Lithography tool

Abstract

A lithographic tool includes a table. The optical element is located above the workbench. The shaft is connected with the optical element, wherein the shaft is rotatable. A rotary assist tool is fixed to the table, where the rotary assist tool includes a wheel in contact with a bottom surface of a portion of the shaft.

Description

TECHNICAL FIELD

[0001] The present disclosure relates to a lithography tool. BACKGROUND

[0002] In semiconductor manufacturing, lithography tools are used to apply a pattern to a substrate by selectively exposing a photoresist layer on the substrate to a beam of radiation. Optical lenses are used in lithography equipment to direct the beam of radiation from a radiation source onto a substrate being processed. The optical lenses in lithography tools are made of high quality materials and need to be replaced periodically due to contamination during operation. SUMMARY

[0003] According to some embodiments of the present disclosure, a lithography tool includes a worktable. An optical element is positioned above the worktable. A shaft is connected to the optical element, wherein the shaft is rotatable. A rotation assist tool is secured to the worktable, wherein the rotation assist tool includes a wheel in contact with a bottom surface of a portion of the shaft.

[0004] According to some embodiments of the present disclosure, a lithography tool includes a worktable. A support bracket is connected to the worktable. An optical element is positioned above the worktable. A lifting device is disposed on the worktable and the support bracket, wherein the lifting device is capable of lifting the optical element from a first level to a second level above the first level.

[0005] In some embodiments of the present disclosure, a lithography tool includes a worktable. An optical element is positioned above the worktable. A shaft is connected to the optical element, wherein the shaft is rotatable. A rotation assist tool is secured to the worktable, wherein the rotation assist tool includes a wheel in contact with a bottom surface of a portion of the shaft, wherein the rotation assist tool is detachable from the worktable. BRIEF DESCRIPTION OF DRAWINGS

[0006] The various features illustrated in the drawings can not be drawn to scale. Accordingly, the dimensions of the various features can be arbitrarily increased or reduced for the convenience of discussion. The same reference numerals can be used in different illustrations to indicate the same or similar

[0007] Figure 1 is a schematic view of a lithography tool according to some embodiments;

[0008] Figure 2A and Figure 2B is a schematic view of a lifting device according to some embodiments;

[0009] Figure 3A , Figure 3B , Figure 3C and Figure 3D is a schematic view of a support bracket according to some embodiments;

[0010] Figure 4A andFigure 4B schematic view of a rotation assist tool according to some embodiments;

[0011] Figure 5 schematic view of a rotation assist tool according to some embodiments;

[0012] Figures 6-11 schematic view of a rotation assist tool according to some embodiments;

[0013] Figure 12A schematic view of a rotation assist tool according to some embodiments; Figure 12B

[0014] Figure 13 schematic view of a rotation assist tool according to some embodiments;

[0015] Figure 14A schematic view of a rotation assist tool according to some embodiments; Figure 14B

[0016] schematic view of a rotation assist tool according to some embodiments; Figure 15

[0017] Figures 16-21 schematic view of a rotation assist tool according to some embodiments.

[0018]

Symbol Explanation

[0019] 100: lithography tool

[0020] 102: light source

[0021] 104: beam steering system

[0022] 106: beam matching unit

[0023] 108: variable attenuator

[0024] 110: shutter system

[0025] 120: zoom-rotation-prism optical system

[0026] 122: zoom lens

[0027] 124: rotation prism

[0028] 126: motor driver

[0029] 130: integrator

[0030] 132, 134: quartz rods

[0031] 136: right-angle prism

[0032] ​​138: energy sensor

[0033] 140: mask curtain mechanism

[0034] 142: fixed curtain unit

[0035] 144: movable curtain unit

[0036] 150: REMA imaging optical system

[0037] 150H: housing

[0038] 152: first group of condenser lenses

[0039] 154: second group of condenser lenses

[0040] 156: mirror

[0041] 160: mask table

[0042] 170: projection optical system

[0043] 172: projection lens

[0044] 180: shaft

[0045] 180A: top portion

[0046] 180B: middle portion

[0047] 180C: bottom portion

[0048] 182: lifting frame

[0049] 184: worktable

[0050] 186: support frame

[0051] 188: fixed bracket

[0052] 188A, 188B, 310, 312, 314, 316: strips

[0053] 200: lifting device

[0054] 210: base

[0055] 212, 216: hydraulic cylinders

[0056] 214, 217: piston rods

[0057] 218: actuator structure

[0058] 220: handle bar

[0059] 230: head

[0060] 230A: first portion

[0061] 230B: second portion

[0062] 230C: third portion

[0063] 240: spring

[0064] 250: clamp

[0065] 300: support bracket

[0066] 320, 322, 324: securing member

[0067] 400: rotation assist tool

[0068] 410, 412, 414, 420: plate

[0069] 422: wheel

[0070] 500: lifting device

[0071] 510: base

[0072] 512, 516: hydraulic cylinder

[0073] 514: piston rod

[0074] 518: actuator structure

[0075] 520: handle bar

[0076] 530: head

[0077] 530A: first portion

[0078] 530B: second portion

[0079] 530C: third portion

[0080] 600: support bracket

[0081] 610: platform

[0082] 612, 614, 616, 618: strip

[0083] 700: rotation assist tool

[0084] 710, 712, 720: plate

[0085] 722: wheel

[0086] 1000, 2000: method

[0087] 1500: REMA lens

[0088] 1500A: first portion

[0089] 1500B: second portion

[0090] 1510: connecting member

[0091] IL: radiation beam

[0092] S101, S102, S103, S104, S105, S106, S107, S201, S202, S203, S204, S205, S206, S207: operation

[0093] W: wafer

[0094] WS: wafer table

[0095] X, Y, Z: direction DETAILED DESCRIPTION

[0096] The following disclosure provides many different embodiments, or examples, for implementing various characteristics of the provided subject matter. Specific examples of components and arrangements are described below to simplify the present disclosure. These are, of course, merely examples and are not intended to be limiting. For example, forming a first feature over or on a second feature in the description below can include embodiments where the first and second features are formed directly contacting one another, and can also include embodiments where additional features are formed between the first and second features such that the first and second features can not directly contact one another. Further, the present disclosure can repeat use of reference numerals in the various examples for simplicity and clarity.

[0097] Also for ease of description, spatial terms such as "below," "under," "beneath," "above," "over," and the like can be used herein to describe one element or feature's relationship to another element or feature as illustrated in the figures. Spatial terms are used in relation to the orientation of the device as depicted in the figures. The device can be oriented in other ways (rotated 90 degrees or at other orientations), and the spatially relative terms used herein are interpreted accordingly. As used herein, "left," "right," "about," "approximately," or "substantially" can generally mean within 20% of a given value or range, or within 10% of a given value or range, or within 5% of a given value or range. Numerical values given herein are approximate, and the terms "about," "approximately," or "substantially" are intended to be inferred unless explicitly stated otherwise. However, those of ordinary skill in the art will recognize that the values or ranges recited in the description are merely examples and can decrease as integrated circuits shrink.

