Cleaning device for silicon nitride ceramic substrate

Abstract

The utility model discloses a cleaning device for a silicon nitride ceramic substrate. The cleaning device for the silicon nitride ceramic substrate comprises a cleaning table, the cleaning table comprises a cleaning frame and a limiting base, the cleaning frame is provided with a cleaning assembly, the cleaning assembly comprises a connecting base installed on the cleaning frame, the lower end of the connecting base is provided with a supporting arm, the supporting arm is hinged to a swing arm, and the swing arm is hinged to the limiting base. One end of the swing arm is connected with a spraying head, a reciprocating motor is further arranged on the end side of the connecting base, a lead screw is arranged at the output end of the reciprocating motor and sleeved with a fixing block, one end of the fixing block is movably connected with a connecting rod, one end of the connecting rod is movably connected with the swing arm, and an adjusting assembly is further arranged on the cleaning frame. The adjusting assembly comprises a fixing base. And by arranging the spraying head capable of swinging up and down, the spraying head capable of swinging can cover a larger area, it can be ensured that cleaning liquid is evenly distributed, and cleaning dead corners are reduced.

Description

Technical Field

[0001] This utility model relates to the field of cleaning device technology, and in particular to a cleaning device for silicon nitride ceramic substrates. Background Technology

[0002] Cleaning equipment is a device that quickly cleans materials, improving cleaning efficiency. However, cleaning equipment may vary depending on the material being cleaned. For silicon nitride ceramic substrates, which have excellent mechanical properties, high thermal conductivity, low coefficient of thermal expansion, and high thermal shock resistance, surface cleaning is even more important.

[0003] The prior art discloses a cleaning device for silicon nitride ceramic substrates. This device effectively cleans organic contaminants on the substrate with hot water, further cleans it with ultrasonic waves, releases thermal stress on the substrate with high-pressure water, and finally dries the cleaned substrate.

[0004] However, this device still has some drawbacks. Because the nozzles in the cleaning components of this device are fixed, and because the fixed-angle nozzles may form cleaning dead corners on substrates of certain shapes or structures, the contaminants in these dead corners are difficult to remove effectively.

[0005] Therefore, it is necessary to provide a cleaning apparatus for silicon nitride ceramic substrates to solve the above-mentioned technical problems. Utility Model Content

[0006] In view of the above situation and to overcome the defects of the prior art, this utility model provides a cleaning device for silicon nitride ceramic substrates that enables the cleaning components to oscillate up and down for cleaning. The oscillating nozzle can cover a larger area, especially when dealing with large or complex-shaped substrates, ensuring uniform distribution of cleaning fluid and reducing cleaning dead corners.

[0007] To achieve the above objectives, the technical solution adopted by this utility model is as follows:

[0008] A cleaning device for silicon nitride ceramic substrates includes: a cleaning table, the cleaning table including a cleaning frame and a limiting base, a cleaning assembly on the cleaning frame, the cleaning assembly including a connecting seat mounted on the cleaning frame, a support arm at the lower end of the connecting seat, a swing arm hinged to the support arm, a spray nozzle connected to one end of the swing arm, and a reciprocating motor at the end of the connecting seat, a lead screw at the output end of the reciprocating motor, a fixing block sleeved on the lead screw, a connecting rod movably connected to one end of the fixing block, and the swing arm movably connected to one end of the connecting rod; an adjustment assembly on the cleaning frame, the adjustment assembly including a fixing seat, a limiting block at the lower end of the fixing seat, a threaded rod at the end of the limiting block, and a silicone plate at one end of the threaded rod.

[0009] Preferably, a drive motor is provided at one end of the cleaning rack, and an adjusting rod is provided at the output end of the drive motor, the adjusting rod being connected through the fixed base.

[0010] Preferably, the cleaning rack is further provided with a circulation component, the circulation component including a return box installed below the cleaning component, a water pump is also provided in the return box, a pipe above the water pump is connected to a circulation pipe, and the circulation pipe is connected to a spray nozzle through a hose.

[0011] Preferably, the return box is further provided with a filter screen, the filter screen is surrounded by a sealing ring, and the filter screen is fitted into the return box.

[0012] Preferably, the return box is divided into two sides by a filter screen, and one side is also provided with a slope.

[0013] Preferably, the cleaning rack is further provided with a drying plate, which is installed on one end of the cleaning assembly.

