Auxiliary air inlet device of chemical vapor deposition furnace

Abstract

The utility model discloses an auxiliary gas inlet device of a chemical vapor deposition furnace, which comprises a chemical vapor deposition furnace body and a reaction tube, the reaction tube is clamped in the chemical vapor deposition furnace body, and one end of the reaction tube is provided with an auxiliary gas inlet mechanism. The utility model discloses an auxiliary gas inlet mechanism capable of assisting in preheating gas inlet into a reaction tube of a chemical vapor deposition furnace, and relates to the technical field of chemical vapor deposition. By arranging an auxiliary gas inlet device on a gas inlet tube of the chemical vapor deposition furnace, various gases firstly enter a tubular preheating tube, and are rapidly heated and preheated while being mixed, so that the space is not occupied, and the energy consumption is reduced; and the mixed gas has a certain temperature when entering the chemical vapor deposition furnace, so that the reaction efficiency and the reaction effect of the mixture can be improved.

Description

Technical Field

[0001] This utility model relates to the field of chemical vapor deposition, specifically to an auxiliary air intake device for a chemical vapor deposition furnace. Background Technology

[0002] Chemical vapor deposition (CVD) is a chemical engineering technique that utilizes one or more gaseous compounds or elements containing thin film elements to chemically react on a substrate surface to form a thin film. Traditional CVD processes require the introduction of multiple gases. A patent database search revealed an auxiliary gas inlet device for a CVD furnace (CN212770948U). This device introduces different gases into a mixing chamber, then starts a stirring motor, and the stirring paddle thoroughly mixes the gases. Finally, a vacuum pump is activated, directing the gas into a second connecting pipe, allowing it to enter the furnace body for reaction. However, during the gas transport and stirring process, the temperature continuously decreases, resulting in insufficient temperature of the mixed gas entering the CVD furnace and poor reaction performance.

[0003] Therefore, it is necessary to propose an auxiliary gas inlet device for a chemical vapor deposition furnace. Utility Model Content

[0004] The purpose of this invention is to provide an auxiliary gas inlet device for a chemical vapor deposition furnace to solve the problems mentioned in the background art.

[0005] To achieve the above objectives, this utility model provides the following technical solution:

[0006] An auxiliary air intake device for a chemical vapor deposition furnace includes a chemical vapor deposition furnace body and a reaction tube. The reaction tube is snapped into the interior of the chemical vapor deposition furnace body. An auxiliary air intake mechanism is provided at one end of the reaction tube, which can provide auxiliary preheating air intake into the reaction tube of the chemical vapor deposition furnace.

[0007] The auxiliary air intake mechanism includes a support assembly, an air intake assembly, and a preheating air intake assembly.

[0008] Preferably, the support assembly includes a first support frame, a second support frame, and a third support frame. The first support frame is mounted on the chemical vapor deposition furnace body by screws, and the second and third support frames are respectively mounted on the top of the first support frame by screws. One end of the reaction tube is snapped onto the second support frame.

[0009] Preferably, the air intake assembly includes a valve, a preheating pipe, and a connector. One end of the valve is connected to one end of the reaction pipe via a flange and bolts, and the other end of the valve is connected to the preheating pipe via a flange and bolts. The other end of the preheating pipe is fixedly installed with a connector, and the outer wall of the preheating pipe is snapped onto a third support frame.

[0010] Preferably, a multi-port connector is threaded onto the other end of the connector, and the other end of the multi-port connector is connected to the air intake pipe.

[0011] Preferably, the preheating air intake assembly includes a baffle, a heating wire, and a stirring plate, wherein the baffle and the stirring plate are rotatably installed inside the preheating tube, and the heating wire is fixedly installed inside the preheating tube.

[0012] Preferably, the preheating air intake assembly further includes a first motor and a second motor. The first motor and the second motor are respectively bolted to the bottom of the first support frame. The output end of the first motor is connected to a second connecting rod, the upper end of the second connecting rod is connected to a stirring plate, the output end of the second motor is connected to the first connecting rod, and the upper end of the first connecting rod is connected to a baffle.

[0013] Preferably, a first switch and a second switch are respectively installed on the top of the first support frame by screws. The first switch is electrically connected to the heating wire, and the second switch is electrically connected to the first motor and the second motor respectively.

[0014] Additional aspects and advantages of this invention will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention.

[0015] Beneficial effects:

[0016] By installing an auxiliary gas inlet device in the gas inlet pipe of the chemical vapor deposition furnace, multiple gases first enter the tubular preheating tube. The gases are rapidly preheated while being mixed, which not only saves space but also ensures that the mixed gases have a certain temperature when entering the chemical vapor deposition furnace, thereby improving the reaction efficiency and reaction effect of the mixture. Attached Figure Description

[0017] Figure 1 A front view of an auxiliary air intake device for a chemical vapor deposition furnace;

[0018] Figure 2 This is a schematic diagram of an auxiliary air intake device for a chemical vapor deposition furnace;

[0019] Figure 3 This is a diagram showing the internal structure of a preheating tube in an auxiliary air intake device of a chemical vapor deposition furnace.