[0098] The advanced lithography processes, methods, and materials described in this disclosure can be used in many applications, including fin-type field effect transistors (FinFETs). For example, fins can be patterned to produce relatively tight spacing between features, which is well suited for the above-described disclosure. In addition, spacers used to form fins for FinFETs can be processed according to the above-described disclosure.

[0099] Figure 1 A schematic diagram of a lithography tool according to some embodiments is shown. A lithography tool 100 is shown. The lithography tool 100 can include an alignment and exposure tool, also known as a stepper and scanner, to transfer a circuit design pattern to a photosensitive layer on a substrate. The lithography tool 100 can be an ultra violet (UV) lithography tool, a deep ultra violet (DUV) lithography tool, an immersion lithography tool, an extreme ultra violet (EUV) lithography tool, an electron beam lithography tool, an X-ray lithography tool, an ion projection lithography tool, or any suitable exposure tool that uses a laser radiation source to generate a beam of radiation for exposure.

[0100] The lithography tool 100 includes a light source 102. In some embodiments, the light source 102 can be an ArF excimer laser light source (oscillation wavelength 193 nm). As an exposure light source, a laser that emits laser light in the ultraviolet range in an oscillation step, such as a KrF excimer laser (wavelength 248 nm) or an F2 laser (wavelength 157 nm), or a device that emits high-harmonic laser light obtained by wavelength conversion of near-infrared laser light from a solid-state laser light source (YAG laser, semiconductor laser, or the like) in the substantially vacuum ultraviolet range, and a mercury discharge lamp or the like commonly used in such exposure apparatuses can be used.

[0101] In Figure 1 The radiation beam IL is generated by the light source 102. The radiation beam IL passes through a beam steering system 104. In some embodiments, the beam steering system 104 can include one or more steering mirrors to adjust the propagation direction of the radiation beam IL.

[0102] The beam steering system 104 directs the radiation beam IL to a beam-matching unit (BMU) 106, which includes a movable mirror or the like to match the beam to the optical path position of the projection exposure apparatus body. A variable attenuator 108 is disposed adjacent to the BMU 106. In some embodiments, the variable attenuator 108 is used to adjust the average energy of each pulse beam of the radiation beam IL. For example, a plurality of filters with different beam attenuation ratios can be used so that these filters can be switched in sequence to change the beam attenuation ratio.

[0103] The lithography tool 100 further includes a shutter system 110 located downstream of and optically coupled to the BMU 106. In some embodiments, the shutter system 110 may include at least one shutter. For example, two shutters are provided to control the output of the radiation beam IL. A safety shutter is kept open by a coil and configured to automatically close when any panel of the lithography equipment housing is opened. The rotating shutter is driven by a motor during each exposure.

[0104] The lithography tool 100 further includes a zoom-rotating prism optical system 120, located downstream of and optically coupled to the shutter system 110. The zoom-rotating prism optical system 120 includes a set of zoom lenses 122 and a rotating prism 124, driven by a motor driver 126. Here, two convex lenses are illustrated as an example of the zoom lens 122. However, it should be understood that this is merely illustrative, and it is understood that the zoom lens 122 may include several lenses, including combinations of convex and / or concave lenses. The zoom lens 122 is configured to determine the size of the light beam or the outer radius of the ring illumination pattern. The zoom lens group 122 may be collectively referred to as a zoom lens system.

[0105] The rotating prism 124 includes a concave conical lens and a complementary convex conical lens, the spacing of which can be adjusted by a motor driver 126. The distance between the two elements of the rotating prism 124 can be adjusted by moving one of the elements along the optical axis. This allows adjustment of the annularity of the radiation beam IL. When the rotating prism 124 is closed, that is, when the gap between the conical surfaces is zero, the radiation beam IL can have a disk shape. When there is a gap between the conical surfaces of the rotating prism 124, an annular intensity distribution may be produced, the inner radial range of which is determined by the distance between the two conical surfaces.

[0106] exist Figure 1 In one embodiment, the zoom lens group 122 is located between the rotating prism 124 and the light source 102 along the optical path of the radiation beam IL. However, the relative positions of the zoom lens group 122 and the rotating prism 124 can be interchanged. For example, in other embodiments, the rotating prism 124 is located between the zoom lens group 122 and the light source 102 along the optical path of the radiation beam IL.

[0107] Lithography tool 100 further includes integrator 130 downstream of and optically coupled to zoom-rotating-prism optical system 120. In some embodiments, integrator 130 includes two elongated quartz rods 132 and 134 connected on a right-angle prism 136, with the hypotenuse surface of right-angle prism 136 silvered to allow a small, known fraction of the beam energy to pass through energy sensor 138. Beam of radiation IL undergoes multiple internal reflections in quartz rods 132 and 134, and thus, in retrospect, a plurality of virtual sources spaced apart, balancing the intensity distribution of beam of radiation IL. The function of the integrator is to improve the uniformity of the spatial and / or angular intensity distribution of beam of radiation IL.

[0108] Lithography tool 100 further includes reticle shuttering mechanism 140 downstream of and optically coupled to integrator 130. In some embodiments, reticle shuttering mechanism 140 can include a fixed shuttering unit 142 and a movable shuttering unit 144 disposed adjacent to fixed shuttering unit 142. Fixed shuttering unit 142 can include blades forming a fixed aperture. Movable shuttering unit 144 can include movable blades having an adjustable aperture. The disposed surfaces of the movable blades constituting movable shuttering unit 144 are conjugate to the patterned surface of a reticle (e.g., reticle MA). By using fixed shuttering unit 142 and movable shuttering unit 144, the slit-like illumination area of the reticle (e.g., reticle MA) can be set to a rectangular shape of a preferred size and form.

[0109] Lithography tool 100 further includes reticle masking (REMA) imaging optical system 150 downstream of and optically coupled to reticle shuttering mechanism 140. REMA imaging optical system 150 includes housing 150H. In some embodiments, the concentration of air (oxygen) inside housing 150H is no more than a few percent, and housing 150H can be filled with clean dry nitrogen (N2), helium (He), and / or other inert gases having an air (oxygen) concentration of less than about 1%. REMA imaging optical system 150 includes a first set of condenser lenses 152 and a second set of condenser lenses 154, with the first set of condenser lenses 152 and the second set of condenser lenses 154 optically coupled to each other by a mirror 156. In some embodiments, the first set of condenser lenses 152 can include one or more lenses, and the present disclosure is not limited in this regard. Similarly, the second set of condenser lenses 154 can include one or more lenses.

