Processing equipment for high-precision large-size gallium nitride single crystal substrate

Abstract

The utility model relates to the technical field of gallium nitride single crystal substrate processing, in particular to processing equipment for a high-precision large-size gallium nitride single crystal substrate, which comprises a base, a lifting platform and a sand grinding disc, the upper side of the base is in sliding connection with the lifting platform, and the upper side of the base is in sliding connection with the sand grinding disc; a fixing structure is installed on the base and comprises a double-shaft motor fixedly installed on the lower side of the base. The double-shaft motor drives the fixing structure to fix a gallium nitride single crystal, the situation that the gallium nitride single crystal is broken due to handheld machining in the machining process is avoided, manual work is not needed, the workload of workers is greatly reduced, the double-shaft motor drives the cleaning structure to clean the workbench, and the machining efficiency is improved. The problem that gaps in the upper side of the workbench are small and difficult to clean is solved, the step of manual cleaning is omitted, and manpower consumption is reduced.

Description

TECHNICAL FIELD

[0001] The utility model relates to gallium nitride single crystal substrate processing technical field especially relates to a kind of processing equipment of high-precision large-size gallium nitride single crystal substrate. BACKGROUND

[0002] Gallium nitride single crystal substrate is the important base of new generation wide band gap semiconductor material, with high thermal conductivity, wide band gap, support high electric field intensity, high voltage resistance, power advantage, has wide application prospect in electronic device, optoelectronic device, communication system etc., the wide band gap characteristics of gallium nitride determines its performance in high voltage and high frequency application far exceeds traditional semiconductor material;

[0003] At present, gallium nitride single crystal substrate is only taken by manual grinding when processing, due to manual operation, there is a little deviation when single crystal substrate is processed, and gallium nitride single crystal substrate is not symmetrical and fragile, so it must be particularly careful when processing, and gallium nitride debris will fall to the ground in the processing process, difficult to clean and clean, and too much accumulation can affect the processing of new gallium nitride single crystal substrate. UTILITY MODEL CONTENT

[0004] In order to realize the above-mentioned purpose, the utility model adopts the following technical scheme:

[0005] A kind of processing equipment of high-precision large-size gallium nitride single crystal substrate, comprising:

[0006] Base, the base upper side is slidably connected with lifting platform, the base upper side is slidably connected with sanding disc;

[0007] Fixed structure is installed on the base, the fixed structure includes double-shaft motor fixedly installed on the lower side of base, the output shaft of double-shaft motor is fixedly installed with driving shaft one, the sidewall of base is rotatably connected with double-way screw rod, the double-way screw rod and the outer side of driving shaft one are all fixedly sleeved with bevel gear one, and the bevel gear one is meshed with each other, the outer side of double-way screw rod is threadedly connected with upper slide plate and lower slide plate, the side wall of upper slide plate is fixedly connected with fixed plate, the sidewall of fixed plate is fixedly connected with control motor, the output end of control motor is fixedly connected with rotating shaft, the outer side of rotating shaft is fixedly connected with clamping plate one, the sidewall of clamping plate one is slidably connected with multiple pressing blocks, multiple pressing blocks and clamping plate one are fixedly connected with spring, the lower slide plate is fixedly connected with lifting platform, the sidewall of lifting platform is rotatably connected with clamping plate two, clamping plate one and clamping plate two are matched.

[0008] Preferably, a cleaning structure is mounted on the base, the cleaning structure comprising a driving shaft two fixedly mounted on the other output shaft of the double-shaft motor, a rotating shaft rotatably connected to the side wall of the base, a bevel gear two fixedly sleeved with the outer sides of the driving shaft two, and the bevel gears two are in mesh with each other, a rotating disc fixedly connected to one end of the rotating shaft, a rotating rod fixedly connected to the upper side of the rotating disc, a connecting plate slidably connected in the base, a slide rail fixedly connected to the side wall of the connecting plate, the slide rail being matched with the rotating rod, and a cleaning plate fixedly connected to one end of the connecting plate.

[0009] Preferably, a top plate is fixedly connected to the upper side of the base, and a plurality of illuminating lamps are fixedly mounted on the lower side of the top plate.

[0010] Preferably, a support plate is fixedly connected to the upper side of the base, a sleeve ring is rotatably connected to the side wall of the support plate, and a knob is fixedly connected to the side wall of the sleeve ring.

[0011] Preferably, a blowing box is fixedly mounted on the upper side of the base.

[0012] Preferably, a plurality of support columns are fixedly connected to the lower side of the base.

