Illumination device of VUV parallel light source photoetching machine equipment

Abstract

The utility model provides an illumination device of VUV parallel light source photoetching machine equipment, which is characterized in that the top end of a base is provided with a moving mechanism, the top end of the moving mechanism is connected with a bearing seat, the top end of the bearing seat is connected with a bearing table, the center of the top of the bearing table is connected with an adsorption platform, and one side of the top end of the base is connected with a mounting seat; the top end of the mounting seat is connected with an illumination device, the illumination device comprises an upper box body and a lower box body, a power supply assembly is arranged in the upper box body, a lamp source assembly is arranged in the lower box body, an illumination window is formed in the center of the bottom of the lower box body, the lamp source assembly comprises a lamp tube, a reflecting cover and a lamp tube support, and the bottom end of the lamp tube support is connected with a lower plate of the lower box body; the two ends of the lamp tube are connected with the upper portions of the corresponding lamp tube supports, the reflecting cover is arranged above the lamp tube, the two ends of the reflecting cover are connected with the lamp tube supports, the illumination device is arranged, operation is easy, meanwhile, the exposure effect is good, the yield of products is increased, and meanwhile the manufacturing cost is greatly reduced.

Description

TECHNICAL FIELD

[0001] The utility model belongs to the technical field of photoetching machine, more specifically, it relates to a kind of light illumination device of VUV parallel light source photoetching machine equipment. BACKGROUND

[0002] In the semiconductor industry, the general photoetching process needs to go through the processes of silicon wafer surface cleaning and drying, coating, photoresist, soft baking, alignment exposure, post-baking, development, hard baking and etching. Among them, the photoetching process is a process of transferring the pattern on the mask to the photoresist (i.e., temporarily "copying" the device or circuit structure onto the silicon wafer) after uniformly coating the photoresist on the silicon wafer surface. In semiconductor equipment, the track machine is a process equipment that integrates different process machines. Its main function is to coat and develop the photoresist on the wafer surface. The photoetching machine is mainly responsible for the exposure of the photoresist.

[0003] In the prior art book, the light illumination mechanism or exposure device of the exposure machine has too high manufacturing cost and is too complex, resulting in poor exposure effect, greatly reduced product yield, and damage to the lamp due to high temperature after long-term use of the light source, etc. CONTENT OF THE UTILITY MODEL

[0004] Therefore, in order to solve the above technical problems, the utility model provides a kind of light illumination device of VUV parallel light source photoetch machine equipment, including base 10, the base 10 top is equipped with moving mechanism 20, the moving mechanism 20 with the base 10 sliding connection, the moving mechanism 20 top connection is equipped with bearing seat 30, the top of bearing seat 30 is equipped with bearing table 40, the top center of bearing table 40 is equipped with adsorption platform 50, the adsorption platform 50 is used to place the circuit board coated with photoresist, the base 10 top side connection is equipped with mounting seat 60, the top of mounting seat 60 is equipped with light illumination device 70, the light illumination device 70 includes upper box body 701 and lower box body 702, the upper box body 701 is equipped with power component in, the lower box body 702 is equipped with lamp source component 80 in, the bottom center of lower box body 702 is equipped with irradiation window 90, and the lamp source component 80 is placed in the just above of irradiation window 90, the lamp source component 80 includes lamp tube 801, reflector 802 and lamp tube support 803, the bottom of lamp tube support 803 with the lower plate of lower box body 702 is connected, the both ends of lamp tube 801 with its corresponding lamp tube support 803 upper portion is connected, reflector 802 is placed in the above of lamp tube 801, and the both ends of reflector 802 with lamp tube support 803 is connected, reflector 802 user control and guide light direction, so that light is gathered, when exposure, the circuit board coated with photoresist is placed on adsorption platform 50, by moving mechanism 20 is sent to the just below of irradiation window 90, then exposure is carried out by the light of lamp tube 801, after exposure, the moving mechanism 20 drives circuit board reset, detects the effect of circuit board after exposure, by being equipped with light illumination device, without operation simple, and exposure effect is good simultaneously, improve the yield of product, and manufacturing is also greatly reduced.

