Substrate cleaning unit and etching equipment
By adding a substrate cleaning unit to the etching equipment, and using an air extraction device and air curtain to treat acid gas and chemical film, the problem of water stains and mura on the substrate surface is solved, achieving more thorough substrate cleaning and improving product quality.
Patent Information
- Application Number
- CN202520145496.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-01-21
- Publication Date
- 2026-01-27
- Estimated Expiration
- 2035-01-21
AI Technical Summary
Existing water washing processes result in water stains and mura on the substrate surface, affecting product quality.
Adding a substrate cleaning unit to the etching equipment uses an air extraction device to remove acid gas outside the cleaning chamber, and uses an air curtain to thin or remove the surface chemical film from the substrate, thereby reducing acid chemical residue.
It effectively reduces the Mura problem on the substrate surface, improves product quality, ensures that the substrate is cleaned more thoroughly during water washing, and reduces chemical residue.
Smart Images
Figure CN223837571U_ABST
Abstract
Description
Technical Field
[0001] This utility model belongs to the field of etching technology, specifically relating to a substrate cleaning unit and etching equipment. Background Technology
[0002] In Al / Mo etching processes, acidic etching solutions are used. After etching, the substrate surface retains the acidic solution and acid fumes, necessitating a water washing process to remove these substances. However, existing water washing methods result in water stains (mura) on the substrate surface, affecting product quality. Utility Model Content
[0003] The purpose of this invention is to provide a substrate cleaning unit and etching equipment, which aims to solve the technical problem that water stains and murmurs remain on the substrate surface after existing water washing processes, affecting product quality.
[0004] To achieve the above objectives, the technical solution adopted by this utility model is as follows:
[0005] In a first aspect, the present invention provides a substrate cleaning unit, comprising: a cleaning chamber; an air extraction device disposed within the cleaning chamber, wherein the air extraction direction of the air extraction device is from bottom to top, and the air extraction device is configured to extract air in a direction away from the substrate; and an air curtain disposed within the cleaning chamber, wherein the air blowing direction of the air curtain is from top to bottom, and the air curtain is configured to blow air in a direction close to the substrate; wherein the air extraction direction from bottom to top is defined as including at least a vertically upward directional component, and the air blowing direction from top to bottom is defined as including at least a vertically downward directional component.
[0006] In some possible implementations, the air extraction device is suspended from the top of the cleaning chamber, or the air extraction device is installed on the side of the cleaning chamber.
[0007] In some possible implementations, the air extraction device is a single unit and covers the transport length of the substrate within the cleaning chamber; or, multiple air extraction devices are provided, and the multiple air extraction devices together cover the transport length of the substrate within the cleaning chamber.
[0008] In some possible implementations, multiple air curtains are provided, arranged along the conveying direction of the substrate and suspended at the bottom of the air extraction device, or installed on the side of the cleaning chamber.
[0009] In some possible implementations, the airflow direction of the air curtain is opposite to the conveying direction of the substrate. In some possible implementations, the airflow direction of the air curtain forms an angle greater than or equal to 90° and less than 180° with respect to the conveying direction of the substrate.
[0010] Optionally, the blowing direction of the air curtain forms an angle of 120° to 150° with the conveying direction of the substrate.
[0011] In some possible implementations, the air inlet pressure of the air curtain ranges from 0.01 MPa to 0.06 MPa;
[0012] Optionally, the air inlet pressure of the air curtain is 0.03 MPa.
[0013] In some possible implementations, the air curtain is provided with baffles on both sides of the substrate in the conveying direction, and there is no gap between the baffles and the air curtain.
[0014] In some possible implementations, the air extraction device is located above the air curtain, and the top of the baffle is connected to the bottom of the air extraction device.
[0015] In some possible implementations, the side of the baffle is connected to the side of the cleaning chamber.
[0016] Secondly, this utility model also provides an etching apparatus, comprising: an etching unit; a substrate cleaning unit as described in any of the above implementations, connected to the etching unit; and a water washing unit, connected to the substrate cleaning unit.