[0013] Compared with the prior art, the device has the advantages that:

[0014] 1. In the device, the double-shaft motor drives the fixing structure to fix the gallium nitride single crystal, the size of the single crystal can be controlled by adjusting the position of the sanding disc during the machining process, the single crystal is prevented from being broken due to manual machining in the machining process by mechanical all-around fixing, manual work is no longer needed, and the work amount of the staff is greatly reduced. The device greatly reduces the cost consumption due to the difficulty in growing the gallium nitride.

[0015] 2. In the device, the double-shaft motor drives the cleaning structure to clean the workbench, the problem that the upper side gap of the workbench is small and difficult to clean is solved, the single crystal powder or fragments left on the upper side of the lifting platform are also cleaned by cooperating with the blowing of the blowing box, the single crystal is prevented from being extruded during the fixing process to cause damage to the single crystal substrate, the step of manual cleaning is eliminated, and the consumption of manpower is reduced. BRIEF DESCRIPTION OF DRAWINGS

[0016] Figure 1 A perspective view of the device is shown in the drawings.

[0017] Figure 2 A perspective view of the device is shown in the drawings.

[0018] Figure 3The utility model provides a kind of high-precision large-size gallium nitride single crystal substrate's processing equipment's fixed structure schematic diagram;

[0019] Figure 4 The utility model provides a kind of high-precision large-size gallium nitride single crystal substrate's processing equipment's clamping plate one and clamping plate two's stereoscopic structure schematic diagram;

[0020] Figure 5 The utility model provides a kind of high-precision large-size gallium nitride single crystal substrate's processing equipment's cleaning structure schematic diagram.

[0021] In the drawing: 1 base, 2 support column, 3 lifting platform, 4 sanding disc, 5 double-shaft motor, 6 drive shaft one, 7 bidirectional screw rod, 8 bevel gear one, 9 upper slide plate, 10 lower slide plate, 11 rotating shaft, 12 clamping plate one, 13 pressing block, 14 spring, 15 clamping plate two, 16 drive shaft two, 17 rotating shaft, 18 bevel gear two, 19 rotating disc, 20 rotating rod, 21 connecting plate, 22 slide rail, 23 cleaning plate, 24 top plate, 25 illuminating lamp, 26 support plate, 27 sleeve ring, 28 knob, 29 blow box, 30 control motor. DETAILED DESCRIPTION

[0022] REFERENCE Figures 1-5 A kind of high-precision large-size gallium nitride single crystal substrate's processing equipment, comprising:

[0023] Base 1, multiple support columns 2 are fixedly connected on the lower side of base 1, the support column 2 has supporting effect, top plate 24 is fixedly connected on the upper side of base 1, multiple illuminating lamps 25 are fixedly installed on the lower side of top plate 24, illuminating lamp 25 can play the role of illumination, so that it can be seen more clearly when working, lifting platform 3 is slidably connected on the upper side of base 1, sanding disc 4 is slidably connected on the upper side of base 1, support plate 26 is fixedly connected on the upper side of base 1, sleeve ring 27 is rotatably connected on the side wall of support plate 26, knob 28 is fixedly connected on the side wall of sleeve ring 27, water pipe is installed in sleeve ring 27, water pump is outside water pipe, cooling is carried out to sanding disc 4, blow box 29 is fixedly installed on the upper side of base 1, blower is connected to blow box 29, and the powder of polishing is blown away;

[0024] The base 1 is provided with a fixing structure, which comprises a double-shaft motor 5 fixedly installed on the lower side of the base 1, a driving shaft one 6 fixedly installed on the output shaft of the double-shaft motor 5, a bidirectional screw rod 7 rotatably connected to the side wall of the base 1, a bevel gear one 8 fixedly sleeved on the outer side of the driving shaft one 6 and the bidirectional screw rod 7, and mutually engaged between the bevel gear one 8, an upper sliding plate 9 and a lower sliding plate 10 threadedly connected to the outer side of the bidirectional screw rod 7, a fixed plate fixedly connected to the side wall of the upper sliding plate 9, a control motor 30 fixedly connected to the side wall of the fixed plate, a rotating shaft 11 fixedly connected to the output end of the control motor 30, a clamping plate one 12 fixedly connected to the outer side of the rotating shaft 11, a plurality of pressing blocks 13 slidably connected to the side wall of the clamping plate one 12, springs 14 fixedly connected between the plurality of pressing blocks 13 and the clamping plate one 12, the lower sliding plate 10 fixedly connected to the lifting platform 3, a clamping plate two 15 rotatably connected to the side wall of the lifting platform 3, and the clamping plate one 12 matched with the clamping plate two 15.

