Cleaning machine for cleaning two sides of wafer

Abstract

The utility model discloses a cleaning machine for cleaning two sides of a wafer, which comprises a base, a cleaning box for cleaning the wafer is arranged right above the base, a storage box for cleaning liquid is fixedly arranged at the bottom end of the cleaning box, a cleaning component for cleaning the wafer is arranged in the cleaning box, and the cleaning component is fixedly arranged on the base. A mounting bottom plate is fixedly arranged at one end of the cleaning box, a driving motor is fixedly mounted at the top end of the mounting bottom plate, a driving rotating shaft is rotationally connected to the interior of the cleaning box, the driving rotating shaft penetrates through the cleaning box and is rotationally connected with the driving motor, and a cleaning assembly for intensively cleaning impurities is arranged in the cleaning box; according to the cleaning device, impurities can fall into the accumulation grooves due to the action of gravity when being cleaned to the accumulation grooves at the two ends of the filter screen plate through the cleaning assembly, and after cleaning is completed, a worker opens the locking door, so that the impurities accumulated in the accumulation grooves can be quickly cleaned through the cleaning holes; and the efficiency of rapidly cleaning impurities by workers is improved.

Description

Technical Field

[0001] This utility model relates to the field of wafer cleaning technology, specifically a cleaning machine for double-sided wafer cleaning. Background Technology

[0002] A wafer is a silicon wafer used in the fabrication of silicon semiconductor integrated circuits. It is called a wafer because of its circular shape. During the continuous processing and polishing of wafers, contaminants are generated due to contact with various organic substances, particles, and metals.

[0003] According to CN219335106U, a wafer double-sided cleaning machine includes a cleaning tank. A support base is fixedly connected to the lower end of the cleaning tank. Multiple support parts are fixedly connected at equal distances to both sides of the cleaning tank. Each support part has a limiting groove. Wafers are placed within the limiting grooves. Connecting cylinders are provided on both sides of each wafer. Drainage holes are provided on the opposite inner sides of each pair of connecting cylinders. A liquid supply mechanism is connected to each pair of connecting cylinders. A rotating mechanism is provided at the lower end of each wafer. This invention allows for simultaneous cleaning of both sides of the wafer, and the rotating mechanism rotates the wafer to clean different positions, ensuring both cleaning speed and cleaning effectiveness.

[0004] In the above-mentioned utility model, when cleaning wafers, the wafers inside the cleaning chamber are rotated by a motor, and the double sides of the wafers can be effectively cleaned through the evenly opened drainage holes of multiple sets of connecting cylinders. However, during the cleaning process, there will be residual impurities inside the cleaning chamber, which will accumulate in the cleaning chamber and cannot be cleaned in a concentrated manner. Utility Model Content

[0005] The purpose of this invention is to solve the problem that, in the above-mentioned invention, when cleaning wafers, the wafers inside the cleaning chamber are rotated by a motor and the double sides of the wafers can be effectively cleaned through the evenly spaced holes of multiple connecting cylinders. However, due to the accumulation of residual impurities inside the cleaning chamber during cleaning, these impurities cannot be cleaned in a concentrated manner. Therefore, this invention provides a cleaning machine for double-sided wafer cleaning.

[0006] To achieve the above objectives, this utility model provides the following technical solution: a wafer double-sided cleaning machine, comprising a base, a cleaning tank for cleaning the wafer is disposed on the top of the base, a storage tank for storing cleaning solution is fixedly installed at the bottom of the cleaning tank, a cleaning assembly for cleaning the wafer is disposed inside the cleaning tank, a mounting base plate is fixedly disposed at one end of the cleaning tank, and a drive motor is fixedly installed at the top of the mounting base plate, an active rotating shaft is rotatably connected inside the cleaning tank, and the active rotating shaft passes through the cleaning tank and is rotatably connected to the drive motor, and a cleaning assembly for centralized cleaning of impurities is disposed inside the cleaning tank, the cleaning assembly including a filter screen plate fixedly installed in the middle of the cleaning assembly and the storage tank. A sliding groove is symmetrically located above the filter screen, and an adjusting screw is rotatably connected to the inner side of the sliding groove. The adjusting screw passes through the cleaning box and is fixedly installed with a driven pulley. A driving shaft is fixedly installed on the outer periphery of the cleaning box and the middle of the drive motor with a driving pulley. A connecting belt is provided between the driving pulley and the driven pulley. A connecting plate that slides with the sliding groove and treats impurities on the surface of the filter screen is slidably connected inside the cleaning box. A cleaning brush is fixedly installed at the bottom of the connecting plate. Accumulation grooves for accumulating impurities are symmetrically located at both ends of the filter screen. Cleaning holes communicating with the accumulation grooves are symmetrically located at both ends of the cleaning box, and a locking door for sealing is rotatably connected to one end of the cleaning hole.

