Cleaning mechanism and cleaning equipment

Abstract

The embodiment of the utility model discloses a cleaning mechanism and cleaning equipment for cleaning a quartz boat, and the cleaning mechanism comprises a cleaning assembly for cleaning the quartz boat; the drying assembly comprises a drying groove, a drying piece and a bearing piece, a drying cavity is formed in the drying groove, the bearing piece is arranged in the drying cavity, the bearing piece is used for bearing the quartz boat and can measure the weight of the quartz boat, and the drying piece is arranged in the drying cavity and used for drying the cleaned quartz boat. According to the cleaning mechanism provided by the embodiment of the invention, the cleaned quartz boat can be dried, and the weight of the quartz boat can be detected while the quartz boat is dried, so that the weight of the quartz boat is compared with the weight of the quartz boat before cleaning, and the problem that whether the quartz boat is completely dried or not cannot be judged is solved.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of solar cell production, and in particular to a cleaning mechanism and a cleaning device. BACKGROUND

[0002] In the current battery manufacturing industry, the production process of passivated contact cells includes the steps of texturing preparation, doping diffusion, alkaline polishing, polysilicon deposition, and heat treatment annealing. Among them, the diffusion and annealing links need to use quartz boats. The quartz boat will continuously form an impurity-containing silicon oxide layer when boron diffusion occurs. If it is not cleaned for a long time, it will contaminate the silicon wafer and affect the quality of the battery. Therefore, in order to ensure product quality, the quartz boat needs to be cleaned regularly to avoid contamination of the quartz boat to the silicon wafer.

[0003] After the cleaning of the quartz boat is completed, the quartz boat needs to be dried. However, it is not easy to visually determine whether the quartz boat has been fully dried. Since the drying process can be affected by various factors, such as the performance of the drying equipment, the length of the drying time, and the environmental humidity, etc., which leads to a certain uncertainty in the drying state of the quartz boat. The quartz boat that is not completely dried may have some impurities or contaminants, which may adhere to the surface of the silicon wafer during the diffusion process, causing contamination to the silicon wafer, thereby affecting the performance and quality of the battery. CONTENT OF THE INVENTION

[0004] The embodiments of the present application disclose a cleaning mechanism and a cleaning device, which can determine whether the cleaned quartz boat is completely dried, solving the problem that the quartz boat that is not completely dried may contaminate the surface of the silicon wafer.

[0005] In order to achieve the above-mentioned purpose, the embodiments of the present application provide a cleaning mechanism for cleaning a quartz boat, comprising:

[0006] A cleaning assembly for cleaning the quartz boat;

[0007] A drying assembly comprising a drying tank, a drying piece, and a bearing piece, the inside of the drying tank forms a drying cavity, the bearing piece is arranged in the drying cavity, the bearing piece is used to bear the quartz boat and can measure the weight of the quartz boat, and the drying piece is arranged in the drying cavity, the drying piece is used to dry the cleaned quartz boat.

[0008] As an optional implementation, the quartz boat comprises a first surface and a second surface, the carrier comprises a first carrier surface and a second carrier surface, and the carrier is rotatable between a first position and a second position; when the carrier is rotated to the first position, the first surface and the first carrier surface are in contact, and a gap exists between the second surface and the second carrier surface; when the carrier is rotated to the second position, the second surface and the second carrier surface are in contact, and a gap exists between the first surface and the first carrier surface.

[0009] As an optional implementation, an included angle a between the first carrier surface and the second carrier surface satisfies: 90° < a < 180°.

[0010] As an optional implementation, the drying assembly further comprises a driving member connected with the carrier, and the driving member is capable of driving the carrier to rotate between the first position and the second position.

[0011] As an optional implementation, the cleaning mechanism further comprises a first weighing member for measuring the weight of the quartz boat before cleaning.

[0012] The carrier comprises a first scale and a second scale connected with each other, the first carrier surface is a weighing surface of the first scale, and the second carrier surface is a weighing surface of the second scale.

