Zinc-nickel alloy coating thickness control device

Abstract

The utility model discloses a zinc-nickel alloy coating thickness control device which comprises a supporting mechanism, a coating mechanism and a distance adjusting mechanism, the supporting mechanism comprises a working table, a copper sheet back plate suspended at the top of the working table, a plurality of base plates connected between the working table and the copper sheet back plate, and the coating mechanism, the coating mechanism comprises a ceiling connected with the top of the workbench and a plurality of ion sources penetrating through the top of the ceiling. According to the utility model, the target material is placed on the copper sheet back plate, and then the plug-in unit is installed at a proper height, so that the height of the magnetron sputtering head at the front side of the plug-in unit is roughly fixed, then the height of the magnetron sputtering head is finely adjusted up and down along the frame body, so that the magnetron sputtering head is suspended at a proper height, and then a plurality of ion emitting sources and a hose are opened as conveying media; and then the magnetron sputtering head controls the coating thickness of the target material, the structure is simple, the manufacturing difficulty and the manufacturing cost are reduced, and meanwhile follow-up maintenance is facilitated.

Description

Technical Field

[0001] This utility model relates to the field of coating technology, specifically a zinc-nickel alloy coating thickness control device. Background Technology

[0002] Vacuum coating is a technique for producing thin film materials using physical methods. In a vacuum chamber, atoms of the material are separated from a heating source and deposited onto the surface of the object being coated. This technology was first used in the production of optical lenses, such as those for marine telescopes. Later, its application was extended to other functional thin films, such as aluminum plating on record panels, decorative coatings, and surface modification of materials. Examples include imitation gold plating on watch cases, coating machine tools, and altering processing red hardness.

[0003] Application number CN201920102532.4 discloses a novel three-target magnetron sputtering coating machine, including a structure such as a second groove on the base. This invention achieves coating thickness control by adjusting the angle of the magnetron sputtering head and the distance between the substrate and the target. While this application allows for flexible adjustment of the magnetron sputtering head, the complex design of the adjustment structure leads to high manufacturing difficulty and cost, and subsequent maintenance is also challenging. Utility Model Content

[0004] This utility model aims to solve one of the technical problems existing in the prior art or related technologies.

[0005] Therefore, the technical solution adopted by this utility model is as follows:

[0006] A zinc-nickel alloy coating thickness control device includes a support mechanism, a coating mechanism, and a distance adjustment mechanism. The support mechanism includes a worktable, a copper back plate suspended above the worktable, and multiple pads connecting the worktable and the copper back plate. The coating mechanism includes a canopy connected to the top of the worktable, multiple ion sources penetrating the top of the canopy, a flexible tube connected to the bottom of the ion source, and a magnetron sputtering head connected to the bottom of the flexible tube. The distance adjustment mechanism includes a mounting plate connected to the bottom of the canopy, three plugs inserted into the mounting plate, a frame connected to the front end of the plugs, and a limiting kit sleeved on the outside of the magnetron sputtering head and slidably connected to the frame. The mounting plate has multiple insertion holes suitable for plug insertion.

[0007] By adopting the above technical solution, the target material is placed on the copper back plate, and then the plug is installed at a suitable height. This roughly fixes the height of the magnetron sputtering head on the front side of the plug. Then, the height of the magnetron sputtering head is finely adjusted up and down along the frame to make it suspend at a suitable height. Then, multiple ion sources are turned on, and the flexible tube is used as the delivery medium. The magnetron sputtering head then controls the coating thickness of the target material. The structure is simple, reducing manufacturing difficulty and cost, and also facilitating subsequent maintenance.

[0008] In a preferred embodiment, the present invention can be further configured as follows: multiple pads are spaced equally and arranged in a row, and the multiple pads are connected in series.

[0009] In a preferred embodiment, the present invention can be further configured as follows: multiple ion sources are arranged in a row with equal spacing, and the ion sources are snapped into the front side of the mounting plate.

[0010] In a preferred embodiment, the present invention can be further configured such that: the plug consists of a rectangular plate and a short shaft, the short shaft is mounted on the rear side of the rectangular plate, and the length of the short shaft is greater than the thickness of the mounting plate.

[0011] In a preferred embodiment, the present invention can be further configured such that multiple sockets are arranged in a matrix, and the sockets are located at the bottom of the ion source.

