Alignment mechanism for wafer substrate of photoetching machine

Abstract

The utility model relates to the technical field of photoetching machines, and discloses an alignment mechanism for a wafer substrate of a photoetching machine, which comprises a machine body, a working platform is arranged in the machine body, the rear side of the working platform is fixedly connected with a mounting box, and a second motor is arranged at the left end of the rear side in the machine body. The output end of the second motor is fixedly connected with a rotating long rod, the left end and the right end of the top of the rotating long rod are both fixedly connected with connecting ropes, the sides, away from each other, of the two connecting ropes are both fixedly connected with clamping plates, and the bottoms of the clamping plates are slidably connected with the top of the working platform. According to the utility model, a second motor is started, a rotating long rod drives a connecting rope to pull a clamping plate to slide, a wafer substrate is clamped, a first gear and a second gear are in meshing transmission, a bidirectional threaded rod is driven to rotate, a sliding square block slides, and a fan moves to dissipate heat, through the procedures, heat dissipation and clamping are realized, and the efficiency is improved.

Description

TECHNICAL FIELD

[0001] The utility model relates to the technical field of photoetching machine, especially relates to a kind of alignment mechanism of photoetching machine wafer substrate. BACKGROUND

[0002] The important carrier of carrying photoresist and realizing photoetching pattern transfer, in photoetching process, photoetching machine projects the circuit pattern designed through light to the wafer substrate coated with photoresist, through photoresist exposure, development some series steps, pattern is accurately copied on wafer substrate surface, and some processes such as subsequent chip manufacturing etching and doping are laid foundation, its quality advantage and disadvantage, including flatness, crystal structure integrity, have decisive influence on the precision of chip manufacturing, yield and final performance.

[0003] A kind of alignment mechanism of photoetching machine wafer substrate, it is the core component of ensuring that photoetching machine high-precision operation, by high-precision displacement table, alignment sensor and complex control system, displacement table can accurately adjust the position of wafer substrate in multiple dimensions, realize sub-micron level even nanometer level displacement precision by piezoelectric ceramic driving element, alignment sensor then utilizes optical and electronic multiple technical means, real-time monitoring the relative position deviation between wafer substrate and photoetching pattern, control system is based on the data fed back by sensor, uses advanced algorithm to calculate quickly and issues instruction, drives displacement table to make corresponding adjustment, so that wafer substrate and photoetching pattern reach accurate alignment, guarantee that circuit pattern can be accurately transferred to wafer substrate in photoetching process, greatly improve the yield and performance of chip manufacturing, in the process of using, in the process of spin coating photoresist, wafer edge area is caused by centrifugal force distribution difference, and photoresist thickness becomes thin or accumulates, affect subsequent exposure and development effect, make edge area pattern quality decline, in prior art, wafer is strictly cleaned and pretreated, and surface particle and oil stain contaminant are removed, for the wafer with uneven surface or mesa structure, chemical mechanical polishing process can be used to flatten treatment, but in the process of using, the heat generated by device cannot be promptly dissipated, and then lead to internal temperature too high, and the failure rate of product increases. UTILITY MODEL CONTENT

[0004] In order to make up for the above shortcomings, the utility model provides a kind of alignment mechanism of photoetching machine wafer substrate, to improve the problem that the heat generated by device in prior art cannot be promptly dissipated, and then lead to internal temperature too high, and the failure rate of product increases.

[0005] In order to achieve the above object, the utility model discloses the following technical scheme: a kind of alignment mechanism of photolithography machine wafer substrate, including body, the inside of the body is equipped with working platform, the rear side of the working platform is fixedly connected with installation box, the inside rear side left end of the body is equipped with second motor, the output of the second motor is fixedly connected with rotating long rod, the top left and right ends of the rotating long rod are fixedly connected with connecting rope, the side far away of two The connecting rope is fixedly connected with clamping plate, the bottom of the clamping plate is slidably connected with the top of the working platform, the side far away of two The front and rear ends of the clamping plate are fixedly connected with spring, the outside left end of the rotating long rod is fixedly connected with first gear, the inside rotationally connected of the installation box has two-way threaded rod, the left side of the two-way threaded rod is fixedly connected with second gear, the rear side of the second gear is meshed with the front side of the first gear, the outside left and right ends of the two-way threaded rod are threadedly connected with sliding square, the top of the sliding square is equipped with fan, the inside top of the body is equipped with cleaning mechanism, and the cleaning mechanism is used for the cleaning of the surface of the working platform.

