Centrifugal silicon wafer spin dryer with protection structure

Abstract

The centrifugal silicon wafer spin dryer with the protection structure comprises a bottom box, a sealing cover is detachably arranged at the top of the bottom box, a waterproof motor is installed at the inner bottom of the bottom box, and an output shaft of the waterproof motor is connected with a fastening disc; the material carrying plate is detachably connected with the fastening disc; the protection structure comprises a cushion block and a U-shaped frame which are mounted at the top of the material carrying plate, a waterproof electric push rod arranged at the inner top of the U-shaped frame, a pressing plate arranged at the output end of the waterproof electric push rod, and a plurality of pressing heads arranged at the bottom of the pressing plate; the fixing column is arranged at the bottom of the sealing cover; the first sealing ring is arranged on the outer wall of the fixing column; the second sealing ring is arranged on the inner wall of the bottom box; the utility model has the beneficial effects that through the designed protection structure, the silicon wafer can be quickly stabilized, the silicon wafer is effectively prevented from being separated in the spin-drying process, the protection performance is better achieved, and the product quality and the production efficiency are improved.

Description

Technical Field

[0001] This utility model belongs to the technical field of silicon wafer spin dryers, specifically relating to a centrifugal silicon wafer spin dryer with a protective structure. Background Technology

[0002] In semiconductor manufacturing processes, silicon wafer spin dryers play a crucial role. They are mainly used to perform efficient and non-destructive drying of cleaned silicon wafers to ensure the cleanliness of the wafer surface and provide a reliable guarantee for subsequent processes.

[0003] For example, the fully automatic silicon wafer spin dryer disclosed in patent publication number CN220229781U includes a base box and a cover disposed at the top opening of the base box. The inner cavity of the base box is provided with a loading component for clamping and positioning the silicon wafers to be spin-dried. A drive component is disposed on the bottom surface of the base box and below the loading component. The output end of the drive component is connected to the loading component through a positioning screw to drive the loading component to rotate at high speed, thereby centrifugally spinning off the liquid on the surface of the silicon wafers on the loading component. A touch screen is disposed on the outer wall surface of the base box. However, in the prior art, during the silicon wafer spin-drying process, the silicon wafers rely only on simple clamping and positioning. At high speeds, there is still a risk that the silicon wafers will detach from the loading component, which cannot provide sufficient protection for the silicon wafers and may lead to damage to the silicon wafers, affecting product quality and production efficiency. Utility Model Content

[0004] The purpose of this invention is to provide a centrifugal silicon wafer spin dryer with a protective structure. Through the designed protective structure, the silicon wafers to be spin-dried can be quickly and firmly stabilized, preventing the silicon wafers from detaching during the spin-drying process, thus better protecting them and improving the spin-drying effect and product quality.

[0005] To achieve the above objectives, this utility model provides the following technical solution: a centrifugal silicon wafer dryer with a protective structure, comprising...

[0006] The bottom box has a detachable cover on its top and a waterproof motor installed at the bottom inside the bottom box, with the output shaft of the waterproof motor connected to a fastening plate.

[0007] A material carrier plate, which is detachably connected to a fastening disc;

[0008] The protective structure includes a pad and a U-shaped frame installed on the top of the material carrier plate, a waterproof electric push rod set inside the top of the U-shaped frame, a pressure plate set at the output end of the waterproof electric push rod, and multiple pressure heads set at the bottom of the pressure plate.

[0009] Preferably, it also includes a fixing post disposed at the bottom of the cover and a first sealing ring disposed on the outer wall of the fixing post.

[0010] Preferably, it also includes a second sealing ring installed on the inner wall of the base box, and the second sealing ring can fit tightly with the first sealing ring.

[0011] Preferably, it also includes fastening legs symmetrically arranged at the bottom of the base box, and a drain pipe arranged at the bottom of the base box and communicating with the inside of the base box.

[0012] Preferably, it also includes a base box, the fastening legs are installed on the top of the base box, and the interior of the base box has a through hole through which water supply and drainage pipes pass.

[0013] Preferably, the bottom box is equipped with a collection box inside, a control valve is installed on the drain pipe, and a touch screen all-in-one machine is installed on the outer wall of the bottom box.

[0014] Preferably, the bottom of the collection box is provided with an extension plate, the bottom of the bottom box is provided with a sliding groove for the extension plate to slide, and the front surface of the bottom box is hinged with a box door.

