Gas supply device for semiconductor process equipment

Abstract

The utility model discloses an air supply device for semiconductor process equipment, which belongs to the technical field of semiconductor process and comprises an air supply pipe and an air delivery pipe, a flange is arranged at the joint of the air supply pipe and the air delivery pipe, a sleeve is fixedly sleeved on the outer side of the joint of the air supply pipe and the air delivery pipe, and a fixed table is fixedly mounted in the middle of the top end of the circumference of the sleeve. As the sleeve is located on the outer side of the joint of the gas supply pipe and the conveying pipe, if gas leakage occurs at the joint of the gas supply pipe and the conveying pipe, firstly, the pressure sensor can monitor the change of the internal pressure of the sleeve to enable the audible and visual alarm to give an alarm; meanwhile, the inert gas sensor can also monitor inert gas to enable the audible and visual alarm to give an alarm, double monitoring and judgment are performed on whether gas leakage occurs at the joint of the gas supply pipe and the conveying pipe or not, diffusion of leaked gas is effectively restrained through the two isolation pieces and the multiple springback reset rods, the leaked gas is effectively controlled in the sleeve, and the safety of the device is improved. And potential safety hazards of gas leakage to operators are reduced.

Description

TECHNICAL FIELD

[0001] The utility model relates to the technical field of semiconductor technology especially relates to a semiconductor technology equipment gas supply device. BACKGROUND

[0002] Semiconductors can be used as carriers of integrated circuits, and their manufacturing process includes many kinds of processing methods, including photosensitive agent coating, exposure, development, etching, and penetration, etc., to make components with multiple layers of circuits, and through detection and packaging, actual usable integrated circuit products are made. A variety of high-purity gases are needed in the semiconductor manufacturing process, and these gases play an important role in each process stage. For example, nitrogen is mainly used for purging stage to remove oxygen in machines and tools to prevent pollution; oxygen is used for growing silicon oxide layer and removing excess material in etching process; argon is used to protect silicon crystals from the influence of oxygen and nitrogen reaction during high-temperature growth. These gases have characteristics such as low temperature, corrosiveness or toxicity, which makes the design and installation of the gas distribution system very complex.

[0003] After searching, the patent with the patent publication number CN203573955U discloses a semiconductor process gas supply device, which solves the technical problem of not being able to completely remove oxygen from the process environment. By diffusing the filling gas from the axis of the nozzle to the outside of the cavity, the oxygen in the semiconductor processing space can be completely removed, and the semiconductor processing parts in the semiconductor processing space can be prevented from contacting oxygen to avoid failure of the heat treatment process of the semiconductor processing parts. Furthermore, the setting method of the utility model can achieve better diffusion uniformity effect. This effectively isolates the semiconductor processing parts from oxygen to improve the manufacturing yield; but there are still the following disadvantages that need to be solved: the gas supply device is directly connected with the semiconductor process equipment, and the gas leakage at the pipe connection cannot be detected and warned, which may cause potential harm to the safety of the operators. UTILITY MODEL CONTENT

[0004] The utility model aims at solving the shortcomings in the prior art and provides a semiconductor process equipment gas supply device.

[0005] In order to achieve the above-mentioned purpose, the utility model adopts the following technical scheme:

[0006] A gas supply device for semiconductor process equipment includes a gas supply pipe and a gas delivery pipe. A flange is provided at the connection between the gas supply pipe and the gas delivery pipe. A sleeve is fixedly sleeved on the outside of the connection between the gas supply pipe and the gas delivery pipe. A fixed platform is fixedly installed at the center of the top of the sleeve. A controller is fixedly installed at the center of the top of the fixed platform. An audible and visual alarm is fixedly installed at the center of the outer walls at both ends of the fixed platform. An inert gas sensor and a pressure sensor are fixedly installed on both sides of the top of the fixed platform, and a pressure gauge is fixedly installed on the top of the pressure sensor. Isolation components are slidably sleeved on the circumferences of both the gas supply pipe and the gas delivery pipe, and both isolation components are located inside the sleeve.

[0007] Preferably, sealing rings are fixedly fitted on both sides of the sleeve to the outer wall of the gas supply pipe and the outer wall of the gas delivery pipe.