[0110] The lithography tool 100 further comprises a mask MA downstream of and optically coupled to the REMA imaging optical system 150. The mask MA is held by a mask table 160. The radiation beam IL passes through the first set of condenser lenses 152, the mirror 156 to bend the optical path, and through the second set of condenser lenses 154, and illuminates an illumination area in a circuit pattern area of the mask MA. The mask MA is fixed on the mask table 160, for example by a vacuum chuck. The mask table 160 is structured such that it can be two-dimensionally finely driven in a plane perpendicular to the optical axis of the radiation beam IL to perform positioning of the mask MA.

[0111] The term "mask" as used herein is to be interpreted broadly as referring to any device for imparting a radiation beam with a pattern, such as to create a pattern in a target portion of a wafer. It should be noted that the pattern imparted to the radiation beam can not exactly correspond to the desired pattern in the target portion of the substrate, e.g. if the pattern includes a phase shift feature or a so-called assist feature. Typically, the pattern imparted to the radiation beam will correspond to a particular functional layer in the device being created in the target portion, such as an integrated circuit. In some embodiments, the term "mask" can also be referred to as "reticle" or "photomask".

[0112] The lithography tool 100 further comprises a projection optical system 170 downstream of and optically coupled to the mask MA. The projection optical system 170 can comprise a plurality of projection lenses 172. The projection optical system 170 projects the radiation beam IL out of the mask MA onto a wafer W coated with a photosensitive material, e.g. a photoresist. In some embodiments, the wafer W is fixed on a wafer table WS during performing the lithography process.

[0113] Along the optical path of the radiation beam IL, the radiation beam IL passes through the beam turning system 104, the BMU 106 (and the variable attenuator 108), the shutter system 110, the zoom-rotary tri-prism optical system 120, the integrator 130, the mask shuttering mechanism 140, the REMA imaging optical system 150, the mask MA, the projection optical system 170, and is incident on the wafer W. That is, the above-mentioned units are optically coupled to each other.

[0114] During semiconductor manufacturing, lithography is one of the most critical processes, by which an image is reduced and projected from a mask (photomask) onto a wafer via a projection lens to form a high-density circuit pattern. However, the lenses closest to the optical entrance and the optical exit of the optical system can be exposed to ambient air, which can suffer from crystallization and contamination after a long period of use (e.g. 3-5 years), thereby damaging the uniformity, transmittance, telecentricity, etc. of the lenses. Since the lithography process is highly sensitive to optical behavior, unhealthy lens conditions will result in low product yield or scrap.

[0115] In Figure 1In some embodiments, the optical system of the lithography tool 100 includes a zoom-rotary prism optical system 120, a REMA imaging optical system 150, and a projection optical system 170. For the zoom-rotary prism optical system 120, the lens nearest the optical entrance and the optical exit of the zoom-rotary prism optical system 120 can be the outermost zoom lens 122 and / or the outermost lens of the rotary prism 124. For example, the entrance lens of the zoom-rotary prism optical system 120 can be one of the zoom lens 122 and the lens of the rotary prism 124 nearest the shutter system 110, and the exit lens of the zoom-rotary prism optical system 120 can be the other of the zoom lens 122 and the lens of the rotary prism 124 nearest the integrator 130. In other words, the entrance lens of the zoom-rotary prism optical system 120 can be the bottom-most lens of the zoom lens 122 and the lens of the rotary prism 124, and the exit lens of the zoom-rotary prism optical system 120 can be the top-most lens of the zoom lens 122 and the lens of the rotary prism 124.

[0116] Figure 2A and Figure 2B is a schematic view of a lifting device according to some embodiments. Shown is a lifting device 200, wherein Figure 2A and Figure 2B are different states of the lifting device 200 during operation. The lifting device 200 is to be used for lifting a REMA imaging optical system of a lithography tool, and will be discussed in more detail later.

[0117] In some embodiments, the lifting device 200 can be a hydraulic bottle jack, although the disclosure is not limited to this. The lifting device 200 can be powered by one or more of hydraulic fluid, compressed air or other gas, a user-operated mechanical lever, an electric motor, or other power or force sources. Various embodiments can be used with other types of lifting devices, including, for example, multi-column truck lifts, agricultural jacks, bumper jacks, screw jacks, trailer jacks, floor jacks, forklift jacks, pallet jacks, lift bag lifting devices, electric jacks, jack stands, and toe jacks, among other similar types of lifting devices.

[0118] The lifting device 200 includes a base 210, disposed at the bottom portion of the lifting device 200. The lifting device 200 includes a hydraulic cylinder 212, disposed on the base 210 and containing a piston rod 214 (see Figure 2BLift 200 further includes hydraulic cylinder 216 disposed on base 210 and connected to actuator structure 218 via a piston rod 217 within hydraulic cylinder 216. Actuator structure 218 is pivotally mounted to base 210 and further pivotally connected to piston rod 217 within hydraulic cylinder 216. Handle bar 220 can be inserted into a tubular opening of actuator structure 218 to facilitate pumping operation.

[0119] Lift 200 further includes a head 230 connected to piston rod 214. In some embodiments, head 230 includes a first portion 230A, a second portion 230B, and a third portion 230C, wherein second portion 230B is connected between first portion 230A and third portion 230C. In more detail, second portion 230B extends downwardly from a bottom surface of first portion 230A to a top surface of third portion 230C. Thus, first portion 230A is at a higher level than third portion 230C. In some embodiments, first portion 230A is fixed to piston rod 214 via a bottom surface of first portion 230A, such that head 230 can be lifted by piston rod 214.

[0120] Lift 200 further includes two springs 240 for connecting head 230 to base 210. For example, first ends of springs 240 can be connected to opposite sides of head 230, respectively, and second ends of springs 240 can be connected to base 210, respectively.

[0121] Figure 2A Fig. 1 shows a first state of head 230 of lift 200 in an original position. Figure 2A Fig. 2 shows a second state of head 230 of lift 200 lifted to a position higher than the original position. Figure 2A In operation of lift 200, handle bar 220 is pumped by a user, for example, such that a leverage is generated to hydraulic cylinder 216. Thus, piston rod in hydraulic cylinder 216 can be pumped up and down within hydraulic cylinder 216 to pump oil from the oil canister into hydraulic cylinder 212 below piston rod 214, such that piston rod 214 and head 230 can be lifted upwardly via the hydraulic pressure.

[0122] Figure 3A , Figure 3B , Figure 3C and Figure 3D are schematic views of a support bracket according to some embodiments, wherein Figure 3A is a perspective view of the support bracket, and Figure 3B , Figure 3C and Figure 3D are side views of the support bracket. Shown in the figures is a support bracket 300. Support bracket 300 is to be used to support a lift in a lithography tool operation and will be discussed in more detail later.

[0123] Support bracket 300 includes bars 310, 312, and 314 connected to each other. In more detail, bar 310 extends in a first direction (e.g., X direction), bar 312 extends in a second direction (e.g., Y direction) substantially perpendicular to the first direction, and bar 314 extends in a third direction (e.g., Z direction) substantially perpendicular to the first and second directions. In addition, ends of bars 310, 312, and 314 are connected to each other.