[0013] As an optional implementation, the cleaning assembly comprises a first cleaning tank, a second cleaning tank and a buffer tank, the first cleaning tank and the second cleaning tank are provided with cleaning solutions, the concentration of the cleaning solution in the first cleaning tank is greater than that of the cleaning solution in the second cleaning tank, a first connecting pipeline is connected between the first cleaning tank and the buffer tank, a first switch valve is arranged in the first connecting pipeline and is used for controlling the opening and closing of the first connecting pipeline, a second connecting pipeline is connected between the second cleaning tank and the buffer tank, and a second switch valve is arranged in the second connecting pipeline and is used for controlling the opening and closing of the second connecting pipeline.

[0014] As an optional implementation, the cleaning assembly further comprises a third cleaning tank, and the third cleaning tank is used for cleaning the quartz boat after cleaning by the first cleaning tank or the second cleaning tank.

[0015] As an optional implementation, the cleaning mechanism further comprises: at least two cover plates, respectively movably arranged at the opening of the first cleaning tank and the opening of the second cleaning tank, to open or close the first cleaning tank and the second cleaning tank; and a condensing pipeline arranged on the cover plate, wherein a cooling medium is arranged inside the condensing pipeline, and the cooling medium is used to condense the cleaning solution volatilized in the first cleaning tank and the second cleaning tank.

[0016] As an optional implementation, the drying member comprises: an air supply member arranged in the drying cavity, and used to blow drying air to the quartz boat to dry the cleaning solution on the surface of the quartz boat.

[0017] Embodiments of the second aspect of the application provide a cleaning device comprising the cleaning mechanism.

[0018] Compared with the prior art, the application has the following beneficial effects:

[0019] The cleaning mechanism provided by the embodiments of the application can perform the cleaning and drying steps of the quartz boat through the cleaning assembly and the drying assembly. While the quartz boat is being dried, the carrying member can measure the weight of the quartz boat. The weight of the quartz boat before cleaning is compared with the weight of the quartz boat during drying. When the two weights are the same, it means that the quartz boat is completely dried. By ensuring that the quartz boat is completely dried, the impurities or pollutants carried by the quartz boat that is not completely dried are prevented from polluting the silicon wafers, thereby ensuring the quality of the silicon wafers carried by the quartz boat. BRIEF DESCRIPTION OF DRAWINGS

[0020] In order to more clearly illustrate the technical solutions in the embodiments of the application, the following will briefly introduce the drawings needed to be used in the embodiments. Obviously, the drawings in the following description only constitute some embodiments of the application, and for those skilled in the art, other drawings can also be obtained from these drawings without creative labor.

[0021] Figure 1 A structure schematic view of the carrying member in the first position according to an embodiment of the application is shown in FIG. 1;

[0022] Figure 2 A structure schematic view of the carrying member in the second position according to an embodiment of the application is shown in FIG. 2;

[0023] Figure 3 A structure schematic view of the cleaning assembly according to an embodiment of the application is shown in FIG. 3;

[0024] Figure 4 A structure schematic view of the cover plate according to an embodiment of the application is shown in FIG. 4.

[0025] Explanation of reference signs:

[0026] 100 - cleaning mechanism; 200 - quartz boat; 201 - first surface; 202 - second surface; 1 - first weighing member; 2 - cleaning assembly; 21 - first cleaning tank; 22 - second cleaning tank; 23 - buffer tank; 24 - first connecting pipeline; 241 - first on-off valve; 25 - second connecting pipeline; 251 - second on-off valve; 26 - third cleaning tank; 27 - cover plate; 271 - condensing pipeline; 3 - drying assembly; 31 - drying tank; 32 - drying cavity; 33 - bearing member; 331 - first scale; 3311 - first bearing surface; 332 - second scale; 3321 - second bearing surface. DETAILED DESCRIPTION

[0027] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative work fall within the scope of protection of the present application.

[0028] In the present application, the terms "upper", "lower", "top", "bottom", "inner", and the like indicate the orientation or positional relationship shown in the drawings. These terms are mainly used to better describe the present application and its embodiments, and are not intended to limit the indicated devices, elements or components to have a specific orientation, or to be constructed and operated in a specific orientation.

[0029] In addition, in addition to indicating the orientation or positional relationship, the above-mentioned part of the terms can also be used to indicate other meanings, for example, the term "upper" can also be used to indicate a certain dependent relationship or connection relationship in some cases. Those of ordinary skill in the art can understand the specific meaning of these terms in the present application according to the specific situation.

