Discharge system of reaction device and reaction system

By installing a bypass pipe and control components on the discharge pipe, the medium and high pressure gases of the reaction device are gradually released, which solves the problems of unstable flow and wear in the discharge system of HPAL and POX reactors, and achieves a more stable unloading process and reduced maintenance costs.

CN223945599UActive Publication Date: 2026-02-27MORIMATSU (JIANGSU) HEAVY IND CO LTD
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Patent Information

Application Number
CN202520536295.8
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2025-03-25
Publication Date
2026-02-27
Estimated Expiration
2035-03-25

AI Technical Summary

Technical Problem

In HPAL and POX reactor discharge systems, direct discharge into the discharge pipeline can easily lead to unstable flow, severe vibration, and increased wear on components such as the high-pressure reactor discharge valve. Furthermore, eliminating the high-pressure water pipeline results in high maintenance costs.

Method used

A bypass pipe is installed on the discharge pipe, and a control component is installed on the bypass pipe. The medium and high pressure gas of the reaction device is gradually released through the bypass pipe until the pressure on both sides of the discharge pipe is balanced. Then the discharge valve is opened to unload and depressurize, reducing violent vibration and wear.

Benefits of technology

By gradually balancing the pressure on both sides of the discharge pipe, severe vibration and wear are reduced, equipment investment and maintenance costs are lowered, and the service life and production efficiency of the discharge system are improved.

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Abstract

The embodiment of the utility model provides a discharge system of a reaction device and a reaction system, and relates to the technical field of discharge systems. The discharge system of the reaction device and the reaction system comprise a discharge pipe, the discharge pipe is communicated with the reaction device, and a discharge valve is arranged on the discharge pipe and used for opening and closing the discharge pipe; the bypass pipe is provided with a first end and a second end, the first end and the second end are communicated with the discharge pipe, and the discharge valve is located between the first end and the second end; and the control assembly is arranged on the bypass pipe and used for obtaining part of pressure gas in the reaction device from the first end and gradually releasing the pressure gas into the discharge pipe through the second end so as to balance the pressure of the discharge pipe on the two sides of the discharge valve. According to the discharge system, severe vibration of the discharge pipe caused by the fact that the pressure difference between the two sides of the discharge valve is too large and flow changes when materials are directly discharged to the discharge pipe is reduced, and the service life of the discharge system is prolonged.
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Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of exhaust systems, in particular to an exhaust system of a reaction device and a reaction system. BACKGROUND

[0002] Currently, in the exhaust system of HPAL (high pressure acid leaching) and POX (pressure oxidation) reaction kettles, a high-pressure water pipe connected to the high-pressure reaction kettle exhaust pipeline is usually used to pressurize the high-pressure reaction kettle before opening the high-pressure reaction kettle exhaust valve to ensure the normal operation of the pipeline. However, this method has certain limitations, requires additional equipment support, and has high maintenance costs.

[0003] In order to reduce costs, some HPAL devices cancel the high-pressure water pipeline and its additional pressurization equipment, and directly connect to the high-pressure reaction kettle through the exhaust pipeline, and the high-pressure reaction kettle releases pressure into the exhaust pipeline.

[0004] However, directly discharging towards the exhaust pipeline can easily cause unstable flow, severe vibration, and increased wear of components such as high-pressure kettle exhaust valves. CONTENT OF THE INVENTION

[0005] The present application provides an exhaust system of a reaction device and a reaction system to solve the problem of unstable flow, severe vibration, and increased wear of components such as high-pressure kettle exhaust valves caused by directly discharging towards the exhaust pipeline.

[0006] In one aspect, the present application provides an exhaust system of a reaction device and a reaction system, comprising:

[0007] An exhaust pipe is in communication with the reaction device, and an exhaust valve is provided on the exhaust pipe to open and close the exhaust pipe;

[0008] A bypass pipe has a first end and a second end, the first end and the second end are in communication with the exhaust pipe, and the exhaust valve is located between the first end and the second end;

[0009] A control assembly is provided on the bypass pipe, and the control assembly is used to obtain part of the pressure gas in the reaction device through the first end and gradually release it into the exhaust pipe through the second end to balance the pressure of the exhaust pipe on both sides of the exhaust valve.

