Limiting mechanism of VUV parallel light source photoetching machine equipment
By introducing a limiting mechanism into the lithography machine and utilizing the negative pressure adsorption technology of a vacuum pump and a microporous ceramic plate, the problem of circuit board displacement during exposure was solved, resulting in better exposure effects.
Patent Information
- Application Number
- CN202520596360.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-04-01
- Publication Date
- 2026-01-16
- Estimated Expiration
- 2035-04-01
AI Technical Summary
During the exposure process of a lithography machine, the circuit board is displaced on the support stage due to inertial forces, causing the exposure position to deviate from the initial setting and affecting the exposure effect.
A limiting mechanism is adopted, including a vacuum pump, a multi-tube interface, a vacuum tube, and a microporous ceramic plate. The circuit board is adsorbed by negative pressure to ensure that it does not shift during the exposure process.
This improved the accuracy of circuit board exposure and enhanced the exposure effect.
Smart Images
Figure CN223808630U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model belongs to the technical field of photoetching machine, more specifically, it relates to a kind of VUV parallel light source photoetching machine equipment's limiting mechanism. BACKGROUND
[0002] In the semiconductor industry, the general photoetching process needs to go through the processes of silicon wafer surface cleaning and drying, coating, photoresist, soft baking, alignment exposure, post-baking, development, hard baking and etching. Among them, the photoetching process is a process of transferring the pattern on the mask to the photoresist (i.e., temporarily "copying" the device or circuit structure onto the silicon wafer). In semiconductor equipment, the track machine is a process equipment that integrates different process machines. Its main function is to coat and develop the photoresist on the wafer surface. The photoetching machine is mainly responsible for the exposure of the photoresist.
[0003] In the prior art, when the light source of the photoetching machine exposes the circuit board, the circuit board needs to be moved to the position of the light source. During the movement, due to the inertial force, the circuit board will displace on the bearing table, deviating from the initially set position, which results in inaccurate exposure of the circuit board during exposure, leading to poor exposure effect. UTILITY MODEL CONTENT
[0004] Therefore, in order to solve the above technical problems, the utility model provides a kind of VUV parallel light source photoetch machine equipment's limiting mechanism, including base 10, the base 10 top end one side connection is equipped with mounting seat 20, the top end of mounting seat 20 is equipped with illumination device 30, the illumination device 30 includes upper box 301 and lower box 302, power supply assembly is equipped in the upper box 301, lamp source component is equipped in the lower box 302, the bottom center of the lower box 302 is equipped with irradiation window 40, and the lamp source component is placed in the just above irradiation window 40, the top end of base 10 is also equipped with first moving mechanism 50, the bottom end both sides of first moving mechanism 50 are equipped with first sliding block 60, the top end of base 10 is equipped with the first sliding rail 70 matched with first sliding block 60, first moving mechanism 50 is slidably connected with base 10, the top end of first moving mechanism 50 is equipped with bearing seat 80, the top end of bearing seat 80 is equipped with bearing table 90, the top center of bearing table 90 is equipped with adsorption platform 100, the adsorption platform 100 is used to place the circuit board coated with photoresist, bearing table 90 is equipped with limiting mechanism for limiting circuit board movement, the limiting mechanism includes vacuum pump, multi-tube interface 110, vacuum tube 120, the vacuum pump is placed in the base 10, the multi-tube interface 110 is connected with one side of bearing seat 80, the vacuum tube 120 is connected with bearing seat 80, the output end of vacuum pump is communicated with the input end of multi-tube interface 110, the output end of multi-tube interface 110 is connected with the input end of vacuum tube 120, the lower part of bearing table 90 is equipped with first through-hole 130 around side, the output end of vacuum tube 120 is connected with first through-hole 130, the top center of bearing table 90 is equipped with recess 140 opening upwards, first through-hole 130 is communicated with recess 140, adsorption platform 100 is clamped with recess 140, the top surface of adsorption platform 100 is equipped with placing groove 150 opening upwards, the bottom of placing groove 150 is equipped with second through-hole 160, so that first through-hole 130 is communicated with recess 140 and second through-hole 160, micro-porous ceramic plate 170 is connected in placing groove 150, the top of micro-porous ceramic plate 170 is placed circuit board, by being equipped with limiting mechanism, when exposure, start vacuum pump to form negative pressure, so that micro-porous ceramic plate 170 and circuit board are closely attached, and do not displace, and when first moving mechanism 50 drives circuit board to move towards irradiation window 40, circuit board also does not shake, position does not deviate, further so that circuit board is exposed, exposure degree is good, improve exposure effect.