[0020] Figure 4 This is a structural diagram of the agitator plate in the auxiliary air intake device of a chemical vapor deposition furnace.

[0021] In the figure: 1. Chemical vapor deposition furnace body; 11. Reaction tube; 2. Support assembly; 21. First support frame; 22. Second support frame; 23. Third support frame; 3. Gas inlet assembly; 31. Valve; 32. Preheating pipe; 33. Connector; 34. Multi-port connector; 35. Gas inlet pipe; 4. Preheating gas inlet assembly; 41. Baffle; 42. Heating wire; 43. Stirring plate; 44. First connecting rod; 45. Second connecting rod; 46. First motor; 47. Second motor; 48. First switch; 49. Second switch; 100. Auxiliary gas inlet mechanism. Detailed Implementation

[0022] The embodiments of this utility model are described in detail below. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain this utility model, and should not be construed as limiting this utility model.

[0023] like Figures 1-4 ;

[0024] An auxiliary gas inlet device for a chemical vapor deposition (CVD) furnace includes a CVD furnace body 1 and a reaction tube 11. The CVD furnace body 1 is a KJ-T120 model. The reaction tube 11 is snapped into the interior of the CVD furnace body 1. A mixed gas enters the reaction tube 11 and reacts with the gaseous reactants under high temperature conditions. An auxiliary gas inlet mechanism 100 is provided at one end of the reaction tube 11. The auxiliary gas inlet mechanism 100 can provide auxiliary preheating gas into the reaction tube 11 of the CVD furnace. The auxiliary gas inlet mechanism 100 includes a support assembly 2, a gas inlet assembly 3, and a preheating gas inlet assembly 4.

[0025] Furthermore, the support assembly 2 includes a first support frame 21, a second support frame 22, and a third support frame 23. The first support frame 21 is mounted on the chemical vapor deposition furnace body 1 by screws and is used to support the auxiliary gas inlet mechanism 100. The second support frame 22 and the third support frame 23 are respectively mounted on the top of the first support frame 21 by screws. The second support frame 22 provides auxiliary support for the reaction tube 11, and one end of the reaction tube 11 is snapped onto the second support frame 22. The third support frame 23 is used to support the preheating tube 32.

[0026] Furthermore, the air intake assembly 3 includes a valve 31, a preheating pipe 32, and a connector 33. One end of the valve 31 is connected to one end of the reaction pipe 11 via a flange and bolts. The valve 31 controls the mixed gas in the preheating pipe 32 to enter the reaction pipe 11. The other end of the valve 31 is connected to the preheating pipe 32 via a flange and bolts. Multiple gases enter the preheating pipe 32, are rapidly preheated and mixed internally, and then rapidly fed into the reaction pipe 11. The other end of the preheating pipe 32 is fixedly installed with a connector 33, which is used to connect to a multi-port connector 34. To prevent air leakage from the connector 33, a sealing ring is placed inside the connector 33. The outer wall of the preheating pipe 32 is snapped onto the third support frame 23. The other end of the connector 33 is threaded with a multi-port connector 34, which is used to connect to the air intake pipe 35 for air intake. The other end of the multi-port connector 34 is connected to the air intake pipe 35, which is connected to an external air pump. Different preset gases are introduced into the preheating pipe 32 through different air intake pipes 35 for reaction.

[0027] Furthermore, the preheating air intake assembly 4 includes a baffle 41, a heating wire 42, and a stirring plate 43. The baffle 41 and the stirring plate 43 are rotatably mounted inside the preheating tube 32. When the baffle 41 rotates, it can push gas into the preheating tube 32; when the baffle 41 is closed, it can also prevent gas from entering and prevent heat loss. The stirring plate 43 rotates to mix various gases inside the preheating tube 32 and to rapidly mix and preheat the gases. The heating wire 42 is fixedly mounted inside the preheating tube 32. When energized, the heating wire 42 increases the internal temperature of the preheating tube 32. The preheating air intake assembly 4 also includes a first motor 46 and a second motor 47. The first motor 46 and the second motor 47 are respectively bolted to the bottom of the first support frame 21. The first motor 46… The output end is connected to the second connecting rod 45. The first motor 46 is used to drive the second connecting rod 45 and the stirring plate 43 to rotate. The second motor 47 is used to drive the first connecting rod 44 and the baffle 41 to rotate. The upper end of the second connecting rod 45 is connected to the stirring plate 43. The output end of the second motor 47 is connected to the first connecting rod 44. The upper end of the first connecting rod 44 is connected to the baffle 41. The top of the first support frame 21 is respectively equipped with a first switch 48 and a second switch 49 by screws. The first switch 48 is electrically connected to the heating wire 42. The other end of the first switch 48 is connected to an external power source. The first switch 48 controls the heating wire 42 to be energized and de-energized. The second switch 49 is electrically connected to the first motor 46 and the second motor 47 respectively. The second switch 49 is used to control the start and stop of the first motor 46 and the second motor 47 respectively.

