Substrate immersion liquid taking tool and waterwheel
By designing a movable substrate structure and fixing method, the problem of easy contamination of artificially immersed substrates was solved, and a highly safe substrate immersion process was achieved.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-03-18
- Publication Date
- 2026-03-17
AI Technical Summary
Artificially immersed substrates are susceptible to contamination, and in existing technologies, it is difficult to avoid particulate contamination during substrate transfer.
A substrate immersion liquid handling tool was designed, including a first substrate and a second substrate that can move relative to each other in the vertical direction. The tool avoids direct contact with the solution during immersion and draining by a fixing structure. It achieves stable fixation by combining magnetic suction and elastic protrusions. Mesh holes and side wall openings are provided to facilitate the introduction and removal of the solution.
This improves the operational safety of substrate immersion and removal, avoids direct human contact with the solution, and ensures the cleanliness of the substrate during immersion and draining.
Smart Images
Figure CN224007060U_ABST
Abstract
Description
Technical Field
[0001] This application belongs to the field of silicon carbide substrate cleaning technology, and specifically relates to a substrate immersion solution taking tool and water truck. Background Technology
[0002] During semiconductor substrate manufacturing, the electrostatic repulsion between particles in water or reagents and the substrate is much greater than the van der Waals force, making it relatively difficult for particles to adhere to the substrate surface. However, as the substrate dries and the hydration layer and electrostatic forces gradually disappear, particles will adhere to the substrate surface, and the higher the degree of dryness, the stronger the adhesion. Furthermore, due to aging, particles adsorbed on the surface of substrates after prolonged drying and storage are difficult to remove even after subsequent immersion in water or washing with a scrubbing machine.
[0003] Currently, to avoid the difficulty in removing particles due to substrate drying, the transfer between different processes or equipment in the post-processing cleaning of semiconductor substrate wafers is often carried out by placing the substrate basket containing the substrate into a water truck to keep the substrate surface moist and thus improve the particle level of the final product. However, since the immersion process requires manual placement of the substrate basket into the solution, and then manual removal of the substrate basket to drain after a period of immersion, it is difficult for manual workers to avoid being contaminated by solution particles or metals with protective tools such as dust-free gloves.
[0004] Based on the above, the technical problem to be solved by this application is that artificial immersion substrates are easily contaminated. Utility Model Content
[0005] The purpose of this application is to address the aforementioned problems in the prior art by proposing a substrate immersion solution handling tool and water truck, which solves the problem of easy contamination of substrates in existing manual immersion solutions and improves the safety of substrate immersion solution handling.
[0006] The objective of this application can be achieved through the following technical solution: a substrate immersion liquid handling fixture, comprising: a first substrate, wherein the first substrate has a first cavity, and the first substrate has a first opening, the first opening communicating with the first cavity and being used to communicate with liquid in a water tank; a second substrate, wherein the second substrate has a degree of freedom of movement to enter or extend from the first cavity, the second substrate has a second cavity, the second cavity being used to accommodate a substrate basket, and the second substrate has a second opening, the second opening communicating with the second cavity; and a fixing structure, wherein the fixing structure is disposed between the first substrate and the second substrate, the fixing structure having a first state and a second state, wherein in the first state, the fixing structure restricts the relative movement of the first substrate and the second substrate in the vertical direction, and in the second state, the fixing structure releases the restriction on the relative movement of the first substrate and the second substrate in the vertical direction.