[0005] The application discloses a light irradiation device of a VUV parallel light source photoetching machine equipment, which comprises a base 10, a moving mechanism 20 arranged at the top of the base 10 and in sliding connection with the base 10, a bearing seat 30 connected to the top of the moving mechanism 20, a bearing table 40 connected to the top of the bearing seat 30, an adsorption platform 50 connected to the top center of the bearing table 40 and used for placing a circuit board coated with photoresist, a mounting seat 60 connected to one side of the top of the base 10, a light irradiation device 70 connected to the top of the mounting seat 60, wherein the light irradiation device 70 comprises an upper box body 701 and a lower box body 702, the upper box body 701 is internally provided with a power supply assembly, the lower box body 702 is internally provided with a lamp source assembly 80, the bottom center of the lower box body 702 is provided with an irradiation window 90, the lamp source assembly 80 is arranged directly above the irradiation window 90, the lamp source assembly 80 comprises lamp tubes 801, a reflector 802 and lamp tube supports 803, the bottom end of the lamp tube support 803 is connected with the lower plate of the lower box body 702, the two ends of the lamp tube 801 are connected with the upper parts of the corresponding lamp tube supports 803, the reflector 802 is arranged above the lamp tube 801 and connected with the lamp tube supports 803, and the reflector 802 is used for controlling and guiding the direction of light so that the light is gathered.

[0006] Further, the model of the lamp tube 801 is LED172nm ultraviolet lamp tube.

[0007] Further, the lamp tube 801 is provided in plurality and arranged in parallel at uniform intervals, and the reflector 802 is arranged above each lamp tube 801.

[0008] Further, the lower box body 702 is provided with a water inlet and a water outlet at any side, the lower box body 702 is internally provided with a water pipe, the body of the lamp tube 801 is provided with a channel for accommodating the water pipe, one end of the water pipe is connected with the water inlet, and the other end passes through the channel on the body of the lamp tube 801 and is then connected with the water outlet.

[0009] Further, the lower box body 702 is further provided with a nitrogen gas interface at any side, nitrogen gas is injected into the lower box body 702 through the nitrogen gas interface, and the air in the lower box body 702 is exhausted.

[0010] Further, the lower box body 702 is further provided with a nitrogen gas flow meter at the same side as the nitrogen gas interface, the nitrogen gas flow meter is in communication with the nitrogen gas interface through an air pipe, the nitrogen gas flow meter is used for controlling the flow rate of the nitrogen gas injected into the lower box body 702, and the flow rate of the nitrogen gas flow meter is 38-42LPM.

[0011] Further, the size of the irradiation window 90 is 150mm*150mm.

[0012] Further, the moving mechanism 20 comprises a moving plate 201, a handle 202 and a sliding block, the bottom ends of the moving plate 201 are connected with the sliding blocks, the top end of the base 10 is provided with sliding rails 100 matched with the sliding blocks, the moving mechanism 20 is slidingly connected with the base 10, the side of the moving plate 201 away from the mounting seat 60 is connected with an outwardly extending connecting block 110, the connecting block 110 is provided with a clamping groove 120, the bottom end of the handle 202 is connected with a clamping column, and the clamping column is matched with the clamping groove 120.

[0013] Further, the front plate of the base 10 is provided with a control panel 130, the control panel 130 is provided with a timer display window 140, a lamp switch 150 and a water cooling switch 160, the timer display window 140 is used for controlling the nitrogen injection time, the lamp switch 150 is used for controlling the opening and closing of the lamp 801, and the water cooling switch 160 is used for controlling the circulation of the water flow.