[0028] The working principle of this utility model is as follows: one end of valve 31 is connected to reaction tube 11, and the other end of valve 31 is connected to preheating tube 32. Different preset gases are introduced into preheating tube 32 through different air inlet pipes 35 to carry out the reaction. The other end of the first switch 48 is connected to an external power source. The first switch 48 controls the heating wire 42 to be energized. The heating wire 42 is energized and heats up, increasing the internal temperature of preheating tube 32. The second motor 47 drives the first connecting rod 44 and the baffle 41 to rotate. When the baffle 41 rotates, it can push the gas into the preheating tube 32. When the baffle 41 is closed, it can also prevent the gas from entering. In addition to its function, the baffle 41 also serves to prevent heat loss. After multiple gases enter the preheating tube 32, the first motor 46 drives the second connecting rod 45 and the stirring plate 43 to rotate. The rotation of the stirring plate 43 mixes the multiple gases inside the preheating tube 32 and rapidly mixes and preheats the gases. After the multiple gases are mixed and preheated, they enter the reaction tube 11, which will improve the reaction efficiency. When the valve 31 is opened, the stirring plate 43 will send the gas in the preheating tube 32 into the reaction tube 11 while rotating. Finally, the mixed gas reacts with the gaseous reactants in the reaction tube 11 under high temperature conditions.

[0029] Although the present invention has been described above with reference to embodiments, various modifications can be made and components can be replaced with equivalents without departing from the scope of the present invention. In particular, as long as there is no structural conflict, the features in the embodiments disclosed in this invention can be combined with each other in any way. The lack of an exhaustive description of these combinations in this specification is merely for the sake of brevity and resource conservation. Therefore, the present invention is not limited to the specific embodiments disclosed herein, but includes all technical solutions falling within the scope of the claims.

Claims

1. An auxiliary gas inlet device of a chemical vapor deposition furnace, comprising a chemical vapor deposition furnace body (1) and a reaction tube (11) clamped in the interior of the chemical vapor deposition furnace body (1), characterized in that: One end of the reaction tube (11) is provided with an auxiliary gas inlet mechanism (100), which can assist in preheating the gas into the reaction tube (11) of the chemical vapor deposition furnace; The auxiliary gas inlet mechanism (100) comprises a support assembly (2), a gas inlet assembly (3) and a preheated gas assembly (4).

2. The auxiliary gas inlet device of a chemical vapor deposition furnace according to claim 1, wherein: The support assembly (2) comprises a first support frame (21), a second support frame (22) and a third support frame (23), the first support frame (21) is installed on the chemical vapor deposition furnace body (1) by screws, the second support frame (22) and the third support frame (23) are respectively installed on the top of the first support frame (21) by screws, and one end of the reaction tube (11) is clamped on the second support frame (22).

3. The auxiliary gas inlet device of a chemical vapor deposition furnace according to claim 2, wherein: The gas inlet assembly (3) comprises a valve (31), a preheating tube (32) and a connector (33), one end of the valve (31) is connected to one end of the reaction tube (11) by flange and bolt, the other end of the valve (31) is connected to the preheating tube (32) by flange and bolt, the other end of the preheating tube (32) is fixedly installed with the connector (33), and the outer wall of the preheating tube (32) is clamped on the third support frame (23).

4. The auxiliary gas inlet device of a chemical vapor deposition furnace according to claim 3, characterized in that: The other end of the connector (33) is threadedly installed with a multi-way connector (34), and the other end of the multi-way connector (34) is connected with a gas inlet pipe (35).

5. The auxiliary gas inlet device of a chemical vapor deposition furnace according to claim 3, wherein: The preheated gas assembly (4) comprises a baffle (41), a heating wire (42) and an agitating plate (43), the baffle (41) and the agitating plate (43) are respectively rotatably installed in the interior of the preheating tube (32), and the heating wire (42) is fixedly installed in the interior of the preheating tube (32).

6. The auxiliary gas inlet device of a chemical vapor deposition furnace according to claim 5, wherein: The preheated gas assembly (4) further comprises a first motor (46) and a second motor (47), the first motor (46) and the second motor (47) are respectively installed at the bottom of the first support frame (21) by bolts, the output end of the first motor (46) is connected with a second connecting rod (45), the upper end of the second connecting rod (45) is connected with the agitating plate (43), the output end of the second motor (47) is connected with a first connecting rod (44), and the upper end of the first connecting rod (44) is connected with the baffle (41).

7. The auxiliary gas inlet device of a chemical vapor deposition furnace according to claim 6, characterized in that: The top of the first support frame (21) is respectively provided with a first switch (48) and a second switch (49) by screws, the first switch (48) is electrically connected with the heating wire (42), and the second switch (49) is respectively electrically connected with the first motor (46) and the second motor (47).

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