Sample table for heating linear plasma device

Abstract

The utility model relates to the technical field of a plasma and wall material interaction (PMI) auxiliary system, and discloses a sample table for heating a linear plasma device, which comprises a heating plate, a temperature sensor and a vacuum chamber, a metal back plate is connected onto the heating plate, a sample holder is connected onto the metal back plate, and the temperature sensor is connected onto the vacuum chamber. The sample holder can attach and connect an experimental sample to the metal back plate, the metal back plate is provided with a bias wire connector, and the bias wire connector is used for being electrically connected with a bias power supply; the measuring end of the temperature sensor sequentially penetrates through the heating plate and the metal back plate and then is in contact with an experimental sample; the heating plate and the temperature sensor are both connected into the vacuum chamber in a sealed mode. The utility model has the beneficial effects that not only can an experimental sample be fixed, but also the experimental sample can be heated to a specific temperature set by an experiment.

Description

TECHNICAL FIELD

[0001] The utility model relates to the technical field of plasma and wall material interaction (PMI) auxiliary system, and particularly relates to a sample table for linear plasma device heating. BACKGROUND

[0002] Magnetic confinement nuclear fusion is considered as one of the main ways to solve human energy problems in the future, and the tokamak device is the most important controlled nuclear fusion device. The interaction between plasma and material is one of the key problems of the service life, safety and economy of the tokamak device. For PMI experiments carried out in the laboratory, a linear plasma device is usually used. The linear plasma device uses arc discharge to ionize the experimental target gas (He, H, D, etc.), generates plasma, and then carries out PMI reaction with the material (usually tungsten-based material or low-activation ferrite martensite steel).

[0003] During the PMI reaction, high-dose plasma will continue to heat the sample after contacting the material surface, and the corresponding reaction will be found only after reaching a certain temperature. In PMI experiments, in order to study the interaction between low-dose plasma and material, it is necessary to ensure that the material can reach a certain temperature, and the current sample table only has the function of fixing the experimental sample and cannot actively heat the experimental sample. UTILITY MODEL CONTENT

[0004] The technical problem to be solved by the utility model is that the current sample table only has the function of fixing the experimental sample and cannot actively heat the experimental sample, and the purpose is to provide a sample table for linear plasma device heating, which can not only fix the experimental sample, but also heat the experimental sample to a certain temperature set by the experiment.

[0005] The utility model is implemented by the following technical solutions:

[0006] A sample table for linear plasma device heating, comprising a heating plate, a temperature sensor and a vacuum chamber, a metal back plate is connected to the heating plate, a sample holder is connected to the metal back plate, the sample holder can be connected to the experimental sample on the metal back plate, a bias line connector is arranged on the metal back plate, and the bias line connector is used for electrical connection with a bias power supply; the measurement end of the temperature sensor is in contact with the experimental sample after passing through the heating plate and the metal back plate in sequence; the heating plate and the temperature sensor are both sealingly connected in the vacuum chamber.

[0007] The utility model discloses a beneficial effect is, through setting up the heating plate, and the metal backboard is connected on the heating plate, still will experimental sample and metal backboard bond together connection, be convenient for through the heating plate to experimental sample heating to the specific temperature of experimental setting, still be provided with bias line connector on the metal backplate, and bias line connector is used for with bias power supply electric connection, makes metal backplate electrification, still can change the plasma beam flow size on the sample through the adjustment bias, satisfy the demand of plasma irradiation sample under different working conditions, more truly simulate the various complex working conditions in tokamak nuclear fusion device, still the measuring end of temperature sensor is in contact with experimental sample after passing heating plate and metal backplate in proper order, and the real-time temperature of experimental sample can be accurately detected by temperature sensor.

[0008] In some embodiments, the heating plate is a ceramic heating plate, one side of the heating plate is provided with a heating wire input end, and the heating wire input end is electrically connected with the heating power supply. By setting the heating plate as a ceramic heating plate, the efficiency of heating is improved.

[0009] In some embodiments, a plurality of connecting holes are arranged on the heating plate, a plurality of mounting holes aligned with the connecting holes are arranged on the metal backplate, and the bias line connector passes through the connecting holes and the mounting holes in sequence to bond and connect the metal backplate on the heating plate. It is convenient to realize that the sample is loaded with negative bias.