[0007] It is understood that by setting a first cavity within a first substrate and providing a first opening, when the first substrate is immersed in a waterwheel, the solution inside the waterwheel can enter the first cavity through the first opening. For example, the first substrate is box-shaped or cassette-shaped with an opening. A second substrate is movably disposed within the first cavity, and a second cavity is provided within the second substrate, providing a second opening. When the second substrate moves downwards and is immersed in the waterwheel, the solution inside the waterwheel can enter the second cavity through the second opening. The second cavity can accommodate a substrate basket, thereby achieving substrate immersion. During immersion, the second substrate can slowly enter the first cavity of the first substrate from top to bottom, providing a buffer time. Manually grasping the second substrate avoids direct contact with the solution and contamination. Similarly, after immersion, the second substrate is manually grasped and raised to a certain position vertically on the first substrate. A fixing structure maintains the second substrate at an appropriate height, defined as above the surface of the solution in the waterwheel, allowing it to be removed from the solution in the waterwheel for draining. The entire substrate immersion and handling process has high operational safety.
[0008] In the aforementioned substrate immersion tooling, the fixing structure includes: a first latching member disposed on the top of the first substrate; and a second latching member disposed on the bottom of the second substrate. In the first state, the second latching member is latched with the first latching member; in the second state, the second latching member is disengaged from the first latching member. It can be understood that by placing the first latching member on the top of the first substrate and the second latching member on the bottom of the second substrate, when the second latching member moves with the second substrate to a position near the top of the first substrate, the second latching member can latch with the first latching member, thereby fixing it at that height position, thus facilitating the substrate's removal from the solution surface for draining.
[0009] In the aforementioned substrate immersion tooling, the first locking element is a groove, and the second locking element is an elastic protrusion. In the first state, the elastic protrusion extends into the groove for locking; in the second state, the elastic protrusion disengages from the groove. It can be understood that in the first state, the elastic protrusion abuts against the inner wall of the first substrate and remains contracted. When the elastic protrusion rises with the second substrate to the vicinity of the first locking element at the top of the first substrate, the elastic protrusion can extend horizontally and enter the groove to achieve locking. For example, the end of the elastic protrusion is an arc-shaped guide portion, which facilitates compression and contraction by the inner wall of the first substrate during downward movement.
[0010] In the aforementioned substrate immersion solution handling fixture, the fixing structure includes: a first magnetic suction member disposed on the top of the first substrate; and a second magnetic suction member disposed on a fixed portion of the second substrate. In a first state, the second magnetic suction member is magnetically connected to the first magnetic suction member; in a second state, the second magnetic suction member is detached from the first magnetic suction member. It can be understood that the first substrate and the second substrate are fixed by the adsorption connection between the first and second magnetic suction members. For example, the first and second magnetic suction members can be configured as magnets or electromagnets. When the second magnetic suction member moves with the second substrate to the vicinity of the first magnetic suction member, it can be magnetically attracted and fixed. The adsorption force between the two needs to be configured to be greater than the weight of the second substrate to maintain stability.
[0011] In the aforementioned substrate immersion liquid handling fixture, both the first magnetic attractor and the second magnetic attractor are magnetic strips. Multiple first magnetic attractors are arranged symmetrically around the center of the second substrate, and the number of second magnetic attractors matches the number of first magnetic attractors. For example, two sets of first and second magnetic attractors arranged symmetrically around the center of the second substrate are provided to improve the stability of the fixation between the second substrate and the first substrate, preventing the second substrate from detaching during the draining process.
[0012] In the aforementioned substrate immersion solution handling fixture, the bottom of the second substrate is provided with multiple mesh openings, which communicate with both the first cavity and the second cavity. It is understood that by providing multiple mesh openings at the bottom of the second substrate, the water-cooled solution can be quickly introduced to wet the substrate within the second cavity.
[0013] In the aforementioned substrate immersion solution handling fixture, the second opening is disposed on the sidewall of the second substrate. In the second state, the second opening tends to communicate with the first opening. It can be understood that by opening a second opening on the sidewall of the second substrate, when the second substrate falls into the first cavity, the second opening can communicate with the first opening, thereby allowing the water-cooled solution to be quickly introduced into the second cavity.
