Opening and closing bearing type vacuum plasma processing equipment
By designing an openable and receptacle-type vacuum plasma treatment equipment, a lifting and opening mechanism is used to uniformly supply plasma treatment gas to the chamber and material receiving plate, thereby achieving automated material handling. This solves the problems of high cost and low efficiency caused by manual operation and improves production safety and efficiency.
Patent Information
- Application Number
- CN202520482157.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-03-19
- Publication Date
- 2026-02-13
- Estimated Expiration
- 2035-03-19
AI Technical Summary
Existing vacuum plasma processing equipment requires manual opening and closing of the equipment cabinet doors, resulting in high costs, low efficiency, and a high risk of production accidents.
A vacuum plasma treatment device with an openable and receptacle design was designed. It uses a lifting and opening mechanism to uniformly supply plasma treatment gas to the chamber and material inlet/outlet, combined with a material receiving plate to achieve automated material handling.
It has enabled automated material handling, reduced the need for human resources, improved production efficiency, and reduced the risk of accidents.
Smart Images

Figure CN223912621U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model relates to vacuum plasma processing technology and its using equipment, specifically, it is a kind of open and close receiving type vacuum plasma processing equipment. BACKGROUND
[0002] Vacuum plasma processing is commonly used product surface treatment equipment, but the vacuum plasma equipment of present stage is mostly artificial switch equipment box door type, and workers carry out product material processing material loading and after processing material removal by opening equipment box door, and the manual taking and placing mode is high in cost, low in efficiency, and vacuum operation, improper operation can easily cause production accidents.
[0003] Therefore, it is necessary to provide an open and close receiving type vacuum plasma processing equipment to solve the above problems. UTILITY MODEL CONTENT
[0004] The utility model aims at providing an open and close receiving type vacuum plasma processing equipment.
[0005] Technical scheme is as follows:
[0006] An open and close receiving type vacuum plasma processing equipment, comprising a rack, a vacuum plasma process box is arranged on the rack, the vacuum plasma process box comprises a lower fixed box body fixedly arranged on the rack, and a lifting open and close type upper plasma processing gas uniform supply box body is arranged corresponding to the lower fixed box body;A material inlet and a material outlet are arranged corresponding to the butt joint of the lower fixed box body and the lifting open and close type upper plasma processing gas uniform supply box body, and a stretching material receiving plate is arranged corresponding to the material inlet and the material outlet respectively, forming an open and close receiving type vacuum plasma processing structure.
[0007] The lifting open and close type upper plasma processing gas uniform supply box body comprises an upper box body, an plasma processing gas supply pipe is arranged on the upper box body, an plasma processing gas filter is arranged on the plasma processing gas supply pipe, an plasma processing gas inlet pipe is arranged on the upper vacuum processing cavity of the upper box body, and the plasma processing gas inlet pipe is communicated with the plasma processing gas supply pipe, and the plasma processing gas inlet pipe is uniformly provided with an plasma processing gas outlet, forming an plasma processing gas uniform input type vacuum plasma processing structure.
[0008] Further, the plasma processing gas supply pipe is communicated with external plasma processing gas supply equipment, the external plasma processing gas supply equipment is used as pump type pressure plasma processing gas supply piece, and the plasma processing gas transmission corresponding to the plasma processing gas supply pipe is formed, forming a stable pressure type plasma processing gas guarantee structure.
[0009] Further, the plasma processing gas supply pipe is further provided with a vacuum electromagnetic valve.
[0010] Further, the lifting opening and closing type upper plasma processing gas uniform supply box is further provided with an RF matcher.
[0011] Further, the rack is provided with an upper box lifting support connected with the lifting driving member, and the upper box lifting support comprises four lifting columns arranged in two groups on the two sides, and the top portions of the lifting columns on the two sides are respectively provided with an upper box connecting plate A and an upper box connecting plate B.
[0012] Further, one of the upper box connecting plate A and the upper box connecting plate B is connected with the lifting opening and closing type upper plasma processing gas uniform supply box through a fixed connecting rod, and the other is connected with the lifting opening and closing type upper plasma processing gas uniform supply box through a rotating table and a hinge block, so as to form a one-side movable adjustment type fool-proof opening and closing structure.
[0013] Further, the lifting opening and closing type upper plasma processing gas uniform supply box is further provided with a process cavity observation window.
[0014] Compared with the prior art, the open and close receiving type vacuum plasma processing structure can automatically perform vacuum plasma processing on materials, reduces the occupation of human resources, and guarantees the work efficiency. BRIEF DESCRIPTION OF DRAWINGS
[0015] Figure 1 is a structural schematic view of the utility model.
[0016] Figure 2 is a structural schematic view of the utility model.
[0017] Figure 3 is a structural schematic view of the utility model.
[0018] Figure 4 is a structural schematic view of the utility model. DETAILED DESCRIPTION
[0019] Embodiment:
[0020] Please refer to Figures 1-3 , the embodiment shows an open and close receiving type vacuum plasma processing equipment, which comprises a rack 1, the rack 1 is provided with a vacuum plasma process box, the vacuum plasma process box comprises a lower fixed box body 2 fixedly arranged on the rack, and a lifting opening and closing type upper plasma processing gas uniform supply box 3 is arranged corresponding to the lower fixed box body 2; a material inlet 100 and a material outlet 200 are arranged corresponding to the butt joint of the lower fixed box body 2 and the lifting opening and closing type upper plasma processing gas uniform supply box 3, and a stretching material receiving plate 300 is arranged corresponding to the material inlet 100 and the material outlet 200 respectively, so as to form an open and close receiving type vacuum plasma processing structure.