[0007] As a further embodiment of this utility model: a discharge valve is fixedly installed at the bottom of the storage tank, a raw liquid tank is fixedly installed at the top of the base, and a connecting pipe is connected between the raw liquid tank and the middle flange of the discharge valve.

[0008] As a further embodiment of this utility model: the top of the cleaning brush is fixedly provided with a card plate that is fixedly installed with the connecting plate, and the bottom end of the connecting plate is provided with a card groove that engages with the card plate. One end of the connecting plate is symmetrically provided with locking slots, and one end of the locking slots is rotatably connected to a locking rod for locking and fixing.

[0009] As a further improvement of this utility model: a sieving plate is slidably connected to the inside of the raw liquid tank and directly below the connecting pipe, and an inlet pipe is fixedly installed at the top of the raw liquid tank.

[0010] As a further improvement of this utility model: a pull-out handle is fixedly installed at one end of the screening plate, and the pull-out handle is also fixedly installed at one end of the locking door.

[0011] As a further embodiment of this utility model: the bottom end of the cleaning tank and the top end of the base are fixedly installed with support rods for support, and the support rods are symmetrically fixed in the middle of the cleaning tank and the base.

[0012] Compared with the prior art, the beneficial effects of this utility model are:

[0013] 1. This utility model can sweep impurities to the accumulation grooves at both ends of the filter screen through the cleaning component. The impurities will fall into the accumulation grooves due to gravity. When the cleaning is completed, the staff can open the locking door and quickly clean the impurities accumulated in the accumulation grooves through the cleaning hole, which increases the efficiency of the staff to clean impurities quickly.

[0014] 2. The filtered cleaning solution in the storage tank can be discharged through the drain valve and then discharged into the original solution tank through the connecting pipe for collection. The discharged original solution can be filtered a second time through the screening plate in the original solution tank to increase the cleanliness of the original solution. The drain valve, connecting pipe and original solution tank can increase the secondary use of the cleaning solution and reduce waste. Attached Figure Description

[0015] Figure 1 This is a schematic diagram of the overall structure of this utility model;

[0016] Figure 2 This is a side view of the cleaning box of this utility model;

[0017] Figure 3 This is a utility model Figure 2 A magnified schematic diagram of the partial structure at point A in the middle;

[0018] Figure 4 This is a cross-sectional structural diagram of the cleaning box of this utility model;

[0019] Figure 5 This is a utility model Figure 4 A magnified schematic diagram of the partial structure at point A in the middle;

[0020] Figure 6 This is a partial unfolded structural diagram of the connecting plate and cleaning brush of this utility model.

[0021] In the diagram: 1. Base; 2. Cleaning tank; 3. Storage tank; 4. Cleaning assembly; 5. Cleaning assembly; 51. Sliding groove; 52. Adjusting screw; 53. Drive pulley; 54. Driven pulley; 55. Connecting belt; 56. Filter screen; 57. Accumulation groove; 58. Cleaning hole; 59. Locking door; 510. Connecting plate; 511. Cleaning brush; 512. Clamping plate; 513. Clamping slot; 514. Locking slot hole; 515. Locking top rod; 6. Drive motor; 7. Mounting base plate; 8. Drive shaft; 9. Drain valve; 10. Raw material tank; 11. Connecting pipe; 12. Inlet pipe; 13. Screening plate; 14. Pull-out handle; 15. Support base rod. Detailed Implementation

[0022] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0023] In the description of this utility model, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicating the orientation or positional relationship, are based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance. In the description of this utility model, it should be noted that unless otherwise explicitly specified and limited, the terms "installation," "connection," "linking," and "setting" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances. The embodiments of this utility model will be described below based on its overall structure.