[0014] Further, the bottom of the base 10 is provided with an operation platform 170, the base 10 is arranged on the upper surface of the operation platform 170, the lower surface of the operation platform 170 is provided with supporting columns 180 at the corners, the bottom end of each supporting column 180 is connected with a universal wheel 190, and the universal wheel 190 is convenient for moving.

[0015] The utility model discloses a beneficial effect: the utility model provides a kind of light illumination device of VUV parallel light source photoetching machine equipment, including pedestal 10, the top of pedestal 10 is equipped with moving mechanism 20, the moving mechanism 20 with the pedestal 10 slidingly connected, the top of moving mechanism 20 is connected and is equipped with bearing seat 30, the top of bearing seat 30 is connected and is equipped with bearing table 40, the top center of bearing table 40 is connected and is equipped with adsorption platform 50, the adsorption platform 50 is used to place circuit board coated with photoresist, the top one side of pedestal 10 is connected and is equipped with mounting seat 60, the top of mounting seat 60 is connected and is equipped with light illumination device 70, the light illumination device 70 includes upper box 701 and lower box 702, the upper box 701 is equipped with power component in, the lower box 702 is equipped with lamp source component 80 in, the bottom center of lower box 702 is equipped with irradiation window 90, and the lamp source component 80 is placed just above the irradiation window 90, the lamp source component 80 includes lamp tube 801, reflector 802 and lamp tube support 803, the bottom of lamp tube support 803 with the lower plate of lower box 702 is connected, the both ends of lamp tube 801 with its corresponding lamp tube support 803 upper portion is connected, reflector 802 is placed above lamp tube 801, and the both ends of reflector 802 with lamp tube support 803 are connected, reflector 802 user control and guide light direction, so that light is gathered, when exposing, circuit board coated with photoresist is placed on adsorption platform 50, is sent to just below the irradiation window 90 by moving mechanism 20, then exposure is carried out by the light of lamp tube 801, after exposure, moving mechanism 20 drives circuit board reset, detects the effect of circuit board after exposure, by being equipped with light illumination device, without operation simple, and exposure effect is good simultaneously, improve the yield of product, and manufacturing is also greatly reduced. BRIEF DESCRIPTION OF DRAWINGS

[0016] Figure 1 It is part structure schematic diagram of the utility model.

[0017] Figure 2 It is part structure schematic diagram of the utility model.

[0018] Figure 3 It is part structure schematic diagram of the utility model.

[0019] Figure 4 It is part structure schematic diagram of the utility model.

[0020] Main component symbol explanation:

[0021] Base 10, moving mechanism 20, moving plate 201, handle 202, bearing seat 30, bearing table 40, adsorption platform 50, mounting seat 60, lighting device 70, upper box body 701, lower box body 702, lamp source assembly 80, lamp tube 801, reflector 802, lamp tube support 803, irradiation window 90, slide rail 100, connecting block 110, clamping groove 120, control panel 130, timer display window 140, lamp tube switch 150, water cooling switch 160, operation platform 170, support column 180, universal wheel 190.

[0022] The following detailed description will further describe the present application in conjunction with the above-mentioned drawings. DETAILED DESCRIPTION

[0023] The following examples are described to assist in the understanding of the present application, the examples are not and should not be interpreted as limiting the protection scope of the present application in any way.

[0024] In the following description, those skilled in the art will recognize that components can be described as separate functional units (which can include sub-units), but those skilled in the art will recognize that various components or portions thereof can be divided into separate components, or can be integrated together (including integrated within a single system or component).

[0025] At the same time, the connection between the components or systems is not intended to be limited to direct connection, on the contrary, the data between these components can be modified, re-formatted, or otherwise changed by intermediate components. In addition, additional or fewer connections can be used. It should also be noted that the terms "coupled", "connected", or "input" should be understood to include direct connections, indirect connections through one or more intermediate devices, and wireless connections.