[0021] The lifting opening and closing type upper plasma processing gas uniform supply box 3 comprises an upper box body 31, and a plasma processing cavity is arranged on the upper box body 31. Figure 4 A plasma processing gas access pipe 33 communicating with the plasma processing gas supply pipe is arranged on the upper vacuum processing cavity of the upper box body 31, and a plurality of plasma processing gas outlets 34 are uniformly arranged on the plasma processing gas access pipe 33, so as to form a plasma processing gas uniform input type vacuum plasma processing structure.
[0022] The lifting opening and closing type upper plasma processing gas uniform supply box 3 is provided with a debris detection piece 35 on both sides for detecting whether the material loading or unloading is collided and damaged.
[0023] The lifting opening and closing type upper plasma processing gas uniform supply box 3 is provided with a plasma material detection rod 36 on both sides for detecting whether the material loading or unloading is collided and damaged.
[0024] The plasma processing gas supply pipe 32 is connected with external plasma processing gas supply equipment, and the external plasma processing gas supply equipment is used as a pump type pressure plasma processing gas supply piece to transmit the plasma processing gas corresponding to the plasma processing gas supply pipe, so as to form a stable pressure type plasma processing gas guarantee structure.
[0025] The plasma processing gas supply pipe 32 is further provided with a vacuum electromagnetic valve.
[0026] The lifting opening and closing type upper plasma processing gas uniform supply box 31 is further provided with an RF matching device 38.
[0027] The rack is provided with an upper box lifting support 5 connected with the lifting driving piece 4, and the upper box lifting support 5 comprises four lifting columns 51 arranged in two groups on both sides, and the top of the lifting column on each side is provided with an upper box connecting plate A 52 and an upper box connecting plate B 53.
[0028] One of the upper box connecting plate A 52 and the upper box connecting plate B 53 is connected with the lifting opening and closing type upper plasma processing gas uniform supply box through a fixed connecting rod 54, and the other is connected with the lifting opening and closing type upper plasma processing gas uniform supply box through a rotating table 55 and a hinge block 56, so as to form a one-side movable adjustment type fool-proof opening and closing structure.
[0029] The lifting opening and closing type upper plasma processing gas uniform supply box 3 is provided with a process cavity observation window 37.
[0030] Compared with the prior art, the lifting opening and closing type upper plasma processing gas uniform supply box 3 can automatically perform material vacuum plasma processing, reduce the occupation of human resources, and guarantee the work efficiency.
[0031] For those skilled in the art, without departing from the inventive concept of the present application, a number of variations and improvements can be made, which all belong to the protection scope of the present application.
Claims
1. An openable and closable vacuum plasma processing apparatus, characterized by: The rack is provided with a vacuum plasma process box, which includes a lower fixed box body fixed on the rack, and a lifting opening and closing type upper plasma processing gas uniform supply box body corresponding to the lower fixed box body; a material inlet and a material outlet are arranged at the docking position of the lower fixed box body and the lifting opening and closing type upper plasma processing gas uniform supply box body; and a stretching material receiving plate is arranged corresponding to the material inlet and the material outlet, forming an opening and closing receiving type vacuum plasma processing structure. The lifting opening and closing type upper plasma processing gas uniform supply box body includes an upper box body, which is provided with a plasma processing gas supply pipe, and the plasma processing gas supply pipe is provided with a plasma processing gas filter; a plasma processing gas inlet pipe connected with the plasma processing gas supply pipe is arranged in the upper vacuum processing cavity of the upper box body, and the plasma processing gas inlet pipe is uniformly provided with a plasma processing gas outlet, forming a plasma processing gas uniform input type vacuum plasma processing structure.
2. An open-able bell-jar vacuum plasma processing apparatus as defined in claim 1, wherein: The plasma processing gas supply pipe is connected with external plasma processing gas supply equipment, which is used as a pump type pressure plasma processing gas supply device to transmit plasma processing gas corresponding to the plasma processing gas supply pipe, forming a stable pressure type plasma processing gas guarantee structure.
3. An openable vacuum processing apparatus according to claim 1 or 2, wherein: A vacuum electromagnetic valve is further arranged on the plasma processing gas supply pipe.
4. An open-able bell-jar vacuum plasma processing apparatus as defined in claim 3, wherein: An RF matcher is further arranged on the lifting opening and closing type upper plasma processing gas uniform supply box body.
5. An openable vacuum processing apparatus according to claim 4, wherein: The rack is provided with an upper box body lifting support connected with a lifting driving device, which includes four lifting columns arranged in two groups on both sides, and the top of the lifting columns on both sides is respectively provided with an upper box body connecting plate A and an upper box body connecting plate B.
6. An open-able bell jar vacuum plasma processing apparatus as defined in claim 5, wherein: One of the upper box body connecting plate A and the upper box body connecting plate B is connected with the lifting opening and closing type upper plasma processing gas uniform supply box body through a fixed connecting rod, and the other is connected with the lifting opening and closing type upper plasma processing gas uniform supply box body through a rotating table and a hinge block, forming a one-side movable adjustment type fool-proof opening and closing structure.
7. An openable vacuum processing apparatus according to claim 6, wherein: A process cavity observation window is arranged on the lifting opening and closing type upper plasma processing gas uniform supply box body.