[0006] As further description of the above technical solution:

[0007] The cleaning mechanism includes a first motor, the first motor is installed on the top left side of the body, the output of the first motor is fixedly connected with a rotating rod, the left and right ends of the rotating rod are fixedly connected with a driving bevel gear, the inside top left and right ends of the body are rotatably connected with a one-way threaded rod, the front side of the one-way threaded rod is fixedly connected with a driven bevel gear, the front side of the driven bevel gear is meshed with the rear side of the driving bevel gear, the outside of the one-way threaded rod is threadedly connected with a sliding rod, the bottom left and right ends of the sliding rod are fixedly connected with a connecting rod, the bottom of the connecting rod is fixedly connected with a cleaning brush, and the bottom of the cleaning brush is slidably connected with the top of the working platform.

[0008] As further description of the above technical solution:

[0009] The left end of the body is provided with a receiving box, and the top of the receiving box is provided with a top cover.

[0010] As further description of the above technical solution:

[0011] The top of the top cover is fixedly connected with a fixed handle, and the outside of the fixed handle is provided with a protective sleeve.

[0012] As further description of the above technical solution:

[0013] The front side of the body is provided with a connecting block, and the front side of the connecting block is provided with an operating device.

[0014] As further description of the above technical solution:

[0015] The front left end top of the body is provided with a clamping groove plate, and the inside of the clamping groove plate is provided with a transparent square plate.

[0016] Further description of the above technical solution:

[0017] The middle part of the left end of the front side of the body is screw-connected with a fixed rod, and the outer side of the fixed rod is provided with a signboard.

[0018] Further description of the above technical solution:

[0019] The left side of the front end of the body is rotationally connected with a box door, the left side of the box door is fixedly connected with a mounting handle, the top of the front side of the body is fixedly connected with a mounting seat, and the top of the mounting seat is provided with a warning light.

[0020] The utility model has the advantages of the following beneficial effects:

[0021] 1、 the utility model discloses, open second motor, rotate long rod drive connecting rope and pull slide clamping plate, clamping wafer substrate, first gear and second gear meshing transmission drive, drive two -way threaded rod rotation, sliding block slide, fan moves and radiates heat, spring buffer and auxiliary clamping on clamping plate, realize heat dissipation and clamping through above -mentioned procedure, improve efficiency, reduce failure rate.

[0022] 2、 the utility model discloses, open first motor, rotate lever drive driving bevel gear rotation, with driven bevel gear meshing transmission drive, drive unidirectional threaded rod rotation, sliding rod moves along threaded rod axial direction, connecting rod drive cleaning brush slide on the top of work platform, clean work platform surface. DRAWINGS

[0023] Figure 1 A perspective view of an alignment mechanism for a wafer substrate of a photoetching machine is provided for the utility model;

[0024] Figure 2 A front view of an alignment mechanism for a wafer substrate of a photoetching machine is provided for the utility model;

[0025] Figure 3 A top view of an alignment mechanism for a wafer substrate of a photoetching machine is provided for the utility model;

[0026] Figure 4 A partial structure schematic view of an alignment mechanism for a wafer substrate of a photoetching machine is provided for the utility model;

[0027] Figure 5 A Figure 4 enlarged view of A in the utility model is provided for the utility model;

[0028] Figure 6A partial structure display drawing of an alignment mechanism of a wafer substrate of a photoetching machine is provided.

