Rotating device and wafer detection system

Abstract

The utility model relates to the technical field of wafer detection, and particularly discloses a rotating device and a wafer detection system, the rotating device comprises a base and a rotating member, the rotating member can be rotatably arranged on the base around a rotating axis and can be close to or far away from the base along the extension direction of the rotating axis; in the state that the rotating piece is far away from the base, a gap is formed between the rotating piece and the base; when the rotating piece is close to the base, the rotating piece abuts against the base. When the rotating piece abuts against the base, a gas cavity is formed between the rotating piece and the base, and the gas cavity is communicated with an external gas source. In the rotating process of the rotating piece relative to the base, abrasion between the rotating piece and the base can be effectively avoided, the accuracy of the rotating angle between the rotating piece and the base is guaranteed, the gradient between the rotating piece and the base is not prone to change, and the positioning accuracy is guaranteed.

Description

TECHNICAL FIELD

[0001] The utility model relates to wafer detection technical field especially relates to a rotating device and wafer detection system. BACKGROUND

[0002] Wafer automatic detection equipment has wafer positioning function, under normal circumstances, wafer is adsorbed on suction disc, and the suction disc is connected with the rotating shaft, and the rotating shaft is rotatably connected with the carrier seat, and when using, the wafer is placed behind the suction disc, and the deflection angle of the suction disc relative to the carrier seat is adjusted, so that the wafer coordinates and the proposed coordinates of the wafer automatic detection equipment are coincided, so as to achieve accurate positioning and improve the detection precision.

[0003] In order to ensure the fluency of rotation, there is a gap between the suction disc and the carrier seat along the axis direction of the rotating shaft, so that the gravity of the suction disc is borne by the bearing, when the suction disc rotates, the bearing between the rotating shaft and the carrier seat is subjected to the radial force and the axial force at the same time, and is easy to wear, and in the long-term use process, the wear becomes more and more serious, so that the angle of rotation of the suction disc relative to the carrier seat deviates, and the suction disc also deviates relative to the carrier seat, finally the positioning accuracy and the detection accuracy are reduced.

[0004] Therefore, it is urgent to research a rotating device and wafer detection system to solve the above problems. UTILITY MODEL CONTENTS

[0005] The utility model aims at providing a rotating device and wafer detection system to solve the problem that the bearing between the rotating shaft and the carrier seat is easy to wear in the prior art, which reduces the positioning of the wafer and reduces the detection accuracy.

[0006] In order to achieve the above purpose, the utility model adopts the following technical scheme:

[0007] The rotating device comprises:

[0008] A base;

[0009] A rotating part, which is rotatably arranged on the base along the extension direction of the rotating shaft, and is capable of approaching or moving away from the base along the extension direction of the rotating shaft; when the rotating part moves away from the base, a gap is formed between the rotating part and the base; when the rotating part approaches the base, the rotating part abuts against the base;

[0010] When the rotating part abuts against the base, a gas cavity is formed between the rotating part and the base, and the gas cavity is communicated with an external gas source.

[0011] As an alternative technical solution of the rotating device, the bottom is provided with a groove on the side facing the rotating part. When the rotating part abuts against the bottom, the side of the rotating part close to the bottom can block the opening of the groove to enclose the gas cavity.

[0012] The bottom is provided with a gas inlet channel communicating with the gas cavity. The gas inlet channel is in communication with an external gas source, so that the external gas source can pass compressed gas into the gas cavity.

[0013] The bottom is provided with a gas outlet channel communicating with the gas cavity. The gas outlet channel is in communication with an external gas source, so that the external gas source can draw the gas cavity to a negative pressure state.

[0014] As an alternative technical solution of the rotating device, the bottom is a disc structure, and the bottom has a first channel. The rotating device further comprises a mounting seat and a rotating shaft. The mounting seat is fixedly connected with the bottom and at least partially located in the first channel. The rotating shaft is arranged in the mounting channel of the mounting seat and one end thereof is connected with the rotating part. The rotating shaft can rotate around its own axis and can reciprocate along the direction of its own axis relative to the mounting seat. The axis of the rotating shaft and the rotating axis coincide.