[0010] In some embodiments, the sample holder is in a strip shape, the sample holder is a molybdenum strip, both ends of the molybdenum strip are connected with the metal backplate through connecting bolts, a gap is arranged between the metal backplate and the molybdenum strip, and the experimental sample is clamped in the gap. By clamping the experimental sample in the gap, it is convenient to replace and disassemble the experimental sample.

[0011] In some embodiments, a circular through-hole is arranged on the metal backplate, a temperature measuring hole aligned with the circular through-hole is arranged on the heating plate, a hollow ceramic sleeve is sleeved on the measuring end of the temperature sensor, and the hollow ceramic sleeve is in contact with the experimental sample after passing through the circular through-hole and the temperature measuring hole in sequence. By arranging the hollow ceramic sleeve outside the measuring end of the temperature sensor, the thermocouple is protected from damage under high temperature for a long time, the temperature measuring accuracy is prevented from being affected when the direct current negative bias is loaded, the measuring end of the temperature sensor is facilitated to be in full contact with the experimental sample, and the temperature measuring accuracy is improved.

[0012] In some embodiments, the temperature sensor is a K-type armored thermocouple, a plurality of ceramic sleeves are sleeved on the K-type armored thermocouple to form an assembly, and the assembly is sleeved in a protective tube. The K-type armored thermocouple has the characteristics of a maximum temperature measurement value of 1200 DEG C and a temperature measurement accuracy of ±1 DEG C, so that the accuracy of measuring the temperature of the experimental sample is ensured, and the temperature measurement accuracy is prevented from being affected when the direct current negative bias is loaded by sleeving the ceramic sleeves outside the armored K-type thermocouple.

[0013] In some embodiments, a base and a plurality of support seats are further included, the base is in a strip shape and horizontally lies on the bottom of the inner side of the vacuum chamber, the temperature sensor is parallel to the base, the bottom of the support seat is slidably connected to the base, and the top of the support seat is slidably connected to the protective tube. By arranging the plurality of support seats, the temperature sensor is supported and positioned to prevent displacement of the temperature sensor during work and affect the accuracy of measuring the temperature of the experimental sample.

[0014] In some embodiments, a ceramic insulating block, a heating plate support base and a bottom plate are further included, the bottom plate is slidably connected to the base, the heating plate support base is connected to the upper end of the bottom plate, and the two ends of the ceramic insulating block are connected to the heating plate and the heating plate support base respectively. The ceramic insulating block can effectively prevent the sample (or the metal back plate) from being conducted with the vacuum chamber.

[0015] In some embodiments, a front baffle is further included, the front baffle is slidably connected to the base, and the front baffle is located on the side of the heating plate away from the support seat. The front baffle is independently arranged on the side of the heating plate away from the support seat (at the front end of the entire heating sample table) to block the excess plasma flow, prevent damage to the ceramic assembly of the sample table, and prevent the plasma flow from connecting the bias voltage line port and the inner wall of the vacuum chamber.

[0016] In some embodiments, a ceramic connecting body and a baffle bottom plate are further included, the bottom of the baffle bottom plate is slidably connected to the base, the ceramic connecting body is connected to the upper end of the baffle bottom plate, and the front baffle is connected to the upper end of the ceramic connecting body. The front baffle is slidably connected to the base.

[0017] Compared with the prior art, the utility model has the advantages and beneficial effects that:

[0018] 1. The heating plate is arranged, a metal back plate is connected to the heating plate, and the experimental sample is connected to the metal back plate, so that the experimental sample can be heated to a specific temperature set by the heating plate.

[0019] 2. The bias voltage line joint is arranged on the metal back plate, and the bias voltage line joint is electrically connected with the bias voltage source, so that the metal back plate is electrified, and the size of the plasma beam on the sample can be changed by adjusting the bias voltage, so that the sample is irradiated by the plasma under different working conditions, and the complex working conditions in the tokamak nuclear fusion device are simulated more truly.

[0020] 3. The measurement end of the temperature sensor is in contact with the experimental sample after passing through the heating plate and the metal back plate in sequence, so that the temperature sensor can accurately detect the real-time temperature of the experimental sample.

[0021] 4. The front baffle is independently arranged on the side of the heating plate away from the support seat (located at the front end of the whole heating sample table), and is used for blocking the excess plasma flow, preventing damage to the ceramic components of the sample table, and preventing the plasma flow from connecting the bias voltage line port and the inner wall of the vacuum. DETAILED DESCRIPTION

[0022] The accompanying drawings used to provide further understanding of the embodiments of the present application, constitute a part of the present application, and do not constitute a limitation to the embodiments of the present application. In the drawings:

[0023] Figure 1 is an internal structure diagram of the present application;

[0024] Figure 2 is another internal structure diagram of the present application from another perspective;

[0025] Figure 3 is another internal structure diagram of the present application from another perspective

[0026] Figure 4 is an external structure diagram of the present application;

[0027] Figure 5 is an internal structure diagram of the present application; Figure 1 is an enlarged view of the K part of the present application.

