Heating control device for chemical vapor deposition
By installing a chamber between the pyrolysis chamber and the coating chamber, and utilizing dry ice cooling pipes and humidification equipment, the problem of excessively high gas temperature leading to slow flow rate was solved, thereby increasing the gas flow rate and extending the pipeline life.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-04-07
- Publication Date
- 2026-03-20
AI Technical Summary
In existing technologies, excessively high gas temperatures lead to slow flow rates, affecting gas flow efficiency, increasing pipeline pressure, and reducing pipeline lifespan.
A chamber is set between the pyrolysis chamber and the coating chamber. The chamber is equipped with cooling and humidification equipment, including cooling pipes and humidification pipes. The gas flow rate and efficiency are improved by cooling with dry ice, cooling with distilled water, and humidifying with cotton cloth.
By using cooling and humidification treatments within the chamber, the gas flow rate is significantly improved, processing efficiency is enhanced, and the service life of the pipeline is extended.
Smart Images

Figure CN224015774U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of chemical vapor deposition technology, and in particular to a heating control device for chemical vapor deposition. Background Technology
[0002] Chemical vapor deposition is a chemical technology that uses one or more gaseous compounds or elements containing thin film elements to chemically react on a substrate surface to generate a thin film.
[0003] According to CN207828409U, a heating control device for chemical vapor deposition includes an evaporation chamber, a pyrolysis chamber, a coating chamber, and a vacuum system, which are sequentially connected by pipes. The gas processing operation is achieved through the cooperation of the evaporation chamber, pyrolysis chamber, coating chamber, and vacuum system, and uniform processing is achieved through multiple grids. However, in the aforementioned document, when the gas enters the coating chamber through the pyrolysis chamber, the excessively high gas temperature causes the gas flow velocity within the pipes to be too slow, resulting in a slow and insufficiently concentrated gas flow. Simultaneously, the increasing gas temperature causes a gradual increase in the overall pressure within the pipes, affecting not only the efficiency of the gas flow rate but also reducing the service life of the pipes. Utility Model Content
[0004] The purpose of this invention is to solve the problem of excessively high gas temperature leading to excessively slow flow rate in the prior art, and to propose a heating control device for chemical vapor deposition.
[0005] To achieve the above objectives, the present invention adopts the following technical solution:
[0006] A heating control device for chemical vapor deposition includes an evaporation chamber, a pyrolysis chamber, a coating chamber, and a vacuum system. The pyrolysis chamber and the coating chamber are connected by a box for cooling the gas. A partition is fixedly installed inside the box, and the box is divided into a cooling chamber and a humidification chamber by the partition. The cooling chamber is equipped with a cooling device for cooling the gas, and the humidification chamber is equipped with a humidification device for cooling the gas.
[0007] Preferably, the cooling device includes a sealing frame fixedly installed in the cooling chamber, and a cooling pipe for conveying gas flow is fixedly installed in the sealing frame, and a dry ice layer for cooling the cooling pipe is laid in the sealing frame.
[0008] Preferably, the sealing frame is provided with an opening and closing port, the cooling pipe is fixedly provided with a sleeve, and the sleeve is provided with a water inlet pipe and an air inlet pipe which are connected and used for conveying distilled water and airflow, the sleeve is provided with an atomizing nozzle corresponding to the cooling pipe, a pressure applying cylinder is slidably arranged in the sleeve and matched with the water inlet pipe, the pressure applying cylinder is fixedly provided with a moving rod, and the moving rod is fixedly provided with a moving plate, and the moving plate and the sleeve are welded with a spring matched with the moving rod.
[0009] Preferably, the pressure applying cylinder is provided with a through hole for unidirectional conveying of distilled water, the moving plate and the moving rod extend to one side position outside the sleeve, the spring is sleeved on the moving rod, and the sleeve, the water inlet pipe and the air inlet pipe are provided with unidirectional valves.
[0010] Preferably, the box body is fixedly provided with a motor, and the motor is fixedly connected with a rotating shaft in transmission connection with the moving plate, the rotating shaft is horizontally arranged, and the rotating shaft is fixedly provided with an eccentric wheel in movable abutment with the moving plate.
[0011] Preferably, the humidifying device comprises a water tank and an atomizing pipe fixedly arranged on the box body, and the humidifying cavity is provided with cotton cloth corresponding to the atomizing pipe and used for humidifying the gas.
[0012] Compared with the prior art, the utility model has the following advantages:
[0013] 1. The box body is arranged between the cracking chamber and the coating cavity, and the gas entering the coating cavity can be cooled by the box body, so that the flow speed of the gas is improved.
[0014] 2. The dry ice layer and the cooling pipe are matched to preliminarily cool the gas, the intermittent movement of the moving plate enables the distilled water to intermittently cool the gas, the gas passes through the cotton cloth to be humidified, and the efficiency of the gas processing is further improved. BRIEF DESCRIPTION OF DRAWINGS
[0015] Figure 1 The box body is arranged between the cracking chamber and the coating cavity, and the gas entering the coating cavity can be cooled by the box body, so that the flow speed of the gas is improved.