[0030] In addition, the terms "mount", "set", "provided with", "connect", "connected" should be broadly understood. For example, it can be fixedly connected, detachably connected, or integrally constructed; it can be mechanically connected, or electrically connected; it can be directly connected, or indirectly connected through an intermediate medium, or internal communication between two devices, elements or components. Those of ordinary skill in the art can understand the specific meaning of the above terms in the present application according to the specific situation.

[0031] In addition, the terms "first", "second", and the like are mainly used to distinguish different devices, elements or components (the specific types and structures may be the same or different), and are not intended to indicate or imply the relative importance and quantity of the indicated devices, elements or components. Unless otherwise stated, the meaning of "multiple" is two or more.

[0032] In the current battery manufacturing industry, the passivated contact battery production process includes roughening preparation, doping diffusion, alkaline polishing, polysilicon deposition, heat treatment annealing, RCA cleaning, atomic layer deposition, front side coating, back side coating, screen printing, laser sintering, and performance testing. Among them, the diffusion and annealing links need to use quartz boats. However, the quartz boat will continuously form an impurity-containing silicon oxide layer when boron diffusion occurs. If it is not cleaned for a long time, it will contaminate the silicon wafer and affect the quality of the battery. Therefore, in order to ensure product quality, the quartz boat needs to be cleaned regularly to avoid contamination of the silicon wafer by the quartz boat.

[0033] After the quartz boat is cleaned, it needs to be dried to remove the residual moisture or cleaning agent on the surface of the quartz boat, so as to prevent the moisture or cleaning agent from causing adverse reactions or pollution in the subsequent high-temperature process. Moisture and some cleaning agents may evaporate or decompose at high temperatures, producing impurities or gases, which not only pollute the silicon wafer, but also affect the performance and stability of the battery.

[0034] However, it is not easy to intuitively determine whether the quartz boat has been fully dried in the prior art. Since the drying process can be affected by various factors such as the performance of the drying equipment, the length of the drying time, and the environmental humidity, there is a certain uncertainty in the drying state of the quartz boat. The quartz boat that is not completely dried may carry some impurities or contaminants, which may adhere to the surface of the silicon wafer during the diffusion process, causing contamination of the silicon wafer and affecting the performance and quality of the battery.

[0035] In order to solve the above problems, the inventors have studied the limitations of existing cleaning mechanisms and cleaning equipment, and have improved the existing cleaning mechanisms and cleaning equipment. A cleaning mechanism and cleaning equipment are designed to dry the cleaned quartz boat, and at the same time, the weight of the quartz boat is detected. The weight of the dried quartz boat is compared with the weight of the quartz boat before cleaning, so as to achieve the purpose of detecting whether the residual moisture or cleaning agent on the surface of the quartz boat is completely dried.

[0036] Based on this, the embodiments of the present application disclose a cleaning mechanism and a cleaning equipment, which solve the problem that it is not possible to determine whether the quartz boat is completely dried.

[0037] The technical solutions of the present application will be further described below with reference to the embodiments and the accompanying drawings.

[0038] Please refer to Figure 1 , Figure 1The structure schematic diagram of the bearing 33 in the first position is provided in the embodiments of the present application. The embodiments of the present application provide a cleaning mechanism 100 for cleaning a quartz boat 200, which comprises: a cleaning assembly 2 for cleaning the quartz boat 200; and a drying assembly 3 comprising a drying tank 31, a drying piece, and a bearing 33. The drying tank 31 has a drying cavity 32 formed in the inside thereof. The bearing 33 is arranged in the drying cavity 32 and is used for bearing the quartz boat 200 and capable of measuring the weight of the quartz boat 200. The drying piece is arranged in the drying cavity 32 and is used for drying the quartz boat 200 after cleaning.

[0039] The cleaning assembly 2 can clean the quartz boat 200. The quartz boat 200 needs to be cleaned after being used for a certain period of time because the boron diffusion process can cause the quartz boat 200 to continuously generate a silicon oxide layer on the surface thereof. The newly generated silicon oxide often contains impurities. If the quartz boat 200 is not cleaned for a long time and continues to be used, the impurities will be brought into the silicon wafer and pollute the silicon wafer.