[0015] Compared with the prior art, the beneficial effects of this utility model are:

[0016] The designed protective structure can quickly and securely hold the silicon wafers, effectively preventing them from detaching during the spin-drying process, thus providing better protection and improving product quality and production efficiency. Attached Figure Description

[0017] Figure 1 This is a schematic diagram of the structure of this utility model;

[0018] Figure 2 This is a schematic diagram of a partial cross-sectional view of the present invention.

[0019] Figure 3 For the present utility model Figure 2 A magnified schematic diagram of region D in the diagram;

[0020] Figure 4 For the present utility model Figure 2 A schematic diagram of the enlarged structure of region G in the diagram;

[0021] In the diagram: 1. Base box; 11. Box door; 12. Slide groove; 2. Base box; 21. Fastening leg; 22. Touch screen all-in-one machine; 23. Drain pipe; 230. Control valve; 24. Second sealing ring; 3. Cover; 31. Fixing column; 4. Collection box; 41. Extension plate; 5. Waterproof motor; 51. Fastening plate; 6. Carrying plate; 61. U-shaped frame; 610. Waterproof electric push rod; 62. Pad; 7. Pressure plate; 71. Pressure head; 8. First sealing ring. Detailed Implementation

[0022] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0023] Example 1

[0024] Please see Figures 1-4 This is the first embodiment of the present invention, which provides a centrifugal silicon wafer dryer with a protective structure, including...

[0025] The bottom box 2 has a cover 3 that can be detached and installed on its top. The cover 3 and the bottom box 2 are spliced ​​together to increase the protective performance. When the cover 3 is opened, it increases the convenience of use. A waterproof motor 5 is installed in the center of the bottom of the bottom box 2, which realizes the stable installation of the waterproof motor 5. The output shaft of the waterproof motor 5 is connected to a fastening plate 51. Starting the waterproof motor 5 can drive the fastening plate 51 to rotate.

[0026] The material carrier plate 6 is detachably connected to the fastening plate 51. When the waterproof motor 5 drives the fastening plate 51 to rotate, it can drive the material carrier plate 6 to rotate.

[0027] The protective structure includes a pad 62 and a U-shaped frame 61 installed on top of the carrier plate 6. The addition of the pad 62 and U-shaped frame 61 allows the silicon wafers to be spun dry to be placed on the pad 62. A waterproof electric push rod 610 is installed at the top inside the U-shaped frame 61. A pressure plate 7 is located at the output end of the waterproof electric push rod 610. When the waterproof electric push rod 610 is activated, it drives the pressure plate 7 to rise and fall. Multiple pressure heads 71 ​​are located at the bottom of the pressure plate 7. When the pressure plate 7 rises and falls, it drives the pressure heads 71 ​​to rise and fall. When the pressure heads 71 ​​descend, they press the silicon wafers onto the pad 62, quickly and firmly securing the silicon wafers and effectively preventing them from detaching during the spun dry process. This provides better protection, improves product quality, and increases production efficiency.

[0028] In this embodiment, preferably, a fixing post 31 is also provided at the bottom of the cover 3, thereby adding the fixing post 31, and a first sealing ring 8 is provided on the outer wall of the fixing post 31, thereby adding the first sealing ring 8.

[0029] In this embodiment, preferably, a second sealing ring 24 is also installed on the inner wall of the bottom box 2, which realizes the addition of the second sealing ring 24, and the second sealing ring 24 can be tightly fitted with the first sealing ring 8. The tight fit between the second sealing ring 24 and the first sealing ring 8 further increases the sealing performance of the splicing of the cover 3 and the bottom box 2.

[0030] In this embodiment, preferably, it also includes fastening legs 21 symmetrically arranged at the bottom of the bottom box 2 to increase the support for the bottom box 2, and a drain pipe 23 arranged at the bottom of the bottom box 2 and communicating with the inside of the bottom box 2 to drain the water inside the bottom box 2.

[0031] Example 2

[0032] Please see Figures 1-4 This is the second embodiment of the present invention, which is based on the previous embodiment, but differs in that:

[0033] It also includes a base box 1, with fastening legs 21 mounted on top of the base box 1 to provide support for the fastening legs 21. The base box 1 has an internal through-hole for water supply and drainage pipes 23. A collection box 4 is installed inside the base box 1, allowing discharged water to fall into and be collected. A control valve 230 is installed on the drain pipe 23 to control its opening and closing. A touch screen all-in-one machine 22 and a waterproof motor 5 are mounted on the outer wall of the base box 2. The control valve 230 and the waterproof electric push rod 610 are all electrically connected to the touch screen all-in-one machine 22, which increases the convenience of using the touch screen all-in-one machine 22. The bottom of the collection box 4 is provided with an extension plate 41, which realizes the addition of the extension plate 41. The bottom of the bottom of the base box 1 is provided with a sliding groove 12 for the extension plate 41 to slide. With the cooperation of the extension plate 41 and the sliding groove 12, the convenience of placing and taking out the collection box 4 for centralized cleaning is increased. The front surface of the base box 1 is hinged with a box door 11, which can be opened and closed.

