Photomask pre-alignment detection system and semiconductor manufacturing equipment
The photomask pre-alignment detection system automatically detects the photomask position using a light source emitter and receiver, solving the problems of contamination and low efficiency caused by manual confirmation in photomask pre-alignment detection, and achieving efficient and accurate photomask position calibration.
Patent Information
- Application Number
- CN202520231786.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-02-13
- Publication Date
- 2026-01-09
- Estimated Expiration
- 2035-02-13
AI Technical Summary
In existing technologies, the pre-alignment and inspection of photomasks rely on manual confirmation, which can lead to photomask contamination and low work efficiency.
A photomask pre-alignment detection system is adopted, which uses the light source emitter and receiver in the transplanter and photomask storage box to automatically detect the light transmittance of the photomask pre-alignment mark to ensure that the photomask is in an accurate position.
It reduces manual intervention, improves the efficiency of photomask pre-alignment and inspection, avoids photomask contamination, and ensures the accuracy of the photolithography process.
Smart Images
Figure CN223784625U_ABST
Abstract
Description
Technical Field
[0001] This application relates to the field of semiconductor equipment, specifically to a photomask pre-alignment detection system and semiconductor manufacturing equipment. Background Technology
[0002] A photomask, also known as a mask, is a crucial component in photolithography. Before photolithography, it is necessary to manually verify that the photomask is correctly positioned and perform pre-alignment checks. However, frequent manual verification and adjustment of the photomask's placement can contaminate it and affect work efficiency.
[0003] Against this backdrop, how to provide a photomask pre-alignment and inspection system to reduce manual intervention and improve work efficiency has become an urgent problem to be solved by those skilled in the art. Utility Model Content
[0004] In view of this, embodiments of this application provide a photomask pre-alignment detection system and semiconductor manufacturing equipment, which can reduce manual intervention and improve work efficiency.
[0005] To achieve the above objectives, the embodiments of this application provide the following technical solutions.
[0006] In a first aspect, embodiments of this application provide a pre-alignment detection system for a photomask, the photomask including a plurality of pre-alignment marks, the pre-alignment detection system comprising:
[0007] A transplanter, comprising a clamping mechanism and a transplanter light source, the transplanter light source comprising multiple light source emitters;
[0008] Photomask storage box, the photomask storage box comprising:
[0009] Multiple photomask fixing structures are used to fix the photomask placed into the photomask storage box by the clamping mechanism;
[0010] Multiple light source receivers, one of which is located at the correct alignment position of a pre-alignment mark on the photomask at the light source receiving position of the photomask storage box, is used to receive light from a light source emitter projected onto the photomask storage box through a pre-alignment mark.
[0011] Optional, also includes:
[0012] An alarm is connected to the plurality of light source receivers and outputs an alarm message when the light source receivers do not receive light.
[0013] Optionally, the photomask storage box further includes: a box body; the plurality of photomask fixing structures are symmetrically arranged through the box body, and the plurality of light source receivers are symmetrically arranged through the box body.
[0014] Optionally, the box body includes a first sidewall and a second sidewall, the first sidewall and the second sidewall being symmetrical;
[0015] The plurality of photomask fixing structures include: a first photomask fixing structure disposed on a first sidewall, and a second photomask fixing structure disposed on a second sidewall; wherein the position of the first photomask fixing structure on the first sidewall is symmetrical to the position of the second photomask fixing structure on the second sidewall.
[0016] The plurality of light source receivers include: a first light source receiver disposed on the inner wall of the first side wall, and a second light source receiver disposed on the inner wall of the second side wall; wherein the position of the first light source receiver on the inner wall of the first side wall is symmetrical to the position of the second light source receiver on the inner wall of the second side wall.
[0017] Optionally, the position of the first light source receiver on the inner wall of the first sidewall corresponds to the first pre-alignment mark of the photomask;
[0018] The second light source receiver is positioned on the inner wall of the second side wall, corresponding to the second pre-alignment mark of the photomask;
[0019] The plurality of light source emitters include: a first light source emitter and a second light source emitter, wherein the first light source emitter projects onto the photomask storage box through a first pre-alignment mark, and the second light source emitter projects onto the photomask storage box through a second pre-alignment mark.