[0015] As an alternative technical solution of the rotating device, the rotating device further comprises a first linear bearing arranged between the rotating shaft and the mounting seat.

[0016] As an alternative technical solution of the rotating device, the rotating part is a disc structure, and the rotating part has a second channel communicating with the first channel. The rotating shaft comprises a shaft body and an end cover arranged at one end of the shaft body. The outer diameter of the end cover is greater than the inner diameter of the second channel. The shaft body is connected and matched with the first linear bearing. The end cover is connected with the rotating part and located on the side of the rotating part away from the bottom.

[0017] As an alternative technical solution of the rotating device, the gas cavity is annular and surrounds the outer periphery of the first channel.

[0018] As an alternative technical solution of the rotating device, the rotating device further comprises a limiting part. The limiting part comprises a limiting seat and a limiting part arranged on the limiting seat. The limiting seat is fixedly connected with the bottom and located beside the rotating part. The limiting part is located on the side of the rotating part away from the bottom.

[0019] As an alternative technical solution of the rotating device, the rotating device further comprises a driving mechanism. The driving mechanism is arranged on the bottom, and the output end of the driving mechanism is in transmission connection with the rotating part and is used for driving the rotating part to rotate relative to the bottom.

[0020] As an alternative technical solution of the rotating device, the driving mechanism comprises:

[0021] The driving assembly is capable of reciprocating along a direction perpendicular to the rotation axis;

[0022] The power input end of the transmission assembly is connected with the output end of the driving assembly, and the power output end of the transmission assembly is connected with the rotating member;

[0023] The transmission assembly comprises:

[0024] The first connecting rod is hingedly connected with the output end of the driving assembly at one end, and is provided with a second linear bearing at the other end;

[0025] The second connecting rod is hingedly connected with the rotating member at one end, and is provided with a pin shaft at the other end, the pin shaft is arranged in the second linear bearing, and the first connecting rod and the second connecting rod are capable of relative rotation with the pin shaft as the axis.

[0026] The wafer detection system comprises a chuck, a stage base and the rotating device of any one of the above technical solutions, the base of the rotating device is movably arranged in the stage base along the vertical direction, and the chuck is arranged on the rotating member and is capable of synchronous movement with the rotating member.

[0027] The wafer detection system comprises a chuck, a stage base and the rotating device of any one of the above technical solutions, the base of the rotating device is movably arranged in the stage base along the vertical direction, and the chuck is arranged on the rotating member and is capable of synchronous movement with the rotating member.

[0028] The wafer detection system comprises a chuck, a stage base and the rotating device of any one of the above technical solutions, the base of the rotating device is movably arranged in the stage base along the vertical direction, and the chuck is arranged on the rotating member and is capable of synchronous movement with the rotating member.

[0029] The wafer detection system comprises a chuck, a stage base and the rotating device of any one of the above technical solutions, the base of the rotating device is movably arranged in the stage base along the vertical direction, and the chuck is arranged on the rotating member and is capable of synchronous movement with the rotating member. BRIEF DESCRIPTION OF DRAWINGS

[0030] Figure 1 It is a structure schematic view of a first visual angle of a wafer detection system in the embodiment of the utility model;

[0031] Figure 2 It is a structure schematic view of a second visual angle of a wafer detection system in the embodiment of the utility model;

[0032] Figure 3 It is a structure schematic view of a first visual angle of a wafer detection system in the embodiment of the utility model; Figure 2 It is a sectional view along A-A direction in the embodiment of the utility model;

[0033] Figure 4 It is an enlarged view of J in the embodiment of the utility model; Figure 3

[0034] Figure 5 It is a structure schematic view of a rotating device in the embodiment of the utility model;

[0035] Figure 6 It is an enlarged view of K in the embodiment of the utility model; Figure 5

[0036] Figure 7 It is a structure schematic view of a base in the embodiment of the utility model;

[0037] Figure 8 It is a structure schematic view of a driving mechanism in the embodiment of the utility model.