[0034] The working principle and usage process of this utility model: Open the cover 3, place the silicon wafer that needs to be spun dry on the pad 62 on the top of the carrier plate 6, and ensure that the silicon wafer is in an accurate position and is located at the corresponding position below the pressure head 71.

[0035] After placing the silicon wafer, close the cover 3, insert the fixing post 31 at the bottom of the cover 3 into the bottom box 2, and ensure that the first sealing ring 8 and the second sealing ring 24 fit tightly to ensure sealing performance; start the waterproof electric push rod 610 through the touch screen 22, which drives the pressure plate 7 and the pressure head 71 to descend and press the silicon wafer onto the pad 62 for stability; then start the waterproof motor 5 through the touch screen 22, which drives the fastening plate 51 to rotate, thereby driving the carrier plate 6 to rotate at high speed to centrifuge and throw out the liquid on the surface of the silicon wafer;

[0036] During the spin-drying process, the liquid spun out is discharged through the drain pipe 23 at the bottom of the bottom box 2. The control valve 230 is opened, and the liquid falls into the collection box 4 in the bottom box 1 through the drain pipe 23 for collection. After spin-drying is completed, the waterproof motor 5 is turned off first through the touch screen 22. After the material carrier plate 6 has completely stopped rotating, the waterproof electric push rod 610 is started to raise and reset the pressure plate 7 and the pressure head 71. The cover 3 is opened and the spin-dried silicon wafers are taken out. The box door 11 is opened periodically, and the collection box 4 is pulled out for cleaning through the cooperation of the extension plate 41 and the slide 12. After the collected waste liquid is poured out, the collection box 4 is pushed back to its original position.

[0037] Although embodiments of the present invention have been shown and described in detail above, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the present invention, the scope of which is defined by the appended claims and their equivalents.

Claims

1. A centrifugal spin-dryer for silicon wafers with a protective structure, characterized in that: include The bottom box (2) has a cover (3) that can be detached from the top. A waterproof motor (5) is installed at the bottom inside the bottom box (2), and the output shaft of the waterproof motor (5) is connected to a fastening plate (51). Material carrier plate (6), which is detachably connected to fastening plate (51); The protective structure includes a pad (62) and a U-shaped frame (61) installed on the top of the material carrier plate (6), a waterproof electric push rod (610) set inside the top of the U-shaped frame (61), a pressure plate (7) set at the output end of the waterproof electric push rod (610), and multiple pressure heads (71) set at the bottom of the pressure plate (7).

2. A centrifugal spin-rinse-dry machine with protective structure for silicon wafers as claimed in claim 1, characterized in that: It also includes a fixing post (31) set at the bottom of the cover (3) and a first sealing ring (8) set on the outer wall of the fixing post (31).

3. A centrifugal spin-rinse-dry machine with protective structure for silicon wafers as claimed in claim 2, characterized in that: It also includes a second sealing ring (24) installed on the inner wall of the bottom box (2), and the second sealing ring (24) can fit tightly with the first sealing ring (8).

4. The centrifugal spin-dryer with protective structure for silicon wafers according to claim 1, characterized in that: It also includes fastening legs (21) symmetrically arranged at the bottom of the base box (2) and a drain pipe (23) arranged at the bottom of the base box (2) and communicating with the inside of the base box (2).

5. A centrifugal spin-rinse-dry machine with protective structure for silicon wafers as claimed in claim 4, characterized in that: It also includes a base box (1), the fastening leg (21) is installed on the top of the base box (1), and the interior of the base box (1) has a through hole through which the water supply and drainage pipe (23) passes.

6. A centrifugal spin-rinse-dry machine with protective structure for silicon wafers as claimed in claim 5, characterized in that: The bottom box (1) is equipped with a collection box (4), the drain pipe (23) is equipped with a control valve (230), and the outer wall of the bottom box (2) is equipped with a touch screen all-in-one machine (22).

7. A centrifugal spin-rinse-dry machine with protective structure for silicon wafers as claimed in claim 6, characterized in that: The bottom of the collection box (4) is provided with an extension plate (41), and the bottom of the base box (1) is provided with a sliding groove (12) for the extension plate (41) to slide. The front surface of the base box (1) is hinged with a box door (11).

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