[0020] Optional, also includes:
[0021] A photomask position adjustment device is used to adjust the placement position of the photomask in the photomask storage box when the alarm outputs alarm information.
[0022] Optionally, the photomask position adjustment device includes: a plane adjustment device or an angle adjustment device.
[0023] Optionally, the photomask fixing structure includes: a reference groove and a locking clip.
[0024] Optional, also includes:
[0025] The operation panel is used to control the clamping mechanism to place the photomask into the photomask storage box.
[0026] Secondly, embodiments of this application provide a semiconductor manufacturing apparatus, including a photomask pre-alignment detection system, the photomask pre-alignment detection system being as described above.
[0027] As can be seen, the photomask pre-alignment detection system provided in this application includes a transplanter and a photomask storage box; the transplanter includes a clamping mechanism and a transplanter light source, wherein the transplanter light source includes multiple light source emitters; the photomask storage box includes multiple photomask fixing structures, which can be used to fix the photomask placed in the photomask storage box by the clamping mechanism; and multiple light source receivers, one light source receiver being located at the light source receiving position in the photomask storage box corresponding to the correct alignment position of a pre-alignment mark on the photomask, thereby receiving light from a light source emitter projected onto the photomask storage box through a pre-alignment mark, thus realizing the pre-alignment detection of the photomask position; that is, by setting multiple light source emitters and corresponding light source receivers, this application embodiment utilizes the light transmittance of the photomask pre-alignment mark to project light, thereby confirming whether the photomask is placed correctly, thus realizing the pre-alignment detection of the photomask, reducing manual intervention, and improving work efficiency. Attached Figure Description
[0028] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only embodiments of this application. For those skilled in the art, other drawings can be obtained based on the provided drawings without creative effort.
[0029] Figure 1 This is a structural example diagram of a photomask shown in an embodiment of this application;
[0030] Figure 2 This is an example diagram of an optional structure of the photomask pre-alignment detection system shown in the embodiments of this application;
[0031] Figure 3 This is an example diagram of another optional structure of the photomask pre-alignment detection system shown in the embodiments of this application. Detailed Implementation
[0032] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.
[0033] A photomask, also known as a photomask, is a crucial component in photolithography. It carries a design pattern, which, when transmitted through it, projects onto a photoresist substrate. For clarity, refer to... Figure 1The diagram illustrates a structural example of a photomask. The photomask may include an exposure area at its center and pre-alignment marks 101 and TIS (Transmission Image Sensor Marks) marks 102 at its edges. The exposure area is the portion of the photomask that allows light to pass through, and the light passing through these areas forms an exposure pattern on the photoresist on the wafer surface. The pre-alignment marks 101 are special patterns used for preliminary alignment of the photomask. The patterns of the pre-alignment marks may differ between different lithography machines. In actual operation, after the robotic arm places the photomask on the photomask worktable, the position of the photomask can be determined by the pre-alignment marks, aligning it with the platform. The TIS marks 102 are a series of equally spaced vertical or horizontal dense lines on the mask worktable, used to achieve alignment between the mask worktable and the wafer worktable through the TIS system.
[0034] Specifically, before the photolithography process, the photomask storage box is placed in the photomask storage box. Before transferring the photomask, it is necessary to manually confirm whether the photomask pre-alignment mark is placed correctly. After the transfer is completed, the photomask needs to be pre-aligned and checked on the photolithography machine. However, frequent manual confirmation and adjustment of the photomask placement position may contaminate the photomask and affect work efficiency. If this operation is ignored, the machine may report an error due to incorrect photomask position during exposure, making exposure processing impossible and affecting work efficiency.
[0035] In view of this, embodiments of this application provide a photomask pre-alignment detection system and semiconductor manufacturing equipment, which can reduce manual intervention and improve work efficiency.