[0026] Example 1

[0027] As shown in FIG. 1, it is a part of the structure schematic diagram of the present application; as shown in FIG. 2, it is a part of the structure schematic diagram of the present application; as shown in FIG. 3, it is a part of the structure schematic diagram of the present application; as shown in FIG. 4, it is a part of the structure schematic diagram of the present application; as shown in FIG. 5, it is a part of the structure schematic diagram of the present application. Figure 1 Figure 2 Figure 3 Figure 4

[0028] ​​​​The utility model provides a kind of light illumination device of VUV parallel light source photoetcher equipment, including base 10, the top of the base 10 is equipped with moving mechanism 20, the moving mechanism 20 is slidably connected with the base 10, the top of the moving mechanism 20 is connected and is equipped with bearing seat 30, the top of the bearing seat 30 is connected and is equipped with bearing table 40, the top center of the bearing table 40 is connected and is equipped with adsorption platform 50, the adsorption platform 50 is used to place circuit board coated with photoresist, the top of the base 10 side is connected and is equipped with mounting seat 60, the top of the mounting seat 60 is connected and is equipped with light illumination device 70, the light illumination device 70 includes upper box 701 and lower box 702, power supply assembly is equipped in the upper box 701, lamp source assembly 80 is equipped in the lower box 702, the bottom center of the lower box 702 is equipped with irradiation window 90, and the lamp source assembly 80 is placed directly above the irradiation window 90, the lamp source assembly 80 includes lamp tube 801, reflector 802 and lamp tube support 803, the bottom end of the lamp tube support 803 is connected with the lower plate of the lower box 702, the both ends of the lamp tube 801 are connected with the upper part of its corresponding lamp tube support 803, the reflector 802 is placed above the lamp tube 801, and the both ends of the reflector 802 are connected with the lamp tube support 803, the reflector 802 user controls and guides the direction of light, so that light is gathered, when exposing, circuit board coated with photoresist is placed on the adsorption platform 50, is sent to directly below the irradiation window 90 by the moving mechanism 20, then is exposed by the light of the lamp tube 801, after exposure, the moving mechanism 20 drives circuit board to reset, detects the effect of exposed circuit board.

[0029] The model of the lamp tube 801 is LED172nm ultraviolet lamp tube, the LED172nm ultraviolet lamp tube has high-density energy, high stability, long service life, high safety and low heat effect, the lamp tube 801 has multiple, and is uniformly and evenly arranged in parallel, and the reflector 802 is connected above each lamp tube 801.

[0030] Water inlet and water outlet are equipped on any side of the lower box 702, water pipe is equipped in the lower box 702, channel for accommodating the water pipe is equipped on the body of the lamp tube 801, one end of the water pipe is connected with the water inlet, and the other end passes through the channel on the body of the lamp tube 801 and is connected with the water outlet, when the lamp tube 801 exposes, water flow enters the water pipe through the water inlet, and flows out through the water outlet, the heat of the lamp tube 801 is taken away through circulating water flow, to avoid high temperature and damage the lamp tube 801.

[0031] The lower box 702 is also provided with a nitrogen gas interface on any side thereof, nitrogen gas is injected into the lower box 702 through the nitrogen gas interface, and the air in the lower box 702 is exhausted. Before exposure, the device is started, and nitrogen gas is injected into the lower box 702 5-10 minutes in advance, so that there is no air in the lower box 702 during exposure, so that the illumination of the lamp tube 801 cannot reach the set value, and the exposure effect is not good. At the same time, the injection of nitrogen gas can also prolong the service life of the lamp tube 801. The lower box 702 is also provided with a nitrogen gas flow meter on the same side as the nitrogen gas interface. The nitrogen gas flow meter is in communication with the nitrogen gas interface through an air pipe. The nitrogen gas flow meter is used to control the flow rate of nitrogen gas injected into the lower box 702. The flow rate of the nitrogen gas flow meter is 38-42LPM.

[0032] The size of the irradiation window 90 is 150mm*150mm.