[0124] Support bracket 300 further includes bar 316 connecting bars 310 and 314. In more detail, bar 316 can be in contact with a bottom surface of bar 310 and a side wall of bar 314. Bar 316 can increase rigidity of support bracket 300 and will facilitate supporting heavier objects.

[0125] Support bracket 300 further includes fixing member 320 connected to bar 312. In more detail, fixing member 320 is connected to an end of bar 312 and can extend upward from the end of bar 312. In some embodiments, fixing member 320 includes a hook-shaped cross-sectional profile to facilitate connection between support bracket 300 and a lithography tool.

[0126] Support bracket 300 further includes fixing member 322 connected to bar 314. In more detail, fixing member 322 is connected to an end of bar 314 and can extend downward from the end of bar 314. In some embodiments, fixing member 322 includes a U-shaped cross-sectional profile to facilitate connection between support bracket 300 and a lithography tool.

[0127] Support bracket 300 further includes fixing member 324 connected to bar 310. In more detail, fixing member 324 is connected to a side wall of bar 310 and can extend in a direction oblique to a length direction of bar 310. In some embodiments, fixing member 324 is to facilitate connection between support bracket 300 and a lithography tool.

[0128] Figure 4A and Figure 4B is a schematic view of a rotation assist tool according to some embodiments, wherein Figure 4A is a perspective view of a rotation assist tool, and Figure 4B is a side view of a rotation assist tool. Shown in the figure is a rotation assist tool 400. Rotation assist tool 400 is to support and facilitate rotation of a REMA imaging optical system in a lithography tool, and will be discussed in more detail later.

[0129] The rotary aid tool 400 includes plates 410, 412, and 414. More specifically, plates 412 and 414 are connected to the opposite ends of plate 410 and extend downward from the bottom surface of plate 410. Plates 410, 412, and 414 together form a generally U-shaped cross-sectional profile to facilitate connection between the rotary aid tool 400 and a lithography tool. In some embodiments, plate 412 may include one or more holes through which screws can pass.

[0130] The rotation aid 400 further includes a plate 420 connected to the plate 410. More specifically, the plate 420 extends upward from the top surface of the plate 410. The rotation aid 400 further includes a wheel 422 fixed to the plate 420 and used to facilitate rotation of the REMA imaging optics system in the lithography tool.

[0131] Figure 5 A method for operating a photolithography tool according to some embodiments. Figures 6-11 This is a schematic diagram of the various stages of operating the shadow puppet tool according to some embodiments. Figure 5 Demonstration operation Figure 1 The method 1000 of the shadow puppet tool 100 discussed in the article will be combined with Figures 6-11 and as described above Figures 2A-2B , Figures 3A-3D and Figures 4A-4B discuss Figure 5 Method 1000. It should be noted that, for the sake of brevity, Figures 6-11 This only explains Figure 1 The REMA imaging optical system 150. Although method 1000 is described as a series of actions, it should be understood that these actions are not limiting, as the order of the actions may be changed in other embodiments. In other embodiments, some actions described and / or illustrated may be omitted in whole or in part.

[0132] See Figure 5 and Figure 6 Method 1000 begins with operation S101: Perform a lithography process in the lithography tool. For example, as... Figure 1 As shown, the wafer W is transferred to the lithography tool 100 and fixed on the wafer stage WS. Then, the lithography tool 100 can be used to perform lithography on the wafer W.

[0133] exist Figure 6In some embodiments, the REMA imaging optics system 150 includes a reticle shadow lens 1500 and a connecting member 1510 connected to the REMA lens 1500. In some embodiments, the REMA lens 1500 includes a first portion 1500A (or a horizontal portion) and a second portion 1500B (or a vertical portion) connected to each other. The first portion 1500A has a length direction extending horizontally, and the second portion 1500B has a length direction extending vertically, where the second portion 1500B can extend downward from one end of the first portion 1500A. In some embodiments, the first portion 1500A can be regarded as a portion of the REMA imaging optics system 150 that contains the first set of condenser lenses 152 and the mirror 156 (see Figure 1 ), and the second portion 1500B can be regarded as a portion of the REMA imaging optics system 150 that contains the second set of condenser lenses 154. The lithography tool 100 further includes the connecting member 1510 connected to a sidewall of the first portion 1500A of the REMA lens 1500.

[0134] The lithography tool 100 further includes a shaft 180 fixed on the connecting member 1510 of the REMA imaging optics system 150. In some embodiments, the shaft 180 can include a top portion 180A, a middle portion 180B, and a bottom portion 180C, where the middle portion 180B is located between the top portion 180A and the bottom portion 180C. In some embodiments, the top portion 180A of the shaft 180 is fixed on and can penetrate the connecting member 1510. In some embodiments, the middle portion 180B and the bottom portion 180C of the shaft 180 are located below a bottom surface of the connecting member 1510. In some embodiments, the top portion 180A, the middle portion 180B, and the bottom portion 180C can each include a cylindrical shape. That is, the top portion 180A, the middle portion 180B, and the bottom portion 180C can each include a circular top cross-sectional profile. In some embodiments, the middle portion 180B is wider than the top portion 180A and the bottom portion 180C. That is, the diameter of the middle portion 180B is greater than the diameter of the top portion 180A and the bottom portion 180C. In some embodiments, the shaft 180 can be rotatable. Since the shaft 180 is connected to the REMA lens 1500 via the connecting member 1510, the REMA lens 1500 can rotate with the shaft 180.

[0135] The lithography tool 100 further includes a lifting frame 182 connected to the bottom portion 180C of the shaft 180. In some embodiments, the lifting frame 182 can be fixed on the bottom portion 180C of the shaft 180, for example, by screws. In some embodiments, the lifting frame 182 can include an L-shaped profile. For example, the lifting frame 182 can include a horizontal portion and a vertical portion extending downward from one end of the horizontal portion.

[0136] The lithography tool 100 further includes a worktable 184, a support frame 186 disposed on the worktable 184, and a fixing bracket 188 connected with the worktable 184. In some embodiments, the bottom portion 180C of the shaft 180 can pass through the worktable 184. In some embodiments, the support frame 186 is in contact with the bottom surface of the connecting member 1510 and is used to support the connecting member 1510 and the REMA lens 150 when performing the lithography process. In some embodiments, the fixing bracket 188 can include an L-shaped profile. That is, the fixing bracket 188 can include a bar 188A and a bar 188B connected with each other. In some embodiments, the bar 188A can be a hollow structure, so that the top surface of the bar 188A of the fixing bracket 188 can have an opening.