[0016] Figure 2 The box body is arranged between the cracking chamber and the coating cavity, and the gas entering the coating cavity can be cooled by the box body, so that the flow speed of the gas is improved.
[0017] Figure 3 The box body is arranged between the cracking chamber and the coating cavity, and the gas entering the coating cavity can be cooled by the box body, so that the flow speed of the gas is improved.
[0018] Figure 4 The box body is arranged between the cracking chamber and the coating cavity, and the gas entering the coating cavity can be cooled by the box body, so that the flow speed of the gas is improved.
[0019] Fig. 1, box; 2, partition; 3, sealing frame; 4, cooling pipe; 5, dry ice layer; 6, atomizing pipe; 7, cotton cloth; 8, sleeve; 9, atomizing nozzle; 10, water inlet pipe; 11, air inlet pipe; 12, pressure cylinder; 13, through hole; 14, moving rod; 15, moving plate; 16, spring; 17, motor; 18, rotating shaft; 19, eccentric wheel. DETAILED DESCRIPTION
[0020] The technical solutions in the embodiments of the utility model will be clearly and completely described below with reference to the drawings in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, rather than all the embodiments.
[0021] Referring to Figures 1-4 A heating control device for chemical vapor deposition, comprising an evaporation chamber, a cracking chamber, a coating chamber and a vacuum system, a box 1 for cooling gas is connected between the cracking chamber and the coating chamber, a partition 2 is fixedly installed in the box 1, the box 1 is divided into a cooling cavity and a humidifying cavity by the partition 2, a cooling device for cooling gas is arranged in the cooling cavity, and a humidifying device for cooling gas is arranged in the humidifying cavity.
[0022] According to the description Figure 3 As shown in the drawings, the cooling device comprises a sealing frame 3 fixedly installed in the cooling cavity, and a cooling pipe 4 for conveying the flow direction of the gas is fixedly installed in the sealing frame 3, the S-shaped structure of the cooling pipe 4 can increase the contact degree with the dry ice layer 5, and the dry ice layer 5 for cooling the cooling pipe 4 is laid in the sealing frame 3.
[0023] A opening and closing port is installed on the sealing frame 3 through a shaft, the dry ice can be laid in the sealing frame 3 by opening the opening and closing port, a sleeve 8 is fixedly installed on the cooling pipe 4, and a water inlet pipe 10 and an air inlet pipe 11 connected in communication and conveying distilled water and airflow are installed on the sleeve 8, and an atomizing nozzle 9 corresponding to the cooling pipe 4 is arranged on the sleeve 8.
[0024] A pressure cylinder 12 matched with the water inlet pipe 10 is slidably sleeved in the sleeve 8, the pressure cylinder 12 is fixedly installed with a moving rod 14, the moving rod 14 is fixedly installed with a moving plate 15, the spring 16 matched with the moving rod 14 is welded between the moving plate 15 and the sleeve 8, the sleeve 8 realizes the guiding effect of the moving rod 14, so that the moving rod 14 can smoothly pull the moving plate 15 when moving, and the spring 16 realizes the resetting effect of the pressure cylinder 12, so that when the moving plate 15 is in an idle state, the spring 16 can drive the pressure cylinder 12 and the moving plate 15 to return to the initial position.
[0025] The pressure cylinder 12 is provided with a through hole 13 for unidirectional delivery of distilled water, the moving plate 15 and the moving rod 14 extend to one side of the sleeve 8, the spring 16 is sleeved on the moving rod 14, the sleeve 8, the water inlet pipe 10 and the air inlet pipe 11 are provided with unidirectional valves, and the unidirectional valves arranged in the sleeve 8, the water inlet pipe 10 and the air inlet pipe 11 can limit the flow direction of distilled water and air flow.
[0026] The motor 17 is fixedly installed on the box body 1, and the output end of the motor 17 is fixedly connected with a rotating shaft 18 in transmission connection with the moving plate 15, the rotating shaft 18 is horizontally arranged, and the eccentric wheel 19 in movable abutment with the moving plate 15 is fixedly installed on the rotating shaft 18; the motor 17 is electrified to drive the rotating shaft 18 to rotate, so that the eccentric wheel 19 can intermittently abut against the moving plate 15 when rotating, so that the distilled water can be sprayed into the cooling pipe 4 through the atomizing nozzle 9, and then the flowing gas can be cooled.
[0027] The humidifying device comprises a water tank and an atomizing pipe 6 fixedly installed on the box body 1, and the humidifying cavity is paved with cotton cloth 7 corresponding to the atomizing pipe 6 and humidifying the gas. Figure 1 As shown in the description and drawings, the multi-layer cotton cloth 7 can humidify the flowing water, and the atomized water sprayed from the atomizing pipe 6 can humidify the water, so that the increase of pressure caused by the too high temperature of the water can be avoided.
