Polishing solution splash-proof device of annular polishing machine

By designing a splash-proof device for the polishing slurry in a ring polisher, and utilizing a guide channel and baffle ring structure, the problem of polishing slurry splashing was solved, enabling the recycling and uniform distribution of the polishing slurry, thereby improving polishing efficiency and product quality.

CN223776869UActive Publication Date: 2026-01-09广西产研院先进技术融合创新促进中心有限公司 +2
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Patent Information

Application Number
CN202423196116.5
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-12-24
Publication Date
2026-01-09
Estimated Expiration
2034-12-24

AI Technical Summary

Technical Problem

During chemical mechanical polishing, the polishing fluid splashes due to centrifugal force, causing equipment contamination and workpiece surface damage, which affects product quality.

Method used

A splash-proof device for polishing fluid in a ring polisher is designed, including a guide channel, a cylindrical baffle ring, and an annular baffle. The polishing fluid is guided into a water tank for recycling through the guide channel to avoid splashing, and the liquid is kept in a uniform state through a hydrophobic coating and a stirrer.

Benefits of technology

It effectively prevents polishing slurry from splashing, maintains uniform recycling of polishing slurry, improves polishing efficiency, reduces waste, and protects the surface quality of workpieces.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model aims to provide a polishing solution splash-proof device of an annular polishing machine and the annular polishing machine. The polishing solution splash-proof device comprises a diversion trench, the flow guide groove is formed in a workbench of the annular polishing machine, a grinding disc of the annular polishing machine is installed in the flow guide groove, and the grinding disc and the top face of a polishing pad installed on the grinding disc are located below a groove opening of the flow guide groove. The device disclosed by the utility model is scientific and reasonable in structural design, and can effectively avoid the problems of polishing solution splashing and the like during ring polishing.
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Description

TECHNICAL FIELD

[0001] The utility model relates to a polishing mechanical equipment technical field, concretely relates to a ring polishing machine polishing liquid splashproof device and ring polishing machine. BACKGROUND

[0002] Chemical mechanical polishing technology is a kind of senior surface treatment technology that combines chemical reaction and mechanical grinding.It is widely used in the surface treatment of semiconductor, optoelectronic, microelectromechanical system (MEMS) and integrated circuit etc.In the engineering of chemical mechanical polishing, polishing liquid is sprayed between rotating workpiece and polishing pad with certain pressure to carry out chemical corrosion and mechanical grinding, however, the centrifugal force generated by high-speed spraying polishing liquid and polishing pad etc.moving parts can make a small part of polishing liquid splash outside the working area, cause equipment environment pollution, more seriously, can cause the non-uniform corrosion or mechanical damage of workpiece surface, further affect product quality. CONTENT OF UTILITY MODEL

[0003] The utility model provides a kind of ring polishing machine polishing liquid splashproof device and ring polishing machine, the device structure design scientific and reasonable, it can effectively avoid the splash of polishing liquid when ring polishing etc.Problems.

[0004] To achieve the above purpose, the technical scheme of the utility model is as follows:

[0005] The ring polishing machine polishing liquid splashproof device includes a flow guide groove.

[0006] The flow guide groove is arranged on the workbench of the ring polishing machine, the grinding disc of the ring polishing machine is installed in the flow guide groove, and the top surface of the grinding disc and the polishing pad installed thereon is below the groove opening of the flow guide groove.

[0007] The bottom surface of the flow guide groove is a slope inclined downward from the center to the periphery, and a drain port is arranged on the edge of the bottom surface of the flow guide groove.

[0008] The drain port is connected to the water storage tank through a pipeline arranged in the workbench.

[0009] The water storage tank is connected to the flow guide groove through a pump and a circulating pipe, and a stirrer is arranged in the water storage tank.

[0010] The ring polishing machine polishing liquid splashproof device further includes a cylindrical retaining ring, the cylindrical retaining ring is arranged at the center position of the top surface of the grinding disc, the end of the circulating pipe extends into the cylindrical retaining ring, and a plurality of liquid outlets are arranged at the bottom of the side wall of the cylindrical retaining ring.