[0038] In the figure:

[0039] 100, base; 110, groove; 120, gas inlet channel; 130, gas outlet channel; 140, first channel;

[0040] 200, rotating member; 210, second channel;

[0041] 300, mounting seat; 310, mounting cylinder; 320, mounting ring;

[0042] 400, rotating shaft; 410, shaft body; 420, end cover;

[0043] 510, first linear bearing; 520, second linear bearing; 521, pin shaft;

[0044] 600, limiting member; 610, limiting seat; 620, limiting part;

[0045] 700, driving mechanism; 710, first connecting rod; 720, second connecting rod; 730, driving member; 740, lead screw; 750, moving member;

[0046] 810, stage seat; 820, suction cup. DETAILED DESCRIPTION​​

[0047] The technical solutions of the present application will be described clearly and completely in connection with the drawings. Obviously, the described embodiments are some of the embodiments of the present application, but not all the embodiments. Based on the embodiments of the present application, all the other embodiments obtained by those skilled in the art without creative labor fall within the scope of the present application.

[0048] In the description of the present application, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer" and the like indicate the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the devices or elements referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the present application. In addition, the terms "first", "second", are only for the purpose of description, and cannot be understood as indicating or implying relative importance. Among them, the terms "first position" and "second position" are two different positions, and moreover, the first feature is "above", "above" and "above" of the second feature, which includes the first feature above and obliquely above the second feature, or only indicates that the horizontal height of the first feature is higher than that of the second feature. The first feature is "below", "below" and "below" of the second feature, which includes the first feature below and obliquely below the second feature, or only indicates that the horizontal height of the first feature is less than that of the second feature.

[0049] In the description of the present application, it should be noted that unless otherwise explicitly specified and limited, the terms "mounting", "connection", "connection" should be understood broadly, for example, it can be fixedly connected, or it can be detachably connected, or integrally connected; it can be mechanically connected, or it can be electrically connected; it can be directly connected, or it can be indirectly connected through an intermediate medium; it can be the communication between two elements. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0050] The embodiments of the present application will be described in detail below, and the examples of the embodiments are shown in the drawings, wherein the same or similar reference numerals represent the same or similar elements or elements with the same or similar functions throughout. The embodiments described below by referring to the drawings are exemplary and are only used to explain the present application, and cannot be understood as a limitation on the present application.

[0051] As Figures 1 to 8As shown, the embodiment provides a wafer detection system, which comprises a chuck 820, a stage base 810 and a rotating device. The base 100 of the rotating device is movably arranged in the vertical direction on the stage base 810, and the chuck 820 is arranged on the rotating member 200 of the rotating device and can move synchronously with the rotating member 200. In order to avoid wear between the rotating member 200 and the base 100 during the rotation of the rotating member 200 relative to the base 100, so as to ensure that the positioning accuracy of the wafer will not be affected in the long-term use state, and to ensure the detection accuracy, in the embodiment, the rotating member 200 is rotatably arranged on the base 100 about the rotation axis, and can move towards or away from the base 100 along the extension direction of the rotation axis; in the state that the rotating member 200 is away from the base 100, there is a gap between the rotating member 200 and the base 100; in the state that the rotating member 200 is close to the base 100, the rotating member 200 abuts against the base 100; in the state that the rotating member 200 abuts against the base 100, a gas cavity is formed between the rotating member 200 and the base 100, and the gas cavity is in communication with an external gas source.

[0052] With the above structure, when it is necessary to adjust the rotating member 200, compressed gas is introduced into the gas cavity. After the introduction of the compressed gas, the rotating member 200 is away from the base 100, so that there is a gap (which is filled with gas to form an air film layer) between the rotating member 200 and the base 100. At this time, the rotating member 200 is driven, and the rotation angle of the rotating member 200 can be easily adjusted. When the introduction of the compressed gas into the gas cavity is stopped and the vacuum operation is switched, the rotating member 200 can abut against the base 100 under the action of gravity and vacuum negative pressure, so that the coordinates of the wafer placed on the rotating member 200 and the coordinates of the base 100 of the rotating member 200 coincide. During the rotation of the rotating member 200 relative to the base 100, wear between the rotating member 200 and the base 100 can be effectively avoided, the accuracy of the rotation angle between the rotating member 200 and the base 100 is ensured, and the inclination between the rotating member 200 and the base 100 is not easy to change, which is beneficial to ensure the positioning accuracy.