[0014] Compared with the prior art, the present invention has the following beneficial effects:

[0015] (1) This utility model can achieve the cleaning of silicon nitride ceramic substrates by using multiple parts in the cleaning assembly. In actual use, the swingable spray head can cover a larger area. Especially when dealing with large or complex substrates, it can ensure that the cleaning liquid is evenly distributed and reduce cleaning dead corners. At the same time, by swinging up and down, the cleaning liquid can be more evenly distributed on the substrate surface, avoiding local over-cleaning or under-cleaning and ensuring the consistency of the overall cleaning effect.

[0016] (2) This utility model can achieve left and right movement cleaning of silicon nitride ceramic substrate by using the combination of the drive motor and the adjustment rod. In actual use, the silicon nitride ceramic substrate is clamped by the silicone plate, and then the left and right movement cleaning of silicon nitride ceramic substrate is achieved by using the combination of the drive motor, the adjustment rod and the cleaning component. The left and right movement cleaning method can make the cleaning liquid cover the surface of the substrate more evenly, reduce the time waste caused by cleaning in a fixed position, and thus improve the overall cleaning efficiency.

[0017] (3) By using the combination of the set reflux box and the water pump, when the cleaning liquid is cleaning the silicon nitride ceramic substrate, part of the cleaning liquid will be collected through the reflux box and then recycled with the water pump. By recycling the cleaning liquid, the consumption of water resources can be reduced and water waste can be reduced. Attached Figure Description

[0018] Figure 1A schematic diagram of the overall structure of the cleaning device for silicon nitride ceramic substrates provided by this utility model.

[0019] Figure 2 A schematic diagram of the internal structure of the cleaning table of the cleaning device for cleaning silicon nitride ceramic substrates provided by this utility model.

[0020] Figure 3 A schematic diagram of the cleaning component structure of the cleaning device for the silicon nitride ceramic substrate provided by this utility model;

[0021] Figure 4 A schematic diagram of the adjustment component structure of the cleaning device for silicon nitride ceramic substrates provided by this utility model;

[0022] Figure 5 A schematic diagram of the internal structure of the reflux box of the cleaning device for silicon nitride ceramic substrates provided by this utility model.

[0023] The corresponding names of the reference numerals in the attached drawings are as follows: 100, cleaning table; 101, cleaning rack; 102, limiting base; 103, baffle; 200, cleaning assembly; 201, connecting seat; 202, support arm; 203, swing arm; 204, spray head; 205, connecting pipe; 206, pre-tightening bolt; 207, reciprocating motor; 208, lead screw; 209, connecting rod; 300, adjusting assembly; 301, drive motor; 302, adjusting rod; 303, fixed seat; 304, limiting block; 305, threaded rod; 306, silicone plate; 400, circulation assembly; 401, circulation pipe; 402, return box; 403, water pump; 404, filter screen; 405, slope; 500, drying plate. Detailed Implementation

[0024] The present invention will be further described below with reference to the accompanying drawings and embodiments. The embodiments of the present invention include, but are not limited to, the following embodiments.

[0025] First embodiment:

[0026] like Figure 1-4As shown, the cleaning device for silicon nitride ceramic substrates provided by this utility model includes: a cleaning table 100, which includes a cleaning frame 101 and a limiting base 102. A baffle 103 is provided on the cleaning frame 101, and a cleaning assembly 200 is also provided. The cleaning assembly 200 includes a connecting seat 201 mounted on the cleaning frame 101. A support arm 202 is provided at the lower end of the connecting seat 201, and a swing arm 203 is hinged to the support arm 202. A pre-tightening bolt 206 is provided on the swing arm 203, and a spray nozzle 204 is connected to one end of the swing arm 203. A reciprocating motor 207 is also provided on the side of the connecting seat 201. A lead screw 208 is provided at the output end of the reciprocating motor 207. A fixing block is sleeved on the lead screw 208. One end of the fixing block is movably connected to a connecting rod 209, and one end of the connecting rod 209 is also movably connected to the swing arm 203. An adjustment assembly 300 is also provided on the cleaning frame 101. The adjustment assembly 300 includes... The system includes a fixed base 303, with a limiting block 304 at its lower end. A threaded rod 305 is provided on one end of the limiting block 304, and a silicone plate 306 is provided on one end of the threaded rod 305. In actual use, the operator tightens the threaded rod 305 to clamp the silicon nitride ceramic substrate through the silicone plate 306. At this time, the cleaning component 200 and the drive motor 301 are activated. The activation of the cleaning component 200 drives the reciprocating motor 207, which in turn causes the fixed block sleeved on the lead screw 208 to move up and down. The up and down movement of the fixed block causes the connecting rod 209 to reciprocate and rise. The reciprocating and rising movement of the connecting rod 209 causes the swing arm 203 movably connected to the support arm 202 to move up and down. The up and down movement of the swing arm 203 causes the spray head 204 to swing and spray, thereby cleaning the silicon nitride ceramic substrate.