[0010] In one possible implementation, the control assembly includes a control member provided on the bypass pipe and used to gradually open and close the bypass pipe.

[0011] In one possible implementation, the control assembly further includes a first opening and closing valve provided between the control member and the first end to open and close the bypass pipe.

[0012] In a possible implementation, the control assembly further comprises a second on-off valve, which is arranged between the control member and the second end to open and close the bypass pipe.

[0013] In a possible implementation, the control assembly further comprises a controller, which is communicatively connected with the first on-off valve, the second on-off valve and the control member respectively to control opening and closing of the first on-off valve, the second on-off valve and the control member respectively.

[0014] In a possible implementation, the bypass pipe is a titanium alloy pipe.

[0015] In a possible implementation, a one-way valve is arranged on the discharge pipe, which is located between the discharge pipe and the reaction device, and is used for one-way discharge of materials in the reaction device into the discharge pipe.

[0016] In a possible implementation, a release pipe is arranged on the discharge pipe, which is located on a side of the discharge valve away from the reaction device, and a safety valve is arranged on the release pipe.

[0017] In a possible implementation, a third on-off valve is arranged on a side of the discharge pipe away from the reaction device, which is located on a side of the second end away from the reaction device, and is used for opening and closing the discharge pipe.

[0018] In another aspect, the application provides a reaction device, which comprises a reaction device and a discharge system of the reaction device as described above connected with the reaction device.

[0019] The discharge system of the reaction device and the reaction system provided by the embodiments of the application can gradually release the high-pressure gas in the reaction device through the bypass pipe and the control assembly to gradually increase the pressure in the discharge pipe, until the pressure on both sides of the discharge valve is balanced, and then the discharge valve is opened to perform the unloading and pressure relief operation of the reaction device, thereby reducing the violent vibration of the discharge pipe caused by the large pressure difference on both sides of the discharge valve and the change in flow when the reaction device is directly unloaded into the discharge pipe, and improving the service life of the discharge system. BRIEF DESCRIPTION OF DRAWINGS

[0020] The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments consistent with the application and serve to explain the principles of the application.

[0021] Figure 1The structure diagram of the discharge system of the reaction device and the reaction system provided in the present application is shown.

[0022] Explanation of reference numerals:

[0023] 100, reaction device;

[0024] 200, discharge pipe; 210, discharge valve; 220, one-way valve; 230, release pipe; 240, safety valve; 250, third on-off valve;

[0025] 300, bypass pipe; 310, first end; 320, second end;

[0026] 400, control assembly; 410, control member; 420, first on-off valve; 430, second on-off valve.

[0027] The specific embodiments of the present application have been shown in the above-described drawings, and will be described in more detail hereinafter. These drawings and the written description are not intended to restrict the scope of the present application by any means, but to illustrate the concept of the present application to those skilled in the art by referring to specific embodiments. DETAILED DESCRIPTION

[0028] The exemplary embodiments will be described in detail herein with reference to the accompanying drawings. In the following description, unless otherwise indicated, the same numbers in different drawings represent the same or similar elements. The embodiments described in the following exemplary embodiments are not representative of all embodiments consistent with the present application. Rather, they are merely examples of devices and methods consistent with some aspects of the present application as detailed in the appended claims.

[0029] It should be noted that the terms "first", "second" are used only for the purpose of description, and should not be understood as indicating or implying relative importance or implicitly indicating the number of the technical features indicated. Therefore, the features defined with "first", "second" can explicitly or implicitly include at least one of the features. In the description of the present application, the meaning of "a plurality of" is at least two, for example, two, three, etc., unless otherwise specifically limited.