[0005] A kind of VUV parallel light source photoetcher equipment limiting mechanism, including base 10, the top end side of the base 10 is connected with mounting seat 20, the top end of the mounting seat 20 is connected with illumination device 30, the illumination device 30 includes upper box 301 and lower box 302, power supply component is equipped in the upper box 301, lamp source component is equipped in the lower box 302, the bottom center of the lower box 302 is equipped with irradiation window 40, and the lamp source component is placed directly above the irradiation window 40, the top end of the base 10 is also equipped with first mobile mechanism 50, the bottom end both sides of the first mobile mechanism 50 are connected with first sliding block 60, the top end of the base 10 is equipped with the first sliding rail 70 matched with the first sliding block 60, the first mobile mechanism 50 is slidably connected with the base 10, the top end of the first mobile mechanism 50 is connected with bearing seat 80, the top end of the bearing seat 80 is connected with bearing table 90, the top center of the bearing table 90 is connected with adsorption platform 100, the adsorption platform 100 is used to place circuit board coated with photoresist, the bearing table 90 is equipped with limiting mechanism for limiting circuit board movement, the limiting mechanism includes vacuum pump, multi-tube interface 110, vacuum tube 120, the vacuum pump is placed in the base 10, the multi-tube interface 110 is connected with one side of the bearing seat 80, the vacuum tube 120 is connected with the bearing seat 80, the output end of the vacuum pump is in communication with the input end of the multi-tube interface 110, the output end of the multi-tube interface 110 is connected with the input end of the vacuum tube 120, the lower part of the bearing table 90 is equipped with first through-hole 130 around side, the output end of the vacuum tube 120 is connected with the first through-hole 130, the top center of the bearing table 90 is equipped with recess 140 opening upwards, the first through-hole 130 is in communication with the recess 140, the adsorption platform 100 is clamped with the recess 140, the top surface of the adsorption platform 100 is equipped with placing groove 150 opening upwards, the bottom of the placing groove 150 is equipped with second through-hole 160, so that the first through-hole 130 is in communication with the recess 140, the second through-hole 160, the micro-porous ceramic plate 170 is connected in the placing groove 150, and the circuit board is placed on the top of the micro-porous ceramic plate 170.
[0006] Further, the first through-hole 130 has multiple, and is uniformly arranged, and each first through-hole 130 is in communication with its corresponding vacuum tube 120, and each first through-hole 130 and its corresponding second through-hole 160 are in communication by the vacuum tube 120.
[0007] Further, the groove 140 is provided with a clamping table 180 extending to the center, the top surface of the clamping table 180 abuts against the bottom end of the adsorption platform 100 after the adsorption platform 100 is clamped with the groove 140, for bearing the adsorption platform 100, and the first through hole 130 is arranged at the lower part of the clamping table 180.
[0008] Further, the placing groove 150 is multiple and uniformly arranged, and the bottom of each placing groove 150 is provided with the second through hole 160.
[0009] Further, the top surface of the adsorption platform 100 is further provided with a positioning hole 190 and a positioning column matched with the positioning hole 190, and the positioning hole 190 is arranged at the opening of the placing groove 150, for limiting the movement of the circuit board.
[0010] Further, the top surface of the adsorption platform 100 is provided with a sealing ring 200, for sealing the sealing property of the lower box 302, improving the exposure effect.