[0028] Markings and corresponding part names in the drawings:

[0029] Front baffle 1, heating plate 2, heating plate support base 3, protection tube 4, support seat 5, vacuum chamber rear cover plate 6, ceramic connecting body 11, bottom plate 12, metal back plate 14, sample holder 15, connecting bolt 16, bias voltage line joint 17, heating line input end 18, ceramic insulating block 19, hollow ceramic sleeve 21, armored thermocouple 22, base 50, vacuum chamber 60. DETAILED DESCRIPTION

[0030] In order to make the purpose, technical scheme and advantages of the present application clearer, more apparent and more comprehensible, the present application will be further described in detail below with reference to the embodiments and drawings. The schematic embodiments of the present application and the description thereof are only used to explain the present application and should not be regarded as a limitation of the present application.

[0031] Throughout this specification, the term "one embodiment", "an embodiment", "one example", or "an example" means that a particular feature, structure, or characteristic described in connection with the embodiment or example is included in at least one embodiment of the present application. Therefore, the appearance of the phrases "in one embodiment", "in an embodiment", "in one example", or "in an example" at various places in the specification is not necessarily referring to the same embodiment or example. In addition, specific features, structures, or characteristics can be combined in any suitable manner and / or sub-combination in one or more embodiments or examples. In addition, those of ordinary skill in the art should understand that the drawings provided herein are for illustrative purposes only and are not necessarily drawn to scale. The term "and / or" as used herein includes any and all combinations of one or more of the associated listed items.

[0032] In the description of the present application, the terms "front", "back", "left", "right", "up", "down", "vertical", "horizontal", "high", "low", "inner", "outer", and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the devices or elements referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore should not be understood as limiting the scope of protection of the present application.

[0033] The terms "first", "second", and the like used in the present application are only used for the purpose of clear description and to distinguish the corresponding parts, and do not intend to limit any order or emphasize importance. In addition, the term "connection" used herein can be direct connection or indirect connection via other components, without special description.

[0034] Embodiment

[0035] As Figures 1-5As shown, the embodiment provides a sample table for linear plasma device heating, which comprises a heating plate 2, a temperature sensor and a vacuum chamber 60, the heating plate 2 is connected with a metal back plate 14, the metal back plate 14 is connected with a sample holder 15, the sample holder 15 can be connected with an experimental sample on the metal back plate 14, the metal back plate 14 is provided with a bias line connector 17, the bias line connector 17 is used for electrical connection with a bias power supply; the measuring end of the temperature sensor is in contact with the experimental sample after passing through the heating plate 2 and the metal back plate 14 in sequence; the heating plate 2 and the temperature sensor are both sealingly connected in the vacuum chamber 60. Specifically, the metal back plate is a metal molybdenum back plate, which improves the heat conduction performance and provides bias for the experimental sample.

[0036] Referring to Figures 1-5 , the heating plate 2 is a ceramic heating plate, one side of the heating plate 2 is provided with a heating wire input end 18, the heating wire input end 18 is electrically connected with the heating power supply. By setting the heating plate 2 as a ceramic heating plate, the efficiency of heating is improved.

[0037] Referring to Figures 1-5 , a plurality of connecting holes are arranged on the heating plate 2, a plurality of mounting holes are arranged on the metal back plate 14 and aligned with the connecting holes, and the bias line connector 17 passes through the connecting holes and the mounting holes in sequence to connect the metal back plate 14 on the heating plate 2. By passing the bias line connector 17 through the connecting holes and the mounting holes in sequence, the metal back plate 14 is connected on the heating plate 2, which facilitates to improve the heating effect of the heating plate 2 on the metal back plate 14, and further improves the heating effect on the experimental sample.

[0038] Referring to Figures 1-5 , the sample holder 15 is in a strip shape, the sample holder 15 is a molybdenum strip, the two ends of the molybdenum strip are connected with the metal back plate 14 through connecting bolts 16, and a gap is arranged between the metal back plate 14 and the molybdenum strip, and the experimental sample is clamped in the gap. By clamping the experimental sample in the gap, it is convenient to replace and disassemble the experimental sample.