[0030] In the present application, unless otherwise specifically defined and limited, the terms "mounting", "connection", "fixing" and the like should be understood broadly, for example, can be fixed connection, or detachable connection, or integral; can be mechanical connection, or electrical connection or communication with each other; can be directly connected, or indirectly connected through an intermediate medium, can be the internal communication of two elements or the interaction relationship between two elements, unless otherwise specifically limited. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0031] In the present application, unless specifically defined and limited otherwise, a first feature "on" or "under" a second feature can be directly in contact with the second feature, or indirectly in contact with the second feature through an intermediate medium. Moreover, the first feature "over", "above" and "on top of" the second feature can be directly above or obliquely above the second feature, or simply indicate that the first feature is higher in horizontal height than the second feature. The first feature "under", "below" and "underneath" the second feature can be directly below or obliquely below the second feature, or simply indicate that the first feature is lower in horizontal height than the second feature.

[0032] Currently, in the HPAL (high pressure acid leaching) and POX (pressure oxidation) reactor discharge system, a high pressure water pipe connected to the high pressure reactor discharge pipeline is usually relied on to pressurize the high pressure reactor discharge valve before it is opened to ensure the normal operation of the pipeline. However, this method has certain limitations, requires additional equipment support, and has high maintenance costs.

[0033] In order to reduce costs, some HPAL devices cancel the high pressure water pipeline and its additional pressurization equipment, and are directly connected to the high pressure reactor through the discharge pipeline, and the high pressure reactor releases pressure into the discharge pipeline.

[0034] However, directly discharging into the discharge pipeline can easily cause unstable flow, severe vibration, and increased wear of components such as the high pressure reactor discharge valve.

[0035] The present application provides a reaction device discharge system and a reaction system. The discharge system is provided with a bypass pipe on the discharge pipe, the two ends of the bypass pipe are connected to the two sides of the discharge valve respectively, and a control assembly is arranged on the bypass pipe to obtain part of the medium-high pressure gas of the reaction device through the control assembly, gradually release the medium-high pressure gas into the discharge pipe through the bypass pipe, gradually increase the pressure in the discharge pipe, and balance the pressure on both sides of the discharge valve, then open the discharge valve to perform the discharge and pressure relief operation of the reaction device, thereby reducing the severe vibration of the discharge pipe caused by the large pressure difference on both sides of the discharge valve when directly discharging into the discharge pipe, and improving the service life of the discharge system. At the same time, the high pressure water pipe and its pressurization equipment do not need to be additionally increased, thereby reducing the equipment investment.

[0036] The technical solutions of the present application and how the technical solutions of the present application solve the above technical problems will be described in detail below with specific embodiments. The following specific embodiments can be combined with each other, and the same or similar concepts or processes can not be described again in some embodiments. The embodiments of the present application will be described below with reference to the accompanying drawings.

[0037] The present application provides a reaction device discharge system and a reaction system, which are described with reference to Figure 1 The reaction device discharge system and the reaction system include:

[0038] A discharge pipe 200 is used to communicate with the reaction device 100, and a discharge valve 210 is arranged on the discharge pipe 200 to open and close the discharge pipe 200.

[0039] A bypass pipe 300 has a first end 310 and a second end 320, which respectively communicate with the discharge pipe 200, and the discharge valve 210 is located between the first end 310 and the second end 320.

[0040] A control assembly 400 is arranged on the bypass pipe 300, which is used to obtain part of the pressure gas in the reaction device 100 from the first end 310, and gradually release it into the discharge pipe 200 through the second end 320 to balance the pressure of the discharge pipe 200 on both sides of the discharge valve 210.

[0041] The discharge pipe 200 is connected to the discharge port of the reaction device 100, and an inner extension pipe is arranged in the discharge port of the reaction device 100 and extends into the reaction device 100, and the discharge pipe 200 is connected with the inner extension pipe to discharge the material in the reaction device 100. The reaction device 100 is a high-pressure reaction device 100, and the discharge valve 210 is installed on the discharge pipe 200, which is a ball valve. In order to improve the resistance of the discharge valve 210 to the high pressure impact in the reaction device 100, the discharge valve 210 is a titanium alloy ball valve. The ball valve only has two states of opening and closing, and is not suitable for flow adjustment control, so after the discharge valve 210 is opened, the high-pressure material in the reaction device 100 will be directly released into the discharge pipe 200, which causes rapid change of the flow in the discharge pipe 200 and causes severe vibration and increased wear of the discharge valve 210 and other components.

