Vacuum magnetron sputtering source cylindrical target device

Abstract

The utility model provides a vacuum magnetron sputtering source cylindrical target material device which comprises a cylindrical target material which can rotate and is arranged on a target back pipe; and the driving motor is used for driving the target and the self-cleaning anode baffle to rotate. The self-cleaning anode baffle and the anode protective cover are arranged on the outer side of the target material and are prevented from being polluted by other target materials; the self-cleaning anode baffle executing mechanism is connected to the self-cleaning anode baffle and used for controlling opening and closing of the self-cleaning anode baffle. The magnetic core angle adjusting mechanism is used for adjusting the angle of the cathode magnetic core on line; the furnace body sealing flange and the insulating flange are respectively used for realizing vacuum sealing and electric insulation; and the working gas pipe is used for introducing working gas. Through a series of innovative designs, the problems of target material pollution, vacuum leakage, inconvenience in magnetic field adjustment and the like in the prior art are solved, the coating quality and the production efficiency are improved, the operation flexibility and reliability of equipment are enhanced, and the production cost is reduced. The driving problem of the target material and the self-cleaning anode baffle plate is solved by utilizing positive and negative rotation of one motor.

Description

Technical Field

[0001] This utility model relates to the field of vacuum magnetron sputtering technology, specifically to a cylindrical target device for vacuum magnetron sputtering source. Background Technology

[0002] In vacuum magnetron sputtering coating technology, multiple targets are typically placed in the vacuum chamber to meet different process requirements. These targets operate at different times according to process needs, and targets in non-operating states are susceptible to contamination by sputtered materials from other operating targets. This contamination not only degrades the performance of the target but may also adversely affect the subsequent coating quality.

[0003] With the continuous advancement of technology, the requirements for coating products and processes are becoming increasingly stringent. Achieving effective protection of non-working targets and preventing contamination without disrupting the vacuum has become a crucial requirement for improving the quality of coating products. Simultaneously, optimizing equipment structure and enhancing its stability and adaptability are also issues that need to be addressed in this field.

[0004] The shortcomings of existing technology:

[0005] 1. Cross-contamination of target materials:

[0006] In existing vacuum magnetron sputtering deposition equipment, multiple targets are typically configured to meet different process requirements. However, since the working time of each target is different, some targets are susceptible to contamination by sputtered materials from other working targets when they are not in operation.

[0007] This contamination can lead to a deterioration in the performance of the target material, thereby affecting the quality and consistency of subsequent coatings.

[0008] 2. Lack of effective pollution prevention measures:

[0009] Current technology cannot provide a simple and effective way to protect the target from contamination when it is not in operation, especially since it is difficult to effectively shield the target without disrupting the vacuum environment.

[0010] The lack of a protective mechanism that can be automatically or manually controlled when not in operation makes the target material highly susceptible to contamination in environments where multiple targets coexist.

[0011] 3. Risk of vacuum leakage:

[0012] In existing technologies, the transmission between the atmosphere and vacuum often cannot completely avoid the problem of vacuum leakage, which poses a challenge to maintaining a stable vacuum environment.

[0013] Traditional transmission methods may cause pressure fluctuations within the vacuum chamber, which in turn can affect the stability and quality of the coating process.

[0014] 4. Inconvenient magnetic field adjustment:

[0015] For magnetron sputtering sources, adjusting the angle of the working magnetic field of the magnetrons is crucial for optimizing sputtering performance. However, in existing equipment, this adjustment typically requires disrupting the vacuum environment, which not only increases operational complexity but also reduces production efficiency.

[0016] Therefore, existing technologies have shortcomings and need further improvement. Utility Model Content

[0017] To address the problems existing in the prior art, this utility model provides a cylindrical target device for vacuum magnetron sputtering source.