[0137] Referring to Figure 5 and Figure 7 , the method 1000 proceeds to operation S102: fixing a support bracket to a lithography tool. In more detail, the support bracket 300 discussed in Figures 3A-3D will be used in operation S102 described herein. In some embodiments, the support bracket 300 is designed so that the support bracket 300 can be stably fixed on the worktable 184 and the fixing bracket 188 of the lithography tool 100.

[0138] In some embodiments, the fixing member 320 on the bar 312 of the support bracket 300 is hooked on the bar 188A of the fixing bracket 188. For example, the hook structure of the fixing member 320 can be hooked on the bar 188A of the fixing bracket 188 by inserting a portion of the fixing member 320 into the opening of the bar 188A of the fixing bracket 188. On the other hand, the fixing member 322 on the bar 314 of the support bracket 300 is installed on the bar 188B of the fixing bracket 188. For example, the U-shaped fixing member 322 can cross the bar 188B of the fixing bracket 188 so that the fixing member 322 covers and contacts three sides of the bar 188B of the fixing bracket 188. In addition, the fixing member 324 is fixed on the worktable 184, for example, by a screw.

[0139] After the support bracket 300 is fixed on the worktable 184 and the fixing bracket 188 of the lithography tool 100, the top surfaces of the bars 310 and 312 of the support bracket 300 can be substantially coplanar with the top surface of the worktable 184. That is, the top surfaces of the bars 310 and 312 of the support bracket 300 can be at the same level as the top surface of the worktable 184.

[0140] Referring to Figure 5 and Figure 8 , the method 1000 proceeds to operation S103: placing a lifting device. In more detail, the lifting device 200 discussed in Figures 2A-2BThe lifting device 200 discussed in the foregoing will be used in the operation S103 described herein. In some embodiments, the lifting device 200 is placed on the workbench 184 and the support bracket 300 such that the base 210 of the lifting device 200 is in contact with the workbench 184 and the support bracket 300. In addition, the orientation of the lifting device 200 is adjusted such that the third portion 230C of the head 230 of the lifting device 200 is in contact with the bottom surface of the lifting frame 182. It should be noted that, for the sake of brevity, Figure 8 The spring 240 of the lifting device 200 is not described in the foregoing.

[0141] In some embodiments, the lifting device 200 can also be fixed on the support bracket 300 via the clamp 250. In some embodiments, the clamp 250 can clamp the base 210 of the lifting device 200 and the bar 310 of the support bracket 300. The presence of the support bracket 300 makes it more flexible to adjust the position of the lifting device 200, and the lifting device 200 can also be stably fixed on the support bracket 300 via the clamp 250.

[0142] Referring to Figure 5 and Figure 9 , the method 1000 proceeds to operation S104: lifting the REMA lens of the lithography tool via the lifting device. In some embodiments, the REMA lens 1500 is lifted by the lifting device 200 such that the REMA lens 1500 is moved from a first position (see Figure 8 ) to a second position (see Figure 9 ) higher than the first position. In more detail, by lifting the head 230 of the lifting device 200, the head 230 of the lifting device 200 can push the lifting frame 182 connected to the rotating shaft 180, and the rotating shaft 180 together with the REMA lens 1500 will be lifted along with the lifting frame 182. In some embodiments, when the REMA lens 1500 is located at the first position (see Figures 6-8 ), the REMA lens 1500 can be considered to be in a processing state in which the lithography process can be performed. On the other hand, when the REMA lens 1500 is located at the second position (see Figure 9 ), the REMA lens 1500 can be considered to be in an operation state in which the repair operation can be performed.

[0143] Referring to Figure 5 and Figure 10 , the method 1000 continues to operation S105: fixing the rotation auxiliary tool to the lithography tool. In more detail, as Figures 4A-4BThe rotation assisting tool 400 discussed above will be used in operation S105 described herein. In some embodiments, after the REMA lens 1500 is lifted, the connecting member 1510 is vertically spaced apart from the support frame 186, thus creating a space between the support frame 186 and the connecting member 1510. Then, the rotation assisting tool 400 is fixed on the support frame 186. In some embodiments, the rotation assisting tool 400 can pass through the support frame 186 and can be fixed on the support frame 186, for example, by screws. In more detail, the plates 412 and 414 of the rotation assisting tool 400 can be in contact with the side walls of the support frame 186, and the plate 410 of the rotation assisting tool 400 is in contact with the top surface of the support frame 186. In addition, the wheels 422 of the rotation assisting tool 400 are in contact with the bottom surface of the middle portion 180B of the shaft 180, such that the middle portion 180B of the shaft 180 can slide along the wheels 422 of the rotation assisting tool 400 during the rotation of the shaft 180.

[0144] Referring to Figure 5 and Figure 11 , the method 1000 proceeds to operation S106: rotating the REMA lens. In more detail, the REMA lens 1500 of the REMA imaging optical system 150 is rotated, such that the aperture of the REMA lens 1500 can be outward, for example, toward the user. In some embodiments, the REMA lens 1500 can be rotated via the shaft 180 as described above. During the rotation of the shaft 180, the wheels 422 of the rotation assisting tool 400 can not only support the middle portion 180B of the shaft 180, but also maintain the smooth rotation of the shaft 180.

[0145] The method 1000 proceeds to operation S107: repairing the REMA lens. In some embodiments, the repairing of the REMA lens 1500 is, for example, replacing the set of condenser lenses 152 with a new set of condenser lenses 152. However, the present disclosure is not limited thereto, and in other embodiments, operation S107 can be performed by repairing other optical elements in the REMA lens 1500.

[0146] In some embodiments, after the operation of repairing the REMA lens 1500 is completed, the REMA lens 1500 can be rotated back to the original orientation. Then, the rotation assisting tool 400, the lifting device 200, and the support bracket 300 can be disassembled from the lithography tool 100, and the REMA lens 1500 can be lowered back to the first position, as shown in Figure 6 .

[0147] Figure 12A and Figure 12B is a schematic view of a lifting device according to some embodiments. Shown in the figure is a lifting device 500, wherein Figure 12A and Figure 12BFIG. 1 illustrates a schematic diagram of a lift device 500 in accordance with an embodiment of the present application. The lift device 500 is for use in the operation of a lithography tool, and will be discussed in greater detail below. It should be noted that the lift device 500 can be similar to the lift device 200 discussed in FIGS. 2A-2C, and thus for brevity, related details can not be repeated. Figure 2A and Figure 2B FIGS. 2A-2C, and thus for brevity, related details can not be repeated.