[0011] The liquid outlets at the bottom of the cylindrical retaining ring are evenly distributed along the outer circumference thereof.

[0012] The diameter of the cylindrical retaining ring is 75-110 mm, and the height is 110-140 mm.

[0013] The aforementioned anti-splash device for the polishing fluid of the ring polisher also includes an annular baffle, which is disposed around the opening of the guide channel and completely surrounds the guide channel.

[0014] Preferably, the height of the annular baffle is 180-220mm.

[0015] The annular baffle is composed of three or more arc-shaped baffles joined together.

[0016] The bottom and sidewalls of the flow channel are covered with a hydrophobic coating.

[0017] Preferably, the hydrophobic coating is a Teflon material.

[0018] This utility model also discloses a ring polisher that utilizes the aforementioned anti-splash device for polishing fluid. The ring polisher can be a precision ring polisher for flat surfaces, or other ring polishers used for flat surface polishing.

[0019] The working principle of this utility model is as follows:

[0020] In this embodiment of the invention, the polishing liquid can be intercepted by the cylindrical baffle and the annular baffle, allowing it to flow into the guide channel. This prevents the polishing liquid from being thrown to other areas by centrifugal force, forming crystals, and thus polluting the polishing environment. In addition, the polishing liquid flowing into the guide channel flows into the water storage tank through the drain outlet under the action of the bottom slope of the guide channel and high-speed operation. Under the action of the agitator in the water storage tank, the polishing liquid is kept in a uniform state at all times. Finally, it flows back into the cylindrical baffle through the circulation pipe, and then flows back to the polishing pad through the liquid outlet, which can be repeatedly recycled to reduce costs.

[0021] The beneficial effects of this utility model are as follows:

[0022] (1) This utility model is designed with a guide channel that can completely accommodate the grinding disc and the polishing pad installed on it. The polishing liquid sprayed on the polishing pad through the side wall of the guide channel will be controlled within the guide channel in the first time, so as to avoid the liquid splashing outside the working area.

[0023] (2) The annular baffle provided in the preferred embodiment of the present invention further enhances the blocking effect and can better prevent liquid from splashing outside the working area.

[0024] (3) The present invention is provided with a cylindrical baffle ring. Through the liquid outlet holes around its bottom, the liquid will flow evenly onto the polishing pad, ensuring that the abrasive and chemical components can continuously act on the workpiece surface, thereby improving the polishing efficiency.

[0025] (4) The hydrophobic inner surface of the guide groove of this utility model helps to prevent the polishing liquid from adhering to the surface, which enables the polishing liquid to be recycled more effectively and avoids unnecessary waste. Attached Figure Description

[0026] Fig. 1 This is a schematic diagram of the anti-splash device for the ring polisher in Example 1;

[0027] Fig. 2 This is a schematic diagram of the flow guide channel and annular baffle in Example 1;

[0028] Fig. 3 This is a schematic diagram of the cylindrical retaining ring in Example 1;

[0029] The numbers and names in the diagram are as follows:

[0030] 1-Guide channel, 2-Water storage tank, 3-Workbench, 4-Grinding disc, 5-Drain outlet, 6-Circulation pipe, 7-Cylindrical baffle, 8-Liquid outlet, 9-Annular baffle, 10-Arc baffle, 11-Polishing pad. Detailed Implementation

[0031] The present invention will now be described in detail with reference to the accompanying drawings and specific embodiments. Example 1

[0032] like Figs. 1-3 As shown, the anti-splash device for the polishing fluid of the ring polisher includes a guide channel 1;

[0033] The guide channel 1 is installed on the workbench 3 of the ring polisher, and the grinding disc 4 of the ring polisher is installed inside the guide channel 1, with the top surface of the grinding disc 4 located below the opening of the guide channel 1. The bottom surface of the guide channel 1 is a sloping surface that slopes downwards from the center, and a drain outlet 5 is provided on the edge of the bottom surface of the guide channel 1. The drain outlet 5 is connected to the water storage tank 2 through a pipe built into the workbench 3.