[0014] In the aforementioned substrate immersion fixture, the second substrate is provided with a gripping part, which can be gripped manually or by a robotic arm. A gripping gap is provided between the gripping part and the first substrate to allow for gripping clearance. For example, the gripping part can be configured as a groove or a handle to facilitate hooking or clamping by the gripping mechanism. By setting the gripping gap, interference between the operator or robotic arm and the first substrate can be avoided, thereby reducing the difficulty of gripping.
[0015] In the aforementioned substrate immersion tooling, the height of the second substrate is higher than the height of the first cavity, and in the second state, the gripping part always protrudes from the first cavity. It is understood that by configuring the height of the second substrate to be higher than the first cavity, it facilitates manual or robotic gripping of the gripping part.
[0016] Another object of this application is to provide a water truck, including the substrate immersion liquid handling fixture described above. It is understood that by applying the substrate immersion liquid handling fixture of this application to a water truck, operational safety can be improved.
[0017] Compared with the prior art, this application has the following beneficial effects:
[0018] 1. This application sets up a first substrate and a second substrate that can move relatively vertically. The second substrate can be grasped and placed into the first cavity to avoid direct contact with the solution and contamination. After the immersion is completed, the second substrate is grasped and raised to a certain position in the vertical direction of the first substrate. The second substrate is maintained at an appropriate height by a fixing structure, so that it can be removed from the water tank solution for draining. The entire process of immersion and use of the substrate has high operational safety.
[0019] 2. This application provides multiple mesh openings at the bottom of the second substrate to facilitate the rapid entry of the water jet solution to wet the substrate within the second cavity;
[0020] 3. This application provides a second opening on the side wall of the second substrate. When the second substrate falls into the first cavity, the second opening can communicate with the first opening, thereby allowing the waterwheel solution to be quickly introduced into the second cavity. Attached Figure Description
[0021] Figure 1 This is a three-dimensional structural diagram of the substrate immersion solution removal tool in the first state of this application;
[0022] Figure 2 This is a three-dimensional structural diagram of the substrate immersion solution removal tool in the second state of this application;
[0023] Figure 3 This is a schematic diagram of the structure of the first embodiment of the first substrate of this application;
[0024] Figure 4 This is a schematic diagram of the structure of the first embodiment of the second substrate of this application;
[0025] Figure 5 This is a schematic diagram of the structure of the second embodiment of the first substrate of this application;
[0026] Figure 6 This is a schematic diagram of the structure of the second embodiment of the second substrate of this application;
[0027] In the figure, 100 is the first substrate; 110 is the first cavity; 120 is the first opening; 200 is the second substrate; 210 is the second cavity; 220 is the second opening; 230 is the mesh; 240 is the gripping part; J is the gripping gap; 300 is the fixing structure; 310a is the first snap-fit component; 320a is the second snap-fit component; 310b is the first magnetic component; 320b is the second magnetic component. Detailed Implementation
[0028] To make the above-mentioned objectives, features, and advantages of this application more apparent and understandable, the specific embodiments of this application are described in detail below with reference to the accompanying drawings. Many specific details are set forth in the following description to provide a thorough understanding of this application. However, this application can be implemented in many other ways different from those described herein, and those skilled in the art can make similar modifications without departing from the spirit of this application. Therefore, this application is not limited to the specific embodiments disclosed below.
[0029] In the description of this application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc., indicating the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this application.
[0030] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one of that feature. In the description of this application, "multiple" means at least two, such as two, three, etc., unless otherwise explicitly specified.
[0031] In this application, unless otherwise expressly specified and limited, the terms "installation," "connection," "joining," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components, unless otherwise expressly limited. Those skilled in the art can understand the specific meaning of the above terms in this application according to the specific circumstances.
[0032] In this application, unless otherwise expressly specified and limited, "above" or "below" the second feature can mean that the first feature is in direct contact with the second feature, or that the first feature is in indirect contact with the second feature through an intermediate medium. Furthermore, "above," "on top of," and "over" the second feature can mean that the first feature is directly above or diagonally above the second feature, or simply that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature can mean that the first feature is directly below or diagonally below the second feature, or simply that the first feature is at a lower horizontal level than the second feature.