[0053] In combination with Figure 3 and Figure 7As shown, the base 100 is provided with a groove 110 on the side facing the rotating member 200. When the rotating member 200 abuts against the base 100, the side of the rotating member 200 close to the base 100 can block the opening of the groove 110 to form a gas cavity. The base 100 is provided with a gas inlet channel 120 communicating with the gas cavity. The gas inlet channel 120 is in communication with an external gas source. The external gas source can pass compressed gas into the gas cavity through the gas inlet channel 120. When the rotating member 200 needs to be adjusted, the compressed gas delivered by the external gas source enters the gas cavity through the gas inlet channel 120, thereby lifting the rotating member 200 to form an air film layer between the rotating member 200 and the base 100, thereby forming effective support for the rotating member 200. The base 100 is provided with a gas outlet channel 130 communicating with the gas cavity. The gas outlet channel 130 is in communication with an external gas source. The external gas source can draw the gas cavity to a negative pressure state through the gas outlet channel 130, thereby negatively adsorbing and fixing the rotating member 200 above it. When the rotating member 200 is adjusted, the detection process needs to ensure that the position of the wafer is stationary. Therefore, the gas cavity is drawn to a negative pressure state, thereby attracting the rotating member 200 and the base 100 to each other, ensuring that the rotating member 200 and the base 100 do not move relative to each other, which is beneficial to ensure the detection accuracy.

[0054] In combination Figures 2 to 4 As shown, in some embodiments, the base 100 is a disc-shaped structure, and the base 100 has a first channel 140 extending through the base 100 along the rotation axis. The rotating device further includes a mounting seat 300 and a rotating shaft 400. The mounting seat 300 is fixedly connected to the base 100 and at least partially located in the first channel 140. The rotating shaft 400 extends through the mounting channel of the mounting seat 300 along the rotation axis, and one end of the rotating shaft 400 is connected to the rotating member 200, and the other end is rotationally limited on the side of the mounting seat 300 away from the rotating member 200. The rotating shaft 400 can rotate around its own axis and reciprocate relative to the mounting seat 300 along its own axis. The axis of the rotating shaft 400 coincides with the rotation axis. The rotating shaft 400 and the mounting seat 300 cooperate to realize the radial constraint between the rotating member and the base 100, and facilitate the high-precision cooperation between the rotating member and the base 100, with low processing cost.

[0055] To improve the smoothness of the relative motion between the rotating shaft 400 and the mounting seat 300, the rotating device further includes a first linear bearing 510 arranged between the rotating shaft 400 and the mounting seat 300 to make the relative rotation and reciprocating motion between the rotating shaft 400 and the mounting seat 300 more smooth.

[0056] Specifically, the mounting seat 300 comprises a mounting cylinder 310 and a mounting ring 320 arranged on the outer periphery of the mounting cylinder 310, the upper side wall of the mounting ring 320 abuts against the bottom of the base 100, and the mounting ring 320 and the base 100 are screwed, and the rotating shaft 400 is arranged in the mounting cylinder 310.

[0057] To facilitate assembly, in some embodiments, the rotating member 200 is a disc structure, the rotating member 200 has a second channel 210 in communication with the first channel 140, the second channel 210 extends through the rotating member 200 along the direction of the rotating axis, the rotating shaft 400 comprises a shaft body 410 and an end cover 420 arranged at one end of the shaft body 410, the outer diameter of the end cover 420 is greater than the inner diameter of the second channel 210, the shaft body 410 is connected and matched with the first linear bearing 510, the end cover 420 is connected with the rotating member 200 and located at the side of the rotating member 200 away from the base 100. In use, first, the shaft body 410 of the rotating member 200 is arranged through the second channel 210, and then the end cover 420 and the rotating member 200 are connected to realize the fixed connection of the rotating shaft 400 and the rotating member 200; in addition, when the rotating member 200 is away from the base 100, the rotating shaft 400 can be conveniently driven to move synchronously.

[0058] The gas cavity is annular and arranged around the outer periphery of the first channel 140, so that the rotating member 200 is uniformly stressed, and no radial extrusion force is generated on the first linear bearing 510 during the process of moving away from the base 100, thereby improving the service life of the first linear bearing 510.

