Film thickness measuring system applied to vacuum

Abstract

The utility model discloses a film thickness measuring system applied under vacuum, which comprises a vacuum evaporation chamber, a measuring head and a light spot monitoring device, the light spot monitoring device comprises a camera element configured on a monitoring window and used for shooting a measured light spot, and an analysis part used for analyzing the measured light spot, a film thickness estimation unit for estimating the film thickness of the measurement object based on the image pickup by the image pickup element; wherein the camera shooting element is arranged outside the vacuum evaporation chamber, and the camera shooting element and the moving direction of the measuring head are not on the same straight line; wherein a reflecting element is configured between the measuring head and the camera element, the reflecting element is used for adjusting the incident angle of the measuring light spot, a periscopic assembly is configured between the reflecting element and the camera element, and the periscopic assembly is configured to reflect the measuring light spot through light path reflection. Therefore, the camera element can receive the incident measuring light.

Description

Technical Field

[0001] This utility model relates to the field of vapor deposition film thickness measurement technology, specifically to a film thickness measurement system applied under vacuum. Background Technology

[0002] In the OLED (Organic Light Emitting Diode) panel display industry, water evaporation is an indispensable core process for manufacturing high-quality OLED panels. This process requires the precise deposition of luminescent materials and other functional materials onto specific locations on a target substrate through heating and evaporation in an ultra-high vacuum environment. Due to the unique light-emitting mechanism of OLEDs, the film deposited on the substrate must be extremely thin, typically ranging from 0.1 nm to 12 nm. The accuracy and stability of this film thickness are crucial to the performance of OLED light-emitting devices; any minute deviation can lead to performance degradation or failure. Since the film materials of OLED panels are mostly organic and extremely sensitive to water and oxygen, the industry generally uses optical non-contact methods to measure film thickness. Among these, spectral reflectance (SR) is a mature and widely used measurement method. However, in the OLED panel production process, a film thickness measurement system must be installed in the vacuum evaporation chamber to monitor the thickness of the deposited film.

[0003] like Figure 1 As shown, confirming the position of the light spot is a challenging problem in existing technologies. First, if existing camera mounting methods are used for spot confirmation, a viewing window needs to be added at a specific point to the fixed position. However, since the position of the light spot changes when detecting different vapor-deposited thin films, the outer wall of the chamber blocks the light, preventing the camera lens from being mounted vertically and thus making it impossible to accurately capture the position of the light spot. Second, since the camera cannot currently be installed inside a vacuum vapor deposition chamber (because the optical components and circuit board seals would shatter in a high vacuum environment), real-time monitoring of moving light spots is not possible.

[0004] Furthermore, the position of the light spot in the detection area directly affects the measurement of film thickness. During production, natural substrate sagging or misalignment can cause the light spot position to shift, leading to abnormal film thickness data. Since it's impossible to determine whether the abnormal film thickness is due to the product's film thickness or the light spot position, the true film thickness may not be effectively monitored and adjusted. Moreover, the light spot position cannot be accurately observed from the bottom of the chamber, and the viewing window at the top of the chamber also cannot accurately show the position due to limitations in line of sight and angle. Therefore, it is necessary to stop the machine, break the vacuum, and open the chamber for confirmation, which severely impacts production capacity and wastes manpower. Therefore, there is an urgent need to design a new light spot system that, through a fixed lens and measuring head, can monitor the relative position of the light spot to the detection area at both fixed and moving points. Utility Model Content

[0005] The technical problem to be solved by this utility model is to overcome the shortcomings of the existing technology and provide a film thickness measurement system for use in vacuum. Through the innovative design of the spot monitoring device, the thickness of the vapor-deposited film under vacuum is detected.

[0006] To achieve the above objectives, the technical solution adopted by this utility model is as follows:

[0007] A film thickness measurement system for use in vacuum includes a vacuum evaporation chamber, a measuring head, and a spot monitoring device. The vacuum evaporation chamber has a monitoring window on its side wall. The measuring head is disposed inside the vacuum evaporation chamber and configured to emit a measuring spot. The spot monitoring device is configured to monitor the thickness of the evaporated film layer based on the measuring spot. The spot monitoring device includes:

[0008] A camera element configured on a monitoring window, the camera element being used to capture images of the measurement spot, and a resolution unit being used to estimate the film thickness of the object being measured based on the images captured by the camera element;

[0009] The camera element is disposed outside the vacuum evaporation chamber, and the camera element is configured not to be in the same straight line as the direction of movement of the measuring head;

[0010] A reflective element is disposed between the measuring head and the camera element. The reflective element is used to adjust the incident angle of the measuring light spot. A periscope assembly is disposed between the reflective element and the camera element. The periscope assembly is configured to reflect the measuring light spot through optical path reflection, so as to enable the camera element to receive the incident measuring light.

