Adjustable gas injection baffle and deposition equipment

By designing an adjustable gas injection baffle, the gas flow field during thin film deposition can be flexibly adjusted and the thickness of the finished film can be made uniform. This solves the problems of inconvenient gas flow field adjustment and uneven film thickness in the existing technology, and improves the convenience of operation and product quality.

CN223921541UActive Publication Date: 2026-02-17JIANGSU MICROVIA NANO EQUIP TECH CO LTD
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Patent Information

Application Number
CN202520577385.1
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2025-03-28
Publication Date
2026-02-17
Estimated Expiration
2035-03-28

AI Technical Summary

Technical Problem

In the existing thin film deposition process, the gas flow field is not easy to adjust, the finished film thickness is uneven, and changing the baffle plugging scheme requires shutdown operation, which poses a production risk.

Method used

Design an adjustable air injection baffle, comprising a baffle plate and a plugging component. The plugging component can be adjusted in a direction perpendicular to the baffle plate. By sealing or opening the vent hole with a plugging needle, the airflow control can be flexible and precise.

Benefits of technology

It improves the ease of gas flow field adjustment during thin film deposition, enhances the uniformity of finished film thickness, simplifies the operation process, and reduces production risks.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model discloses an adjustable gas injection baffle and deposition equipment, the adjustable gas injection baffle mainly comprises a barrier plate and a hole blocking piece, the barrier plate is provided with a vent hole for airflow to pass through and enter a reaction cavity, and the hole blocking piece is arranged on one side, far away from the reaction cavity, of the barrier plate and can be adjusted in the direction perpendicular to the barrier plate; when the hole blocking piece is adjusted to the first position in the direction perpendicular to the barrier plate, at least part of the vent holes in the barrier plate are blocked so as to block an airflow passing path. According to the utility model, the hole blocking piece is additionally arranged, so that the state of the vent hole in the barrier plate can be adjusted, the flow field of air flow entering the reaction cavity is realized, and the air flow field is blocked and adjusted when a finished film in the reaction cavity is non-uniformly deposited, so that the deposition uniformity is improved, and the yield of the finished film is improved.
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Description

TECHNICAL FIELD

[0001] The utility model relates to the technical field of deposition equipment, especially to an adjustable gas injection baffle and deposition equipment. BACKGROUND

[0002] At present, in the fields of semiconductor, micro-electro-mechanical system and solar cell, thin film deposition technology such as chemical vapor deposition (CVD) or atomic layer deposition (ALD) is needed to make finished film products. In the reaction process, the reaction gas needs to pass through the baffle first to control the flow resistance and flow field of the gas after premixing, and then enter the reaction chamber through the spray plate to deposit in the target area. However, due to the complexity of the deposition process, there are some areas in the target area where the film thickness is not uniform, and it is difficult to adjust during the process. In severe cases, the gas flow field downstream of the baffle needs to be changed by plugging holes to improve the uniformity of the film. However, for different process scenarios, there may be film thickness imbalance problems in different areas, and different baffle plugging schemes are needed. At the same time, when changing the plugging scheme, the reaction chamber needs to be opened for replacement, which not only complicates the operation and prolongs the cycle, but also changes the chamber state and poses new production risks.

[0003] Therefore, how to improve the convenience of adjusting the gas flow field during the thin film deposition process and improve the uniformity of the finished film thickness is a technical problem that needs to be solved by those skilled in the art. UTILITY MODEL CONTENT

[0004] Therefore, the utility model aims to provide an adjustable gas injection baffle to improve the convenience of adjusting the gas flow field during the thin film deposition process and improve the uniformity of the finished film thickness.

[0005] Another purpose of the utility model is to provide a deposition equipment internally provided with the above-mentioned adjustable gas injection baffle.

[0006] To achieve the above-mentioned purpose, the utility model provides the following technical scheme:

[0007] An adjustable gas injection baffle, comprising a blocking baffle and a plugging piece, the blocking baffle is provided with a gas passage hole for gas flow to pass through and enter a reaction chamber, the plugging piece is arranged on the side of the blocking baffle away from the reaction chamber and can be adjusted in a direction perpendicular to the blocking baffle.

