Suction disc of spin coater and spin coater

Abstract

The utility model discloses a spin coater adsorption disc and a spin coater, and particularly relates to the technical field of photoetching, the spin coater adsorption disc comprises an adsorption table and a baffle disc, the adsorption table is fixedly connected with the top surface of the baffle disc, the center line of the adsorption table and the center line of the baffle disc are collinear, the top surface of the adsorption table is provided with an adsorption air channel, and the baffle disc is provided with four positioning lines. And the four positioning lines uniformly surround the adsorption table. According to the utility model, accurate positioning can be realized in the sample adsorption process, the operation accuracy is ensured, the working efficiency is improved, photoresist can be prevented from flowing back into the motor, and the safety of equipment is improved.

Description

Technical Field

[0001] This utility model relates to the field of photolithography technology, and in particular to an adsorption plate for a spin coater and a spin coater. Background Technology

[0002] With the rapid development of scientific research technology, micro-nano technology has been widely applied in physical sciences, electronics, medicine, and materials science. In the fabrication of micro-nano devices, the photoresist exposure machine is an indispensable key piece of equipment. Before exposure, coating the wafer with photoresist is a crucial preliminary step. However, for smaller wafers commonly used in laboratories, the sample adsorption trays of conventional spin coaters are prone to photoresist backflow onto the motor. Furthermore, existing adsorption trays struggle to achieve precise sample placement. If the sample is not placed in the exact center of the adsorption tray, the photoresist distribution on the entire sample surface will be uneven when the spin coater starts rotating at high speed. This leads to a decrease in the precision of the pattern after exposure, failing to meet the high-precision requirements of micro-nano device fabrication, thus affecting the performance and quality of the micro-nano devices. Even more seriously, samples not placed in the center are at risk of being flung off due to uneven force, which not only damages the sample but also interrupts the spin coater operation, reduces spin coat efficiency, and increases experimental costs. Utility Model Content

[0003] The purpose of this invention is to provide a spin coater adsorption plate and a spin coater to solve the problems existing in the prior art. It can achieve precise positioning during sample adsorption, ensure the accuracy of operation, improve work efficiency, and also prevent photoresist from flowing back into the motor, thus improving equipment safety.

[0004] To achieve the above objectives, this utility model provides the following solution:

[0005] This utility model provides an adsorption plate for a spin coater, including an adsorption platform and a baffle plate. The top surface of the adsorption platform is fixedly connected to the top surface of the baffle plate, and the center line of the adsorption platform is collinear with the center line of the baffle plate. An adsorption air channel is provided on the top surface of the adsorption platform, and four positioning lines are provided on the baffle plate, which are evenly arranged around the adsorption platform.

[0006] Preferably, the adsorption stage is a cuboid adsorption stage, and the top surface of the cuboid adsorption stage is a square.

[0007] Preferably, the adsorption airway includes a first square annular groove, a second square annular groove, a cross-shaped groove, and four suction holes. The first square annular groove and the second square annular groove are concentrically arranged, and the center line of the first square annular groove is collinear with the center line of the adsorption stage. The center of the adsorption stage is provided with the cross-shaped groove, and the cross-shaped groove passes through the center of the four side grooves of the second square annular groove and communicates with the center of the four side grooves of the first square annular groove. Each suction hole is respectively located at the intersection of the cross-shaped groove and the second square annular groove. The suction hole passes through the adsorption stage and the baffle plate and communicates with the suction device.

[0008] Preferably, the width of the first square annular groove, the width of the second square annular groove, and the width of the cross-shaped groove are the same, and the depth of the first square annular groove, the depth of the second square annular groove, and the depth of the cross-shaped groove are the same.

[0009] Preferably, the top surface of the adsorption stage has a side length of 20 mm and a thickness of 1.5 mm; the outer side length of the first square annular groove is 17.5 mm and the outer side length of the second square annular groove is 7 mm.

[0010] Preferably, it further includes a connecting cylinder, which is fixedly connected to the bottom surface of the baffle plate, and the axis of the connecting cylinder is collinear with the center line of the baffle plate. The connecting cylinder is used to be fixedly connected to the rotating shaft of the spin coater.

[0011] Preferably, the adsorption platform and the baffle are integrally formed.

[0012] Preferably, the baffle is cylindrical in shape.

[0013] Preferably, the diameter of the baffle is 60mm and the thickness of the baffle is 3mm.

[0014] This embodiment also provides a spin coater, including a spin coater body, an air suction device, and the spin coater adsorption plate. The air suction device is connected to the adsorption air channel opened on the adsorption table, and the spin coater body is fixedly connected to the spin coater adsorption plate.

