DFN2510 anti-layering framework
By setting a stepped structure on the DFN2510 frame to form a narrow connecting rib, the delamination problem between the DFN2510 frame and the insulating dielectric layer during molding and cutting is solved, thereby improving the bonding strength and product quality.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- SHANGHAI TRS MICROELECTRONICS CO LTD
- Filing Date
- 2025-04-22
- Publication Date
- 2026-04-28
AI Technical Summary
The DFN2510 frame and insulating dielectric layer are prone to delamination during molding and cutting, leading to a decline in product quality.
A stepped structure is set at the long edge of the DFN2510 frame to form a narrowed connecting rib opening, which extends to the inside through the connecting rib to increase the bonding area and strength with the insulating dielectric layer, disperse stress, and offset external impact.
This effectively improved the bonding strength between the DFN2510 frame and the insulating dielectric layer, reduced the risk of delamination, and improved product quality.
Smart Images

Figure CN224178602U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of semiconductor packaging technology, and in particular to a DFN2510 anti-delamination frame. Background Technology
[0002] Please see the appendix Figure 1 A connecting rib 2 is provided at the edge of the DFN2510 frame 1. The distance between the two connecting ribs 2 in the middle of the long side of the DFN2510 frame 1 is relatively large, making the connecting rib opening 20 in the middle of the long side of the DFN2510 frame 1 longer.
[0003] When the DFN2510 frame 1 is composite-molded with the insulating dielectric layer, the bonding strength between the DFN2510 frame 1 and the insulating dielectric layer is relatively low. Delamination may occur due to factors such as improper process control weakening the interlayer bonding force or causing mechanical / thermal stress concentration. Delamination may also occur during product cutting due to cutting vibration, thus reducing product quality. Therefore, there is a need to provide a DFN2510 anti-delamination frame that can solve the problem of delamination defects that may occur between the DFN2510 frame and the insulating dielectric layer during molding and cutting in the existing technology. Summary of the Invention
[0004] The purpose of this invention is to provide a DFN2510 anti-delamination frame that can solve the problem of delamination defects that may occur between the DFN2510 frame and the insulating dielectric layer during molding and cutting in the prior art.
[0005] This utility model is implemented as follows:
[0006] A DFN2510 anti-delamination frame includes a DFN2510 frame and connecting ribs formed at the edges of the DFN2510 frame; a stepped structure is formed at the long edge of the DFN2510 frame, one end of the stepped structure is connected to the edge of the hollow part on the DFN2510 frame, and the other end of the stepped structure extends to the connecting rib opening in the middle of the long side of the DFN2510 frame; a pair of stepped structures are symmetrically arranged on both sides of the connecting rib opening, so that the connecting rib opening is narrowed by the pair of stepped structures.
[0007] The stepped structure is Z-shaped, with one end flush with the edge of the hollowed-out part on the DFN2510 frame, the other end perpendicular to the long side of the DFN2510 frame, and the middle part of the stepped structure diagonally connecting the two ends.
[0008] The step structure has a length of 0.025 mm at one end and 0.050 mm at the other end, and the inclination angle of the middle part of the step structure is 108.43°.
[0009] The two connecting ribs located in the middle of the long side of the DFN2510 frame extend to the inside of the narrow connecting rib opening, that is, the distance between the two connecting ribs is less than the distance between the other ends of a pair of stepped structures.
[0010] The stepped structure and the DFN2510 frame are an integral structure.
[0011] The DFN2510 frame is provided with an electroplated layer.
[0012] Compared with the prior art, this utility model has the following advantages:
[0013] Because this utility model has a stepped structure, a pair of stepped structures form a narrowed connecting rib opening in the middle of the long side of the DFN2510 frame. At the same time, the width of the connecting rib opening is reduced by extending the connecting rib to the inside of the narrowed connecting rib opening. This can effectively increase the bonding area and bonding strength between the DFN2510 frame and the insulating dielectric layer, disperse stress during the molding process, and offset the impact of external forces during the cutting process, thereby reducing the risk of delamination and improving product quality. Attached Figure Description
[0014] Figure 1 This is the main view of the existing DFN2510 framework;
[0015] Figure 2 This is the front view of the DFN2510 anti-delamination frame of this utility model.
[0016] In the diagram, there is a 1DFN2510 frame, 11 openwork sections, 2 connecting ribs, 20 connecting rib openings, 3 stepped structure, and 4 narrowed connecting rib openings. Detailed Implementation
[0017] The present invention will be further described below with reference to the accompanying drawings and specific embodiments.
[0018] Please see the appendix Figure 2 A DFN2510 anti-delamination frame includes a DFN2510 frame 1 and a connecting rib 2 formed at the edge of the DFN2510 frame 1; a stepped structure 3 is formed at the long edge of the DFN2510 frame 1, one end of the stepped structure 3 is connected to the edge of the hollow part 11 on the DFN2510 frame 1, and the other end of the stepped structure 3 extends to the connecting rib opening in the middle of the long side of the DFN2510 frame 1; a pair of stepped structures 3 are symmetrically arranged on both sides of the connecting rib opening, so that the connecting rib opening is formed into a narrowed connecting rib opening 4 through the pair of stepped structures 3.