[0008] When the plugging piece is adjusted to a first position in the direction perpendicular to the blocking baffle, at least part of the gas passage hole on the blocking baffle is plugged to block the gas flow path.

[0009] Preferably, in the adjustable gas injection baffle described above, the hole blocking member comprises a hole blocking plate, a plurality of hole blocking needles are arranged on the hole blocking plate, and each hole blocking needle has a floating area in the direction perpendicular to the baffle plate; when the hole blocking plate is in the first position, the hole blocking needles float to close or open the air holes.

[0010] Preferably, in the adjustable gas injection baffle described above, the hole blocking needle has a working position to close a part of the opening of the air hole during the process from completely opening the air hole to completely closing the air hole.

[0011] Preferably, in the adjustable gas injection baffle described above, the end of the hole blocking needle towards the air hole is in a stepped structure, a hemispherical structure or a sharp pointed conical structure.

[0012] Preferably, in the adjustable gas injection baffle described above, the hole blocking needle is arranged one-to-one corresponding to the air hole.

[0013] Preferably, in the adjustable gas injection baffle described above, the hole blocking member has the same area as the baffle plate, and the hole blocking member is divided into at least two independently driven areas.

[0014] Preferably, in the adjustable gas injection baffle described above, the hole blocking member is divided into three concentric circular ring areas in the radial direction, and each circular ring area is divided into six fan ring structures with equal area and concentric by six radii, and each fan ring structure of the hole blocking member is independently driven.

[0015] Preferably, in the adjustable gas injection baffle described above, the hole blocking plate is driven by a motor to realize lifting in the direction perpendicular to the baffle plate.

[0016] Preferably, in the adjustable gas injection baffle described above, when the hole blocking plate is adjusted to the second position in the direction perpendicular to the baffle plate, the hole blocking plate is arranged separately and spaced apart from the baffle plate.

[0017] A deposition device comprising the adjustable gas injection baffle described in any of the above embodiments.

[0018] As can be seen from the above technical solutions, the adjustable gas injection baffle provided by the utility model mainly comprises a baffle plate and a hole blocking member, wherein the baffle plate is arranged between the gas inlet and the reaction chamber, and a plurality of air holes are formed on the surface of the baffle plate, so that the reaction gas entering from the gas inlet can reach the inside of the reaction chamber through the air holes; and the hole blocking member can be adjusted in height to block at least part of the air holes on the baffle plate, when the deposition thickness of part of the area of the membrane product in the reaction chamber is too thick, the hole blocking member is adjusted to block the corresponding air holes above the thicker area to reduce the deposition rate, and when the thickness is uniform, the air holes are kept fully open to ensure the deposition rate and improve the uniformity of the finished film thickness. BRIEF DESCRIPTION OF DRAWINGS

[0019] To more clearly illustrate the technical solutions in the embodiments of this utility model or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0020] Fig. 1 This is a schematic diagram of the cross-sectional structure of the adjustable gas injection baffle provided in an embodiment of the present utility model;

[0021] Fig. 2 This is a schematic diagram of the partitioning of the plugging component;

[0022] Fig. 3 This is a schematic diagram showing the connection between a single plugging needle and a vent hole.

[0023] Among them, 10-baffle plate; 110-vent hole; 20-plugging part; 210-plugging needle; 30-airflow inlet. Detailed Implementation

[0024] The core of this invention lies in disclosing an adjustable gas injection baffle to improve the ease of adjusting the gas flow field during thin film deposition and enhance the uniformity of the finished film thickness.

[0025] Another objective of this invention is to provide a deposition device with the aforementioned adjustable gas injection baffle internally.

[0026] To enable those skilled in the art to better understand the present invention, embodiments of the present invention will be described below with reference to the accompanying drawings. Furthermore, the embodiments shown below do not limit the scope of the invention as described in the claims. Additionally, the complete contents of the configurations shown in the following embodiments are not limited to those necessary for the solution of the invention as described in the claims.