[0015] The present invention achieves the following technical advantages over the prior art:

[0016] This utility model provides a spin coater adsorption plate and a spin coater. The baffle plate can block the photoresist that is thrown out during spin coating, preventing the photoresist from flowing into the motor and causing damage to the motor. The four positioning lines on the baffle plate that are evenly arranged around the adsorption stage can accurately place the wafer in the center of the adsorption stage, preventing the sample from being thrown out due to unbalanced force during high-speed rotation. At the same time, it can make the photoresist evenly distributed, improve the spin coater speed and coating uniformity, and thus improve the exposure accuracy. Attached Figure Description

[0017] To more clearly illustrate the technical solutions in the embodiments of this utility model or the prior art, the drawings used in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0018] Figure 1 This is a schematic diagram of the adsorption plate of a spin coater;

[0019] Figure 2 This is a schematic diagram showing the bottom view of the adsorption plate of the spin coater.

[0020] Figure 3 This is a front view of the adsorption plate of the spin coater;

[0021] Figure 4 This is a top view of the adsorption plate of the spin coater;

[0022] Figure 5 This is a bottom view of the adsorption plate of the spin coater.

[0023] In the diagram: 1-Adsorption stage; 2-Baffle plate; 3-Positioning line; 4-First square ring groove; 5-Second square ring groove; 6-"+" shaped groove; 7-Suction hole; 8-Connecting cylinder. Detailed Implementation

[0024] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0025] The purpose of this invention is to provide a spin coater adsorption plate and a spin coater to solve the problems existing in the prior art. It can achieve precise positioning during sample adsorption, ensure the accuracy of operation, improve work efficiency, and also prevent photoresist from flowing back into the motor, thus improving equipment safety.

[0026] To make the above-mentioned objectives, features and advantages of this utility model more apparent and understandable, the utility model will be further described in detail below with reference to the accompanying drawings and specific embodiments.

[0027] Example 1

[0028] This embodiment provides an adsorption plate for a spin coater, such as... Figure 1-5 As shown, the device includes an adsorption stage 1 and a baffle plate 2. The top surfaces of the adsorption stage 1 and the baffle plate 2 are fixedly connected, and the centerline of the adsorption stage 1 and the centerline of the baffle plate 2 are collinear. An adsorption air channel is provided on the top surface of the adsorption stage 1. Four positioning lines 3 are evenly arranged around the adsorption stage 1 on the baffle plate 2. The baffle plate 2 can shield the photoresist that is ejected during spin coating, preventing it from flowing into the motor and causing damage. The four positioning lines 3 evenly arranged around the adsorption stage 1 on the baffle plate 2 ensure that the wafer is accurately placed in the center of the adsorption stage 1, preventing the sample from being ejected due to uneven force during high-speed rotation. Simultaneously, it ensures uniform photoresist distribution, improving the spin coating rate and uniformity, thereby improving exposure accuracy.

[0029] In a further preferred embodiment of this invention, the adsorption platform 1 is a cuboid adsorption platform 1 with a square top surface. The adsorption air passage includes a first square annular groove 4, a second square annular groove 5, a cross-shaped groove 6, and four suction holes 7. The first square annular groove 4 and the second square annular groove 5 are concentrically arranged, and the center line of the first square annular groove 4 is collinear with the center line of the adsorption platform 1. A cross-shaped groove 6 is provided at the center of the adsorption platform 1, and the cross-shaped groove 6 passes through the center of the four side grooves of the second square annular groove 5 and communicates with the center of the four side grooves of the first square annular groove 4. Each suction hole 7 is respectively located at the intersection of the cross-shaped groove 6 and the second square annular groove 5, and the suction hole 7 passes through the adsorption platform 1 and the baffle 2 and communicates with the suction device. The groove width of the first square annular groove 4, the groove width of the second square annular groove 5, and the groove width of the cross-shaped groove 6 are the same, and the groove depth of the first square annular groove 4, the groove depth of the second square annular groove 5, and the groove depth of the cross-shaped groove 6 are the same. The first square annular groove 4, the second square annular groove 5, the cross-shaped groove 6, and the four suction holes 7 can adsorb and fix the sample, so that the sample is firmly adsorbed onto the adsorption stage 1. Moreover, the first square annular groove 4, the second square annular groove 5, the cross-shaped groove 6, and the four suction holes 7 are symmetrically distributed on the adsorption stage 1, ensuring that the sample is subjected to uniform force when rotating to coat the photoresist, avoiding the sample being thrown out during the photoresist spin coating, and ensuring uniform distribution of the photoresist.

[0030] In a further preferred embodiment of this invention, the top surface of the adsorption stage 1 has a side length of 20 mm, and the thickness of the adsorption stage 1 is 1.5 mm; the outer side length of the first square annular groove 4 is 17.5 mm, and the outer side length of the second square annular groove 5 is 7 mm. The first square annular groove 4 is located near the edge of the adsorption stage 1, and the second square annular groove 5 is located in the center of the adsorption stage 1, which ensures that the edge and center of the sample have adsorption force, resulting in more reliable adsorption.