[0040] Similarly, although oxygen is not used in the annealing process and only nitrogen is introduced to create a high-temperature environment, it is still difficult to prevent the attachment of oxides on the surface of the quartz boat 200 during the process of the quartz boat 200 entering and leaving the high-temperature area. Therefore, the quartz boat 200 after annealing also needs to be cleaned to avoid the influence of the oxides on the surface of the quartz boat 200 on the quality of the silicon wafer borne by the quartz boat 200.

[0041] Optionally, the cleaning assembly 2 is used for cleaning the quartz boat 200. The cleaning assembly 2 can clean the quartz boat 200 by means of a spraying device, can immerse the quartz boat 200 in a cleaning tank for cleaning, or can clean the quartz boat 200 by means of a scrubbing device.

[0042] The drying assembly 3 comprises the drying tank 31. The drying tank 31 has the drying cavity 32 formed in the inside thereof. The drying cavity 32 can accommodate the bearing 33, the drying piece, and the quartz boat 200 after cleaning.

[0043] It can be understood that the bearing 33 is arranged in the drying cavity 32 of the drying tank 31. The main function of the bearing 33 is to bear the quartz boat 200 after cleaning to ensure that the quartz boat 200 remains stable during the drying process.

[0044] Meanwhile, the bearing 33 also has the function of measuring the weight of the quartz boat 200, which is helpful to monitor the weight change of the quartz boat 200 during the drying process and thus to judge the drying effect. In addition, the design of the bearing 33 should consider the size, shape, and weight of the quartz boat 200 to ensure that the bearing 33 can stably bear the quartz boat 200 and avoid displacement or falling during the drying process.

[0045] The drying piece is a core component in the drying assembly 3, and the main function of the drying piece is to use hot air or other drying methods to rapidly evaporate the moisture on the surface of the cleaned quartz boat 200, so that the quartz boat 200 reaches a dry state. The high-efficiency drying function of the drying piece not only can improve the production efficiency, but also can reduce the influence of moisture on the quartz boat 200 and the silicon wafer in the subsequent process, so as to ensure the quality of the silicon wafer.

[0046] Therefore, the cleaning mechanism 100 provided by the embodiments of the present application can perform the cleaning and drying steps of the quartz boat 200 through the cleaning assembly 2 and the drying assembly 3. While the quartz boat 200 is being dried, the carrier 33 can measure the weight of the quartz boat 200. The weight of the quartz boat 200 before cleaning is compared with the weight of the quartz boat 200 during drying. When the two are the same, it means that the quartz boat 200 is completely dried. By ensuring that the quartz boat 200 is completely dried, the impurities or pollutants carried by the quartz boat 200 that is not completely dried are prevented from polluting the silicon wafer, thereby ensuring the quality of the silicon wafer carried by the quartz boat 200.

[0047] Please refer to Figure 1 and Figure 2 , Figure 2 The structure schematic view of the carrier 33 provided by the embodiments of the present application in the second position. In some embodiments, the quartz boat 200 includes a first surface 201 and a second surface 202, the carrier 33 includes a first carrying surface 3311 and a second carrying surface 3321, and the carrier 33 can rotate between the first position and the second position. When the carrier 33 rotates to the first position, the first surface 201 and the first carrying surface 3311 are in contact, and there is a gap between the second surface 202 and the second carrying surface 3321. When the carrier 33 rotates to the second position, the second surface 202 and the second carrying surface 3321 are in contact, and there is a gap between the first surface 201 and the first carrying surface 3311.

[0048] The first surface 201 and the second surface 202 of the quartz boat 200 correspond to the first carrying surface 3311 and the second carrying surface 3321 of the carrier 33 respectively, and the carrier 33 has a rotating function and can rotate between the first position and the second position.

[0049] Specifically, in the first position, the first surface 201 of the quartz boat 200 is in close contact with the first carrying surface 3311, and the second surface 202 maintains a certain gap with the second carrying surface 3321, so that the space between the second surface 202 and the second carrying surface 3321 is conducive to the heat transfer and gas flow of the drying piece.

[0050] Similarly, when the carrier 33 rotates to the second position, the second surface 202 is in close contact with the second carrier surface 3321, while the first surface 201 forms a gap with the first carrier surface 3311. This transition ensures that the first surface 201, which may have been affected by the gap, can also receive uniform heat distribution.