[0027] like Figs. 1-3 As shown in the figure, the adjustable gas injection baffle provided in this embodiment of the present invention mainly consists of a baffle plate 10 and a plugging component 20. The baffle plate 10 is disposed between the gas inlet 30 and the reaction chamber to regulate the flow field of the gas flow. Specifically, the baffle plate 10 has a vent hole 110 to allow the gas flow to pass smoothly through and enter the reaction chamber, thereby meeting the supply requirements of the reaction gas during the deposition process. It should be noted that the shape and size of the vent hole 110 can be designed according to actual process requirements, for example, it can be circular, square, or other irregular shapes to adapt to different gas flow rates and distribution requirements.

[0028] The blocking piece 20 is arranged on the side of the blocking plate 10 away from the reaction cavity, that is, the blocking piece 20 is located between the blocking plate 10 and the gas inlet 30, and the blocking piece 20 can be adjusted in the direction perpendicular to the blocking plate 10. It should be noted that the adjustment of the blocking piece 20 is realized by a specific driving mechanism, which can be motor-driven, cylinder-driven or manually adjusted. At the same time, the blocking piece 20 can be moved to the first position in the direction perpendicular to the blocking plate 10, and it should be noted that when the blocking piece 20 is moved to the first position, it can block at least part of the air holes 110 on the blocking plate 10, thereby effectively blocking the passing path of the gas flow. The operator can flexibly adjust the on-off of the gas flow according to the actual process requirements, thereby improving the adaptability of the equipment and the convenience of operation.

[0029] As in some embodiments of the present application, under certain deposition conditions, the deposition rate of the film product in part of the reaction cavity is too fast, and when the film thickness is relatively thick, the blocking piece 20 is adjusted to the first position within a certain period of time to close the air hole 110 corresponding to the film thickness area, and the supply of the part of the reaction gas is stopped to reduce the deposition rate of the film thickness area, so that the deposition of each position of the film product is more uniform, and the complex adjustment of the entire gas system is not required during the process, thereby improving the convenience of deposition process adjustment. It should be noted that by reasonably adjusting the position of the blocking piece 20, the gas flow can be accurately controlled, thereby improving the performance of the deposition equipment and the product quality.

[0030] Further, the blocking of the blocking piece 20 to the blocking plate 10 can be closed by a plane, that is, the blocking piece 20 directly covers the blocking plate 10 to realize the shielding and closing effect of the air hole 110, and the blocking plate can also be provided with a protruding structure to be inserted into the air hole 110 to realize the blocking. In some embodiments of the present application, in order to improve the shielding and closing effect of the blocking piece 20 to the blocking plate 10, the blocking piece 20 comprises a blocking plate, and a plurality of blocking needles 210 are arranged on the plate structure of the blocking plate. The size of the blocking needle 210 is matched with the size of the air hole 110, so that the blocking needle 210 can be inserted into the air hole 110 to realize the closing of the air hole 110. At the same time, each blocking needle 210 also has a floating area in the direction perpendicular to the blocking plate 10, so that each blocking needle 210 can move freely to a certain extent, so that the blocking needle 210 can better adapt to the position and shape change of the air hole 110, thereby more accurately closing or opening the air hole 110 when the blocking piece 20 is located at the first position, and improving the adjustment effect of the blocking piece 20 to the air hole 110. It should be noted that the floating structure of the blocking needle 210 can be realized by a spring or other elastic element, or a slide structure can be provided to realize the mechanical driving mode.

[0031] In the above embodiments, when the hole-plugging needles 210 cooperate with the air holes 110, the mode of action between the two is similar to a dynamic sealing mechanism, and the floating characteristics of the hole-plugging needles 210 allow them to automatically adjust the position when in contact with the air holes 110 to ensure sealing effects, so that when there are slight irregularities on the edges of the air holes 110, the hole-plugging needles 210 can fill these gaps by floating, thereby achieving better sealing performance.

[0032] In addition, the number and layout of the hole-plugging needles 210 can be designed according to the distribution of the air holes 110 on the blocking plate 10 to ensure that the areas on the blocking plate 10 that need to be regulated or each air hole 110 on the blocking plate 10 can be effectively controlled. For example, the same number of hole-plugging needles 210 can be provided corresponding to the uniformly distributed air holes 110 on the blocking plate 10, so that each air hole 110 can be independently closed or opened, which not only improves the flexibility of airflow control, but also makes it possible to achieve complex airflow distribution patterns, and different areas of the air holes 110 can be controlled separately at different process stages, thereby optimizing the gas supply and distribution effect during the deposition process.