[0011] Further, the first moving mechanism 50 comprises a first moving plate 501 and a first handle 502, the bottom end of the first moving plate 501 is connected with the first sliding block 60 at both sides, the top end of the first moving plate 501 is connected with the bearing table 90, the side of the first moving plate 501 away from the mounting seat 20 is connected with an outwardly extending connecting block 210, the connecting block 210 is provided with a clamping groove 220, the bottom end of the first handle 502 is connected with a clamping column, and the clamping column is matched with the clamping groove 220.
[0012] Further, the bottom end of the first moving plate 501 is connected with a first electromagnet 230 near one side of the lower box 302, the top end of the base 10 is also connected with a first fixed block 240 and a second fixed block 250, the first fixed block 240 is arranged below the first moving plate 501, the second fixed block 250 is arranged below the lower box 302, the first fixed block 240 is arranged on one side of the first electromagnet 230, the second fixed block 250 is arranged on the other side of the first electromagnet 230, and the first electromagnet 230, the first fixed block 240 and the second fixed block 250 are all arranged on the inner side of the first sliding rail 70, the lower part of the first fixed block 240 is connected with a first iron block 260, the second fixed block 250 is connected with a second iron block 270, the first handle 502 is provided with a first electromagnetic switch, in normal state, the first electromagnet 230 is magnetically attracted to the first iron block 260, for fixing the first moving plate 501, when the circuit board needs to be exposed, the first electromagnetic switch is pressed, so that the first electromagnet 230 is broken magnetically with the first iron block 260, the first moving plate 501 drives the circuit board to move, when the circuit board moves directly below the irradiation window 40, at this time, the first electromagnet 230 is magnetically attracted to the second iron block 270, preventing the first moving plate 501 from moving back and forth when the circuit board is exposed, and the exposure effect is poor.
[0013] Further, the front plate of the base 10 is provided with a control panel 280, the control panel 280 is provided with a vacuum pump switch 290 and a gas valve switch 300, the vacuum pump switch 290 is used to control the start and stop of the vacuum pump, the gas valve switch 300 has a plurality of, and each gas valve switch 300 is connected with its corresponding vacuum pipe 120, the gas valve switch 300 is used to control the opening or closing of the vacuum pipe 120, control the first through hole 130 and the second through hole 160 communicated with the vacuum pipe 120, and further control the adsorption state of the microporous ceramic plate 170 and the circuit board, so that different specifications of the circuit board are opened and adsorbed by the corresponding gas valve switch 300.
[0014] Further, the lower part of the base 10 is provided with an operation platform 310, the base 10 is arranged on the upper surface of the operation platform 310, the lower surface of the operation platform 310 is provided with support columns 320 at the corners, the bottom end of each support column 320 is connected with a universal wheel 330, which is convenient to move.
