Vacuum plasma treatment box structure capable of rapidly and uniformly bearing materials

Abstract

The utility model relates to a vacuum plasma treatment box structure capable of quickly and uniformly bearing materials, which comprises a lower fixed box body fixedly arranged on a rack, an upper lifting box body arranged corresponding to the lower fixed box body to form a lifting open-close type box body structure, and a quick material taking and placing type vacuum plasma treatment box body structure matched with an external stretching type material taking and placing plate, the lower fixed box body comprises a lower box body main body, a vacuum treatment bearing table top is arranged on the lower box body main body, a vacuum treatment bearing boss module is arranged on the vacuum treatment bearing table top, a material bearing lifting pin module is arranged corresponding to the vacuum treatment bearing boss module, the material bearing lifting pin module is lifted, and the vacuum treatment bearing boss module is arranged on the material bearing lifting pin module; and the vacuum plasma processing structure is used for loading and receiving materials or lifting the materials to take out the execution piece corresponding to the external stretching type material taking and placing plate, so as to form a rapid and uniform receiving vacuum plasma processing structure.

Description

Technical Field

[0001] This utility model relates to vacuum plasma treatment technology and its equipment, specifically, a lifting and opening type upper plasma treatment gas uniform supply box structure. Background Technology

[0002] Vacuum plasma treatment is a commonly used surface treatment equipment for products. However, most vacuum plasma equipment at present is a side-switchable cabinet type. Side-switchable cabinet type equipment generally requires operators to be responsible for the processing. Operators open the cabinet door to load and unload the processed materials. This manual handling method is costly and inefficient.

[0003] Therefore, it is necessary to provide a vacuum plasma treatment chamber structure that can rapidly and uniformly load materials to solve the above problems. Utility Model Content

[0004] The purpose of this invention is to provide a structure for a vacuum plasma treatment box that can rapidly and uniformly hold materials.

[0005] The technical solution is as follows:

[0006] A vacuum plasma treatment box structure for rapid and uniform material loading includes a lower fixed box body fixedly mounted on a frame, and an upper lifting box body corresponding to the lower fixed box body, forming a lifting and opening box structure. Combined with an externally extending material loading and unloading plate, it forms a rapid material loading and unloading vacuum plasma treatment box structure.

[0007] The lower fixed housing includes a lower housing body, on which a vacuum processing receiving platform is provided. A vacuum processing receiving boss module is provided on the vacuum processing receiving platform. Corresponding to the vacuum processing receiving boss module, a material receiving lifting pin module is set. When the material receiving lifting pin module is raised, it is used for material loading and receiving or for lifting the material to retrieve the corresponding external extension plate, forming a vacuum plasma processing structure with fast and uniform receiving.

[0008] Furthermore, the vacuum-processed receiving boss module includes several receiving bosses, four of which are arranged at the four corners of square A, and the other four are arranged at the four corners of quadrilateral B.

[0009] Furthermore, the material receiving lifting pin module includes four pins, which are set at the four corners of square A.

[0010] Furthermore, the material receiving lifting pin module also includes a connecting plate for connecting four pins, which is connected to the lifting drive component.

[0011] Furthermore, the lifting drive component is a cylinder.

[0012] Furthermore, a vacuum extraction tube is connected to the bottom of the lower main body of the box.

[0013] Furthermore, the lower main body of the box is also connected to a vacuum level detection device and a corresponding vacuum contact pipeline structure.

[0014] Compared with existing technologies, this utility model achieves high-quality material handling through a rapid material handling vacuum plasma treatment box structure, combined with a rapid and uniform vacuum plasma treatment structure, facilitating the automated implementation of vacuum treatment. Attached Figure Description

[0015] Figure 1 This is one of the structural schematic diagrams of this utility model.

[0016] Figure 2 This is the second structural schematic diagram of this utility model.

[0017] Figure 3 This is the third structural schematic diagram of this utility model. Detailed Implementation

[0018] Example:

[0019] Please see Figure 1-3 This embodiment demonstrates a vacuum plasma treatment box structure for rapid and uniform material loading, including a lower fixed box 2 fixedly mounted on a frame 1, and an upper lifting box 3 corresponding to the lower fixed box 2, forming a lifting and opening box structure. Combined with an externally extending material loading and unloading plate, it forms a rapid material loading and unloading vacuum plasma treatment box structure.