[0011] Furthermore, the light spot monitoring device also includes a focusing element, which is used to extend the focal length and reduce attenuation during optical path transmission to adapt to changes in focal length when the measuring head is measuring at different positions.

[0012] Furthermore, the focusing element is disposed between the measuring head and the periscope assembly.

[0013] Furthermore, the length and installation position of the focusing element can be dynamically adjusted.

[0014] Furthermore, the film thickness measurement system also includes a substrate for placing the vapor-deposited film layer, the substrate having multiple detection areas.

[0015] Furthermore, each detection region corresponds to a membrane layer.

[0016] Furthermore, the camera element is configured to monitor the thickness of the vapor-deposited film layer by capturing the relative position of the light spot and the detection area in real time.

[0017] Furthermore, the camera element can automatically adjust the framing parameters according to different vapor-deposited film layers within the detection area to achieve spot monitoring of different film layers.

[0018] Furthermore, the measuring head is an ISM measuring head.

[0019] Furthermore, the reflective element, the focusing element, and the periscope assembly are all disposed inside the vacuum evaporation chamber.

[0020] Due to the adoption of the above technical solutions, this utility model has the following beneficial effects:

[0021] This invention places the imaging element outside the vacuum evaporation chamber, avoiding potential damage to electronic equipment caused by the vacuum environment and extending the equipment's lifespan. Simultaneously, by introducing reflective elements and a periscope assembly, the measurement spot reaches the imaging element after multiple reflections, eliminating the need for direct exposure to the vacuum environment. This cleverly solves the space limitation problem within the vacuum evaporation chamber, enabling flexible adjustment of the optical path and effective reception of the measurement spot. This design not only improves the system's structural compactness but also effectively prevents potential optical path interference during measurement, enhancing the system's stability and reliability.

[0022] To further improve the accuracy and adaptability of measurements, this invention incorporates a focusing element between the measuring head and the periscope assembly. This focusing element extends the focal length and reduces attenuation during optical transmission, ensuring that the camera element can clearly capture the measurement spot. More importantly, the length and mounting position of the focusing element can be dynamically adjusted to accommodate changes in focal length when the measuring head is in different positions. This design significantly enhances the system's flexibility and measurement accuracy.

[0023] To further enhance the system's intelligence, this invention also incorporates intelligent viewfinder parameter adjustment and optical path attenuation compensation devices. The camera element can automatically adjust viewfinder parameters based on different vapor-deposited film layers within the detection area to ensure accurate monitoring of light spots on different film layers. Simultaneously, the optical path attenuation compensation device further reduces light intensity attenuation during optical path transmission, thereby improving measurement accuracy and stability. Attached Figure Description

[0024] To more clearly illustrate the technical solutions of the embodiments of this utility model, the accompanying drawings of the embodiments will be briefly introduced below. Obviously, the drawings described below only involve some embodiments of this utility model, and are not intended to limit this utility model.

[0025] Figure 1 This is a structural diagram of existing technology.

[0026] Figure 2This is a schematic diagram of the structure of this utility model.

[0027] Figure 3 This is a three-dimensional structural diagram of the internal structure of this utility model.

[0028] Figure 4 This is a diagram of the optical path structure of this utility model.

[0029] Figure 5 This is a three-dimensional structural diagram of the present invention.

[0030] Figure label:

[0031] In the diagram, 100 is the vacuum evaporation chamber; 110 is the monitoring window.

[0032] 200. Measuring head;

[0033] 300. Spot monitoring device; 310. Imaging element; 320. Reflective element; 330. Periscope assembly; 331. Optical path receiver; 332. Optical path output unit; 340. Focusing element;

[0034] 400. Substrate; 410. Detection area;

[0035] 500. Measure the light spot. Detailed Implementation

[0036] To make the objectives, technical solutions, and advantages of the embodiments of this utility model clearer, the utility model will be further described in detail below with reference to the accompanying drawings. The components of the embodiments of this utility model described and shown in the accompanying drawings can be arranged and designed in various different configurations. All other embodiments obtained by those skilled in the art based on the embodiments of this utility model without inventive effort are within the scope of protection of this utility model.

[0037] It should be noted that similar labels and letters in the following figures indicate similar items. Therefore, once an item is defined in one figure, it does not need to be further defined and explained in subsequent figures.

[0038] Unless otherwise defined, the technical or scientific terms used in this patent document shall have the ordinary meaning understood by one of ordinary skill in the art to which this utility model pertains. The terms "first," "second," and similar terms used in this utility model patent specification and claims do not indicate any order, quantity, or importance, but are merely used to distinguish different components. Similarly, the terms "an," "a," or "the" do not indicate a quantity limitation, but rather indicate the presence of at least one. The terms "comprising" or "including" indicate that the element or object preceding "comprising" encompasses the element or object listed following "comprising" or its equivalents, and do not exclude other elements or objects. Terms such as "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer" are used only to indicate relative positional relationships. When the absolute position of the described object changes, the relative positional relationship may also change accordingly. They are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model.