[0036] Figure 2 This is an example diagram of an optional structure of the photomask pre-alignment detection system shown in an embodiment of this application. Figure 3 This is an example diagram of another optional structure of the photomask pre-alignment detection system shown in the embodiments of this application, wherein, Figure 2 This is a structural example diagram of a photomask storage box. Figure 3 This is a structural example diagram for pre-alignment inspection of the photomask, referring to... Figures 2 to 3 The pre-alignment detection system for the photomask includes:
[0037] A transplanter (not shown in the figure) includes a clamping mechanism (not shown in the figure) and a transplanter light source, wherein the transplanter light source may include multiple light source emitters 100.
[0038] A transfer machine is a device used in the semiconductor industry to transfer semiconductor materials or components (such as photomasks) from one location to another (such as a photomask storage box). It plays a crucial role in the semiconductor manufacturing process by moving materials or components between different process steps.
[0039] The clamping mechanism is a key part of the transplanter. It can effectively clamp the photomask with a very small clamping area, preventing the photomask from falling or being improperly bumped, and ensuring that the photomask will not be damaged during clamping and moving.
[0040] The transplanter is also equipped with a transplanter light source to provide precise light control for subsequent pre-alignment detection of the photomask; wherein, the transplanter light source may include multiple light source emitters, which are devices used in optical communication systems to generate light signals, capable of generating light of specific wavelengths and intensities, to perform pre-alignment detection of the photomask position, ensuring accurate positioning and correct orientation when the photomask is subsequently transferred to the lithography machine.
[0041] Photomask storage box 200, the photomask storage box comprising:
[0042] Multiple photomask fixing structures are used to fix the photomask 201, which is placed in the photomask storage box 200 by the clamping mechanism.
[0043] Photomask storage boxes are specialized containers used for storing and transporting photomasks during semiconductor manufacturing. They are primarily used for the transfer and storage of photomasks, ensuring their safety and cleanliness, and protecting them from damage and contamination.
[0044] The photomask storage box includes multiple photomask fixing structures for fixing the photomasks placed into the photomask storage box by the clamping mechanism.
[0045] In an optional implementation, the photomask storage box further includes a box body; the plurality of photomask fixing structures 200 are symmetrically arranged through the box body.
[0046] In an optional embodiment, continue to refer to Figure 2 The box body includes a first sidewall 231 and a second sidewall 232, and the first sidewall 231 and the second sidewall 232 are symmetrical.
[0047] The plurality of photomask fixing structures include: a first photomask fixing structure 211 disposed on the first sidewall 231, and a second photomask fixing structure 212 disposed on the second sidewall 232; wherein, the position of the first photomask fixing structure on the first sidewall is symmetrical to the position of the second photomask fixing structure on the second sidewall; thereby, the first photomask fixing structure on the first sidewall and the second photomask fixing structure on the second sidewall can jointly fix the photomask.
[0048] In an optional embodiment, the photomask fixing structure may include a reference groove and a locking clip.
[0049] The reference groove can provide precise positioning for the edge or corner of the photomask. The edge or corner of the photomask can be embedded in the groove to keep it in a fixed position and prevent it from shaking. The locking clip can fix the photomask to the clamping point of the locking clip through elasticity or mechanical pressure, effectively preventing the photomask from shifting during transportation or vibration, and avoiding friction between the photomask and the photomask storage box.
[0050] In other embodiments, the photomask fixing structure may also be other structures or combinations thereof capable of fixing the photomask.
[0051] Furthermore, the photomask storage box includes: a plurality of light source receivers 220, wherein a light source receiver is positioned at a light source receiving position in the photomask storage box corresponding to a pre-alignment mark on the photomask 201, for receiving a light source projected onto the photomask storage box by a light source emitter through a pre-alignment mark.
[0052] A light source receiver is a sensor that receives light signals from a light source emitter and converts them into electrical signals for further processing and analysis.
[0053] In this embodiment of the application, by monitoring whether the light source receiver receives the light signal from the light source emitter, it is possible to detect whether the pre-alignment mark position of the photomask is correct, and thus detect whether the placement position of the photomask is correct.