[0051] Through this rotation mechanism, both surfaces of the quartz boat 200 can have a gap with the carrier surface at different time periods, ensuring that each surface of the quartz boat 200 can receive heat emitted by the drying element during the drying process, effectively eliminating dead angles caused by abutting the carrier surface during the drying process, improving drying efficiency and uniformity, and optimizing heat transfer and gas flow conditions, further enhancing the drying effect.

[0052] Please refer to Figure 1 and Figure 2 In some embodiments, the angle a between the first carrier surface 3311 and the second carrier surface 3321 satisfies: 90° < a < 180°.

[0053] Firstly, 90° < a < 180° ensures that when the carrier 33 rotates between the first position and the second position, both surfaces of the quartz boat 200 can have the opportunity to be in close contact with the corresponding carrier surface, while the other surface forms a suitable gap with the other carrier surface. This helps to promote heat transfer and gas flow through the gap, providing better heat distribution conditions for the drying process.

[0054] Secondly, the angle range of 90° < a < 180° allows the carrier 33 to achieve smooth transition during rotation, avoiding the problems of mechanical stress concentration or poor movement caused by excessive or insufficient angle. This helps to prolong the service life of the carrier 33 and reduce downtime caused by mechanical failure.

[0055] In some embodiments, the drying assembly 3 further comprises a driving member connected with the carrier 33, the driving member being capable of driving the carrier 33 to rotate between the first position and the second position.

[0056] The driving member is connected with the carrier 33 and can control the carrier 33 to rotate between the first position and the second position, improving the automation level of the drying process. Without manual operation of the carrier 33, the carrier 33 can be driven to rotate smoothly, ensuring the continuity and stability of the drying process. At the same time, the rapid response capability of the driving member can also shorten the drying period, so that the efficiency of the drying is improved.

[0057] In addition, the driving member drives the carrier 33 to rotate, so that each surface of the quartz boat 200 can have a gap with the carrier surface at different time periods, thereby ensuring that the time for the first surface 201 to have a gap with the first carrier surface 3311 is equal to the time for the second surface 202 to have a gap with the second carrier surface 3321, and ensuring the uniformity of the drying.

[0058] Please refer to Figure 1 and Figure 2 In some embodiments, the cleaning mechanism 100 further comprises a first weighing member 1 for measuring the weight of the quartz boat 200 before cleaning. The carrier 33 comprises a first scale 331 and a second scale 332 connected to each other, the first carrier surface 3311 being the weighing surface of the first scale 331, and the second carrier surface 3321 being the weighing surface of the second scale 332.

[0059] The first weighing member 1 is used to measure the weight of the quartz boat 200 before cleaning, to provide accurate initial data for the subsequent cleaning process, so as to evaluate the drying effect of the quartz boat 200 by comparing the weight change of the quartz boat 200 before cleaning and after drying, and to ensure that the quartz boat 200 is fully dried.

[0060] Optionally, the first weighing member 1 can be an element capable of measuring the weight of the quartz boat 200 before cleaning, such as a weighing sensor and an electronic scale, and the present application does not limit the same.

[0061] Specifically, the carrier 33 is composed of two connected parts: the first scale 331 and the second scale 332. The first scale 331 is a part of the carrier 33, and the first carrier surface 3311 is the weighing surface of the first scale 331. This means that when the carrier 33 is in the first position, the first surface 201 of the quartz boat 200 can be in contact with the first carrier surface 3311, thereby achieving stable support. The weighing function of the first scale 331 can also ensure that the weight of the quartz boat 200 is monitored in real time during the drying process, so as to determine whether the quartz boat 200 is dried.

[0062] The second scale 332 is also a component of the carrier 33, and the second carrier surface 3321 is the weighing surface of the second scale 332. When the carrier 33 is rotated to the second position, the second surface 202 of the quartz boat 200 will be in contact with the second carrier surface 3321, ensuring that the quartz boat 200 can also achieve stable support on this surface. Similar to the first scale 331, the second scale 332 also has weighing capability, and can accurately record the weight change of the object during the drying process.

[0063] In this way, the quartz boat 200 can be weighed to determine whether the quartz boat 200 is dried to completion, regardless of whether the carrier 33 is rotated to the first position or the second position. Thus, the work of the drying device can be stopped after drying is completed, which can save energy while ensuring the drying effect.