[0018] To achieve the above objectives, the specific solution of this utility model is as follows:

[0019] This utility model provides a cylindrical target device for a vacuum magnetron sputtering source, comprising a vacuum chamber and at least one target unit disposed therein, wherein the target unit includes:

[0020] Cylindrical target material, mounted on the target back tube, is rotatable;

[0021] The drive motor is connected to the target back tube through a static seal transmission or a dynamic seal transmission mechanism to drive the target material to rotate;

[0022] Self-cleaning anode baffles and anode protective covers are movably installed on the outside of the target material. They can rotate or translate within the vacuum chamber to shield the target material, preventing it from being contaminated by other target materials when not in operation.

[0023] The self-cleaning anode baffle actuator is connected to the self-cleaning anode baffle via a static sealing transmission or a dynamic sealing transmission mechanism, and is used to control the opening and closing of the self-cleaning anode baffle.

[0024] The core angle adjustment mechanism is located outside the vacuum chamber and is used to adjust the angle of the cathode core online.

[0025] The furnace body sealing flange and insulating flange respectively achieve vacuum sealing and electrical insulation;

[0026] Working gas tube, used to introduce working gas;

[0027] Mask plates are used to shield areas where splashing is not required.

[0028] When the drive motor rotates in the forward direction, the target material is in working condition and rotates. When it rotates in the reverse direction, the self-cleaning anode baffle actuator drives the self-cleaning anode baffle to close and cooperate with the anode protective cover to shield the target material.

[0029] Furthermore, the device also includes a cooling water inlet pipe and a cooling water outlet pipe, which are connected to the target back pipe for circulating cooling water to cool the target material.

[0030] Furthermore, the static sealing transmission mechanism includes a magnetic coupling seal or a bellows seal structure, and the dynamic sealing transmission mechanism includes a magnetic fluid seal, a skeleton seal, and a mechanical seal, with the transmission between the atmosphere and vacuum achieved through the furnace body sealing flange.

[0031] Furthermore, it also includes a target back tube rotation speed sensor, which is set on the side of the target back tube to monitor the rotation speed of the target material in real time.

[0032] Furthermore, the self-cleaning anode baffle actuator and the target back tube rotation actuator are linked by a linkage and gear mechanism, and the opening and closing of the self-cleaning anode baffle and the rotation of the target material are controlled by the forward and reverse rotation of the drive motor, respectively.

[0033] Furthermore, the core angle adjustment mechanism includes a manual knob or an electric drive device for adjusting the angle or position of the cathode core under vacuum conditions.

[0034] Furthermore, the self-cleaning anode baffle is equipped with a self-cleaning anode baffle zero-point signal sensor to determine the initial closed position of the self-cleaning anode baffle.

[0035] Furthermore, the device also includes a cathode power-on mechanism, which is connected to the cathode core through the furnace body insulation flange.

[0036] Furthermore, the device also includes a core zero-point signal sensor, which is mounted on the side of the cathode core to determine the zero-point position of the cathode core.

[0037] The technical solution of this utility model has the following beneficial effects:

[0038] 1. Prevent target contamination:

[0039] By using a self-cleaning anode baffle (11) to shield the target material when it is not in operation, the target material is effectively prevented from being contaminated by sputtering materials from other working targets. This design significantly reduces cross-contamination between targets and improves the quality and consistency of the coating.

[0040] 2. Improve product yield:

[0041] The self-cleaning anode baffle not only protects the target material from contamination but also allows it to self-clean when not in use. This ensures the purity of the target surface, thereby improving the yield of the final product.

[0042] 3. Prevent vacuum leakage:

[0043] All transmissions between the atmosphere and the vacuum employ static sealing technology or dynamic sealing transmission. For example, the connections of components such as the drive motor (1) and cooling water inlet and outlet pipes (2, 3) are all statically sealed, which effectively avoids vacuum leakage problems and ensures the stability of the vacuum environment.

[0044] 4. Convenient magnetic field adjustment:

[0045] The core angle adjustment mechanism (10) allows the operator to adjust the working magnetic field angle of the cathode core (12) online to adapt to different process requirements. This method is both convenient and efficient, and can be adjusted without disrupting the vacuum environment, greatly improving operational flexibility and production efficiency. Attached Figure Description

[0046] Figure 1 This is a cross-sectional view of the present invention;

[0047] Figure 2 yes Figure 1 A magnified view of a portion of the image;

[0048] Figure 3 This is a perspective view of the present invention;

[0049] Figure 4 This is another perspective view of the present invention;

[0050] Figure 5 This is a top view of the present invention.