[0017] The substrate cleaning unit and etching equipment provided by this utility model have at least the following technical effects: Compared with the prior art, this utility model adds a substrate cleaning unit to the etching equipment. The substrate cleaning unit can be set between the etching unit and the water washing unit. In the substrate cleaning unit, the cleaning chamber is used to form an operating space and an installation space. The air extraction device can extract the acid gas accompanying the substrate coming out of the etching unit to the outside of the cleaning chamber, reducing the contact between acid gas and the substrate. The air curtain can blow away or remove the surface chemical film formed on the substrate coming out of the etching unit, so that the substrate can be cleaned more thoroughly when entering the water washing unit, reducing the residue of acidic chemical solution, reducing the Mura problem on the substrate surface, and improving product quality. Attached Figure Description
[0018] To more clearly illustrate the technical solutions in the embodiments of this utility model, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.
[0019] Figure 1 This is a schematic diagram of the structure of a substrate cleaning unit provided in an embodiment of the present invention;
[0020] Figure 2 This is a schematic diagram of the etching device provided in one embodiment of the present invention.
[0021] Explanation of reference numerals in the attached figures:
[0022] 1. Substrate cleaning unit; 10. Cleaning chamber; 20. Air extraction device; 30. Air curtain; 40. Baffle; 2. Etching unit; 3. Water washing unit; D. Substrate conveying direction; M. Chemical film. Detailed Implementation
[0023] To make the technical problems, technical solutions, and beneficial effects of this utility model clearer, the present utility model will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present utility model and are not intended to limit the present utility model.
[0024] It should be noted that when an element is referred to as "fixed to," "fixed," "connected to," "connected to," "set on," "set on," or "fixed to" another element, a central element may or may not be present. Furthermore, when an element is referred to as "connected to" or "connected to" another element, it can be interpreted, according to the conventional understanding of those skilled in the art, as a mechanical connection, electrical connection, communication connection, etc. In this document, terms such as "upper," "lower," "left," "right," "clockwise," and "counterclockwise," indicating orientation or positional relationships, are used for simplified description based on the accompanying drawings and are not limited to having a specific orientation or positional relationship. Terms such as "first," "second," and "third" are used to distinguish different objects and are not used to describe a specific order. "Multiple" refers to two or more items; "several" refers to one or more items.
[0025] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention pertains.
[0026] Please refer to the following: Figure 1 and Figure 2 The substrate cleaning unit and etching equipment provided in the embodiments of this utility model will now be described.
[0027] Please see Figure 1 This utility model provides a substrate cleaning unit 1, including: a cleaning chamber 10; an air extraction device 20 disposed in the cleaning chamber 10, the air extraction direction of the air extraction device 20 being from bottom to top, and the air extraction device 20 being configured to extract air away from the substrate; and an air curtain 30 disposed in the cleaning chamber 10, the air blowing direction of the air curtain 30 being from top to bottom, and the air curtain 30 being configured to blow air towards the substrate; wherein, the air extraction direction from bottom to top is defined as including at least a vertically upward direction component, and the air blowing direction from top to bottom is defined as including at least a vertically downward direction component.
[0028] It should be noted that the bottom-up suction direction can include both a vertically upward component and a horizontal component, in which case the suction direction is tilted relative to the vertical direction; the bottom-up suction direction can also include only a vertically upward component, in which case the suction direction is parallel to the vertical direction.
[0029] Similarly, the top-down blowing direction can include a vertically downward component and a horizontal component, in which case the blowing direction is tilted relative to the vertical direction; the top-down blowing direction can also include only a vertically downward component, in which case the blowing direction is parallel to the vertical direction.
[0030] Specifically, the cleaning chamber 10 can be fully enclosed or semi-enclosed. This facilitates the installation of the extraction device 20 and the air curtain 30, while also improving the efficiency of extraction and blowing, and reducing external interference when completely exposed. The extraction device 20 can be composed of conventional components such as air pumps, fans, and fan blades, as long as it has an extraction function. The cleaning chamber 10 has a corresponding exhaust port to discharge the acidic gases and other gases extracted by the extraction device 20, thus achieving a cleaning process. The air curtain 30 is a commonly used blowing device in the etching field.