[0054] In other words, the position of the light source receiver in the photomask storage box corresponds to the correct position of the pre-alignment mark on the photomask. Based on the position of the light source receiver, only when the light source emitter correctly projects the light source to the position of the light source receiver through the pre-alignment mark can the correct placement of the photomask be ensured.
[0055] In an optional implementation, corresponding to the number of pre-alignment marks on the photomask, the plurality of light source receivers 220 may include: a first light source receiver 221 disposed on the inner wall of the first side wall 231, and a second light source receiver 222 disposed on the inner wall of the second side wall 232; wherein the placement position of the first light source receiver on the inner wall of the first side wall is symmetrical to the placement position of the second light source receiver on the inner wall of the second side wall.
[0056] The first light source receiver 221 is positioned on the inner wall of the first side wall 231, corresponding to the first pre-alignment mark 241 of the photomask; the second light source receiver 222 is positioned on the inner wall of the second side wall 232, corresponding to the second pre-alignment mark 242 of the photomask.
[0057] Accordingly, the plurality of light source emitters 100 may include a first light source emitter 110 and a second light source emitter 120. The first light source emitter 110 can be projected onto the photomask storage box through a first pre-alignment mark 241, and the second light source emitter 120 can be projected onto the photomask storage box through a second pre-alignment mark 242.
[0058] Furthermore, the photomask storage box also includes an alarm connected to the plurality of light source receivers, which outputs alarm information when the light source receivers do not receive light.
[0059] In other words, when the light source receiver does not receive the light source projected by the light source transmitter, it indicates that the position of the light cover is incorrect, and the light source projected by the light source transmitter through the pre-alignment mark cannot be projected to the correct position (the light source receiving position of the light source receiver). At this time, the alarm connected to multiple light source receivers will output alarm information to prompt the operator.
[0060] In an optional implementation, the photomask storage box may further include a photomask position adjustment device (not shown in the figure) for adjusting the placement position of the photomask in the photomask storage box when the alarm outputs alarm information.
[0061] In an optional embodiment, the photomask position adjustment device may include a plane adjustment device or an angle adjustment device, thereby adjusting the position of the photomask using either a plane position adjustment method or an angle adjustment method. For example, when using the plane position adjustment method, if the photomask is offset on the horizontal plane, resulting in inaccurate position of the photomask in the X or Y direction, a precision linear displacement platform can be used to adjust the position of the photomask in the X or Y direction. The linear displacement platform can be driven by a servo motor or a stepper motor, and combined with the photomask pre-alignment detection system, it can be gradually fine-tuned until the photomask moves to the correct position of the pre-alignment mark corresponding to the photomask. When using the angle adjustment method, if the rotation angle of the photomask is incorrect, resulting in deviation of the direction of the photomask pre-alignment mark, a rotation platform can be used in conjunction with the photomask pre-alignment detection system to adjust the rotation angle of the photomask until the photomask moves to the correct position of the pre-alignment mark corresponding to the photomask.
[0062] In this embodiment of the application, after the alarm outputs alarm information, it can be adjusted manually by the operator or by the light cover position adjustment device to ensure that the light cover is placed correctly.
[0063] Furthermore, the photomask pre-alignment detection system also includes an operation panel, through which the operator can control the clamping mechanism to place the photomask into the photomask storage box for further photomask pre-alignment detection.
[0064] As can be seen, the photomask pre-alignment detection system provided in this application includes a transplanter and a photomask storage box; the transplanter includes a clamping mechanism and a transplanter light source, wherein the transplanter light source includes multiple light source emitters; the photomask storage box includes multiple photomask fixing structures, which can be used to fix the photomask placed in the photomask storage box by the clamping mechanism; and multiple light source receivers, one light source receiver being located at the light source receiving position in the photomask storage box corresponding to the correct alignment position of a pre-alignment mark on the photomask, thereby receiving light from a light source emitter projected onto the photomask storage box through a pre-alignment mark, thus realizing the pre-alignment detection of the photomask position; that is, by setting multiple light source emitters and corresponding light source receivers, this application embodiment utilizes the light transmittance of the photomask pre-alignment mark to project light, thereby confirming whether the photomask is placed correctly, thus realizing the pre-alignment detection of the photomask, reducing manual intervention, and improving work efficiency.