[0051] Attached image captions:

[0052] 1. Drive motor; 2. Cooling water inlet pipe; 3. Cooling water outlet pipe; 4. Self-cleaning anode baffle actuator; 5. Target back tube rotation actuator; 6. Target back tube rotation speed sensor; 7. Furnace body insulation flange; 8. Furnace body sealing flange; 9. Cathode power-on mechanism; 10. Core angle adjustment mechanism; 11. Self-cleaning anode baffle; 12. Cathode core; 13. Target back tube; 14. Self-cleaning anode baffle zero-point signal sensor; 15. Core zero-point signal sensor; 16. Working air pipe; 17. Mask plate; 18. Anode protective cover. Detailed Implementation

[0053] The present invention will now be described in further detail with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present invention and not intended to limit it. Furthermore, it should be noted that, for ease of description, the accompanying drawings show only the parts relevant to the present invention, not the entire structure.

[0054] In the description of this utility model, unless otherwise explicitly specified and limited, the terms "connected," "linked," and "fixed" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0055] In this invention, unless otherwise explicitly specified and limited, "above" or "below" the second feature can include direct contact between the first and second features, or contact between the first and second features through another feature between them. Furthermore, "above," "over," and "on top" of the second feature includes the first feature directly above or diagonally above the second feature, or simply indicates that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature includes the first feature directly below or diagonally below the second feature, or simply indicates that the first feature is at a lower horizontal level than the second feature.

[0056] In the description of this embodiment, the terms "upper," "lower," "front," "rear," "left," and "right," etc., refer to the orientation or positional relationship shown in the accompanying drawings. They are used only for ease of description and simplification of operation, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model. In addition, the terms "first" and "second" are only used for distinction in description and have no special meaning.

[0057] Combination Figures 1-5 As shown, this utility model provides a cylindrical target device for a vacuum magnetron sputtering source, including a vacuum chamber and at least one target unit disposed therein, wherein the target unit includes:

[0058] A cylindrical target is rotatably mounted on the target back tube 13;

[0059] The drive motor 1 is connected to the target back tube 13 through a static sealed transmission mechanism and is used to drive the target material to rotate.

[0060] The self-cleaning anode baffle 11 and anode protective cover 18 are movably disposed on the outside of the target material and rotate or translate in the vacuum chamber to shield the target material. They are used to shield the target material when it is not in operation to prevent it from being contaminated by other target materials.

[0061] The self-cleaning anode baffle actuator 4 is connected to the self-cleaning anode baffle 11 via a static sealing transmission or a dynamic sealing transmission mechanism, and is used to control the opening and closing of the self-cleaning anode baffle 11.

[0062] The core angle adjustment mechanism 10 is located outside the vacuum chamber and is used to adjust the angle of the cathode core 12 online.

[0063] The furnace body sealing flange 8 and the insulating flange 7 respectively achieve vacuum sealing and electrical insulation;

[0064] Working gas tube 16 is used to introduce working gas;

[0065] Mask plate 17 is used to shield areas where splashing is not required;

[0066] When the drive motor 1 rotates in the forward direction, the target material is in working condition and rotates. When it rotates in the reverse direction, the self-cleaning anode baffle actuator 4 drives the self-cleaning anode baffle 11 to close and cooperate with the anode protective cover 18 to shield the target material.

[0067] The device also includes a cooling water inlet pipe 2 and a cooling water outlet pipe 3, which are connected to the target back pipe for circulating cooling water to cool the target material.

[0068] The static sealing transmission mechanism includes a magnetic coupling seal or a bellows seal structure. The dynamic sealing transmission mechanism includes a magnetic fluid seal, a skeleton seal, and a mechanical seal. The transmission between the atmosphere and vacuum is achieved through the furnace body sealing flange 8.

