranged in the hollow chamber, and the body is divided into an unfiltered area and a filtered area; the body is provided with an air inlet and an air outlet, the air inlet is communicated with the unfiltered area, and the air outlet is communicated with the filtered area; the filter further comprises a cooling device, and the cooling device is arranged on the periphery of the body to cool the body.

[0007] The body is further internally provided with a collection chamber located below the hollow chamber and communicated with the hollow chamber, and the bottom of the collection chamber is provided with an external interface.

[0008] The collection chamber is provided with a temperature control meter, and the temperature control meter is connected with an external display through a signal line.

[0009] The external interface of the collection chamber is provided with an external valve, and the external valve is detachably connected with a collection container.

[0010] The cooling device comprises a cooling body filled with cooling liquid and a cooling liquid circulating system, the cooling body is mounted on the periphery of the body, and the cooling liquid circulating system drives the cooling liquid to circulate in the cooling body.

[0011] The hollow chamber in the body is a cylindrical structure, the filter core is a cylindrical metal filter core, and the collection chamber is a conical structure.

[0012] The air inlet is arranged at the top of the body, the air inlet is provided with an air inlet valve, the air outlet is arranged at the lower half area of the side of the body, and the air outlet is provided with an air outlet valve.

[0013] The utility model also discloses a chemical vapor deposition equipment, the equipment adopts the filter above, to carry out tail gas purification and processing in chemical vapor deposition process.

[0014] The equipment comprises a gas supply device, a reaction chamber, a filter, a vacuum system and a tail gas treatment device connected in sequence, the reaction chamber is used for carrying out a chemical vapor deposition reaction, the air inlet of the filter is connected with an exhaust pipeline of the reaction chamber, and the air outlet of the filter is connected with an air inlet pipeline of the vacuum system.

[0015] The equipment is suitable for the chemical vapor deposition preparation process of silicon carbide material.

[0016] The utility model has at least the following beneficial effects:

[0017] 1) By installing a cooling device on the periphery of the body, and equipped with a cooling liquid circulation system, the system can continuously drive the cooling liquid to circulate in the cooling body, so as to effectively cool the filter. This mechanism not only ensures that the filter can operate stably in high temperature environment, prevents performance degradation or safety hazards caused by high temperature, but also promotes the conversion of high temperature gaseous tail gas to liquid, and improves the efficiency of tail gas treatment.

[0018] 2) In the internal structure design of the filter, a conical collection chamber is specially arranged, which is closely connected with the hollow chamber to form a smooth tail gas flow path and by-product collection path. When the tail gas passes through the filter core for purification, the by-products are converted to liquid state by cooling treatment and are guided into the collection chamber. The collection chamber is equipped with a temperature control meter and is connected with an external display, so that the operator can obtain the temperature information in the chamber in real time, so as to accurately judge the state of the by-products.

[0019] 3) An external valve and a quick connector are arranged at the external interface of the collection chamber, which enables the collection container to be conveniently and quickly connected with the filter in a detachable manner, realizing the rapid and leakage-free transfer of by-products. This innovation not only greatly simplifies the collection and treatment process of by-products and reduces the risk of environmental pollution, but also provides great convenience for the subsequent recycling of by-products, and promotes the green and efficient of the entire tail gas treatment process. BRIEF DESCRIPTION OF DRAWINGS

[0020] In order to more clearly illustrate the technical solutions in the specific embodiments of the present application, the drawings needed in the embodiment description will be briefly introduced. Obviously, the drawings described below are only some embodiments of the present application, and other drawings can be obtained by those skilled in the art without creating laborious work.

[0021] Figure 1 It is a sectional view of the filter in the side direction of the embodiment 1 of the present application.

[0022] Figure 2 It is a sectional view of the filter in the side direction of the embodiment 1 of the present application. Figure 1

[0023] Figure 3 It is a structural schematic view of the chemical vapor deposition equipment in the embodiment 2 of the present application.

[0024] The drawings show that: 1-body; 101-unfiltered area; 102-filtered area; 103-inlet valve; 104-exhaust valve; 2-filter core; 3-cooling device; 4-collection chamber; 401-external valve. DETAILED DESCRIPTION​

[0025] The technical solutions in the embodiments of the utility model will be described clearly and completely below. Obviously, the described embodiments are only a part of the embodiments of the utility model, rather than all the embodiments. Based on the embodiments in the utility model, all the other embodiments obtained by those skilled in the art without creative work belong to the protection scope of the utility model.

[0026] The implementation of the utility model will be described in detail below in combination with specific embodiments.