[0065] This application also provides a semiconductor manufacturing apparatus, including a photomask pre-alignment detection system, which is the same as the photomask pre-alignment detection system described in the foregoing embodiments.
[0066] The foregoing describes multiple embodiment schemes provided by the embodiments of this application. The optional methods described in each embodiment scheme can be combined and cross-referenced with each other without conflict, thereby extending to a variety of possible embodiment schemes. These can all be considered as the embodiment schemes disclosed and published by the embodiments of this application.
[0067] While the embodiments disclosed above are described in this application, this application is not limited thereto. Any person skilled in the art can make various modifications and alterations without departing from the spirit and scope of this application; therefore, the scope of protection of this application should be determined by the scope defined in the claims.
Claims
1. A pre-alignment detection system for a photomask, characterized in that, The photomask includes multiple pre-alignment markers, and the pre-alignment detection system includes: A transplanter, comprising a clamping mechanism and a transplanter light source, the transplanter light source comprising multiple light source emitters; Photomask storage box, the photomask storage box comprising: Multiple photomask fixing structures are used to fix the photomask placed into the photomask storage box by the clamping mechanism; Multiple light source receivers, one of which is located at the correct alignment position of a pre-alignment mark on the photomask at the light source receiving position of the photomask storage box, is used to receive light from a light source emitter projected onto the photomask storage box through a pre-alignment mark.
2. The system according to claim 1, characterized in that, Also includes: An alarm is connected to the plurality of light source receivers and outputs an alarm message when the light source receivers do not receive light.
3. The system according to claim 2, characterized in that, The photomask storage box further includes: a box body; the plurality of photomask fixing structures are symmetrically arranged through the box body, and the plurality of light source receivers are symmetrically arranged through the box body.
4. The system according to claim 3, characterized in that, The box body includes a first sidewall and a second sidewall, and the first sidewall and the second sidewall are symmetrical. The plurality of photomask fixing structures include: a first photomask fixing structure disposed on a first sidewall, and a second photomask fixing structure disposed on a second sidewall; wherein the position of the first photomask fixing structure on the first sidewall is symmetrical to the position of the second photomask fixing structure on the second sidewall. The plurality of light source receivers include: a first light source receiver disposed on the inner wall of the first side wall, and a second light source receiver disposed on the inner wall of the second side wall; wherein the position of the first light source receiver on the inner wall of the first side wall is symmetrical to the position of the second light source receiver on the inner wall of the second side wall.
5. The system according to claim 4, characterized in that, The first light source receiver is positioned on the inner wall of the first side wall, corresponding to the first pre-alignment mark of the photomask; The second light source receiver is positioned on the inner wall of the second side wall, corresponding to the second pre-alignment mark of the photomask; The plurality of light source emitters include: a first light source emitter and a second light source emitter, wherein the first light source emitter projects onto the photomask storage box through a first pre-alignment mark, and the second light source emitter projects onto the photomask storage box through a second pre-alignment mark.
6. The system according to claim 2, characterized in that, Also includes: A photomask position adjustment device is used to adjust the placement position of the photomask in the photomask storage box when the alarm outputs alarm information.
7. The system according to claim 6, characterized in that, The photomask position adjustment device includes: a plane adjustment device or an angle adjustment device.
8. The system according to claim 4, characterized in that, The photomask fixing structure includes: a reference groove and a locking clip.
9. The system according to claim 1, characterized in that, Also includes: The operation panel is used to control the clamping mechanism to place the photomask into the photomask storage box.
10. A semiconductor manufacturing apparatus, characterized in that, Including the pre-alignment detection system for the photomask as described in any one of claims 1-9.