[0031] The substrate cleaning unit 1 provided in this embodiment of the present invention has at least the following technical effects: Compared with the prior art, this embodiment of the present invention adds a substrate cleaning unit 1 to the etching equipment. The substrate cleaning unit 1 can be set between the etching unit 2 and the water washing unit 3. In the substrate cleaning unit 1, the cleaning chamber 10 is used to form an operating space and an installation space. The air extraction device 20 can extract the acid gas accompanying the substrate coming out of the etching unit 2 to the outside of the cleaning chamber 10, reducing the contact corrosion of the substrate by the acid gas. The air curtain 30 can blow away or remove the surface chemical film M formed on the substrate coming out of the etching unit 2, so that the substrate can be cleaned more thoroughly when entering the water washing unit 3, reducing the residue of acidic chemical solution, reducing the Mura problem on the substrate surface, and improving product quality.
[0032] Of course, the substrate cleaning unit 1 provided in this embodiment can also be set in other process positions of the etching equipment. The air extraction device 20 is used to extract the gas accompanying the substrate to the outside of the cleaning chamber 10, reducing the gas contact and corrosion of the substrate. The air curtain 30 can blow the surface film formed on the substrate thin or blow it away from the substrate, reducing the residue of the solution, reducing the Mura problem on the substrate surface, improving product quality, so as to achieve the purpose of thoroughly cleaning the substrate.
[0033] The specific structures of the air extraction device 20 and the air curtain 30 are illustrated below, but are not limited to the following embodiments.
[0034] In some embodiments, the suction device 20 is suspended from the top of the cleaning chamber 10, or the suction device 20 is installed on the side of the cleaning chamber 10. Specifically, the suction device 20 can be suspended from the top of the cleaning chamber 10 by ropes. For example, a lifting ring or hook can be provided on the suction device 20, and the lifting ring or hook can be tied with a rope to connect it to the top of the cleaning chamber 10. Of course, a lifting ring or hook also needs to be provided on the top of the cleaning chamber 10. The suction device 20 can also be fixedly suspended from the top of the cleaning chamber 10 by bolts, screws, or other locking devices.
[0035] In addition, the air extraction device 20 can also be fixedly installed on the side of the cleaning chamber 10 by bolts, screws or other locking parts, or the air extraction device 20 can be placed on the frame by setting a frame on the side of the cleaning chamber 10. The frame can be set on two opposite sides, and the two ends of the air extraction device 20 can be placed on the two frames respectively.
[0036] As can be seen, the air extraction device 20 has multiple installation methods, therefore, no specific restrictions are placed on the installation method of the air extraction device 20.
[0037] In some embodiments, the suction device 20 is integral and covers the transport length of the substrate within the cleaning chamber 10; or, multiple suction devices 20 are provided, and the multiple suction devices 20 collectively cover the transport length of the substrate within the cleaning chamber 10. Specifically, as Figure 1 As shown, the extraction device 20 can be an integral strip. A single extraction device 20 can cover the conveying length of the substrate in the cleaning chamber 10, thereby allowing more acid gas to be discharged and minimizing contact between acid gas and the substrate.
[0038] Of course, multiple air extraction devices 20 can be provided. Multiple air extraction devices 20 are arranged at intervals in a long strip. Multiple air extraction devices 20 can jointly cover the transmission length of the substrate in the cleaning chamber 10, thereby venting more acid gas and minimizing acid gas contact with the substrate.
[0039] like Figure 1As shown, in some embodiments, multiple air curtains 30 are provided, arranged along the conveying direction D of the substrate, and suspended at the bottom of the suction device 20, or installed on the side of the cleaning chamber 10. Specifically, the multiple air curtains 30 are spaced apart, which can blow the liquid film M as thin as possible or blow it away from the substrate, reducing the liquid residue on the substrate, so that the substrate can be cleaned more thoroughly in the water washing unit 3, reducing the substrate water stain Mura problem.
[0040] There are several ways to install the air curtain 30. For example, the air curtain 30 can be suspended from the bottom of the extraction device 20 by ropes. This can be achieved by installing lifting rings or hooks on the air curtain 30 and securing them with ropes to the bottom of the extraction device 20. Of course, the bottom of the extraction device 20 also needs to be equipped with lifting rings or hooks. Alternatively, the air curtain 30 can be fixed to the bottom of the extraction device 20 using bolts, screws, or other locking devices.