[0027] Embodiment 1

[0028] In the embodiments of the utility model, a filter is provided as shown in the combination of reference Figure 1 , 2 The filter mainly comprises a body 1 and a filter core 2 arranged inside the body 1. A hollow cylindrical chamber is designed inside the body 1, which is divided into two areas: an unfiltered area 101 and a filtered area 102 by the built-in filter core 2. An air inlet is designed at the top position of the body 1, which is connected with the unfiltered area 101 and used to introduce the gas to be filtered into the filter, and an air inlet valve 103 is arranged at the air inlet. An air outlet is arranged at the lower half area of the side surface of the body 1, which is connected with the filtered area 102 to ensure that the gas purified by the filter core 2 can be smoothly discharged, and an exhaust valve 104 is also arranged at the air outlet. In this embodiment, the filter core 2 is made of high-quality high-temperature-resistant cylindrical metal material, which not only ensures that the filter can maintain high filtering performance, but also greatly prolongs the service life; in other embodiments, it can be flexibly selected according to the needs of specific application scenarios.

[0029] The filter also introduces a cooling device 3, which is installed on the periphery of the body 1. The cooling device 3 comprises a cooling body filled with cooling liquid and a cooling liquid circulating system connected therewith. The cooling liquid circulating system is used to drive the cooling liquid to continuously and efficiently circulate in the cooling body, so as to continuously and effectively cool the filter body 1 and the filtered gas inside. The cooling liquid circulating system can adopt a cooling tower or a compressor as the driving core.

[0030] The filter body 1 is further provided with a collection chamber 4 located below the hollow chamber and communicating with the hollow chamber. The bottom of the collection chamber 4 is provided with an external interface for facilitating connection with an external collection container. In order to monitor the temperature in the collection chamber 4 in real time, a temperature control meter is further arranged in the collection chamber 4 and connected with an external display through a signal line, so that the operator can grasp the temperature change in the collection chamber 4 at any time. Meanwhile, an external valve 401 and a quick connector are specially arranged at the external interface of the collection chamber 4, and through the valve and the quick connector, the collection chamber 4 can be quickly and reliably connected with the collection container, thereby facilitating the collection and treatment of impurities or pollutants generated in the filtering process. In the embodiment, the collection chamber 4 adopts a conical structure design, which is not only beneficial to the deposition and collection of impurities, but also facilitates the subsequent cleaning and maintenance work.

[0031] Embodiment 2

[0032] The utility model discloses still provide a kind of chemical vapor deposition equipment, the equipment is specially integrated above-mentioned filter, aims at efficiently performing tail gas purification and processing task in chemical vapor deposition (CVD) process, especially applicable to the preparation process of silicon carbide (SiC) material.

[0033] In the embodiment, the device uses CVD method to prepare SiC, uses methyltrichlorosilane (MTS) as main raw material, introduces hydrogen (H2) as reaction gas and carrier gas, and argon (Ar) as dilution gas, which not only effectively reduces the security risk, but also realizes the precise control of deposition rate.

[0034] The process of preparing SiC by CVD method is relatively complex, and the total reaction formula can be written as follows:

[0035]

[0036] Among them, MTS mainly occurs pyrolysis reaction at high temperature, and decomposes to generate free radicals such as CH3 * , SiCl3 * , etc. These free radicals subsequently undergo a series of chemical reactions with reducing gas H2, and finally gradually deposit on the surface of graphite substrate to form SiC. This series of complex chemical reactions can be refined as follows:

[0037]

[0038] SiCl2+H2——→ <si>+ HCI

[0039] <c> + <si>→ SiC

[0040] As shown in Figure 3 , the device designs a complete process flow system, including sequentially connected gas supply device, reaction chamber, filter, vacuum system and tail gas treatment device. Among them, the reaction chamber is the core area of chemical vapor deposition reaction, responsible for the preparation of SiC material. The gas inlet of the filter is closely connected with the exhaust pipeline of the reaction chamber, to ensure that the tail gas can smoothly enter the filter system for purification treatment. The gas outlet of the filter is connected with the gas inlet pipeline of the vacuum system, and the purified tail gas is discharged from the device through the suction of the vacuum system. The function of the filter is to prevent the products and by-products produced by the reaction from entering the vacuum system and the tail gas treatment device, so as to avoid the abnormality of the vacuum system and the tail gas treatment device or the need to spend more cost for cleaning.