[0024] Reference Figure 1 and Figure 6In this embodiment of the present invention, a wafer double-sided cleaning machine includes a base 1, a cleaning tank 2 for cleaning the wafer is disposed on the top of the base 1, a storage tank 3 for storing cleaning solution is fixedly installed at the bottom of the cleaning tank 2, a cleaning assembly 4 for cleaning the wafer is disposed inside the cleaning tank 2, a mounting base plate 7 is fixedly disposed at one end of the cleaning tank 2, and a drive motor 6 is fixedly installed at the top of the mounting base plate 7, an active rotating shaft 8 is rotatably connected inside the cleaning tank 2, and the active rotating shaft 8 passes through the cleaning tank 2 and is rotatably connected to the drive motor 6, and a cleaning assembly 5 for centralized cleaning of impurities is disposed inside the cleaning tank 2, the cleaning assembly 5 including a filter screen plate 56 fixedly installed in the middle of the cleaning assembly 4 and the storage tank 3, and sliding grooves 5 symmetrically opened above the filter screen plate 56. 1. An adjusting screw 52 is rotatably connected to the inner side of the sliding groove 51. The adjusting screw 52 passes through the cleaning box 2 and is fixedly installed with a driven pulley 54. The driving shaft 8 is fixedly installed with a driving pulley 53 on the outer periphery of the cleaning box 2 and the middle of the drive motor 6. A connecting belt 55 is provided between the driving pulley 53 and the driven pulley 54. A connecting plate 510 is slidably connected inside the cleaning box 2 and slides with the sliding groove 51 to treat the impurities on the surface of the filter screen plate 56. A cleaning brush 511 is fixedly installed at the bottom of the connecting plate 510. The filter screen plate 56 has symmetrically opened accumulation grooves 57 for accumulating impurities at both ends. The cleaning box 2 has symmetrically opened cleaning holes 58 that communicate with the accumulation grooves 57 at both ends. One end of the cleaning hole 58 is rotatably connected to a locking door 59 for sealing.

[0025] Through the implementation of this method: During cleaning, the staff starts the connecting water pump, which extracts the cleaning solution from the raw solution tank 10 and delivers it to the water supply pipe at the top of the cleaning tank 2. The water supply pipe delivers the raw solution to the cleaning pipes on both sides of the wafer to clean the wafer. After cleaning, the impurities that fall off the wafer will fall onto the surface of the filter screen plate 56. Then, the cleaning component 5 will sweep away the remaining impurities on the surface of the filter screen plate 56 and sweep them to the accumulation grooves 57 at both ends of the filter screen plate 56. The impurities will fall into the accumulation grooves 57 due to gravity. When cleaning is completed, the staff opens the locking door 59 and can quickly clean the impurities accumulated in the accumulation grooves 57 through the cleaning hole 58, increasing the efficiency of the staff in quickly cleaning impurities.

[0026] Reference Figure 1 and Figure 6 A discharge valve 9 is fixedly installed at the bottom of the storage tank 3, and a raw liquid tank 10 is fixedly installed at the top of the base 1. A connecting pipe 11 is connected to the middle flange of the raw liquid tank 10 and the discharge valve 9. A sliding sieve plate 13 is slidably connected inside the raw liquid tank 10 and directly below the connecting pipe 11. An inlet pipe 12 is fixedly installed at the top of the raw liquid tank 10. A pull-out handle 14 is fixedly installed at one end of the sieve plate 13, and the pull-out handle 14 is also fixedly installed at one end of the locking door 59.

[0027] Through the implementation of this method: the filtered cleaning liquid in the storage tank 3 can be discharged through the discharge valve 9 and discharged into the raw liquid tank 10 through the connecting pipe 11 for collection. The discharged raw liquid can be filtered a second time through the screening plate 13 in the raw liquid tank 10 to increase the cleanliness of the raw liquid. The discharge valve 9, connecting pipe 11 and raw liquid tank 10 can increase the secondary use of the cleaning liquid and reduce waste.

[0028] Reference Figure 1 and Figure 6 The cleaning brush 511 has a card plate 512 fixedly installed at the top end and fixedly installed with the connecting plate 510. The bottom end of the connecting plate 510 has a card groove 513 that engages with the card plate 512. One end of the connecting plate 510 has a locking slot 514 symmetrically opened. One end of the locking slot 514 is rotatably connected to a locking rod 515 for locking and fixing.

[0029] By implementing this method, when the cleaning brush 511 is damaged after prolonged use, the staff can quickly replace the cleaning brush 511 using the card plate 512, card slot 513, locking rod 515, and locking slot 514.

[0030] Reference Figure 1 and Figure 6 The bottom of the cleaning tank 2 and the top of the base 1 are fixedly installed with support rods 15 for support, and the support rods 15 are symmetrically fixed in the middle of the cleaning tank 2 and the base 1.