[0015] The utility model discloses a beneficial effect: the utility model provides a kind of VUV parallel light source photoetching machine equipment's limiting mechanism, including pedestal 10, the top one side of pedestal 10 is connected with mounting seat 20, the top of mounting seat 20 is connected with illumination device 30, the illumination device 30 includes upper box 301 and lower box 302, power pack is equipped in the upper box 301, lamp source assembly is equipped in the lower box 302, the bottom center of the lower box 302 is equipped with irradiation window 40, and the lamp source assembly is placed directly above the irradiation window 40, the top of pedestal 10 is also equipped with first moving mechanism 50, the bottom two sides of first moving mechanism 50 are connected with first sliding block 60, the top of pedestal 10 is equipped with the first sliding rail 70 matched with the first sliding block 60, the first moving mechanism 50 is slidably connected with the pedestal 10, the top of first moving mechanism 50 is connected with bearing seat 80, the top of bearing seat 80 is connected with bearing table 90, the top center of bearing table 90 is connected with adsorption platform 100, the adsorption platform 100 is used to place circuit board coated with photoresist, bearing table 90 is equipped with limiting mechanism for limiting circuit board movement, the limiting mechanism includes vacuum pump, multi-tube interface 110, vacuum tube 120, the vacuum pump is placed in the pedestal 10, the multi-tube interface 110 is connected with one side of bearing seat 80, the vacuum tube 120 is connected with bearing seat 80, the output of vacuum pump is communicated with the input of multi-tube interface 110, the output of multi-tube interface 110 is connected with the input of vacuum tube 120, the lower part of bearing table 90 is equipped with first through-hole 130 around side, the output of vacuum tube 120 is connected with the first through-hole 130, the top center of bearing table 90 is equipped with recess 140 with opening upwards, the first through-hole 130 is communicated with the recess 140, the adsorption platform 100 is clamped with the recess 140, the top surface of adsorption platform 100 is equipped with placing groove 150 with opening upwards, the bottom of placing groove 150 is equipped with second through-hole 160, so that the first through-hole 130 is communicated with the recess 140 and the second through-hole 160, micro-porous ceramic plate 170 is connected in placing groove 150, circuit board is placed on the top of micro-porous ceramic plate 170, by being equipped with limiting mechanism, when exposure, start the vacuum pump and form negative pressure, so that micro-porous ceramic plate 170 and circuit board are closely attached, and do not displace, and when first moving mechanism 50 drives circuit board to move towards irradiation window 40, circuit board also does not shake, position does not deviate, to make circuit board when exposure, exposure degree is good, improve exposure effect. BRIEF DESCRIPTION OF DRAWINGS
[0016] Figure 1 It is the structural schematic diagram of the utility model.
[0017] Figure 2 Part structure diagram of the utility model.
[0018] Figure 3 Part structure diagram of the utility model.
[0019] Figure 4 Part structure plan view of the utility model.
[0020] Figure 5 Part structure diagram of the utility model.
[0021] Figure 6 Structure diagram of the bearing table of the utility model.
[0022] Figure 7 Front view of the bearing table of the utility model.
[0023] Main element symbol explanation:
[0024] Base 10, mounting seat 20, illumination device 30, upper box body 301, lower box body 302, irradiation window 40, first moving mechanism 50, first moving plate 501, first handle 502, first sliding block 60, first sliding rail 70, bearing seat 80, bearing table 90, adsorption platform 100, multi-tube interface 110, vacuum tube 120, first through hole 130, recess 140, placing groove 150, second through hole 160, microporous ceramic plate 170, clamping table 180, positioning hole 190, sealing ring 200, connecting block 210, clamping groove 220, first electromagnet 230, first fixed block 240, second fixed block 250, first iron block 260, second iron block 270, control panel 280, vacuum pump switch 290, gas valve switch 300, operation platform 310, support column 320, universal wheel 330.
[0025] The following specific embodiments will further illustrate the utility model in conjunction with the above-mentioned drawings. Specific embodiments
[0026] The following embodiments are described to assist in the understanding of the present application, the embodiments are not and should not be interpreted as limiting the protection scope of the present application in any way.
[0027] In the following description, those skilled in the art will recognize that throughout the present discussion, components can be described as single functional units (which can include sub-units), but those skilled in the art will recognize that the various components, or portions thereof, can be divided into separate components, or can be integrated together, including integrated within a single system or component.
[0028] Furthermore, the connection between components or systems is not intended to be limited to a direct connection; on the contrary, data between these components may be modified, reformatted, or otherwise altered by intermediate components. Additionally, other or fewer connections may be used. It should also be noted that the terms "connection," "link," or "input" should be understood to include direct connections, indirect connections via one or more intermediate devices, and wireless connections.