[0012] In a preferred embodiment, the present invention can be further configured such that: a suction mechanism is provided on the front side of the mounting plate, the suction mechanism includes a plurality of magnetic rings I embedded on the front side of the mounting plate and a magnetic ring II embedded on the rear side of the rectangular plate, the magnetic ring II and the magnetic ring I are magnetically attracted to each other, and the rear side of the magnetic ring II and the rear side of the rectangular plate are located on the same horizontal plane.

[0013] In a preferred embodiment, the present invention can be further configured such that: a plurality of magnetic rings are respectively sleeved on the front side of a plurality of sockets, and the front side of the magnetic rings is located on the same horizontal plane as the front side of the mounting plate.

[0014] By adopting the above technical solution, the beneficial effects achieved by this utility model are as follows:

[0015] In this invention, the target material is placed on a copper back plate, and then the plug is installed at a suitable height to roughly fix the height of the magnetron sputtering head on the front side of the plug. Then, the height of the magnetron sputtering head is finely adjusted up and down along the frame to suspend it at a suitable height. Then, multiple ion sources are turned on, and the flexible tube is used as the delivery medium. The magnetron sputtering head then controls the coating thickness of the target material. The structure is simple, reducing manufacturing difficulty and cost, and also facilitating subsequent maintenance. Attached Figure Description

[0016] Figure 1 This is a perspective view of the overall structure of this utility model;

[0017] Figure 2 This is a schematic diagram of the support mechanism and coating mechanism of this utility model;

[0018] Figure 3 This is a schematic diagram of the adjusting mechanism of this utility model;

[0019] Figure 4 This is a schematic diagram of the suction mechanism of this utility model.

[0020] Figure label:

[0021] 100. Support mechanism; 110. Workbench; 120. Copper back plate; 130. Pad plate;

[0022] 200. Coating mechanism; 210. Canopy; 220. Ion source; 230. Flexible tube; 240. Magnetron sputtering head;

[0023] 300. Adjustment mechanism; 310. Mounting plate; 320. Insert; 330. Frame; 340. Limiting kit; 350. Socket;

[0024] 400. Suction clamping mechanism; 410. Magnetic ring one; 420. Magnetic ring two. Detailed Implementation

[0025] To make the objectives, technical solutions, and advantages of this utility model clearer, the present utility model will be further described in detail below with reference to specific embodiments and accompanying drawings. It should be noted that, unless otherwise specified, the embodiments and features of the present utility model can be combined with each other.

[0026] It should be understood that these descriptions are merely exemplary and not intended to limit the scope of this invention.

[0027] The following describes, with reference to the accompanying drawings, some embodiments of a zinc-nickel alloy coating thickness control device provided by this utility model.

[0028] Example 1:

[0029] Combination Figure 1-4 As shown, the present invention provides a zinc-nickel alloy coating thickness control device, including a support mechanism 100, a coating mechanism 200 and an adjustment mechanism 300. The support mechanism 100 includes a worktable 110, a copper sheet back plate 120 suspended on the top of the worktable 110, and a plurality of pads 130 connected between the worktable 110 and the copper sheet back plate 120.

[0030] The coating mechanism 200 includes a canopy 210 connected to the top of the worktable 110, a plurality of ion sources 220 penetrating the top of the canopy 210, a flexible tube 230 connected to the bottom of the ion source 220, and a magnetron sputtering head 240 connected to the bottom of the flexible tube 230.

[0031] The distance adjustment mechanism 300 includes a mounting plate 310 connected to the bottom of the canopy 210, three plugs 320 inserted into the mounting plate 310, a frame 330 connected to the front end of the plugs 320, and a limiting kit 340 sleeved on the outside of the magnetron sputtering head 240 and slidably connected to the frame 330. The mounting plate 310 has a plurality of insertion holes 350 suitable for the plugs 320 to be inserted.

[0032] Furthermore, the multiple pads 130 are evenly spaced and arranged in a row, and the multiple pads 130 are connected in series. This layout design of multiple pads 130 can stably support the copper sheet back plate 120.

[0033] Furthermore, multiple ion sources 220 are arranged in a row with equal spacing. The ion sources 220 are snapped into the front side of the mounting plate 310. The layout design of the ion sources 220 allows multiple magnetron sputtering heads 240 to uniformly deposit a coating onto the target material.

[0034] Furthermore, the multiple sockets 350 are arranged in a matrix and are located at the bottom of the ion source 220. The layout design of the multiple sockets 350 provides conditions for flexible adjustment of the magnetron sputtering head 240.