[0031] The working principle of this utility model is as follows: When the operator places the wafer into the cleaning tank 2 and cleans it using the cleaning component 4, the impurities that fall off the wafer surface due to cleaning will fall onto the surface of the filter screen 56 due to gravity. At this time, the operator starts the drive motor 6 to drive the active rotating shaft 8 to rotate, which in turn drives the active pulley 53 to rotate. Through the connecting belt 55, the active pulley 53 also drives the driven pulley 54 to rotate. As the driven pulley 54 rotates, it drives the adjusting screw 52 inside the sliding groove 51 inside the cleaning tank 2 to rotate. At this time, the connecting plate 510 inside the sliding groove 51 slides inside the sliding groove 51 under the movement of the adjusting screw 52, ​​which in turn drives the cleaning brush 511 at the bottom to remove the residue on the surface of the filter screen 56. Impurities are swept away. When the impurities are swept to the accumulation tanks 57 at both ends of the filter screen plate 56, they will fall into the accumulation tanks 57 due to gravity. When the cleaning is completed, the staff can open the locking door 59 and quickly clean the impurities accumulated in the accumulation tanks 57 through the cleaning hole 58, increasing the efficiency of the staff to quickly clean the impurities. At the same time, when the cleaning is completed, the staff can open the drain valve 9 to discharge the filtered cleaning liquid in the storage tank 3 and discharge it to the original liquid tank 10 through the connecting pipe 11 for collection. The discharged original liquid can be filtered a second time through the screening plate 13 in the original liquid tank 10 to increase the cleanliness of the original liquid. The drain valve 9, connecting pipe 11 and original liquid tank 10 can increase the secondary use of the cleaning liquid and reduce waste.

[0032] The above description is only a preferred embodiment of the present utility model, but the protection scope of the present utility model is not limited thereto. Any equivalent substitutions or changes made by those skilled in the art within the technical scope disclosed in the present utility model, based on the technical solution and the inventive concept of the present utility model, should be included within the protection scope of the present utility model.

Claims

1. A cleaning machine for double-sided cleaning of wafers, characterized in that, The application relates to a wafer cleaning device, which comprises a base (1), a cleaning box (2) arranged above the base (1) and used for cleaning wafers, a storage box (3) fixedly installed at the bottom end of the cleaning box (2) and used for storing cleaning liquid, a cleaning assembly (4) arranged in the cleaning box (2) and used for cleaning wafers, an installation base plate (7) fixedly arranged at one end of the cleaning box (2), a driving motor (6) fixedly installed at the top end of the installation base plate (7), a driving shaft (8) rotatably connected in the cleaning box (2) and rotatably connected with the driving motor (6), a cleaning assembly (5) arranged in the cleaning box (2) and used for collecting and cleaning impurities, the cleaning assembly (5) comprising a filter screen plate (56) fixedly installed in the middle of the cleaning assembly (4) and the storage box (3), sliding grooves (51) symmetrically arranged above the filter screen plate (56), and an adjusting screw rod (52) rotatably connected to the inner side of the sliding grooves (51), the adjusting screw rod (52) penetrating through the cleaning box (2) and externally fixedly installed with a driven belt pulley (54), the driving shaft (8) fixedly installed with a driving belt pulley (53) at the outer periphery of the cleaning box (2) and in the middle of the driving motor (6), the driving belt pulley (53) and the driven belt pulley (54) being provided with a connecting belt (55) in the middle, a connecting plate (510) slidably connected in the cleaning box (2) and used for sliding with the sliding grooves (51) and treating the impurities on the surface of the filter screen plate (56), a cleaning brush (511) fixedly installed at the bottom end of the connecting plate (510), and accumulation grooves (57) symmetrically arranged at the two ends of the filter screen plate (56) and used for accumulating impurities, cleaning holes (58) symmetrically arranged at the two ends of the cleaning box (2) and communicated with the accumulation grooves (57), and a locking door (59) rotatably connected at one end of the cleaning holes (58) and used for sealing.

2. The cleaning machine for cleaning both surfaces of a wafer according to claim 1, wherein The storage box (3) is fixedly installed with a discharge valve (9) at the bottom end, the base (1) is fixedly installed with an original liquid tank (10) at the top end, and the original liquid tank (10) is flange-connected with a connecting pipe (11) in the middle of the discharge valve (9).

3. The cleaning machine for cleaning both surfaces of a wafer according to claim 1, wherein The cleaning brush (511) is fixedly provided with a clamping plate (512) at the top end and fixedly installed with the connecting plate (510), the connecting plate (510) is provided with a clamping groove (513) at the bottom end and clamped with the clamping plate (512), and the connecting plate (510) is symmetrically provided with a locking groove hole (514) at one end.

4. The cleaning machine for cleaning both surfaces of a wafer according to claim 2, wherein The original liquid tank (10) is slidably connected with a screening plate (13) at the inner side and below the connecting pipe (11), and the original liquid tank (10) is fixedly installed with an inlet pipe (12) at the top end.

5. The cleaning machine for cleaning both surfaces of a wafer according to claim 4, wherein The screening plate (13) is fixedly installed with a pull-out handle (14) at one end, and the pull-out handle (14) is also fixedly installed at one end of the locking door (59).

6. The cleaning machine for cleaning both surfaces of a wafer according to claim 1, wherein The cleaning box (2) is fixedly installed with a supporting bottom rod (15) at the bottom end and the top end of the base (1) and used for supporting, and the supporting bottom rod (15) is symmetrically fixedly arranged in the middle of the cleaning box (2) and the base (1).

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