[0033] The moving mechanism 20 comprises a moving plate 201, a handle 202 and a sliding block. The bottom ends of the moving plate 201 are connected with the sliding blocks. The top end of the base 10 is provided with sliding rails 100 matched with the sliding blocks. The moving mechanism 20 is in sliding connection with the base 10. The side of the moving plate 201 away from the mounting seat 60 is connected with an outwardly extending connecting block 110. The connecting block 110 is provided with a clamping groove 120. The bottom end of the handle 202 is connected with a clamping column. The clamping column is matched with the clamping groove 120.

[0034] The front plate of the base 10 is provided with a control panel 130. The control panel 130 is provided with a timer display window 140, a lamp tube switch 150 and a water cooling switch 160. The timer display window 140 is used to control the time of nitrogen gas injection. The lamp tube switch 150 is used to control the opening and closing of the lamp tube 801. The water cooling switch 160 is used to control the circulation of water flow.

[0035] The lower end of the base 10 is provided with an operation platform 170. The base 10 is placed on the upper surface of the operation platform 170. The lower surface of the operation platform 170 is provided with supporting columns 180 at the corners. The bottom end of each supporting column 180 is connected with a universal wheel 190, which is convenient for moving.

[0036] The utility model discloses a beneficial effect: the utility model provides a kind of VUV parallel light source photoetching machine equipment's illumination device, including pedestal 10, the pedestal 10 top is equipped with moving mechanism 20, the moving mechanism 20 with the pedestal 10 sliding connection, the moving mechanism 20 top connection is equipped with bearing seat 30, the bearing seat 30 top connection is equipped with bearing platform 40, the bearing platform 40 top center is connected and is equipped with adsorption platform 50, the adsorption platform 50 is used to place circuit board coated with photoresist, the pedestal 10 top side connection is equipped with mounting seat 60, the mounting seat 60 top connection is equipped with illumination device 70, the illumination device 70 includes upper box 701 and lower box 702, the upper box 701 is equipped with power component, the lower box 702 is equipped with lamp source component 80, the lower box 702 bottom center is equipped with irradiation window 90, and the lamp source component 80 is placed in the just above of the irradiation window 90, the lamp source component 80 includes lamp tube 801, reflector 802 and lamp tube support 803, the bottom of lamp tube support 803 with the lower plate of lower box 702 is connected, the both ends of lamp tube 801 with its corresponding lamp tube support 803 upper portion is connected, reflector 802 is placed in the above of lamp tube 801, and the both ends of reflector 802 with lamp tube support 803 is connected, reflector 802 user control and guide light direction, so that light converges, when exposing, circuit board coated with photoresist is placed on adsorption platform 50, by moving mechanism 20 is sent to the just below of irradiation window 90, then exposure is carried out through the light of lamp tube 801, after exposure, the moving mechanism 20 drives circuit board reset, detects the effect of circuit board after exposure. By being equipped with illumination device, it is not operated simply, and exposure effect is good simultaneously, improve the yield of product, and manufacturing is also greatly reduced.

[0037] The above-described embodiments only express several implementation manners of the utility model, and the description is more specific and detailed, but it can not be understood as the limitation of the utility model patent scope. It should be pointed out that, for ordinary skilled person in the art, without departing from the concept of the utility model, a plurality of variations and improvements can be made, and these all belong to the protection scope of the utility model. Therefore, the protection scope of the utility model patent should be according to the attached claims.