[0059] In other embodiments, a plurality of limiting columns arranged at intervals can be arranged on the top surface of the base 100 in the circumferential direction, the rotating member 200 is placed on the top surface of the base 100, and the limiting columns abut against the outer periphery of the rotating member 200 to limit the radial displacement of the rotating member 200.

[0060] In combination with Figure 4 and Figure 5 to avoid the rotating member 200 from moving too far away from the base 100 and being separated, in some embodiments, the rotating device further comprises a limiting member 600, the limiting member 600 comprises a limiting seat 610 and a limiting portion 620 arranged on the limiting seat 610, the limiting seat 610 is fixedly connected with the base 100 and located at the side of the rotating member 200, and the limiting portion 620 is located at the side of the rotating member 200 away from the base 100. In the state that the rotating member 200 abuts against the base 100, the distance between the limiting portion 620 and the top surface of the rotating member 200 is preferably between 1mm and 5mm.

[0061] In combination with Figure 1 and Figure 8To improve the automation level of the rotating device, in some embodiments, the rotating device further comprises a driving mechanism 700, which is arranged on the base 100, and the output end of the driving mechanism 700 is in transmission connection with the rotating member 200 and is used to drive the rotating member 200 to rotate around the rotation axis relative to the base 100.

[0062] The driving mechanism 700 comprises a driving assembly and a transmission assembly. The output end of the driving assembly can move reciprocatingly in a direction perpendicular to the rotation axis. The power input end of the transmission assembly is connected with the output end of the driving assembly, and the power output end of the transmission assembly is connected with the rotating member 200. This kind of arrangement helps to simplify the assembly mode and makes the structure of the driving rotating member 200 simpler.

[0063] In some embodiments, the transmission assembly comprises a first connecting rod 710 and a second connecting rod 720. One end of the first connecting rod 710 is hinged with the output end of the driving assembly, and the other end of the first connecting rod 710 is provided with a second linear bearing 520. One end of the second connecting rod 720 is hinged with the rotating member 200, and the other end of the second connecting rod 720 is provided with a pin shaft 521 which is arranged in the second linear bearing 520. The first connecting rod 710 and the second connecting rod 720 can rotate relative to each other. The connecting mode of the two connecting rods and the rotating member 200 forms a crank slider structure, which can convert the linear motion of the output end of the driving assembly into the circumferential motion of the rotating member 200. At the same time, it can adapt to the working mode of the rotating member 200 approaching or moving away from the base 100.

[0064] The driving assembly comprises a driving member 730, a lead screw 740 and a moving member 750. The extension direction of the output shaft of the driving member 730 is perpendicular to the extension direction of the rotation axis, and the output shaft of the driving member 730 can rotate around its own axis. The lead screw 740 is arranged on the base 100 and is in transmission connection with the output shaft of the driving member 730. The moving member 750 has a transmission screw hole which is in screw connection with the lead screw 740, and the moving member 750 is hinged with one end of the first connecting rod 710 as the output end of the driving assembly. In other embodiments, the driving assembly comprises a linear cylinder and the moving member 750, wherein the moving member 750 is connected with the output shaft of the linear cylinder.

[0065] In some embodiments, the driving of the rotating member 200 can also be realized by the transmission mode of gear meshing. Exemplarily, the driving assembly is a servo motor, the output end of the servo motor is provided with a gear, and a gear ring is installed on the outer periphery of the rotating member 200 and can be in meshing connection with the gear.

[0066] Obviously, the above embodiments of the present application are merely examples for clearly illustrating the present application, and are not intended to limit the implementation modes of the present application. For those skilled in the art, other different forms of changes or variations can be made on the basis of the above description. Here, it is not necessary and also impossible to exhaust all the implementation modes. Any modification, equivalent replacement and improvement, etc. made within the spirit and principle of the present application shall be included in the protection scope of the present application claims.