[0039] Referring to Figures 1-5 , the metal back plate 14 is provided with a circular through hole, the heating plate 2 is provided with a temperature measuring hole aligned with the circular through hole, and a hollow ceramic sleeve 21 is arranged on the measuring end of the temperature sensor, the hollow ceramic sleeve 21 is in contact with the experimental sample after passing through the circular through hole and the temperature measuring hole in sequence. By arranging the hollow ceramic sleeve 21 outside the measuring end of the temperature sensor, the temperature measurement accuracy is prevented from being affected when the direct current negative bias is loaded, and the measuring end of the temperature sensor is facilitated to be in full contact with the experimental sample, thereby improving the temperature measurement accuracy.

[0040] Referring toFigures 1-5 The temperature sensor is a K-type armored thermocouple, a plurality of ceramic sleeves are sleeved on the K-type armored thermocouple to form an assembly, and the assembly is sleeved in the protection tube 4. The K-type armored thermocouple has a maximum temperature measurement value of 1200℃ and a temperature measurement accuracy of ±1℃. In order to ensure the accuracy of measuring the temperature of the experimental sample, ceramic sleeves are sleeved on the outside of the armored K-type thermocouple to prevent the temperature measurement accuracy from being affected when the direct current negative bias is loaded.

[0041] Referring to Figures 1-5 The base 50 is in a strip shape and horizontally lies on the bottom of the inside of the vacuum chamber 60. The temperature sensor is parallel to the base 50. The bottom of the support seat 5 is slidably connected to the base 50, and the top of the support seat 5 is slidably connected to the protection tube 4. The plurality of support seats 5 are arranged to support and position the temperature sensor, prevent the temperature sensor from moving during work, and affect the accuracy of measuring the temperature of the experimental sample.

[0042] Referring to Figures 1-5 The ceramic insulating block 19, the heating plate support base 3 and the bottom plate 12 are further included. The bottom plate 12 is slidably connected to the base 50. The heating plate support base 3 is connected to the upper end of the bottom plate 12. The two ends of the ceramic insulating block 19 are respectively connected to the heating plate 2 and the heating plate support base 3. The ceramic insulating block 19 can effectively prevent heat loss, ensure that heat is mainly used for the experimental sample rather than being emitted to the surrounding environment, so that the experimental sample can reach the required temperature faster. Meanwhile, the ceramic insulating block 19 can also prevent heat conduction to other components such as the heating plate support base 3 and the bottom plate 12, avoid deformation or damage of these components due to overheating, and prolong the service life of the entire device.

[0043] Referring to Figures 1-5 The front baffle 1 is further included. The front baffle 1 is slidably connected to the base 50 and located on the side of the heating plate 2 away from the support seat 5. The front baffle 1 is independently arranged on the side of the heating plate 2 away from the support seat 5 (at the front end of the entire heating sample table) to block the excess plasma flow, prevent damage to the sample table ceramic assembly, and prevent the plasma flow bias line port from being in communication with the inner wall of the vacuum.

[0044] Referring to Figures 1-5 The ceramic connecting body 11 and the baffle bottom plate 12 are further included. The bottom of the baffle bottom plate 12 is slidably connected to the base 50. The ceramic connecting body 11 is connected to the upper end of the baffle bottom plate 12. The front baffle 1 is connected to the upper end of the ceramic connecting body 11. The front baffle 1 is slidably connected to the base 50.

[0045] Referring to Figure 1 The vacuum chamber 60 comprises a vacuum chamber back cover plate 6, and the terminal box of the armored thermocouple 22 is mounted on the vacuum chamber back cover plate 6.