[0029] Legend:

[0030] 1, machine body; 2, cleaning mechanism; 201, first motor; 202, cleaning brush; 203, rotating rod; 204, driving bevel gear; 205, driven bevel gear; 206, connecting rod; 207, one-way threaded rod; 208, sliding rod; 3, storage box; 4, top cover; 5, fixed handle; 6, protective sleeve; 7, operating device; 8, connecting block; 9, warning light; 10, mounting seat; 11, transparent square plate; 12, clamping groove plate; 13, box door; 14, mounting handle; 15, fixed rod; 16, signboard; 17, working platform; 18, second motor; 19, fan; 20, rotating long rod; 21, connecting rope; 22, clamping plate; 23, spring; 24, two-way threaded rod; 25, sliding square; 26, mounting box; 27, second gear; 28, first gear. DETAILED DESCRIPTION

[0031] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative labor fall within the scope of protection of the present application.

[0032] Reference Figure 1 , Figure 4 and Figure 5The utility model provides an embodiment: a kind of alignment mechanism of photolithography machine wafer substrate, including body 1, the inside installation of body 1 has working platform 17, the rear side fixedly connected of working platform 17 has installation box 26, the inside rear side left end of body 1 is installed with second motor 18, by the installation of second motor 18, to give subsequent process with power, the output of second motor 18 is fixedly connected with rotating long rod 20, the top left and right ends of rotating long rod 20 are all fixedly connected with connecting rope 21, the side far away of two connecting ropes 21 is all fixedly connected with clamping plate 22, the bottom of clamping plate 22 is slidably connected with the top of working platform 17, the side far away of two clamping plates 22 is all fixedly connected with spring 23, the outside left end of rotating long rod 20 is fixedly connected with first gear 28, the inside rotation of installation box 26 is connected with two-way threaded rod 24, the left side of two-way threaded rod 24 is fixedly connected with second gear 27, the rear side of second gear 27 is meshingly connected with the front side of first gear 28, the outside left and right ends of two-way threaded rod 24 are all threadedly connected with sliding square 25, the top of sliding square 25 is installed with fan 19, by the installation of fan 19, the heat in its inside is quickly dissipated, the inside top of body 1 is installed with cleaning mechanism 2, cleaning mechanism 2 is used for the cleaning of the surface of working platform 17, the front side middle part of body 1 is installed with connecting block 8, the front side of connecting block 8 is installed with operating device 7, by the installation of operating device 7, the operation of staff is convenient, the front side left end top of body 1 is installed with slot plate 12, the inside of slot plate 12 is provided with transparent square plate 11, by the installation of transparent square plate 11, staff is convenient to observe its inside;

[0033] Specifically, start second motor 18, its output end drives rotating long rod 20 to rotate, the connecting rope 21 of rotating long rod 20 top end is dragged, causes two connecting ropes 21 to drive clamping plate 22 to slide respectively, to realize the clamping of wafer substrate, simultaneously, first gear 28 on rotating long rod 20 rotates along with long rod, and is meshed transmission with second gear 27, to drive two-way threaded rod 24 to rotate in turn, the sliding square 25 of two-way threaded rod 24 outside slides because threaded rod rotates, the fan 19 of sliding square 25 top installation moves in turn, and the related components of working platform 17 are heat dissipated, in addition, the spring 23 fixed on clamping plate 22 plays the role of buffering and auxiliary clamping, by above-mentioned procedure, the heat dissipation and clamping of the device are realized, to improve work efficiency in turn.

[0034] Refer to Figure 1 , Figure 3 And Figure 6The cleaning mechanism 2 comprises a first motor 201 installed on the top left side of the body 1, the output end of the first motor 201 is fixedly connected with a rotating rod 203, the left and right ends of the rotating rod 203 are fixedly connected with driving bevel gears 204, the inner top left and right ends of the body 1 are rotatably connected with one-way threaded rods 207, the front side of the one-way threaded rod 207 is fixedly connected with a driven bevel gear 205, the front side of the driven bevel gear 205 is meshedly connected with the rear side of the driving bevel gear 204, the outer side of the one-way threaded rod 207 is threadedly connected with a sliding rod 208, the bottom left and right ends of the sliding rod 208 are fixedly connected with connecting rods 206, the bottom of the connecting rod 206 is fixedly connected with a cleaning brush 202, the bottom of the cleaning brush 202 is slidably connected with the top of the working platform 17, the left end of the front side of the body 1 is provided with a storage box 3, the top of the storage box 3 is provided with a top cover 4, the top of the top cover 4 is fixedly connected with a fixed handle 5, the outer side of the fixed handle 5 is provided with a protective sleeve 6;