[0039] In the description of this utility model, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0040] The following detailed description of some embodiments of the present invention is provided in conjunction with the accompanying drawings. Unless otherwise specified, the features in the following embodiments can be combined with each other.

[0041] Please see Figures 2-5This utility model discloses a novel film thickness measurement system applied under vacuum. The system includes a vacuum evaporation chamber 100, a measuring head 200, and a spot monitoring device 300. A monitoring window 110 is provided on the side wall of the vacuum evaporation chamber 100. The measuring head 200 is disposed inside the vacuum evaporation chamber 100 and is configured to emit a measuring spot 500. The spot monitoring device 300 is configured to monitor the thickness of the evaporated film layer based on the measuring spot 500. In this embodiment, the spot monitoring device 300 includes an image sensor 310 disposed on the monitoring window 110 and a resolution unit. The image sensor 310 is used to capture images of the measuring spot 500, and the resolution unit is used to estimate the film thickness of the measured object based on the images captured by the image sensor 310. The image sensor 310 is disposed outside the vacuum evaporation chamber 100, and the image sensor 310 is configured not to be in the same straight line as the moving direction of the measuring head 200. Furthermore, a reflective element 320 is disposed between the measuring head 200 and the imaging element 310. This reflective element 320 is used to adjust the incident angle of the measuring spot 500. In this embodiment, the reflective element 320 is used to adjust the incident angle of the measuring spot 500 so that the imaging element 310 can receive the measuring spot 500 from the measuring head 200. The introduction of the reflective element 320 allows the imaging element 310 to be disposed outside the vacuum evaporation chamber 100. A periscope assembly 330 is disposed between the reflective element 320 and the imaging element 310. The periscope assembly 330 is configured to reflect the measuring spot 500 through optical path reflection, so as to enable the imaging element 310 to receive the incident measuring light. In this embodiment, the reflection angle of the reflective element 320 is 45 degrees, the optical axis of the optical path output section 332 of the periscope assembly 330 is perpendicular to the optical axis of the imaging lens, and the angles between the optical axis of the optical path output section 332 of the periscope assembly 330, the optical axis of the imaging lens, and the beam-splitting surface of the reflective element 320 are all 45 degrees. The core of this system lies in the innovative spot monitoring device 300, which achieves precise monitoring of the thickness of the vapor-deposited film layer through non-linear optical path design, reflective element 320, periscope assembly 330, and intelligent framing and optical path attenuation compensation technologies.

[0042] In this embodiment, the monitoring window 110 is a transmission window, which is a quartz glass window.

[0043] It should be noted that in this invention, the light emitted by the measuring head 200 is an infrared laser. This infrared laser can directly or focused onto the infrared upconversion thick film material, thereby converting the infrared laser spot that the camera element 310 cannot detect into a spot that the camera element 310 can detect. By using the camera element 310 to collect the spot on the infrared upconversion thick film material and quantitatively analyzing the various parameters of the spot, it is possible to achieve quantitative measurement and evaluation of the infrared laser beam quality.

[0044] Furthermore, the light spot monitoring device 300 also includes a focusing element 340, which is used to extend the focal length and reduce attenuation during optical path transmission, so as to adapt to the focal length changes when the measuring head 200 is measuring at different positions through dynamic adjustment of its length and installation position. Further, the focusing element 340 is disposed between the measuring head 200 and the periscope assembly 330.

[0045] In this embodiment, the film thickness measurement system also includes a substrate 400 for placing the vapor-deposited film layers. In this embodiment, the substrate 400 is a glass substrate. To further improve the measurement accuracy and efficiency of the system, multiple detection areas 410 are also provided on the substrate 400. Each detection area 410 corresponds to one film layer. The imaging element 310 can simultaneously monitor the thickness of multiple vapor-deposited film layers by capturing the relative position of the light spot and the detection area 410 in real time. This multi-area real-time monitoring design greatly improves production efficiency and quality control capabilities. During production, the detection areas 410 are designed to be relatively small to improve the utilization rate of the substrate 400. In this embodiment, the substrate 400 is a movable XY platform.

[0046] To further enhance the system's intelligence, this invention can also be equipped with intelligent viewfinder parameter adjustment and optical path attenuation compensation devices. The camera element 310 can automatically adjust its viewfinder parameters according to different vapor-deposited film layers within the detection area 410 to ensure accurate monitoring of the light spots on different film layers. Simultaneously, the optical path attenuation compensation device can further reduce light intensity attenuation during optical path transmission, thereby improving the accuracy and stability of the measurement.