[0033] It should be noted that when an element is referred to as being "fixed to" or "set on" another element, it can be directly on the other element or there may be an intervening element. When an element is considered to be "connected to" another element, it can be directly connected to the other element or there may be an intervening element. The terms "vertical," "horizontal," "upper," "lower," "left," "right," and similar expressions used herein are for illustrative purposes only and do not represent the only possible implementation.
[0034] Please refer to the attached diagram in the instruction manual. Figure 1 and Figure 2 The substrate immersion tooling of this application includes a first substrate 100, a second substrate 200, and a fixing structure 300. The first base 100 has a first cavity 110 inside and a first opening 120 on the first base 100, which communicates with the first cavity 110 and is used to communicate with the liquid inside the waterwheel. The second base 200 has the freedom of movement to enter or exit the first cavity 110. The second base 200 has a second cavity 210 inside and is used to accommodate the substrate basket. The second base 200 has a second opening 220 on it, which communicates with the second cavity 210. A fixing structure 300 is disposed between the first base 100 and the second base 200. The fixing structure 300 has a first state and a second state. In the first state, the fixing structure 300 restricts the first base 100 and the second base 200 from moving relative to each other in the vertical direction. In the second state, the fixing structure 300 releases the restriction on the first base 100 and the second base 200 from moving relative to each other in the vertical direction.
[0035] It is understood that by providing a first cavity 110 within the first substrate 100 and opening a first opening 120, when the first substrate 100 is immersed in the waterwheel, the solution inside the waterwheel can enter the first cavity 110 through the first opening 120. For example, the first substrate 100 is in the shape of a box or container with an opening. A second substrate 200 is movably disposed within the first cavity 110. A second cavity 210 is disposed within the second substrate 200, and a second opening 220 is formed therein. Thus, when the second substrate 200 moves downwards and is immersed in the water tank, the solution inside the water tank can enter the second cavity 210 through the second opening 220. The second cavity 210 can accommodate a substrate basket, thereby achieving substrate immersion. During immersion, the second substrate 200 can slowly enter the first cavity 110 of the first substrate 100 from top to bottom, providing a buffer time. Manually grasping the second substrate 200 avoids direct contact with the solution and contamination. Similarly, after immersion, the second substrate 200 is manually grasped and raised to a certain position in the vertical direction of the first substrate 100. A fixing structure 300 maintains the second substrate 200 at an appropriate height, defined as above the upper surface of the solution in the water tank, thereby removing it from the solution inside the water tank for draining. The entire substrate immersion and handling process has high operational safety.
[0036] See Figure 1 , Figure 3 as well as Figure 4 In some embodiments, the fixing structure 300 includes a first latching member 310a and a second latching member 320a. The first latching member 310a is disposed on the top of the first substrate 100, and the second latching member 320a is disposed on the bottom of the second substrate 200. In a first state, the second latching member 320a is latched with the first latching member 310a; in a second state, the second latching member 320a is disengaged from the first latching member 310a. It can be understood that by disposing of the first latching member 310a on the top of the first substrate 100 and the second latching member 320a on the bottom of the second substrate 200, when the second latching member 320a moves with the second substrate 200 to a position near the top of the first substrate 100, the second latching member 320a can latch with the first latching member 310a, thereby fixing it at that height position, thus facilitating the substrate to detach from the liquid surface of the solution and drain.
[0037] In some embodiments, the first engaging member 310a is a groove, and the second engaging member 320a is an elastic protrusion. In a first state, the elastic protrusion extends into the groove and engages; in a second state, the elastic protrusion disengages from the groove. It is understood that in the first state, the elastic protrusion abuts against the inner wall of the first base 100 and remains contracted. When the elastic protrusion rises with the second base 200 to near the first engaging member 310a at the top of the first base 100, the elastic protrusion can extend horizontally and enter the groove to engage. Exemplarily, the end of the elastic protrusion is an arc-shaped guide portion, which facilitates compression and contraction by the inner wall of the first base 100 during downward movement.