[0064] Referring to Figure 3 , Figure 3 A structure diagram of the cleaning assembly 2 provided by the embodiment of the present application is shown in the figure. In some embodiments, the cleaning assembly 2 includes a first cleaning tank 21, a second cleaning tank 22, and a buffer tank 23. The first cleaning tank 21 and the second cleaning tank 22 are provided with cleaning solutions. The concentration of the cleaning solution in the first cleaning tank 21 is higher than that of the cleaning solution in the second cleaning tank 22. A first connecting pipeline 24 is connected between the first cleaning tank 21 and the buffer tank 23. A first on-off valve 241 is arranged in the first connecting pipeline 24 and is used to control the opening and closing of the first connecting pipeline 24. A second connecting pipeline 25 is connected between the second cleaning tank 22 and the buffer tank 23. A second on-off valve 251 is arranged in the second connecting pipeline 25 and is used to control the opening and closing of the second connecting pipeline 25.

[0065] It can be understood that the first cleaning tank 21 and the second cleaning tank 22 are both used to clean the quartz boat 200. The first cleaning tank 21 and the second cleaning tank 22 are provided with cleaning solutions. The concentration of the cleaning solution in the first cleaning tank 21 is higher than that of the cleaning solution in the second cleaning tank 22.

[0066] Specifically, the first cleaning tank 21 can be used to clean the boron-doped quartz boat 200, and the required concentration of the cleaning solution is high, and the cleaning solution can be used for a lower number of cleaning times. The cleaning solution in the first cleaning tank 21 can be composed of 64L of 37% hydrochloric acid, 128L of 40% hydrofluoric acid, and 1208L of water. The second cleaning tank 22 can be used to clean the annealed quartz boat 200. The annealed quartz boat 200 requires a low concentration of cleaning solution during the cleaning process, and the cleaning solution can be used for a longer number of cleaning times. The cleaning solution in the second cleaning tank 22 can be composed of 32L of 37% hydrochloric acid, 64L of 40% hydrofluoric acid, and 1304L of water.

[0067] Since the boron-diffused quartz boat 200 still has a small amount of boron residue after cleaning, if the cleaning solution used to clean the boron-diffused quartz boat 200 is used to clean the annealed quartz boat 200, the annealed quartz boat 200 will be contaminated, thereby causing contamination of the silicon wafer. However, the cleaning solution used to clean the annealed quartz boat 200 can be treated to continue cleaning the boron-diffused quartz boat 200. It can be understood that the buffer tank 23 is in communication with the first cleaning tank 21 and the second cleaning tank 22, so that the cleaning solution in the second cleaning tank 22 can be input into the buffer tank 23. After adjusting the concentration of the cleaning solution in the buffer tank 23, the adjusted cleaning solution is input into the first cleaning tank 21.

[0068] In this way, the provision of the buffer tank 23 can realize the reuse of the cleaning solution, thereby achieving the purpose of saving the cleaning solution and improving the cleaning efficiency of the cleaning mechanism 100.

[0069] In addition, the provision of the first switch valve 241 can control the flow of the cleaning solution in the buffer tank 23 into the first cleaning tank 21, and the provision of the second switch valve 251 can control the flow of the cleaning solution in the second cleaning tank 22 into the buffer tank 23. In this way, it can be ensured that the mixing of different cleaning solutions will not cause the contamination of the clean cleaning solution.

[0070] Please refer to Figure 3 In some embodiments, the cleaning assembly 2 further comprises a third cleaning tank 26, which is used to clean the quartz boat 200 after being cleaned by the first cleaning tank 21 or the second cleaning tank 22.

[0071] It can be understood that the third cleaning tank 26 can be filled with deionized water or distilled water to ensure that the third cleaning tank 26 is free of impurities and contaminants. The third cleaning tank 26 is used to clean the quartz boat 200 after being cleaned by the first cleaning tank 21 or the second cleaning tank 22. The deionized water or distilled water in the third cleaning tank 26 can effectively flush away the cleaning solution remaining on the surface of the quartz boat 200, including any possible residual chemicals, thereby avoiding adverse effects on subsequent processes or the quartz boat 200 itself.