[0148] The lift device 500 includes a base 510 disposed at the bottom of the lift device 500. The lift device 500 includes a hydraulic cylinder 512 disposed on the base 510 and containing a piston rod 514 (see FIG. 1) movable within the hydraulic cylinder 512. The lift device 500 further includes a hydraulic cylinder 516 disposed on the base 510 and connected to an actuator structure 518 via a piston rod (not shown) within the hydraulic cylinder 516, the actuator structure 518 being pivotally mounted to the base 510 and further pivotally connected to the piston rod within the hydraulic cylinder 516. A handle bar 520 can be inserted into a tubular opening of the actuator structure 518 to facilitate pumping operations. Figure 12B

[0149] The lift device 500 further includes a head 530 connected to the piston rod 514. In some embodiments, the head 530 includes a first portion 530A, a second portion 530B, and a third portion 530C, with the second portion 530B connected between the first portion 530A and the third portion 530C. In more detail, the second portion 530B extends downward from a bottom surface of the first portion 530A to a top surface of the third portion 530C. Thus, the first portion 530A is at a higher level than the third portion 530C. In some embodiments, the first portion 530A is fixed to the piston rod 514 via a bottom surface of the first portion 530A, and thus the head 530 can be lifted by the piston rod 514. In some embodiments, the third portion 530C can include a curved sidewall, which can facilitate connection of the lift device 500 to a shaft in a lithography tool, and will be discussed in greater detail below.

[0150] Figure 12A is a first state in which the head 530 of the lift device 500 is at a home position. Figure 12A is a second state in which the head 530 of the lift device 500 is lifted to a position higher than the home position shown in FIG. 1. In operation of the lift device 500, the handle bar 520 is pumped, for example, by a user, thereby creating a leverage on the hydraulic cylinder 516. Thus, the piston rod in the hydraulic cylinder 516 can pump up and down within the hydraulic cylinder 516, pumping oil from an oil canister into the hydraulic cylinder 512 below the piston rod 514, and thus the piston rod 514 and the head 530 can be lifted upward via hydraulic pressure. Figure 12A

[0151] Figure 13 ​​A schematic view of a support bracket according to some embodiments. Shown is a support bracket 600. The support bracket 600 is to be used for supporting a lift device in operation of a lithography tool, and will be discussed in more detail later. The support bracket 600 comprises a platform 610 and bars 612, 614, 616 and 618 connected to the platform 610. In more detail, one end of the bar 612 is in contact with a bottom surface of the platform 610, and the bar 614 is in contact with the other end of the bar 612 and the bottom surface of the platform 610. Similarly, one end of the bar 616 is in contact with the bottom surface of the platform 610, and the bar 618 is in contact with the other end of the bar 616 and the bottom surface of the platform 610. In some embodiments, the bars 612 and 616 can extend in a vertical direction (e.g. X-direction).

[0152] Figure 14A and Figure 14B A schematic view of a rotation assisting tool according to some embodiments, wherein Figure 14A is a perspective view of the rotation assisting tool, and Figure 14B is a side view of the rotation assisting tool. Shown is a rotation assisting tool 700. The rotation assisting tool 700 is to be used for supporting and facilitating rotation of a REMA imaging optical system in a lithography tool, and will be discussed in more detail later.

[0153] The rotation assisting tool 700 comprises a plate 710 and a plate 712. In more detail, the plate 712 is connected to one end of the plate 710 and can extend downwardly from a bottom surface of the plate 710. The plates 710 and 712 together form a generally L-shaped cross-sectional profile for facilitating connection between the rotation assisting tool 700 and the lithography tool.

[0154] The rotation assisting tool 700 further comprises a plate 720 connected to the plate 710. In more detail, the plate 720 extends upwardly from a top surface of the plate 710. The rotation assisting tool 700 further comprises a wheel 722 fixed on the plate 720 and to be used for facilitating rotation of a REMA imaging optical system in a lithography tool.

[0155] Figure 15 A method of operating a lithography tool according to some embodiments. Figures 16-21 A schematic view of a lithography tool according to some embodiments at various stages of operation of the lithography tool. Figure 15 The method 2000 of the lithography tool 100 discussed in Figure 1 will be discussed in connection with Figures 16-21 and as described above Figures 12A-12B , Figure 13 and Figures 14A-14B The method 2000 discussed in Figure 15 . It should be noted that, for brevity, Figures 16-21 only the steps of Figure 1the REMA imaging optical system 150. Although the method 2000 is described as a series of acts, it is understood that the acts are not limited to the order disclosed, and that other embodiments can alter the order of the acts. In other embodiments, some acts can be omitted, in whole or in part.

[0156] Referring to Figure 15 and Figure 16 , the method 2000 begins at operation S201 : performing a lithography process in a lithography tool. For example, as shown in FIG. 2A, a wafer W is transferred to the lithography tool 100 and is fixed on a wafer stage WS. Then, the lithography process can be performed on the wafer W using the lithography tool 100. Figure 1

[0157] In some embodiments, the REMA imaging optical system 150 includes a REMA lens 1500 and a connecting member 1510 connected to the REMA lens 1500. In some embodiments, the REMA lens 1500 includes a first portion 1500A (or a horizontal portion) and a second portion 1500B (or a vertical portion) connected to each other. The first portion 1500A has a length direction extending horizontally, and the second portion 1500B has a length direction extending vertically, wherein the second portion 1500B can extend downward from one end of the first portion 1500A. In some embodiments, the first portion 1500A can be regarded as a portion of the REMA imaging optical system 150 that contains the first set of condenser lenses 152 and the mirror 156 (see FIG. 1A), and the second portion 1500B can be regarded as a portion of the REMA imaging optical system 150 that contains the second set of condenser lenses 154. The lithography tool 100 further includes the connecting member 1510 connected to a sidewall of the first portion 1500A of the REMA lens 1500. Figure 16 Figure 1

[0158] ​​​The lithography tool 100 further includes a shaft 180 fixed on the connection member 1510 of the REMA imaging optical system 150. In some embodiments, the shaft 180 can include a top portion 180A, a middle portion 180B, and a bottom portion 180C, where the middle portion 180B is between the top portion 180A and the bottom portion 180C. In some embodiments, the top portion 180A of the shaft 180 is fixed on and can penetrate the connection member 1510. In some embodiments, the middle portion 180B and the bottom portion 180C of the shaft 180 are below the bottom surface of the connection member 1510. In some embodiments, the top portion 180A, the middle portion 180B, and the bottom portion 180C can each include a cylindrical shape. That is, the top portion 180A, the middle portion 180B, and the bottom portion 180C can each include a circular top cross-sectional profile. In some embodiments, the middle portion 180B is wider than the top portion 180A and the bottom portion 180C. That is, the diameter of the middle portion 180B is greater than the diameter of the top portion 180A and the bottom portion 180C. In some embodiments, the shaft 180 can be rotatable. Since the shaft 180 is connected with the REMA lens 1500 via the connection member 1510, the REMA lens 1500 can rotate with the shaft 180.

[0159] The lithography tool 100 further includes a worktable 184 and a support frame 186 disposed on the worktable 184. In some embodiments, the bottom portion 180C of the shaft 180 can penetrate the worktable 184.