[0027] By using multiple parts within the cleaning assembly 200 in conjunction, the cleaning of silicon nitride ceramic substrates can be achieved. In actual use, the swingable spray head 204 can cover a larger area, especially when dealing with large or complex-shaped substrates. This ensures uniform distribution of the cleaning solution, reduces cleaning dead zones, and the swinging motion ensures that the cleaning solution is more evenly distributed on the substrate surface, avoiding over- or under-cleaning in certain areas and ensuring the consistency of the overall cleaning effect.

[0028] Second embodiment:

[0029] like Figure 2 , Figure 4As shown, a drive motor 301 is also provided at one end of the cleaning rack 101. An adjusting rod 302 is provided at the output end of the drive motor 301. The adjusting rod 302 is connected to the fixed base 303. In actual use, by starting the drive motor 301, the adjusting rod 302 is driven to rotate. The adjusting rod 302 has a threaded structure. By rotating the adjusting rod 302, the fixed base 303 is moved left and right. By moving the fixed base 303 left and right, the silicon nitride ceramic substrate can be cleaned by moving left and right.

[0030] By using the drive motor 301 and the adjusting rod 302 in conjunction, the silicon nitride ceramic substrate can be cleaned by moving it left and right. In actual use, the silicon nitride ceramic substrate is clamped by the silicone plate 306, and then the drive motor 301, the adjusting rod 302 and the cleaning assembly 200 work together to achieve the left and right movement of the silicon nitride ceramic substrate for cleaning. The left and right movement cleaning method allows the cleaning solution to cover the surface of the substrate more evenly, reducing the time wasted due to cleaning in a fixed position, thereby improving the overall cleaning efficiency. At the same time, the rotation frequency of the drive motor 301 can be controlled by PLC programming, which can control the left and right movement speed of the silicon nitride ceramic substrate. By using a reasonable left and right movement speed, more cleaning time can be provided, resulting in a better cleaning effect.

[0031] Third embodiment:

[0032] like Figure 2 , Figure 5 As shown, the cleaning rack 101 is also equipped with a circulation component 400. The circulation component 400 includes a return box 402 installed below the cleaning component 200. A water pump 403 is also installed in the return box 402. The water pump 403 is connected to the circulation pipe 401 through a pipe. The circulation pipe 401 is connected to the spray head 204 through a hose. In actual use, the return box 402 can collect part of the cleaning liquid. Then, the water pump 403 in the return box 402 will push the cleaning liquid into the circulation pipe 401. Since the circulation pipe 401 and the spray head 204 are connected through a connecting pipe 205, the cleaning liquid can be recycled.

[0033] By using the reflux tank 402 in conjunction with the water pump 403, when the cleaning solution is cleaning the silicon nitride ceramic substrate, part of the cleaning solution is collected through the reflux tank 402 and then recycled with the water pump 403. By recycling the cleaning solution, the consumption of water resources can be reduced, thus reducing water waste.

[0034] Fourth embodiment:

[0035] like Figure 2 , Figure 5As shown, a filter screen 404 is also provided inside the return box 402. A sealing ring is provided around the filter screen 404, and the filter screen 404 is fitted into the return box 402. The return box 402 is divided into two sides by the filter screen 404, and a slope 405 is provided on one side. In actual use, after a portion of the cleaning liquid is collected by the return box 402, the collected cleaning liquid flows to the end of the filter screen 404 through the slope 405. After the returned cleaning liquid is filtered by the filter screen 404, the cleaning liquid is pumped into the circulation pipe 401 by the water pump 403 in the return box 402. The circulation pipe 401 is connected to the spray head 204 through the connecting pipe 205, thereby realizing the recycling of the cleaning liquid.

[0036] By using the filter screen 404, impurities such as dust, particulate matter and other suspended matter in the cleaning fluid can be effectively removed, ensuring the cleanliness of the cleaning fluid and thus improving the quality of the cleaning fluid circulation process.

