Chemical vapor deposition equipment

Abstract

The utility model discloses chemical vapor deposition equipment which comprises an equipment main body, a reaction cavity is formed in the equipment main body, a temperature measuring opening penetrating through the reaction cavity in the first direction is further formed in the inner wall of the reaction cavity, a light-transmitting piece is arranged in the temperature measuring opening, and the temperature measuring opening is blocked by the light-transmitting piece. The workpiece to be machined is suitable for moving to the position opposite to the temperature measuring opening in the first direction; the temperature measuring device is arranged on the outer side of the equipment main body, the temperature measuring device comprises an infrared temperature measuring instrument, a collimating lens and a concave lens, the infrared temperature measuring instrument, the collimating lens and the concave lens are all arranged opposite to the temperature measuring opening in the first direction, the collimating lens is arranged between the infrared temperature measuring instrument and the concave lens, and the concave lens is arranged on the side, facing the temperature measuring opening, of the collimating lens. According to the chemical vapor deposition equipment disclosed by the utility model, non-contact measurement can be carried out on the temperature of the workpiece to be processed in the chemical vapor deposition process, and the temperature measurement acquisition area is larger, so that the temperature measurement precision can be improved.

Description

Technical Field

[0001] This utility model relates to the field of chemical vapor deposition technology, and in particular to a chemical vapor deposition device. Background Technology

[0002] Chemical vapor deposition (CVD) is a process of growing a coating on the surface of a solid material through a high-temperature chemical reaction. In semiconductor manufacturing, CVD is frequently used to generate thin films on the surface of wafers. The CVD process requires high precision in the reaction temperature. In related technologies, the temperature measurement accuracy of wafers during CVD is relatively low, which affects the yield. Utility Model Content

[0003] This invention aims to solve at least one of the technical problems existing in the prior art. To this end, this invention provides a chemical vapor deposition (CVD) apparatus with a higher yield rate.

[0004] The chemical vapor deposition apparatus according to this utility model includes: an apparatus body, wherein a reaction chamber is formed within the apparatus body for performing chemical vapor deposition on a workpiece; a temperature measuring port is formed on the inner wall of the reaction chamber, extending through the reaction chamber in a first direction; a light-transmitting element is provided within the temperature measuring port, and the light-transmitting element blocks the temperature measuring port; the workpiece is adapted to move to a position opposite to the temperature measuring port in the first direction; and a temperature measuring device disposed on the outside of the apparatus body, the temperature measuring device including an infrared thermometer, a collimating lens, and a concave lens, wherein the infrared thermometer, the collimating lens, and the concave lens are all disposed opposite to the temperature measuring port in the first direction, and the collimating lens is disposed between the infrared thermometer and the concave lens, and the concave lens is disposed on the side of the collimating lens facing the temperature measuring port.

[0005] According to the chemical vapor deposition equipment of this utility model, on the one hand, the temperature of the workpiece to be processed can be measured non-contactly during the chemical vapor deposition process, and the temperature measuring device has a long service life. On the other hand, the temperature measuring device has a large collection area, which can improve the temperature measurement accuracy, thereby making the temperature control of chemical vapor deposition equipment more precise and improving the yield rate in the production process.

[0006] According to some embodiments of the present invention, the temperature measuring device further includes: a mounting cylinder, one end of which has an open opening, the open opening being opposite to the temperature measuring port in the first direction, the infrared thermometer, the collimating lens, and the concave lens all being disposed in the mounting cylinder, and the concave lens being disposed on the side of the collimating lens facing the open opening.

[0007] According to some embodiments of the present invention, the infrared thermometer, the collimating lens, and the concave lens are movably disposed in the mounting cylinder along the first direction.

[0008] According to some embodiments of the present invention, the chemical vapor deposition apparatus further includes: a first support, which is movably disposed in the mounting cylinder along the first direction, and the infrared thermometer is disposed on the first support; a second support, which is movably disposed in the mounting cylinder along the first direction, and the collimating lens is disposed on the second support; and a third support, which is movably disposed in the mounting cylinder along the first direction, and the concave lens is disposed on the third support.

[0009] According to some embodiments of the present invention, an operating hole is formed on the side wall of the mounting cylinder, extending through the side wall of the mounting cylinder in the thickness direction, and the operating hole extends in the first direction; the first bracket has a first adjustment section, which extends out of the mounting cylinder through the operating hole; the second bracket has a second adjustment section, which extends out of the mounting cylinder through the operating hole; and the third bracket has a third adjustment section, which extends out of the mounting cylinder through the operating hole.