[0046] In specific operation, referring to Figures 1-5 Before vacuumizing the linear device, the experimental sample is fixed on the metal back plate 14 through the sample holder 15 and the connecting bolt 16 on the sample heating plate 2, and then the front baffle 1, the sample heating plate 2 and the heating plate support base 3 are sequentially placed in the linear device; the thermocouple is mounted on the support base 5, the position of the support base 5 on the base 50 is adjusted, the armored thermocouple 22 is abutted against the back of the experimental sample to fully contact, and then the armored thermocouple 22 is connected to the temperature patrol instrument through the thermocouple terminal; the bias voltage connecting line and the heating connecting line on the bias voltage source and the heating source are respectively connected with the bias voltage line joint 17 and the heating line input end 18 through the heating line and bias voltage terminals. The bias voltage source is turned on, the DC negative bias voltage value is adjusted, the connection of the bias voltage line is ensured not to be conducted with the inner wall of the vacuum chamber, the temperature patrol instrument is turned on, and the armored thermocouple 22 is ensured to operate normally; the linear device is vacuumized, after the vacuum degree reaches the experimental requirement, corresponding low-dose plasma discharge operation is performed; the heating source is turned on, the heating temperature and the heating rate are set, the experimental sample mounted on the metal back plate 14 is actively heated through the heating plate 2, and the temperature of the experimental sample is measured in real time by using the K-type armored thermocouple 22 mounted on the back of the sample and the temperature patrol instrument. After the sample completes the specified PMI experiment, the plasma discharge is stopped, the bias voltage source and the heating source are turned off, the linear device is continuously vacuumized for about 30 minutes, after the sample is cooled to room temperature to ensure that the surface of the sample after the PMI experiment is not oxidized by air, the vacuum is turned off, and the sample is taken out from the linear device.

[0047] The above specific embodiments further specifically describe the purpose, technical scheme and beneficial effects of the utility model, and it should be understood that the above description is only a specific embodiment of the utility model, and is not used to limit the protection scope of the utility model, and any modification, equivalent replacement, improvement, etc. within the spirit and principle of the utility model should be included in the protection scope of the utility model.

Claims

1. A sample stage for linear plasma device heating, characterized by, The utility model relates to a heating plate, a metal back plate connected to the heating plate, a sample holder connected to the metal back plate, the sample holder being capable of being attached to the metal back plate, a biasing wire connector provided on the metal back plate for electrical connection with a biasing power supply, a temperature sensor having a measuring end in contact with the sample after sequentially passing through the heating plate and the metal back plate, and a vacuum chamber in which the heating plate and the temperature sensor are both sealingly connected. The heating plate is a ceramic heating plate, one side of the heating plate being provided with a heating wire input end electrically connected to a heating power supply. The heating plate is provided with a plurality of connecting holes, the metal back plate is provided with a plurality of mounting holes aligned with the connecting holes, and the biasing wire connector sequentially passes through the connecting holes and the mounting holes to attach the metal back plate to the heating plate. The sample holder is in the shape of a long strip, the sample holder being a molybdenum strip, both ends of the molybdenum strip being connected to the metal back plate through connecting bolts, a gap being provided between the metal back plate and the molybdenum strip, and the sample being clamped in the gap.

2. The linear plasma device heating sample stage of claim 1, wherein, The metal back plate is provided with a circular through hole, the heating plate is provided with a temperature measuring hole aligned with the circular through hole, a hollow ceramic sleeve is provided on the measuring end of the temperature sensor, and the hollow ceramic sleeve sequentially passes through the circular through hole and the temperature measuring hole to contact the sample.

3. The linear plasma device heating sample stage of claim 1, wherein, The temperature sensor is a K-type armored thermocouple, a plurality of ceramic sleeves are provided on the K-type armored thermocouple to form an assembly, and the assembly is sleeved in a protective tube.

4. The linear plasma device heating sample stage of claim 1, wherein, The utility model further comprises a base and a plurality of support seats, the base being a long strip-shaped metal slide rail and lying horizontally on the bottom of the inner side of the vacuum chamber, the temperature sensor being parallel to the base, the bottom of the support seat being slidably connected to the base, and the top of the support seat being slidably connected to the protective tube.

5. The linear plasma device heating sample stage of claim 1, wherein, The utility model further comprises a ceramic insulating block, a heating plate support base, and a bottom plate, the bottom plate being slidably connected to the base, the heating plate support base being connected to the upper end of the bottom plate, and both ends of the ceramic insulating block being connected to the heating plate and the heating plate support base, respectively.

6. The linear plasma device heating sample stage of claim 1, wherein, The utility model further comprises a front baffle, the front baffle being slidably connected to the base, and the front baffle being located on the side of the heating plate away from the support seat.

7. The linear plasma device heating sample stage of claim 6, wherein, The utility model further comprises a ceramic connecting body and a baffle bottom plate, the baffle bottom plate being slidably connected to the base, the ceramic connecting body being connected to the upper end of the baffle bottom plate, and the front baffle being connected to the upper end of the ceramic connecting body.

8. The linear plasma device heating sample stage of claim 7, wherein, ​ 9. The linear plasma device heating sample stage of claim 7, wherein, ​ 10. The linear plasma device heating sample stage of claim 9, wherein, ​

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