[0069] It also includes a target back tube rotation speed sensor 6, which is set on the side of the target back tube 13 to monitor the rotation speed of the target material in real time.

[0070] The self-cleaning anode baffle actuator 4 and the target back tube rotation actuator 5 are linked by a linkage and gear mechanism. The opening and closing of the self-cleaning anode baffle 11 and the rotation of the target material are controlled by the forward and reverse rotation of the drive motor 1, respectively.

[0071] The core angle adjustment mechanism 10 includes a manual knob or an electric drive device for adjusting the angle or position of the cathode core 12 in a non-vacuum state.

[0072] The self-cleaning anode baffle 11 is equipped with a self-cleaning anode baffle zero-point signal sensor 14, which is used to determine the initial closed position of the self-cleaning anode baffle 11.

[0073] The device also includes a cathode power supply mechanism 9, which is connected to the cathode core 12 through the furnace body insulating flange 7.

[0074] The device also includes a core zero-point signal sensor 15, which is mounted on the side of the cathode core 12 to determine the zero-point position of the cathode core 12.

[0075] The principle of this utility model is as follows:

[0076] Core Mechanism

[0077] Based on magnetron sputtering technology, a rotating target surface is bombarded by plasma confined by a magnetic field in a vacuum environment, sputtering target atoms to deposit onto a substrate to form a thin film. This invention optimizes target utilization, cleaning efficiency, and magnetic field distribution stability through innovative designs such as a rotatable cylindrical target, a self-cleaning baffle linkage mechanism, and online magnetic core adjustment.

[0078] Step-by-step workflow

[0079] 1. Vacuum environment and target start-up

[0080] The vacuum chamber is evacuated to a preset vacuum level, and the target material is subjected to a negative high voltage (-300V to -800V) through the cathode electrification mechanism 9 to form a plasma environment.

[0081] The drive motor 1 rotates in the forward direction, driving the cylindrical target to rotate at a uniform speed (adjustable speed) through a static sealing transmission mechanism (magnetic coupling / bellows seal) or (dynamic sealing transmission mechanism including magnetohydrodynamic seal, skeleton seal, mechanical seal), avoiding local overheating and improving the etching uniformity of the target.

[0082] 2. Magnetic field confinement and sputtering deposition

[0083] The cathode core 12 forms a closed magnetic field behind the target material, which constrains the electron movement path in the plasma, enhances ionization efficiency, and increases sputtering rate.

[0084] The atoms on the target surface are bombarded and sputtered by high-energy ions, and the process gas (such as argon) input through the working gas pipe 16 participates in the reaction and is deposited on the substrate surface to form a film.

[0085] 3. Self-cleaning baffle linkage protection

[0086] When drive motor 1 rotates in the reverse direction, it is triggered by the linkage / gear mechanism:

[0087] The self-cleaning anode baffle actuator 4 drives the self-cleaning anode baffle 11 and the anode protective cover 18 to close, completely covering the surface of the target material and preventing residual pollutants in the vacuum chamber from adhering to the target material.

[0088] The closed position of the baffle is calibrated by the zero-point signal sensor 14 to ensure the sealing performance.

[0089] 4. Online adjustment and optimization of magnetic core

[0090] The angle or position of the cathode core 12 can be adjusted by the core angle adjustment mechanism 10 (motor driven) outside the vacuum chamber without disrupting the vacuum, thereby changing the magnetic field distribution pattern and adapting to different sputtering process requirements.

[0091] 5. Cooling and Thermal Management

[0092] Cooling water inlet pipe 2 and cooling water outlet pipe 3 circulate cooling water to force cooling of the target back tube, maintaining the working temperature of the target material (usually ≤80℃) and preventing high-temperature deformation or material failure.

[0093] 6. Technological advantages are evident.

[0094] High-efficiency target utilization: The rotation of cylindrical targets ensures uniform distribution of the etching area, increasing the utilization rate to over 80% (compared to approximately 30% for traditional planar targets).