[0010] According to some embodiments of the present invention, the outer edge of the operating hole is provided with a guide rail extending along the first direction, the guide rail is arranged side by side with the operating hole, the protruding end of the first adjusting section is provided with a first adjusting block, the first adjusting block is movably fitted onto the guide rail along the first direction, the protruding end of the second adjusting section is provided with a second adjusting block, the second adjusting block is movably fitted onto the guide rail along the first direction, and the protruding end of the third adjusting section is provided with a third adjusting block, the third adjusting block is movably fitted onto the guide rail along the first direction.

[0011] According to some embodiments of the present invention, a vent hole is also formed on the mounting cylinder. The vent hole is located on the side of the infrared thermometer away from the open opening, and the vent hole is used to introduce airflow into the mounting cylinder.

[0012] According to some embodiments of the present invention, a cooling channel is further formed inside the mounting cylinder, and an inlet and an outlet are respectively formed on the mounting cylinder that communicate with the cooling channel.

[0013] According to some embodiments of the present invention, the cooling channel is formed inside the cylinder of the mounting cylinder.

[0014] According to some embodiments of the present invention, the chemical vapor deposition apparatus further includes: a turntable, which is rotatably disposed in the reaction chamber, and a substrate tray is provided on the turntable for carrying the workpiece to be processed. The rotation is adapted to rotate so that the workpiece to be processed and the temperature measuring port are opposite each other in the first direction.

[0015] Additional aspects and advantages of this invention will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention. Attached Figure Description

[0016] Figure 1 This is a schematic diagram of a chemical vapor deposition apparatus according to an embodiment of the present invention;

[0017] Figure 2 yes Figure 1 A schematic diagram of the temperature measuring device shown;

[0018] Figure 3 yes Figure 2 A cross-sectional view of the measuring device shown;

[0019] Figure 4 yes Figure 2 A schematic diagram of the mounting cylinder shown;

[0020] Figure 5 This is a schematic diagram of an infrared thermometer, a collimating lens, a concave lens, and a workpiece to be processed according to an embodiment of the present invention.

[0021] Figure label:

[0022] 100. Chemical vapor deposition equipment;

[0023] 10. Main body of the equipment; 11. Reaction chamber; 12. Temperature measuring port; 13. Main body; 14. Cover plate; 15. Air inlet;

[0024] 20. Temperature measuring device; 21. Infrared thermometer; 22. Collimating lens; 23. Concave lens; 24. Mounting cylinder; 241. Opening; 242. Operating hole; 243. Guide rail; 244. Vent hole; 245. Liquid inlet; 246. Liquid outlet; 247. Communication interface; 25. First bracket; 251. First adjusting block; 26. Second bracket; 261. Second adjusting block; 27. Third bracket; 271. Third adjusting block;

[0025] 30. Rotary disk; 31. Slide tray;

[0026] 40. Heating device;

[0027] 200. Parts to be processed. Detailed Implementation

[0028] The embodiments of this utility model are described in detail below. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and intended to explain this utility model, and should not be construed as limiting this utility model.

[0029] The following is for reference. Figures 1-5 Describes a chemical vapor deposition apparatus 100 according to an embodiment of the present invention.

[0030] like Figure 1 and Figure 5 As shown, the chemical vapor deposition apparatus 100 according to an embodiment of the present invention includes: an apparatus body 10 and a temperature measuring device 20.

[0031] Specifically, a reaction chamber 11 is formed within the main body 10 of the equipment. The reaction chamber 11 is used for chemical vapor deposition of the workpiece 200. A temperature measuring port 12 is also formed on the inner wall of the reaction chamber 11, extending through the reaction chamber 11 in a first direction. A light-transmitting element is provided inside the temperature measuring port 12, and the light-transmitting element blocks the temperature measuring port 12. It is understood that the light-transmitting element can be selected from quartz glass, etc. The workpiece 200 is adapted to move to a position opposite to the temperature measuring port 12 in the first direction. Further, movement refers to the horizontal rotation or horizontal linear movement of the workpiece 200 to the position opposite to the temperature measuring port 12 in the first direction. The temperature measuring device 20 is located on the outside of the main body 10 of the equipment. The temperature measuring device 20 includes an infrared thermometer 21, a collimating lens 22 and a concave lens 23. The infrared thermometer 21, the collimating lens 22 and the concave lens 23 are all arranged opposite to the temperature measuring port 12 in a first direction. The collimating lens 22 is located between the infrared thermometer 21 and the concave lens 23, and the concave lens 23 is located on the side of the collimating lens 22 facing the temperature measuring port 12.