[0042] By connecting the bypass pipe 300 at both ends of the discharge valve 210, when the material needs to be discharged, part of the medium-high pressure gas in the reaction device 100 is obtained in advance through the control assembly 400, and is gradually released into the discharge pipe 200 through the bypass pipe to gradually increase the pressure in the discharge pipe 200 until the pressure on both sides of the discharge valve 210 is balanced, and then the discharge valve 210 is opened for the unloading and pressure relief of the reaction device 100, which reduces the severe vibration of the discharge pipe 200 caused by the large pressure difference on both sides of the discharge valve 210 when the material is directly discharged into the discharge pipe 200, and improves the service life of the discharge system. At the same time, it does not need to additionally increase the high-pressure water pipe and its pressurizing equipment, and reduces the equipment investment.

[0043] In a possible implementation, the control assembly 400 includes a control member 410 arranged on the bypass pipe 300 and used to gradually open and close the bypass pipe 300.

[0044] Specifically, the control member 410 is a control valve, which is installed on the bypass pipe 300, and when the reaction device 100 needs to be unloaded, the control valve is gradually opened first to release part of the material in the reaction device 100 into the discharge pipe 200, and through the gradual release of the control valve, the vibration caused by excessive flow fluctuation is reduced, and the control valve is closed after the pressure balance on both sides of the discharge valve 210, thereby playing a role in protecting the discharge valve 210 and the discharge pipe 200.

[0045] In a possible implementation, the control assembly 400 further comprises a first on-off valve 420, which is arranged on the bypass pipe 300 between the control member 410 and the first end 310 to open and close the bypass pipe 300.

[0046] The first on-off valve 420 is installed on the bypass pipe 300 and located on the side of the control valve close to the reaction device 100, so as to facilitate the opening and closing control of the bypass pipe 300.

[0047] Through the arrangement of the first on-off valve 420, when the reaction device 100 needs to be unloaded, the first on-off valve 420 is opened first to charge the bypass pipe 300 between the first on-off valve 420 and the control valve, and since the distance between the first on-off valve 420 and the control valve is short, directly charging this section of the bypass pipe 300 will not cause vibration of the bypass pipe 300, and when the pressure on both sides of the first on-off valve 420 is balanced, the first on-off valve 420 is closed, and then the control valve is opened to gradually release the pressure between the first on-off valve 420 and the control valve into the discharge pipe 200, so as to increase the pressure in the discharge pipe 200; then the control valve is closed, the first on-off valve 420 is opened, and the pressure in the bypass pipe 300 is continuously filled, and through repeated operations, the pressure balance in the discharge pipe 200 on both sides of the discharge valve 210 is finally realized.

[0048] The rapid pressure change that usually occurs when the discharge valve 210 is opened is avoided, the vibration is minimized, and the excessive wear of the equipment is reduced.

[0049] The controlled unloading reduces the risk of system instability and mechanical failure caused by unstable flow conditions, and reduces the need for high-pressure water pipes and additional equipment, thereby reducing the initial setup cost and continuous maintenance cost.

[0050] Through the phased pressurization, the startup process after the hot standby shutdown is faster and smoother, thereby reducing the downtime and improving the overall efficiency of the plant. The hot standby refers to a state in which the equipment or system is ready to be put into operation at any time, and has the ability to start up quickly and take over the work.

[0051] With smoother flow transitions and fewer mechanical interruptions to facilitate more consistent and reliable processing conditions, resulting in improved efficiency of downstream hydrometallurgical processes. And versatile, adaptable to a range of autoclave discharge pipe configurations in HPAL (high pressure acid leaching) and POX (pressure oxidation) applications, making it suitable for a variety of plant sizes and operational requirements.