[0035] Specifically, the first motor 201 is started, the output end of the first motor 201 drives the rotating rod 203 to rotate, the left and right ends of the rotating rod 203 are fixedly connected with the driving bevel gears 204, so that the driving bevel gears 204 can rotate synchronously with the rotating rod 203, the driving bevel gears 204 are meshedly connected with the driven bevel gear 205, thereby driving the one-way threaded rod 207 to rotate, when the one-way threaded rod 207 rotates, the outer side of the one-way threaded rod 207 drives the sliding rod 208 to move along the axial direction of the threaded rod, the bottom left and right ends of the sliding rod 208 are fixedly connected with the connecting rods 206, with the movement of the sliding rod 208, the cleaning brush 202 fixedly connected with the connecting rods 206 at the bottom slides on the top of the working platform 17, thereby realizing the cleaning of the surface of the working platform 17.

[0036] With reference to Figure 1 , Figure 2 and Figure 3 , the middle part of the front left end of the body 1 is threadedly connected with a fixed rod 15, the outer side of the fixed rod 15 is provided with a signboard 16, the left side of the front end of the body 1 is rotatably connected with a box door 13, the left side of the box door 13 is fixedly connected with a mounting handle 14, the top of the front side of the body 1 is fixedly connected with a mounting seat 10, the top of the mounting seat 10 is provided with a warning lamp 9;

[0037] Specifically, the installation of the signboard 16 facilitates the reminding of the workers, the installation of the mounting handle 14 facilitates the opening of the box door 13, and the installation of the warning lamp 9 facilitates the use of the workers.

[0038] Working principle: the second motor 18 is opened, the output end drives the rotating long rod 20 to rotate, the connecting rope 21 at the top of the rotating long rod 20 is pulled due to the rotation of the rotating long rod 20, so that the two connecting ropes 21 drive the clamping plates 22 to slide respectively, the clamping of the wafer substrate is realized, at the same time, the first gear 28 on the rotating long rod 20 rotates with the long rod, meshes with the second gear 27 to drive the bidirectional threaded rod 24 to rotate, the sliding block 25 on the outside of the bidirectional threaded rod 24 slides due to the rotation of the threaded rod, the fan 19 installed at the top of the sliding block 25 moves, the working platform 17 and related parts are cooled, in addition, the spring 23 fixed on the clamping plate 22 plays a buffering and auxiliary clamping role, through the above process, the cooling and clamping of the device are realized, and the working efficiency is improved;

[0039] The first motor 201 is opened, the output end drives the rotating rod 203 to rotate, the driving bevel gear 204 fixedly connected to the left and right ends of the rotating rod 203 rotates synchronously with the rotating rod 203, the driving bevel gear 204 meshes with the driven bevel gear 205 to drive the unidirectional threaded rod 207 to rotate, when the unidirectional threaded rod 207 rotates, the sliding rod 208 connected with the outside of the threaded rod moves along the axial direction of the threaded rod, the connecting rod 206 fixedly connected to the bottom left and right ends of the sliding rod 208 moves with the sliding rod 208, so that the cleaning brush 202 fixedly connected to the bottom of the connecting rod 206 slides on the top of the working platform 17, and the surface of the working platform 17 is cleaned.

[0040] Finally, it should be pointed out that: the above only for preferred embodiments of the present application, and is not intended to limit the present application, although the foregoing embodiments of the present application are described in detail, for those skilled in the art, it still can be modified, or part of the technical features of the equivalent replacement, any modification, equivalent replacement, improvement, etc. made within the spirit and principles of the present application, should be included in the scope of protection of the present application.