[0029] Example 1
[0030] like Figure 1 The diagram shown is a structural schematic of this utility model; as shown... Figure 2 The diagram shown is a partial structural schematic of this utility model; as shown... Figure 3 The diagram shown is a partial structural schematic of this utility model; as shown... Figure 4 The image shown is a partial top view of the structure of this utility model; as shown... Figure 5 The diagram shown is a partial structural schematic of this utility model; as shown... Figure 6 The diagram shown is a structural schematic of the support platform of this utility model; as shown... Figure 7 The image shown is a front view of the support platform of this utility model.
[0031] A kind of VUV parallel light source photoetcher equipment limiting mechanism, including base 10, the top end side of the base 10 is connected with mounting seat 20, the top end of the mounting seat 20 is connected with illumination device 30, the illumination device 30 includes upper box 301 and lower box 302, power supply component is equipped in the upper box 301, lamp source component is equipped in the lower box 302, the bottom center of the lower box 302 is equipped with irradiation window 40, and the lamp source component is placed directly above the irradiation window 40, the top end of the base 10 is also equipped with first mobile mechanism 50, the bottom end both sides of the first mobile mechanism 50 are connected with first sliding block 60, the top end of the base 10 is equipped with the first sliding rail 70 matched with the first sliding block 60, the first mobile mechanism 50 is slidably connected with the base 10, the top end of the first mobile mechanism 50 is connected with bearing seat 80, the top end of the bearing seat 80 is connected with bearing table 90, the top center of the bearing table 90 is connected with adsorption platform 100, the adsorption platform 100 is used to place the circuit board coated with photoresist, the bearing table 90 is equipped with limiting mechanism for limiting circuit board movement, the limiting mechanism includes vacuum pump, multi-tube interface 110, vacuum tube 120, the vacuum pump is placed in the base 10, the multi-tube interface 110 is connected with one side of the bearing seat 80, the vacuum tube 120 is connected with the bearing seat 80, the output end of the vacuum pump is in communication with the input end of the multi-tube interface 110, the output end of the multi-tube interface 110 is connected with the input end of the vacuum tube 120, the lower part of the bearing table 90 is equipped with first through-hole 130 around side, the output end of the vacuum tube 120 is connected with the first through-hole 130, the top center of the bearing table 90 is equipped with recess 140 opening upwards, the first through-hole 130 is in communication with the recess 140, the adsorption platform 100 is clamped with the recess 140, the top surface of the adsorption platform 100 is equipped with placing groove 150 opening upwards, the bottom of the placing groove 150 is equipped with second through-hole 160, so that the first through-hole 130 is in communication with the recess 140, the second through-hole 160, the micro-porous ceramic plate 170 is connected in the placing groove 150, and the circuit board is placed on the top of the micro-porous ceramic plate 170.
[0032] The first through-hole 130 has multiple, and is uniformly arranged, and each first through-hole 130 is in communication with its corresponding vacuum tube 120, and each first through-hole 130 is in communication with its corresponding second through-hole 160 through the vacuum tube 120.
[0033] The recess 140 is provided with a clamping table 180 extending to the center, the top surface of the clamping table 180 abuts with the bottom end of the adsorption platform 100 after the adsorption platform 100 is clamped with the recess 140, for bearing the adsorption platform 100, and the first through hole 130 is arranged at the lower part of the clamping table 180.
[0034] The placing groove 150 is multiple and uniformly arranged, and the bottom of each placing groove 150 is provided with the second through hole 160.
[0035] The top surface of the adsorption platform 100 is further provided with a positioning hole 190 and a positioning column matched with the positioning hole 190, and the positioning hole 190 is arranged at the opening of the placing groove 150, for limiting the movement of the circuit board.
[0036] The top surface of the adsorption platform 100 is provided with a sealing ring 200, for sealing the sealing property of the lower box 302, improving the exposure effect.
[0037] The first moving mechanism 50 comprises a first moving plate 501 and a first handle 502, the bottom end of the first moving plate 501 is connected with the first sliding block 60 at both sides, the top end of the first moving plate 501 is connected with the bearing table 90, the side of the first moving plate 501 away from the mounting seat 20 is connected with an outwardly extending connecting block 210, the connecting block 210 is provided with a clamping groove 220, the bottom end of the first handle 502 is connected with a clamping column, and the clamping column is matched with the clamping groove 220.