[0072] Please refer to Figure 4 , Figure 4 The structure of the cover plate 27 provided in the embodiments of the present application is shown in the schematic view. In some embodiments, the cleaning mechanism 100 further comprises at least two cover plates 27, which are movably arranged at the openings of the first cleaning tank 21 and the second cleaning tank 22, respectively, to open or close the first cleaning tank 21 and the second cleaning tank 22. A condensation pipeline 271 is arranged on the cover plate 27. The condensation pipeline 271 is internally provided with a cooling medium, which is used to condense the cleaning solution volatilized in the first cleaning tank 21 and the second cleaning tank 22.

[0073] At least two cover plates 27 are movably arranged at the openings of the first cleaning tank 21 and the second cleaning tank 22 respectively. The cover plates 27 can be opened or closed according to the needs, and the closed state of the cover plates 27 can effectively prevent the volatilization of the cleaning solution during the cleaning process, thereby reducing the waste of the cleaning solution.

[0074] Meanwhile, the cover plates 27 can also protect the safety of the operators. During the cleaning process, especially when high-concentration or corrosive cleaning solution is used, the closing of the cover plates 27 can prevent the solution from directly contacting the operators, thereby reducing the safety hazards.

[0075] A condensing pipeline 271 is arranged on the cover plate 27, and the condensing pipeline 271 is filled with a cooling medium. When the cleaning solution in the first cleaning tank 21 or the second cleaning tank 22 is heated and volatilized, the volatilized gas will quickly condense into liquid when it meets the cooling medium in the condensing pipeline 271, thereby falling back into the first cleaning tank 21 or the second cleaning tank 22, avoiding the waste of the cleaning solution and reducing the emission of harmful gas. The cleaning solution recovered by condensation can be reused, thereby reducing the consumption of new cleaning solution.

[0076] Optionally, the condensing pipeline 271 can be made of polyvinyl chloride, polypropylene, polytetrafluoroethylene or other corrosion-resistant and heat-conducting materials, which are not limited in the embodiments of the present application.

[0077] In some embodiments, the drying member comprises: an air supply member arranged in the drying cavity 32, and the air supply member is configured to blow drying air to the quartz boat 200 to dry the cleaning solution on the surface of the quartz boat 200.

[0078] The air supply member can quickly remove the moisture on the surface of the quartz boat 200 by generating high-speed and high-temperature drying air, thereby accelerating the evaporation process of the cleaning solution and the moisture. The drying efficiency of the quartz boat 200 is improved, and the surface corrosion or pollution of the quartz boat 200 caused by long-term exposure to a humid environment can be avoided.

[0079] Meanwhile, the air supply member also has the characteristics of energy saving and consumption reduction. By optimizing the air supply path and air flow distribution, unnecessary energy consumption is reduced, and the energy utilization efficiency of the entire drying process is improved.

[0080] Further, the cleaning method of the quartz boat 200 is as follows:

[0081] Firstly, the quartz boat 200 is placed on the first weighing member 1 to obtain the weight of the quartz boat 200 before cleaning.

[0082] Secondly, the quartz boat 200 is put into the first cleaning tank 21, the cover plate 27 on the first cleaning tank 21 is closed, and soaking is performed for a predetermined time. The predetermined time can be 2-3 hours, and the condenser line 271 on the cover plate 27 is supplied with cooling medium during soaking, and the temperature of the cooling medium can be 2-5℃.

[0083] Then, the cover plate 27 on the first cleaning tank 21 is opened, the quartz boat 200 is transferred from the first cleaning tank 21 to the third cleaning tank 26, and soaking is performed for a predetermined time. The predetermined time can be 15-25 minutes.

[0084] Next, the quartz boat 200 is transferred from the third cleaning tank 26 to the drying tank 31, the carrier 33 is controlled to rotate to the first position, drying is performed for 30 minutes, then the carrier 33 is controlled to rotate to the second position, drying is performed for 20 minutes, and the weight of the quartz boat 200 during drying is monitored at the same time.

[0085] Finally, it is determined whether the weight of the quartz boat 200 during drying is equal to the weight of the quartz boat 200 before cleaning. If yes, the drying is completed, and the quartz boat 200 is taken out of the drying tank 31; if no, the drying of the quartz boat 200 is continued until the weight of the quartz boat 200 is equal to the weight of the quartz boat 200 before cleaning.