[0095] Pollution control: The motor's forward and reverse rotation is linked to the opening and closing of the baffle, enabling automatic switching between the working and cleaning states of the target material, reducing the frequency of manual maintenance.

[0096] Magnetic field stability: Online core adjustment avoids repeated vacuum cavity breakage, ensuring consistent magnetic field parameters and guaranteeing coating quality.

[0097] Sealing reliability: The static sealing transmission mechanism (magnetic coupling / bellows seal) or (dynamic sealing transmission mechanism including magnetohydrodynamic seal, skeleton seal, mechanical seal) is used to isolate the atmospheric and vacuum environment, preventing leakage from causing process failure.

[0098] The above description is only a preferred embodiment of the present utility model and does not limit the scope of the present utility model. All equivalent structural transformations made under the present utility model concept and based on the contents of the present utility model specification and drawings, or direct / indirect applications in other related technical fields, are included within the protection scope of the present utility model.

Claims

1. A cylindrical target arrangement for a vacuum magnetron sputter source, characterized in that The device comprises a vacuum chamber and at least one target unit arranged in the vacuum chamber, wherein the target unit comprises: a cylindrical target rotatably mounted on a target backing tube; a driving motor connected to the target backing tube through a static sealing transmission or a dynamic sealing transmission mechanism for driving the target to rotate; a self-cleaning anode baffle and an anode shield movably arranged outside the target and rotating or translating in the vacuum chamber to shield the target, for shielding the target in a non-working state and preventing the target from being contaminated by other targets; a self-cleaning anode baffle actuator connected to the self-cleaning anode baffle through a static sealing transmission or a dynamic sealing transmission mechanism for controlling the opening and closing of the self-cleaning anode baffle; a magnetic core angle adjustment mechanism arranged outside the vacuum chamber for online adjustment of the angle of the cathode magnetic core; a furnace body sealing flange and an insulating flange for realizing vacuum sealing and electrical insulation, respectively; a working gas pipe for introducing working gas; a mask plate for shielding areas that do not need to be sputtered; wherein when the driving motor rotates in a forward direction, the target is in a working state and rotates, and when the driving motor rotates in a reverse direction, the self-cleaning anode baffle actuator drives the self-cleaning anode baffle to close and cooperate with the anode shield to shield the target.

2. The device of claim 1, wherein the device further comprises a cooling water inlet pipe and a cooling water outlet pipe connected to the target backing tube for circulating cooling water to cool the target.

3. The apparatus of claim 1, wherein, The static sealing transmission mechanism comprises a magnetic coupling seal or a bellows seal structure, and the dynamic sealing transmission mechanism comprises a magnetic fluid seal, a skeleton seal, or a mechanical seal, which realizes transmission between the atmosphere and the vacuum space through the furnace body sealing flange.

4. The apparatus of claim 1, wherein, The device further comprises a target backing tube rotation speed sensor arranged on the side of the target backing tube for real-time monitoring of the rotation speed of the target.

5. The apparatus of claim 1, wherein, The self-cleaning anode baffle actuator and the target backing tube rotation actuator are connected through a connecting rod and a gear mechanism, and the opening and closing of the self-cleaning anode baffle and the rotation of the target are controlled by the forward and reverse rotation of the driving motor, respectively.

6. The apparatus of claim 1, wherein, The magnetic core angle adjustment mechanism comprises a manual knob or an electric drive device for adjusting the angle or position of the cathode magnetic core in a vacuum state.

7. The apparatus of claim 1, wherein, The self-cleaning anode baffle is provided with a self-cleaning anode baffle zero point signal sensor for determining the initial closing position of the self-cleaning anode baffle.

8. The apparatus of claim 1, wherein, The device further comprises a cathode upper electrode mechanism connected to the cathode magnetic core through the furnace body insulating flange.

9. The device of claim 1, wherein the device further comprises a magnetic core zero point signal sensor mounted on the side of the cathode magnetic core for determining the zero point position of the cathode magnetic core.

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