[0033] In order to further optimize the regulation effect of the hole-plugging member 20, in some embodiments of the present application, the hole-plugging needles 210 on the hole-plugging plate have an open position that fully opens the air holes 110, a closed position that fully closes the air holes 110, and an intermediate working position that partially closes the air holes 110. This structural design allows the hole-plugging needles 210 to not only switch between fully opening and fully closing the air holes 110, but also to adjust the opening area of the air holes 110 in the intermediate state, thereby providing a more precise adjustment means for airflow control. In some specific embodiments, the deposition process requires fine-tuning of the airflow flow rate rather than simple on-off control, and at this time, by adjusting the hole-plugging needles 210 to the partially closed working position, linear adjustment of the airflow flow rate can be achieved. In other words, when the hole-plugging needles 210 move from the position of fully opening the air holes 110 to the position of fully closing the air holes 110, the contact area between the hole-plugging needles 210 and the air holes 110 gradually increases, thereby gradually reducing the effective opening area of the air holes 110, and in this process, the airflow flow rate will decrease accordingly with the change in the opening area. This continuous adjustment function allows the operator to flexibly adjust the airflow flow rate according to the actual process requirements without the need to frequently switch the air holes 110 between fully open and fully closed states, which not only improves the adaptability of the equipment, but also better meets the high-precision requirements for airflow control under complex process conditions, allowing the hole-plugging needles 210 to function like a variable throttle valve.

[0034] In order to further optimize the above technical solutions, in the adjustable air injection baffle provided by the embodiment of the utility model, the end of the hole plugging needle 210 towards the air hole 110 can be provided with a stepped structure, so that when the hole plugging needle 210 is in contact with the air hole 110, it can gradually realize sealing by the stepped surfaces of different heights, and meet the air flow adjustment requirements of the hole plugging needle 210 for the air hole 110, and the gradual sealing mode can not only reduce the pressure impact on the edge of the air hole 110 in the sealing process, but also improve the reliability of sealing. In the initial stage of contact between the hole plugging needle 210 and the air hole 110, the lower stepped surface first contacts the edge of the air hole 110, and as the hole plugging needle 210 moves further, the higher stepped surface gradually contacts the air hole 110, and finally realizes complete sealing, so that the shape and size changes of the air hole 110 can be better adapted in the sealing process, thereby improving the sealing effect.

[0035] Meanwhile, in some other embodiments of the utility model, the end of the hole plugging needle 210 towards the air hole 110 can also be provided with a hemispherical structure, and the smooth surface of the hemispherical structure can better fit the edge of the air hole 110, reduce air leakage at the sealing place, and also achieve gradual sealing, and meet the air flow adjustment requirements of the hole plugging needle 210 for the air hole 110.

[0036] In addition, in some other embodiments of the utility model, the end of the hole plugging needle 210 towards the air hole 110 can also be provided with a tapered structure, and the tip of the tapered structure is arranged towards the air hole 110. When the hole plugging needle 210 of the tapered structure is in contact with the air hole 110, it can be guided into by the tip part, and the flow of the air hole 110 can be adjusted according to the insertion depth of the tip in the air hole 110, and then as the hole plugging needle 210 moves further, the tapered part gradually fits the air hole 110 to realize complete sealing.

[0037] Further, in order to improve the adjustment accuracy of the hole plugging plate for the air holes 110 on the blocking plate 10, in some embodiments of the utility model, the hole plugging needle 210 of the adjustable air injection baffle and the air hole 110 are provided in a one-to-one correspondence. That is, the number of hole plugging needles 210 is the same as the number of air holes 110, and each air hole 110 has a special hole plugging needle 210 to cooperate with it, so that independent control of each air hole 110 is realized. In actual deposition conditions, if it is necessary to control the air flow of different areas separately, this design can realize it by independently driving each hole plugging needle 210. Each hole plugging needle 210 can be individually adjusted to a fully open, fully closed or partially closed state, thereby realizing accurate control of the air flow of each air hole 110. This independent control mode not only can meet the complex process requirements, but also can improve the flexibility and adaptability of the equipment.