[0032] During the operation of the chemical vapor deposition equipment 100, the workpiece 200 undergoes a chemical vapor deposition reaction in the reaction chamber 11. When it is necessary to detect the temperature of the workpiece 200, the workpiece 200 moves to a position opposite to the temperature measuring port 12 in the first direction. Then, the infrared radiation wave generated on the surface of the workpiece 200 passes through the light-transmitting element, the concave lens 23, and the collimating lens 22 in sequence and is collected by the infrared thermometer 21. The infrared thermometer 21 obtains the temperature of the workpiece 200 based on the collected infrared radiation wave. Thus, non-contact measurement of the temperature of the workpiece 200 can be achieved. Furthermore, the temperature measuring device 20 is located outside the reaction chamber 11, and the temperature of the temperature measuring device 20 is relatively low during operation, which can improve the service life of the temperature measuring device 20.

[0033] As will be understood by those skilled in the art, the temperature of the workpiece 200 during chemical vapor deposition has a significant impact on the reaction results. In related technologies, when detecting the temperature of the workpiece 200, the area of ​​the workpiece 200 corresponding to the collected infrared radiation wave is small, and the local temperature of the workpiece 200 is difficult to accurately represent the overall temperature of the workpiece 200, resulting in low temperature accuracy. If the chemical vapor deposition equipment 100 controls the temperature in the reaction chamber 11 based on the low-accuracy temperature measurement, it will affect the yield rate in the production process.

[0034] Infrared radiation waves generated on the surface of the workpiece 200 are emitted in all directions. In this embodiment, a concave lens 23 and a collimating lens 22 are set in front of the infrared thermometer 21. The concave lens 23 collects infrared radiation waves over a wide range of angles, and the collimating lens 22 can adjust the optical path of the infrared radiation waves passing through the concave lens 23, so that the infrared radiation waves are focused and constrained to the acquisition area of ​​the infrared thermometer 21. In this way, the acquisition area of ​​the workpiece 200 during the temperature measurement process can be increased, so that the temperature measuring device 20 can detect the temperature of a larger proportion of the workpiece 200, improve the accuracy of the temperature measurement of the workpiece 200, and the chemical vapor deposition equipment 100 can perform more precise temperature control on the chemical vapor deposition process, thereby improving the yield rate in the production process.

[0035] The temperature measuring device 20 is equipped with a communication interface 247, and the display device and controller of the chemical vapor deposition equipment 100 are electrically connected to the infrared thermometer 21 through the communication interface 247.

[0036] According to the chemical vapor deposition equipment 100 of this utility model embodiment, on the one hand, the temperature of the workpiece 200 to be processed can be measured non-contactly during the chemical vapor deposition process, and the temperature measuring device 20 has a long service life. On the other hand, the temperature measuring device 20 has a large collection area, which can improve the temperature measurement accuracy, thereby making the chemical vapor deposition equipment 100 more precise in controlling the temperature of chemical vapor deposition and improving the yield rate in the production process.

[0037] In some embodiments of this utility model, such as Figure 3 As shown, the temperature measuring device 20 also includes: a mounting cylinder 24, one end of which has an open opening 241, the open opening 241 being opposite to the temperature measuring port 12 in a first direction, the infrared thermometer 21, the collimating lens 22 and the concave lens 23 being disposed in the mounting cylinder 24, and the concave lens 23 being disposed on the side of the collimating lens 22 facing the open opening 241.

[0038] By setting the mounting cylinder 24, on the one hand, it is convenient to fix the relative positions of the infrared thermometer 21, the collimating lens 22, and the concave lens 23. During the assembly process, after the infrared thermometer 21, the collimating lens 22, and the concave lens 23 are assembled into the mounting cylinder 24, the infrared thermometer 21, the collimating lens 22, and the concave lens 23 can be moved by operating the mounting cylinder 24, reducing the assembly difficulty. On the other hand, the mounting cylinder 24 can provide protection for the infrared thermometer 21, the collimating lens 22, and the concave lens 23, improving the reliability of the temperature measuring device 20.