[0052] In one possible implementation, the control assembly 400 further comprises a second on-off valve 430, which is arranged on the bypass pipe 300 between the control member 410 and the second end 320 to open and close the bypass pipe 300.

[0053] The second on-off valve 430 is arranged on the side of the control valve away from the first on-off valve 420, and when the formal discharge process is carried out in the discharge pipe 200, the first on-off valve 420 and the first on-off valve 420 are closed at the same time to prevent material from entering the bypass pipe 300.

[0054] In one possible implementation, the control assembly 400 further comprises a controller, which is in communication connection with the first on-off valve 420, the second on-off valve 430 and the control member 410 respectively, to control the opening and closing of the first on-off valve 420, the second on-off valve 430 and the control member 410 respectively.

[0055] For example, the first on-off valve 420, the second on-off valve 430 and the control valve are all electrically controlled valves, and through the communication connection with the controller, remote control of the first on-off valve 420, the second on-off valve 430 and the control valve can be realized, reducing the process of manual operation and improving production efficiency.

[0056] In one possible implementation, the length of the bypass pipe 300 is greater than or equal to 0.5m and less than or equal to 2m.

[0057] Among them, the length of the bypass pipe 300 is short to reduce the vibration caused by the change of flow in the bypass pipe 300.

[0058] In one possible implementation, the bypass pipe 300 is a titanium alloy pipe.

[0059] The bypass pipe 300 adopts a titanium alloy pipe, which improves the strength of the bypass pipe 300 to adapt to the changes of pressure and flow in the bypass pipe 300.

[0060] In one possible implementation, the discharge pipe 200 is provided with a one-way valve 220, which is located between the discharge pipe 200 and the reaction device 100, and the one-way valve 220 is used for one-way discharge of the material in the reaction device 100 into the discharge pipe 200.

[0061] The one-way valve 220 is installed at the feeding end of the discharge pipe 200 and only allows the material to be discharged in one direction, thereby avoiding the backflow of the material in the discharge pipe 200.

[0062] In a possible implementation, the discharge pipe 200 is provided with a release pipe 230, the release pipe 230 is located at the side of the discharge valve 210 away from the reaction device 100, and the release pipe 230 is provided with a safety valve 240.

[0063] The release pipe 230 is arranged on the discharge pipe 200, and the safety valve 240 is installed on the release pipe 230, so as to improve the safety of the discharge pipe 200 and avoid the danger caused by overpressure of the discharge pipe 200.

[0064] In a possible implementation, the discharge pipe 200 is provided with a third on-off valve 250 at the side away from the reaction device 100, the third on-off valve 250 is located at the side of the second end 320 away from the reaction device 100, and the third on-off valve 250 is used to open and close the discharge pipe 200.

[0065] The third on-off valve 250 is installed at the end of the discharge pipe 200 away from the reaction device 100, and when the pressure of the discharge pipe 200 is balanced, the third on-off valve 250 is closed, so as to maintain the pressure in the discharge pipe 200 and balance the pressure on both sides of the discharge valve 210.

[0066] The application provides a reaction device, which comprises a reaction device 100 and a discharge system of the reaction device connected with the reaction device 100.

[0067] The reaction device 100 is a reaction kettle, the discharge system of the reaction device in the embodiment has the same structure as the discharge system of the reaction device provided in any one of the above embodiments and can bring the same or similar technical effects, and details are not described herein again. Please refer to the description of the above embodiments.