[0038] In addition, the one-to-one setting mode also simplifies the matching relationship between the plugging needles 210 and the vent holes 110. Since each plugging needle 210 corresponds to one vent hole 110, the size and positional relationship between them can be more accurately controlled during the design and manufacturing process. This precise matching relationship can reduce errors during the sealing process and improve the reliability of the sealing.

[0039] Further, in some embodiments of the present application, the plugging member 20 in the adjustable gas injection baffle and the blocking plate 10 have the same area, so that the plugging member 20 can completely cover the vent hole 110 area on the blocking plate 10, so that full sealing of all vent holes 110 can be achieved when needed. This same area setting provides a sufficient physical basis for the adjustment and sealing function of the plugging member 20, ensuring that when the plugging member 20 moves to the first position, it can effectively block the airflow through the path. At the same time, the plugging member 20 is divided into at least two independently driven areas, which makes it possible to control the airflow in different areas, i.e. the plugging member 20 can be divided into two, three or more areas, and each area can be independently adjusted. The division of independently driven areas allows operators to control the vent holes 110 in different areas according to actual process requirements, i.e. the vent holes 110 in some areas can be completely closed, while the vent holes 110 in other areas can remain open, thereby achieving flexible adjustment of airflow distribution and more intelligent airflow management.

[0040] Based on the above embodiments, as shown in Fig. 2 In some embodiments of the present application, the plugging member 20 of the adjustable gas injection baffle is divided into three concentric circular ring areas along the radial direction, so that the plugging member 20 presents a hierarchical layout in structure. At the same time, each circular ring area is divided into six fan ring structures with equal area and concentric by six radii, thereby forming multiple independent control units to provide high flexibility for fine control of airflow. Specifically, each fan ring structure of the plugging member 20 can be independently driven so that operators can individually adjust each fan ring structure according to actual process requirements. During the deposition process, if it is necessary to accurately adjust the airflow distribution in the reaction chamber, different fan ring structure areas of the plugging member 20 can be independently driven to achieve this. The vent holes 110 of some fan ring structures can be completely closed, while the vent holes 110 of other fan ring structures can remain open or be adjusted to a partially closed state. This independent control method not only meets complex process requirements, but also enables high-precision optimization of airflow distribution.

[0041] In addition, the separation mode of the three concentric circular ring and sector ring structure also provides great convenience for the automatic control of the device. Each sector ring structure can be controlled by a separate driving mechanism, which can be connected to the control system of the device to realize intelligent airflow management. The adjustment parameters of different sector ring structures can be preset by a computer program, and then the control system automatically controls the lifting of the hole blocking piece 20 of each sector ring structure to realize dynamic adjustment of the airflow distribution.

[0042] In addition, it should be noted that in the adjustable gas injection baffle provided in the embodiments of the present application, the hole blocking piece 20 can be driven by a motor to lift in the direction perpendicular to the baffle plate 10. Motor drive is a highly automated adjustment method that can achieve precise adjustment of the position of the hole blocking piece 20 through precise control algorithms, providing stable power output and precise position control. Through forward and reverse rotation and speed adjustment of the motor, rapid lifting and precise positioning of the hole blocking piece 20 can be achieved. In addition, the motor drive can also be combined with the control system of the device to realize intelligent airflow management.

[0043] It should be noted that the hole blocking piece 20 includes at least three moving gears during driving by the motor. Specifically, the hole blocking piece 20 is fully opened when it is in the first gear, the hole blocking piece 20 is fully closed when it is in the second gear, and when the hole blocking piece 20 is in the third gear, it closes part of the air hole 110. At this time, the air hole 110 still maintains the function of airflow passing, but the airflow passing rate is weaker than that of the fully open air hole 110, and the multi-polar and fine adjustment requirements of the gas flow field are realized.

[0044] In other embodiments of the present application, one side of the hole blocking piece 20 is provided with a handle extending out of the deposition device, and the lifting in the direction perpendicular to the baffle plate 10 is realized by manual adjustment. The manual adjustment method provides a direct control means for the operator, and is especially suitable for some process steps that require manual intervention; its adjustment process is simpler and more intuitive, and the operator can directly adjust the hole blocking piece 20 according to actual observation and experience. In addition, it should be noted that manual adjustment can also be used as a backup adjustment method. When the motor drive system fails or needs to be adjusted quickly, the operator can quickly restore the normal operation of the device by manually adjusting the handle.