[0039] In some embodiments of this utility model, the infrared thermometer 21, the collimating lens 22, and the concave lens 23 are movably disposed in the mounting cylinder 24 along the first direction.

[0040] In this way, the light path of the temperature measuring device 20 can be adjusted by adjusting the distance between the infrared thermometer 21, the collimating lens 22 and the concave lens 23 and the temperature measuring port 12, as well as the distance between the infrared thermometer 21, the collimating lens 22 and the concave lens 23, so that the temperature measuring device 20 can meet more temperature measuring needs.

[0041] In some embodiments of this utility model, such as Figure 2 and Figure 3 As shown, the chemical vapor deposition apparatus 100 also includes: a first support 25, a second support 26 and a third support 27.

[0042] Specifically, the first bracket 25 is movably disposed in the mounting cylinder 24 along the first direction, the infrared thermometer 21 is disposed on the first bracket 25, the second bracket 26 is movably disposed in the mounting cylinder 24 along the first direction, the collimating lens 22 is disposed on the second bracket 26, the third bracket 27 is movably disposed in the mounting cylinder 24 along the first direction, and the concave lens 23 is disposed on the third bracket 27.

[0043] Therefore, during the temperature measurement process, by moving the first bracket 25, the second bracket 26, and the third bracket 27 in the first direction, the positions of the infrared thermometer 21, the collimating lens 22, and the concave lens 23 within the mounting cylinder 24 and their positions relative to the temperature measuring port 12 can be achieved. It can be understood that compared to achieving a movable connection between the infrared thermometer 21, the collimating lens 22, and the concave lens 23 and the mounting cylinder 24, achieving a connection between the first bracket 25, the second bracket 26, and the third bracket 27 and the mounting cylinder 24 is simpler and can reduce structural changes to the infrared thermometer 21, the collimating lens 22, and the concave lens 23, thereby reducing the difficulty of product design.

[0044] In some embodiments of this utility model, such as Figures 2-4As shown, an operating hole 242 is formed on the side wall of the mounting cylinder 24, extending through the side wall of the mounting cylinder 24 in the thickness direction. The operating hole 242 extends in a first direction. The first bracket 25 has a first adjustment section that extends out of the mounting cylinder 24 through the operating hole 242. The second bracket 26 has a second adjustment section that extends out of the mounting cylinder 24 through the operating hole 242. The third bracket 27 has a third adjustment section that extends out of the mounting cylinder 24 through the operating hole 242.

[0045] Therefore, during the temperature measurement process, the infrared thermometer 21, collimating lens 22 and concave lens 23 can be moved by operating the first adjustment section, the second adjustment section and the third adjustment section on the outside of the mounting cylinder 24. The operation is relatively simple and can reduce the difficulty of operation.

[0046] In some embodiments of this utility model, such as Figures 2-4 As shown, the outer edge of the operating hole 242 is provided with a guide rail 243 extending in the first direction. The guide rail 243 is arranged side by side with the operating hole 242. The protruding end of the first adjustment section is provided with a first adjustment block 251, which is movably fitted onto the guide rail 243 in the first direction. The protruding end of the second adjustment section is provided with a second adjustment block 261, which is movably fitted onto the guide rail 243 in the first direction. The protruding end of the third adjustment section is provided with a third adjustment block 271, which is movably fitted onto the guide rail 243 in the first direction.

[0047] Therefore, the first adjusting block 251, in cooperation with the guide rail 243, can guide and limit the movement of the first bracket 25 in the first direction. Similarly, the second adjusting block 261, in cooperation with the guide rail 243, can guide and limit the movement of the second bracket 26 in the first direction. The third adjusting block 271, in cooperation with the guide rail 243, can guide and limit the movement of the third bracket 27 in the first direction. This can further reduce the difficulty of adjusting the position of the infrared thermometer 21, the collimating lens 22, and the concave lens 23, and the adjustment accuracy is higher.