Claims

1. A rotating device, characterized by The utility model relates to a rotating device, which comprises: a base (100); a rotating member (200) rotatably arranged on the base (100) and capable of moving towards or away from the base (100) along the extension direction of the rotation axis; when the rotating member (200) is away from the base (100), a gap is formed between the rotating member (200) and the base (100); when the rotating member (200) is close to the base (100), the rotating member (200) abuts against the base (100); when the rotating member (200) abuts against the base (100), a gas cavity is formed between the base (100) and the rotating member (200), and the gas cavity is in communication with an external gas source.

2. The rotating device of claim 1, wherein The side of the base (100) facing the rotating member (200) is provided with a groove (110), and when the rotating member (200) abuts against the base (100), the side of the rotating member (200) close to the base (100) can block the opening of the groove (110) to form the gas cavity; wherein the base (100) is provided with an air inlet channel (120) in communication with the gas cavity, and the air inlet channel (120) is in communication with the external gas source so that the external gas source can supply compressed gas to the gas cavity; and / or the base (100) is provided with an air outlet channel (130) in communication with the gas cavity, and the air outlet channel (130) is in communication with the external gas source so that the external gas source can draw the gas cavity to a negative pressure state.

3. The rotating device of claim 1, wherein, The base (100) is a disc structure, and the base (100) has a first channel (140); the rotating device further comprises a mounting seat (300) and a rotating shaft (400), the mounting seat (300) is fixedly connected with the base (100) and at least partially located in the first channel (140); the rotating shaft (400) is arranged in a mounting channel of the mounting seat (300) and one end of the rotating shaft (400) is connected with the rotating member (200); the rotating shaft (400) can rotate around its own axis and reciprocally move along its own axis direction relative to the mounting seat (300), and the axis of the rotating shaft (400) coincides with the rotation axis.

4. The rotating device of claim 3, wherein The rotating device further comprises a first linear bearing (510) arranged between the rotating shaft (400) and the mounting seat (300).

5. The rotating device of claim 4, wherein, The rotating member (200) is a disc structure, and the rotating member (200) has a second channel (210) in communication with the first channel (140); the rotating shaft (400) comprises a shaft body (410) and an end cover (420) arranged at one end of the shaft body (410), the outer diameter of the end cover (420) is greater than the inner diameter of the second channel (210), the shaft body (410) is connected and matched with the first linear bearing (510), the end cover (420) is connected with the rotating member (200) and located on the side of the rotating member (200) away from the base (100).

6. The rotating device of claim 3, wherein The gas cavity is annular and arranged around the outer periphery of the first channel (140).

7. The rotating device of claim 1, wherein The rotating device further comprises a limiting member (600), which comprises a limiting seat (610) and a limiting part (620) arranged on the limiting seat (610), the limiting seat (610) is fixedly connected with the base (100) and located on the side of the rotating member (200), and the limiting part (620) is located on the side of the rotating member (200) away from the base (100).

8. A rotating device according to any one of claims 1-7, characterized in that The rotating device further comprises a driving mechanism (700), which is arranged on the base (100), and the output end of the driving mechanism (700) is in transmission connection with the rotating member (200) and is used for driving the rotating member (200) to rotate relative to the base (100).

9. The rotating device of claim 8, wherein, The driving mechanism (700) comprises: a driving assembly, the output end of the driving assembly can reciprocate in the direction perpendicular to the rotation axis; a transmission assembly, the power input end of the transmission assembly is connected with the output end of the driving assembly, and the power output end of the transmission assembly is connected with the rotating member (200); wherein the transmission assembly comprises: a first connecting rod (710), one end of the first connecting rod (710) is hinged with the output end of the driving assembly, and the other end of the first connecting rod (710) is provided with a second linear bearing (520); a second connecting rod (720), one end of the second connecting rod (720) is hinged with the rotating member (200), and the other end of the second connecting rod (720) is provided with a pin shaft (521), the pin shaft (521) is arranged in the second linear bearing (520), and the first connecting rod (710) and the second connecting rod (720) can relatively rotate with the pin shaft (521) as the axis.

10. A wafer inspection system characterized by, The rotating device comprises a suction disc (820), a stage seat (810) and a rotating device according to any one of claims 1-9, the base (100) of the rotating device is movably arranged on the stage seat (810) in the vertical direction, and the suction disc (820) is arranged on the rotating member (200) and can synchronously move with the rotating member (200).

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