Claims

1. An alignment mechanism for a lithographic machine wafer substrate comprising a body (1) characterised in that: The inside of the machine body (1) is internally mounted with a work platform (17), the rear side of the work platform (17) is fixedly connected with a mounting box (26), the inside rear side left end of the machine body (1) is mounted with a second motor (18), the output end of the second motor (18) is fixedly connected with a rotating long rod (20), the top left and right ends of the rotating long rod (20) are fixedly connected with a connecting rope (21), the far away sides of the two connecting ropes (21) are fixedly connected with a clamping plate (22), the bottom of the clamping plate (22) is slidably connected with the top of the work platform (17), the far away sides of the two clamping plates (22) are fixedly connected with a spring (23), the outside left end of the rotating long rod (20) is fixedly connected with a first gear (28), the inside of the mounting box (26) is rotatably connected with a bidirectional threaded rod (24), the left side of the bidirectional threaded rod (24) is fixedly connected with a second gear (27), the rear side of the second gear (27) is meshingly connected with the front side of the first gear (28), the outside left and right ends of the bidirectional threaded rod (24) are threadedly connected with a sliding square (25), the top of the sliding square (25) is mounted with a fan (19), the inside top of the machine body (1) is mounted with a cleaning mechanism (2), and the cleaning mechanism (2) is used for cleaning the surface of the work platform (17).

2. The wafer substrate alignment mechanism of claim 1 wherein: The cleaning mechanism (2) comprises a first motor (201), the first motor (201) is installed on the top left side of the machine body (1), the output end of the first motor (201) is fixedly connected with a rotating rod (203), the left and right ends of the rotating rod (203) are fixedly connected with a driving bevel gear (204), the inside top left and right ends of the machine body (1) are rotatably connected with a unidirectional threaded rod (207), the front side of the unidirectional threaded rod (207) is fixedly connected with a driven bevel gear (205), the front side of the driven bevel gear (205) is meshingly connected with the rear side of the driving bevel gear (204), the outside of the unidirectional threaded rod (207) is threadedly connected with a sliding rod (208), the bottom left and right ends of the sliding rod (208) are fixedly connected with a connecting rod (206), the bottom of the connecting rod (206) is fixedly connected with a cleaning brush (202), and the bottom of the cleaning brush (202) is slidably connected with the top of the work platform (17).

3. The alignment mechanism for a photolithography wafer substrate according to claim 1, characterized in that: The left end of the machine body (1) is provided with a receiving box (3), and the top of the receiving box (3) is provided with a top cover (4).

4. A wafer substrate alignment mechanism for a photolithography machine as claimed in claim 3, wherein: The top of the top cover (4) is fixedly connected with a fixed handle (5), and the outside of the fixed handle (5) is provided with a protective sleeve (6).

5. The alignment mechanism for a photolithography wafer substrate according to claim 1, characterized in that: The front side of the machine body (1) is provided with a connecting block (8), and the front side of the connecting block (8) is provided with an operating device (7).

6. The alignment mechanism for a photolithography wafer substrate according to claim 1, characterized in that: The front left top of the machine body (1) is provided with a clamping groove plate (12), and the inside of the clamping groove plate (12) is provided with a transparent square plate (11).

7. The alignment mechanism for a photolithography wafer substrate according to claim 1, characterized in that: The front side left end middle part of the machine body (1) is screw-connected with a fixing rod (15), and the outer side of the fixing rod (15) is mounted with a signboard (16).

8. The alignment mechanism for a photolithography wafer substrate according to claim 1, characterized in that: The front end left side of the machine body (1) is rotationally connected with a box door (13), the left side of the box door (13) is fixedly connected with a mounting handle (14), the top front side of the machine body (1) is fixedly connected with a mounting seat (10), and the top of the mounting seat (10) is mounted with a warning light (9).

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