[0048] In some embodiments of this utility model, the operating hole 242 is provided with guide rails 243 on both sides in the width direction. There are multiple operating holes 242, which are arranged at intervals in the circumferential direction on the side wall of the mounting cylinder 24. There are multiple first adjustment sections, second adjustment sections, and third adjustment sections, and each of the first adjustment section, second adjustment section, and third adjustment section corresponds one-to-one with an operating hole 242. As a result, the stability of the first support 25, second support 26, and third support 27 during movement can be improved, and the movement of the first support 25, second support 26, and third support 27 can be made smoother.

[0049] In some embodiments of this utility model, such as Figures 2-4As shown, a vent hole 244 is also formed on the mounting cylinder 24. The vent hole 244 is located on the side of the infrared thermometer 21 away from the open opening 241. The vent hole 244 is used to introduce airflow into the mounting cylinder 24.

[0050] During the temperature measurement process, airflow is introduced into the mounting cylinder 24 through the vent 244. The airflow passes sequentially through the infrared thermometer 21, the collimating lens 22 and the concave lens 23, and then exits from the open port 241 of the mounting cylinder 24.

[0051] Understandably, the surface cleanliness of the infrared thermometer 21, collimating lens 22, and concave lens 23 has a significant impact on temperature measurement accuracy. By introducing airflow into the mounting cylinder 24, the infrared thermometer 21, collimating lens 22, and concave lens 23 can be continuously purged, causing dust and impurities on their surfaces to be blown out, thereby maintaining the surface cleanliness of the infrared thermometer 21, collimating lens 22, and concave lens 23 and improving temperature measurement accuracy. In addition, the introduced airflow can also cool the infrared thermometer 21, collimating lens 22, and concave lens 23, further improving the reliability of the temperature measuring device 20 during operation.

[0052] In some embodiments of this utility model, such as Figures 2-4 As shown, a cooling channel is also formed inside the mounting cylinder 24, and an inlet 245 and an outlet 246 that are respectively connected to the cooling channel are also formed on the mounting cylinder 24.

[0053] Alternatively, a heat exchanger can be installed inside the mounting cylinder 24 to form a cooling channel, or a cooling channel can be formed inside the cylinder of the mounting cylinder 24.

[0054] During the temperature measurement process, the heat exchange medium flows into the cooling channel from the inlet 245 and then flows out of the cooling channel from the outlet 246. During the flow of the heat exchange medium, it will exchange heat with the mounting cylinder 24, thereby cooling the temperature measuring device 20 and further improving the reliability of the temperature measuring device 20 during operation.

[0055] In some embodiments of this invention, cooling channels are formed within the cylinder of the mounting cylinder 24. This simplifies the structure of the temperature measuring device 20, reduces its production cost, and improves the heat exchange efficiency between the heat exchange medium and the temperature measuring device 20, thereby enhancing the cooling efficiency of the temperature measuring device 20.

[0056] In some embodiments of this utility model, such as Figure 1As shown, the chemical vapor deposition apparatus 100 also includes: a turntable 30, which is rotatably disposed in the reaction chamber 11. A slide plate 31 is provided on the turntable 30, which is used to carry the workpiece 200 to be processed. The turntable 30 is adapted to rotate so that the workpiece 200 to be processed is opposite to the temperature measuring port 12 in a first direction.

[0057] The main body 10 of the equipment includes a main body 13 and a cover plate 14. The main body 13 defines a reaction chamber 11 with one end open. The cover plate 14 covers the main body 13. The main body 10 also has an air inlet 15 and an air outlet. A heating device 40 is provided on the lower side of the turntable 30. During the chemical vapor deposition process, the workpiece 200 is placed on the substrate tray 31. The reaction gas flows into and out of the reaction chamber 11 through the air inlet 15 and the air outlet. At the same time, the turntable 30 drives the workpiece 200 to rotate through the substrate tray 31.

[0058] The rotation of the turntable 30 allows the workpiece 200 to come into more full contact with the reactive gas, thereby improving the chemical vapor deposition effect.

[0059] In the description of this utility model, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc., indicating the orientation or positional relationship are based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this utility model and simplifying the description, and are not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model.

[0060] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this utility model, "a plurality of" means two or more, unless otherwise explicitly specified.

[0061] In this utility model, unless otherwise explicitly specified and limited, the terms "installation," "connection," "linking," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection, an electrical connection, or a communication connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model according to the specific circumstances.

[0062] In the description of this specification, the references to terms such as "one embodiment," "some embodiments," "example," "specific example," or "some examples," etc., indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment or example is included in at least one embodiment or example of the present invention. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples. Moreover, without contradiction, those skilled in the art can combine and integrate the different embodiments or examples described in this specification, as well as the features of different embodiments or examples.