[0160] Referring to Figure 15 and Figure 17 , the method 2000 proceeds to operation S202: fixing a support bracket to the lithography tool. In more detail, the support bracket 600 as discussed in Figure 13 will be used in operation S202 described herein. In some embodiments, the support bracket 600 is designed such that the support bracket 600 can be stably fixed on the worktable 184 of the lithography tool 100.

[0161] In some embodiments, the bars 612 and 616 of the support bracket 600 can be fixed on the worktable 184 of the lithography tool 100, for example, by screws or a suitable connection method. After the support bracket 600 is fixed on the worktable 184 of the lithography tool 100, the top surface of the platform 610 of the support bracket 600 can be substantially coplanar with the top surface of the worktable 184. That is, the top surface of the platform 610 of the support bracket 600 can be at the same level as the top surface of the worktable 184.

[0162] Referring to Figure 15 and Figure 18 , the method 2000 continues to operation S203: placing a lifting device. In more detail, the lifting device 700 as discussed in Figures 12A-12BThe lifting device 500 discussed in the above will be used in the operation S203 described herein. In some embodiments, the lifting device 500 is placed on the workbench 184 and the support bracket 600 such that the base 510 of the lifting device 500 is in contact with both the workbench 184 and the support bracket 600. In addition, the orientation of the lifting device 500 is adjusted such that the third portion 530C of the head 530 of the lifting device 500 is in contact with the bottom surface of the connecting member 1510. As discussed in the above, Figure 12A and Figure 12B As discussed in the above, the third portion 530C of the head 530 of the lifting device 500 can comprise a curved surface, and the lifting device 500 can be positioned such that the curved surface of the third portion 530C of the head 530 is in contact with the curved sidewall of the top portion 180A of the shaft 180. The presence of the support bracket 600 makes it more flexible to adjust the position of the lifting device 500.

[0163] Referring to Figure 15 and Figure 19 , the method 2000 proceeds to operation S204: lifting the REMA lens of the lithography tool via the lifting device. In some embodiments, the REMA lens 1500 is lifted by the lifting device 500 such that the REMA lens 1500 is moved from a first position (see Figure 18 ) to a second position (see Figure 19 ) that is higher than the first position. In more detail, by lifting the head 530 of the lifting device 500, the head 530 of the lifting device 500 can push the connecting member 1510 that is connected to the shaft 180, and the shaft 180 and the REMA lens 1500 will be lifted together with the connecting member 1510.

[0164] Referring to Figure 15 and Figure 20 , the method 2000 continues to operation S205: fixing the rotation assisting tool to the lithography tool. In more detail, the rotation assisting tool 700 discussed in the above Figures 14A-14B will be used in the operation S205 described herein. In some embodiments, after the REMA lens 1500 is lifted, the connecting member 1510 is vertically separated from the support frame 186, thereby creating a space between the support frame 186 and the connecting member 1510. Then, the rotation assisting tool 700 is fixed on the support frame 186. In more detail, the plate 712 of the rotation assisting tool 700 can be in contact with the sidewall of the support frame 186, and the plate 710 of the rotation assisting tool 700 is in contact with the top surface of the support frame 186. That is, the rotation assisting tool 700 is in contact with at least two sides of the support frame 186. In some embodiments, the rotation assisting tool 700 can be fixed on the support frame 186, for example, by screws. In addition, the wheel 722 of the rotation assisting tool 700 is in contact with the bottom surface of the middle portion 180B of the shaft 180. Figure 19The support bracket 600 and the lifting device 500 are omitted in the figure to clearly show the structure of the rotation assisting tool 700. It should be understood that the support bracket 600 and the lifting device 500 can still exist during operation S205.

[0165] Referring to Figure 15 and Figure 21 , the method 2000 proceeds to operation S206: rotating the REMA lens. In more detail, the REMA lens 1500 of the REMA imaging optical system 150 is rotated so that the aperture of the REMA lens 1500 can be outward, for example, toward the user. In some embodiments, the REMA lens 1500 can be rotated via the shaft 180, as described above. During the rotation of the shaft 180, the wheels 722 of the rotation assisting tool 700 are not only able to support the middle portion 180B of the shaft 180, but also maintain the smooth rotation of the shaft 180. Figure 19 The support bracket 600 and the lifting device 500 are omitted in the figure to clearly show the structure of the rotation assisting tool 700. It should be understood that the support bracket 600 and the lifting device 500 can still exist during operation S205.

[0166] The method 2000 proceeds to operation S207: repairing the REMA lens. In some embodiments, the repairing of the REMA lens 1500 is, for example, replacing the set of condenser lenses 152 with a new set of condenser lenses 152. However, the present disclosure is not limited thereto, and in other embodiments, operation S207 can be performed by repairing other optical elements in the REMA lens 1500.

[0167] In some embodiments, after the operation of repairing the REMA lens 1500 is completed, the REMA lens 1500 can be rotated back to the original orientation. Then, the rotation assisting tool 700, the lifting device 500, and the support bracket 600 can be disassembled from the lithography tool 100, and the REMA lens 1500 can be lowered back to the first position, as shown in Figure 16 .

[0168] According to the above embodiments, it can be seen that the present disclosure has advantages in the fabrication of integrated circuits. However, it should be understood that other embodiments can have additional advantages, and not all advantages are necessarily discovered before an embodiment is disclosed, and an embodiment can have particular advantages with respect to particular applications. Embodiments of the present disclosure provide a method of a lithography tool. A support frame is fixed on a stage of the lithography tool, and a lifting device is placed on the support frame and the stage. The lifting device is used to lift an optical element (e.g., a REMA lens) of the lithography tool without using a lifting mechanism (e.g., a pneumatic cylinder) integrated in the lithography tool, which is beneficial to prolong the service life of the lifting mechanism. In addition, the support frame allows the lifting device to be stably fixed to the lithography tool and the position of the lifting device to be flexibly adjusted. Embodiments of the present disclosure also provide a method of fixing a rotation auxiliary tool to the lithography tool such that a wheel of the rotation auxiliary tool is in contact with a shaft connected to the optical element. The rotation auxiliary tool not only supports the shaft but also keeps the shaft stably rotating, thereby improving the structural stability of the lithography tool.

[0169] In some embodiments of the present disclosure, a method includes the steps of: fixing a support bracket to a stage in a lithography tool; placing a lifting device on the support bracket; lifting an optical element in the lithography tool from a first level to a second level higher than the first level using the lifting device; rotating the optical element via a shaft connected to the optical element; and repairing the optical element.

[0170] In some embodiments, the method further includes the step of: fixing a rotation auxiliary tool to the lithography tool before rotating the optical element, wherein the rotation auxiliary tool includes a wheel in contact with a bottom surface of a portion of the shaft.

[0171] In some embodiments, the rotation auxiliary tool is fixed to the lithography tool after the optical element is lifted.

[0172] In some embodiments, the method further includes the step of: clamping the lifting device on the support bracket using a clamp.