[0025] The base 1 is provided with a cleaning structure, which comprises a driving shaft two 16 fixedly installed on the other output shaft of the double-shaft motor 5, a rotating shaft 17 rotatably connected to the side wall of the base 1, a bevel gear two 18 fixedly sleeved on the outer side of the driving shaft two 16 and the rotating shaft 17, and mutually engaged between the bevel gear two 18, a rotating disc 19 fixedly connected to one end of the rotating shaft 17, a rotating rod 20 fixedly connected to the upper side of the rotating disc 19, a connecting plate 21 slidably connected in the base 1, a sliding rail 22 fixedly connected to the side wall of the connecting plate 21, the sliding rail 22 matched with the rotating rod 20, and a cleaning plate 23 fixedly connected to one end of the connecting plate 21.

[0026] The utility model discloses a first, the staff puts the need processing gallium nitride single crystal substrate into to the lifting platform 3, passes through opening double -shaft motor 5, double -shaft motor 5 drives driving shaft no.

Claims

1. A processing apparatus for high-precision large-size gallium nitride single crystal substrates, comprising a base (1), characterized in that, A lifting platform (3) is slidably connected to the upper side of the base (1), and a sanding disc (4) is slidably connected to the upper side of the base (1); A fixing structure is installed on the base (1). The fixing structure includes a dual-axis motor (5) fixedly installed on the lower side of the base (1). A drive shaft (6) is fixedly installed on the output shaft of the dual-axis motor (5). A bidirectional screw (7) is rotatably connected to the side wall of the base (1). The bidirectional screw (7) and the drive shaft (6) are both fixedly sleeved by bevel gears (8), and the bevel gears (8) mesh with each other. An upper slide plate (9) and a lower slide plate (10) are threadedly connected to the outer side of the bidirectional screw (7). A fixing plate is fixedly connected to the side wall of the upper slide plate (9). A control motor (30) is fixedly connected to the side wall of the fixed plate. A rotating shaft (11) is fixedly connected to the output end of the control motor (30). A clamping plate (12) is fixedly connected to the outside of the rotating shaft (11). Multiple pressure blocks (13) are slidably connected to the side wall of the clamping plate (12). A spring (14) is fixedly connected to the multiple pressure blocks (13) and the clamping plate (12). The sliding plate (10) is fixedly connected to the lifting platform (3). A clamping plate (15) is rotatably connected to the side wall of the lifting platform (3). The clamping plate (12) and the clamping plate (15) are matched.

2. The processing apparatus of a high-precision large-size gallium nitride single crystal substrate according to claim 1, characterized in that, A cleaning structure is installed on the base (1). The cleaning structure includes a second drive shaft (16) fixedly installed on the other output shaft of the dual-axis motor (5). A rotating shaft (17) is rotatably connected to the side wall of the base (1). A second bevel gear (18) is fixedly sleeved on the outer side of both the rotating shaft (17) and the second drive shaft (16), and the second bevel gear (18) meshes with each other. A turntable (19) is fixedly connected to one end of the rotating shaft (17). A rotating rod (20) is fixedly connected to the upper side of the turntable (19). A connecting plate (21) is slidably connected inside the base (1). A slide rail (22) is fixedly connected to the side wall of the connecting plate (21). The slide rail (22) matches the rotating rod (20). A cleaning plate (23) is fixedly connected to one end of the connecting plate (21).

3. The processing apparatus of claim 1, wherein the apparatus further comprises a substrate holder for holding the substrate, and a substrate heater for heating the substrate. A top plate (24) is fixedly connected to the upper side of the base (1), and multiple lighting lamps (25) are fixedly installed on the lower side of the top plate (24).

4. The processing apparatus of a high-precision large-size gallium nitride single crystal substrate according to claim 1, characterized in that, A support plate (26) is fixedly connected to the upper side of the base (1), and a collar (27) is rotatably connected to the side wall of the support plate (26). A knob (28) is fixedly connected to the side wall of the collar (27).

5. The processing apparatus of a high-precision large-size gallium nitride single crystal substrate according to claim 1, characterized in that, A blower box (29) is fixedly installed on the upper side of the base (1).

6. The processing apparatus of a high-precision large-size gallium nitride single crystal substrate according to claim 1, characterized in that, Multiple support pillars (2) are fixedly connected to the lower side of the base (1).

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