[0045] Further, the plugging piece 20 of the adjustable gas injection baffle is spaced and separated from the baffle 10 when adjusted to the second position in the direction perpendicular to the baffle 10, that is, the plugging piece 20 can keep a certain distance from the baffle 10 in the non-working state, thereby avoiding unnecessary contact and friction between the two. Such a separate arrangement not only helps to prolong the service life of the equipment, but also provides a more unobstructed path for the free passage of gas flow.

[0046] Further, the utility model embodiment further provides a deposition equipment, the inside of the deposition equipment is provided with the adjustable gas injection baffle provided by any one of the above embodiments, and since the adjustable gas injection baffle has the technical effect provided by any one of the above embodiments, the deposition equipment also has the above technical effect, which will not be repeated here.

[0047] The terms "first", "second", "left side" and "right side" and the like in the description and claims of the utility model and the above drawings are used to distinguish different objects, and are not used to describe a specific order. In addition, the terms "include" and "have" and any variations thereof are intended to cover non-exclusive inclusion. For example, a process, method, system, product or device that includes a series of steps or units is not limited to the listed steps or units, but can include steps or units that are not listed.

[0048] The above description of the disclosed embodiments enables a person skilled in the art to implement or use the utility model. Various modifications to these embodiments will be apparent to those skilled in the art, and the general principles defined herein can be implemented in other embodiments without departing from the spirit or scope of the utility model. Therefore, the utility model will not be limited to these embodiments shown herein, but will conform to the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. An adjustable gas injection baffle, characterized by, The adjustable gas injection baffle comprises a baffle plate and a hole blocking member, the baffle plate is provided with a plurality of air holes for air flow to pass through and enter a reaction cavity, and the hole blocking member is arranged on a side of the baffle plate away from the reaction cavity and can be adjusted in a direction perpendicular to the baffle plate; When the hole blocking member is adjusted to a first position in the direction perpendicular to the baffle plate, at least part of the air holes on the baffle plate are blocked to block the air flow path.

2. The adjustable gas injection baffle of claim 1, wherein, The hole blocking member comprises a hole blocking plate provided with a plurality of hole blocking needles, and each hole blocking needle has a floating area in the direction perpendicular to the baffle plate; when the hole blocking member is in the first position, the hole blocking needles on the hole blocking plate are adjusted to be floated to close or open the air holes.

3. The adjustable sparging baffle of claim 2, wherein, The hole blocking needle has a working position to close part of the opening area of the air hole from completely opening the air hole to completely closing the air hole.

4. The adjustable sparge baffle of claim 3, wherein, The end of the hole blocking needle towards the air hole is a stepped structure, a hemispherical structure or a sharp pointed conical structure.

5. The adjustable sparge baffle of claim 2, wherein, The hole blocking needle is arranged one-to-one corresponding to the air hole.

6. The adjustable sparge baffle of claim 1, wherein, The hole blocking member has the same area as the baffle plate, and the hole blocking member is divided into at least two independently driven areas.

7. The adjustable sparging baffle of claim 6, wherein, The hole blocking member is divided into three concentric ring areas in the radial direction, and each ring area is divided into six fan ring structures with equal area and concentric by six radii, and each fan ring structure of the hole blocking member is independently driven.

8. The adjustable sparge baffle of claim 1, wherein, The hole blocking member is driven by a motor to rise and fall in the direction perpendicular to the baffle plate.

9. The adjustable sparge baffle of claim 1, wherein, When the hole blocking member is adjusted to a second position in the direction perpendicular to the baffle plate, the hole blocking member is arranged spaced and separated from the baffle plate.

10. A deposition apparatus, characterized by, The adjustable gas injection baffle comprises a baffle plate and a hole blocking member, the baffle plate is provided with a plurality of air holes for air flow to pass through and enter a reaction cavity, and the hole blocking member is arranged on a side of the baffle plate away from the reaction cavity and can be adjusted in a direction perpendicular to the baffle plate;