[0068] The reaction device provided in the embodiment comprises a discharge pipe 200, a discharge valve 210, a bypass pipe 300 and a control assembly 400. The bypass pipe 300 is connected with both sides of the discharge valve 210, and the control assembly 400 is arranged on the bypass pipe 300. The control assembly 400 is used to obtain part of the high-pressure gas of the reaction device 100 and release the high-pressure gas into the discharge pipe 200 through the bypass pipe 300, so as to gradually increase the pressure in the discharge pipe 200 until the pressure on both sides of the discharge valve 210 is balanced, and then the discharge valve 210 is opened to perform the unloading and pressure relief operation of the reaction device 100. The application reduces the violent vibration of the discharge pipe 200 caused by the large pressure difference on both sides of the discharge valve 210 when the material is directly unloaded into the discharge pipe 200, and improves the service life of the discharge system.

[0069] It should be understood that many of the materials and devices exemplified in this disclosure are articles of manufacture (i.e., articles of manufacture) according to this disclosure. The articles of manufacture can be manufactured as such or can be manufactured by combining the materials and devices exemplified in this disclosure. It is also to be understood that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting. It should be understood that, in some embodiments, equivalents to the specific electrode structures and / or methods described herein can be employed without departing from the scope of the application. Accordingly, the phraseology and terminology used herein is for the purpose of description and should not be regarded as limiting. The use of "including," "comprising," "having," "containing," "involving," "characterized by," "characterized into," and variations thereof herein, is meant to encompass the items listed thereafter, and equivalents thereof as well as additional items. Although the foregoing application has been described in some detail by way of illustration and example, it is not to be limited thereby, but rather, only by the scope of the appended claims.

Claims

1. An exhaust system for a reaction device, characterized by, The application relates to a reaction device (100) and a bypass pipe (300) for the reaction device (100). The bypass pipe (300) has a first end (310) and a second end (320), and the first end (310) and the second end (320) are respectively communicated with the discharge pipe (200), and the discharge valve (210) is located between the first end (310) and the second end (320). The control assembly (400) is arranged on the bypass pipe (300) and is used for gradually releasing part of pressure gas in the reaction device (100) from the first end (310) to the discharge pipe (200) through the second end (320) to balance the pressure of the discharge pipe (200) on both sides of the discharge valve (210). The control assembly (400) comprises a control member (410) arranged on the bypass pipe (300) and used for gradually opening and closing the bypass pipe (300).

2. The vent system of a reaction apparatus according to claim 1, wherein The control assembly (400) further comprises a first opening and closing valve (420) arranged between the control member (410) and the first end (310) to open and close the bypass pipe (300).

3. The emission system of the reaction apparatus according to claim 2, characterized in that, The control assembly (400) further comprises a second opening and closing valve (430) arranged between the control member (410) and the second end (320) to open and close the bypass pipe (300).

4. The vent system of a reaction apparatus according to claim 3, wherein The control assembly (400) further comprises a controller in communication connection with the first opening and closing valve (420), the second opening and closing valve (430) and the control member (410) respectively to control the opening and closing of the first opening and closing valve (420), the second opening and closing valve (430) and the control member (410) respectively.

5. The vent system of a reaction apparatus according to claim 4, wherein The bypass pipe (300) is a titanium alloy pipe.

6. The vent system of a reaction apparatus according to any one of claims 1 to 5, wherein The discharge pipe (200) is provided with a one-way valve (220) located between the discharge pipe (200) and the reaction device (100), and the one-way valve (220) is used for unidirectionally discharging materials in the reaction device (100) into the discharge pipe (200).

7. The vent system of a reaction apparatus according to any one of claims 1 to 5, wherein The discharge pipe (200) is provided with a release pipe (230) located on the side, away from the reaction device (100), of the discharge valve (210), and the release pipe (230) is provided with a safety valve (240).

8. The vent system of a reaction apparatus according to any one of claims 1 to 5, wherein The discharge pipe (200) is provided with a third opening and closing valve (250) located on the side, away from the reaction device (100), of the second end (320), and the third opening and closing valve (250) is used for opening and closing the discharge pipe (200).

9. The vent system of a reaction apparatus according to any one of claims 1 to 5, wherein ​ 10. A reaction system characterized by, A reaction apparatus (100) and a discharge system as claimed in any one of claims 1 to 9 connected to the reaction apparatus (100).