[0038] The bottom end of the first moving plate 501 is connected with a first electromagnet 230 near one side of the lower box 302, the top end of the base 10 is also connected with a first fixed block 240 and a second fixed block 250, the first fixed block 240 is arranged below the first moving plate 501, the second fixed block 250 is arranged below the lower box 302, the first fixed block 240 is arranged on one side of the first electromagnet 230, the second fixed block 250 is arranged on the other side of the first electromagnet 230, and the first electromagnet 230, the first fixed block 240 and the second fixed block 250 are all arranged on the inner side of the first sliding rail 70, the lower part of the first fixed block 240 is connected with a first iron block 260, the second fixed block 250 is connected with a second iron block 270, the first handle 502 is provided with a first electromagnetic switch, in normal state, the first electromagnet 230 is magnetically attracted to the first iron block 260, for fixing the first moving plate 501, when the circuit board needs to be exposed, the first electromagnetic switch is pressed, so that the first electromagnet 230 is broken magnetically with the first iron block 260, the first moving plate 501 drives the circuit board to move, when the circuit board moves directly below the irradiation window 40, at this time, the first electromagnet 230 is magnetically attracted to the second iron block 270, preventing the first moving plate 501 from moving back and forth when the circuit board is exposed, and the exposure effect is poor.
[0039] The front plate of the base 10 is provided with a control panel 280, the control panel 280 is provided with a vacuum pump switch 290 and a gas valve switch 300, the vacuum pump switch 290 is used to control the start and stop of the vacuum pump, the gas valve switch 300 has a plurality of, and each gas valve switch 300 is connected with its corresponding vacuum pipe 120, the gas valve switch 300 is used to control the opening or closing of the vacuum pipe 120, control the first through hole 130 and the second through hole 160 communicated with the vacuum pipe 120, and further control the adsorption state of the microporous ceramic plate 170 and the circuit board, so that different specifications of the circuit board are opened, the corresponding gas valve switch 300 is opened for adsorption.
[0040] The lower part of the base 10 is provided with an operation platform 310, the base 10 is arranged on the upper surface of the operation platform 310, the lower surface of the operation platform 310 is provided with support columns 320 at the corners, the bottom end of each support column 320 is connected with a universal wheel 330, which is convenient to move.
[0041] The utility model discloses a beneficial effect: the utility model provides a kind of VUV parallel light source photoetching machine equipment's limiting mechanism, including pedestal 10, the pedestal 10 top one side connection is equipped with mounting seat 20, the top of mounting seat 20 is equipped with illumination device 30, the illumination device 30 includes upper box 301 and lower box 302, the upper box 301 is equipped with power component, the lower box 302 is equipped with lamp source component, the bottom center of lower box 302 is equipped with irradiation window 40, and the lamp source component is placed in the just above irradiation window 40, the top of pedestal 10 is also equipped with first moving mechanism 50, the bottom two sides of first moving mechanism 50 are equipped with first sliding block 60, the top of pedestal 10 is equipped with the first sliding rail 70 matched with first sliding block 60, the first moving mechanism 50 is slidably connected with the pedestal 10, the top of first moving mechanism 50 is equipped with bearing seat 80, the top of bearing seat 80 is equipped with bearing table 90, the top center of bearing table 90 is equipped with adsorption platform 100, the adsorption platform 100 is used to place circuit board coated with photoresist, bearing table 90 is equipped with limiting mechanism for limiting circuit board movement, the limiting mechanism includes vacuum pump, multi-tube interface 110, vacuum tube 120, the vacuum pump is placed in the pedestal 10, the multi-tube interface 110 is connected with one side of bearing seat 80, the vacuum tube 120 is connected with bearing seat 80, the output end of vacuum pump is communicated with the input end of multi-tube interface 110, the output end of multi-tube interface 110 is connected with the input end of vacuum tube 120, the lower part of bearing table 90 is equipped with first through-hole 130 around side surface, the output end of vacuum tube 120 is connected with the first through-hole 130, the top center of bearing table 90 is equipped with recess 140 with opening upwards, the first through-hole 130 is communicated with the recess 140, the adsorption platform 100 is clamped with the recess 140, the top surface of adsorption platform 100 is equipped with placing groove 150 with opening upwards, the bottom of placing groove 150 is equipped with second through-hole 160, so that the first through-hole 130 is communicated with the recess 140, the second through-hole 160, placing groove 150 is equipped with microporous ceramic plate 170, the top of microporous ceramic plate 170 is placed circuit board, by being equipped with limiting mechanism, when exposure, start the vacuum pump and air extraction, form negative pressure, so that microporous ceramic plate 170 and circuit board closely adhere, do not occur displacement, and when first moving mechanism 50 drives circuit board to move towards irradiation window 40, circuit board also does not shake, position does not deviate, further so that circuit board when exposure, exposure degree is good, improve exposure effect.