[0035] Example 2:

[0036] Combination Figure 3-4 As shown, based on Embodiment 1, the plug-in 320 is composed of a rectangular plate and a short shaft. The short shaft is installed on the rear side of the rectangular plate. The length of the short shaft is greater than the thickness of the mounting plate 310. The shape design of the plug-in 320 allows it to be tightly inserted into the mounting plate 310.

[0037] Example 3:

[0038] Combination Figure 1 and Figure 4 As shown, in the above embodiment, the mounting plate 310 is provided with a suction mechanism 400 on the front side. The suction mechanism 400 includes a plurality of magnetic rings 410 embedded on the front side of the mounting plate 310 and a magnetic ring 420 embedded on the rear side of the rectangular plate. The magnetic ring 420 and the magnetic ring 410 are magnetically attracted to each other. The rear side of the magnetic ring 420 and the rear side of the rectangular plate are located on the same horizontal plane. The magnetic rings 410 and 420 cooperate to make the plug 320 firmly inserted into the mounting plate 310.

[0039] Furthermore, multiple magnetic rings 410 are respectively sleeved on the front side of multiple sockets 350. The front side of the magnetic rings 410 and the front side of the mounting plate 310 are located on the same horizontal plane. The layout design of the multiple magnetic rings 410 allows the plug-in 320 to fit seamlessly into the mounting plate 310.

[0040] The working principle and usage process of this utility model are as follows: When this device is put into actual use, the target material is placed on the copper sheet back plate 120, and then the plug-in 320 is installed at a suitable height. In this way, the height of the magnetron sputtering head 240 on the front side of the plug-in 320 is roughly fixed. Then, along the frame 330, the height of the magnetron sputtering head 240 is finely adjusted up and down to make it suspend at a suitable height. Then, multiple ion sources 220 are turned on, and the flexible tube 230 is used as the delivery medium. Then, the magnetron sputtering head 240 controls the coating thickness of the target material.

[0041] Although embodiments of the present invention have been shown and described, those skilled in the art will understand that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the present invention, the scope of which is defined by the claims and their equivalents.

Claims

1. A zinc-nickel alloy coating thickness control device, characterized in that, include: Support mechanism (100) includes a workbench (110), a copper sheet back plate (120) suspended above the workbench (110), and a plurality of pads (130) connecting the workbench (110) and the copper sheet back plate (120). The coating mechanism (200) includes a canopy (210) connected to the top of the worktable (110), a plurality of ion sources (220) penetrating the top of the canopy (210), a flexible tube (230) connected to the bottom of the ion source (220), and a magnetron sputtering head (240) connected to the bottom of the flexible tube (230). The distance adjustment mechanism (300) includes a mounting plate (310) connected to the bottom of the canopy (210), three plugs (320) inserted into the mounting plate (310), a frame (330) connected to the front end of the plugs (320), and a limiting kit (340) sleeved on the outside of the magnetron sputtering head (240) and slidably connected to the frame (330). The mounting plate (310) has a plurality of insertion holes (350) suitable for the plugs (320) to be inserted.

2. The zinc-nickel alloy coating thickness control device according to claim 1, characterized in that, Multiple pads (130) are arranged in a row with equal spacing, and multiple pads (130) are connected in series.

3. The zinc-nickel alloy coating thickness control device according to claim 1, characterized in that, Multiple ion sources (220) are arranged in a row with equal spacing, and the ion sources (220) are snapped into the front side of the mounting plate (310).

4. The zinc-nickel alloy coating thickness control device according to claim 1, characterized in that, The plug-in (320) consists of a rectangular plate and a short shaft, with the short shaft mounted on the rear side of the rectangular plate. The length of the short shaft is greater than the thickness of the mounting plate (310).

5. The zinc-nickel alloy coating thickness control device according to claim 1, characterized in that, Multiple sockets (350) are arranged in a matrix, and the sockets (350) are located at the bottom of the ion source (220).

6. The zinc-nickel alloy coating thickness control device according to claim 4, characterized in that, The mounting plate (310) is provided with a suction mechanism (400) on the front side. The suction mechanism (400) includes a plurality of magnetic rings (410) embedded on the front side of the mounting plate (310) and a magnetic ring (420) embedded on the rear side of the rectangular plate. The magnetic ring (420) is magnetically attracted to the magnetic ring (410), and the rear side of the magnetic ring (420) is on the same horizontal plane as the rear side of the rectangular plate.

7. The zinc-nickel alloy coating thickness control device according to claim 6, characterized in that, Multiple magnetic rings (410) are respectively sleeved on the front side of multiple sockets (350), and the front side of the magnetic rings (410) and the front side of the mounting plate (310) are located on the same horizontal plane.

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