[0037] Fifth embodiment:

[0038] like Figure 1-2 As shown, a drying plate 500 is also provided on the cleaning rack 101. The drying plate 500 is installed on one end of the cleaning assembly 200. In actual use, by starting the drive motor 301, the drive motor 301 drives the adjusting rod 302 to rotate. The rotation of the adjusting rod 302 causes the fixed seat 303 to move the silicon nitride ceramic substrate. After the silicon nitride ceramic substrate is cleaned, the drive motor 301 drives the silicon nitride ceramic substrate to the drying plate 500. At this time, the drying plate 500 blows the silicon nitride ceramic substrate dry. Finally, the drive motor 301 drives the dried silicon nitride ceramic substrate to the port, thus completing the cleaning work of the silicon nitride ceramic substrate.

[0039] The drying plate 500 can accelerate the drying speed of silicon nitride ceramic substrates because it can quickly remove moisture from the substrate surface, reducing the time required for natural air drying.

[0040] Working principle: In actual use, the operator tightens the threaded rod 305 to clamp the silicon nitride ceramic substrate through the silicone plate 306. At this time, the cleaning component 200 and the drive motor 301 are activated. The activation of the cleaning component 200 drives the reciprocating motor 207, which in turn causes the fixing block sleeved on the lead screw 208 to move up and down. The up and down movement of the fixing block causes the connecting rod 209 to reciprocate and rise. The reciprocating and rising movement of the connecting rod 209 causes the swing arm 203 movably connected to the support arm 202 to move up and down. The up and down movement of the swing arm 203 causes the spray head 204 to swing and spray, thereby cleaning the silicon nitride ceramic substrate.

[0041] The above embodiments are merely one of the preferred embodiments of this utility model and should not be used to limit the scope of protection of this utility model. Any modifications or refinements made to the main design concept and spirit of this utility model that are not of substantial significance, but solve the same technical problem as this utility model, should be included within the scope of protection of this utility model.

Claims

1. A cleaning apparatus for a silicon nitride ceramic substrate, characterized by comprising: Include: The cleaning platform (100) includes a cleaning frame (101) and a limiting base (102), the cleaning frame (101) is provided with a cleaning assembly (200), the cleaning assembly (200) includes a connecting seat (201) mounted on the cleaning frame (101), the lower end of the connecting seat (201) is provided with a support arm (202), the support arm (202) is hinged to swing arm (203), one end of the swing arm (203) is connected with a spray shower head (204), and the end side of the connecting seat (201) is also provided with a reciprocating motor (207), the output end of the reciprocating motor (207) is provided with a lead screw (208), the lead screw (208) is sleeved with a fixed block, one end of the fixed block is movably connected with a connecting rod (209), and one end of the connecting rod (209) is also movably connected with the swing arm (203), the cleaning frame (101) is also provided with an adjusting assembly (300), the adjusting assembly (300) includes a fixed seat (303), the lower end of the fixed seat (303) is provided with a limiting block (304), the end side of the limiting block (304) is provided with a threaded rod (305), one end of the threaded rod (305) is also provided with a silica gel plate (306).

2. The cleaning apparatus for a silicon nitride ceramic substrate according to claim 1, wherein The cleaning frame (101) is also provided with a driving motor (301), the output end of the driving motor (301) is provided with an adjusting rod (302), and the adjusting rod (302) is connected with the fixed seat (303).

3. The cleaning apparatus for a silicon nitride ceramic substrate according to claim 2, wherein The cleaning frame (101) is also provided with a circulating assembly (400), the circulating assembly (400) includes a reflux box (402) mounted below the cleaning assembly (200), the reflux box (402) is also provided with a water pump (403) inside, the water pump (403) is connected with a circulating pipeline (401) through a pipe above, the circulating pipeline (401) is connected with the spray shower head (204) through a hose.

4. The cleaning apparatus for a silicon nitride ceramic substrate according to claim 3, wherein The reflux box (402) is also provided with a filter screen (404) inside, the filter screen (404) is provided with a sealing ring on the periphery, and the filter screen (404) is embedded into the reflux box (402).

5. The cleaning apparatus for a silicon nitride ceramic substrate according to claim 4, wherein The reflux box (402) is divided into two sides by the filter screen (404), and one side is also provided with a slope (405).

6. The cleaning apparatus for a silicon nitride ceramic substrate according to claim 3, wherein The cleaning frame (101) is also provided with a drying plate (500), and the drying plate (500) is installed on one end side of the cleaning assembly (200).

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