[0042] The above-described embodiments only express several implementation manners of the utility model, the description is more specific and detailed, but can not therefore be understood as the limitation of the utility model patent range. It should be pointed out that for ordinary skilled person in the art, without departing from the utility model concept, several deformations and improvements can be made, which belong to the protection range of the utility model. Therefore, the protection range of the utility model patent should be subject to the appended claims.
Claims
1. A limiting mechanism of a VUV parallel light source photoetching machine device, comprising a base (10), a mounting seat (20) is arranged on one side of the top end of the base (10), a light irradiation device (30) is arranged on the top end of the mounting seat (20), the light irradiation device (30) comprises an upper box body (301) and a lower box body (302), a power supply assembly is arranged in the upper box body (301), a lamp source assembly is arranged in the lower box body (302), a radiation window (40) is arranged at the bottom center of the lower box body (302), and the lamp source assembly is arranged directly above the radiation window (40), a first moving mechanism (50) is further arranged on the top end of the base (10), first sliding blocks (60) are arranged on the bottom end of the first moving mechanism (50), first sliding rails (70) matched with the first sliding blocks (60) are arranged on the top end of the base (10), the first moving mechanism (50) is slidably connected with the base (10), a bearing seat (80) is arranged on the top end of the first moving mechanism (50), a bearing table (90) is arranged on the top end of the bearing seat (80), and an adsorption platform (100) is arranged at the top center of the bearing table (90), the adsorption platform (100) is used for placing a circuit board coated with photoresist, characterized in that: The bearing table (90) is provided with a limiting mechanism for limiting the movement of the circuit board, the limiting mechanism comprises a vacuum pump, a multi-tube interface (110), a vacuum tube (120), the vacuum pump is arranged in the base (10), the multi-tube interface (110) is connected with one side of the bearing seat (80), the vacuum tube (120) is connected with the bearing seat (80), the output end of the vacuum pump is communicated with the input end of the multi-tube interface (110), the output end of the multi-tube interface (110) is connected with the input end of the vacuum tube (120), the lower part of the four circumferential sides of the bearing table (90) is provided with a first through hole (130), the output end of the vacuum tube (120) is connected with the first through hole (130), the top end of the bearing table (90) is provided with a recess (140) opening upward, the first through hole (130) is communicated with the recess (140), the adsorption platform (100) is clamped with the recess (140), the top surface of the adsorption platform (100) is provided with a placing groove (150) opening upward, the bottom of the placing groove (150) is provided with a second through hole (160), so that the first through hole (130) is communicated with the recess (140) and the second through hole (160), a microporous ceramic plate (170) is connected in the placing groove (150), and the circuit board is placed on the top of the microporous ceramic plate (170).