[0028] The function principle of the utility model can be described as follows:
[0029] The gas enters the box body 1 after being processed in the cracking chamber;
[0030] After the gas enters the cooling pipe 4 through the box body 1, the temperature of the gas is dissipated to the cooling pipe 4, and the dry ice layer 5 can cool the cooling pipe 4, so that the gas entering the cooling pipe 4 can be preliminarily cooled;
[0031] At the same time, the output end of the motor 17 drives the rotating shaft 18 to rotate, the rotating shaft 18 drives the eccentric wheel 19 to intermittently abut against the moving plate 15, the moving plate 15 drives the moving rod 14 and the pressure cylinder 12 to slide in the sleeve 8, the spring 16 is stressed, the through hole 13 and the water inlet pipe 10 correspond to each other when the pressure cylinder 12 slides in the sleeve 8, the gas enters the bottom of the sleeve 8, the air flow enters the sleeve 8 through the air inlet pipe 11, the through hole 13 and the water inlet pipe 10 are staggered by the continuous movement of the pressure cylinder 12, the pressure cylinder 12 is continuously extruded and pressurizes the distilled water, the distilled water enters the cooling pipe 4 through the atomizing nozzle 9, and then the air flow in the cooling pipe 4 is intermittently cooled;
[0032] After the gas is cooled, the water tank is opened to make the water sprayed through the atomizing pipe 6, the atomized water first humidifies the gas, and the cotton cloth 7 can atomize and humidify the flowing gas with the continuous spraying of the atomized water.
[0033] The gas is humidified and then enters a coating chamber for further processing.
[0034] The above merely describes a preferred embodiment of the present application, but the protection scope of the present application is not limited thereto, and any skilled person in the art can make equivalent substitutions or changes according to the technical scheme and the inventive concept of the present application within the technical range disclosed by the present application, which should be covered by the protection scope of the present application.
Claims
1. A heating control device for chemical vapor deposition, comprising an evaporation chamber, a pyrolysis chamber, a coating chamber, and a vacuum system, characterized in that, The pyrolysis chamber and the coating chamber are connected by a box (1) for cooling the gas. A partition (2) is fixedly installed inside the box (1). The box (1) is divided into a cooling chamber and a humidification chamber by the partition (2). A cooling device for cooling the gas is installed in the cooling chamber, and a humidification device for cooling the gas is installed in the humidification chamber.
2. The heating control device for chemical vapor deposition according to claim 1, characterized in that, The cooling device includes a sealing frame (3) fixedly installed in the cooling chamber, and a cooling pipe (4) for conveying gas flow is fixedly installed in the sealing frame (3). A dry ice layer (5) for cooling the cooling pipe (4) is laid in the sealing frame (3).
3. The heating control device for chemical vapor deposition according to claim 2, characterized in that, The sealing frame (3) is equipped with an opening and closing port on the pin shaft. The cooling pipe (4) is fixedly installed with a sleeve (8). The sleeve (8) is equipped with a water inlet pipe (10) and an air inlet pipe (11) that are connected and transport distilled water and airflow. The sleeve (8) is provided with an atomizing nozzle (9) corresponding to the cooling pipe (4). The sleeve (8) is slidably fitted with a pressure cylinder (12) that cooperates with the water inlet pipe (10). The pressure cylinder (12) is fixedly installed with a moving rod (14). The moving rod (14) is fixedly installed with a moving plate (15). The moving plate (15) and the sleeve (8) are welded together with a spring (16) that cooperates with the moving rod (14).
4. The heating control device for chemical vapor deposition according to claim 3, characterized in that, The pressure cylinder (12) has a through hole (13) for unidirectional delivery of distilled water. The moving plate (15) and the moving rod (14) extend to one side outside the sleeve (8). The spring (16) is sleeved on the moving rod (14). The sleeve (8), the water inlet pipe (10) and the air inlet pipe (11) are equipped with one-way valves.
5. The heating control device for chemical vapor deposition according to claim 3, characterized in that, A motor (17) is fixedly installed on the housing (1), and the output end of the motor (17) is fixedly connected to a rotating shaft (18) that is connected to the moving plate (15) for transmission. The rotating shaft (18) is horizontally arranged, and an eccentric wheel (19) that moves against the moving plate (15) is fixedly installed on the rotating shaft (18).
6. The heating control device for chemical vapor deposition according to claim 1, characterized in that, The humidification device includes a water tank and an atomizing tube (6) fixedly installed on the housing (1), and a cotton cloth (7) corresponding to the atomizing tube (6) and used to humidify the gas is laid in the humidification chamber.
Citation Information
Patent Citations
Chemical vapor deposition's heating control device
CN207828409U