Claims

1. An illumination device for a VUV parallel light source lithography machine, comprising a base (10), a moving mechanism (20) provided at the top of the base (10), the moving mechanism (20) being slidably connected to the base (10), a support seat (30) connected at the top of the moving mechanism (20), a support platform (40) connected at the top of the support seat (30), and an adsorption platform (50) connected at the center of the top of the support platform (40), the adsorption platform (50) being used to place a circuit board coated with photoresist, characterized in that: The top side of the base (10) is connected with a mounting seat (60), the top of the mounting seat (60) is connected with an illumination device (70), the illumination device (70) comprises an upper box (701) and a lower box (702), the upper box (701) is internally provided with a power supply assembly, the lower box (702) is internally provided with a lamp source assembly (80), the bottom center of the lower box (702) is provided with an irradiation window (90), and the lamp source assembly (80) is directly above the irradiation window (90), the lamp source assembly (80) comprises a lamp tube (801), a reflector (802) and a lamp tube support (803), the bottom end of the lamp tube support (803) is connected with the lower plate of the lower box (702), the two ends of the lamp tube (801) are connected with the upper part of the corresponding lamp tube support (803), the reflector (802) is above the lamp tube (801), and the two ends of the reflector (802) are connected with the lamp tube support (803), the reflector (802) controls and guides the direction of light, so that the light is gathered.

2. The illumination device for a VUV parallel light source lithography apparatus according to claim 1, characterized in that: The model of the lamp tube (801) is LED172nm ultraviolet lamp tube.

3. The illumination device for a VUV parallel light source lithography apparatus according to claim 2, characterized in that: There are a plurality of lamp tubes (801), which are uniformly and parallel arranged at intervals, and each lamp tube (801) is connected with the reflector (802) above.

4. The illumination device of a VUV parallel light source lithography apparatus according to claim 3, characterized in that: Any side of the lower box (702) is provided with a water inlet and a water outlet, the lower box (702) is internally provided with a water pipe, the body of the lamp tube (801) is provided with a channel for accommodating the water pipe, one end of the water pipe is connected with the water inlet, and the other end passes through the channel on the body of the lamp tube (801) and is then connected with the water outlet.

5. The illumination device of a VUV parallel light source lithography apparatus according to claim 4, characterized in that: Any side of the lower box (702) is also provided with a nitrogen gas interface, nitrogen gas is injected into the lower box (702) through the nitrogen gas interface, and the air in the lower box (702) is exhausted.

6. The illumination device for a VUV parallel light source lithography apparatus according to claim 5, characterized in that: The same side of the lower box (702) as the nitrogen gas interface is also provided with a nitrogen gas flowmeter, the nitrogen gas flowmeter is in communication with the nitrogen gas interface through an air pipe, the nitrogen gas flowmeter is used for controlling the flow rate of nitrogen gas injected into the lower box (702), and the flow rate of the nitrogen gas flowmeter is 38-42LPM.

7. The illumination device of a VUV parallel light source lithography apparatus according to claim 1, characterized in that: The size of the irradiation window (90) is 150mm*150mm.

8. The illumination device of a VUV parallel light source lithography apparatus according to claim 7, characterized in that: The moving mechanism (20) comprises a moving plate (201), a handle (202) and a sliding block, the bottom sides of the moving plate (201) are connected with the sliding blocks, the top of the base (10) is provided with sliding rails (100) matched with the sliding blocks, the side, away from the mounting seat (60), of the moving plate (201) is connected with an outwardly extending connecting block (110), the connecting block (110) is provided with a clamping groove (120), the bottom end of the handle (202) is connected with a clamping column, and the clamping column is matched with the clamping groove (120).

9. The illumination device of a VUV parallel light source lithography apparatus according to claim 8, characterized in that: The front plate of the base (10) is provided with a control panel (130), the control panel (130) is provided with a timer display window (140), a lamp switch (150) and a water cooling switch (160), the timer display window (140) is used for controlling the nitrogen injection time, the lamp switch (150) is used for controlling the opening and closing of the lamp (801), and the water cooling switch (160) is used for controlling the circulation of water flow.

10. The illumination device of a VUV parallel light source lithography apparatus according to claim 9, characterized in that: The lower portion of the base (10) is provided with an operation platform (170), the base (10) is arranged on the upper surface of the operation platform (170), and the lower surface of the operation platform (170) is provided with supporting columns (180) at the corners; the bottom end of each supporting column (180) is connected with a universal wheel (190), so that the base (10) can be conveniently moved.

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