[0019] By setting a pair of stepped structures 3, the width of the narrowed connecting rib opening 4 is smaller than the width of the connecting rib opening 20 in the prior art, which increases the contact area and bonding strength between the DFN2510 frame 1 and the insulating dielectric layer. This effectively disperses the stress between the DFN2510 frame 1 and the insulating dielectric layer during the molding process, and offsets the impact of vibration during product cutting. This effectively avoids the product delamination problem and improves product quality.
[0020] Please see the appendix Figure 2 The step structure 3 is in the shape of a "Z" so that one end of the step structure 3 is flush with the edge of the hollow part 11 on the DFN2510 frame 1, the other end of the step structure 3 is perpendicular to the long side of the DFN2510 frame 1, and the middle part of the step structure 3 is obliquely connected between the two ends of the step structure 3.
[0021] The structure and dimensions of the stepped structure 3 can be adapted to actual needs to ensure sufficient bonding force between the DFN2510 frame 1 and the insulating dielectric layer, and to prevent delamination during molding and cutting.
[0022] Preferably, the length of one end of the stepped structure 3 is 0.025 mm, the length of the other end of the stepped structure 3 is 0.050 mm, and the inclination angle of the middle part of the stepped structure 3 is 108.43°, which enables the DFN2510 frame 1 to achieve the best stress dispersion and external impact offset effect, thereby effectively avoiding the delamination problem.
[0023] Please see the appendix Figure 2 The two connecting ribs 2 located in the middle of the long side of the DFN2510 frame 1 extend to the inside of the narrow connecting rib opening 4, that is, the distance between the two connecting ribs 2 is less than the distance between the other ends of the pair of stepped structures 3.
[0024] The spacing of the connecting ribs 2 at the narrow connecting rib opening 4 of this utility model is smaller than the width of the connecting rib opening 20 in the prior art. This is beneficial for dispersing stress during the forming process of the DFN2510 frame 1 and the insulating dielectric layer, and for offsetting the impact of external forces during the cutting process, thereby further avoiding the delamination problem.
[0025] The stepped structure 3 and the DFN2510 frame 1 are an integral structure. The stepped structure 3 can be integrally molded with the DFN2510 frame 1 to ensure the structural strength and integrity of the DFN2510 frame 1 and further reduce the risk of delamination.
[0026] The DFN2510 frame 1 is provided with an electroplated layer (not shown in the figure).
[0027] Preferably, the electroplating layer can be formed by NiPdAu (nickel-palladium-gold) electroplating, with the Ni electroplating layer having a thickness of 20-80 U", the Pd electroplating layer having a thickness of 0.8-6.0 U", and the Au electroplating layer having a thickness of 0.12-0.6 U".
[0028] Preferably, the DFN2510 frame 1 can be manufactured using an etching process, and the material is a high-elasticity, corrosion-resistant C7025 white copper plate with a thickness of 0.127mm.
[0029] The above are merely preferred embodiments of the present utility model and are not intended to limit the scope of protection of the present utility model. Therefore, any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present utility model should be included within the scope of protection of the present utility model.
Claims
1. A DFN2510 anti-delamination frame, comprising a DFN2510 frame (1) and connecting ribs (2) formed at the edges of the DFN2510 frame (1); characterized in that: The DFN2510 frame (1) has a stepped structure (3) formed at the edge of its long side. One end of the stepped structure (3) is connected to the edge of the hollow part (11) on the DFN2510 frame (1), and the other end of the stepped structure (3) extends to the connecting rib opening in the middle of the long side of the DFN2510 frame (1). A pair of stepped structures (3) are symmetrically arranged on both sides of the connecting rib opening, so that the connecting rib opening forms a narrow connecting rib opening (4) through a pair of stepped structures (3).
2. The DFN2510 anti-delamination frame according to claim 1, characterized in that: The step structure (3) is in the shape of a "Z" so that one end of the step structure (3) is flush with the edge of the hollow part (11) on the DFN2510 frame (1), and the other end of the step structure (3) is set perpendicular to the long side of the DFN2510 frame (1). The middle part of the step structure (3) is obliquely connected between the two ends of the step structure (3).
3. The DFN2510 anti-delamination frame according to claim 2, characterized in that: The step structure (3) has a length of 0.025 mm at one end and 0.050 mm at the other end. The inclination angle of the middle part of the step structure (3) is 108.43°.
4. The DFN2510 anti-delamination frame according to claim 1, characterized in that: The two connecting ribs (2) located in the middle of the long side of the DFN2510 frame (1) extend to the inside of the narrow connecting rib opening (4), that is, the distance between the two connecting ribs (2) is less than the distance between the other ends of the pair of stepped structures (3).
5. The DFN2510 anti-delamination frame according to any one of claims 1-4, characterized in that: The stepped structure (3) and the DFN2510 frame (1) are an integral structure.
6. The DFN2510 anti-delamination frame according to any one of claims 1-4, characterized in that: The DFN2510 frame (1) is provided with an electroplated layer.