[0041] In the device, by-product silicon chloride (SiCl X ) will be produced in the CVD reaction process, which is in gaseous state at high temperature. When these gaseous by-products flow through the filter, the integrated cooling device 3 can effectively reduce the temperature of the tail gas, so that SiCl X is converted from gaseous state to liquid state and smoothly introduced into the collection chamber 4 for centralized collection. After the reaction is completed, in order to ensure the safety of operation and the collection efficiency, first, the gas inlet valve 103 of the filter is closed, so as to cut off the connection channel between the reaction chamber and the filter. Then, by increasing the flow of the cooling liquid in the cooling device 3, the system cooling process is accelerated, until the temperature of the collection chamber 4 is stably reduced to below 57℃. At this time, the gas inlet valve 103 of the filter is reopened, and inert gas (such as argon Ar or nitrogen N2) is filled into the system until the overall gas pressure reaches the normal pressure state. After the gas pressure balance is completed, the gas inlet valve 103 and the exhaust valve 104 of the filter are closed again, to ensure that the system is in a closed and safe state. In order to efficiently and safely collect liquid SiCl X , a disposable container with a quick connector and a closing valve is used, and the liquid SiCl X is transferred without leakage through the external valve 401 connected to the collection chamber 4. After the SiCl X liquid is completely introduced into the container, the valves at both ends of the container are quickly closed to ensure the safety and integrity of the collection process.

[0042] The utility model innovatively provides a filter equipped with a cooling device 3 and a collection chamber 4, which significantly reduces the risk of gaseous by-product SiCl X accidentally entering the vacuum system and the tail gas treatment device during the chemical vapor deposition (CVD) reaction process. After the reaction is completed, through the designed cooling step and efficient collection mechanism, SiCl X react with oxygen in the air to generate silicon dioxide (SiO2) and chlorine (Cl2) which can cause damage to operators and equipment, and also greatly facilitate the collection of environmentally unfriendly SiCl X (especially SiCl2) substances. This improvement not only improves the operation safety and reduces the risk of environmental pollution, but also greatly facilitates the subsequent by-product treatment, realizes the overall optimization and control from the source to the terminal.

[0043] It should be pointed out that for those skilled in the art, without departing from the principles of the present application, the present application can be improved and modified in several ways, and these improvements and modifications also fall within the scope of the present application.< / si> < / c> < / si>

Claims

1. A filter, characterized by, The filter includes a body (1) and a filter core (2), the body (1) is internally provided with a hollow cavity, the filter core (2) is arranged in the hollow cavity, and the body (1) is divided into an unfiltered area (101) and a filtered area (102) by the filter core (2); the body (1) is provided with an air inlet and an air outlet, the air inlet is communicated with the unfiltered area (101), and the air outlet is communicated with the filtered area (102); and the filter further includes a cooling device (3) arranged on the periphery of the body (1) and used for cooling the body (1).

2. The filter of claim 1, wherein, The body (1) is further provided with a collection cavity (4) arranged below the hollow cavity and communicated with the hollow cavity, and the bottom of the collection cavity is provided with an external interface.

3. The filter of claim 2, wherein, The collection cavity (4) is provided with a temperature control meter, and the temperature control meter is connected with an external display through a signal line.

4. The filter of claim 2, wherein, The external interface of the collection cavity (4) is provided with an external valve (401), and the collection cavity (4) is detachably connected with a collection container through the external valve (401).

5. The filter of claim 1, wherein, The cooling device (3) includes a cooling body filled with cooling liquid and a cooling liquid circulating system, the cooling body is arranged on the periphery of the body (1), and the cooling liquid circulating system drives the cooling liquid to circulate in the cooling body.

6. The filter of claim 2, wherein, The hollow cavity in the body (1) is in a cylindrical structure, and the filter core (2) is a cylindrical metal filter core; and the collection cavity (4) is in a conical structure.

7. The filter of claim 1, wherein, The air inlet is arranged at the top of the body (1), and the air inlet is provided with an air inlet valve (103); and the air outlet is arranged at the lower half of the side of the body (1), and the air outlet is provided with an air outlet valve (104).

8. A chemical vapor deposition apparatus characterized by comprising: The device adopts the filter according to any one of claims 1-7 to perform tail gas purification and treatment in a chemical vapor deposition process.

9. The apparatus of claim 8, wherein, The device includes a gas supply device, a reaction cavity, a filter, a vacuum system and a tail gas treatment device connected in sequence, the reaction cavity is used for performing a chemical vapor deposition reaction, the air inlet of the filter is connected with an exhaust pipeline of the reaction cavity, and the air outlet of the filter is connected with an air inlet pipeline of the vacuum system.

10. The apparatus of claim 8, wherein, The device is suitable for a chemical vapor deposition preparation process of silicon carbide material.

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