2. The limit mechanism of the VUV parallel light source lithography machine apparatus according to claim 1, wherein: The first through hole (130) is provided with a plurality of uniform intervals, and each first through hole (130) is communicated with the corresponding vacuum tube (120), and each first through hole (130) is communicated with the corresponding second through hole (160) through the vacuum tube (120).
3. The VUV collimated source lithography apparatus limit mechanism of claim 2, wherein: The recess (140) is provided with a clamping table (180) extending to the center, after the adsorption platform (100) is clamped with the recess (140), the top surface of the clamping table (180) abuts against the bottom end of the adsorption platform (100), for bearing the adsorption platform (100), and the first through hole (130) is arranged at the lower part of the clamping table (180).
4. The VUV collimated source lithography apparatus limit mechanism of claim 3, wherein: The placing groove (150) is provided with a plurality of uniform intervals, and the bottom of each placing groove (150) is provided with the second through hole (160).
5. The VUV collimated source lithography apparatus limit mechanism of claim 4, wherein: The top surface of the adsorption platform (100) is also provided with a positioning hole (190), and a positioning column matched with the positioning hole (190) is arranged, and the positioning hole (190) is arranged at the four circumferential sides of the opening of the placing groove (150), for limiting the movement of the circuit board.
6. The VUV collimated source lithography apparatus limit mechanism of claim 5, wherein: The top surface of the adsorption platform (100) is provided with a sealing ring (200), for sealing the sealing property of the lower box body (302), improving the exposure effect.
7. The limit mechanism of the VUV parallel light source lithography apparatus according to claim 1, wherein: The first moving mechanism (50) comprises a first moving plate (501) and a first handle (502), the bottom ends of the first moving plate (501) are connected with the first sliders (60), the top end of the first moving plate (501) is connected with the bearing table (90), the side of the first moving plate (501) away from the mounting seat (20) is connected with an outwardly extending connecting block (210), the connecting block (210) is provided with a clamping groove (220), and the bottom end of the first handle (502) is connected with a clamping column.
8. The VUV collimated source lithography apparatus limit mechanism of claim 7, wherein: The bottom end of the first moving plate (501) is connected with a first electromagnet (230) on the side close to the lower box body (302), the top end of the base (10) is further connected with a first fixed block (240) and a second fixed block (250), the first fixed block (240) is arranged below the first moving plate (501), the second fixed block (250) is arranged below the lower box body (302), the first fixed block (240) is arranged on one side of the first electromagnet (230), the second fixed block (250) is arranged on the other side of the first electromagnet (230), and the first electromagnet (230), the first fixed block (240) and the second fixed block (250) are all arranged on the inner side of the first sliding rail (70), the lower part of the first fixed block (240) is connected with a first iron block (260), the second fixed block (250) is connected with a second iron block (270), and the first handle (502) is provided with a first electromagnetic switch.
9. The limit mechanism of the VUV parallel light source lithography apparatus according to claim 1, wherein: The front plate of the base (10) is provided with a control panel (280), the control panel (280) is provided with a vacuum pump switch (290) and a gas valve switch (300), the vacuum pump switch (290) is used for controlling the start and stop of the vacuum pump, the gas valve switch (300) is provided with a plurality of gas valve switches (300), each of which is connected with the corresponding vacuum pipe (120), the gas valve switch (300) is used for controlling the opening or closing of the vacuum pipe (120), controlling the first through hole (130) and the second through hole (160) connected with the vacuum pipe (120), and further controlling the adsorption state of the microporous ceramic plate (170) and the circuit board, so that different specifications of circuit boards are adsorbed by opening the corresponding gas valve switch (300).
10. The VUV collimated source lithography apparatus limit mechanism of claim 9, wherein: The lower side of the base (10) is provided with an operation platform (310), the base (10) is arranged on the upper surface of the operation platform (310), and the lower surface of the operation platform (310) is provided with supporting columns (320) at the corners, and the bottom end of each supporting column (320) is connected with a universal wheel (330), which is convenient for moving.