[0008] Preferably, the sensing probes of both the inert gas sensor and the pressure sensor are located inside the sleeve.

[0009] Preferably, the isolation element is formed by a first sealing sleeve, a movable ring, and a second sealing sleeve fixedly connected together, and the widths of the first sealing sleeve and the second sealing sleeve are both greater than the width of the movable ring.

[0010] Preferably, multiple spring-loaded reset rods at equal angles are fixedly installed at an angle between the opposite ends of the two moving rings and the inner walls on both sides of the sleeve.

[0011] Preferably, the inner circumference of the first sealing sleeve is slidably fitted with the outer circumference of the gas supply pipe and the outer circumference of the gas transmission pipe, and the outer circumference of the second sealing sleeve is slidably installed with the inner circumference of the sleeve.

[0012] The beneficial effects of this utility model are as follows:

[0013] This invention discloses a gas supply device for semiconductor process equipment. A sleeve is located outside the connection between the gas supply pipe and the delivery pipe. A controller, an audible and visual alarm, an inert gas sensor, and a pressure sensor are fixedly installed on the top of a mounting platform. The sensing probes of the inert gas sensor and the pressure sensor are located inside the sleeve, as are two isolators. If there is a gas leak at the connection between the gas supply pipe and the delivery pipe, the pressure sensor will detect the pressure change inside the sleeve, triggering the audible and visual alarm. Simultaneously, the inert gas sensor will also detect the presence of inert gas, triggering the audible and visual alarm as well. This dual monitoring and judgment system ensures there is a gas leak at the connection between the gas supply pipe and the delivery pipe. Furthermore, the two isolators and multiple rebound reset rods effectively suppress the diffusion of leaked gas, effectively controlling the leaked gas within the sleeve and reducing the safety hazards to operators caused by gas leaks. Attached Figure Description

[0014] Figure 1 This is a schematic diagram of the structure of a gas supply device for semiconductor process equipment proposed in this utility model;

[0015] Figure 2 The utility model provides a kind of structure schematic diagram inside sleeve of semiconductor process equipment gas supply device set forth in the utility model;

[0016] Figure 3 The utility model provides a kind of structure schematic diagram of semiconductor process equipment gas supply device sleeve from below set forth in the utility model;

[0017] Figure 4 The utility model provides a kind of structure schematic diagram of semiconductor process equipment gas supply device isolator set forth in the utility model.

[0018] In the drawing: 1 gas supply pipe, 2 conveying pipe, 3 flange, 4 sleeve, 5 sealing ring, 6 fixed table, 7 controller, 8 audible and visual alarm, 9 inert gas sensor, 10 pressure sensor, 11 pressure gauge, 12 isolator, 13 rebound reset rod;

[0019] 121 first sealing sliding sleeve, 122 moving ring, 123 second sealing sliding sleeve. DETAILED DESCRIPTION

[0020] Refer to Figures 1-4 A kind of semiconductor process equipment gas supply device, including gas supply pipe 1 and gas conveying pipe 2, flange 3 is provided at the junction of gas supply pipe 1 and gas conveying pipe 2, sleeve 4 is fixedly sleeved outside the junction of gas supply pipe 1 and gas conveying pipe 2, and fixed table 6 is fixedly installed in the middle of the circumferential top end of sleeve 4, controller 7 is fixedly installed in the middle of the top end of fixed table 6, audible and visual alarm 8 is fixedly installed in the middle of the outer wall of the both ends of fixed table 6, inert gas sensor 9 and pressure sensor 10 are fixedly installed respectively on the both sides of the top end of fixed table 6, and pressure gauge 11 is fixedly installed on the top end of pressure sensor 10, isolator 12 is slidably sleeved with the circumference of gas supply pipe 1 and the circumference of gas conveying pipe 2, and the two isolators 12 are located inside sleeve 4.