[0041] In addition, the air curtain 30 can also be fixedly installed on the side of the cleaning chamber 10 by bolts, screws and other locking parts, or the air curtain 30 can be placed on the frame by setting a frame on the side of the cleaning chamber 10. The frame can be set on two opposite sides, and the two ends of the air curtain 30 can be placed on the two frames respectively.
[0042] like Figure 1 As shown, in some embodiments, the blowing direction of the air curtain 30 is opposite to the conveying direction D of the substrate. It can be understood that the blowing direction of the air curtain 30 is opposite to the conveying direction D of the substrate, that is, the two are set at an angle greater than or equal to 90° and less than 180°, specifically 90°, 100°, 110°, 120°, 130°, 135°, 140°, 150°, 160°, 170°, 179°, etc. This setting can blow the liquid medicine film M on the substrate thinner or blow it away from the substrate to a greater extent.
[0043] For example, the blowing direction of the air curtain 30 is at an angle of 120° to 150° with the conveying direction D of the substrate. The inventors have found that within this range, the air curtain 30 has a good pushing effect on the liquid medicine film M, which can blow the liquid medicine film M to a smaller value range and is less likely to cause liquid medicine splashing and rebound. If the angle is less than 120° or greater than 150°, the thickness of the liquid medicine film M begins to increase, and it is easy to cause liquid medicine splashing and rebound.
[0044] In some embodiments, the air inlet pressure of the air curtain 30 ranges from 0.01 MPa to 0.06 MPa, specifically 0.01 MPa, 0.02 MPa, 0.03 MPa, 0.035 MPa, 0.04 MPa, 0.05 MPa, 0.06 MPa, etc. For example, the inventors have found that adjusting the air inlet pressure of the air curtain 30 to 0.03 MPa better assists the blowing effect of the air curtain 30, making it less likely to cause drug splashing and rebound while making the drug film M thinner.
[0045] To reduce the splashing of the medicine onto the substrate, in some embodiments, the air curtain 30 is provided with baffles 40 on both sides in the conveying direction D of the substrate, and there is no gap between the baffles 40 and the air curtain 30. In this embodiment, the bottom of the baffles 40 is basically flush with the bottom of the air curtain 30, so it will not adversely affect the blowing process. At the same time, the absence of gap between the baffles 40 and the air curtain 30 can provide a certain degree of shielding for the medicine, preventing it from splashing everywhere and reducing the amount of medicine splashing onto the substrate again, thus facilitating the subsequent water washing process of the substrate.
[0046] There are several ways to install the baffle 40. For example, the air extraction device 20 is located above the air curtain 30, and the top of the baffle 40 is connected to the bottom of the air extraction device 20. Specifically, the top of the baffle 40 can be fixed to the bottom of the air extraction device 20 by bolts, screws or other locking devices, or it can be fixed to the bottom of the air extraction device 20 by adhesive, snap-fit, binding or other methods.
[0047] For example, the side of the baffle 40 is connected to the side of the cleaning chamber 10. In this case, the top of the baffle 40 can be fixed to the bottom of the suction device 20, or it can be left unfixed to the bottom of the suction device 20; there is no restriction on this. The side of the baffle 40 can be fixed to the side of the cleaning chamber 10 by bolts, screws, or other fasteners, or it can be snapped onto the side of the cleaning chamber 10 by providing a snap-fit groove, or it can be installed on the side of the cleaning chamber 10 by providing a frame.
[0048] As can be seen, the baffle 40 has multiple installation methods, therefore, no specific restrictions are placed on the installation method of the baffle 40.
[0049] Please see Figure 2 This utility model provides an etching apparatus, including: an etching unit 2; a substrate cleaning unit 1 as described in any of the above embodiments, connected to the etching unit 2; and a water washing unit 3, connected to the substrate cleaning unit 1. It is understood that the etching apparatus may also include other conventional structures capable of performing the etching function, which will not be described in detail here.