[0086] In addition, the method for processing the cleaning medium in the buffer tank 23 is as follows:

[0087] Firstly, the cleaning solution used in the second cleaning tank 22 for 30 days is input into the buffer tank 23.

[0088] Then, the cleaning solution in the buffer tank 23 is adjusted according to the original proportion of 75%.

[0089] Finally, the adjusted cleaning solution is input into the first cleaning tank 21 for use.

[0090] The second aspect of the application discloses a cleaning device, comprising a cleaning mechanism 100. Since the cleaning device provided by the embodiment of the application comprises the cleaning mechanism 100 provided by the first aspect of the application, the cleaning device has the beneficial effects of any of the cleaning mechanisms 100 described above, which will not be repeated here.

[0091] Finally, it should be noted that: the above embodiments are only used to illustrate the technical solutions of the application, but not to limit them; although the application has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that they can still modify the technical solutions recorded in the foregoing embodiments, or make equivalent replacement for part or all of the technical features; and these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the scope of the technical solutions of the embodiments of the application.

Claims

1. A cleaning mechanism for cleaning a quartz boat, characterized by, The cleaning mechanism comprises: a cleaning assembly for cleaning the quartz boat; a drying assembly comprising a drying tank, a drying piece and a bearing piece, an inner part of the drying tank is formed with a drying cavity, the bearing piece is arranged in the drying cavity, the bearing piece is used for bearing the quartz boat and capable of measuring the weight of the quartz boat, the drying piece is arranged in the drying cavity, and the drying piece is used for drying the cleaned quartz boat.

2. The cleaning mechanism according to claim 1, wherein the quartz boat comprises a first surface and a second surface, the bearing piece comprises a first bearing surface and a second bearing surface, and the bearing piece is rotatable between a first position and a second position; when the bearing piece is rotated to the first position, the first surface and the first bearing surface are in contact, and a gap exists between the second surface and the second bearing surface; when the bearing piece is rotated to the second position, the second surface and the second bearing surface are in contact, and a gap exists between the first surface and the first bearing surface.

3. The cleaning mechanism of claim 2, wherein, an included angle a between the first bearing surface and the second bearing surface satisfies 90° < a < 180°.

4. The cleaning mechanism of claim 2, wherein the drying assembly further comprises a driving piece connected with the bearing piece, and the driving piece is capable of driving the bearing piece to rotate between the first position and the second position.

5. The cleaning mechanism according to claim 2, wherein the cleaning mechanism further comprises a first weighing piece for measuring the weight of the quartz boat before cleaning; the bearing piece comprises a first scale and a second scale connected with each other, the first bearing surface is a weighing surface of the first scale, and the second bearing surface is a weighing surface of the second scale.

6. The cleaning mechanism of claim 2, wherein the cleaning assembly comprises: a first cleaning tank, a second cleaning tank and a buffer tank, the first cleaning tank and the second cleaning tank are arranged with cleaning solution, and the concentration of the cleaning solution in the first cleaning tank is greater than that in the second cleaning tank; a first connecting pipeline connected between the first cleaning tank and the buffer tank; a first on-off valve arranged in the first connecting pipeline and used for controlling the opening and closing of the first connecting pipeline; a second connecting pipeline connected between the second cleaning tank and the buffer tank; a second on-off valve arranged in the second connecting pipeline and used for controlling the opening and closing of the second connecting pipeline.

7. The cleaning mechanism of claim 6, wherein the cleaning assembly further comprises: a third cleaning tank used for cleaning the quartz boat after cleaning by the first cleaning tank or the second cleaning tank.

8. The cleaning mechanism of claim 6, wherein, the cleaning mechanism further comprises: at least two cover plates movably arranged at openings of the first cleaning tank and the second cleaning tank respectively, so as to open or close the first cleaning tank and the second cleaning tank; a condensing pipeline arranged in the cover plate, an inner part of the condensing pipeline is arranged with cooling medium, and the cooling medium is used for condensing the cleaning solution volatilized in the first cleaning tank and the second cleaning tank.

9. The cleaning mechanism of claim 6, wherein, the drying piece comprises: An air supply member is arranged in the drying cavity, and is used to blow drying air to the quartz boat to dry the cleaning solution on the surface of the quartz boat.

10. A cleaning apparatus characterized by, The cleaning mechanism as claimed in any one of claims 1 to 9.

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