[0020] The lower fixed housing 2 includes a lower housing body 21. A vacuum processing receiving platform 22 is provided on the lower housing body 21. A vacuum processing receiving boss module 23 is provided on the vacuum processing receiving platform 22. A material receiving lifting pin module 24 is provided corresponding to the vacuum processing receiving boss module 23. When the material receiving lifting pin module 24 is raised, it is used for material loading and receiving or for lifting the material to remove the corresponding external insertion pick-and-place plate, forming a vacuum plasma processing structure with fast and uniform receiving.

[0021] The vacuum-processed receiving boss module 23 includes several receiving bosses 231, four of which are arranged at the four corners of square A100, and the other four are arranged at the four corners of quadrilateral B200.

[0022] The material receiving and lifting pin module 24 includes four pins 241, which are set at the four corners of the square A100.

[0023] The material receiving lifting pin module 24 also includes a connecting plate 242 for connecting four pins 241, and the connecting plate 242 is connected to the lifting drive component 243.

[0024] The lifting drive component 243 is a cylinder.

[0025] The bottom of the lower box body 21 is connected to a corresponding vacuum extraction tube 3.

[0026] The lower housing body 21 is also connected to a vacuum degree detection component 4 and a vacuum contact corresponding pipeline structure 5.

[0027] Compared with existing technologies, this utility model achieves high-quality material handling through a rapid material handling vacuum plasma treatment box structure, combined with a rapid and uniform vacuum plasma treatment structure, facilitating the automated implementation of vacuum treatment.

[0028] For those skilled in the art, various modifications and improvements can be made without departing from the inventive concept of this utility model, and these modifications and improvements all fall within the protection scope of this utility model.

Claims

1. A vacuum plasma treatment chamber structure for rapid and uniform material loading, characterized in that: The lower fixed box body is fixedly arranged on the rack, the upper lifting box body is arranged corresponding to the lower fixed box body, a lifting opening and closing box body structure is formed, and a quick material taking and placing vacuum plasma processing box body structure is formed by cooperating with the external extension type material taking and placing plate. The lower fixed box body comprises a lower box body main body, a vacuum processing receiving table is arranged on the lower box body main body, a vacuum processing receiving boss module is arranged on the vacuum processing receiving table, a material receiving and lifting pin needle module is arranged corresponding to the vacuum processing receiving boss module, the material receiving and lifting pin needle module is lifted, is used for material loading and receiving or material lifting, and a quick and uniform vacuum plasma processing structure is formed.

2. The vacuum plasma processing chamber of claim 1 wherein: The vacuum processing receiving boss module comprises a plurality of receiving bosses, four of the receiving bosses are arranged at four corners of a square A, and the other four are arranged at four corners of a square B.

3. The vacuum plasma processing chamber of claim 2 wherein: the chamber is configured to process a substrate at a rate of at least 0.5 m / min. The material receiving and lifting pin needle module comprises four pin needles arranged corresponding to the four corners of the square A.

4. The vacuum plasma processing chamber of claim 3 wherein: the chamber is configured to process a substrate at a rate of at least 0.5 m / min. The material receiving and lifting pin needle module further comprises a connecting plate for connecting the four pin needles, and the connecting plate is connected to the lifting driving element.

5. The vacuum plasma processing chamber of claim 4 wherein: the chamber is configured to process a substrate at a rate of at least 0.5 m / min. The lifting driving element is a gas cylinder.

6. The vacuum plasma processing chamber of claim 5 wherein: the gas distribution plate is formed of a plurality of gas distribution plate segments. The lower box body main body is connected with a vacuum extraction corresponding pipe.

7. The vacuum plasma processing chamber of claim 6 wherein: the chamber is configured to process a substrate at a rate of at least 0.5 m / min. The lower box body main body is further connected with a vacuum degree detection element and a vacuum contact corresponding pipeline structure.

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