[0050] Specifically, the substrate is first etched in etching unit 2, then transferred to substrate cleaning unit 1 for cleaning, and finally transferred to water washing unit 3 for water washing. Correspondingly, etching unit 2 may include an etching chamber, substrate cleaning unit 1 may include a cleaning chamber 10, and water washing unit 3 may include a water washing chamber. The etching chamber and cleaning chamber 10, as well as the cleaning chamber 10 and water washing chamber, are connected to each other to facilitate the smooth transfer of the substrate.
[0051] Of course, the etching unit 2, the substrate cleaning unit 1 and the water washing unit 3 can be directly connected or indirectly connected. That is, there can be other process units between the three, and there are no restrictions on this.
[0052] The etching apparatus provided in this embodiment of the present invention uses the substrate cleaning unit 1 as described in any of the above embodiments. The two have the same technical effect, and will not be described in detail here.
[0053] Furthermore, when the substrate cleaning unit 1 is used in the etching equipment, it may not follow the process sequence from the etching unit 2 to the water washing unit 1. That is, it can be set in other process locations to achieve the effect of thoroughly cleaning the substrate.
[0054] It is understood that the parts in the above embodiments can be freely combined or deleted to form different combined embodiments. The specific contents of each combined embodiment will not be repeated here. After this description, it can be considered that the specification has recorded each combined embodiment and can support different combined embodiments.
[0055] The above description is only a preferred embodiment of the present utility model and is not intended to limit the present utility model. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present utility model should be included within the protection scope of the present utility model.
Claims
1. A substrate cleaning unit, characterized in that, include: Clean chamber (10); An air extraction device (20) is disposed within the cleaning chamber (10), the air extraction direction of the air extraction device (20) is from bottom to top, and the air extraction device (20) is configured to extract air away from the substrate; and An air curtain (30) is provided in the cleaning chamber (10). The air curtain (30) blows air from top to bottom and is configured to blow air towards the substrate. The upward air extraction direction is defined as including at least a vertically upward direction component, and the downward air blowing direction is defined as including at least a vertically downward direction component.
2. The substrate cleaning unit according to claim 1, characterized in that, The air extraction device (20) is suspended from the top of the cleaning chamber (10), or the air extraction device (20) is installed on the side of the cleaning chamber (10).
3. The substrate cleaning unit according to claim 1, characterized in that, The air extraction device (20) is an integral unit and covers the transmission length of the substrate in the cleaning chamber (10); or, multiple air extraction devices (20) are provided, and multiple air extraction devices (20) together cover the transmission length of the substrate in the cleaning chamber (10).
4. The substrate cleaning unit according to claim 1, characterized in that, Multiple air curtains (30) are provided, and the multiple air curtains (30) are arranged along the conveying direction of the substrate and are suspended at the bottom of the air extraction device (20) or installed on the side of the cleaning chamber (10).
5. The substrate cleaning unit according to claim 1 or 4, characterized in that, The blowing direction of the air curtain (30) is opposite to the conveying direction of the substrate; the blowing direction of the air curtain (30) and the conveying direction of the substrate form an angle greater than or equal to 90° and less than 180°.
6. The substrate cleaning unit according to claim 5, characterized in that, The blowing direction of the air curtain (30) forms an angle of 120° to 150° with the conveying direction of the substrate.
7. The substrate cleaning unit according to claim 5, characterized in that, The air inlet pressure range of the air curtain (30) is 0.01MPa to 0.06MPa.
8. The substrate cleaning unit according to claim 1 or 4, characterized in that, The air curtain (30) has baffles (40) on both sides of the substrate in the conveying direction, and there is no gap between the baffles (40) and the air curtain (30).
9. The substrate cleaning unit according to claim 8, characterized in that, The air extraction device (20) is located above the air curtain (30), the top of the baffle (40) is connected to the bottom of the air extraction device (20), and the side of the baffle (40) is connected to the side of the cleaning chamber (10).
10. An etching apparatus, comprising: Etching unit (2); The substrate cleaning unit (1) as described in any one of claims 1 to 9 is connected to the etching unit (2); as well as The water washing unit (3) is connected to the substrate cleaning unit.