[0063] Although embodiments of the present invention have been shown and described, those skilled in the art will understand that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the present invention, the scope of which is defined by the claims and their equivalents.

Claims

1. A chemical vapor deposition apparatus characterized by comprising: The application relates to a chemical vapor deposition device. The device body is internally formed with a reaction cavity for chemical vapor deposition of a workpiece, and an internal wall of the reaction cavity is further formed with a temperature measuring opening penetrating through the reaction cavity along a first direction, the temperature measuring opening is internally provided with a light-transmitting piece, the light-transmitting piece seals the temperature measuring opening, and the workpiece is adapted to move to a position opposite to the temperature measuring opening in the first direction. The temperature measuring device is arranged outside the device body and comprises an infrared temperature measuring instrument, a collimating lens and a concave lens, the infrared temperature measuring instrument, the collimating lens and the concave lens are oppositely arranged with the temperature measuring opening in the first direction, the collimating lens is arranged between the infrared temperature measuring instrument and the concave lens, and the concave lens is arranged on a side of the collimating lens facing the temperature measuring opening.

2. The chemical vapor deposition apparatus according to claim 1, wherein The temperature measuring device further comprises a mounting cylinder, one end of the mounting cylinder is provided with an open opening, the open opening is opposite to the temperature measuring opening in the first direction, the infrared temperature measuring instrument, the collimating lens and the concave lens are arranged in the mounting cylinder, and the concave lens is arranged on a side of the collimating lens facing the open opening.

3. The chemical vapor deposition apparatus according to claim 2, wherein The infrared temperature measuring instrument, the collimating lens and the concave lens are movably arranged in the mounting cylinder along the first direction.

4. The chemical vapor deposition apparatus according to claim 3, wherein The chemical vapor deposition device further comprises: a first support movably arranged in the mounting cylinder along the first direction, the infrared temperature measuring instrument is arranged on the first support; a second support movably arranged in the mounting cylinder along the first direction, the collimating lens is arranged on the second support; a third support movably arranged in the mounting cylinder along the first direction, the concave lens is arranged on the third support.

5. The chemical vapor deposition apparatus according to claim 4, wherein An operation hole penetrating through a side wall of the mounting cylinder along a thickness direction is formed on the side wall of the mounting cylinder, the operation hole extends along the first direction; the first support has a first adjusting section, the first adjusting section extends out of the mounting cylinder through the operation hole, the second support has a second adjusting section, the second adjusting section extends out of the mounting cylinder through the operation hole, the third support has a third adjusting section, the third adjusting section extends out of the mounting cylinder through the operation hole.

6. The chemical vapor deposition apparatus according to claim 5, wherein An outer side edge of the operation hole is provided with a guide rail extending along the first direction, the guide rail is arranged side by side with the operation hole, a first adjusting block is arranged on an extending end of the first adjusting section, the first adjusting block is movably matched with the guide rail along the first direction, a second adjusting block is arranged on an extending end of the second adjusting section, the second adjusting block is movably matched with the guide rail along the first direction, a third adjusting block is arranged on an extending end of the third adjusting section, the third adjusting block is movably matched with the guide rail along the first direction.

7. The chemical vapor deposition apparatus according to any one of claims 2 to 6, wherein An air inlet hole is further formed on the mounting cylinder, the air inlet hole is arranged on a side of the infrared temperature measuring instrument away from the open opening, and the air inlet hole is used for introducing an air flow into the mounting cylinder.

8. The chemical vapor deposition apparatus according to any one of claims 2 to 6, wherein A cooling flow channel is further formed in the mounting cylinder, and a liquid inlet and a liquid outlet are further formed in the mounting cylinder and communicate with the cooling flow channel respectively.

9. The chemical vapor deposition apparatus of claim 8, wherein, The cooling flow channel is formed in a cylinder body of the mounting cylinder.

10. The chemical vapor deposition apparatus of claim 1, wherein Further comprising: A rotating disc is rotatably arranged in the reaction cavity, and a slide glass disc is arranged on the rotating disc and used for carrying the workpiece to be processed. The rotating disc is adapted to rotate so that the workpiece to be processed and the temperature measuring port are opposite in the first direction.

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