[0038] See Figure 1 , Figure 5 as well as Figure 6 In some embodiments, the fixing structure 300 includes a first magnetic attractor 310b and a second magnetic attractor 320b. The first magnetic attractor 310b is disposed on the top of the first base 100, and the second magnetic attractor 320b is disposed on the fixed part of the second base 200. In a first state, the second magnetic attractor 320b is magnetically connected to the first magnetic attractor 310b; in a second state, the second magnetic attractor 320b is detached from the first magnetic attractor 310b. It can be understood that the fixation of the first base 100 and the second base 200 is achieved through the adsorption connection between the first magnetic attractor 310b and the second magnetic attractor 320b. For example, the first magnetic attractor 310b and the second magnetic attractor 320b can be configured as magnets or electromagnets. When the second magnetic attractor 320b moves with the second base 200 to the vicinity of the first magnetic attractor 310b, it can be magnetically attracted to complete the fixation. The adsorption force between the two needs to be configured to be greater than the gravity of the second base 200 to maintain stability.
[0039] In some embodiments, both the first magnetic attractor 310b and the second magnetic attractor 320b are magnetic strips. Multiple first magnetic attractors 310b are arranged symmetrically around the center of the second substrate 200, and the number of second magnetic attractors 320b matches the number of first magnetic attractors 310b. For example, providing two sets of first magnetic attractors 310b and second magnetic attractors 320b symmetrically arranged around the center of the second substrate 200 improves the stability of the fixation between the second substrate 200 and the first substrate 100, preventing the second substrate 200 from detaching during the draining process.
[0040] In some embodiments, the bottom of the second substrate 200 is provided with a plurality of mesh openings 230, which communicate with the first cavity 110 and the second cavity 210 respectively. It is understood that by providing a plurality of mesh openings 230 at the bottom of the second substrate 200, the water-cooled solution can be quickly introduced to wet the substrate in the second cavity 210.
[0041] In some embodiments, the second opening 220 is disposed on the sidewall of the second base 200, and in a second state, the second opening 220 tends to communicate with the first opening 120. It is understood that by opening the second opening 220 on the sidewall of the second base 200, when the second base 200 falls into the first cavity 110, the second opening 220 and the first opening 120 can communicate, thereby allowing the water-cooled solution to be quickly introduced into the second cavity 210.
[0042] In some embodiments, the second base 200 is provided with a gripping part 240, which can be gripped manually or by a robotic arm. A gripping gap J is provided between the gripping part 240 and the first base 100 for gripping clearance. For example, the gripping part 240 can be configured as a groove or a handle to facilitate hooking or clamping by the gripping mechanism. By setting the gripping gap J, interference between the operator or robotic arm and the first base 100 can be avoided, thereby reducing the difficulty of gripping.
[0043] In some embodiments, the height of the second base 200 is higher than the height of the first cavity 110, and in the second state, the gripping part 240 always protrudes from the first cavity 110. It is understood that by configuring the height of the second base 200 to be higher than the first cavity 110, it is easier for a person or a robot to grip the gripping part 240.
[0044] The water truck of this application (not shown) includes the substrate immersion liquid handling tool of this application. It is understood that by applying the substrate immersion liquid handling tool of this application to the water truck, operational safety can be improved.