[0047] Furthermore, the reflective element 320, the focusing element 340, and the periscope assembly 330 are all disposed within the vacuum evaporation chamber 100.

[0048] This invention combines ISM technology with a light-emitting measuring head to form a complete, high-precision film thickness measurement system. The ISM measuring head 200, as one of the core components of the system, is responsible for emitting a measurement spot 500 and receiving the reflected light signal. Through coordinated operation with the spot monitoring device 300, the ISM measuring head 200 can accurately measure and monitor the thickness of the vapor-deposited film layer. Furthermore, ISM technology allows the measuring head 200 to store all important information, such as calibration data and measurement history. This information can be automatically transmitted to the measurement system, ensuring the accuracy and traceability of the measurement results.

[0049] This embodiment employs a film thickness measurement system for use in a vacuum environment. The system includes a vacuum evaporation chamber 100, an ISM measuring head 200, and a spot monitoring device 300. The ISM measuring head 200, which emits a measurement spot 500, is located inside the vacuum evaporation chamber 100. The spot monitoring device 300, located outside the vacuum evaporation chamber 100, includes an imaging element 310, a resolution unit, a reflective element 320, a periscope assembly 330, and a focusing element 340.

[0050] In practice, the following steps are included:

[0051] 1) The measuring head 200 emits an infrared laser beam, which illuminates the detection area 410 and forms a light spot;

[0052] 2) The light spot reflected on the detection area 410 passes through the reflective element 320 set at 45 degrees in sequence, causing the light path to be folded back and reach the light path receiving unit 331 of the periscope assembly 330. The light path receiving unit 331 reflects the light path upward and passes through the light path output unit and the imaging lens in sequence, and images onto the photosensitive sensor surface of the imaging element 310 to obtain a digital image. The parameters of the obtained image are quantitatively analyzed to realize the quantitative measurement and evaluation of the quality of the infrared laser beam.

[0053] It should be noted that in actual use, the periscope can be added or removed depending on the position of the vacuum chamber window or the obstruction, which will not be elaborated on here.

[0054] The above description is merely a specific embodiment of this utility model, but the protection scope of this utility model is not limited thereto. Any variations or substitutions that can be easily conceived by those skilled in the art within the technical scope disclosed in this utility model should be included within the protection scope of this utility model. Therefore, the protection scope of this utility model should be determined by the scope of the claims.

Claims

1. A film thickness measurement system for use in a vacuum, comprising a vacuum evaporation chamber, a measuring head, and a spot monitoring device, wherein a monitoring window is provided on the side wall of the vacuum evaporation chamber, the measuring head is disposed inside the vacuum evaporation chamber and configured to emit a measuring spot, and the spot monitoring device is configured to monitor the thickness of the evaporated film layer based on the measuring spot, characterized in that, The light spot monitoring device includes: A camera element configured on a monitoring window, the camera element being used to capture images of the measured light spot, and The analysis unit is used to estimate the film thickness of the object being measured based on the image captured by the camera element; The camera element is disposed outside the vacuum evaporation chamber, and the camera element is configured not to be in the same straight line as the direction of movement of the measuring head; A reflective element is disposed between the measuring head and the camera element. The reflective element is used to adjust the incident angle of the measuring light spot. A periscope assembly is disposed between the reflective element and the camera element. The periscope assembly is configured to reflect the measuring light spot through optical path reflection, so as to enable the camera element to receive the incident measuring light.

2. The film thickness measurement system according to claim 1, characterized in that, The light spot monitoring device also includes a focusing element, which is used to extend the focal length and reduce the attenuation during the optical path transmission process, so as to adapt to the focal length change when the measuring head measures at different positions.

3. The film thickness measurement system according to claim 2, characterized in that, The focusing element is disposed between the measuring head and the periscope assembly.

4. The film thickness measurement system according to claim 3, characterized in that, The length and installation position of the focusing element can be dynamically adjusted.

5. The film thickness measurement system according to claim 1, characterized in that, The film thickness measurement system also includes a substrate for placing the vapor-deposited film layer, the substrate having multiple detection areas.

6. The film thickness measurement system according to claim 5, characterized in that, Each detection region corresponds to one membrane layer.

7. The film thickness measurement system according to claim 6, characterized in that, The camera element is configured to monitor the thickness of the vapor-deposited film layer by capturing the relative position of the light spot and the detection area in real time.

8. The film thickness measurement system according to claim 7, characterized in that, The camera element can automatically adjust the framing parameters according to different vapor-deposited film layers in the detection area to achieve spot monitoring of different film layers.

9. The film thickness measurement system according to claim 1, characterized in that, The measuring head is an ISM measuring head.

10. The film thickness measurement system according to claim 1, characterized in that, The reflective element, the focusing element, and the periscope assembly are all disposed inside the vacuum evaporation chamber.

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