[0034] The water storage tank 2 is connected to the guide channel 1 via a pump and a circulation pipe 6; a stirrer is installed inside the water storage tank 2; a cylindrical baffle 7 is located at the center of the top surface of the grinding disc 4, and the end of the circulation pipe 6 extends into the cylindrical baffle 7; the bottom of the side wall of the cylindrical baffle 7 is provided with multiple liquid outlet holes 8 evenly distributed along its outer circumference. The diameter of the cylindrical baffle 7 is 110 mm, and its height is 110-140 mm.

[0035] The polishing fluid anti-splash device for the ring polisher further includes an annular baffle 9, which is disposed around the opening of the guide channel 1, completely surrounding the guide channel 1. The height of the annular baffle 9 is 200mm. The annular baffle 9 is composed of three or more arc-shaped baffles 10 spliced ​​together.

[0036] The bottom surface and sidewalls of the flow channel 1 are covered with a hydrophobic coating. The hydrophobic coating is made of Teflon material.

[0037] Although embodiments of the present invention have been shown and described, those skilled in the art will understand that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the present invention, the scope of which is defined by the claims and their equivalents.

Claims

1. A splash-proof device for polishing fluid in a ring polisher, comprising a guide channel (1), characterized in that: The guide groove (1) is set on the worktable (3) of the ring polisher, and the grinding disc (4) of the ring polisher is installed in the guide groove (1). The top surface of the grinding disc (4) and the polishing pad (11) installed on it is located below the groove opening of the guide groove (1).

2. The anti-splash device for polishing fluid in a ring polisher as described in claim 1, characterized in that: The bottom surface of the flow channel (1) is a downward slope from the center to the surrounding area, and a drain outlet (5) is provided on the edge of the bottom surface of the flow channel (1).

3. The anti-splash device for polishing fluid in a ring polisher as described in claim 2, characterized in that: The drain outlet (5) is connected to the water storage tank (2) through a pipe built into the workbench (3).

4. The anti-splash device for polishing fluid in a ring polisher as described in claim 3, characterized in that: The water storage tank (2) is connected to the guide channel (1) through a pump and a circulation pipe (6); the water storage tank (2) is equipped with a stirrer.

5. The anti-splash device for polishing fluid in a ring polisher as described in claim 4, characterized in that: It also includes a cylindrical baffle (7), which is located at the center of the top surface of the grinding disc (4). The end of the circulation pipe (6) extends into the cylindrical baffle (7), and the bottom of the side wall of the cylindrical baffle (7) is provided with multiple liquid outlet holes (8).

6. The anti-splash device for polishing fluid in a ring polisher as described in claim 5, characterized in that: The liquid outlet holes (8) at the bottom of the cylindrical baffle (7) are evenly distributed along its outer circumference.

7. The anti-splash device for polishing fluid in a ring polisher as described in claim 5, characterized in that: The diameter of the cylindrical retaining ring (7) is 75-110mm and the height is 110-140mm.

8. The anti-splash device for polishing fluid in a ring polisher as described in claim 1, characterized in that: It also includes an annular baffle (9), which is located around the opening of the guide channel (1) and surrounds the guide channel (1) as a whole.

9. The anti-splash device for polishing fluid in a ring polisher as described in claim 8, characterized in that: The height of the annular baffle (9) is 180-220mm.

10. The anti-splash device for polishing fluid in a ring polisher as described in claim 8, characterized in that: The annular baffle (9) is composed of three or more arc baffles (10) spliced ​​together.

11. The anti-splash device for polishing fluid in a ring polisher as described in claim 1, characterized in that: The bottom and sidewalls of the flow channel (1) are covered with a hydrophobic coating.

12. The anti-splash device for polishing fluid in a ring polisher as described in claim 1, characterized in that: The hydrophobic coating is made of Teflon material.

13. A ring polisher, employing the anti-splash device for polishing fluid as described in any one of claims 1-12.