[0045] Beneficial effects:
[0046] This application, by setting up a first substrate 100 and a second substrate 200 that can move vertically relative to each other, avoids direct contact with the solution and contamination when the second substrate 200 is grasped and placed into the first cavity 110. After immersion, the second substrate 200 is grasped and raised to a certain position in the vertical direction of the first substrate 100, and the second substrate 200 is maintained at an appropriate height by the fixing structure 300, thereby removing it from the waterwheel solution for draining. The entire process of substrate immersion and handling has high operational safety. By setting multiple mesh holes 230 at the bottom of the second substrate 200, the waterwheel solution can be quickly introduced to wet the substrate in the second cavity 210. By opening a second opening 220 on the side wall of the second substrate 200, when the second substrate 200 falls into the first cavity 110, the second opening 220 can communicate with the first opening 120, thereby allowing the waterwheel solution to be quickly introduced into the second cavity 210.
[0047] The specific embodiments described herein are merely illustrative examples of the spirit of this application. Those skilled in the art to which this application pertains may make various modifications or additions to the described specific embodiments or use similar methods to substitute them, without departing from the spirit of this application or exceeding the scope defined by the appended claims.
Claims
1. A substrate immersion access tool, comprising: The utility model relates to a water wheel, which comprises: a first base (100) having a first cavity (110) formed therein, a first opening (120) formed on the first base (100) and communicating with the first cavity (110), and the first opening (120) being configured to communicate with a liquid in the water wheel; a second base (200) having a freedom of movement into or out of the first cavity (110), a second cavity (210) formed in the second base (200) and configured to accommodate a substrate basket, a second opening (220) formed on the second base (200) and communicating with the second cavity (210); and a fixing structure (300) disposed between the first base (100) and the second base (200), the fixing structure (300) having a first state and a second state, in the first state, the fixing structure (300) limits the relative movement of the first base (100) and the second base (200) in the vertical direction, and in the second state, the fixing structure (300) releases the limitation of the relative movement of the first base (100) and the second base (200) in the vertical direction.
2. The substrate immersion access tool of claim 1, wherein, The fixing structure (300) comprises: a first clamping member (310a) disposed on the top of the first base (100); a second clamping member (320a) disposed on the bottom of the second base (200), in the first state, the second clamping member (320a) is clamped with the first clamping member (310a), and in the second state, the second clamping member (320a) is separated from the first clamping member (310a).
3. The substrate immersion access tool of claim 2, wherein, The first clamping member (310a) is a groove, and the second clamping member (320a) is an elastic protrusion, in the first state, the elastic protrusion is clamped into the groove, and in the second state, the elastic protrusion is separated from the groove.
4. The substrate immersion access tool of claim 1, wherein, The fixing structure (300) comprises: a first magnetic member (310b) disposed on the top of the first base (100); a second magnetic member (320b) disposed on the bottom of the second base (200), in the first state, the second magnetic member (320b) is magnetically connected with the first magnetic member (310b), and in the second state, the second magnetic member (320b) is separated from the first magnetic member (310b).
5. The substrate fluid access tooling of claim 4, wherein, The first magnetic member (310b) and the second magnetic member (320b) are both magnetic strips, the first magnetic member (310b) is a plurality of and respectively disposed in the center of the second base (200) in a symmetrical manner, and the number of the second magnetic member (320b) matches that of the first magnetic member (310b).
6. The substrate immersion access tool of claim 1, wherein, The second base (200) is provided with a plurality of mesh holes (230) respectively communicating with the first cavity (110) and the second cavity (210).
7. The substrate immersion access tool of claim 1, wherein, The second opening (220) is arranged on the sidewall of the second base (200), and in the second state, the second opening (220) has a tendency to communicate with the first opening (120).
8. The substrate immersion access tool of claim 1, wherein, The second base (200) is provided with a grabbing part (240) which can be grabbed by a hand or a mechanical hand, and the grabbing part (240) and the first base (100) are provided with a grabbing gap (J) for grabbing and giving way.
9. The substrate fluid access tooling of claim 8, wherein, The height of the second base (200) is higher than the height of the first cavity (110), and in the second state, the grabbing part (240) is always protruding from the first cavity (110).
10. A water wheel characterized by, The substrate immersion tool comprises the substrate immersion tool as claimed in any one of claims 1-9.