[0021] In the utility model, the both sides of the circumference of sleeve 4 are fixedly sleeved with sealing ring 5 with the outer wall of the circumference of gas supply pipe 1 and the outer wall of the circumference of gas conveying pipe 2;

[0022] The sensing probe of inert gas sensor 9 and pressure sensor 10 is located inside sleeve 4;

[0023] Isolator 12 is fixedly connected by first sealing sliding sleeve 121, moving ring 122 and second sealing sliding sleeve 123, and the width of first sealing sliding sleeve 121 and second sealing sliding sleeve 123 is greater than the width of moving ring 122;

[0024] Multiple equal-angle rebound reset rods 13 are fixedly installed between the inner wall of the both sides of sleeve 4 and the opposite ends of the two moving rings 122;

[0025] The first sealing sliding sleeve 121 is slidably sleeved with the outer wall of the gas supply pipe 1 and the outer wall of the gas conveying pipe 2.

[0026] Working principle: the controller 7, the audible and light alarm 8, the inert gas sensor 9 and the pressure sensor 10 are fixedly installed on the top end of the fixed table 6, and the inert gas sensor 9 and the pressure sensor 10 are located inside the sleeve 4, and the two isolation pieces 12 are also located inside the sleeve 4. If there is gas leakage at the connection between the gas supply pipe 1 and the conveying pipe 2, the pressure sensor 10 can first monitor the change of the pressure inside the sleeve 4, so that the audible and light alarm 8 sends an alarm, and the inert gas sensor 9 can also monitor the inert gas, so that the audible and light alarm 8 sends an alarm. The double monitoring and judgment of whether there is gas leakage at the connection between the gas supply pipe 1 and the conveying pipe 2, and the two isolation pieces 12 and the multiple rebound reset rods 13 effectively inhibit the diffusion of the leaked gas, effectively control the leaked gas inside the sleeve 4, and reduce the safety hazards of the gas leakage to the operators.

[0027] The above is only a preferred specific embodiment of the present application, but the protection scope of the present application is not limited to this. Any person skilled in the art can make equivalent replacement or change according to the technical scheme and the inventive concept of the present application within the technical range disclosed by the present application, which should be covered in the protection scope of the present application.

Claims

1. A semiconductor process equipment gas supply device comprising a gas supply pipe (1) and a gas delivery pipe (2), a flange (3) being provided at the connection of the gas supply pipe (1) and the gas delivery pipe (2), characterized in that, The outer side of the connecting place of the gas supply pipe (1) and the gas delivery pipe (2) is fixedly sleeved with a sleeve (4), and the middle of the circumferential top end of the sleeve (4) is fixedly installed with a fixed table (6), the middle of the outer wall of both ends of the fixed table (6) is fixedly installed with an audible and visual alarm (8), the top end of the fixed table (6) is fixedly installed with a controller (7), and the top end of the fixed table (6) is fixedly installed with an inert gas sensor (9) and a pressure sensor (10) on both sides, and the top end of the pressure sensor (10) is fixedly installed with a pressure gauge (11), the circumferences of the gas supply pipe (1) and the gas delivery pipe (2) are slidably sleeved with isolation pieces (12), and the two isolation pieces (12) are located inside the sleeve (4).

2. The semiconductor process equipment gas supply apparatus of claim 1, wherein, The circumferential two sides of the sleeve (4) are fixedly sleeved with sealing rings (5) on the circumferential outer walls of the gas supply pipe (1) and the gas delivery pipe (2).

3. The semiconductor process equipment gas supply apparatus of claim 1, wherein, The sensing probes of the inert gas sensor (9) and the pressure sensor (10) are located inside the sleeve (4).

4. The semiconductor process equipment gas supply of claim 1, wherein, The isolation piece (12) is fixedly connected by a first sealing sliding sleeve (121), a moving ring (122) and a second sealing sliding sleeve (123), and the widths of the first sealing sliding sleeve (121) and the second sealing sliding sleeve (123) are greater than the width of the moving ring (122).

5. The semiconductor process equipment gas supply of claim 4, wherein, A plurality of equal-angle rebound reset rods (13) are obliquely fixedly installed between the opposite ends of the two moving rings (122) and the inner walls of the sleeve (4).

6. The semiconductor process equipment gas supply of claim 4, wherein, The circumferential inner side of the first sealing sliding sleeve (121) is slidably sleeved with the circumferential outer walls of the gas supply pipe (1) and the gas delivery pipe (2), and the circumferential outer side of the second sealing sliding sleeve (123) is slidably installed with the circumferential inner wall of the sleeve (4).

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