[0031] In a further preferred embodiment of this invention, the spin coater's adsorption plate also includes a connecting cylinder 8. The connecting cylinder 8 is fixedly connected to the bottom surface of the baffle 2, and the axis of the connecting cylinder 8 is collinear with the center line of the baffle 2. The connecting cylinder 8 is used to fixally connect to the rotating shaft of the spin coater. The inner diameter of the connecting cylinder 8 is 28mm, and the outer diameter is 33mm. The connecting cylinder 8 is fixed on the rotating shaft of the spin coater, so that the spin coater's adsorption plate can rotate at high speed together with the spin coater's rotating shaft, ensuring uniform photoresist coating. At the same time, the central through hole of the connecting cylinder 8 is connected to the suction hole 7, and the suction device can act on the suction hole 7 through the central through hole of the connecting cylinder 8, so that the sample can be firmly adsorbed on the adsorption stage 1.

[0032] In a further preferred embodiment of this invention, the adsorption platform 1 and the baffle plate 2 are integrally formed, which facilitates manufacturing and processing.

[0033] In a further preferred embodiment of this invention, the baffle 2 is cylindrical in shape, with a diameter of 60 mm and a thickness of 3 mm.

[0034] Example 2

[0035] This embodiment provides a spin coater, including a spin coater body, an air suction device, and the spin coater adsorption plate of Embodiment 1. The air suction device is connected to the adsorption air channel opened in the adsorption table 1, and the spin coater body is fixedly connected to the spin coater adsorption plate.

[0036] This utility model uses specific examples to illustrate its principles and implementation methods. The above description of the embodiments is only for the purpose of helping to understand the method and core idea of ​​this utility model. At the same time, for those skilled in the art, there will be changes in the specific implementation methods and application scope based on the idea of ​​this utility model. In summary, the content of this specification should not be construed as a limitation of this utility model.

Claims

1. An adsorption plate for a spin coater, characterized in that: It includes an adsorption platform and a baffle plate. The top surface of the adsorption platform is fixedly connected to the top surface of the baffle plate, and the center line of the adsorption platform is collinear with the center line of the baffle plate. An adsorption air channel is opened on the top surface of the adsorption platform. Four positioning lines are provided on the baffle plate, and the four positioning lines are evenly arranged around the adsorption platform.

2. The adsorption plate of the spin coater according to claim 1, characterized in that: The adsorption stage is a cuboid adsorption stage, and the top surface of the cuboid adsorption stage is a square.

3. The adsorption plate of the spin coater according to claim 2, characterized in that: The adsorption channel includes a first square annular groove, a second square annular groove, a cross-shaped groove, and four suction holes. The first square annular groove and the second square annular groove are concentrically arranged, and the center line of the first square annular groove is collinear with the center line of the adsorption stage. The cross-shaped groove is located at the center of the adsorption stage, and the cross-shaped groove passes through the center of the four side grooves of the second square annular groove and connects with the center of the four side grooves of the first square annular groove. Each suction hole is located at the intersection of the cross-shaped groove and the second square annular groove. The suction holes pass through the adsorption stage and the baffle plate and connect with the suction device.

4. The adsorption plate of the spin coater according to claim 3, characterized in that: The width of the first square annular groove, the width of the second square annular groove, and the width of the "+" shaped groove are the same, and the depth of the first square annular groove, the depth of the second square annular groove, and the depth of the "+" shaped groove are the same.

5. The adsorption plate of the spin coater according to claim 4, characterized in that: The top surface of the adsorption platform has a side length of 20mm, and the thickness of the adsorption platform is 1.5mm; the outer side length of the first square annular groove is 17.5mm, and the outer side length of the second square annular groove is 7mm.

6. The adsorption plate of the spin coater according to claim 1, characterized in that: It also includes a connecting cylinder, which is fixedly connected to the bottom surface of the baffle plate, and the axis of the connecting cylinder is collinear with the center line of the baffle plate. The connecting cylinder is used to be fixedly connected to the rotating shaft of the spin coater.

7. The adsorption plate of the spin coater according to claim 1, characterized in that: The adsorption platform and the baffle are integrally formed.

8. The adsorption plate of the spin coater according to claim 1, characterized in that: The baffle is cylindrical in shape.

9. The adsorption plate of the spin coater according to claim 8, characterized in that: The diameter of the baffle is 60mm and the thickness of the baffle is 3mm.

10. A spin coater, characterized in that: The device includes a spin coater body, an air suction device, and a spin coater adsorption plate according to any one of claims 1-9. The air suction device is connected to the adsorption air channel opened on the adsorption table, and the spin coater body is fixedly connected to the spin coater adsorption plate.

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