[0173] In some embodiments, the step of lifting the optical element includes the step of: pushing a lifting frame connected to the shaft using the lifting device.

[0174] In some embodiments, the method further includes the step of: disassembling the lifting device and the support bracket from the lithography tool after repairing the optical element.

[0175] In some embodiments, a base of the lifting device is in contact with the stage and the support bracket.

[0176] In some embodiments, the optical element is a reticle masking (REMA) lens.

[0177] In some embodiments, the lifting device is a hydraulic bottle jack.

[0178] In some embodiments of the disclosure, a method comprises the steps of: lifting an optical element in a lithography tool from a first level to a second level higher than the first level; securing a rotation assist tool to the lithography tool, wherein the rotation assist tool comprises a wheel in contact with a bottom surface of a portion of a shaft connected to the optical element; rotating the optical element via the shaft, wherein during the rotating of the optical element, the portion of the shaft slides along the wheel of the rotation assist tool; and repairing the optical element.

[0179] In some embodiments, the rotation assist tool is secured to a support frame in the lithography tool, and wherein the rotation assist tool is in contact with at least two sides of the support frame.

[0180] In some embodiments, the rotation assist tool is secured to the support frame by a screw.

[0181] In some embodiments, the method further comprises the steps of: securing a support bracket to a worktable in the lithography tool; and placing a lifting device on the support bracket, wherein the lifting device is used to lift the optical element.

[0182] In some embodiments, the method further comprises the step of: disassembling the rotation assist tool from the lithography tool after the repairing of the optical element.

[0183] In some embodiments, the step of repairing the optical element comprises the step of: replacing a lens in the optical element with a new lens.

[0184] In some embodiments of the disclosure, a lithography tool comprises a worktable. An optical element is positioned above the worktable. A shaft is connected to the optical element, wherein the shaft is rotatable. A rotation assist tool is secured to the worktable, wherein the rotation assist tool comprises a wheel in contact with a bottom surface of a portion of the shaft.

[0185] In some embodiments, the rotation assist tool is detachable from the worktable.

[0186] In some embodiments, during the rotating of the optical element, the portion of the shaft slides along the wheel of the rotation assist tool.

[0187] In some embodiments, the lithography tool further comprises a support frame positioned on the worktable, wherein the rotation assist tool is secured to the support frame, and wherein the rotation assist tool is in contact with at least two sides of the support frame.

[0188] In some embodiments, the rotation assist tool is secured to the support frame by a screw.

[0189] In some embodiments, the shaft includes a bottom portion, a top portion, and a middle portion between the bottom portion and the top portion, wherein the wheel is in contact with the middle portion.

[0190] In some embodiments of the disclosure, the lithography tool includes a worktable. The support bracket is connected to the worktable. The optical element is above the worktable. The lifting device is disposed on the worktable and the support bracket, wherein the lifting device is used to lift the optical element from a first level to a second level higher than the first level.

[0191] In some embodiments, the lifting device is fixed on the support bracket using a clamp.

[0192] In some embodiments, the lifting device is detachable from the worktable and the support bracket.

[0193] In some embodiments, the top surface of the support bracket is flush with the top surface of the worktable.

[0194] In some embodiments, the optical element is a reticle masking (REMA) lens.

[0195] In some embodiments of the disclosure, the lithography tool includes a worktable. The optical element is above the worktable. The shaft is connected to the optical element, wherein the shaft is rotatable. The rotation assisting tool is fixed on the worktable, wherein the rotation assisting tool includes a wheel in contact with a bottom surface of a portion of the shaft, wherein the rotation assisting tool is detachable from the worktable.

[0196] The features of the several embodiments have been broadly summarized so that familiar devices, methods, and / or data structures can be better understood. Familiar devices, methods, and / or data structures can be easily adapted for use with the disclosed embodiments. Familiar devices, methods, and / or data structures can be easily adapted for use with the disclosed embodiments. Familiar devices, methods, and / or data structures can be easily adapted for use with the disclosed embodiments. Familiar devices, methods, and / or data structures can be easily adapted for use with the disclosed embodiments. Familiar devices, methods, and / or data structures can be easily adapted for use with the disclosed embodiments. Familiar devices, methods, and / or data structures can be easily adapted for use with the disclosed embodiments. Familiar devices, methods, and / or data structures can be easily adapted for use with the disclosed embodiments. Familiar devices, methods, and / or data structures can be easily adapted for use with the disclosed embodiments. Familiar devices, methods, and / or data structures can be easily adapted for use with the disclosed embodiments. Familiar devices, methods, and / or data structures can be easily adapted for use with the disclosed embodiments. Familiar devices, methods, and / or data structures can be easily adapted for use with the disclosed embodiments. Familiar devices, methods, and / or data structures can be easily adapted for use with the disclosed embodiments. Familiar devices, methods, and / or data structures can be easily adapted for use with the disclosed embodiments. Familiar devices, methods, and / or data structures can be easily adapted for use with the disclosed embodiments.

Claims

1. A lithography tool, characterized by, Comprising: a worktable; an optical element positioned above the worktable; a shaft connected to the optical element, wherein the shaft is rotatable; and a rotation assisting tool fixed on the worktable, wherein the rotation assisting tool comprises a wheel in contact with a bottom surface of a portion of the shaft.

2. The lithography tool of claim 1, wherein, wherein the rotation assisting tool is detachable from the worktable.

3. The lithography tool of claim 1, wherein, wherein the portion of the shaft slides along the wheel of the rotation assisting tool during rotation of the optical element.

4. The lithography tool of claim 1, wherein, further comprising a support frame positioned on the worktable, wherein the rotation assisting tool is fixed on the support frame, and wherein the rotation assisting tool is in contact with at least two sides of the support frame.

5. The lithography tool of claim 4, wherein, wherein the rotation assisting tool is fixed on the support frame by screws.

6. The lithography tool of claim 1, wherein, wherein the shaft comprises a bottom portion, a top portion, and a middle portion positioned between the bottom portion and the top portion, wherein the wheel is in contact with the middle portion.

7. A lithography tool characterized by, Comprising: a worktable; a support bracket connected to the worktable; an optical element positioned above the worktable; and a lifting device disposed on the worktable and the support bracket, wherein the lifting device is capable of lifting the optical element from a first level to a second level, the second level being higher than the first level.

8. The lithography tool of claim 7, wherein, wherein the lifting device is fixed on the support bracket using a clamp.

9. The lithography tool of claim 7, wherein, wherein the lifting device is detachable from the worktable and the support bracket.

10. A lithography tool characterized by, Comprising: a worktable; an optical element positioned above the worktable; a shaft connected to the optical element, wherein the shaft is rotatable; and a rotation assisting tool fixed on the worktable, wherein the rotation assisting tool comprises a wheel in contact with a bottom surface of a portion of the shaft, wherein the rotation assisting tool is detachable from the worktable.

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